Parameter-adjustable hollow light guide tube and photoetching system

Abstract

The invention discloses a parameter-adjustable hollow light guide tube and a photoetching system.The parameter-adjustable hollow light guide tube comprises a shell, a fixed mirror set, a movable mirror set and an adjusting mechanism, and the fixed mirror set comprises a first reflecting mirror and a second reflecting mirror which are arranged on the shell in the vertical direction at intervals; the movable mirror group comprises a third reflecting mirror and a fourth reflecting mirror which are arranged on the shell at an interval in the left-right direction, and the first reflecting mirror, the second reflecting mirror, the third reflecting mirror and the fourth reflecting mirror are enclosed to form a light guide cavity; the adjusting mechanism is arranged between the third reflecting mirror and the shell and / or between the fourth reflecting mirror and the shell, the distance and the included angle between the third reflecting mirror and the fourth reflecting mirror can be adjusted through the adjusting mechanism, and the distance and the included angle between the third reflecting mirror and the fourth reflecting mirror can be adjusted through the adjusting mechanism. Therefore, the size parameter and the light emitting characteristic of the hollow light guide tube are adjusted, and the parameter adjustment requirement of an exposure system is met.

Description

Technical Field

[0001] The invention relates to the technical field of optical devices, and in particular to a hollow light pipe with adjustable parameters and a photolithography system. Background Art

[0002] In the maskless lithography system, the exposure engine needs to design and customize the parameters of the lighting components according to the performance requirements of the whole machine, and is divided into full field, half field and 1 / 3 field according to the spot size. Light pipes are required in the lighting components. The structure size and optical performance parameters of the light pipes are fixed. Every time its parameters are changed, they need to be reprocessed, which is costly and time-consuming. More importantly, the current exposure engine cannot adjust DOF and CD. Summary of the invention

[0003] The present invention aims to solve at least one of the technical problems existing in the prior art. To this end, the present invention provides a hollow light guide tube with adjustable parameters.

[0004] The present invention also provides a photolithography system.

[0005] According to the first aspect of the present invention, a hollow light guide tube with adjustable parameters comprises a shell, a fixed mirror group, a movable mirror group and an adjustment mechanism, wherein the fixed mirror group comprises a first reflector and a second reflector arranged in the shell at intervals along the up-down direction; the movable mirror group comprises a third reflector and a fourth reflector arranged in the shell at intervals along the left-right direction, and the first reflector, the second reflector, the third reflector and the fourth reflector enclose a light guide cavity; the adjustment mechanism is arranged between the third reflector and the shell and / or between the fourth reflector and the shell, and the distance and angle between the third reflector and the fourth reflector can be adjusted by the adjustment mechanism.

[0006] The parameter-adjustable hollow light pipe according to the embodiment of the present invention has at least the following beneficial effects: the adjustment mechanism can adjust the distance and angle between the third reflector and the fourth reflector, thereby adjusting the size parameters and light output characteristics of the hollow light pipe to meet the parameter adjustment requirements of the exposure system.

[0007] According to some embodiments of the present invention, the adjustment mechanism includes a push-pull device disposed between an end portion of the third reflector and the housing and / or disposed between an end portion of the fourth reflector and the housing.

[0008] According to some embodiments of the present invention, the push-pull device is provided between both ends of the third reflector and the housing;

[0009] and / or,

[0010] The push-pull devices are arranged between both ends of the fourth reflector and the shell.

[0011] According to some embodiments of the present invention, the push-pull device is an electric telescopic rod.

[0012] According to some embodiments of the present invention, the adjustment mechanism further includes an elastic device disposed between an end of the third reflector and the shell and / or between an end of the fourth reflector and the shell, and the elastic device is configured correspondingly to the push-pull device.

[0013] According to some embodiments of the present invention, the elastic device is disposed between both ends of the third reflector and the housing;

[0014] and / or,

[0015] The elastic device is arranged between both ends of the fourth reflector and the shell.

[0016] According to some embodiments of the present invention, the elastic device is a tension spring.

