Mask pattern optimization method, program product, storage medium and equipment

Abstract

The invention relates to the technical field of computational lithography, in particular to a mask pattern optimization method, a program product, a storage medium and equipment. The method comprises the following steps: providing a reticle graph; detecting defects of the reticle graph to generate a database file, wherein the database file comprises a defect data group corresponding to each detected defect; displaying the defect data set contained in the database file in real time through the first graphical user interface; receiving a selection instruction for the defect data set in the first graphical user interface, recording the selected defect data set to a second graphical user interface and displaying the selected defect data set in real time; and continuing iterative correction of the optical proximity effect, and after each round of correction in the iterative process is finished, updating the database file according to the newly corrected reticle graph. According to the method, the function of quickly repositioning the previously positioned defect information is provided for workers, the operation steps of a user in the mask graph correction process are simplified, and the working efficiency is improved.

Description

Technical Field The present invention relates to the field of computational lithography technology, and in particular to a mask layout optimization method, program product, storage medium and equipment. Background Art In the work of optical proximity effect correction, it is often necessary to detect and process defect information. When obtaining defect information, workers can often see a large amount of defect information. In the later iterative lithography correction process, workers need to repair specific defect locations and need to pay attention to the locations of these major defects.

[0003] Currently, defect information obtained by optical rule checking is usually recorded in a database, and staff can locate the defect information by searching in the database. However, for larger layouts, the database will become very large. During the iterative process of optical proximity effect correction, it is difficult to relocate the defect information that has been located before. Summary of the invention In order to solve the problem that previously located defect information is difficult to re-locate in the existing optical proximity effect correction process, the present invention provides a mask layout optimization method, program product, storage medium and device.

[0005] In order to solve the above technical problems, the present invention provides the following technical solutions: a mask layout optimization method, the method comprising: providing an initial mask layout, performing optical proximity effect correction on the initial mask layout to obtain an intermediate mask layout; detecting defects of the intermediate mask layout to generate a database file, the database file containing a defect data group corresponding to each detected defect; displaying the defect data group contained in the database file in real time through a first graphical user interface; receiving a selection instruction for the defect data group in the first graphical user interface, recording the selected defect data group in a second graphical user interface and displaying it in real time; continuing to perform iterative correction of the optical proximity effect, and after each round of correction in the iterative process, updating the database file according to the newly corrected intermediate mask layout; after completing the iterative correction, outputting the intermediate mask layout obtained in the last iteration as an optimized mask layout.

[0006] Preferably, the defect data set includes type information, location information and value information of the corresponding defect.

[0007] Preferably, the method further includes: providing a third graphical user interface for displaying the intermediate mask layout, receiving a selection instruction for a defect data group in the second graphical user interface; obtaining position information of a corresponding defect from the selected defect data group, and locating and displaying the corresponding defect in the third graphical user interface according to the obtained position information.

[0008] Preferably, both the first graphical user interface and the second graphical user interface display the defect data group in a table format. The tables in the first graphical user interface and the second graphical user interface have filtering and sorting functions, and the second graphical user interface also has a deletion function for the defect data group.

[0009] Preferably, defect detection of the intermediate mask layout is achieved by optical rule checking, and the exposure profile of the intermediate mask layout under different exposure conditions is checked by providing a variety of detectors, detection types and detection ranges during the optical rule checking.

[0010] Preferably, the defect data set further includes detector type information, detection range information and exposure condition information corresponding to the defect.

[0011] Preferably, when performing iterative correction of the optical proximity effect, only defects corresponding to the defect data set displayed in the second graphical user interface may be corrected.

[0012] In order to solve the above technical problems, the present invention provides another technical solution as follows: a program product, including a computer program / instruction, which implements the steps of the mask layout optimization method as described above when executed by a processor.

[0013] In order to solve the above technical problems, the present invention provides another technical solution as follows: a storage medium storing a computer program / instruction, which implements the steps of the mask layout optimization method as described above when executed by a processor.

