Air pressure adjusting system and substrate processing apparatus

Abstract

The invention discloses an air pressure adjusting system and a substrate processing apparatus. The air pressure adjusting system is used for adjusting air pressure in different process cavities in the substrate processing device, and comprises an exhaust pipeline connected with the process cavities; the air exhaust regulating valve is arranged on the air exhaust pipeline; the barometer is arranged on the exhaust pipeline and is positioned between the process cavity and the exhaust regulating valve; and the control part is in communication connection with the air exhaust adjusting valve and the barometer and is configured to control the opening degree of the air exhaust adjusting valve so as to adjust the air exhaust rate of the air exhaust pipeline, so that the air pressure detection value of the barometer is equal to a first air pressure preset value, and the air pressure in the process cavity is equal to a second air pressure preset value. By means of the scheme, the problem that in existing substrate processing equipment, due to air pressure fluctuation of the main exhaust pipeline, the air pressure in the process cavity is unstable is solved.

Description

Technical Field

[0001] The present invention relates to the field of semiconductor processing equipment, and further to a gas pressure regulating system and a substrate processing device. Background Art

[0002] Annealing is a common substrate processing process in the field of semiconductor processing. After the electroplating process is completed, the atoms on the surface of the substrate will have different lattice structures due to different current densities, which will affect electron migration. At this time, the rapid thermal annealing process can be performed on the substrate to achieve better electron migration ability through heat treatment at a sufficiently high temperature.

[0003] Usually, the substrate annealing device is equipped with multiple annealing chambers, and the multiple annealing chambers share a main exhaust duct. During the substrate annealing, the main exhaust duct extracts the gas in each annealing chamber at the same time, so that a certain negative pressure is maintained in the annealing chamber, so that the gas reduction ability and stability during the annealing process are optimized. However, due to the pressure fluctuations in the total exhaust, it is easy to cause the air pressure in the annealing chamber to be unstable, resulting in fluctuations in the exhaust rate of the annealing chamber, which in turn leads to uneven heat treatment on the surface of the substrate, unsatisfactory annealing effect on the surface of the substrate, and a single point of high or low reflectivity and a low overall average value after annealing. The existing regulating device for controlling the air pressure in the annealing chamber is manually adjusted, and cannot be adjusted in real time according to the exhaust pressure fluctuations. It lacks controllability, and the state of the machine is unstable, affecting the substrate yield. Summary of the invention

[0004] In view of the above technical problems, the present invention aims to solve the problem of unstable air pressure in the annealing chamber due to fluctuation of total exhaust air pressure in the existing substrate annealing device.

[0005] In order to achieve the above-mentioned object, the present invention provides a gas pressure regulating system and a substrate processing device.

[0006] In some embodiments, the air pressure regulating system proposed in the present invention is used to regulate the air pressure in different process chambers in a substrate processing device, including: an exhaust duct connected to the process chamber; an exhaust regulating valve arranged on the exhaust duct; a barometer arranged on the exhaust duct and located between the process chamber and the exhaust regulating valve; a control component, which is communicatively connected to the exhaust regulating valve and the barometer, and is configured to: control the opening of the exhaust regulating valve to adjust the exhaust rate of the process chamber, so that the air pressure detection value of the barometer is equal to the first air pressure preset value, and the air pressure in the process chamber is equal to the second air pressure preset value.

[0007] In some embodiments, the exhaust duct includes a main exhaust duct and several first ducts, the first ducts correspond to the process chambers one by one, the exhaust regulating valves include several first regulating valves, and the barometers include several first barometers; one end of each of the first ducts is connected to the main exhaust duct, and the other end is connected to the corresponding process chamber, each of the first regulating valves and each of the first barometers are respectively arranged on the corresponding first duct, and the first barometer is arranged between the first regulating valve and the process chamber for detecting the air pressure in the process chamber; the control component is communicatively connected with the first regulating valve and the first barometer, and is configured to: control the opening of the first regulating valve to adjust the exhaust rate of the process chamber so that the air pressure detection value of the first barometer is equal to the first air pressure preset value; wherein, the first air pressure preset value is equal to the second air pressure preset value.

