A production process and system for ultrapure octachlorotrisilane for integrated circuits

Abstract

The invention discloses a production process and system of ultrapure octachlorotrisilane for integrated circuits. The system includes a trichlorosilane storage tank, a methyl chloride storage tank, and a reaction synthesizer; the discharge ports of the trichlorosilane storage tank and the methyl chloride storage tank are both connected to the feed port of the reaction synthesizer. The process includes adding trichlorosilane and methyl chloride into the reaction synthesizer in a molar ratio of 21 to 30:1, maintaining the temperature in the reaction synthesizer at 1500°C to 1800°C, and maintaining the pressure at 1.0 to 1.2Mpa, and reacting to generate gaseous crude octachlorotrisilane under the action of a catalyst polyacetic acid resin. The advantages are: the invention uses trichlorosilane and methyl chloride to prepare octachlorotrisilane, and the purity of the obtained octachlorotrisilane can be as high as 99.99%, which meets the requirements of octachlorotrisilane for preparing high-end integrated circuits, and can provide strong guarantees for the development and application of high-end integrated circuits; the production process of octachlorotrisilane can be simplified, the production cost of octachlorotrisilane can be greatly reduced, and the problem that it can only be imported from abroad can be solved.

Description

Technical Field

[0001] The invention relates to the field of preparation of octachlorotrisilane, and in particular to a production process and a system thereof for ultrapure octachlorotrisilane for integrated circuits. Background Art

[0002] Octachlorotrisilane is an important chemical raw material with wide application value in many fields and plays a key role. For example, in the semiconductor industry, octachlorotrisilane is a key material for producing high-quality silicon wafers, which directly affects the performance and output of integrated circuits. As an additive for new materials, it not only improves the durability and performance of new materials, but also promotes the miniaturization of electronic equipment, and brings revolutionary improvements to innovations in new energy, aerospace and other fields. Octachlorotrisilane is also an extremely important pharmaceutical intermediate and plays a key role in drug chemical synthesis. The quality and performance of pharmaceutical intermediates have an important impact on the safety and effectiveness of drugs. The structure of the intermediate can affect the rate, selectivity and conditions of the reaction, which helps to adjust the reaction conditions and improve the reaction efficiency.

[0003] The currently used octachlorotrisilane production process, such as that disclosed by JE Lang et al. in application number: CN201480023100.4, entitled: Method and apparatus for preparing octachlorotrisilane, is to prepare octachlorotrisilane from monomeric chloroalkane by subjecting chloroalkane to thermal plasma. The conversion of chloroalkane requires the use of thermal plasma, and the control procedure and operation are complicated, which restricts the production and application of octachlorotrisilane. Summary of the invention

[0004] The first object of the present invention is to provide a production system for ultra-pure octachlorotrisilane for integrated circuits. The second object of the present invention is to provide a production process for ultra-pure octachlorotrisilane for integrated circuits.

[0005] The first object of the present invention is implemented by the following technical solutions:

[0006] A production system for ultra-pure octachlorotrisilane for integrated circuits, comprising a trichlorosilane storage tank, a methyl chloride storage tank, and a reaction synthesizer;

[0007] The discharge ports of the trichlorosilane storage tank and the methyl chloride storage tank are both connected to the feed port of the reaction synthesizer.

[0008] Further, it also includes a separation tower and a purification tower;

[0009] The gas phase outlet at the top of the reaction synthesizer is connected to the gas phase inlet in the middle of the separation tower through a pipeline, the bottom liquid outlet at the bottom of the separation tower is connected to the feed inlet in the middle of the purification tower through a pipeline, and the bottom liquid outlet at the bottom of the purification tower is connected to the inlet of the octachlorotrisilane product storage tank through a pipeline.

