Chemical polishing device and polishing method

Abstract

The invention discloses a chemical polishing device and a polishing method, and relates to the technical field of polishing. The chemical polishing device comprises: a polishing liquid tank, a parts tank, a waste liquid tank, a first circulating water tank and a second circulating water tank, wherein the polishing liquid tank is used to hold polishing liquid, the parts tank is used to hold parts, the waste liquid tank is used to collect waste liquid, the first circulating water tank and the second circulating water tank are used to hold water, the outlet of the polishing liquid tank is connected to the inlet of the parts tank, the outlet of the parts tank is connected to the inlet of the polishing liquid tank, the outlet of the first circulating water tank is connected to the inlet of the parts tank, the outlet of the parts tank is connected to the inlet of the waste liquid tank, the outlet of the parts tank is connected to the inlet of the first circulating water tank, the outlet of the second circulating water tank is connected to the inlet of the parts tank, and the outlet of the parts tank is connected to the inlet of the second circulating water tank. The chemical polishing device of the invention can realize circulating polishing on the surface of parts and improve the surface quality of parts.

Description

Technical Field

[0001] The invention relates to the technical field of polishing, and in particular to a chemical polishing device and a polishing method. Background Art

[0002] Additive manufacturing technology, also known as 3D printing technology, can produce complex parts that are difficult to achieve with traditional technologies. However, the surfaces (including inner and outer surfaces) of complex parts manufactured by additive manufacturing are usually of poor quality. Surface defects such as step effect, spheroidization effect, powder adhesion, spatter or insufficient melting will lead to greater surface roughness, affecting the performance of complex parts manufactured by additive manufacturing. Post-processing polishing technology is required to eliminate surface defects.

[0003] Common post-processing polishing technologies mainly include mechanical polishing, abrasive flow polishing, laser polishing, electrolytic polishing, and chemical polishing. Among them, mechanical polishing is difficult to achieve contact with complex surfaces of additive manufacturing, and cannot polish, which easily causes uneven surface polishing of complex parts; abrasive flow polishing requires customized special equipment and abrasive carriers for complex parts, and cannot polish small areas; electrolytic polishing requires the manufacture of electrodes that conform to the polishing surface for complex parts, and cannot polish small areas; chemical polishing can effectively remove various surface defects of materials, can meet the polishing of various complex areas of various materials, and obtain uniform and consistent surface quality. Therefore, a chemical polishing device is urgently needed. Summary of the invention

[0004] The purpose of the present invention is to provide a chemical polishing device and a polishing method, which can realize cyclic polishing on the surface of parts and improve the surface quality of parts.

[0005] To achieve the above object, the present invention provides the following solutions:

[0006] The present invention provides a chemical polishing device, comprising: a polishing liquid tank, a parts tank, a waste liquid tank, a first circulating water tank and a second circulating water tank, wherein the polishing liquid tank is used to hold the polishing liquid, the parts tank is used to hold the parts, the waste liquid tank is used to hold the neutralizer and to collect the waste liquid, the first circulating water tank and the second circulating water tank are used to hold water, the outlet of the polishing liquid tank is connected to the inlet of the parts tank, the outlet of the parts tank is connected to the inlet of the polishing liquid tank, the outlet of the first circulating water tank is connected to the inlet of the parts tank, the outlet of the parts tank is connected to the inlet of the waste liquid tank, the outlet of the parts tank is connected to the inlet of the first circulating water tank, the outlet of the second circulating water tank is connected to the inlet of the parts tank, and the outlet of the parts tank is connected to the inlet of the second circulating water tank.

[0007] Preferably, a plurality of inlet reducers are provided at the inlet of the part tank, the size of one end of the inlet reducer is larger than the size of the other end of the inlet reducer, one end of the inlet reducer is used to connect with the polishing liquid tank, the first circulating water tank and the second circulating water tank, and the other end of the inlet reducer is used to connect with the flow channel inside the part;

[0008] A plurality of outlet reducers are provided at the outlet of the part tank, the size of one end of the outlet reducer is larger than the size of the other end of the outlet reducer, one end of the outlet reducer is used to connect with the polishing liquid tank, the waste liquid tank, the first circulating water tank and the second circulating water tank, and the other end of the outlet reducer is used to connect with the flow channel inside the part.