[0008] In some embodiments, it also includes: a plurality of supplementary gas sources and a plurality of second pipelines, each of the supplementary gas sources is connected to the corresponding first pipeline through the corresponding second pipeline, and each of the second pipelines is respectively configured with a second regulating valve; the control component is also communicated with the second regulating valve, and is configured to: control the opening of the first regulating valve and the second regulating valve to adjust the exhaust rate of the process chamber, so that the air pressure detection value of the first barometer is equal to the first air pressure preset value, and the air pressure in the corresponding process chamber is equal to the second air pressure preset value.

[0009] In some embodiments, the exhaust duct also includes a plurality of auxiliary ducts, one end of each of the auxiliary ducts is connected to the first duct, and the other end is connected to the main exhaust duct, and each of the auxiliary ducts is respectively configured with a third regulating valve; the control component is also communicated with the third regulating valve, and is configured to: control the opening of the first regulating valve, the second regulating valve and the third regulating valve to adjust the exhaust rate of the process chamber, so that the air pressure detection value of the first barometer is equal to the first air pressure preset value, and the air pressure in the corresponding process chamber is equal to the second air pressure preset value.

[0010] In some embodiments, during system debugging, the control component controls the second regulating valve and the third regulating valve to be in a closed state, and controls the opening of the first regulating valve to adjust the exhaust rate of the process chamber so that the air pressure detection value of the first barometer is equal to the first air pressure preset value; during system operation, when the air pressure detection value of the first barometer is not equal to the first air pressure preset value, the opening of the first regulating valve is maintained unchanged, and the opening of the second regulating valve and the third regulating valve are controlled to adjust the exhaust rate of the process chamber so that the air pressure detection value of the first barometer is equal to the first air pressure preset value.

[0011] In some embodiments, the control component is further configured as follows: during operation of the system, when the air pressure detection value of the first barometer is lower than the first air pressure preset value, the control component adjusts the air supply rate of the second pipeline by controlling the opening of the corresponding second regulating valve, and restores the air pressure detection value of the first barometer to the first air pressure preset value; when the air pressure detection value of the first barometer is higher than the first air pressure preset value, the control component adjusts the exhaust rate of the auxiliary pipeline by controlling the opening of the corresponding third regulating valve, and restores the air pressure detection value of the first barometer to the first air pressure preset value.

[0012] In some embodiments, the exhaust duct includes a main exhaust duct and several first ducts, the first ducts correspond to the process chambers one by one, wherein one end of each of the first ducts is connected to the main exhaust duct, and the other end is connected to the corresponding process chamber; the exhaust regulating valve includes a fourth regulating valve arranged on the main exhaust duct, and the barometer includes a second barometer arranged on the main exhaust duct; the control component is configured to: control the opening of the fourth regulating valve so that the air pressure detection value of the second barometer is equal to the first air pressure preset value, and the air pressure in the process chamber is equal to the second air pressure preset value.

[0013] In some embodiments, a first regulating valve and a first pressure gauge are disposed on the first pipeline, and the first pressure gauge is located between the first regulating valve and the process chamber.

[0014] In some embodiments, the control component is further configured as follows: during system debugging, the control component controls the fourth regulating valve to be in a closed state, and controls the opening of the first regulating valve to adjust the exhaust rate of the process chamber so that the air pressure detection value of the first barometer is equal to the second air pressure preset value; during system operation, when the air pressure detection value of the second barometer is not equal to the first air pressure preset value, maintain the opening of the first regulating valve unchanged, and control the opening of the fourth regulating valve to adjust the exhaust rate of the process chamber so that the air pressure detection value of the second barometer is equal to the first air pressure preset value.

