A vortex oscillation device

Abstract

The present invention discloses a vortex oscillation device, which belongs to the technical field of oscillation devices. The vortex oscillation device comprises: an oscillation component, comprising an oscillation platform, the oscillation platform can perform eccentric rotational motion; a heating component, arranged on the oscillation platform, the oscillation platform can drive the heating component to perform eccentric rotational motion, a cell culture plate for placing a sample can be placed on the heating component, and the heating component can heat the cell culture plate. The present invention can quickly complete the collection of sample DNA.

Description

Technical Field

[0001] The invention relates to the technical field of oscillation devices, and in particular to a vortex oscillation device. Background Art

[0002] When extracting DNA using the magnetic bead method or the silica bead method, a vortex oscillator is generally used to vortex the sample solution.

[0003] Taking the magnetic bead method for DNA extraction as an example, in the prior art, the collected sample is pre-processed and lysed to obtain a supernatant, a magnetic bead suspension is added to the supernatant, and a vortex shaker is used to vortex the supernatant to extract the DNA in the liquid.

[0004] In the prior art, the speed of vortex oscillation to disperse magnetic beads is slow, which affects the efficiency of DNA extraction.

[0005] Therefore, there is an urgent need for a vortex oscillation device to solve the above problems. Summary of the invention

[0006] The object of the present invention is to provide a vortex oscillation device to solve the technical problem in the prior art that the extraction speed of DNA is slow when the vortex oscillator is used to extract DNA.

[0007] As conceived above, the technical solution adopted by the present invention is:

[0008] A vortex oscillation device, comprising:

[0009] an oscillating assembly including an oscillating platform capable of eccentric rotational motion;

[0010] The heating component is arranged on the oscillating platform. The oscillating platform can drive the heating component to perform eccentric rotational motion. The cell culture plate for placing samples can be placed on the heating component. The heating component can heat the cell culture plate.

[0011] Optionally, the heating component comprises a heating plate, and the heating plate is capable of generating heat.

[0012] Optionally, the heating assembly further comprises a heat conducting plate, which is stacked on top of the heating plate, and the heat of the heating plate is transferred to the cell culture plate via the heat conducting plate.

[0013] Optionally, the heating component further includes a temperature controller to control the temperature of the heating component.

[0014] Optionally, the vortex oscillation device further comprises a fixed plate, the oscillation platform is arranged on the fixed plate and the oscillation platform can perform eccentric rotational motion relative to the fixed plate.

[0015] Optionally, a limiting column is provided on the fixing plate, and a first cylindrical cavity cooperating with the limiting column is provided on the lower surface of the oscillation platform.

[0016] Optionally, a buffer structure is provided between the oscillating platform and the fixing plate, so as to reduce noise between the oscillating platform and the fixing plate.

[0017] Optionally, the buffer structure includes:

[0018] A raised column, provided on the upper surface of the fixing plate;

[0019] The buffer ring is sleeved on the protruding column.

[0020] Optionally, a second cylindrical cavity cooperating with the buffer structure is provided on the lower surface of the oscillation platform, and when the oscillation platform is installed on the fixed plate, the buffer structure is located in the second cylindrical cavity and the buffer ring can elastically collide with the inner wall of the second cylindrical cavity.

[0021] Optionally, the oscillation component further comprises:

[0022] Driving parts;

[0023] An eccentric shaft has one end fixedly connected to the output end of the driving member, and the other end passes through the fixing plate and is connected to the oscillating platform. The eccentric shaft can drive the oscillating platform to perform eccentric rotational motion.

[0024] The vortex oscillation device proposed by the present invention has the following advantages:

[0025] When collecting DNA, the sample is placed on a cell culture plate, and the heating component heats the cell culture plate, thereby increasing the temperature of the sample. The oscillating platform drives the heating component to perform eccentric rotation, thereby driving the cell culture plate to perform vortex oscillation. The temperature increase can quickly disperse the magnetic beads or silica beads, speeding up the extraction of DNA. BRIEF DESCRIPTION OF THE DRAWINGS

[0026] Figure 1 is a schematic diagram of the vortex oscillation device provided by an embodiment of the present invention when in use;

[0027] Figure 2 is a cross-sectional schematic diagram of a portion of the internal structure of a vortex oscillation device provided in an embodiment of the present invention;

[0028] Figure 3 is a schematic structural diagram of the vortex oscillation device provided by an embodiment of the present invention with the limit block hidden;

[0029] Figure 4 is a schematic diagram of a viewing angle when the oscillating platform and the fixing plate provided by an embodiment of the present invention are not assembled;

[0030] Figure 5 is a schematic diagram of another viewing angle when the oscillating platform and the fixing plate provided by an embodiment of the present invention are not assembled;

[0031] Figure 6 is a schematic structural diagram of a limiting column provided in an embodiment of the present invention;

[0032] Figure 7 is a schematic structural diagram of an elastic buffer block provided by an embodiment of the present invention;

[0033] Figure 8 is a schematic structural diagram of an elastic buffer sheet provided by an embodiment of the present invention;

[0034] Fig. 9 It is a schematic diagram of the structure of an eccentric shaft provided in an embodiment of the present invention.

