A multi-material facial controllable millimeter scale lens and a preparation method thereof

Abstract

The application discloses a multi-material surface controllable millimeter scale lens and a preparation method thereof, and belongs to the technical field of laser micro-nano machining. Two ion beams are obliquely incident on the surface of a hard material sample, the sample is fixed on a sample holder and uniformly rotates at a certain speed, and a very smooth millimeter scale lens can be obtained after etching for a period of time. The millimeter scale lens has excellent stability and surface quality, and is very suitable for being used as a template to transcribe a millimeter scale convex lens. In a word, the application can efficiently etch a smooth, uniform and surface controllable millimeter scale lens on the surface of various hard materials through the method of oblique incidence of two ion beams, and to some extent, solves the problems of difficult surface morphology control, poor surface quality, low preparation efficiency and complex preparation process during the preparation of the millimeter scale lens.

Description

Technical Field

[0001] This invention belongs to the field of laser micro-nano fabrication technology, specifically relating to an efficient fabrication method for millimeter-scale concave lenses with controllable surface shapes on the surfaces of different hard materials using ion beam etching technology. By converging two ion beams and obliquely incident them onto the surfaces of different hard materials, uniform and controllable millimeter-scale concave lenses can be efficiently etched and fabricated. Background Technology

[0002] With the advancement of science and technology, the development trend of modern optical systems is miniaturization and integration, which requires the size of optical systems to shrink from the centimeter scale to the millimeter and micrometer scale. Millimeter-scale lenses and micron-scale microlenses, as extremely important fundamental components in modern integrated optical devices, have received extensive research from researchers. Lens surface types can generally be simply divided into spherical and aspherical surfaces. The mathematical expression for a commonly used axisymmetric aspherical surface type is: The Y-axis represents the system's optical axis, x represents the abscissa of each point in the system, c represents the curvature at the lens vertex, and k represents the conic coefficient of the aspherical surface, a key parameter determining the lens shape. Based on different values ​​of the conic coefficient k, the surface shape can be classified into five types: hyperboloid, paraboloid, elliptical, circular, and horizontally flattened elliptical. Besides the common spherical surface shape, various aspherical lenses possess unique advantages. For example, hyperboloid lenses are mainly used in reflection and telescope systems, paraboloid lenses are mainly used in off-axis telescope systems, and elliptical lenses are mainly used in laser collimation instruments. Currently, many methods for fabricating microlenses have been developed, such as photolithography, nanoimprinting, and etching-assisted femtosecond laser processing. However, these methods face difficulties, even impossibilities, when applied to millimeter-scale lenses. Fabricating millimeter-scale lenses that meet the requirements of optical systems on various hard material surfaces also faces challenges such as difficulty in controlling surface morphology, poor surface quality, low fabrication efficiency, and complex fabrication processes.

[0003] The mainstream methods for fabricating millimeter-scale lenses can be broadly categorized as follows:

[0004] I. Microfabrication methods such as injection molding: Injection molding refers to the use of pressure to press colloid into a template to prepare a structure. It is simple to use and the efficiency can be guaranteed. However, the difficulty in preparing the template, the poor surface quality, and the inapplicability to rigid materials limit its use.

[0005] II. Precision machining methods such as diamond turning: Diamond turning refers to the use of diamond tools to turn optical parts at a single point to produce optical parts that meet optical quality requirements. The surface shape is basically controllable and it is more suitable for machining non-metallic materials with low hardness. However, issues such as machining efficiency and the quality of the machined surface restrict the popularization of this technology.

[0006] III. Processing methods such as direct ion beam etching: Ion beam etching refers to the direct use of high-energy ion beams to bombard the sample surface, causing material atoms to sputter and achieve the purpose of etching. It has high preparation precision and good surface quality. However, ion beams are currently generally used for vertical bombardment etching of micron-scale microlenses. Theoretically, increasing the etching time can also etch spherical lenses, but the etching efficiency is very low and the lens shape is difficult to control. Summary of the Invention