[0010] Further, it also includes a separation tower top condenser and a purification tower top condenser;

[0011] The gas phase outlet at the top of the separation tower is connected to the inlet of the condenser at the top of the separation tower through a pipeline, and the condensate of the condenser at the top of the separation tower is connected to the liquid inlet at the top of the separation tower through a pipeline;

[0012] The gas phase outlet at the top of the purification tower is connected to the air inlet of the top condenser of the purification tower through a pipeline, and the condensate of the top condenser of the purification tower is connected to the liquid inlet at the top of the purification tower through a pipeline.

[0013] Further, it also includes a separation tower kettle reboiler and a purification tower kettle reboiler;

[0014] The bottom liquid outlet of the separation tower is connected to the inlet of the tower kettle reboiler of the separation tower through a pipeline, and the outlet of the tower kettle reboiler of the separation tower is connected to the liquid inlet in the middle of the separation tower through a pipeline;

[0015] The bottom liquid outlet of the purification tower is connected to the inlet of the tower kettle reboiler of the purification tower through a pipeline, and the outlet of the tower kettle reboiler of the purification tower is connected to the liquid inlet in the middle of the purification tower through a pipeline;

[0016] The gas phase outlet at the top of the separation tower is also connected to the heat medium inlet of the purification tower kettle reboiler through a pipeline, and the heat medium outlet of the purification tower kettle reboiler is connected to the inlet of the separation tower top condenser through a pipeline.

[0017] Furthermore, the non-condensable gas outlets of the separation tower top condenser and the purification tower top condenser are both connected to the inlet of the final-stage condenser through pipelines.

[0018] The second object of the present invention is implemented by the following technical solutions:

[0019] A production process of ultrapure octachlorotrisilane for integrated circuits, wherein trichlorosilane and methyl chloride are added into a reaction synthesizer at a molar ratio of 21 to 30:1, the temperature in the reaction synthesizer is maintained at 1500° C. to 1800° C., and the pressure is maintained at 1.0 to 1.2 MPa, and gaseous crude octachlorotrisilane is generated by reaction, and the reaction equation is as follows:

[0020] SiHCl3+CH3Cl→Si3Cl8+CH4+HCl

[0021] Chlorine atoms are excited under high temperature to produce chlorine free radicals, which recombine with silicon atoms to produce octachlorotrisilane. The by-products are mainly silicon tetrachloride and other small amounts of chlorosilane, as well as some incompletely reacted trichlorosilane.

[0022] Furthermore, the crude gaseous octachlorotrisilane is sent to a separation tower at 0.6-0.8Mpa for condensation treatment, so that the octachlorotrisilane contained in the gas phase is condensed into the bottom of the separation tower, and then the condensate obtained after condensation is sent to a purification tower at 0.2-0.35Mpa for distillation and purification treatment. The octachlorotrisilane product obtained after purification is sent to an octachlorotrisilane product storage tank for storage.

[0023] Furthermore, the uncondensed gas (mainly including silicon tetrachloride, trichlorosilane, other chlorosilane substances, hydrogen chloride and uncondensed octachlorotrisilane) discharged from the top of the separation tower is sent to the top condenser of the separation tower for condensation treatment again, so that the uncondensed octachlorotrisilane contained therein is further condensed, and the condensate (mainly octachlorotrisilane and a small amount of silicon tetrachloride) at 100 to 110° C. produced after condensation is returned to the separation tower, so that the yield of octachlorotrisilane can be improved;

[0024] The uncondensed gas discharged from the top of the purification tower (mainly including silicon tetrachloride, a small amount of trichlorosilane, other chlorosilane substances, hydrogen chloride and a small amount of uncondensed octachlorotrisilane) is sent to the top condenser of the purification tower for condensation treatment again, so that the very small amount of uncondensed octachlorotrisilane contained therein is condensed, and the condensate (mainly octachlorotrisilane) at 60-70°C produced after condensation is returned to the purification tower.

