Large field of view ultra-high spatial resolution X-ray submicroscopic imaging device and imaging method

Abstract

The present invention discloses a large-field-of-view ultra-high spatial resolution X-ray submicroscopic imaging device, which mainly includes: a square-hole microchannel plate, an X-ray imaging detector, an optical theodolite, and a half-reflecting half-mirror. The X-ray microfocus to be measured is placed on the inner side of the spherical square hole array structure of the square-hole microchannel plate, and the X-ray detector is placed on the outer side of the spherical square hole array structure of the square-hole microchannel plate, and the centers of the three are on the same X-ray optical axis. The optical theodolite and the half-reflecting half-mirror are located on one side of the X-ray optical axis for measuring the object distance S and the image distance F. The submicroscopic imaging method includes: equipment assembly, adjustment of the object distance and the image distance, and X-ray microscopic imaging. The device and method of the present invention combine microchannel X-ray optics and geometric spherical imaging optics to achieve microscopic magnification of the X-ray microfocus signal and image to be measured, and can accurately obtain high-definition submicroscopic imaging accuracy information and results of the object, which has broad application prospects in X-ray submicroscopic imaging.

Description

Technical Field

[0001] The present invention belongs to the field of X-ray imaging, and in particular relates to a large-field-of-view ultra-high spatial resolution X-ray submicroscopic imaging device, and a large-field-of-view ultra-high spatial resolution X-ray submicroscopic imaging method based on the device. Background Art

[0002] Over the years, people have developed a variety of X-ray imaging technologies. For example, X-ray contact imaging technology, X-ray scanning imaging technology, X-ray grating imaging technology, X-ray coaxial imaging technology (X-ray holography), X-ray diffraction enhancement technology, X-ray interferometry imaging technology and X-ray CT technology. Spatial resolution is the most important indicator for determining image clarity. However, the spatial resolution of these imaging technologies is very low, generally depending on the resolution of the detector or recording medium, and only reaches microns. Since the discovery of X-rays more than 100 years ago, improving the resolution of X-ray submicroscopes has always been an important goal pursued by X-ray submicroscopy researchers.

[0003] However, due to the lack of high-performance high-resolution imaging optical components, the potential of X-ray high-resolution imaging has not been fully realized for a long time, and accurate X-ray imaging cannot be achieved in nuclear fission, nuclear fusion simulation experiments and other super-resolution requirements. At present, the mainstream microscopic imaging systems are based on high-resolution X-ray submicroscopy using zone plates, but there are two problems. On the one hand, the diffraction efficiency of X-rays is relatively low, and the low-brightness X-ray tube is not enough to produce a strong enough large-angle diffraction signal carrying high-resolution information; on the other hand, due to the lack of appropriate optical components, accurate ray focusing cannot be achieved in experiments.

[0004] Therefore, it is urgent to design an X-ray submicroscopic imaging device with a large field of view and ultra-high spatial resolution to realize X-ray submicroscopic imaging. Summary of the invention

[0005] To achieve this object, the present invention provides a high-resolution X-ray submicroscopic imaging device based on a square-hole microchannel plate. The device combines microchannel X-ray optics and spherical geometric optics to achieve micro-focus enlargement and improve spatial resolution, providing a new technical means for X-ray submicroscopic imaging systems.

[0006] A large-field-of-view ultra-high spatial resolution X-ray submicroscopic imaging device comprises: a square-hole microchannel plate and an X-ray imaging detector; the square-hole microchannel plate is a spherical square-hole array structure, and the X-ray imaging detector is coaxial with the center of the spherical square-hole array structure and is located outside the sphere.

[0007] Optionally, the spherical curvature radius of the square hole microchannel is 100 mm to 2000 mm, the square hole size is 1 μm to 10 μm, and the hole wall thickness is 0.1 μm to 2 μm.

[0008] Optionally, the X-ray imaging detector may be a CCD type X-ray imaging detector, with a single pixel size of 1 μm to 5 μm, for improving the imaging resolution of the imaging device.

[0009] Optionally, the large-field-of-view ultra-high spatial resolution X-ray sub-microscopic imaging device also includes an optical theodolite and a half-reflecting, half-mirror lens; the half-reflecting, half-mirror lens and the optical theodolite are placed together on the side of the line connecting the center of the square hole microchannel plate and the X-ray imaging detector, and are used to measure the image distance and object distance of the large-field-of-view ultra-high spatial resolution X-ray sub-microscopic imaging device.