[0009] Preferably, the polishing liquid tank is located in a constant temperature water tank.

[0010] Preferably, a ventilation device is further included, and the polishing liquid tank, the parts tank, the waste liquid tank, the first circulating water tank and the second circulating water tank are all located in the ventilation device.

[0011] Preferably, a pH meter, a first flow regulating valve, a thermometer, a first circulation pump, a first pressure controller, a flow meter and a check valve are provided on the pipeline connecting the outlet of the polishing liquid tank and the inlet of the parts tank;

[0012] Alternatively, a pH meter, a first flow regulating valve, a first two-way solenoid valve, a thermometer, a first circulation pump, a first pressure controller, a flow meter and a check valve are arranged on the pipeline connecting the outlet of the polishing liquid tank and the inlet of the parts tank.

[0013] Preferably, it further comprises a tee, wherein a first interface of the tee is connected to the outlet of the first circulating water tank, a second flow regulating valve is arranged on the pipeline between the first interface of the tee and the outlet of the first circulating water tank, a second interface of the tee is connected to the outlet of the second circulating water tank, a third flow regulating valve is arranged on the pipeline between the second interface of the tee and the outlet of the second circulating water tank, and the third interface of the tee is connected to the inlet of the parts tank;

[0014] Alternatively, it also includes a tee, wherein the first interface of the tee is connected to the outlet of the first circulating water tank, a second flow regulating valve and a second two-way solenoid valve are arranged on the pipeline between the first interface of the tee and the outlet of the first circulating water tank, the second interface of the tee is connected to the outlet of the second circulating water tank, a third flow regulating valve and a third two-way solenoid valve are arranged on the pipeline between the second interface of the tee and the outlet of the second circulating water tank, and the third interface of the tee is connected to the inlet of the parts tank.

[0015] Preferably, a first three-way valve is provided at the inlet of the parts slot, and the first three-way valve is respectively connected to the outlet of the polishing liquid tank, the inlet of the parts slot and the third interface of the tee, and a second circulation pump and a second pressure controller are provided on the pipeline between the first three-way valve and the tee.

[0016] Preferably, a second three-way valve is provided at the outlet of the parts tank, and the second three-way valve is respectively connected to the outlet of the parts tank, the inlet of the waste liquid tank and the inlet of the polishing liquid tank.

[0017] Preferably, a third three-way valve and a fourth three-way valve are provided on the pipeline between the inlet of the waste liquid tank and the inlet of the first circulating water tank;

[0018] The first interface of the third three-way valve is connected to the inlet of the waste liquid tank, the second interface of the third three-way valve is used to connect to the outlet of the parts tank, the third interface of the third three-way valve is connected to the first interface of the fourth three-way valve, the second interface of the fourth three-way valve is connected to the inlet of the second circulating water tank, and the third interface of the fourth three-way valve is connected to the inlet of the first circulating water tank.

[0019] The present invention also provides a polishing method using the chemical polishing device, comprising the following steps:

[0020] Polishing: drain the polishing liquid in the polishing liquid tank into the parts tank, polish the parts in the parts tank, and drain the polishing liquid in the parts tank into the polishing liquid tank;

[0021] Waste liquid cleaning: drain the water in the first circulating water tank into the parts tank, clean the polishing liquid remaining in the parts tank and pipeline, and after the cleaning is completed, drain the remaining polishing liquid into the waste liquid tank;

[0022] Primary circulating water cleaning: the water in the first circulating water tank is drained into the parts tank to clean the parts in the parts tank. After the cleaning is completed, the water in the parts tank is drained into the first circulating water tank;

[0023] Secondary circulating water cleaning: The water in the second circulating water tank is drained into the parts tank to clean the parts in the parts tank. After the cleaning is completed, the water in the parts tank is drained into the second circulating water tank;

[0024] Drying: Take out the parts in the parts slot and dry them.

