Laser interference photoetching system

Abstract

The invention belongs to the technical field of optical instruments and meters, and discloses a laser interference photoetching system, which comprises a laser, a first reflector, a grating beam splitter, a second reflector, a first universal reflector, a first lens, a second universal reflector, a second lens, a beam splitter prism, a control module, an angle measurement module, a third lens anda substrate, wherein the control module comprises a signal processing end, a controller and a driver; the signal processing end is connected with the angle measuring module; the controller is connected with the signal processing end and the driver; and the driver is connected with the first universal reflector and the second universal reflector. A light source emitted by the laser is divided intotwo beams of light through the system and focused on the substrate for exposure; and by adjusting the exposure angle, the manufacturing of the large-area grating with the gradient period is realized.The size of the grating manufactured in a scanning interference photoetching mode is not limited by the size of an exposure light spot, and a large-size gradient period grating can be manufactured.

Description

technical field [0001] The invention belongs to the technical field of optical instruments and meters, and in particular relates to a laser interference photolithography system, which can be used for the manufacture of large-scale gradually changing periodic gratings. Background technique [0002] Laser interference lithography is an important technology for manufacturing micro-nano array devices by exposing photosensitive substrates with periodic patterns generated by the interference of two or more laser beams. Array, dot matrix, microlens array and other devices, these microarray devices are widely used in national defense, people's livelihood, scientific research and other fields. [0003] Grating devices are key devices in major engineering systems such as large astronomical telescopes, inertial confinement fusion laser ignition systems, and photolithography systems. In recent years, the requirements for size, grid line density, and accuracy have been continuously impro...

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Problems solved by technology

Suzhou Sudaweige Optoelectronics Technology Co., Ltd. discloses a parallel interference lithography system in the Chinese patent publication number CN101846890. The lithography system uses a grating to split light and a lens to combine light, but there is no interference pattern phase locking device in the interference lithography system. , so the laser interference lithography system is also difficult to realize the fabrication of large-area high-precision gratings

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