[0025] Furthermore, the bottom liquid of the separation tower is heated to 230-250° C. by a bottom reboiler of the separation tower and then returned to the separation tower, so that the bottom liquid of the separation tower is vaporized again, and silicon tetrachloride, trichlorosilane and other chlorosilane substances contained in the bottom liquid of the separation tower are evaporated by heating;

[0026] The bottom liquid of the purification tower is heated to 75-85°C by the reboiler of the purification tower and then returned to the purification tower, so that the bottom liquid of the purification tower is vaporized again, and the trace amount of silicon tetrachloride in the bottom liquid of the purification tower is heated and evaporated;

[0027] A portion of the uncondensed gas discharged from the top of the separation tower is sent to the reboiler of the purification tower as a heat source to heat the bottom liquid of the purification tower. After heat exchange, it enters the condenser at the top of the separation tower and is condensed into liquid and returned to the separation tower.

[0028] Furthermore, the uncondensed gases in the top condensers of the separation tower and the purification tower are sent to the final condenser to be condensed again by cooling water at 6 to 8°C.

[0029] Advantages of the present invention:

[0030] The present invention utilizes trichlorosilane and methyl chloride to prepare octachlorotrisilane. The purity of the obtained octachlorotrisilane can be as high as 99.99%, which meets the requirements of preparing high-end integrated circuits for octachlorotrisilane and can provide a strong guarantee for the development and application of high-end integrated circuits. The production process of octachlorotrisilane can be simplified, the production cost of octachlorotrisilane can be greatly reduced, and the problem that octachlorotrisilane can only be imported from abroad can be solved. BRIEF DESCRIPTION OF THE DRAWINGS

[0031] In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings required for use in the embodiments or the description of the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present invention. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying creative work.

[0032] Figure 1 This is a schematic diagram of system connection in Example 1;

[0033] In the figure: trichlorosilane storage tank 1, methyl chloride storage tank 2, reaction synthesizer 3, separation tower 4, purification tower 5, octachlorotrisilane product storage tank 6, separation tower top condenser 7, purification tower top condenser 8, separation tower kettle reboiler 9, purification tower kettle reboiler 10, final condenser 11. DETAILED DESCRIPTION

[0034] The technical solutions in the embodiments of the present invention are described clearly and completely below. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of them. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0035] Embodiment 1:

[0036] like Figure 1 The production system of ultrapure octachlorotrisilane for integrated circuits shown in the figure comprises a trichlorosilane storage tank 1, a methyl chloride storage tank 2, a reaction synthesizer 3, a separation tower 4, a purification tower 5, a separation tower top condenser 7, a purification tower top condenser 8, a separation tower kettle reboiler 9 and a purification tower kettle reboiler 10;

[0037] The discharge ports of the trichlorosilane storage tank 1 and the methyl chloride storage tank 2 are both connected to the feed port of the reaction synthesizer 3, the gas phase outlet at the top of the reaction synthesizer 3 is connected to the gas phase inlet in the middle of the separation tower 4 through a pipeline, the bottom liquid outlet at the bottom of the separation tower 4 is connected to the feed port in the middle of the purification tower 5 through a pipeline, and the bottom liquid outlet at the bottom of the purification tower 5 is connected to the inlet of the octachlorotrisilane product storage tank 6 through a pipeline.

[0038] The gas phase outlet at the top of the separation tower 4 is connected to the inlet of the separation tower top condenser 7 through a pipeline, and the condensate of the separation tower top condenser 7 is connected to the liquid inlet at the top of the separation tower 4 through a pipeline;

[0039] The gas phase outlet at the top of the purification tower 5 is connected to the air inlet of the purification tower top condenser 8 through a pipeline, and the condensate of the purification tower top condenser 8 is connected to the liquid inlet at the top of the purification tower 5 through a pipeline.

[0040] The bottom liquid outlet of the separation tower 4 is connected to the inlet of the separation tower kettle reboiler 9 through a pipeline, and the outlet of the separation tower kettle reboiler 9 is connected to the liquid inlet in the middle of the separation tower 4 through a pipeline;

[0041] The bottom liquid outlet of the purification tower 5 is connected to the inlet of the purification tower kettle reboiler 10 through a pipeline, and the outlet of the purification tower kettle reboiler 10 is connected to the liquid inlet in the middle of the purification tower 5 through a pipeline;

[0042] The gas phase outlet at the top of the separation tower 4 is also connected to the heat medium inlet of the purification tower kettle reboiler 10 through a pipeline, and the heat medium outlet of the purification tower kettle reboiler 10 is connected to the inlet of the separation tower top condenser 7 through a pipeline.