[0035] In the figure:

[0036] 1. Oscillation assembly; 11. Fixing plate; 111. Limiting column; 1111. First flange; 1112. Second flange; 12. Driving member; 13. Eccentric shaft; 131. First shaft portion; 132. Second shaft portion; 133. Third shaft portion; 134. Mounting cavity;

[0037] 2. Heating assembly; 21. Heating plate; 22. Heat conducting plate; 23. Temperature controller; 24. Heat insulating plate;

[0038] 3. Cell culture plate;

[0039] 4. Oscillating platform; 41. First cylindrical cavity; 42. Second cylindrical cavity; 43. Limiting block; 431. Elastic buffer block; 4311. Buffer housing; 4312. Elastic buffer sheet; 43121. First part; 43122. Second part; 43123. Third part;

[0040] 5. Buffer structure; 51. Protruding column; 52. Buffer ring;

[0041] 61. first bearing; 62. second bearing; 63. first bearing end cover; 64. first annular portion; 65. second annular portion;

[0042] 7. Connectors. DETAILED DESCRIPTION

[0043] In order to make the technical problems solved by the present invention, the technical solutions adopted and the technical effects achieved clearer, the technical solutions of the present invention are further described below in conjunction with the accompanying drawings and through specific implementation methods. It is understood that the specific embodiments described herein are only used to explain the present invention, rather than to limit the present invention. It should also be noted that, for the convenience of description, only the parts related to the present invention are shown in the accompanying drawings, not all.

[0044] In the description of the present invention, it should be noted that the terms "center", "up", "down", "left", "right", "vertical", "horizontal", "inside", "outside" and the like indicate positions or positional relationships based on the positions or positional relationships shown in the accompanying drawings, and are only for the convenience of describing the present invention and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as limiting the present invention. In addition, the terms "first" and "second" are used for descriptive purposes only, and cannot be understood as indicating or implying relative importance. Among them, the terms "first position" and "second position" are two different positions.

[0045] In the description of the present invention, it should be noted that, unless otherwise clearly specified and limited, the terms "installed", "connected", and "connected" should be understood in a broad sense, for example, it can be a fixed connection or a detachable connection; it can be a mechanical connection or an electrical connection; it can be a direct connection or an indirect connection through an intermediate medium, and it can be the internal communication of two components. For ordinary technicians in this field, the specific meanings of the above terms in the present invention can be understood according to specific circumstances.

[0046] This embodiment provides a vortex oscillation device, which can quickly disperse magnetic beads or silica beads to complete the extraction of sample DNA.

[0047] See also Figure 1-Figure 9 In this embodiment, the vortex oscillation device includes an oscillation component 1 and a heating component 2.

[0048] The oscillating assembly 1 includes an oscillating platform 4, which can perform eccentric rotational motion. The heating assembly 2 is arranged on the oscillating platform 4. The oscillating platform 4 can drive the heating assembly 2 to perform eccentric rotational motion, and a cell culture plate 3 for placing a sample can be placed on the heating assembly 2, and the heating assembly 2 can heat the cell culture plate 3.

[0049] The function of the cell culture plate 3 is to carry the sample to be collected. Optionally, in this embodiment, the cell culture plate 3 is a 96-well plate.

[0050] Specifically, in this embodiment, the heating assembly 2 includes a heating plate 21 and a heat conducting plate 22 .

[0051] The heating plate 21 is provided with a heating wire inside to generate heat. The heat conducting plate 22 is stacked on the heating plate 21, and the heat of the heating plate 21 is transferred to the cell culture plate 3 via the heat conducting plate 22. The setting of the heat conducting plate 22 can make the heat transfer more uniform, which is conducive to the rapid extraction of the sample DNA in the cell culture plate 3.

[0052] Optionally, the heating component 2 further includes a temperature controller 23 to control the temperature of the heating component 2. Of course, in other embodiments, the heating component 2 may also be provided with a temperature sensor to monitor the temperature of the heating component 2 in real time.