[0007] To address the shortcomings of existing technologies, the technical problem this invention aims to solve is to provide an efficient method for fabricating millimeter-scale lenses with controllable multi-material surface profiles. Two ion beams are used to bombard the surface of a hard material sample at an oblique incidence. The sample is fixed on a sample holder and rotated uniformly at a certain speed. After etching for a period of time, a very smooth millimeter-scale lens can be obtained. Compared to traditional perpendicular ion beam incidence, the oblique incidence method can significantly improve the etching efficiency of the ion beam. The ion beam achieves the highest etching efficiency when the angle between the ion beam and the sample is approximately 10°-20°, meaning that oblique incidence significantly improves efficiency compared to perpendicular incidence. However, at this point, the oblique incidence of the ion beam causes uneven energy distribution on the sample surface. The energy density per unit area near the ion source is higher than that further away, leading to uneven or even non-uniform lens morphology after efficient etching. To address this, two ion beams can be used simultaneously on the same area, resolving the issue of varying energy from a single beam depending on the sample surface position, thus solving the lens morphology unevenness caused by oblique incidence. Alternatively, the two ion beams can be used separately, by adjusting the height of the sample holder to control their positions. When there is a certain misalignment in the XY plane, the etching effect is similar. The pits etched by the two ion beams will eventually merge into one to form the millimeter-scale lens with controllable surface shape prepared by this invention. If the sample holder height is adjusted upward in advance, the left and right parts of the lens surface shape will be determined by the left and right halves of the pits etched by the left and right ion beam sources, respectively. If the sample holder height is adjusted downward in advance, the left and right parts of the lens surface shape will be determined by the right and left halves of the pits etched by the left and right ion beam sources, respectively. In short, the synergistic effect of the two ion beams can relatively easily control the surface shape of the final lens, such as etching a hyperboloid lens. Compared to a single ion beam, using two obliquely incident ion beams further improves etching efficiency. The uniform rotation of the sample holder at a certain speed also results in a more uniform lens morphology. Furthermore, since ion beam etching is a purely physical bombardment process, it can be performed on various hard materials, albeit with varying efficiencies. In addition, the millimeter-scale lens provided by this invention, due to its excellent stability and surface quality, is very suitable as a template for transcribing millimeter-scale convex lenses. In summary, this invention, through the method of two obliquely incident ion beams, can efficiently etch smooth, uniform, and controllable millimeter-scale lenses onto the surfaces of various hard materials, to a certain extent solving problems such as difficulty in controlling surface morphology, poor surface quality, low fabrication efficiency, and complex fabrication processes in millimeter-scale lens preparation.

[0008] This invention is achieved through the following technical solution:

[0009] A method for fabricating a multi-material, controllable millimeter-scale lens includes the following steps:

[0010] Step 1: Sample preparation;

[0011] The substrate to be processed was wiped with cotton balls soaked in acetone solution and ethanol solution in turn, then rinsed with deionized water and dried in a low temperature oven. The purpose was to remove the contaminants remaining on the substrate surface. The substrate was then taken out for use, and the sample preparation was completed.

[0012] Step 2: Millimeter-scale lenses are fabricated using oblique incidence etching with two ion beams;

[0013] First, the prepared sample is fixed on the sample holder, and a vacuum is drawn to remove the influence of air. Two ion beams are used for etching at an oblique incidence. Before etching, the height of the sample holder is first adjusted to the ion beam convergence position, and then the height of the sample holder is adjusted up or down so that the two ion beams do not converge completely on the surface of the substrate to be processed, or that they are separated to some extent after convergence. The sample holder rotates at a constant speed during etching. After etching is completed, the sample is removed, and the millimeter-level lens is prepared.

[0014] Furthermore, the substrate to be processed in step one, due to the lack of material selectivity in ion beam etching, includes, but is not limited to, transparent hard optical materials such as fused silica, sapphire, and diamond; the size of the substrate is 3mm-20mm, the thickness is 100μm-1mm, and the temperature of the low-temperature oven is set to 50℃-100℃.

[0015] Furthermore, in step two, the ion beam is generated by ionized argon gas, the instrument's operating voltage is 0.1-6kV, the etching time is 0-100 hours, the incident angle of the two ion beams is 0-10°, the focusing degree of the ion beam is 0-100%, and the sample holder that fixes the sample rotates in a 360° uniform rotation or swings back and forth within a specific angle range, with a rotation speed of 1-6 revolutions per minute.