[0043] The non-condensable gas outlets of the separation tower top condenser 7 and the purification tower top condenser 8 are both connected to the inlet of the final-stage condenser 11 through pipelines.

[0044] Embodiment 2:

[0045] In the process of producing octachlorotrisilane using a production system of ultrapure octachlorotrisilane for integrated circuits proposed in Example 1, trichlorosilane and methyl chloride are added into a reaction synthesizer 3 at a molar ratio of 22:1, the temperature in the reaction synthesizer 3 is maintained at 1730° C., and the pressure is maintained at 1.0-1.2 MPa. Under the action of a catalyst, polyacetic acid resin, the reaction generates gaseous crude octachlorotrisilane.

[0046] The gaseous crude octachlorotrisilane is sent to a separation tower 4 at a pressure of 0.6 to 0.8 MPa for condensation treatment, so that the octachlorotrisilane contained in the gas phase is condensed to the bottom of the separation tower 4, and then the condensate obtained after condensation is sent to a purification tower 5 at a pressure of 0.2 to 0.35 MPa for distillation and purification treatment. The octachlorotrisilane product obtained after purification is sent to an octachlorotrisilane product storage tank 6 for storage.

[0047] The uncondensed gas discharged from the top of the separation tower 4 is sent to the top condenser 7 of the separation tower for condensation again, and the condensate at 110° C. produced after condensation is returned to the separation tower 4;

[0048] The uncondensed gas discharged from the top of the purification tower 5 is sent to the top condenser 8 of the purification tower for condensation treatment again, and the condensate at 65° C. produced after condensation is returned to the purification tower 5.

[0049] The bottom liquid of the separation tower 4 is heated to 240° C. by the separation tower bottom reboiler 9 and then returned to the separation tower 4, so that the bottom liquid of the separation tower 4 is vaporized again;

[0050] The bottom liquid of the purification tower 5 is heated to 80° C. by the purification tower bottom reboiler 10 and then returned to the purification tower 5, so that the bottom liquid of the purification tower 5 is vaporized again;

[0051] A portion of the uncondensed gas discharged from the top of the separation tower 4 is sent to the purification tower kettle reboiler 10 as a heat source to heat the bottom liquid of the purification tower 5. After heat exchange, it enters the separation tower top condenser 7 and is condensed into liquid and returned to the separation tower 4.

[0052] The uncondensed gases in the separation tower top condenser 7 and the purification tower top condenser 8 are sent to the final condenser 11 for condensation again by cooling water at 7°C. After condensation, the condensate with a temperature of 7 to 10°C is returned to the hydrogenation device and used as a raw material to continuously produce trichlorosilane. The uncondensed gases are discharged into the non-condensable gas discharge system.

[0053] Embodiment 3:

[0054] In the process of producing octachlorotrisilane using a production system of ultrapure octachlorotrisilane for integrated circuits proposed in Example 1, trichlorosilane and methyl chloride are added into a reaction synthesizer 3 at a molar ratio of 26:1, the temperature in the reaction synthesizer 3 is maintained at 1660° C., and the pressure is maintained at 1.0-1.2 MPa. Under the action of a catalyst, polyacetic acid resin, the reaction generates gaseous crude octachlorotrisilane.

[0055] The gaseous crude octachlorotrisilane is sent to a separation tower 4 at a pressure of 0.6 to 0.8 MPa for condensation treatment, so that the octachlorotrisilane contained in the gas phase is condensed to the bottom of the separation tower 4, and then the condensate obtained after condensation is sent to a purification tower 5 at a pressure of 0.2 to 0.35 MPa for distillation and purification treatment. The octachlorotrisilane product obtained after purification is sent to an octachlorotrisilane product storage tank 6 for storage.

