Real-time microscopic imaging compensation micro-nano processing system based on digital light processing technology

The real-time microscopic imaging compensation micro-nano fabrication system using digital light processing technology has solved the problem of low yield in the fabrication process of micro-nano photonic devices in the existing technology, realizing high-precision and high-efficiency three-dimensional object manufacturing and improving the forming quality of optical devices.

CN118664902BActive Publication Date: 2024-12-13CHENGDU BENNISHI TECHNOLOGY CO LTD
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Patent Information

Application Number
CN202410730432.1
Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
Filing Date
2024-06-06
Publication Date
2024-12-13
Estimated Expiration
2044-06-06

AI Technical Summary

Technical Problem

Existing micro-nano photonic device fabrication processes have low yield rates and make it difficult to precisely control the forming quality of devices, which limits the performance of the system in processing high-performance optical devices.

Method used

A real-time microscopic imaging compensation micro-nano fabrication system based on digital light processing technology is adopted. Combining a digital light processing optical path system and a microscopic imaging feedback compensation system, real-time microscopic imaging compensation is achieved through components such as ultraviolet single-wavelength optical structures, microscope objectives, and substrate supports, thereby improving the uniformity of light spots and the yield of three-dimensional objects.

Benefits of technology

This greatly improves the uniformity of the printed structural layers and the yield rate of three-dimensional objects, significantly enhancing the quality of sample printing.

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Abstract

The present invention discloses a real-time microscopic imaging compensation micro-nano processing system based on digital light processing technology, wherein the processing system includes a digital light processing optical path system and a microscopic imaging feedback compensation system, wherein: the digital light processing optical path system includes an ultraviolet single-wavelength optical structure, a microscope objective, a substrate support, and a substrate liquid container pool with an oxygen permeable membrane, the substrate support includes a three-dimensional displacement controller and an angle platform, the ultraviolet single-wavelength optical structure includes a DMD optical machine, the DMD optical machine includes a DMD chip and an ultraviolet light source, and the microscopic imaging feedback compensation system includes a detector, a processor, and a computer connected to the processor. The present invention can solve the problems of poor uniformity of the light spot introduced by the light source and the optical path system, greatly improve the uniformity of the printed structure layer, and greatly improve the yield rate of three-dimensional objects and the sample printing quality.
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Description

Technical Field

[0001] The invention belongs to the technical field of optical micro-nano structure preparation, and relates to a micro-nano processing system, and in particular to a micro-nano processing system based on digital light processing technology and capable of realizing microscopic imaging compensation. Background Art

[0002] With the development of micro-nano optics, micro-nano photonic devices are gradually becoming miniaturized, structurally diversified, and highly integrated. How to further improve the preparation of micro-nano structures has always been a difficult problem. At present, there are many micro-nano photonic device preparation technologies, such as single-photon polymerization technology based on micromirror array structure, electron beam lithography technology, and other advanced preparation technologies. Among them, electron beam lithography technology has extremely high precision, but the processing is time-consuming and costly; single-photon polymerization technology based on micromirror array structure realizes layer-by-layer preparation through software control. This method has a fast processing speed and has micron-level precision. Through optimized control and improvement of photosensitive polymer parameters, single-photon polymerization has successfully achieved nanoscale resolution for micro-nano processing. However, the existing preparation process has a low yield rate and it is difficult to accurately control the molding quality of the device, which seriously restricts the performance of the system in processing high-performance optical devices. Summary of the invention

[0003] In order to solve the problem of difficult to control finished product quality in existing processing technology, the present invention provides a real-time microscopic imaging compensation micro-nano processing system based on digital light processing technology.

[0004] The objective of the present invention is achieved through the following technical solutions:

[0005] A real-time microscopic imaging compensation micro-nano processing system based on digital light processing technology, comprising a digital light processing optical path system and a microscopic imaging feedback compensation system, wherein:

[0006] The digital light processing optical path system comprises an ultraviolet single-wavelength optical structure, a microscope objective, a substrate support and a substrate liquid container pool with an oxygen permeable membrane, wherein: the substrate support is located below the substrate liquid container pool and is used to support and fix the substrate liquid container pool; the substrate liquid container pool is used to hold a photosensitive polymer, and the oxygen permeable membrane is wrapped around the bottom surface of the substrate liquid container pool; the ultraviolet single-wavelength optical structure is used to provide a single-wavelength ultraviolet light to initiate a single-photon polymerization process in the photosensitive polymer; the microscope objective is used to focus the ultraviolet light on the photosensitive polymer; the substrate support comprises a three-dimensional displacement controller and an angle platform, and the three-dimensional mobile control console comprises an X-axis displacement controller, a Y-axis displacement controller and a Z-axis displacement controller. Before preparing a three-dimensional structure, the Z-axis displacement controller is used to adjust the position of the microscope objective to find the interface between the photosensitive polymer and the oxygen permeable membrane. During the preparation of the three-dimensional structure, for a smaller three-dimensional object structure, the Z-axis displacement controller is used to control the height of the printed sample substrate; for a three-dimensional structure exceeding the aperture of the microscope objective, the X-axis displacement controller and the Y-axis displacement controller are used to adjust the position of the three-dimensional structure preparation; the angle displacer is used to correct the position of the sample substrate and adjust the structure position of the three-dimensional structure preparation;

[0007] The ultraviolet single-wavelength optical structure includes a DMD optical machine, which includes a DMD chip and an ultraviolet light source with a wavelength of 390 nanometers, and is mainly used to generate a two-dimensional structural model diagram prepared layer by layer in a single-photon polymerization system;

[0008] The microscopic imaging feedback compensation system includes a detector, a processor, and a computer connected to the processor;

[0009] The ultraviolet light source generates an ultraviolet light with a wavelength of 390 nanometers. The ultraviolet light is processed by a computer to generate a two-dimensional structure model diagram. The two-dimensional structure model diagram is input into the DMD chip. The two-dimensional structure light spot output by the DMD chip is guided to the microscope objective through an optical component. The microscope objective focuses the two-dimensional structure light spot into the photosensitive polymer to induce single-photon polymerization. The detector images the current printing layer and compares and evaluates it with the three-dimensional structure model, and then feeds back the single-photon polymerization model data to the processor. The processor controls the ultraviolet single-wavelength optical structure and the three-dimensional displacement controller. The computer executes a computer program according to the single-photon polymerization model data received by the processor to obtain a series of images. Image pattern and layering information; the control operation includes irradiating the photosensitive polymer with a single wavelength of ultraviolet light through an ultraviolet single-wavelength optical structure, exposing and compensating on the basis of the existing layer again through single-photon polymerization, controlling the Z-axis position after completion, and repeating the steps until the three-dimensional object is manufactured; the computer program instructions include: dividing the CAD file of the three-dimensional structure model into a data group, including feature data representing the three-dimensional object, slicing the data group along the Z-axis of the three-dimensional object to provide a first group of data layers, converting each layer of the first group into image data, thereby providing single-photon polymerization data containing all image data and related layer values, and outputting the single-photon polymer data to the DMD optical machine.

[0010] Compared with the prior art, the present invention has the following advantages:

[0011] The present invention can solve the problems of poor uniformity of light spots introduced by the light source and the optical path system, greatly improve the uniformity of the printed structure layer, and greatly improve the yield rate of three-dimensional objects and the sample printing quality. BRIEF DESCRIPTION OF THE DRAWINGS

[0012] Figure 1 It is a structural schematic diagram of the real-time microscopic imaging compensation micro-nano processing system based on digital light processing technology;

[0013] Figure 2 A physical picture of the real-time microscopic imaging compensation micro-nano processing system based on digital light processing technology;

[0014] Figure 3 Flow chart of the real-time microscopic imaging compensation micro-nano processing system based on digital light processing technology;

[0015] Figure 4 It is a structural diagram of one-time molding and square array;

[0016] Figure 5 It is the lateral accuracy of the system and the side view of the layer height accuracy;

[0017] Figure 6 Diagram of lens structures prepared for compensated feedback and without compensated feedback. DETAILED DESCRIPTION

[0018] The technical solution of the present invention is further described below in conjunction with the accompanying drawings, but is not limited thereto. Any modification or equivalent replacement of the technical solution of the present invention without departing from the spirit and scope of the technical solution of the present invention should be included in the protection scope of the present invention.

[0019] The present invention provides a real-time microscopic imaging compensation micro-nano processing system based on digital light processing technology. The system uses single-photon polymerization technology and takes into account factors such as uneven exposure and curing to achieve real-time microscopic imaging compensation. The prepared three-dimensional objects can have three-dimensional structural characteristics and resolution characteristics, and may include structural features with a length scale within the range of 2.1 microns.

[0020] like Figure 1~Figure 3 As shown, the real-time microscopic imaging compensation micro-nano processing system based on digital light processing technology includes a digital light processing optical path system and a microscopic imaging feedback compensation system.