[0016] Furthermore, to control the spatial position of the ion beam in order to adjust the surface shape of the millimeter-level lens, the height of the sample holder is adjusted upwards or downwards by 10μm-1000μm. Combined with different ion beam etching parameters, such as incident angle and focusing degree, the experimentally obtained lens surface shape is expressed using a mathematical expression for an axisymmetric aspherical surface shape. The fitting is performed, where c is the curvature at the vertex of the lens, c<0.001; k is the conic coefficient of the aspherical surface, the value of k determines the surface shape distribution of the aspherical surface, k<-1, the aspherical surface is hyperboloid.

[0017] Furthermore, in step two, two ion beams are obliquely incident at a symmetrical angle, or three or more ion beams can be used for etching to obtain a similar millimeter-scale lens structure.

[0018] Compared with the prior art, the advantages of the present invention are as follows:

[0019] (1) Compared with micro-machining methods such as injection molding, the biggest advantage of this invention is that it can prepare millimeter-scale lenses with good surface quality on the surface of different hard materials, and can be used as templates to mass-produce millimeter-scale lenses.

[0020] (2) Compared with precision machining methods such as diamond turning, the present invention can prepare millimeter-scale lenses on various hard materials, such as diamond surfaces, thereby improving the processing efficiency and ensuring good lens surface quality, which can directly meet the requirements of optical systems.

[0021] (3) Compared with processing methods such as direct ion beam etching, the main advantage of this invention is that the processing method is improved. The method of using two ion beams to be obliquely incident can balance efficiency and uniformity, greatly improve the efficiency of direct ion beam etching, and can prepare millimeter-scale lenses with controllable surface shape. Attached Figure Description

[0022] Figure 1 This is a schematic diagram of the oblique incidence etching process of the two ion beams of the present invention;

[0023] Figure 2 Schematic diagram illustrating how to adjust the lens surface shape by controlling the height of the sample holder;

[0024] Figure 3 This is a schematic diagram illustrating the uneven energy distribution in the incident region caused by the oblique incidence of the ion beam in this invention, and the improved uniform energy distribution.

[0025] Figure 4 This is a schematic diagram illustrating the method of fabricating a surface-controllable lens by adjusting the height and position of two ion beams to create a certain misalignment in the XY plane.

[0026] Figure 5 The image shows the three-dimensional morphology and cross-sectional curve of the millimeter-scale lens prepared on the surface of fused silica according to the present invention.

[0027] Figure a shows the three-dimensional topography; Figure b shows the cross-sectional curve.

[0028] Figure 6 The image shows the three-dimensional topography and cross-sectional curve of the millimeter-scale lens fabricated on the surface of sapphire according to the present invention.

[0029] Figure a shows the three-dimensional topography; Figure b shows the cross-sectional curve. Detailed Implementation

[0030] To clearly and completely describe the technical solution and its specific working process of the present invention, the specific embodiments of the present invention are as follows, in conjunction with the accompanying drawings:

[0031] Example 1

[0032] In this embodiment, a hyperboloid millimeter-scale lens is fabricated on the surface of fused silica by oblique incidence etching with two ion beams.

[0033] Depend on Figure 1 As shown, two ion beams, I1 and I2, are incident at a certain angle and converge onto the surface of the quartz sample. The sample S is fixed on the sample holder T, which rotates uniformly at a certain speed.

[0034] An efficient method for fabricating a millimeter-scale hyperboloid lens with a quartz surface, comprising the following steps:

[0035] (1) Sample preparation;

[0036] Wipe the quartz sample to be processed in turn with cotton balls soaked in acetone solution and ethanol solution. Hold the cotton ball with tweezers and wipe along the quartz surface in the same direction. Then rinse with deionized water and dry in a low temperature oven at 50 degrees Celsius to remove the contaminants remaining on the sample surface. Then take out the quartz sample for later use. The sample preparation is complete.

[0037] (2) High-efficiency fabrication of hyperboloid millimeter-scale lenses by oblique incidence etching using two ion beams;

[0038] First, the quartz sample is fixed to the sample holder with silver paste. A vacuum is drawn to remove the influence of air. The system is set to work with two ion beams, both of which are incident at a 10° angle. The etching voltage is 6kV, the etching time is 10h, the ion beam focusing degree is 50%, and the sample holder rotation speed is 3 revolutions per minute.

[0039] like Figure 1 As shown, using two ion beams incident at an oblique angle can balance etching efficiency and etching uniformity. Compared with the case where the angle between the ion beam and the sample is 90°, i.e., perpendicular incident, the etching efficiency is highest when the angle between the ion beam and the sample is 10-20°. This invention selects the ion beam to be incident at a 10° angle, which greatly improves the efficiency of ion beam etching.