[0056] The uncondensed gas discharged from the top of the separation tower 4 is sent to the top condenser 7 of the separation tower for condensation again, and the condensate at 110° C. produced after condensation is returned to the separation tower 4;

[0057] The uncondensed gas discharged from the top of the purification tower 5 is sent to the top condenser 8 of the purification tower for condensation treatment again, and the condensate at 65° C. produced after condensation is returned to the purification tower 5.

[0058] The bottom liquid of the separation tower 4 is heated to 240° C. by the separation tower bottom reboiler 9 and then returned to the separation tower 4, so that the bottom liquid of the separation tower 4 is vaporized again;

[0059] The bottom liquid of the purification tower 5 is heated to 80° C. by the purification tower bottom reboiler 10 and then returned to the purification tower 5, so that the bottom liquid of the purification tower 5 is vaporized again;

[0060] A portion of the uncondensed gas discharged from the top of the separation tower 4 is sent to the purification tower kettle reboiler 10 as a heat source to heat the bottom liquid of the purification tower 5. After heat exchange, it enters the separation tower top condenser 7 and is condensed into liquid and returned to the separation tower 4.

[0061] The uncondensed gases in the separation tower top condenser 7 and the purification tower top condenser 8 are sent to the final condenser 11 for condensation again by cooling water at 7°C. After condensation, the condensate with a temperature of 7 to 10°C is returned to the hydrogenation device and used as a raw material to continuously produce trichlorosilane. The uncondensed gases are discharged into the non-condensable gas discharge system.

[0062] Embodiment 4:

[0063] In the process of producing octachlorotrisilane using a production system of ultrapure octachlorotrisilane for integrated circuits proposed in Example 1, trichlorosilane and methyl chloride are added into a reaction synthesizer 3 at a molar ratio of 28:1, the temperature in the reaction synthesizer 3 is maintained at 1550° C., and the pressure is maintained at 1.0-1.2 MPa. Under the action of a catalyst, polyacetic acid resin, the reaction generates gaseous crude octachlorotrisilane.

[0064] The gaseous crude octachlorotrisilane is sent to a separation tower 4 at a pressure of 0.6 to 0.8 MPa for condensation treatment, so that the octachlorotrisilane contained in the gas phase is condensed to the bottom of the separation tower 4, and then the condensate obtained after condensation is sent to a purification tower 5 at a pressure of 0.2 to 0.35 MPa for distillation and purification treatment. The octachlorotrisilane product obtained after purification is sent to an octachlorotrisilane product storage tank 6 for storage.

[0065] The uncondensed gas discharged from the top of the separation tower 4 is sent to the top condenser 7 of the separation tower for condensation again, and the condensate at 110° C. produced after condensation is returned to the separation tower 4;

[0066] The uncondensed gas discharged from the top of the purification tower 5 is sent to the top condenser 8 of the purification tower for condensation treatment again, and the condensate at 65° C. produced after condensation is returned to the purification tower 5.

[0067] The bottom liquid of the separation tower 4 is heated to 240° C. by the separation tower bottom reboiler 9 and then returned to the separation tower 4, so that the bottom liquid of the separation tower 4 is vaporized again;

[0068] The bottom liquid of the purification tower 5 is heated to 80° C. by the purification tower bottom reboiler 10 and then returned to the purification tower 5, so that the bottom liquid of the purification tower 5 is vaporized again;

[0069] A portion of the uncondensed gas discharged from the top of the separation tower 4 is sent to the purification tower kettle reboiler 10 as a heat source to heat the bottom liquid of the purification tower 5. After heat exchange, it enters the separation tower top condenser 7 and is condensed into liquid and returned to the separation tower 4.

