The invention discloses a leaching-resistant immersed
photoresist and a preparation method thereof, and the preparation method comprises the following steps: combining a
photoacid agent with
calixarene or a derivative thereof to form a functional supramolecule, the
calixarene or the derivative thereof at least has a
fluorine-containing
side chain and a hydroxyl group; performing
esterification reaction on the functional supramolecule and
methacrylic acid or a derivative thereof to obtain a
polymer monomer; and finally, carrying out free
radical polymerization reaction on the
polymer monomers to obtain macromolecular resin, namely the anti-leaching immersed
photoresist. The preparation process provided by the invention is simple, low in synthesis difficulty, low in production cost and easy to industrialize, the obtained anti-leaching immersed
photoresist is good in leaching effect, swelling caused by infiltration of component solvents such as
moisture in immersion liquid into
colloid can be effectively prevented, pattern denaturation is avoided, the anti-leaching immersed photoresist also has very good anti-
etching capability, and when the immersed photoresist is used, the anti-leaching effect of the anti-leaching immersed photoresist is greatly improved. A top
coating is not needed, and the service life of the lens is prolonged.