[0015] In some embodiments, the substrate processing apparatus includes the above-mentioned gas pressure regulating system and also includes a plurality of process chambers.

[0016] In some embodiments, the process chamber is an annealing chamber, and the second gas pressure preset value is -(8-12)Pa.

[0017] The air pressure regulating system of the present invention is provided with an exhaust pipeline, an exhaust regulating valve, a barometer and a control component, and the opening of the exhaust regulating valve is controlled by the control component to adjust the exhaust rate of the process chamber, so that the air pressure detection value of the barometer is equal to the first air pressure preset value, and the air pressure in the process chamber is equal to the second air pressure preset value, thereby realizing automatic adjustment of the exhaust rate of the exhaust pipeline, which is beneficial to the stability of the air pressure in the process chamber.

[0018] In addition, the present application also adds a second pipeline and an auxiliary pipeline to the first pipeline connecting each process chamber with the main exhaust pipeline, and connects to the supplementary air source through the second pipeline. It is used to supplement additional air pressure for extraction from the main exhaust pipeline when the air pressure in the main exhaust pipeline is too low, so as to avoid the air pressure in the process chamber being too low and the reaction gas in the process chamber being lost too quickly; the first pipeline is connected to the main exhaust pipeline through the auxiliary pipeline. It is used to increase the flow area between the process chamber and the main exhaust pipeline when the air pressure in the main exhaust pipeline is too high, increase the exhaust rate, and avoid the air pressure in the process chamber being too high and the reaction gas in the process chamber being discharged too slowly. In addition, by setting a fourth regulating valve and a second barometer in the total exhaust air pipeline, the second barometer is used to detect the air pressure of the total exhaust air pipeline. When the air pressure of the total exhaust air pipeline is too low, the opening of the fourth regulating valve is reduced to avoid the air pressure in the process chamber being too low, causing the reaction gas in the process chamber to be lost too quickly; when the air pressure in the total exhaust air pipeline is too high, the opening of the fourth regulating valve is increased to avoid the air pressure in the process chamber being too high, causing the reaction gas in the process chamber to be discharged too slowly. Through the above scheme, the present application makes the air pressure in the process chamber tend to be stable, thereby meeting the requirements of the substrate processing process. BRIEF DESCRIPTION OF THE DRAWINGS

[0019] The preferred implementation modes will be described below in a clear and understandable manner with reference to the accompanying drawings to further illustrate the above-mentioned characteristics, technical features, advantages and implementation methods of the present invention.

[0020] Figure 1 is a schematic diagram of an air pressure regulating system according to an embodiment of the present application;

[0021] Figure 2 is a schematic diagram of an air pressure regulating system in another embodiment of the present application;

[0022] Figure 3 This is a schematic diagram of an air pressure regulating system according to another embodiment of the present application. DETAILED DESCRIPTION

[0023] In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the specific implementation methods of the present invention will be described below with reference to the accompanying drawings. Obviously, the accompanying drawings described below are only some embodiments of the present invention. For ordinary technicians in this field, other drawings and other implementation methods can be obtained based on these drawings without creative work.

[0024] In order to simplify the drawings, only the parts related to the invention are schematically shown in each figure, and they do not represent the actual structure of the product. In addition, in order to simplify the drawings and facilitate understanding, in some figures, only one of the parts with the same structure or function is schematically drawn or marked. In this article, "one" not only means "only one", but also means "more than one".

[0025] In this document, it should be noted that, unless otherwise clearly specified and limited, the terms "installed", "connected", and "connected" should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection or an indirect connection through an intermediate medium, or it can be the internal communication of two components. For ordinary technicians in this field, the specific meanings of the above terms in the present invention can be understood according to specific circumstances.

[0026] In addition, in the description of the present application, the terms "first", "second", etc. are only used to distinguish the description and cannot be understood as indicating or implying relative importance.