[0010] A large-field-of-view ultra-high spatial resolution X-ray submicroscopic imaging method, the X-ray submicroscopic imaging method is based on a large-field-of-view ultra-high spatial resolution X-ray submicroscopic imaging device; the imaging steps are as follows:

[0011] S10 sequentially arranges the X-ray microfocus to be measured, the center of the square hole microchannel plate, and the X-ray imaging detector on the same straight line to construct the X-ray optical axis, requiring the X-ray imaging detector to be located outside the spherical surface of the square hole microchannel plate; arranges the optical theodolite and the half-reflecting half-mirror on one side of the X-ray optical axis, requiring the visible light axis in the half-reflecting half-mirror to be perpendicular to the X-ray optical axis;

[0012] S20 adjusts the object distance S and the image distance F according to the imaging conditions, wherein the object distance S is the distance between the X-ray microfocus to be measured and the square-hole microchannel plate, and the image distance F is the distance between the square-hole microchannel plate and the X-ray imaging detector;

[0013] After the object distance S and the image distance F are adjusted in step S30, the X-ray imaging detector completes imaging of the X-ray microfocus to be measured and completes the measurement.

[0014] Optionally, the focal spot diameter of the X-ray microfocus to be measured is less than 10 μm, and the X-ray energy range is 1 keV to 20 keV.

[0015] Optionally, the object distance S should satisfy that the transmission of X-rays emitted by the X-ray microfocus to be measured on the inner wall of the square hole satisfies total reflection.

[0016] Optionally, the object distance S is: 0<S<R / 2, and the image distance F is: F=RS / (R-2S), wherein R is the spherical curvature radius of the square hole microchannel plate.

[0017] Optionally, the magnification MF of the large-field-of-view ultra-high spatial resolution X-ray submicroscopic imaging method is: F / S.

[0018] The submicroscopic imaging device and imaging method have the following beneficial effects: (1) by combining microchannel X-ray optics and geometric spherical imaging optics, X-ray submicroscopic imaging can be realized; (2) the device has strong anti-interference ability, a large dynamic range and a simple device structure, and the submicron-level high-resolution image imaging is clear, which is helpful for image analysis and rapid measurement of the signal to be measured. BRIEF DESCRIPTION OF THE DRAWINGS

[0019] The drawings are not intended to be drawn to scale. In the drawings, each identical or nearly identical component shown in various figures may be represented by the same reference numeral. For clarity, not every component is labeled in every figure. Embodiments of various aspects of the present invention will now be described by way of example and with reference to the accompanying drawings, in which:

[0020] Figure 1 A schematic diagram of a large-field-of-view ultra-high spatial resolution X-ray submicroscopic imaging device according to the present invention;

[0021] Figure 2 It is a schematic structural diagram of a square hole microchannel plate of the present invention;

[0022] Figure 3 Schematic diagram of total reflection of X-rays in the microchannel plate of the present invention Figure 1 ;

[0023] Figure 4 Schematic diagram of total reflection of X-rays in the microchannel plate of the present invention Figure 2 ;

[0024] Figure 5 The X-ray micro-focus image to be measured in the present invention;

[0025] Figure 6 Collecting magnified images for the X-ray detector of the present invention;

[0026] In the figure: 1. X-ray microfocus to be measured, 2. Square hole microchannel plate, 3. X-ray detector, 4. Optical theodolite, 5. Half-reflecting half-mirror, 6. X-rays emitted by the X-ray microfocus to be measured, 7. X-rays collected by the X-ray detector, 8. Visible light axis, 9. X-ray optical axis. DETAILED DESCRIPTION

[0027] In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the accompanying drawings required for use in the description of the embodiments will be briefly introduced below. Obviously, the accompanying drawings described below are only some embodiments of the present invention. For ordinary technicians in this field, other accompanying drawings can be obtained based on these accompanying drawings without any creative labor.

[0028] In order to make the purpose, technical solutions and advantages of the present invention more clear, the following is a detailed description of the present invention in combination with the specific implementation methods and Figure 1 to Figure 6 , the present invention is described in further detail.

[0029] Example 1

[0030] In order to better understand the technical content of the present invention, specific embodiments are given and described as follows in conjunction with the accompanying drawings.

[0031] Various aspects of the present invention are described in this disclosure with reference to the accompanying drawings, in which many illustrative embodiments are shown. The embodiments of the present disclosure are not necessarily intended to include all aspects of the present invention. It should be understood that the various concepts and embodiments introduced above, as well as those described in more detail below, can be implemented in any of many ways, because the concepts and embodiments disclosed by the present invention are not limited to any implementation. In addition, some aspects disclosed by the present invention can be used alone or in any appropriate combination with other aspects disclosed by the present invention.