[0070] The uncondensed gases in the separation tower top condenser 7 and the purification tower top condenser 8 are sent to the final condenser 11 for condensation again by cooling water at 7°C. After condensation, the condensate with a temperature of 7 to 10°C is returned to the hydrogenation device and used as a raw material to continuously produce trichlorosilane. The uncondensed gases are discharged into the non-condensable gas discharge system.

[0071] The octachlorotrisilane product obtained in Example 2-4 was analyzed for metal impurities using an ICP-OES instrument, and the material components were analyzed by a gas chromatograph. The analysis results are shown in Table 1.

[0072] Table 1 Analysis results of octachlorotrisilane products obtained in Examples 2-4

[0073]

[0074] Comparative Example 1:

[0075] The only difference between this comparative example and Example 1 is that the temperature in the reaction synthesizer 3 is adjusted to 980°C.

[0076] Comparative Example 2:

[0077] The only difference between this comparative example and Example 1 is that the temperature in the reaction synthesizer 3 is adjusted to 1100°C.

[0078] Comparative Example 3:

[0079] The only difference between this comparative example and Example 1 is that the temperature in the reaction synthesizer 3 is adjusted to 1400°C.

[0080] Comparative Example 4:

[0081] The only difference between this comparative example and Example 1 is that the molar ratio of trichlorosilane to methyl chloride is adjusted to 35:1.

[0082] The various parameters of the octachlorotrisilane products obtained in Examples 2-4 and Comparative Examples 1-3 are compared, and the results are shown in Table 2.

[0083] Table 2 Comparison results of the processes of Examples 2-4 and Comparative Examples 1-3 and the purity of the obtained octachlorotrisilane products

[0084]

[0085] As can be seen from the above table, the octachlorotrisilane product obtained by the present invention can be as high as 99.99%, meeting the requirements for octachlorotrisilane in the preparation of high-end integrated circuits. In Comparative Example 1, due to the low temperature, the chemical reaction could not proceed, and therefore, no octachlorotrisilane was obtained; in Comparative Document 2, the reaction started, but the substance generated was not octachlorotrisilane; in Comparative Example 3, the reaction started, but the conversion rate was low; because methyl chloride would affect the separation of hydrogen elements in trichlorosilane, the addition of methyl chloride in Comparative Example 4 was insufficient, resulting in an incomplete dehydrogenation reaction, affecting the conversion rate, which was about 70% of the normal value of Example 2, and the amount of octachlorotrisilane generated was reduced, with a purity of about 90%.

[0086] At the same time, the production cost of the octachlorotrisilane product prepared by the present invention is about 550,000 yuan / ton, which can save 8 million yuan per ton compared with imported octachlorotrisilane. Calculated based on the company's annual output of 5 tons of octachlorotrisilane products, the company can save at least 8 million*5=40 million yuan a year.

[0087] The above description is only a preferred embodiment of the present invention and is not intended to limit the present invention. Any modifications, equivalent substitutions, improvements, etc. made within the spirit and principle of the present invention should be included in the protection scope of the present invention.

Claims

1. A production system for ultra-pure octachlorotrisilane for integrated circuits, It is characterized in that Including trichlorosilane storage tank, methyl chloride storage tank, reaction synthesizer, separation tower, purification tower, separation tower top condenser, purification tower top condenser, separation tower kettle reboiler and purification tower kettle reboiler; The discharge ports of the trichlorosilane storage tank and the methyl chloride storage tank are both connected to the feed port of the reaction synthesizer; The gas phase outlet at the top of the reaction synthesizer is connected to the gas phase inlet in the middle of the separation tower through a pipeline, the bottom liquid outlet at the bottom of the separation tower is connected to the feed inlet in the middle of the purification tower through a pipeline, and the bottom liquid outlet at the bottom of the purification tower is connected to the inlet of the octachlorotrisilane product storage tank through a pipeline; The gas phase outlet at the top of the separation tower is connected to the inlet of the condenser at the top of the separation tower through a pipeline, and the condensate of the condenser at the top of the separation tower is connected to the liquid inlet at the top of the separation tower through a pipeline; The gas phase outlet at the top of the purification tower is connected to the gas inlet of the top condenser of the purification tower through a pipeline, and the condensate of the top condenser of the purification tower is connected to the liquid inlet at the top of the purification tower through a pipeline; The bottom liquid outlet of the separation tower is connected to the inlet of the tower kettle reboiler of the separation tower through a pipeline, and the outlet of the tower kettle reboiler of the separation tower is connected to the liquid inlet in the middle of the separation tower through a pipeline; The bottom liquid outlet of the purification tower is connected to the inlet of the tower kettle reboiler of the purification tower through a pipeline, and the outlet of the tower kettle reboiler of the purification tower is connected to the liquid inlet in the middle of the purification tower through a pipeline; Trichlorosilane and methyl chloride are added into the reaction synthesizer at a molar ratio of 21 to 30:

1. The temperature in the reaction synthesizer is maintained at 1500° C. to 1800° C., and the pressure is maintained at 1.0 to 1.2 MPa.

2. A production system for ultrapure octachlorotrisilane for integrated circuits according to claim 1, It is characterized in that The gas phase outlet at the top of the separation tower is also connected to the heat medium inlet of the purification tower kettle reboiler through a pipeline, and the heat medium outlet of the purification tower kettle reboiler is connected to the inlet of the separation tower top condenser through a pipeline.

3. The production system of ultrapure octachlorotrisilane for integrated circuits according to claim 1, It is characterized in that The non-condensable gas outlets of the separation tower top condenser and the purification tower top condenser are both connected to the inlet of the final-stage condenser through pipelines.

4. A process for producing octachlorotrisilane using the production system of ultrapure octachlorotrisilane for integrated circuits according to any one of claims 1 to 3, It is characterized in that Trichlorosilane and methyl chloride are added into a reaction synthesizer at a molar ratio of 21 to 30:1, the temperature in the reaction synthesizer is maintained at 1500 to 1800°C, the pressure is maintained at 1.0 to 1.2 MPa, and under the action of a catalyst polyacetic acid resin, gaseous crude octachlorotrisilane is reacted.

5. The production process of ultrapure octachlorotrisilane for integrated circuits according to claim 4, It is characterized in that The gaseous crude octachlorotrisilane is sent to a separation tower at 0.6-0.8Mpa for condensation treatment, so that the octachlorotrisilane contained in the gas phase is condensed into the bottom of the separation tower, and the condensate obtained after condensation is sent to a purification tower at 0.2-0.35Mpa for distillation and purification treatment. The octachlorotrisilane product obtained after purification is sent to an octachlorotrisilane product storage tank for storage.

6. The production process of ultrapure octachlorotrisilane for integrated circuits according to claim 5, It is characterized in that The uncondensed gas discharged from the top of the separation tower is sent to the top condenser of the separation tower for condensation again. The condensate at 100-110°C produced after condensation is returned to the separation tower. The uncondensed gas discharged from the top of the purification tower is sent to the top condenser of the purification tower for condensation again, and the condensate at 60-70°C produced after condensation is returned to the purification tower.

7. The production process of ultrapure octachlorotrisilane for integrated circuits according to claim 6, It is characterized in that The bottom liquid of the separation tower is heated to 230-250°C by the separation tower bottom reboiler and then returned to the separation tower to vaporize the bottom liquid of the separation tower again. The bottom liquid of the purification tower is heated to 75-85°C by the reboiler of the purification tower and then returned to the purification tower to vaporize the bottom liquid of the purification tower again. A portion of the uncondensed gas discharged from the top of the separation tower is sent to the reboiler of the purification tower as a heat source to heat the bottom liquid of the purification tower. After heat exchange, it enters the condenser at the top of the separation tower and is condensed into liquid and returned to the separation tower.

8. The production process of ultrapure octachlorotrisilane for integrated circuits according to claim 6, It is characterized in that The uncondensed gases in the top condensers of the separation tower and the purification tower are sent to the final condenser for condensation again by cooling water at 6 to 8°C.

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