[0014] In order to solve the above technical problems, the present invention provides another technical solution as follows: a computer device, including a memory, a processor and a computer program stored in the memory, and the processor executes the computer program to implement the steps of the mask layout optimization method as described above.

[0015] Compared with the prior art, the mask layout optimization method, program product, storage medium and device provided by the present invention have the following beneficial effects: 1. A mask layout optimization method provided by an embodiment of the present invention provides a function of quickly relocating previously located defect information for staff by providing a first graphical user interface and a second graphical user interface, thereby simplifying the operation steps of users in the optical proximity effect correction process and improving work efficiency; specifically, an initial mask layout is first provided to provide a basis for subsequent optical proximity effect correction; performing optical proximity effect correction on the initial mask layout can reduce the deviation caused by the optical proximity effect, which is beneficial to improving the accuracy of the mask layout, detecting defects in the intermediate mask layout, identifying defects in the mask layout, and providing a basis for subsequent corrections, thereby ensuring that defects are discovered and corrected in a timely manner and improving the yield rate; generating a database file can systematically record defect information and facilitate the management and use of defect information; displaying a defect data group in real time through the first graphical user interface and providing an intuitive defect information display method can simplify user operations and improve efficiency; recording and displaying a selected defect data group through the second graphical user interface can realize convenient attention and tracking of important defects in the process of iterative defect correction.

[0016] 2. In an embodiment of the present invention, by displaying the type information, location information and numerical information in the defect data group, comprehensive defect information can be provided to the staff, helping them to more effectively manage, locate and repair defects; specifically, the type information can help the staff understand the nature of the defect, such as edge position error, tightening or bridging defects, so as to better understand the causes and impacts of the defects. The repair methods for different types of defects may be different. Understanding the defect type is helpful in formulating a reasonable repair plan; the location information enables the staff to quickly locate the specific location where the defect occurs, which is convenient for detailed inspection and correction, and through the location information, the staff can track the changes of the defect in different correction rounds and evaluate the repair effect; the numerical information can help the staff quantify the severity of the defect, and the changes in the numerical information can be used to evaluate the effectiveness of the repair measures; in summary, by providing multiple types of defect information, the staff can identify and locate problems more quickly, reduce ineffective work, and improve repair efficiency.

[0017] 3. In the embodiment of the present invention, a third graphical user interface is provided for displaying the intermediate mask layout, and the position of the selected defect is directly displayed on the third graphical user interface, thereby enhancing the visualization effect of the defect information and making the defect information more intuitive and easy to understand; the corresponding defects are located and displayed in the third graphical user interface according to the defect data group selected in the second graphical user interface, which can significantly improve the accuracy and efficiency of defect location; by automatically locating and displaying defects, staff can quickly locate and handle defects, thereby improving overall work efficiency, and automated defect location reduces errors that may occur when manually searching for defects, thereby improving the accuracy of defect management.

[0018] 4. In the embodiment of the present invention, the defect data group is displayed in the form of a table in the first graphical user interface and the second graphical user interface. The display in the form of a table makes the defect information clearer, reduces errors caused by information confusion, improves the readability of information, and allows users to easily browse and manage defect information; the table has filtering and sorting functions. The filtering function allows users to quickly find the defect type of concern, and the sorting function helps users sort according to the severity of the defect or other indicators. Users can quickly locate specific types of defect information as needed, thereby improving the efficiency of processing defect information. The second graphical user interface also has a deletion function for the defect data group, allowing users to easily remove defect information that is no longer needed, simplifying the defect information management process.

[0019] 5. In the embodiment of the present invention, by providing a variety of detectors, detection types and detection ranges, it is possible to achieve comprehensive detection of the exposure profile of the mask layout under different exposure conditions, ensuring that all types of defects are discovered. Specifically, by providing a variety of detectors, different types of defects, such as edge position errors, tightening and bridging, can be detected, thereby improving the comprehensiveness of the detection; appropriate detection types, such as rule-based detection, model-based detection, etc., can be selected according to different detection requirements, thereby improving the flexibility of the detection, so that the detection process can better adapt to the diverse needs in actual production; different detection ranges can be set as needed, such as global detection, local detection, etc., thereby improving the pertinence of the detection, making the detection process more efficient; different exposure conditions, such as different exposure doses, focus offsets, etc., can be simulated to detect the performance of the mask layout under these conditions, thereby improving the authenticity and reliability of the detection, and ensuring that the performance of the mask layout in actual production meets the design requirements.