[0027] like Figure 1 As shown, a gas pressure regulating system according to an embodiment of the present application is disclosed, which is used to regulate the gas pressure in different process chambers 610, 620, and 630 in a substrate processing device. The gas pressure regulating system includes an exhaust pipeline, an exhaust regulating valve, a barometer, and a control component 500.

[0028] The exhaust duct is connected to the process chambers 610, 620, and 630, and the exhaust regulating valve and the barometer are respectively arranged on the exhaust duct, and the barometer is located between the process chambers 610, 620, and 630 and the exhaust regulating valve. In addition, the control component 500 is connected to the exhaust regulating valve and the barometer for communication, and is configured to: control the opening of the exhaust regulating valve to adjust the exhaust rate of the exhaust duct, so that the air pressure detection value of the barometer is equal to the first air pressure preset value, and the air pressure in the process chambers 610, 620, and 630 is equal to the second air pressure preset value.

[0029] The air pressure regulating system of the present application can automatically adjust the exhaust rate of the exhaust pipeline, which is beneficial to the stability of the air pressure in the process chamber.

[0030] Preferably, the exhaust pipeline includes a main exhaust pipeline 100 and a plurality of first pipelines 211, 212, 213, the first pipelines 211, 212, 213 correspond to the process chambers 610, 620, 630 one by one, the exhaust regulating valve includes a plurality of first regulating valves 231, 232, 233, and the barometer includes a plurality of first barometers 221, 222, 223. Among them, one end of each first pipeline 211, 212, 213 is connected to the main exhaust pipeline 100, and the other end is connected to the corresponding process chamber 610, 620, 630, and each first regulating valve 231, 232, 233 and each first barometer 221, 222, 223 are respectively arranged on the corresponding first pipeline 211, 212, 213. Figure 1 In the example shown, each first pressure gauge 221, 222, 223 is located between the corresponding first regulating valve 231, 232, 233 and the corresponding process chamber 610, 620, 630, and can be used to detect the actual pressure in the corresponding process chamber 610, 620, 630. Therefore, in this example, the first pressure preset value of each first pressure gauge 221, 222, 223 is equal to the second pressure preset value of each process chamber 610, 620, 630.

[0031] Specifically, the control component 500 is configured to: control the opening of the first regulating valve 231, 232, 233 to adjust the exhaust rate of the process chamber 610, 620, 630. When the air pressure detection value of the first barometer 221, 222, 223 is lower than the first air pressure preset value, reduce the opening of the first regulating valve 231, 232, 233; when the air pressure detection value of the first barometer 221, 222, 223 is higher than the first air pressure preset value, increase the opening of the first regulating valve 231, 232, 233, and then make the air pressure detection value of the first barometer 221, 222, 223 equal to the first air pressure preset value, and make the air pressure of the process chamber 610, 620, 630 equal to the second air pressure preset value. It should be noted that if the first barometers 221, 222, 223 are not located between the corresponding first regulating valves 231, 232, 233 and the corresponding process chambers 610, 620, 630, the air pressure detection values ​​of the first barometers 221, 222, 223 may have a large deviation from the actual air pressure of the process chambers 610, 620, 630, resulting in the first air pressure preset values ​​of the first barometers 221, 222, 223 not being equal to the second air pressure preset values ​​of the process chambers 610, 620, 630. However, there is still a corresponding relationship between the first air pressure preset value and the second air pressure preset value, so the first barometers 221, 222, 223 can still be adjusted to maintain the second air pressure preset value of the process chambers 610, 620, 630.

[0032] Preferably, the air pressure regulating system also includes a plurality of supplementary gas sources 311, 312, 313 and a plurality of second pipelines 321, 322, 323, each supplementary gas source 311, 312, 313 is connected to the corresponding first pipeline 211, 212, 213 through the corresponding second pipeline 321, 322, 323, for conveying gas to the first pipeline 211, 212, 213, and each second pipeline 321, 322, 323 is respectively provided with a second regulating valve 331, 332, 333. The control component 500 is also communicatively connected with the second regulating valve 331, 332, 333, and is configured to: control the opening of the first regulating valve 231, 232, 233 and the second regulating valve 331, 332, 333 to adjust the exhaust rate of the process chamber 610, 620, 630, so that the air pressure detection value of the first barometer 221, 222, 223 is equal to the first air pressure preset value, and the air pressure in the corresponding process chamber 610, 620, 630 is equal to the second air pressure preset value.