[0053] Specifically, in this embodiment, the thermostat 23 is electrically connected to the heating plate 21. The temperature sensor can be disposed on the heating plate 21 to monitor the temperature of the heating plate 21 in real time. The thermostat 23 is used to control the temperature of the heating plate 21.

[0054] Of course, in other embodiments, the temperature sensor may also be disposed on the heat conducting plate 22 to monitor the temperature of the heat conducting plate 22 in real time, so as to more accurately detect the temperature of the cell culture plate.

[0055] Furthermore, in order to prevent heat loss, in this embodiment, the heating assembly further includes a heat insulation board 24. Specifically, the heat insulation board 24 is disposed below the heating plate 21 to prevent heat loss and ensure the heating effect of the heating assembly 2 on the cell culture plate 3.

[0056] Furthermore, the vortex oscillation device also includes a fixed plate 11, and the oscillation platform 4 is arranged on the fixed plate 11 and the oscillation platform 4 can perform eccentric rotation relative to the fixed plate 11. When the vortex oscillation device is used, the fixed plate 11 can be fixed on the frame to provide a support platform for the vortex oscillation device. During operation, the oscillation platform 4 can perform eccentric rotation relative to the fixed plate 11, thereby realizing vortex oscillation of the cell culture plate 3.

[0057] Specifically, see Figure 4 and Figure 5 In this embodiment, a limiting column 111 is provided on the fixing plate 11, and a first cylindrical cavity 41 cooperating with the limiting column 111 is provided on the lower surface of the oscillating platform 4, and the limiting column 111 can swing in the first cylindrical cavity 41. When the oscillating platform 4 performs eccentric rotational motion, the limiting column 111 can limit the oscillating platform 4 to prevent the oscillating platform 4 from exceeding the limit position due to inertia.

[0058] Further, see Figure 6In this embodiment, the two ends of the limiting column 111 are respectively provided with a first flange 1111 and a second flange 1112, and a limiting column installation cavity is provided on the fixing plate 11, the lower half of the limiting column 111 is located in the limiting column installation cavity and the second flange 1112 is clamped in the second flange clamping groove in the limiting column installation cavity, and the upper half of the limiting column 111 is located in the first cylindrical cavity 41, and the diameter of the first cylindrical cavity 41 is greater than the diameter of the second flange 1112, so as to ensure that the limiting column 111 can swing in the first cylindrical cavity 41. At the same time, the provision of the second flange 1112 enables the upper end of the limiting column 111 to be more stably abutted against the oscillation platform 4, so as to ensure the stability of the movement of the oscillation platform 4.

[0059] Preferably, two limiting posts 111 are respectively disposed at the four corners of the fixing plate 11. When the oscillating platform 4 oscillates at a high speed, the limiting posts 111 located at the four corners can limit the oscillating platform 4 at various positions.

[0060] Furthermore, in order to reduce the noise between the oscillating platform 4 and the fixing plate 11 , a buffer structure 5 is provided between the oscillating platform 4 and the fixing plate 11 .

[0061] See also Figure 4 The buffer structure 5 includes a protruding column 51 and a buffer ring 52. The protruding column 51 is arranged on the upper surface of the fixing plate 11, and the buffer ring 52 is sleeved on the protruding column 51.

[0062] Specifically, the buffer ring 52 is made of a flexible buffer material, such as silicone or rubber.

[0063] See also Figure 5 The lower surface of the oscillation platform 4 is provided with a second cylindrical cavity 42 that cooperates with the buffer structure 5. When the oscillation platform 4 is installed on the fixed plate 11, the buffer structure 5 is located in the second cylindrical cavity 42 and the buffer ring 52 can elastically collide with the inner wall of the second cylindrical cavity 42, thereby reducing the collision force and reducing noise.

[0064] Furthermore, in order to prevent the heating component 2 and the cell culture plate 3 from detaching from the oscillation platform 4 during the oscillation process, in the present embodiment, a limit block 43 is provided at each of the four corners of the oscillation platform 4, and each limit block 43 abuts against the side wall of the heating component 2 and the cell culture plate 3. The four limit blocks 43 clamp the heating component 2 and the cell culture plate 3, so that the relative positions of the heating component 2 and the cell culture plate 3 and the oscillation platform 4 are fixed, thereby further ensuring the oscillation effect.