[0025] Compared with the prior art, the present invention has achieved the following technical effects:

[0026] The present invention can realize the circulation polishing of parts by connecting the outlet of the polishing liquid tank to the inlet of the parts tank and the outlet of the parts tank to the inlet of the polishing liquid tank; can realize the cleaning of the residual polishing liquid in the parts tank and the pipeline by connecting the outlet of the first circulating water tank to the inlet of the parts tank and the outlet of the parts tank to the inlet of the waste liquid tank; can realize the primary circulation water cleaning and the secondary circulation water cleaning by connecting the outlet of the parts tank to the inlet of the first circulating water tank, the outlet of the second circulating water tank to the inlet of the parts tank and the outlet of the parts tank to the inlet of the second circulating water tank. The present invention can polish the surface of parts and improve the surface quality of parts by circulating polishing with polishing liquid, cleaning with waste liquid, primary circulation water cleaning and secondary circulation water cleaning. BRIEF DESCRIPTION OF THE DRAWINGS

[0027] In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings required for use in the embodiments will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present invention. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying creative work.

[0028] Figure 1 A schematic diagram of the chemical polishing device of the present invention (used for polishing the outer surface of parts);

[0029] Figure 2 A schematic diagram of the chemical polishing device of the present invention (used for polishing the inner surface of parts);

[0030] In the figure: 1-polishing liquid tank; 2-constant temperature water tank; 3-pH meter; 4-first flow regulating valve; 5-thermometer; 6-first circulation pump; 7-pipeline; 8-first pressure controller; 9-flow meter; 10-check valve; 11-first three-way valve; 12-parts tank; 13-parts; 14-second three-way valve; 15-third three-way valve; 16-waste liquid tank; 17-fourth three-way valve; 18-first circulation water tank; 19-second flow regulating valve; 20-three-way; 21-second circulation Ring pump; 22-second pressure controller; 23-third flow regulating valve; 24-second circulating water tank; 25-ventilation device; 26-first two-way solenoid valve; 27-first four-way; 28-first inlet reducer; 29-second inlet reducer; 30-third inlet reducer; 31-first outlet reducer; 32-second outlet reducer; 33-third outlet reducer; 34-second four-way; 35-second two-way solenoid valve; 36-third two-way solenoid valve. DETAILED DESCRIPTION

[0031] The following will be combined with the drawings in the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0032] The purpose of the present invention is to provide a chemical polishing device which can realize cyclic polishing on the surface of parts and improve the surface quality of parts.

[0033] In order to make the above-mentioned objects, features and advantages of the present invention more obvious and easy to understand, the present invention is further described in detail below with reference to the accompanying drawings and specific embodiments. Example

[0034] like Figure 1 As shown, this embodiment provides a chemical polishing device, including: a polishing liquid tank 1, a part tank 12, a waste liquid tank 16, a first circulating water tank 18 and a second circulating water tank 24, the polishing liquid tank 1 is used to hold the polishing liquid, the part tank 12 is used to hold the part 13, the waste liquid tank 16 is used to hold the neutralizer and to collect the waste liquid, neutralize the residual polishing liquid, prevent environmental pollution, and protect the safety of the experimenters, the first circulating water tank 18 and the second circulating water tank 24 are both made of acid and alkali resistant materials, the first circulating water tank 18 and the second circulating water tank 24 are used to hold water, the outlet of the polishing liquid tank 1 is connected to the inlet of the part tank 12, the outlet of the part tank 12 is connected to the inlet of the polishing liquid tank 1, the outlet of the first circulating water tank 18 is connected to the inlet of the part tank 12, the outlet of the part tank 12 is connected to the inlet of the waste liquid tank 16, the outlet of the part tank 12 is connected to the inlet of the first circulating water tank 18, the outlet of the second circulating water tank 24 is connected to the inlet of the part tank 12, and the outlet of the part tank 12 is connected to the inlet of the second circulating water tank 24.