[0033] Preferably, the exhaust pipeline further includes a plurality of auxiliary pipelines 411, 412, 413, one end of each auxiliary pipeline 411, 412, 413 is connected to the first pipeline 211, 212, 213, and the other end is connected to the main exhaust pipeline 100, so as to increase the flow area of ​​the first pipeline 211, 212, 213. A third regulating valve 421, 422, 423 is respectively provided on each auxiliary pipeline 411, 412, 413. The control component 500 is also communicated with the third regulating valve 421, 422, 423, and is configured to: control the opening of the first regulating valve 231, 232, 233, the second regulating valve 331, 332, 333 and the third regulating valve 421, 422, 423 to adjust the exhaust rate of each process chamber 610, 620, 630, so that the air pressure detection value of the first barometer 221, 222, 223 is equal to the first air pressure preset value, and the air pressure in the corresponding process chamber 610, 620, 630 is equal to the second air pressure preset value.

[0034] Preferably, the control component 500 is further configured as follows: during system debugging, the control component 500 controls the second regulating valve 331, 332, 333 and the third regulating valve 421, 422, 423 to be in a closed state, and controls the opening of the first regulating valve 231, 232, 233 to adjust the exhaust rate of the process chamber 610, 620, 630 so that the air pressure detection value of the first barometer 221, 222, 223 is equal to the first air pressure preset value; during system operation During this period, when the air pressure detection value of the first barometer 221, 222, 223 is not equal to the first air pressure preset value, the opening of the first regulating valve 231, 232, 233 is maintained unchanged, and the opening of the second regulating valve 331, 332, 333 and the third regulating valve 421, 422, 423 are controlled to adjust the exhaust rate of the process chamber 610, 620, 630 so that the air pressure detection value of the first barometer 221, 222, 223 is equal to the first air pressure preset value.

[0035] It should be noted that due to factors such as the length of the first pipelines 211, 212, 213 and processing errors, the pipe resistances in different first pipelines 211, 212, 213 may be different. Therefore, even if the air pressure in the total exhaust pipeline 100 is stable, the air pressures in each process chamber 610, 620, 630 may be inconsistent. Therefore, in order to eliminate the influence of the pipe resistance on each process chamber 610, 620, 630, the above control method is adopted, that is, during the system debugging, the air pressure in each process chamber 610, 620, 630 is kept consistent by adjusting the first regulating valve 231, 232, 233, and then during the system operation, i.e., the actual production link, the influence of the air pressure fluctuation of the total exhaust pipeline 100 on the process chamber 610, 620, 630 is eliminated by adjusting the opening of the second regulating valve 331, 332, 333 and the third regulating valve 421, 422, 423.

[0036] Preferably, the control component 500 is further configured to: during the operation of the above system, when the air pressure detection value of the first barometer 221, 222, 223 is lower than the first air pressure preset value, the control component 500 controls the opening of the corresponding second regulating valve 331, 332, 333 to adjust the air supply rate of the second pipeline 321, 322, 323, and restore the air pressure detection value of the first barometer 221, 222, 223 to the first air pressure preset value. When the air pressure detection value of the first barometer 221, 222, 223 is higher than the first air pressure preset value, the control component 500 controls the opening of the corresponding third regulating valve 421, 422, 423 to adjust the exhaust rate of the auxiliary pipeline 411, 412, 413, and restore the air pressure detection value of the first barometer 221, 222, 223 to the first air pressure preset value.