[0017] According to some embodiments of the present invention, the first reflector and the second reflector are arranged in parallel, and the third reflector and the fourth reflector are movably arranged between the first reflector and the second reflector.

[0018] According to some embodiments of the present invention, the shell includes an upper fixed plate, a lower fixed plate, a left plate and a right plate, the first reflector and the second reflector are fixed to the upper fixed plate and the lower fixed plate respectively, the third reflector is connected to the left plate through the adjustment mechanism, and the fourth reflector is connected to the right plate through the adjustment mechanism.

[0019] The photolithography system according to the second aspect of the present invention comprises the parameter-adjustable hollow light pipe of any one of the embodiments of the first aspect of the present invention.

[0020] The photolithography system according to the embodiment of the present invention has at least the following beneficial effects: by changing the size parameters and light output characteristics of the hollow light pipe, the exposure parameters of the photolithography system can be adjusted to meet different usage requirements. BRIEF DESCRIPTION OF THE DRAWINGS

[0021] The above and / or additional aspects and advantages of the present invention will become apparent and easily understood from the description of the embodiments in conjunction with the following drawings, in which:

[0022] Figure 1 It is a schematic structural diagram of a hollow light guide tube with adjustable parameters according to an embodiment of the present invention;

[0023] Figure 2A schematic diagram of the internal structure of a hollow light guide tube with adjustable parameters according to an embodiment of the present invention;

[0024] Figure 3 A schematic diagram of the coordination of a fixed mirror assembly and a movable mirror assembly according to an embodiment of the present invention;

[0025] Figure 4 It is a front structural schematic diagram of a hollow light guide tube with adjustable parameters according to an embodiment of the present invention;

[0026] Figure 5 is a light path diagram of the movable mirror assembly when the third reflector and the fourth reflector are parallel to each other according to an embodiment of the present invention;

[0027] Figure 6 is a light path diagram of the fixed mirror assembly when the third reflector is parallel to the fourth reflector according to an embodiment of the present invention;

[0028] Figure 7 is a light path diagram of the movable mirror assembly when the third reflector and the fourth reflector are not parallel to each other according to an embodiment of the present invention;

[0029] Figure 8 is a light path diagram of the fixed mirror assembly when the third reflector and the fourth reflector are not parallel to each other according to an embodiment of the present invention;

[0030] Fig. 9 This is a schematic diagram of the structure of the exposure device.

[0031] Reference numerals:

[0032] Shell 100, upper fixing plate 110, lower fixing plate 120, left side plate 130, right side plate 140;

[0033] A first reflecting mirror 210 , a second reflecting mirror 220 , a third reflecting mirror 230 , and a fourth reflecting mirror 240 .

[0034] Push-pull device 310, elastic device 320;

[0035] Light source 1, coupling lens 2, adjustable light guide 3, illumination objective lens 4, digital micromirror 5, projection objective lens 6, exposure area 7. DETAILED DESCRIPTION

[0036] Embodiments of the present invention are described in detail below, examples of which are shown in the accompanying drawings, wherein the same or similar reference numerals throughout represent the same or similar elements or elements having the same or similar functions. The embodiments described below with reference to the accompanying drawings are exemplary and are only used to explain the present invention, and cannot be understood as limiting the present invention.

[0037] In the description of the present invention, it should be understood that descriptions involving orientations, such as up, down, front, back, left, right, etc., and orientations or positional relationships indicated are based on the orientations or positional relationships shown in the accompanying drawings, and are only for the convenience of describing the present invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore should not be understood as a limitation on the present invention.

[0038] In the description of the present invention, if there is a description of first and second, it is only for the purpose of distinguishing the technical features, and cannot be understood as indicating or implying the relative importance or implicitly indicating the number of the indicated technical features or implicitly indicating the order of the indicated technical features.

[0039] In the description of the present invention, unless otherwise clearly defined, terms such as setting, installing, connecting, etc. should be understood in a broad sense, and technicians in the relevant technical field can reasonably determine the specific meanings of the above terms in the present invention based on the specific content of the technical solution.