[0032] like Figure 1 As shown in the figure, it is a schematic diagram of the large-field-of-view ultra-high spatial resolution X-ray submicroscopic imaging device of the present invention. The large-field-of-view ultra-high spatial resolution X-ray submicroscopic imaging device of the present invention mainly comprises: a square-hole microchannel plate 2 and an X-ray imaging detector 3. The square-hole microchannel plate is designed as a spherical square-hole array structure, which can achieve imaging without aberration. The spherical curvature radius is 100mm to 2000mm, and the curvature radius in this embodiment is 600mm. The entire spherical square-hole array structure is as shown in FIG. Figure 2 As shown, it contains n×n square holes. The size of each square hole is 1μm to 10μm, and the hole wall thickness is 0.1μm to 2μm. In this embodiment, the square hole size is 2μm, the hole wall thickness is 1μm, and the overall size of the square hole microchannel plate 2 is 42.5mm×42.5mm. In order to improve the imaging resolution of the imaging device, the size of a single pixel of the X-ray imaging detector 3 is 1μm to 5μm. In this embodiment, the X-ray imaging detector 3 uses a CCD type X-ray imaging detector CCD imaging detector, the pixel size is 1μm, and the pixel size of the detector is 3000×3000.

[0033] The X-ray microfocus 1 to be measured is located on the inner side of the spherical structure of the square hole microchannel plate 2, and the X-ray microfocus 1 to be measured, the center of the square hole microchannel plate 2, and the X-ray imaging detector 3 are arranged on the same straight line to form an X-ray optical axis 9.

[0034] In order to facilitate the adjustment of the object distance S and the image distance F during the imaging process, the large-field-of-view ultra-high spatial resolution X-ray sub-microscopic imaging device also includes an optical theodolite 4 and a half-reflecting half-mirror 5; the optical theodolite 4 and the half-reflecting half-mirror 5 are placed together on the side of the line connecting the center of the square hole microchannel plate and the X-ray imaging detector, that is, on the side of the X-ray optical axis 9.

[0035] The steps for performing submicroscopic imaging are as follows:

[0036] S10 sequentially arranges the X-ray microfocus 1 to be measured, the center of the square hole microchannel plate 2, and the X-ray imaging detector 3 on the same straight line to construct the X-ray optical axis, requiring the X-ray imaging detector 3 to be located outside the spherical surface of the square hole microchannel plate 2; arranges the optical theodolite 4 and the half-reflecting half-mirror 5 on one side of the X-ray optical axis, requiring the visible light axis in the half-reflecting half-mirror 5 to be perpendicular to the X-ray optical axis;

[0037] S20 adjusts the object distance S and the image distance F according to the imaging conditions, wherein the object distance S is the distance between the X-ray microfocus 1 to be measured and the square hole microchannel plate 2, and the image distance F is the distance between the square hole microchannel plate 2 and the X-ray imaging detector 3;

[0038] After the object distance S and the image distance F are adjusted in step S30, the X-ray imaging detector 3 completes imaging of the X-ray microfocus 1 to be measured and completes the measurement.

[0039] The whole measurement process: the X-ray light 6 emitted by the light source of the X-ray microfocus 1 to be measured passes through the spherical array structure in the microchannel plate 2, such as Figure 3 and Figure 4 It shows that the X-ray light 6 realizes grazing-in total reflection in the square hole in the spherical array structure, and the reflected X-ray light 7 is collected by the X-ray detector 3 to realize X-ray imaging. That is, the object distance S should satisfy the transmission of the X-ray emitted by the X-ray microfocus 1 to be measured on the inner wall of the square hole to satisfy total reflection. The object distance S has a value range of: 0<S<R / 2, then the image distance F is; F=RS / (R-2S), where R is the spherical curvature radius of the square hole microchannel plate. The magnification MF of the large-field-of-view ultra-high spatial resolution X-ray sub-microscopic imaging device or imaging method is: F / S.