[0065] Specifically, the limit block 43 is in a right angle shape, and includes a first limit portion and a second limit portion that are perpendicular to each other. In order to prevent the cell culture plate 3 from being damaged by excessive collision force with the limit block 43 during the oscillation process, an elastic buffer block 431 is also provided on the limit block 43 to buffer the collision between the cell culture plate 3 and the limit block 43. The elastic buffer block 431 is located on the inner side of the limit block 43 to buffer the collision between the cell culture plate 3 and the limit block 43 during the oscillation process.

[0066] See also Figure 7 and Figure 8 Specifically, in this embodiment, the elastic buffer block 431 includes a buffer shell 4311 and an elastic buffer sheet 4312 clamped inside the buffer shell 4311.

[0067] Specifically, the elastic buffer sheet 4312 is made of spring steel, and includes a first portion 43121, a second portion 43122, and a third portion 43123 connected in sequence. The first portion 43121 and the third portion 43123 are arranged at opposite ends of the second portion 43122, and are arranged at an obtuse angle to the second portion 43122. The first portion 43121 and the third portion 43123 both extend toward the direction close to the cell culture plate 3. The ends of the first portion 43121 and the third portion 43123 away from the second portion 43122 are both provided with hooks to engage with the buffer housing 4311.

[0068] The second portion 43122 is provided with a connecting hole, and a bolt or a screw passes through the connecting hole to connect with the limiting block 43 .

[0069] Preferably, in this embodiment, an elastic buffer block 431 is respectively provided on the first limiting portion and the second limiting portion, so as to limit the two adjacent sides of the cell culture plate 3 .

[0070] Furthermore, the oscillation assembly 1 also includes a driving member 12 and an eccentric shaft 13: one end of the eccentric shaft 13 is fixedly connected to the output end of the driving member 12, and the other end passes through the fixed plate 11 and is fixedly connected to the oscillation platform 4. The eccentric shaft 13 can drive the oscillation platform 4 to perform eccentric rotational motion.

[0071] Optionally, the driving member 12 is a servo motor, which can ensure the oscillation frequency and oscillation stability.

[0072] Specifically, see Figure 2 and Fig. 9 In order to enable the eccentric shaft 13 to drive the oscillation platform 11 to oscillate circumferentially when rotating, the eccentric shaft 13 includes a first shaft portion 131, a second shaft portion 132 and a third shaft portion 133, and the axes of the first shaft portion 131, the second shaft portion 132 and the third shaft portion 133 do not overlap.

[0073] The eccentric shaft 13 is provided with a mounting cavity 134 for fixedly connecting with the output shaft of the driving member 12. The mounting cavity 134 passes through the first shaft portion 131 from the end face of the first shaft portion 131 and extends to the second shaft portion 132. The axis of the mounting cavity 134 does not coincide with the axis of the third shaft portion 133, thereby forming an eccentric shaft structure. The output shaft of the driving member 12 is fixedly arranged in the mounting cavity 134. When the output shaft of the driving member 12 rotates, the driving member 12 drives the eccentric shaft 13 to rotate around the axis of the mounting cavity 134. Because the axis of the mounting cavity 134 does not coincide with the axis of the third shaft portion 133, the third shaft portion 133 undergoes eccentric rotational motion. A connecting hole is provided at the center of the oscillating platform 4. The third shaft portion 133 is sleeved in the connecting hole, driving the oscillating platform 4 to undergo eccentric rotational motion.

[0074] Specifically, the third shaft portion 133 of the eccentric shaft 13 is sleeved with the oscillation platform 4 to drive the oscillation platform 4 to perform eccentric rotation. In order to ensure the stability and smoothness of the rotation of the eccentric shaft 13, a second bearing 62 is sleeved on the third shaft portion 133. The upper end of the third shaft portion 133 is provided with a second bearing end cover that cooperates with the second bearing 62. It should be noted that the upper surface of the second bearing end cover needs to be in the same plane as the upper surface of the oscillation platform 4 so that the heating component 2 can be stably placed. The second bearing end cover can be fixed to the third shaft portion 133 by screws or bolts.

[0075] The first shaft portion 131 and the second shaft portion 132 of the eccentric shaft 13 both pass through the fixing plate 11 and can rotate relative to the fixing plate 11 around the axis of the mounting cavity 134 .

[0076] Specifically, a first annular portion 64 and a second annular portion 65 are sleeved between the first bearing 61 and the second bearing 62 on the eccentric shaft 13. The upper end of the first bearing 61 abuts against the lower surface of the first annular portion 64, and the lower end of the second bearing 62 abuts against the upper surface of the second annular portion 65.

[0077] The first annular portion 64 and the second annular portion 65 can limit the two bearings and also facilitate the installation of the eccentric shaft 13 .