[0040] Reference below Figures 1 to 8 A hollow light pipe with adjustable parameters according to an embodiment of the present invention is described.

[0041] like Figures 1 to 4 As shown, a hollow light guide tube with adjustable parameters according to an embodiment of the present invention includes a shell 100, a fixed mirror group, a movable mirror group and an adjustment mechanism, wherein the fixed mirror group includes a first reflector 210 and a second reflector 220 spaced apart in the shell 100 along the up-down direction; the movable mirror group includes a third reflector 230 and a fourth reflector 240 spaced apart in the left-right direction of the shell 100, and the first reflector 210, the second reflector 220, the third reflector 230 and the fourth reflector 240 enclose a light guide cavity; the adjustment mechanism is disposed between the third reflector 230 and the shell 100 and / or between the fourth reflector 240 and the shell 100, and the distance and angle between the third reflector 230 and the fourth reflector 240 can be adjusted by the adjustment mechanism.

[0042] When used, the adjustment mechanism can adjust the distance and angle between the third reflector 230 and the fourth reflector 240 , thereby adjusting the size parameters and light output characteristics of the hollow light pipe.

[0043] Specifically, the opening size of the hollow light pipe and / or the divergence angle of the light can be adjusted according to actual needs, avoiding the disadvantages of multiple custom processing due to parameter adjustment and meeting the parameter adjustment requirements of the exposure system.

[0044] In some embodiments of the present invention, the adjustment mechanism is disposed between the third reflector 230 and the housing 100 , and can meet the adjustment requirements of the distance and angle between the third reflector 230 and the fourth reflector 240 .

[0045] In some embodiments of the present invention, the adjustment mechanism is disposed between the fourth reflector 240 and the housing 100 , and can meet the adjustment requirements of the distance and angle between the third reflector 230 and the fourth reflector 240 .

[0046] In some embodiments of the present invention, the adjustment mechanism is disposed between the third reflector 230 and the housing 100 and between the fourth reflector 240 and the housing 100 , which can meet the adjustment requirements of the distance and angle between the third reflector 230 and the fourth reflector 240 .

[0047] Specifically, the adjustment mechanism may be only provided on the third reflector 230 or the fourth reflector 240 ; or, the adjustment mechanism may be provided on both the third reflector 230 and the fourth reflector 240 , both of which can meet the adjustment requirements of the distance and angle between the third reflector 230 and the fourth reflector 240 .

[0048] like Figure 2 , Figure 4 As shown, in some embodiments of the present invention, the adjustment mechanism includes a push-pull device 310 disposed between an end of the third reflector 230 and the shell 100 and / or disposed between an end of the fourth reflector 240 and the shell 100. Through the push-pull action of the push-pull device 310, the third reflector 230 and the fourth reflector 240 are moved left and right, thereby meeting the adjustment requirements of the distance and angle between the third reflector 230 and the fourth reflector 240.

[0049] It is understandable that in some embodiments of the present invention, the adjustment mechanism may also be a rotation drive mechanism for driving the third reflector 230 and the fourth reflector 240 to rotate, and may also meet the position adjustment requirements of the third reflector 230 and the fourth reflector 240 .

[0050] like Figure 2 As shown, in some embodiments of the present invention, push-pull devices 310 are provided between both ends of the third reflector 230 and the housing 100 , and the position of the third reflector 230 is adjusted by pushing and pulling the two ends of the third reflector 230 .

[0051] Specifically, when the driving distances at both ends of the third reflector 230 are the same, the third reflector 230 translates to achieve the adjustment requirement of the distance between it and the fourth reflector 240; when the driving distances at both ends of the third reflector 230 are different, the third reflector 230 deflects to achieve the adjustment requirement of the angle between it and the fourth reflector 240.

[0052] like Figure 2 As shown, in some embodiments of the present invention, push-pull devices 310 are provided between both ends of the fourth reflector 240 and the housing 100 , and the position of the fourth reflector 240 is adjusted by pushing and pulling the two ends of the fourth reflector 240 .