[0035] Specifically, in this embodiment, the polishing liquid tank 1 is made of acid and alkali resistant material, and a liquid filling port is provided on the top of the polishing liquid tank 1, and polishing liquid can be added at any time. The polishing liquid is configured according to the chemical polishing formula of different materials. The polishing liquid tank 1 is located in a constant temperature water tank 2. The constant temperature water tank 2 is made of acid and alkali resistant material. The constant temperature water tank 2 is controlled by a PLC. The constant temperature water tank 2 is provided with a temperature sensor, a heating element, a cooling element and a temperature control panel, which can heat or cool the polishing liquid in the polishing liquid tank 1, set the required temperature, and keep the polishing liquid at a constant temperature.

[0036] This embodiment further includes a ventilation device 25, and the polishing liquid tank 1, the parts tank 12, the waste liquid tank 16, the first circulating water tank 18 and the second circulating water tank 24 are all located in the ventilation device 25. The ventilation device 25 can remove toxic and harmful gases and effectively protect the safety of the experimenters.

[0037] In this embodiment, the part groove 12 includes an inner groove and an outer groove arranged outside the inner groove, and the part 13 is placed in the inner groove. Both the inner groove and the outer groove are made of acid and alkali resistant materials.

[0038] In this embodiment, a pH meter 3, a first flow regulating valve 4, a thermometer 5, a first circulation pump 6, a first pressure controller 8, a flow meter 9 and a check valve 10 are provided on the pipeline connecting the outlet of the polishing liquid tank 1 and the inlet of the parts tank 12. The pH meter 3, the first flow regulating valve 4, the thermometer 5, the first circulation pump 6, the first pressure controller 8, the flow meter 9 and the check valve 10 are all made of acid and alkali resistant materials. The pH meter 3 can detect the concentration of the polishing liquid. If the concentration of the polishing liquid decreases during the polishing process, the polishing liquid can be added through the liquid filling port of the polishing liquid tank 1. The first flow regulating valve 4 can control the flow rate of the polishing liquid. The thermometer 5 can detect the temperature of the polishing liquid. The first pressure controller 8 can detect the pressure of the polishing liquid in the pipeline 7. The flow meter 9 can detect the flow rate of the polishing liquid in the pipeline 7. If the temperature decreases, the temperature of the constant temperature water tank 2 is adjusted to heat the polishing liquid. If the temperature rises, the temperature of the constant temperature water tank 2 is adjusted to cool the polishing liquid. The check valve 10 can prevent the polishing liquid from flowing back and damaging the flow meter 9. Depending on the complexity of the part 13 , different pressures and flows can be selected to chemically polish the part 13 .

[0039] This embodiment also includes a tee 20, a first interface of the tee 20 is connected to the outlet of the first circulating water tank 18, a second flow regulating valve 19 is provided on the pipeline between the first interface of the tee 20 and the outlet of the first circulating water tank 18, a second interface of the tee 20 is connected to the outlet of the second circulating water tank 24, a third flow regulating valve 23 is provided on the pipeline between the second interface of the tee 20 and the outlet of the second circulating water tank 24, and the third interface of the tee 20 is connected to the inlet of the parts tank 12. The second flow regulating valve 19 and the third flow regulating valve 23 are both made of acid and alkali resistant materials, the second flow regulating valve 19 can control the flow of the first circulating water, and the third flow regulating valve 23 can control the flow of the second circulating water.

[0040] In this embodiment, a first three-way valve 11 is provided at the inlet of the parts slot 12, a first interface of the first three-way valve 11 is connected to the inlet of the parts slot 12, a second interface of the first three-way valve 11 is connected to the check valve 10, a second circulation pump 21 and a second pressure controller 22 are provided on the pipeline between the third interface of the first three-way valve 11 and the third interface of the three-way valve 20, and the third interface of the first three-way valve 11 is connected to the second circulation pump 21. The second pressure controller 22 is made of acid and alkali resistant material, and the second pressure controller 22 can control the pressure of the circulating water.

