132 results about "Exposure chamber" patented technology

A quantitative fit test (QNFT) system and method for assessing the biological fit factor (FF) performance of respiratory protective devices. The biological QNFT system includes the following three main elements: an aerosol generation system; an exposure chamber; and an aerosol sampling subsystem. The aerosol sampling subsystem includes an aerosol spectrometer that counts particles in discrete size units ranging from 0.5 to 20 micrometers (μm) making it possible to obtain several size-specific FF measurements from a single respirator fit test. A virtual impactor in the aerosol generation system increases the number of challenge particles in the primary target size of interest (1 to 5 μm) and increases the sensitivity of the method allowing FF values of up to one million to be measured without the need to correct for in-mask background particles.

An apparatus for removing an immersion lithography liquid and a method of immersion lithography are disclosed, that rapidly and easily remove liquid from a wafer before development and after exposure. The apparatus includes a housing device configured to prevent the exposure chamber from being contaminated with a scattered liquid; a (rotatable) stage inside the housing device, configured to support a substrate; and (i) a motor configured to rotate the stage or (ii) a gas-spraying device or nozzle above the stage, configured to spray the substrate with an inert gas. The method generally includes coating a photoresist on a substrate; immersing the substrate in a liquid; exposing the substrate; removing the liquid from the substrate by (i) rotating the stage and / or substrate or (ii) spraying the substrate with an inert gas; and developing the photoresist.

A portable automated biomonitoring system for monitoring water quality includes an exposure chamber for housing an aquatic organism and a water inlet for directing water to the exposure chamber. The aquatic organism has ventilatory behavior and body movement sensitive to water quality. Electrodes sense electrical signals produced by the organism during its ventilatory behavior and body movement, and a controller responsive to signals from the electrodes determines a plurality of ventilatory parameters based on the signals. The ventilatory parameters are compared with corresponding thresholds to determine when the water to which the organism is exposed has caused physiological stress to the organism. The water being evaluated may be recirculated through the system for further analysis.

A device for the exposure of blood to light produces a controlled, safe, and rapid exposure of blood to specific emissions, thereby inducing improved immune response. The device exposes the blood through a simplified macro blood flow path in which the internal or micro blood flow is in a spiral motion. The device includes a blood flow path, a pump, an exposure chamber, an ultraviolet light source, and a vacuum chamber.

Embodiments of the present application are directed to devices, systems and methods for irradiating fluids (e.g., blood) with ultraviolet light, and corresponding related components, systems and methods. In some embodiments of the invention, an ultraviolet blood irradiation (UBI) system is provided and may include an ultraviolet UV source providing a predetermined wavelength of radiation to provide a detrimental effect to virus and / or bacteria, an exposure chamber for exposing a predetermined volume of blood to radiation, a conduit between the UV source and the exposure chamber, a pump for pumping blood between a first location and a second location and a shutter assembly provided between the UV source and the exposure chamber providing time-metered irradiation of the blood in the chamber.

A lithography tool includes an exposure chamber and a reticle handler that exchanges a reticle being exposed as prescribed by the user of the lithography tool. The reticle handler can include a vacuum-compatible robot, a vacuum chamber to house the robot, a load-lock to input reticles and transition them from atmospheric pressure to vacuum, a processing station for processing the reticle, and a reticle library for storing at least one extra reticle so that it is quickly available for exchange during an exposure process. The robot can have a two or more handed gripper to simultaneously hold multiple reticles. This allows a first reticle to be removed from the reticle stage with a first hand and a second reticle to be loaded onto the reticle stage with a second hand, and so on, which minimizes exchange time.

An exposure apparatus for exposing a substrate. The apparatus includes an optical system being set at a reference temperature, for directing light to the substrate, an exposure chamber for storing the optical system in a vacuum ambience, and a load-lock chamber, disposed adjacent to the exposure chamber, for converting an ambience of a space surrounding the substrate into a vacuum ambience. When the load-lock chamber converts the ambience of the space surrounding the substrate into a vacuum ambience, the temperature of the load-lock chamber is made higher than the reference temperature.

A quantitative fit test (QNFT) system and method for assessing the biological fit factor (FF) performance of respiratory protective devices. The biological QNFT system includes the following three main elements: an aerosol generation system; an exposure chamber; and an aerosol sampling subsystem. The aerosol sampling subsystem includes an aerosol spectrometer that counts particles in discrete size units ranging from 0.5 to 20 micrometers (μm) making it possible to obtain several size-specific FF measurements from a single respirator fit test. A virtual impactor in the aerosol generation system increases the number of challenge particles in the primary target size of interest (1 to 5 μm) and increases the sensitivity of the method allowing FF values of up to one million to be measured without the need to correct for in-mask background particles.

An exposure apparatus includes an atmosphere maintaining unit which maintains an exposure chamber in an air atmosphere, a gas supply unit which supplies air or a mixed gas containing air and an inert gas to a local space, between a final surface of a projection optical system and a substrate, a detector which detects an alignment mark and a reference mark formed on the substrate stage, and a controller. The controller controls the gas supply unit not to supply the mixed gas to the local space when the detector detects the reference mark, and controls the gas supply unit to supply the mixed gas to the local space when an instruction to detect the alignment mark upon setting the local space in a mixed gas atmosphere, and expose the substrate based on the detection results of the reference mark and the alignment mark is issued from the recipe.

The invention discloses a semi-automatic alignment and exposure device of a printed circuit board (PCB). The semi-automatic alignment and exposure device comprises an alignment chamber and an exposure chamber, wherein an upper slipway and a lower slipway are respectively arranged in the alignment chamber and the exposure chamber and are in parallel, an upper alignment platform is arranged in the upper slipway and comprises a first working table, a first upper cover and an alignment mechanism, the first working table can slide along the upper slipway, the first upper cover is hinged with the first working table, a signal acquisition device is arranged above the first working table and can slide along the alignment chamber, the exposure chamber comprises an exposure device, the exposure device can do vertical movement along the exposure chamber, a lower alignment platform comprises a second working table, a second upper cover and an alignment mechanism, the second working table can slide along the lower slipway, the second upper cover is hinged with the second working table, the first working table and the second working table do movement relative to each other by a driving device, the semi-automatic alignment and exposure device also comprises a control system, and the control system controls opening and closing of a partition plate, controls the first working table and the second working table to do movement relative to each other and controls the alignment mechanism to automatically align. The semi-automatic alignment and exposure device has the advantages of positioning accuracy and high positioning efficiency.

An apparatus for removing an immersion lithography liquid and a method of immersion lithography are disclosed, that rapidly and easily remove liquid from a wafer before development and after exposure. The apparatus includes a housing device configured to prevent the exposure chamber from being contaminated with a scattered liquid; a (rotatable) stage inside the housing device, configured to support a substrate; and (i) a motor configured to rotate the stage or (ii) a gas-spraying device or nozzle above the stage, configured to spray the substrate with an inert gas. The method generally includes coating a photoresist on a substrate; immersing the substrate in a liquid; exposing the substrate; removing the liquid from the substrate by (i) rotating the stage and / or substrate or (ii) spraying the substrate with an inert gas; and developing the photoresist.