[0020] 6. In an embodiment of the present invention, by displaying a more detailed defect data group, the judgment and work efficiency of the staff can be further improved; by providing detector type information, the staff can understand what type of detector the detected defect was found by, which helps to more accurately judge the nature and cause of the defect; by providing detection range information, the staff can understand in which area or range the defect was found, which helps to more accurately locate the position of the defect; by providing exposure condition information, the staff can understand under which exposure condition the defect was found, which helps to analyze the cause of the defect and adjust the exposure conditions accordingly.

[0021] 7. In the embodiment of the present invention, by correcting only the defects corresponding to the defect data group displayed in the second graphical user interface, it can be ensured that each iterative correction is based on the defects that need the most attention, which helps to improve the targeted nature of defect repair, ensure that each correction is valuable, and avoid excessive attention to non-critical defects, which helps to improve the efficiency of defect repair, reduce the time required to repair defects, and speed up the process of mask layout optimization.

[0022] 8. To solve the above technical problems, an embodiment of the present invention further provides a program product, including a computer program / instruction, which implements the steps of the mask layout optimization method described above when executed by a processor. This program product has the same beneficial effects as the above mask layout optimization method, which will not be described in detail here.

[0023] 9. To solve the above technical problems, an embodiment of the present invention further provides a storage medium on which a computer program / instruction is stored. When the computer program / instruction is executed by a processor, the steps of the mask layout optimization method described above are implemented. This storage medium has the same beneficial effects as the above mask layout optimization method, which will not be described in detail here.

[0024] 10. To solve the above technical problems, an embodiment of the present invention further provides a computer device, including a memory, a processor, and a computer program stored in the memory, wherein the processor executes the computer program to implement the steps of the mask layout optimization method described above. The computer device has the same beneficial effects as the above mask layout optimization method, which will not be described in detail here. BRIEF DESCRIPTION OF THE DRAWINGS Figure 1 It is a flow chart of the mask layout optimization method provided by the first embodiment of the present invention.

[0026] Figure 2 It is a flow chart of step S2 of the mask layout optimization method provided in the first embodiment of the present invention.

[0027] Figure 3 It is a schematic diagram of the working status of the mask layout optimization method provided by the first embodiment of the present invention.

[0028] Figure 4 It is a schematic diagram of a table displayed by the second graphical user interface in the mask layout optimization method provided in the first embodiment of the present invention.

[0029] Figure 5 It is a block diagram of a program product provided by the second embodiment of the present invention.

[0030] Figure 6 is a block diagram of a storage medium provided by a third embodiment of the present invention.

[0031] Figure 7 is a block diagram of a computer device provided by a fourth embodiment of the present invention.

[0032] Description of the accompanying drawings: 1. Program product; 2. Storage medium; 3. Computer equipment. DETAILED DESCRIPTION In order to make the purpose, technical solution and advantages of the present invention more clearly understood, the present invention is further described in detail below in conjunction with the accompanying drawings and implementation examples. It should be understood that the specific embodiments described herein are only used to explain the present invention and are not intended to limit the present invention.

[0034] In the embodiments provided by the present invention, it should be understood that "B corresponding to A" means that B is associated with A, and B can be determined according to A. However, it should also be understood that determining B according to A does not mean determining B only according to A, and B can also be determined according to A and / or other information.

[0035] It should be understood that the "one embodiment" or "an embodiment" mentioned throughout the specification means that the specific features, structures or characteristics related to the embodiment are included in at least one embodiment of the present invention. Therefore, "in one embodiment" or "in an embodiment" appearing throughout the specification does not necessarily refer to the same embodiment. In addition, these specific features, structures or characteristics can be combined in one or more embodiments in any suitable manner. Those skilled in the art should also be aware that the embodiments described in the specification are all optional embodiments, and the actions and modules involved are not necessarily required for the present invention.