[0053] Specifically, when the driving distances at both ends of the fourth reflector 240 are the same, the fourth reflector 240 translates to achieve the adjustment requirement of the distance between the fourth reflector 240 and the third reflector 230; when the driving distances at both ends of the fourth reflector 240 are different, the fourth reflector 240 deflects to achieve the adjustment requirement of the angle between the fourth reflector 240 and the third reflector 230.

[0054] like Figure 2 As shown, in some embodiments of the present invention, the push-pull device 310 is an electric telescopic rod, and the push-pull drive of the movable mirror group is achieved by the electric telescopic rod.

[0055] Specifically, the electric telescopic rod has a screw mechanism inside, which is driven by a servo motor or the like to achieve precise displacement control, thereby satisfying the precise adjustment of the light guide tube parameters.

[0056] It can be understood that in some embodiments of the present invention, the push-pull device 310 can also be a cylinder mechanism, a cam mechanism, a spur rack mechanism, etc., which will not be described in detail here.

[0057] like Figure 2 As shown, in some embodiments of the present invention, the adjustment mechanism also includes an elastic device 320 arranged between the end of the third reflector 230 and the shell 100 and / or between the end of the fourth reflector 240 and the shell 100, and the elastic device 320 is configured corresponding to the push-pull device 310 to improve the compactness of the transmission of the push-pull device 310 and improve the movement accuracy of the third reflector 230 and / or the fourth reflector 240.

[0058] like Figure 2 As shown, in some embodiments of the present invention, elastic devices 320 are provided between both ends of the third reflector 230 and the shell 100, and elastic tension is performed from both ends of the third reflector 230 to improve the compactness of the transmission between the third reflector 230 and the push-pull device 310, and improve the movement accuracy of the third reflector 230.

[0059] like Figure 2 As shown, in some embodiments of the present invention, elastic devices 320 are provided between both ends of the fourth reflector 240 and the shell 100, and elastic tension is performed from both ends of the fourth reflector 240 to improve the compactness of the transmission between the fourth reflector 240 and the push-pull device 310, and improve the movement accuracy of the fourth reflector 240.

[0060] like Figure 2 As shown, in some embodiments of the present invention, the elastic device 320 is a tension spring to generate tension between the third reflector 230 and the housing 100 and / or between the fourth reflector 240 and the housing 100, thereby improving the compactness of the structure.

[0061] It can be understood that in some embodiments of the present invention, the elastic device 320 is also a compression spring, a rubber band, a V-shaped metal plate, etc., which will not be described in detail here.

[0062] like Figures 2 to 4 As shown, in some embodiments of the present invention, the first reflector 210 is arranged in parallel with the second reflector 220, the third reflector 230 and the fourth reflector 240 are movably arranged between the first reflector 210 and the second reflector 220, the first reflector 210 and the second reflector 220 are arranged in parallel and the interval is equal to the height of the third reflector 230 and the fourth reflector 240, so that the third reflector 230 and the fourth reflector 240 will not affect the position of the first reflector 210 and the second reflector 220 when they are translated or deflected between the first reflector 210 and the second reflector 220. And a better sealing effect can be achieved to reduce the occurrence of light overflow.

[0063] like Figure 1 , Figure 2 and Figure 4 As shown, in some embodiments of the present invention, the shell 100 includes an upper fixing plate 110, a lower fixing plate 120, a left side plate 130 and a right side plate 140, the first reflector 210 and the second reflector 220 are respectively fixed to the upper fixing plate 110 and the lower fixing plate 120, the third reflector 230 is connected to the left side plate 130 through an adjustment mechanism, and the fourth reflector 240 is connected to the right side plate 140 through an adjustment mechanism, thereby meeting the installation and adjustment requirements of the reflectors and the adjustment mechanisms.