[0040] like Figure 2 As shown, before etching, the height of the sample holder is reduced by 300 micrometers from the height Z0 (i.e., the ion beam convergence position) automatically measured by the instrument to a height Z. -The two ion beams converge in the XY plane and then separate to a certain extent. The left and right halves of the millimeter-scale lens surface are determined by the right and left halves of the pits etched by the left and right ion beam sources, respectively. By adjusting parameters such as the incident angle of a single ion beam source, the surface shape of the pits etched by the single ion beam can be freely adjusted, thereby controlling the final surface shape of the millimeter-scale lens. In this way, the present invention can control the final lens surface shape relatively simply through the synergistic effect of two ion beams, such as the hyperboloid lens obtained in this embodiment. Compared with the inability to freely adjust the lens surface shape when the ion beam is incident perpendicularly, the present invention can more conveniently adjust the lens surface shape by oblique incidence and control of the spatial position of the ion beam.

[0041] like Figure 3 As shown, the ion beam source of ion beam I1 is located on the left side of the sample, and the ion beam source of ion beam I2 is located on the right side of the sample. When these two ion beams are simultaneously obliquely incident on the sample, at the same moment, the ion beam spot, which should be circularly distributed, will be slightly elongated into an elliptical distribution, and its energy distribution will also change accordingly. Specifically, the energy of ion beam I1 is higher on the left and lower on the right, while the energy of ion beam I2 is higher on the right and lower on the left. While pursuing efficiency, single-beam oblique incident etching can also cause uneven etching. This invention solves this problem by using two symmetrically distributed ion beams. The energies of the two ion beam spots are superimposed, which makes the energy distribution of the ion beam spot used for etching uniform. The problem of uneven etching or incomplete etching of lenses caused by pursuing efficiency with two ion beams can be solved by using two ion beams. At the same time, two ion beams can further increase the etching efficiency compared to a single beam. Compared with injection molding and diamond turning, this invention also achieves a breakthrough in hard materials and has good surface quality, which can directly meet the requirements of optical systems. That is, this invention can achieve efficient and uniform fabrication of millimeter-scale lenses.

[0042] like Figure 4As shown, if the height of the sample holder is reduced by 300 micrometers from the height automatically measured by the instrument (i.e., the ion beam convergence position) before etching, the purpose is to ensure that the two obliquely incident ion beams are separated to a certain extent in the XY plane. If the z-axis position of the sample is too high or too low, it will result in the inability to etch a complete lens, or even make it look as if the two ion beams have each etched a pit similar to a concave lens, as shown by L1 and L2 in the figure. However, if the position of the two ion beams irradiating the sample surface is precisely controlled, i.e., the method of reducing the sample holder by 300 micrometers adopted in this invention, this is to modify the surface shape of the millimeter-scale lens. If the millimeter-scale lenses L1 and L2 etched by the two ion beams are superimposed in spatial position, they can be combined to etch the final hyperboloid lens L1+L2, with the left half of the lens coming from lens L2 and the right half from lens L1. Through this method, compared with vertical ion beam etching, this invention can precisely control the surface shape of the etched millimeter-scale lens.

[0043] like Figure 5 As shown, after etching, the morphology of the millimeter-scale lens was characterized using a super depth-of-field three-dimensional microscopic observation system. The lens has an opening diameter of approximately 2500 micrometers and a depth of approximately 40 micrometers. Figure 5 The three-dimensional topography of a and Figure 5 The cross-sectional curve of b shows that its surface is very smooth, which can directly meet the requirements of optical systems; Figure 5 The cross-sectional coordinates of the lens shown in b are fitted using the mathematical expression for an axisymmetric aspherical surface. The fitting yields a vertex curvature c = 0.0008748 and a conic coefficient k = -738, confirming that its surface shape is hyperboloid. Thus, this invention achieves a balance between efficiency and uniformity through the oblique incidence of two ion beams, and controls the final lens shape by adjusting the positions of the two ion beams on the sample surface, efficiently fabricating uniform and smooth hyperboloid millimeter-scale lenses on fused silica surfaces.