[0036] In various embodiments of the present invention, it should be understood that the size of the serial numbers of the above-mentioned processes does not mean the necessary order of execution. The execution order of each process should be determined by its function and internal logic, and should not constitute any limitation on the implementation process of the embodiments of the present invention.

[0037] The flow chart and block diagram in the accompanying drawings of the present invention illustrate the possible architecture, function and operation of the system, method and computer program product according to various embodiments of the present application. In this regard, each box in the flow chart or block diagram can represent a module, a program segment or a part of a code, and the module, the program segment or a part of the code contains one or more executable instructions for realizing the specified logical function. It should also be noted that in some alternative implementations, the functions marked in the box can also occur in a sequence different from that marked in the accompanying drawings. For example, two boxes represented in succession can actually be executed substantially in parallel, and they can sometimes be executed in the opposite order, which is determined based on the functions involved. It should be particularly noted that each box in the block diagram and / or flow chart, and the combination of the boxes in the block diagram and / or flow chart can be implemented by a dedicated hardware-based system that performs a specified function or operation, or can be implemented by a combination of dedicated hardware and computer instructions.

[0038] See also Figure 1 The first embodiment of the present invention provides a mask layout optimization method, comprising the following steps: S1: providing an initial mask layout, and performing optical proximity effect correction on the initial mask layout to obtain an intermediate mask layout; S2: detecting defects of the intermediate mask layout to generate a database file, wherein the database file includes a defect data group corresponding to each detected defect; S3: Displaying the defect data group contained in the database file in real time through the first graphical user interface; S4: receiving a selection instruction for a defect data group in the first graphical user interface, recording the selected defect data group in the second graphical user interface and displaying it in real time; S5: continue to perform iterative correction of the optical proximity effect, and after each round of correction in the iterative process, update the database file according to the newly corrected intermediate mask layout; S6: After completing the iterative correction, the intermediate mask layout obtained in the last iteration is output as the optimized mask layout.

[0039] It can be understood that a mask layout optimization method provided by an embodiment of the present invention, by providing a first graphical user interface and a second graphical user interface, provides staff with the function of quickly relocating previously located defect information, thereby simplifying the user's operating steps in the optical proximity effect correction process and improving work efficiency.

[0040] Specifically, an initial mask layout is first provided to provide a basis for subsequent optical proximity effect correction; optical proximity effect correction of the initial mask layout can reduce the deviation caused by the optical proximity effect, which is beneficial to improve the accuracy of the mask layout, detect defects in the intermediate mask layout, identify defects in the mask layout, and provide a basis for subsequent corrections, which can ensure that defects are discovered and corrected in a timely manner and improve the yield rate; generating a database file can systematically record defect information and facilitate the management and use of defect information; displaying defect data groups in real time through a first graphical user interface and providing an intuitive defect information display method can simplify user operations and improve efficiency; recording and displaying selected defect data groups through a second graphical user interface can realize convenient attention and tracking of important defects in the process of iterative defect correction.

[0041] It should be noted that in step S1, the initial mask layout refers to the design layout before optical proximity correction (OPC) is performed. It is the starting point of the mask layout optimization process and is usually created based on the designer's design intent and specification requirements. The initial mask layout contains all the necessary information for chip design and is used to guide the subsequent mask manufacturing process. Optical proximity correction, also known as OPC optimization, is a technology used to improve the quality of lithography in the semiconductor manufacturing process. It corrects the design layout in advance to compensate for pattern distortion caused by the optical proximity effect during the lithography process.

[0042] As a feasible implementation manner, in step S2, the defect data group includes type information, location information and value information of the corresponding defect.