[0037] It should be noted that, in the drawings of the present application, only three process chambers 610, 620, 630 are shown. In actual applications, the number of process chambers 610, 620, 630 can be adjusted according to the size, production capacity or process requirements of the substrate processing equipment, and the preset value of the air pressure in the process chambers 610, 620, 630 needs to be set according to the actual process requirements, which can be either a negative pressure value or a positive pressure value.

[0038] like Figure 2 As shown, another air pressure regulating system according to an embodiment of the present application is disclosed. In this embodiment, the exhaust pipeline includes a main exhaust pipeline 100 and a plurality of first pipelines 211, 212, 213. The first pipelines 211, 212, 213 correspond to the process chambers 610, 620, 630 one by one, wherein one end of each first pipeline 211, 212, 213 is connected to the main exhaust pipeline 100, and the other end is connected to the corresponding process chamber 610, 620, 630. The exhaust regulating valve includes a fourth regulating valve 120 disposed on the main exhaust pipeline 100, and the barometer includes a second barometer 110 disposed on the main exhaust pipeline 100. The control component 500 is configured to: control the opening of the fourth regulating valve 120 so that the air pressure detection value of the second barometer 110 is equal to the first air pressure preset value, and the air pressure in the process chamber 610, 620, 630 is equal to the second air pressure preset value.

[0039] Specifically, the control component 500 is configured to: when the air pressure detection value of the second barometer 110 is equal to the first air pressure preset value, the control component 500 determines that the substrate processing apparatus is normally exhausted, and controls the opening of the fourth regulating valve 120 to remain unchanged. At this time, the air pressure detection value of the second barometer 110 is equal to the air pressure of the total exhaust pipeline 100, which is equal to the first air pressure preset value.

[0040] When the pressure detection value of the second barometer 110 is lower than the first pressure preset value, the control component 500 determines that the substrate processing device is abnormally exhausted, and controls the opening of the fourth regulating valve 120 to decrease, so that the pressure detection value is restored to the first pressure preset value, so as to avoid the pressure in the process chambers 610, 620, 630 being lower than the second pressure preset value, resulting in a faster extraction speed of the reaction gas in the process chambers 610, 620, 630.

[0041] When the air pressure detection value of the second barometer 110 is higher than the first air pressure preset value, the control component 500 determines that the substrate processing device is abnormally exhausted, and controls the opening of the fourth regulating valve 120 to increase so that the air pressure detection value is restored to the first air pressure preset value. Avoid the air pressure in the process chambers 610, 620, 630 being higher than the second air pressure preset value, resulting in a slower extraction speed of the reaction gas in the process chambers 610, 620, 630. In this embodiment, the fourth regulating valve 120 adjusts the air pressure of the total exhaust pipeline 100 to maintain the air pressure in each process chamber 610, 620, 630 connected to the total exhaust pipeline 100 stable. It should be noted that, in this embodiment, there is still a corresponding relationship between the first air pressure preset value and the second air pressure preset value. In actual applications, the opening of the fourth regulating valve 120 can be repeatedly adjusted until the air pressure value in the process chamber 610, 620, 630 reaches the second air pressure preset value. At this time, the air pressure detection value of the second barometer 110 can be recorded as the first air pressure preset value.

[0042] In addition, if Figure 3 As shown, in order to eliminate the influence of pipe resistance on the air pressure in the process chambers 610, 620, 630 during system debugging, a first regulating valve 231, 232, 233 and a first barometer 221, 222, 223 may be provided on the first pipeline 211, 212, 213, and the first barometer 221, 222, 223 may be located between the first regulating valve 231, 232, 233 and the process chambers 610, 620, 630, so that the air pressure detection value of the first barometer 221, 222, 223 is equal to the air pressure value in the process chambers 610, 620, 630.