[0044] Example 2

[0045] In this embodiment, a hyperboloid millimeter-scale lens is fabricated on the sapphire surface by obliquely incident etching with two ion beams.

[0046] Depend on Figure 1 As shown, two ion beams, I1 and I2, are incident at a certain angle and converge onto the surface of the sapphire sample. The sample S is fixed on the sample holder T, which rotates uniformly at a certain speed.

[0047] An efficient method for fabricating millimeter-scale hyperboloid lenses on sapphire surfaces, comprising the following specific steps:

[0048] (1) Sample preparation;

[0049] Same as Example 1;

[0050] (2) High-efficiency fabrication of hyperboloid millimeter-scale lenses by oblique incidence etching using two ion beams;

[0051] First, the sapphire sample is fixed to the sample holder with silver paste. A vacuum is drawn to remove the influence of air. The system is set to work with two ion beams, both of which are incident at a 10° angle. The etching voltage is 6kV, the etching time is 20h, the ion beam focusing degree is 50%, and the sample holder rotation speed is 3 revolutions per minute.

[0052] like Figure 1 As shown, using two ion beams incident at an oblique angle can balance etching efficiency and etching uniformity. Compared with the case where the angle between the ion beam and the sample is 90°, i.e., perpendicular incident, the etching efficiency is highest when the angle between the ion beam and the sample is 10-20°. This invention selects the ion beam to be incident at a 10° angle, which greatly improves the efficiency of ion beam etching.

[0053] like Figure 2 As shown, before etching, the height of the sample holder is reduced by 300 micrometers from the height Z0 (i.e., the ion beam convergence position) automatically measured by the instrument to a height Z. - The two ion beams converge in the XY plane and then separate to a certain extent. The left and right halves of the millimeter-scale lens surface are determined by the right and left halves of the pits etched by the left and right ion beam sources, respectively. By adjusting parameters such as the incident angle of a single ion beam source, the surface shape of the pits etched by the single ion beam can be freely adjusted, thereby controlling the final surface shape of the millimeter-scale lens. In this way, the present invention can control the final lens surface shape relatively simply through the synergistic effect of two ion beams, such as the hyperboloid lens obtained in this embodiment. Compared with the inability to freely adjust the lens surface shape when the ion beam is incident perpendicularly, the present invention can more conveniently adjust the lens surface shape by oblique incidence and control of the spatial position of the ion beam.

[0054] like Figure 3As shown, the ion beam source of ion beam I1 is located on the left side of the sample, and the ion beam source of ion beam I2 is located on the right side of the sample. When these two ion beams are simultaneously obliquely incident on the sample, at the same moment, the ion beam spot, which should be circularly distributed, will be slightly elongated into an elliptical distribution, and its energy distribution will also change accordingly. Specifically, the energy of ion beam I1 is higher on the left and lower on the right, while the energy of ion beam I2 is higher on the right and lower on the left. While pursuing efficiency, single-beam oblique incident etching can also cause uneven etching. This invention solves this problem by using two symmetrically distributed ion beams. The energies of the two ion beam spots are superimposed, which makes the energy distribution of the ion beam spot used for etching uniform. The problem of uneven etching or incomplete etching of lenses caused by pursuing efficiency with two ion beams can be solved by using two ion beams. At the same time, two ion beams can further increase the etching efficiency compared to a single beam. Compared with injection molding and diamond turning, this invention also achieves a breakthrough in hard materials and has good surface quality, which can directly meet the requirements of optical systems. That is, this invention can achieve efficient and uniform fabrication of millimeter-scale lenses.

[0055] like Figure 4 As shown, if the height of the sample holder is reduced by 300 micrometers from the height automatically measured by the instrument (i.e., the ion beam convergence position) before etching, the purpose is to ensure that the two obliquely incident ion beams are separated to a certain extent in the XY plane. If the z-axis position of the sample is too high or too low, it will result in the inability to etch a complete lens, or even make it look as if the two ion beams have each etched a pit similar to a concave lens. However, if the position of the two ion beams irradiating the sample surface is precisely controlled, i.e., the method of reducing the sample holder by 300 micrometers adopted in this invention, this is to modify the surface shape of the millimeter-scale lens. If the millimeter-scale lenses L1 and L2 etched by the two ion beams are superimposed in spatial position, they can be combined to etch the final hyperboloid lens L1+L2, with the left half of the lens coming from lens L2 and the right half from lens L1. Through this method, compared with vertical ion beam etching, this invention can precisely control the surface shape of the etched millimeter-scale lens.