[0043] In an embodiment of the present invention, by displaying type information, location information and numerical information in a defect data group, comprehensive defect information can be provided to staff members, helping them to more effectively perform defect management, positioning and repair work; specifically, type information can help staff members understand the nature of defects, such as edge position errors, tightening or bridging defects, so as to better understand the causes and impacts of defects. The repair methods for different types of defects may be different, and understanding the defect types helps to formulate reasonable repair plans; location information enables staff members to quickly locate the specific location where the defect occurs, which is convenient for detailed inspection and correction, and through location information, staff members can track changes in defects in different correction rounds and evaluate the repair effect; numerical information can help staff members quantify the severity of defects, and changes in numerical information can be used to evaluate the effectiveness of repair measures; in summary, by providing multiple types of defect information, staff members can identify and locate problems more quickly, reduce ineffective work, and improve repair efficiency.

[0044] As a feasible implementation mode, when executing step S2, defect detection of the intermediate mask layout is achieved through optical rule checking. During the optical rule checking, the exposure profile of the intermediate mask layout under different exposure conditions is checked by providing a variety of detectors, detection types and detection ranges.

[0045] It can be understood that in the embodiments of the present invention, by providing a variety of detectors, detection types and detection ranges, it is possible to achieve comprehensive detection of the exposure profile of the mask layout under different exposure conditions, ensuring that all types of defects are discovered. Specifically, by providing a variety of detectors, different types of defects such as EPE (edge ​​position error), Pinch, Bridge, etc. can be detected, thereby improving the comprehensiveness of the detection; appropriate detection types such as rule-based detection, model-based detection, etc. can be selected according to different detection requirements, thereby improving the flexibility of the detection, so that the detection process can better adapt to the diverse needs in actual production; different detection ranges can be set as needed, such as global detection, local detection, etc., thereby improving the pertinence of the detection, making the detection process more efficient; different exposure conditions such as different exposure doses, focus offsets, etc. can be simulated to detect the performance of the mask layout under these conditions, thereby improving the authenticity and reliability of the detection, and ensuring that the performance of the mask layout in actual production meets the design requirements.

[0046] As a feasible implementation manner, the defect data set further includes detector type information, detection range information and exposure condition information corresponding to the defect.

[0047] It can be understood that in the embodiments of the present invention, by displaying a more detailed defect data group, the judgment and work efficiency of the staff can be further improved; by providing detector type information, the staff can understand what type of detector the detected defect was found by, which helps to more accurately judge the nature and cause of the defect; by providing detection range information, the staff can understand in which area or range the defect was found, which helps to more accurately locate the position of the defect; by providing exposure condition information, the staff can understand under which exposure condition the defect was found, which helps to analyze the cause of the defect and adjust the exposure conditions accordingly.

[0048] See also Figure 4 , as a feasible implementation, Figure 4 The first column NO. of the displayed table is the serial number column, the second and third columns are the position information columns, X represents the horizontal coordinate, Y represents the vertical coordinate, Checker represents the type information column, Size represents the value information column, Range represents the detection range information column, and Unit represents the unit column. It can be understood that the display columns in the table can be increased or deleted according to needs.

[0049] See also Figure 2 As a feasible implementation, step S2 includes the following steps: Step S21: Setting defect detection parameters; specifically, setting the detector type of the optical rule checking (LRC) tool, such as EPE (edge ​​position error), Pinch, Bridge, etc.; setting the detection type and detection range, defining which types of defects need to be detected and the detection accuracy. Determine different exposure conditions so that the mask layout can be checked under different exposure conditions.

[0050] Step S22: perform defect detection; specifically, use the LRC tool to perform defect detection on the intermediate mask layout, and scan the mask layout according to the set detector type, detection type, detection range and exposure conditions; this helps to ensure that the detection process covers various possible defect types and achieves the required detection accuracy.

[0051] Step S23: Collect defect data and generate a defect data group; specifically, for each defect detected, collect basic information, including but not limited to the defect type, location (X, Y coordinates), size, unit, detector name, detection type and detection range; integrate each defect information collected into a defect data group.

[0052] Step S24: constructing a database file, which specifically includes creating a database file to store all defect data groups, and recording each defect data group into the database file.

[0053] Understandably, this process achieves comprehensive and detailed defect detection of the intermediate mask layout, and organizes the detected defect information into a form that is easy to manage and analyze, aiming to provide key data support for subsequent mask layout optimization.