[0040] In order to demonstrate the microscopic imaging effect of the device and facilitate the identification and comparison of subsequent image enlargement, an irregular X-ray microfocus 1 to be tested is used, such as Figure 5As shown, the minimum size of the X-ray microfocus 1 to be tested is 1 pixel, 300 nm. The semi-reflective and semi-mirror 5 is placed 300 mm away from the square hole microchannel plate and 500 mm below the X-ray optical axis. The optical theodolite is placed 200 mm away from the semi-reflective and semi-mirror for testing the object distance and the image distance. The X-ray microfocus 1 to be tested is placed at a distance of 273.5 mm from the square hole microchannel plate 2 for emitting X-rays, where 273.5 mm is the object distance S, and the X-rays here are the X-rays 6 emitted by the X-ray microfocus to be tested. The X-ray detector 3 is placed at a position of 3343 mm outside the spherical surface of the square hole microchannel plate 2 for collecting X-rays, where 3343 mm is the image distance 3343 mm, and the X-rays collected here are the X-rays 7 collected by the X-ray detector. Figure 6 As shown in the figure, the X-ray signal of the X-ray microfocus 1 to be measured passes through the above device, and the minimum size is 1 pixel, 300nm imaging is clear, and the pixel resolution is better than 500nm, which has broad application prospects in the field of X-ray microscopic imaging in the future.

[0041] In order to give full play to the advantages of the present device, the focal spot diameter of the X-ray microfocus 1 to be measured should generally be less than 10 μm, and the X-ray energy range should be 1 keV to 20 keV to avoid excessive energy and X-ray penetration of the square hole microchannel material; if the energy is too small, higher-order reflections will be generated, resulting in blurred microscopic imaging.

[0042] Although the present invention has been disclosed as above with preferred embodiments, it is not intended to limit the present invention. A person with ordinary knowledge in the technical field to which the present invention belongs may make various changes and modifications without departing from the spirit and scope of the present invention. Therefore, the protection scope of the present invention shall be determined by the definition of the claims.

Claims

1. A large-field-of-view ultra-high spatial resolution X-ray submicroscopic imaging device, characterized in that: The submicroscopic imaging device comprises: a square hole microchannel plate and an X-ray imaging detector; the square hole microchannel plate is a spherical square hole array structure, the X-ray imaging detector is coaxial with the center of the spherical square hole array structure and is located outside the sphere, the spherical curvature radius of the square hole microchannel is 100mm-2000mm, the square hole size is 1μm-10μm, and the hole wall thickness is 0.1μm-2μm, the X-ray imaging detector can be a CCD type X-ray imaging detector, the size of a single pixel is 1μm-5μm, which is used to improve the imaging resolution of the imaging device, and the large field of view ultra-high spatial resolution X-ray submicroscopic imaging device also includes an optical theodolite and a half-reflecting half-mirror; the half-reflecting half-mirror and the optical theodolite are placed together on the side of the line connecting the center of the square hole microchannel plate and the X-ray imaging detector, and are used to measure the image distance and object distance of the large field of view ultra-high spatial resolution X-ray submicroscopic imaging device.

2. A method for large-field-of-view ultra-high spatial resolution X-ray submicroscopic imaging based on the large-field-of-view ultra-high spatial resolution X-ray submicroscopic imaging device of claim 1, wherein the specific steps are as follows: S10 sequentially arranges the X-ray microfocus to be measured, the center of the square hole microchannel plate, and the X-ray imaging detector on the same straight line to construct the X-ray optical axis, requiring the X-ray imaging detector to be located outside the spherical surface of the square hole microchannel plate; arranges the optical theodolite and the half-reflecting half-mirror on one side of the X-ray optical axis, requiring the visible light axis in the half-reflecting half-mirror to be perpendicular to the X-ray optical axis; S20 adjusts the object distance S and the image distance F according to the imaging conditions, wherein the object distance S is the distance between the X-ray microfocus to be measured and the square-hole microchannel plate, and the image distance F is the distance between the square-hole microchannel plate and the X-ray imaging detector; After the object distance S and the image distance F are adjusted in step S30, the X-ray imaging detector completes imaging of the X-ray microfocus to be measured and completes the measurement.

3. The large-field-of-view ultra-high spatial resolution X-ray submicroscopic imaging method according to claim 2, characterized in that: The focal spot diameter of the light source of the X-ray micro-focus to be measured is less than 10 μm, and the X-ray energy range is 1 keV to 20 keV.

4. The large-field-of-view ultra-high spatial resolution X-ray submicroscopic imaging method according to claim 2, characterized in that: The object distance S should satisfy that the transmission of X-rays emitted by the X-ray microfocus to be measured on the inner wall of the square hole satisfies total reflection.

5. The large-field-of-view ultra-high spatial resolution X-ray submicroscopic imaging method according to claim 2, characterized in that: The object distance S is: 0<S<R / 2, and the image distance F is: F=RS / (R-2S), wherein R is the spherical curvature radius of the square hole microchannel plate.

6. The large-field-of-view ultra-high spatial resolution X-ray submicroscopic imaging method according to claim 2, characterized in that: The magnification MF of the large-field-of-view ultra-high spatial resolution X-ray submicroscopic imaging method is: F / S.

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