[0021] The digital light processing optical path system comprises an ultraviolet single wavelength optical structure, a microscope objective lens, a substrate support and a substrate liquid container pool with an oxygen permeable membrane, wherein:

[0022] The substrate support is located below the substrate liquid container pool and is used to support and fix the substrate liquid container pool.

[0023] The substrate support includes a three-dimensional displacement controller and an angle platform, which are used to support a sample substrate (a transparent glass sheet or a microscope slide) on which a three-dimensional object is to be manufactured.

[0024] The three-dimensional mobile control console includes an X-axis displacement controller, a Y-axis displacement controller and a Z-axis displacement controller. Before preparing the three-dimensional structure, the Z-axis displacement controller is used to adjust the position of the microscope objective lens to find the interface between the photosensitive polymer and the oxygen permeable membrane. During the preparation of the three-dimensional structure, for a smaller three-dimensional object structure, the Z-axis displacement controller is used to control the height of the printed sample substrate; for a three-dimensional structure exceeding the aperture of the microscope objective lens, the X-axis displacement controller and the Y-axis displacement controller are used to adjust the position of the three-dimensional structure preparation; the angle displacer is used to correct the position of the sample substrate and adjust the structural position of the three-dimensional structure preparation.

[0025] The substrate liquid container pool is used to hold the photosensitive polymer that constitutes the three-dimensional object (such as the coating layer on the surface of the sample substrate), and the oxygen permeable membrane is wrapped on the bottom of the substrate liquid container pool. Since the bottom of the container pool is an oxygen permeable membrane, the single-photon polymerization of the photoresist / film interface will be inhibited; due to the effect of the ultraviolet absorber in the photoresist, the photopolymerization process is only carried out within a certain depth range (approximately 300 microns), ensuring that the substrate is within the curing depth range; the system can operate in different forms. In non-immersion mode, the photosensitive polymer can be dripped on the sample substrate; in immersion mode, the sample substrate is immersed in the container pool containing the photosensitive polymer, which can be used to perform a continuous liquid interface manufacturing (CLIP) process. The photosensitive polymer includes negative and positive photosensitive polymer materials, and according to the required manufacturing materials of the three-dimensional object, the photosensitive polymer can also include other materials, such as glass, ceramics, metals, semiconductor particles, nanoparticles, etc.

[0026] The ultraviolet single-wavelength optical structure is used to provide a single-wavelength ultraviolet light to initiate a single-photon polymerization process in a photosensitive polymer.

[0027] The microscope objective can focus ultraviolet light on the photosensitive polymer, thereby simultaneously inducing a single-photon polymerization process in the photosensitive polymer.

[0028] The wavelength of light selected in the present invention is not particularly limited, as long as it can induce a single-photon process in the selected photosensitive polymer, and can be located in the ultraviolet part of the spectrum. Similarly, such ultraviolet single-wavelength optical structure is not particularly limited, but needs to include a light source for generating light, an optical component for guiding light (dichroic reflectors, lenses, etc.), and electrical components associated with the light source and optical components.

[0029] For example, Figure 1 and Figure 2 As shown, the microscope objective (e.g., a 5x objective) focuses light onto a field of view of about 3500×3500 microns on the sample substrate. The ultraviolet single-wavelength optical structure includes a DMD optical engine, which is a system based on a micromirror array chip (digital micromirror device (DLP4500 EVM )), including a DMD chip and a UV light source with a wavelength of 390 nanometers, which is mainly used to generate a two-dimensional structure model image prepared layer by layer in a single-photon polymerization system. The optical components (dichroic mirrors DM1, DM2 and tube lens) guide the two-dimensional structure light spot generated by the UV light to the microscope objective, and the microscope objective focuses the two-dimensional structure light spot to induce the single-photon process.

[0030] The digital light processing optical path system also includes a Z-axis stage mounted on the microscope objective lens for alignment along the Z-axis.

[0031] The microscopic imaging feedback compensation system determines whether to compensate for the exposed structure through real-time microscopic imaging evaluation, thereby printing a three-dimensional object.

[0032] The microscopic imaging feedback compensation system is used to control one or more structures of the digital light processing optical path system. The microscopic imaging feedback compensation system can also be used to generate lithography data to be used during the manufacture of three-dimensional objects. The microscopic imaging feedback compensation system can be integrated into the system as part of a single device, or it can be distributed in multiple devices to achieve a certain function, and these devices can be connected to other structures by wired or wireless network. The controller can also include a database for system data storage.

[0033] The communication interface supports the interface for receiving and sending data between devices using various protocols and transmission technologies. The communication interface supports communication by wired or wireless transmission methods. Data and information can be transmitted between controllers, databases, other structures of the system and / or other external devices through the communication interface.