[0054] As a feasible implementation, in step S3, when the data in the database file changes, for example, after a new OPC revision, the user interface is automatically refreshed to ensure that the displayed data is the latest.

[0055] Please combine Figure 3 and Figure 4 As a feasible implementation method, both the first graphical user interface and the second graphical user interface display the defect data group in a table format. The tables in the first graphical user interface and the second graphical user interface have filtering and sorting functions, and the second graphical user interface also has a deletion function for the defect data group.

[0056] It can be understood that in the embodiment of the present invention, the defect data group is displayed in the form of a table in the first graphical user interface and the second graphical user interface. The display in the form of a table makes the defect information clearer, reduces errors caused by information confusion, improves the readability of information, and allows users to easily browse and manage defect information; the table has filtering and sorting functions. The filtering function allows users to quickly find the defect type of concern, and the sorting function helps users sort according to the severity of the defect or other indicators. Users can quickly locate specific types of defect information as needed, thereby improving the efficiency of processing defect information. The second graphical user interface also has a deletion function for the defect data group, allowing users to easily remove defect information that is no longer needed, simplifying the management process of defect information.

[0057] As a feasible implementation, step S4 includes the following steps: Step S41: receiving a selection instruction; specifically, the user selects one or more defect data groups in the first graphical user interface; Step S42: transmitting information of the selected defect data group from the first graphical user interface to the second graphical user interface; Step S43: parsing the input defect data group information in the second graphical user interface, and storing the information in a data structure of the second graphical user interface, such as a table or a list.

[0058] When executing step S4, the data display in the second graphical user interface is updated in real time to ensure that the user can see the latest selection results.

[0059] As a feasible implementation, the currently displayed defect data group may be exported as a file to facilitate further analysis or integration with other tools.

[0060] See also Figure 3 As a feasible implementation method, the mask layout optimization method also includes: providing a third graphical user interface for displaying the intermediate mask layout; receiving a selection instruction for a defect data group in the second graphical user interface; obtaining position information of the corresponding defect from the selected defect data group, and locating and displaying the corresponding defect in the third graphical user interface according to the obtained position information.

[0061] It can be understood that in the embodiment of the present invention, by providing a third graphical user interface for displaying the intermediate mask layout, the position of the selected defect is directly displayed on the third graphical user interface, thereby enhancing the visualization effect of the defect information and making the defect information more intuitive and easy to understand; locating and displaying the corresponding defects in the third graphical user interface according to the defect data group selected in the second graphical user interface can significantly improve the accuracy and efficiency of defect location; by automatically locating and displaying defects, staff can quickly locate and handle defects, thereby improving overall work efficiency, and automated defect location reduces possible errors that may occur when manually searching for defects, thereby improving the accuracy of defect management.

[0062] As a feasible implementation, the first graphical user interface, the second graphical user interface and the third graphical user interface may be displayed simultaneously on the same display page.

[0063] As a feasible implementation, the table of the first graphical user interface prohibits deletion of data. It can be understood that this design can ensure the integrity and accuracy of the original defect data and avoid the data from being accidentally deleted or modified during the processing.

[0064] As a feasible implementation, when performing iterative correction of the optical proximity effect, only the defects corresponding to the defect data set displayed in the second graphical user interface may be corrected.

[0065] It can be understood that in the embodiment of the present invention, by correcting only the defects corresponding to the defect data group displayed in the second graphical user interface, it can be ensured that each iterative correction is based on the defects that need the most attention, which helps to improve the targeted nature of defect repair, ensure that each correction is valuable, and avoid excessive attention to non-critical defects, which helps to improve the efficiency of defect repair, reduce the time required to repair defects, and speed up the process of mask layout optimization.

[0066] See also Figure 5 In order to solve the above technical problems, the second embodiment of the present invention provides another technical solution as follows: a program product 1, including a computer program / instruction, which implements the steps of the mask layout optimization method as described above when executed by a processor. It can be understood that the program product 1 has the same beneficial effects as the above mask layout optimization method, which will not be described in detail here.