[0041] In this embodiment, a second three-way valve 14 is provided at the outlet of the parts tank 12, and a third three-way valve 15 and a fourth three-way valve 17 are provided on the pipeline between the inlet of the waste liquid tank 16 and the inlet of the first circulating water tank 18; the second three-way valve 14 is respectively connected to the outlet of the parts tank 12, the second interface of the third three-way valve 15 and the inlet of the polishing liquid tank 1; the first interface of the third three-way valve 15 is connected to the inlet of the waste liquid tank 16, the third interface of the third three-way valve 15 is connected to the first interface of the fourth three-way valve 17, the second interface of the fourth three-way valve 17 is connected to the inlet of the second circulating water tank 24, and the third interface of the fourth three-way valve 17 is connected to the inlet of the first circulating water tank 18.

[0042] In this embodiment, the first three-way valve 11, the second three-way valve 14, the third three-way valve 15 and the fourth three-way valve 17 are all manual three-way valves. The first three-way valve 11, the second three-way valve 14, the third three-way valve 15 and the fourth three-way valve 17 are all made of acid and alkali resistant materials, and the first three-way valve 11, the second three-way valve 14, the third three-way valve 15 and the fourth three-way valve 17 are used to control the flow direction of the polishing liquid and the flow direction of the circulating water.

[0043] In this embodiment, a time relay is used to control the working time and stop time of the first circulating pump 6 and the second circulating pump 21. The working time and stop time are adjustable. The first circulating pump 6 works once, and the second circulating pump 21 works three times.

[0044] In this embodiment, the pipelines at various locations and the second circulation pump 21 are all made of acid- and alkali-resistant materials.

[0045] The chemical polishing device of this embodiment can realize cyclic polishing on the complex surfaces of various parts 13, thereby improving the quality of the outer surfaces of the parts. Example

[0046] This embodiment provides a polishing method using the chemical polishing device of embodiment 1, comprising the following steps:

[0047] Polishing: Prepare the required polishing liquid according to the chemical polishing formula of the material to be polished, set the temperature in the constant temperature water tank 2 according to the temperature required for chemical polishing, perform water bath temperature control on the polishing liquid tank 1, adjust the first flow regulating valve 4 and the first pressure controller 8, set the working time of the first circulation pump 6, control the first three-way valve 11 and the second three-way valve 14, drain the polishing liquid into the part tank 12, perform chemical polishing on the complex surface of the part 13 in the part tank 12, and then return the polishing liquid in the part tank 12 to the polishing liquid tank 1; when the polishing of the polishing liquid circulation is about to end, adjust the first flow regulating valve 4 to make the polishing liquid in the part tank 12 as little as possible;

[0048] Waste liquid cleaning: Since the concentration of the polishing liquid remaining in the part tank 12 and the pipeline 7 is relatively high after the polishing liquid is circulated and polished, the second flow regulating valve 19 and the second pressure controller 22 are adjusted, the first working time of the second circulation pump 21 is set, and the first three-way valve 11, the second three-way valve 14 and the third three-way valve 15 are controlled. The pure water in the first circulating water tank 18 is used to clean the polishing liquid remaining in the part tank 12 and the pipeline 7. After the cleaning is completed, the residual polishing liquid flows back to the waste liquid tank 16. The waste liquid tank 16 contains a neutralizer, which can neutralize the residual polishing liquid to prevent environmental pollution and ensure the safety of the experimenters;

[0049] Primary circulating water cleaning: adjust the second flow regulating valve 19 and the second pressure controller 22, set the second working time of the second circulating pump 21, control the first three-way valve 11, the second three-way valve 14, the third three-way valve 15 and the fourth three-way valve 17, divert the water in the first circulating water tank 18 to the parts tank 12, perform primary circulating water cleaning on the complex surface of the parts 13 in the parts tank 12, and after the cleaning is completed, the primary circulating water flows back to the first circulating water tank 18;

