Dual platform switching system for mask aligner silicon slice platform using conveyer structure

A technology of switching system and silicon wafer stage, which is applied in the field of semiconductor manufacturing equipment, can solve the problems of insufficient utilization of system space, high precision of rail docking, etc., and achieve the effects of shortening working time, small size and improving exposure efficiency

Inactive Publication Date: 2008-06-18
TSINGHUA UNIV
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Problems solved by technology

[0008] The present invention aims at the deficiencies and defects that the system in the prior art requires extremely high guide rail docking precision and that the system space cannot be fully utilized, and provides a dual-swap system for lithography machine silicon wafer tables that adopts a conveyor belt structure.

Method used

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  • Dual platform switching system for mask aligner silicon slice platform using conveyer structure
  • Dual platform switching system for mask aligner silicon slice platform using conveyer structure
  • Dual platform switching system for mask aligner silicon slice platform using conveyer structure

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Embodiment Construction

[0019] As shown in Fig. 2, the wafer stage of a traditional lithography machine has only one wafer motion positioning system in the lithography machine, that is, only one wafer stage. Preparations such as leveling, focusing, and alignment must be done on the exposure wafer stage, and these tasks take a long time, especially for alignment, which requires extremely high-precision low-speed scanning (typical alignment scanning The speed is 1mm / s), so it takes a long time. In order to improve the exposure efficiency of the photolithography machine, a dual-stage exchange system for the silicon wafer stage of the photolithography machine using a conveyor belt structure according to the present invention transfers the exposure preparation work such as leveling, focusing, and alignment to the preprocessing station On the wafer stage of the exposure station, and independently at the same time as the wafer stage of the exposure station, thus greatly shortening the working time of the wa...

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Abstract

The invention provides a double-platform exchanging system for a photoetching machine silicon chip platform with a conveyor belt and belongs to the technical field of the manufacturing equipment of a semiconductor. The invention comprises a silicon chip platform operated on a pretreatment station and a silicon chip platform operated on an exposure station; the pretreatment station and the exposure station are respectively provided with a H-typed driving unit and the H-typed driving unit consists of X-directional straight line motors on the two sides and a Y-directional straight line motor, both of which are used for driving the silicon chip platform to move along X direction and Y direction on the pretreatment station and the exposure station; the two sides of a base station are respectively provided with a conveyor belt in the system and a butt slide block is fixed on and connected with the lateral side of the conveyor belt; with the conveyor belt and the butt slide block, the transition of the silicon chip platform 1 from the pretreatment station to the exposure station can be realized. As the invention adopts the conveyor belt structure, the invention effectively avoids the problem of accurate abut joint of the guide rail of the patent ZL03156436.4 double-platform exchanging system and has the characteristics of simple operation and small size of outline, etc.

Description

technical field [0001] The invention relates to a new double-swap exchange system for photolithography machines, which is mainly used in semiconductor photolithography machines and belongs to the technical field of semiconductor manufacturing equipment. Background technique [0002] In the production process of integrated circuit chips, the exposure transfer (photolithography) of the design pattern of the chip on the photoresist on the surface of the silicon wafer is one of the most important processes. The equipment used in this process is called a photolithography machine (exposure machine). The resolution and exposure efficiency of the lithography machine greatly affect the characteristic line width (resolution) and productivity of the integrated circuit chip. As the key system of the lithography machine, the motion accuracy and work efficiency of the silicon wafer ultra-precision motion positioning system (hereinafter referred to as the wafer stage) largely determine th...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20H01L21/68
Inventor 朱煜张鸣汪劲松徐登峰尹文生胡金春杨开明李广闵伟段广洪
Owner TSINGHUA UNIV
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