[0067] See also Figure 6In order to solve the above technical problems, the third embodiment of the present invention provides another technical solution as follows: a storage medium 2 having a computer program / instruction stored thereon, which implements the steps of the mask layout optimization method as described above when the computer program / instruction is executed by a processor. It can be understood that the storage medium 2 has the same beneficial effects as the above mask layout optimization method, which will not be described in detail here.

[0068] See also Figure 7 In order to solve the above technical problems, the fourth embodiment of the present invention provides another technical solution as follows: a computer device 3 includes a memory, a processor and a computer program stored in the memory, and the processor executes the computer program to implement the steps of the mask layout optimization method as described above. It can be understood that the computer device 3 has the same beneficial effects as the above mask layout optimization method, which will not be described in detail here.

[0069] The above is a detailed introduction to a mask layout optimization method, program product, storage medium and device disclosed in an embodiment of the present invention. Specific examples are used in this article to illustrate the principles and implementation methods of the present invention. The description of the above embodiments is only used to help understand the method of the present invention and its core idea; at the same time, for those skilled in the art, according to the idea of ​​the present invention, there will be changes in the specific implementation method and application scope. In summary, the content of this specification should not be understood as a limitation on the present invention. Any modifications, equivalent substitutions and improvements made within the principles of the present invention should be included in the protection scope of the present invention.

Claims

1. A mask layout optimization method, characterized in that: The method comprises: Providing an initial mask layout, and performing optical proximity effect correction on the initial mask layout to obtain an intermediate mask layout; Detecting defects of the intermediate mask layout to generate a database file, wherein the database file includes a defect data group corresponding to each detected defect; Displaying the defect data group contained in the database file in real time through the first graphical user interface; receiving a selection instruction for the defect data group in the first graphical user interface, recording the selected defect data group in the second graphical user interface and displaying it in real time; Continue to iterate and correct the optical proximity effect. After each round of correction in the iterative process, update the database file according to the newly corrected intermediate mask layout; After completing the iterative correction, the intermediate mask layout obtained in the last iteration is output as the optimized mask layout.

2. The mask layout optimization method according to claim 1, wherein: The defect data set includes type information, location information, and value information of the corresponding defect.

3. The mask layout optimization method according to claim 2, characterized in that: The method further comprises: Providing a third graphical user interface for displaying the intermediate mask layout, and receiving a selection instruction for the defect data group in the second graphical user interface; The position information of the corresponding defect is obtained from the selected defect data group, and the corresponding defect is located and displayed in the third graphical user interface according to the obtained position information.

4. The mask layout optimization method according to claim 1, wherein: The first graphical user interface and the second graphical user interface both display the defect data group in a table format. The tables in the first graphical user interface and the second graphical user interface have filtering and sorting functions, and the second graphical user interface also has a deletion function for the defect data group.

5. The mask layout optimization method according to claim 1, wherein: Defect detection of the intermediate mask layout is achieved through optical rule checking. During optical rule checking, a variety of detectors, detection types and detection ranges are provided to check the exposure profile of the intermediate mask layout under different exposure conditions.

6. The mask layout optimization method according to claim 5, characterized in that: The defect data set also includes detector type information, detection range information, and exposure condition information corresponding to the defect.

7. The mask layout optimization method according to claim 1, wherein: When performing iterative correction of the optical proximity effect, only defects corresponding to the defect data set displayed in the second graphical user interface may be corrected.

8. A program product comprising a computer program / instructions, characterized in that: When the computer program / instructions are executed by a processor, the steps of the mask layout optimization method according to any one of claims 1 to 7 are implemented.

9. A storage medium having a computer program / instruction stored thereon, characterized in that: When the computer program / instructions are executed by a processor, the steps of the mask layout optimization method according to any one of claims 1 to 7 are implemented.

10. A computer device comprising a memory, a processor and a computer program stored in the memory, characterized in that: The processor executes the computer program to implement the steps of the mask layout optimization method according to any one of claims 1 to 7.

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