[0056] like Figure 6 As shown, after etching, the morphology of the millimeter-scale lens was characterized using a super depth-of-field three-dimensional microscopic observation system. The lens has an opening diameter of approximately 2500 micrometers and a depth of approximately 55 micrometers. Figure 6 The three-dimensional topography of a and Figure 6 The cross-sectional curve of b shows that its surface is very smooth, which can directly meet the requirements of optical systems; Figure 6The cross-sectional coordinates of the lens shown in b are fitted using the mathematical expression for an axisymmetric aspherical surface. The fitting yields a vertex curvature c = 0.0003439 and a conic coefficient k = -339, confirming that its surface shape is hyperboloid. Thus, this invention achieves a balance between efficiency and uniformity through the oblique incidence of two ion beams. By adjusting the positions of the two ion beams on the sample surface, the final lens surface shape is controlled, efficiently fabricating uniform and smooth hyperboloid millimeter-scale lenses on sapphire surfaces. Furthermore, due to the stability of sapphire, this lens can be used as a template for mass production of millimeter-scale lenses from other materials.

[0057] The preferred embodiments of the present invention have been described in detail above with reference to the accompanying drawings. However, the present invention is not limited to the specific details of the above embodiments. Within the scope of the technical concept of the present invention, various simple modifications can be made to the technical solution of the present invention, and these simple modifications all fall within the protection scope of the present invention.

[0058] It should also be noted that the various specific technical features described in the above specific embodiments can be combined in any suitable manner without contradiction. In order to avoid unnecessary repetition, the present invention will not describe the various possible combinations separately.

[0059] Furthermore, various different embodiments of the present invention can be combined in any way, as long as they do not violate the spirit of the present invention, they should also be regarded as the content disclosed by the present invention.

Claims

1. A method for fabricating a millimeter-scale lens with controllable multi-material surface shape, characterized in that, The specific steps are as follows: Step 1: Sample preparation; The substrate to be processed was wiped with cotton balls soaked in acetone solution and ethanol solution in turn, then rinsed with deionized water and dried in a low temperature oven. The purpose was to remove the contaminants remaining on the substrate surface. The substrate was then taken out for use, and the sample preparation was completed. Step 2: Millimeter-scale lenses are fabricated using oblique incidence etching with two ion beams; First, the prepared sample is fixed on the sample holder, and a vacuum is drawn to remove the influence of air. Two ion beams are used for etching at an oblique incidence. Before etching, the height of the sample holder is first adjusted to the ion beam convergence position, and then the height of the sample holder is adjusted up or down so that the two ion beams do not converge completely on the surface of the substrate to be processed, or that they are separated to some extent after convergence. The sample holder rotates at a constant speed during etching. After etching is completed, the sample is removed, and the millimeter-level lens is prepared. In step two, two ion beams are obliquely incident at a symmetrical angle.

2. The method for fabricating a multi-material surface-type controllable millimeter-scale lens as described in claim 1, characterized in that, The substrate to be processed in step one includes transparent hard optical materials such as fused silica, sapphire, or diamond; the size of the substrate is 3mm-20mm, the thickness is 100μm-1mm, and the temperature of the low-temperature oven is set to 50℃-100℃.

3. The method for fabricating a multi-material surface-type controllable millimeter-scale lens as described in claim 1, characterized in that, In step two, the ion beam is generated by ionized argon gas. The instrument's operating voltage is 0.1-6kV, the etching time is 0-100 hours, the incident angle of the two ion beams is 0-10°, the focusing degree of the ion beams is 0-100%, and the sample holder that fixes the sample rotates 360° at a constant speed or swings back and forth within a specific angle range at a speed of 1-6 revolutions per minute.

4. The method for fabricating a multi-material surface-type controllable millimeter-scale lens as described in claim 1, characterized in that, The height of the sample holder can be adjusted up or down from 10μm to 1000μm.

5. The method for fabricating a multi-material surface-type controllable millimeter-scale lens as described in claim 1, characterized in that, Step two also includes etching with three or more ion beams to obtain a millimeter-scale lens structure.

6. A multi-material surface-type controllable millimeter-scale lens, characterized in that, It is obtained by the preparation method according to any one of claims 1-5.

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