[0064] like Fig. 9 As shown, the exposure device consists of a light source 1, a coupling lens 2, an adjustable light pipe 3, an illumination objective lens 4, a digital micromirror 5 (Digital Micromirror Devices, DMD for short), a projection objective lens 6, and an exposure area 7. The light from the light source 1 passes through the coupling lens 2, the adjustable light pipe 3, the illumination objective lens 4, the digital micromirror 5, and the projection objective lens 6 in sequence, and is projected onto the exposure area 7.

[0065] like Figure 5 , Figure 6 As shown, by changing the retraction amount of the four push-pull devices 310, the size of the opening of the hollow light pipe can be enlarged or reduced, while ensuring that the third reflector 230 and the fourth reflector 240 are parallel, forming a rectangular light pipe, and the light emission angle remains unchanged, and the end surface of the light emission changes, such as the end surface of the light emission can be set to a full-field size, a half-field size, a 1 / 3 field size, etc., without changing the light beam emission angle.

[0066] like Figure 7 , Figure 8As shown, the push-pull devices 310 at both ends have different retraction amounts, so that the third reflector 230 and the fourth reflector 240 are not parallel, forming a T-shaped (trapezoidal) hollow light pipe, and the entrance and exit areas of the hollow light pipe are different. According to the optical etendue formula E = π·A·NA 2 , A is the area, the entrance and exit areas of the hollow light pipe are inconsistent, so the light emission angle will change.

[0067] In order to better understand the above technical solution, the above technical solution will be described in detail below in combination with specific implementation methods.

[0068] Implementation Case 1:

[0069] The exposure system is in full-field mode. The DMD (model 9500) used in the lithography machine has an effective area of ​​1920*1080 pixels (20.736mm*11.664mm), the illumination objective magnification is 2 times, the outlet size of the adjustable light guide is 10.368mm*5.832mm (full-field size), the opening size is adjusted, and the light output angle is kept unchanged, such as Figure 5 , Figure 6 Solution, adjust the retraction amount of the four push-pull devices 310 to ensure that the third reflector 230 and the fourth reflector 240 are parallel to form a rectangular light guide.

[0070] Implementation Case 2:

[0071] The exposure system is in half-field mode. The effective area of ​​the DMD (model 9500) used in the lithography machine is 1920*540 pixels (20.736mm*5.832mm). The magnification of the illumination objective lens is 2 times. The outlet size of the adjustable light guide 3 is 10.368mm*2.916mm (half-field size). The opening size is adjusted and the light output angle is kept unchanged. Figure 5 , Figure 6 Solution, adjust the retraction amount of the four push-pull devices 310 to ensure that the third reflector 230 and the fourth reflector 240 are parallel to form a rectangular light guide.

[0072] Implementation Case 3:

[0073] The exposure system is in 1 / 3 field mode. The effective area of ​​the DMD (model 9500) used in the lithography machine is 1920*336 pixels (20.736mm*3.629mm). The magnification of the illumination objective lens is 2 times. The outlet size of the adjustable light guide 3 is 10.368mm*1.815mm (1 / 3 field size). Adjust the opening size and ensure that the light angle remains unchanged, such as Figure 5 , Figure 6 Solution, adjust the retraction amount of the four push-pull devices 310 to ensure that the third reflector 230 and the fourth reflector 240 are parallel to form a rectangular light guide.

[0074] Implementation Case 4:

[0075] Use Figure 7 , Figure 8 In the adjustment scheme shown, the push-pull devices 310 at both ends have different retraction amounts, so that the third reflector 230 and the fourth reflector 240 are not parallel, forming a T-shaped (trapezoidal) hollow light pipe, and the entrance and exit of the hollow light pipe have different faces. According to the optical extension formula E = π·A·NA 2 , A is the area, the entrance and exit areas of the hollow light pipe are inconsistent, so the light emission angle will change.