[0050] Secondary circulating water cleaning: adjust the third flow regulating valve 23 and the second pressure controller 22, set the third working time of the second circulating pump 21, control the first three-way valve 11, the second three-way valve 14, the third three-way valve 15 and the fourth three-way valve 17, and divert the water in the second circulating water tank 24 to the parts tank 12, and perform secondary circulating water cleaning on the complex surface of the parts 13 in the parts tank 12. After the cleaning is completed, the secondary circulating water flows back to the second circulating water tank 24;

[0051] Drying: Take out the part 13 in the part slot 12, dry it, and evaluate the surface quality of the part 13.

[0052] The invention has the advantages of easily controllable polishing time, polishing temperature, pressure and flow rate, simple operation, high polishing efficiency for complex outer surfaces of parts and good polishing effect. Example

[0053] like Figure 2As shown, the difference between this embodiment and embodiment one is that: in this embodiment, a plurality of inlet reducers are provided at the inlet of the part groove 12, and the inlet reducers are made of corrosion-resistant material. For example, three inlet reducers are provided, and the three inlet reducers are respectively a first inlet reducer 28, a second inlet reducer 29 and a third inlet reducer 30. The first inlet reducer 28 is connected to the first interface of the first four-way 27, the second inlet reducer 29 is connected to the second interface of the first four-way 27, the third inlet reducer 30 is connected to the third interface of the first four-way 27, and the fourth interface of the first four-way 27 is connected to the third interface of the three-way 20. The size of one end of the inlet reducer is larger than the size of the other end of the inlet reducer. One end of the inlet reducer is used to connect to the polishing liquid groove 1, the first circulating water groove 18 and the second circulating water groove 24, and the other end of the inlet reducer is used to connect to one end of the flow channel inside the part 13.

[0054] In this embodiment, a plurality of outlet reducers are provided at the outlet of the part slot 12, and the outlet reducers are made of corrosion-resistant material. For example, three outlet reducers are provided, and the three outlet reducers are respectively a first outlet reducer 31, a second outlet reducer 32 and a third outlet reducer 33. The first outlet reducer 31 is connected to the first interface of the second four-way valve 34, the second outlet reducer 32 is connected to the second interface of the second four-way valve 34, the third outlet reducer 33 is connected to the third interface of the second four-way valve 34, and the fourth interface of the second four-way valve 34 is connected to the second three-way valve 14. The size of one end of the outlet reducer is larger than the size of the other end of the outlet reducer. One end of the outlet reducer is used to connect to the polishing liquid tank 1, the waste liquid tank 16, the first circulating water tank 18 and the second circulating water tank 24, and the other end of the outlet reducer is used to connect to the other end of the flow channel inside the part 13.

[0055] In this embodiment, the large-diameter pipeline 7 is transformed into the required small-diameter pipeline 7 by the inlet reducer and the outlet reducer. The types and numbers of the inlet reducer and the outlet reducer are set according to the complexity of the complex internal flow channel of the part 13.

[0056] In this embodiment, a pH meter 3, a first flow regulating valve 4, a first two-way solenoid valve 26, a thermometer 5, a first circulation pump 6, a first pressure controller 8, a flow meter 9 and a check valve 10 are arranged on the pipeline connecting the outlet of the polishing liquid tank 1 and the inlet of the parts tank 12. The first two-way solenoid valve 26 is made of acid and alkali resistant material, and the first two-way solenoid valve 26 can switch the flow of the polishing liquid.

[0057] In this embodiment, a second flow regulating valve 19 and a second two-way solenoid valve 35 are provided on the pipeline between the first interface of the tee 20 and the outlet of the first circulating water tank 18, and a third flow regulating valve 23 and a third two-way solenoid valve 36 are provided on the pipeline between the second interface of the tee 20 and the outlet of the second circulating water tank 24. The second two-way solenoid valve 35 and the third two-way solenoid valve 36 are both made of acid and alkali resistant materials, and the second two-way solenoid valve 35 controls the switch of the first circulating water, and the third two-way solenoid valve 36 controls the switch of the second circulating water.