[0034] The microscopic imaging feedback compensation system includes a processor and a computer connected to the processor, the processor controls the ultraviolet single wavelength optical structure and the three-dimensional displacement controller, and the computer executes a computer program according to the single photon polymerization model data received by the processor to obtain a series of image patterns and layered information, and the computer program instructions specifically include: dividing the data of the CAD file into data groups, slicing the data of the data group along the Z axis to provide multiple layers, and the slicing can be performed using commercial software. Before slicing, the data of the data group represents three-dimensional pixels. Each slice of the first group of multiple layers of the data group is converted into an image pattern, and each image pattern corresponds to a layer for forming a light pattern. The multiple image patterns are called single-photon lithography data, which includes a set of image patterns and related layer values ​​(i.e., the first layer, the second layer...the nth layer), and a compensation sequence is produced according to the imaging quality received from the microscopic imaging feedback compensation system, and the single-wavelength ultraviolet light is irradiated again. Specifically, in the first step of operation, the first layer is exposed first, and the exposed layer is subjected to real-time imaging judgment to determine whether the quality of the representation meets the expected effect. If the judgment is "no", the imaging compensation data is imported into the processor for in-situ exposure again. If the judgment is "yes", in the second step, the Z axis is moved to perform exposure of the next layer.

[0035] The microscopic imaging feedback compensation system also includes other component structures. For example, Figure 1 and Figure 2 As shown, the microscopic imaging feedback compensation system also includes a detector, which includes a second light source (e.g., a low-coherence red (633 nm) LED), a beam splitter (BS) and a photodetector (e.g., a CCD camera) to image the substrate during the fabrication of the three-dimensional object.

[0036] As described above, the microscopic imaging feedback compensation system can control the digital light processing optical path system based on the photolithography data to manufacture a three-dimensional object. The photolithography data can be generated by the microscopic imaging feedback compensation system described above, or by an external device.

[0037] The present invention also provides a method for manufacturing a three-dimensional object using the above-mentioned real-time microscopic imaging compensation micro-nano processing system, the method comprising the following steps:

[0038] (1) irradiating a photosensitive polymer with a single wavelength of ultraviolet light through an ultraviolet single wavelength optical structure to produce a first region of a three-dimensional object by single photon polymerization;

[0039] (2) Imaging is achieved through the ultraviolet single-wavelength optical structure, and the three-dimensional structure model image is compared to evaluate the imaging quality, and then feedback is given to the microscopic imaging feedback compensation system to judge the ultraviolet single-wavelength optical structure and determine the uniformity of the printed layer structure;

[0040] (3) Repeat steps (1) and (2) until a three-dimensional object is made.

[0041] Figures 4 to 6 Images of three-dimensional objects made using the above-described systems and methods are shown. Figure 4 Shown is the structure and square pillar array unit prepared by the system after a single exposure. Figure 5 What is shown is the test chart of the lateral accuracy and layer height accuracy of the system's single exposure. The lateral accuracy of the system is about 1.2 microns / pixel. The layer height control is mainly achieved by adding a light absorber (Sudan I) to the photosensitive polymer material. The optimized single exposure layer height can be about 800 nanometers. Figure 6 is a lens array. In these figures, “no compensation” refers to structures fabricated by single-photon lithography without compensation optimization, and “compensation feedback” refers to structures fabricated by single-photon lithography after some of the structures have been compensated in real time microscopically.

[0042] The present invention can produce the following types of structures: polymer photonic sensors (ultra-high frequency ultrasound detection, chemical sensing); optofluidic and microfluidic sensors for gas and liquid sensing; polymer biosensors; biomedical devices; integrated optical circuits; active / functional lasers.