[0043] Specifically, the control component 500 is configured to: during system debugging, control the opening of the first regulating valve 231, 232, 233 to adjust the exhaust rate of the process chambers 610, 620, 630, so that the air pressure detection value of the first barometer 221, 222, 223 is equal to the second air pressure preset value, that is, the air pressure in each process chamber 610, 620, 630 is equal to the second air pressure preset value. At this time, the detection value of the second barometer 110 set on the main exhaust duct 100 is the first air pressure preset value. During system operation, when the air pressure detection value of the second barometer 110 is not equal to the first air pressure preset value, the opening of the first regulating valves 231, 232, and 233 is maintained unchanged, and the opening of the fourth regulating valve 120 is controlled to adjust the exhaust rate of the process chambers 610, 620, and 630 so that the air pressure detection value of the second barometer 110 is equal to the first air pressure preset value. At this time, the air pressure detection value of the first barometers 221, 222, and 223 is restored to the second air pressure preset value.

[0044] The present application also discloses a substrate processing device, which includes the gas pressure regulating system in any of the above embodiments, and also includes a plurality of process chambers 610, 620, 630, wherein the process chambers 610, 620, 630 include but are not limited to annealing chambers. Figure 1 When the pressure regulating system shown in the figure, the optimal pressure value required by the substrate processing process in the annealing chamber, that is, the second preset pressure value, is equal to the first preset pressure value, which is -(8 to 12) Pa, preferably -10 Pa; when the substrate processing device includes Figure 2 or Figure 3 In the illustrated gas pressure regulating system, the first gas pressure preset value is -(130-150) Pa, preferably -140 Pa, and the optimal gas pressure value required by the substrate processing process in the annealing chamber, that is, the second gas pressure preset value is -(8-12) Pa, preferably -10 Pa. In this embodiment, the gas pressure regulating system can effectively eliminate the influence of the gas pressure fluctuation of the total exhaust pipe on the gas pressure in each annealing chamber, so as to maintain the gas pressure in each annealing chamber stable.

[0045] It should be noted that the above embodiments can be freely combined as needed. The above are only preferred embodiments of the present invention. For ordinary technicians in this technical field, several improvements and modifications can be made without departing from the principle of the present invention, and these improvements and modifications should also be regarded as the protection scope of the present invention.

Claims

1. A gas pressure regulating system for regulating the gas pressure in different process chambers of a substrate processing device, characterized in that: include: An exhaust pipeline connected to the process chamber; An exhaust regulating valve is arranged on the exhaust pipe; A barometer, arranged on the exhaust duct and located between the process chamber and the exhaust regulating valve; A control component is communicatively connected with the exhaust regulating valve and the barometer, and is configured to: control the opening of the exhaust regulating valve to adjust the exhaust rate of the process chamber, so that the air pressure detection value of the barometer is equal to the first air pressure preset value, and the air pressure in the process chamber is equal to the second air pressure preset value.

2. The air pressure regulating system according to claim 1, characterized in that: The exhaust pipeline includes a main exhaust pipeline and a plurality of first pipelines, the first pipelines correspond to the process chambers one by one, the exhaust regulating valve includes a plurality of first regulating valves, and the barometer includes a plurality of first barometers; One end of each of the first pipelines is connected to the main exhaust pipeline, and the other end is connected to the corresponding process chamber. Each of the first regulating valves and each of the first barometers are respectively arranged on the corresponding first pipelines. The first barometer is arranged between the first regulating valve and the process chamber to detect the air pressure of the process chamber. The control component is in communication with the first regulating valve and the first barometer, and is configured to: control the opening of the first regulating valve to adjust the exhaust rate of the process chamber so that the air pressure detection value of the first barometer is equal to the first air pressure preset value; Wherein, the first preset air pressure value is equal to the second preset air pressure value.

3. The air pressure regulating system according to claim 2, characterized in that: Also includes: A plurality of supplementary gas sources and a plurality of second pipelines, each of the supplementary gas sources is connected to the corresponding first pipeline through the corresponding second pipeline, and each of the second pipelines is respectively provided with a second regulating valve; The control component is also communicatively connected to the second regulating valve, and is configured to: control the opening of the first regulating valve and the second regulating valve to adjust the exhaust rate of the process chamber, so that the air pressure detection value of the first barometer is equal to the first air pressure preset value, and the air pressure in the corresponding process chamber is equal to the second air pressure preset value.