[0076] The characteristic dimension CD (critical dimension) of the exposure analysis is given by the formula Determine that the depth of focus DOF ​​(DeptofFocus) of the exposure engine system is given by the formula The opening size is determined to meet the requirements of full field, half field, and 1 / 3 field in cases 1, 2, and 3. At the same time, the push-pull devices 310 at both ends are retracted by different amounts, so that the third reflector 230 and the fourth reflector 240 are not parallel, forming a T-shaped hollow light guide, such as Figure 7 As shown, the angle between the third reflector 230 and the fourth reflector 240 determines the NA of the emitted light. After the light beam passes through the projection objective 6, the NA of the light beam on the exposure area 7 is determined by the formula nuy=n′u′y′, that is, the CD and DOF are changed, thereby achieving adjustable exposure parameters.

[0077] According to the second aspect of the present invention, the lithography system includes a hollow light pipe with adjustable parameters according to any one of the first aspect of the present invention. By changing the size parameters and light output characteristics of the hollow light pipe, the exposure parameters of the lithography system are adjusted to meet different usage requirements.

[0078] Of course, the invention is not limited to the above-mentioned embodiments, and those skilled in the art may make equivalent modifications or substitutions without violating the spirit of the invention, and these equivalent modifications or substitutions are all included in the scope defined by the claims of this application.

Claims

1. A hollow light guide tube with adjustable parameters, characterized in that: include: Housing (100); A fixed mirror assembly, comprising a first reflecting mirror (210) and a second reflecting mirror (220) arranged on the housing (100) at intervals in the up-down direction; A movable mirror group, comprising a third reflector (230) and a fourth reflector (240) arranged at intervals on the housing (100) along the left-right direction, wherein the first reflector (210), the second reflector (220), the third reflector (230) and the fourth reflector (240) enclose a light guide cavity; An adjustment mechanism is provided between the third reflector (230) and the housing (100) and / or between the fourth reflector (240) and the housing (100), and the distance and angle between the third reflector (230) and the fourth reflector (240) can be adjusted by the adjustment mechanism.

2. The parameter-adjustable hollow light guide tube according to claim 1, characterized in that: The adjustment mechanism comprises a push-pull device (310) arranged between an end of the third reflector (230) and the housing (100) and / or arranged between an end of the fourth reflector (240) and the housing (100).

3. The parameter-adjustable hollow light guide tube according to claim 2, characterized in that: The push-pull device (310) is disposed between both ends of the third reflector (230) and the housing (100); and / or, The push-pull device (310) is disposed between both ends of the fourth reflector (240) and the housing (100).

4. The parameter-adjustable hollow light guide according to claim 2 or 3, characterized in that: The push-pull device (310) is an electric telescopic rod.

5. The parameter-adjustable hollow light guide tube according to claim 2, characterized in that: The adjustment mechanism also includes an elastic device (320) arranged between an end of the third reflector (230) and the shell (100) and / or between an end of the fourth reflector (240) and the shell (100), and the elastic device (320) is configured correspondingly to the push-pull device (310).

6. The parameter-adjustable hollow light guide tube according to claim 5, characterized in that: The elastic device (320) is disposed between both ends of the third reflector (230) and the housing (100); and / or, The elastic device (320) is disposed between both ends of the fourth reflector (240) and the housing (100).

7. The parameter-adjustable hollow light guide tube according to claim 5 or 6, characterized in that: The elastic device (320) is a tension spring.

8. The parameter-adjustable hollow light guide tube according to claim 1, characterized in that: The first reflector (210) and the second reflector (220) are arranged in parallel, and the third reflector (230) and the fourth reflector (240) are movably arranged between the first reflector (210) and the second reflector (220).

9. The parameter-adjustable hollow light guide according to claim 1 or 8, characterized in that: The shell (100) comprises an upper fixing plate (110), a lower fixing plate (120), a left side plate (130) and a right side plate (140); the first reflector (210) and the second reflector (220) are respectively fixed to the upper fixing plate (110) and the lower fixing plate (120); the third reflector (230) is connected to the left side plate (130) via the adjustment mechanism; and the fourth reflector (240) is connected to the right side plate (140) via the adjustment mechanism.

10. A photolithography system, characterized in that: include: A hollow light guide with adjustable parameters as claimed in any one of claims 1 to 9.

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