[0058] In this embodiment, the first three-way valve 11, the second three-way valve 14, the third three-way valve 15 and the fourth three-way valve 17 are two-inlet-one-outlet three-way solenoid valves or one-inlet-two-outlet three-way solenoid valves.

[0059] PLC is used to control the working time and stop time of the first two-way solenoid valve 26, the second two-way solenoid valve 35, the third two-way solenoid valve 36, the first three-way valve 11, the second three-way valve 14, the third three-way valve 15 and the fourth three-way valve 17. The working time and stop time are adjustable, and a jog button is provided to check the quality of each solenoid valve.

[0060] The chemical polishing device of this embodiment can realize cyclic polishing of complex internal flow channels of various calibers, thereby improving the surface quality of the internal flow channels of the part 13. Example

[0061] This embodiment provides a polishing method using the chemical polishing device of embodiment 3, comprising the following steps:

[0062] Polishing: according to the complexity of the internal flow channel, the types and quantities of the inlet reducer and the outlet reducer are set, the required polishing liquid is prepared according to the chemical polishing formula of the material to be polished, the temperature in the constant temperature water tank 2 is set according to the temperature required for chemical polishing, the polishing liquid tank 1 is temperature-controlled in a water bath, the first flow regulating valve 4 and the first pressure controller 8 are adjusted, the working time of the first circulation pump 6 is set, the first two-way solenoid valve 26, the first three-way valve 11 and the second three-way valve 14 are controlled, the polishing liquid is drained into the part tank 12, the complex surface of the part 13 in the part tank 12 is chemically polished, and then the polishing liquid in the part tank 12 is returned to the polishing liquid tank 1;

[0063] Waste liquid cleaning: Since the concentration of the polishing liquid remaining in the part tank 12 and the pipeline 7 is relatively high after the polishing liquid is circulated and polished, the second flow regulating valve 19 and the second pressure controller 22 are adjusted, the first working time of the second circulation pump 21 is set, and the working time of the second two-way solenoid valve 35, the first three-way valve 11, the second three-way valve 14 and the third three-way valve 15 are controlled. The pure water in the first circulating water tank 18 is used to clean the inner flow channel of the part 13 of the part tank 12 and the residual polishing liquid in the pipeline 7. After the cleaning is completed, the residual polishing liquid flows back to the waste liquid tank 16. The waste liquid tank 16 contains a neutralizer, which can neutralize the residual polishing liquid to prevent environmental pollution and ensure the safety of the experimenters;

[0064] Primary circulating water cleaning: adjust the second flow regulating valve 19 and the second pressure controller 22, set the second working time of the second circulating pump 21, control the working time of the third two-way solenoid valve 36, the first three-way valve 11, the second three-way valve 14, the third three-way valve 15 and the fourth three-way valve 17, divert the water in the first circulating water tank 18 to the parts tank 12, perform primary circulating water cleaning on the complex surface of the parts 13 in the parts tank 12, and after the cleaning is completed, the primary circulating water flows back to the first circulating water tank 18;

[0065] Secondary circulating water cleaning: adjust the third flow regulating valve 23 and the second pressure controller 22, set the third working time of the second circulating pump 21, control the working time of the third two-way solenoid valve 36, the first three-way valve 11, the second three-way valve 14, the third three-way valve 15 and the fourth three-way valve 17, and divert the water in the second circulating water tank 24 to the parts tank 12, and perform secondary circulating water cleaning on the complex surface of the parts 13 in the parts tank 12. After the cleaning is completed, the secondary circulating water flows back to the second circulating water tank 24;

[0066] Drying: Take out the part 13 in the part slot 12, dry it, and evaluate the surface quality of the inner flow channel of the part 13.