4. The air pressure regulating system according to claim 3, characterized in that: The exhaust pipeline further includes a plurality of auxiliary pipelines, one end of each of the auxiliary pipelines is connected to the first pipeline, and the other end is connected to the main exhaust pipeline, and each of the auxiliary pipelines is respectively provided with a third regulating valve; The control component is also communicatively connected with the third regulating valve, and is configured to: control the opening of the first regulating valve, the second regulating valve and the third regulating valve to adjust the exhaust rate of the process chamber, so that the air pressure detection value of the first barometer is equal to the first air pressure preset value, and the air pressure in the corresponding process chamber is equal to the second air pressure preset value.

5. The air pressure regulating system according to claim 4, characterized in that: The control component is also configured to: During system debugging, the control component controls the second regulating valve and the third regulating valve to be in a closed state, and controls the opening of the first regulating valve to adjust the exhaust rate of the process chamber so that the air pressure detection value of the first barometer is equal to the first air pressure preset value; During system operation, when the air pressure detection value of the first barometer is not equal to the first air pressure preset value, the opening of the first regulating valve is maintained unchanged, and the openings of the second regulating valve and the third regulating valve are controlled to adjust the exhaust rate of the process chamber so that the air pressure detection value of the first barometer is equal to the first air pressure preset value.

6. The air pressure regulating system according to claim 5, characterized in that: The control component is also configured to: During the operation of the system, when the air pressure detection value of the first barometer is lower than the first air pressure preset value, the control component adjusts the air supply rate of the second pipeline by controlling the opening of the corresponding second regulating valve, and restores the air pressure detection value of the first barometer to the first air pressure preset value; When the air pressure detection value of the first barometer is higher than the first air pressure preset value, the control component adjusts the exhaust rate of the auxiliary pipeline by controlling the opening of the corresponding third regulating valve, and restores the air pressure detection value of the first barometer to the first air pressure preset value.

7. The air pressure regulating system according to claim 1, characterized in that: The exhaust pipeline includes a main exhaust pipeline and a plurality of first pipelines, wherein the first pipelines correspond to the process chambers one by one, wherein one end of each of the first pipelines is connected to the main exhaust pipeline, and the other end is connected to the corresponding process chamber; The exhaust regulating valve includes a fourth regulating valve arranged on the main exhaust duct, and the barometer includes a second barometer arranged on the main exhaust duct; The control component is configured to control the opening of the fourth regulating valve so that the pressure detection value of the second barometer is equal to the first preset pressure value, and the pressure in the process chamber is equal to the second preset pressure value.

8. The air pressure regulating system according to claim 7, characterized in that: The first pipeline is provided with a first regulating valve and a first pressure gauge, and the first pressure gauge is located between the first regulating valve and the process chamber.

9. The air pressure regulating system according to claim 8, characterized in that: The control component is also configured to: During system debugging, the control component controls the opening of the first regulating valve to adjust the exhaust rate of the process chamber so that the air pressure detection value of the first barometer is equal to the second air pressure preset value; During system operation, when the air pressure detection value of the second barometer is not equal to the first air pressure preset value, the opening of the first regulating valve is maintained unchanged, and the opening of the fourth regulating valve is controlled to adjust the exhaust rate of the process chamber so that the air pressure detection value of the second barometer is equal to the first air pressure preset value.

10. A substrate processing device, characterized in that: It comprises the gas pressure regulating system as described in any one of claims 1 to 9, and also comprises a plurality of process chambers.

11. The substrate processing apparatus according to claim 10, wherein: The process chamber is an annealing chamber, and the second gas pressure preset value is -8Pa to -12Pa.

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