Claims

1. A real-time microscopic imaging compensation micro-nano processing system based on digital light processing technology, characterized in that The processing system includes a digital light processing optical path system and a microscopic imaging feedback compensation system, wherein: The digital light processing optical path system comprises an ultraviolet single-wavelength optical structure, a microscope objective lens, a substrate support and a substrate liquid container pool with an oxygen permeable membrane, wherein: the substrate support is located below the substrate liquid container pool and is used to support and fix the substrate liquid container pool; the substrate liquid container pool is used to hold a photosensitive polymer, and the oxygen permeable membrane is wrapped around the bottom surface of the substrate liquid container pool; the ultraviolet single-wavelength optical structure is used to provide a single-wavelength ultraviolet light to induce a single-photon polymerization process in the photosensitive polymer; the microscope objective lens is used to focus the ultraviolet light on the photosensitive polymer; The substrate support includes a three-dimensional displacement controller and an angle platform, and the three-dimensional mobile control console includes an X-axis displacement controller, a Y-axis displacement controller and a Z-axis displacement controller. Before preparing the three-dimensional structure, the Z-axis displacement controller is used to adjust the position of the microscope objective lens to find the interface between the photosensitive polymer and the oxygen permeable membrane. During the preparation of the three-dimensional structure, the Z-axis displacement controller is used to control the height of the sample substrate, and the X-axis displacement controller and the Y-axis displacement controller are used to adjust the position of the three-dimensional structure preparation; the angle displacement device is used to correct the position of the sample substrate and adjust the structural position of the three-dimensional structure preparation; The ultraviolet single-wavelength optical structure includes a DMD optical machine, and the DMD optical machine includes a DMD chip and an ultraviolet light source, which is used to generate a two-dimensional structural model diagram prepared layer by layer by single-photon polymerization; The microscopic imaging feedback compensation system includes a detector, a processor, and a computer connected to the processor; The ultraviolet light source generates an ultraviolet light with a wavelength of 390 nanometers, and the ultraviolet light is processed by a computer to generate a two-dimensional structure model diagram, which is input into the DMD chip, and the two-dimensional structure light spot output by the DMD chip is guided to the microscope objective through an optical component, and the microscope objective is used to focus the two-dimensional structure light spot into the photosensitive polymer to induce single-photon polymerization, and the detector is used to image the current printing layer and feed back the single-photon polymerization data to the processor after comparing and evaluating with the three-dimensional structure model, and the processor is used to control the ultraviolet single-wavelength optical structure and the three-dimensional displacement controller, and the computer is used to execute a computer program according to the single-photon polymerization data received by the processor to obtain a series of image patterns and layered information; The control operation includes irradiating the photosensitive polymer with a single wavelength of ultraviolet light through an ultraviolet single-wavelength optical structure, exposing and compensating again on the basis of the existing layer through single-photon polymerization, controlling the Z-axis position after completion, and repeating the steps until the three-dimensional object is manufactured. Specifically, in the first step, the first layer is exposed first, and the exposed layer is imaged in real time to determine whether the quality meets the expected effect. If the judgment is "no", the imaging compensation data is imported into the processor for in-situ exposure again. If the judgment is "yes", in the second step, the Z-axis is moved to expose the next layer.

2. The real-time microscopic imaging compensation micro-nano processing system based on digital light processing technology according to claim 1 is characterized in that The computer program includes: dividing the CAD file of the three-dimensional structure model into a data group including feature data representing the three-dimensional object, slicing the data group along the Z-axis of the three-dimensional object to provide a first group of data layers, converting each layer of the first group into image data, thereby providing single-photon polymerization data including all image data and related layer values, and outputting the single-photon polymerization data to the DMD optical machine.

3. The real-time microscopic imaging compensation micro-nano processing system based on digital light processing technology according to claim 1 is characterized in that The sample substrate is a transparent glass sheet or a microscope slide.

4. The real-time microscopic imaging compensation micro-nano processing system based on digital light processing technology according to claim 1 is characterized in that The photosensitive polymer includes one or more of negative photosensitive polymer materials, positive photosensitive polymer materials, glass, ceramics, metals, semiconductor particles, and nanoparticles.

5. The real-time microscopic imaging compensation micro-nano processing system based on digital light processing technology according to claim 1 is characterized in that The digital light processing optical path system also includes a Z-axis stage mounted on the microscope objective lens for alignment along the Z-axis.

6. A method for manufacturing a three-dimensional object using the real-time microscopic imaging compensation micro-nano processing system based on digital light processing technology according to any one of claims 1 to 5, the method comprising the following steps: (1) irradiating a photosensitive polymer with a single wavelength of ultraviolet light through an ultraviolet single wavelength optical structure to produce a first region of a three-dimensional object by single photon polymerization; (2) Imaging is achieved through the ultraviolet single-wavelength optical structure, and the three-dimensional structure model image is compared to evaluate the imaging quality, and then feedback is given to the microscopic imaging feedback compensation system to judge the ultraviolet single-wavelength optical structure and determine the uniformity of the printed layer structure; (3) Repeat steps (1) and (2) until a three-dimensional object is made.

7. The method according to claim 6, characterized in that The three-dimensional object is a polymer photon sensor, an optofluidic sensor, a microfluidic sensor, a polymer biosensor, a biomedical device, an integrated optical circuit, and an active / functional laser.

Citation Information

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