[0078] The eccentric shaft 13 is mounted on the fixing plate 11 through the first annular portion 64 and the second annular portion 65. Specifically, the fixing plate 11 is provided with an eccentric shaft mounting hole, and the cross section of the eccentric shaft mounting hole is "T"-shaped, including a large hole end and a small hole end. The first annular portion 64 and the second annular portion 65 are located in the large hole end and are fixedly connected to the fixing plate 11 by bolts. The first bearing 61 is located in the small hole end.

[0079] The arrangement of the first bearing 61 and the second bearing 62 makes the rotation of the eccentric shaft 13 more stable and smooth.

[0080] At the same time, in order to facilitate fixing the fixing plate 11 to the support frame of the vortex oscillation device, connecting pieces 7 are provided on opposite sides of the fixing plate 11. The fixing plate 11 can be fixedly connected to the support frame through two connecting pieces 7 to ensure that the vortex oscillation device can work normally.

[0081] Optionally, weight-reducing holes may be provided on the fixing plate 11 .

[0082] When collecting DNA, the driving member 12 is started, and the oscillating platform 4 begins to perform eccentric rotational motion, thereby driving the heating component 2 to also perform eccentric rotational motion, i.e., vortex oscillation. At the same time, the heating component 2 also heats the collected sample, quickly vibrates the magnetic beads or silica beads, and completes the DNA collection.

[0083] The above embodiments are only to illustrate the basic principles and characteristics of the present invention. The present invention is not limited by the above embodiments. Without departing from the spirit and scope of the present invention, the present invention may be subject to various changes and modifications, which are within the scope of the present invention. The scope of protection of the present invention is defined by the attached claims and their equivalents.

Claims

1. A vortex oscillation device, characterized in that: include: An oscillating assembly (1) comprises an oscillating platform (4), wherein the oscillating platform (4) is capable of performing eccentric rotational motion; A heating component (2) is arranged on the oscillating platform (4), the oscillating platform (4) can drive the heating component (2) to perform eccentric rotational motion, a cell culture plate (3) for placing a sample can be placed on the heating component (2), and the heating component (2) can heat the cell culture plate (3); The vortex oscillation device further comprises a fixed plate (11), the oscillation platform (4) being arranged on the fixed plate (11), and the oscillation platform (4) being capable of performing eccentric rotational motion relative to the fixed plate (11); The fixing plate (11) is provided with a limiting column (111), and the lower surface of the oscillating platform (4) is provided with a first cylindrical cavity (41) that cooperates with the limiting column (111); A buffer structure (5) is provided between the oscillating platform (4) and the fixing plate (11), which can reduce noise between the oscillating platform (4) and the fixing plate (11); A limit block (43) is provided at each of the four corners of the oscillating platform (4), and each of the limit blocks (43) abuts against the side walls of the heating component (2) and the cell culture plate (3). The four limit blocks (43) clamp the heating component (2) and the cell culture plate (3).

2. The vortex oscillation device according to claim 1, characterized in that: The heating component (2) comprises a heating plate (21), and the heating plate (21) is capable of generating heat.

3. The vortex oscillation device according to claim 2, characterized in that: The heating component (2) further comprises a heat conducting plate (22), wherein the heat conducting plate (22) is stacked above the heating plate (21), and the heat of the heating plate (21) is transferred to the cell culture plate (3) via the heat conducting plate (22).

4. The vortex oscillation device according to claim 1, characterized in that: The heating component (2) further comprises a temperature controller (23) for controlling the temperature of the heating component (2).

5. The vortex oscillation device according to claim 1, characterized in that: The buffer structure (5) comprises: A raised column (51) is provided on the upper surface of the fixing plate (11); The buffer ring (52) is sleeved on the protruding column (51).

6. The vortex oscillation device according to claim 5, characterized in that: The lower surface of the oscillating platform (4) is provided with a second cylindrical cavity (42) cooperating with the buffer structure (5); when the oscillating platform (4) is mounted on the fixing plate (11), the buffer structure (5) is located in the second cylindrical cavity (42) and the buffer ring (52) is capable of elastically colliding with the inner wall of the second cylindrical cavity (42).

7. The vortex oscillation device according to claim 1, characterized in that: The oscillating component (1) further comprises: A driving member (12); An eccentric shaft (13) has one end fixedly connected to the output end of the driving member (12), and the other end passes through the fixing plate (11) and is connected to the oscillating platform (4); the eccentric shaft (13) can drive the oscillating platform (4) to perform eccentric rotational motion.

Images