[0067] The advantages of the present invention are that it can meet the polishing needs of complex internal flow channels of different calibers, the polishing time, polishing temperature, pressure and flow rate can be easily controlled, the operation is simple, the polishing efficiency of complex internal flow channel parts is high, and the polishing effect is good.

[0068] The present invention uses specific examples to illustrate the principles and implementation methods of the present invention. The above examples are only used to help understand the method and core ideas of the present invention. At the same time, for those skilled in the art, according to the ideas of the present invention, there will be changes in the specific implementation methods and application scope. In summary, the content of this specification should not be understood as limiting the present invention.

Claims

1. A chemical polishing device, characterized in that: include: A polishing liquid tank, a parts tank, a waste liquid tank, a first circulating water tank and a second circulating water tank, the polishing liquid tank is used to hold polishing liquid, the parts tank is used to hold parts, the waste liquid tank is used to hold a neutralizer and to collect waste liquid, the first circulating water tank and the second circulating water tank are used to hold water, the outlet of the polishing liquid tank is connected to the inlet of the parts tank, the outlet of the parts tank is connected to the inlet of the polishing liquid tank, the outlet of the first circulating water tank is connected to the inlet of the parts tank, the outlet of the parts tank is connected to the inlet of the waste liquid tank, the outlet of the parts tank is connected to the inlet of the first circulating water tank, the outlet of the second circulating water tank is connected to the inlet of the parts tank, and the outlet of the parts tank is connected to the inlet of the second circulating water tank; It also includes a tee, wherein a first interface of the tee is connected to the outlet of the first circulating water tank, a second flow regulating valve is provided on the pipeline between the first interface of the tee and the outlet of the first circulating water tank, a second interface of the tee is connected to the outlet of the second circulating water tank, a third flow regulating valve is provided on the pipeline between the second interface of the tee and the outlet of the second circulating water tank, and the third interface of the tee is connected to the inlet of the parts tank; Alternatively, it further comprises a tee, wherein a first interface of the tee is connected to an outlet of the first circulating water tank, a second flow regulating valve and a second two-way solenoid valve are arranged on a pipeline between the first interface of the tee and the outlet of the first circulating water tank, a second interface of the tee is connected to an outlet of the second circulating water tank, a third flow regulating valve and a third two-way solenoid valve are arranged on a pipeline between the second interface of the tee and the outlet of the second circulating water tank, and the third interface of the tee is connected to an inlet of the parts tank; A first three-way valve is provided at the inlet of the parts tank, the first three-way valve is respectively connected to the outlet of the polishing liquid tank, the inlet of the parts tank and the third interface of the three-way valve, and a second circulation pump and a second pressure controller are provided on the pipeline between the first three-way valve and the three-way valve; A second three-way valve is arranged at the outlet of the parts tank, and the second three-way valve is respectively connected to the outlet of the parts tank, the inlet of the waste liquid tank and the inlet of the polishing liquid tank.

2. The chemical polishing device according to claim 1, characterized in that: A plurality of inlet reducers are provided at the inlet of the part tank, the size of one end of the inlet reducer is larger than the size of the other end of the inlet reducer, one end of the inlet reducer is used to connect with the polishing liquid tank, the first circulating water tank and the second circulating water tank, and the other end of the inlet reducer is used to connect with the flow channel inside the part; A plurality of outlet reducers are provided at the outlet of the part tank, the size of one end of the outlet reducer is larger than the size of the other end of the outlet reducer, one end of the outlet reducer is used to connect with the polishing liquid tank, the waste liquid tank, the first circulating water tank and the second circulating water tank, and the other end of the outlet reducer is used to connect with the flow channel inside the part.

3. The chemical polishing device according to claim 1, characterized in that: The polishing liquid tank is located in a constant temperature water tank.

4. The chemical polishing device according to claim 1, characterized in that: It also includes a ventilation device, in which the polishing liquid tank, the parts tank, the waste liquid tank, the first circulating water tank and the second circulating water tank are all located.

5. The chemical polishing device according to claim 1, characterized in that: A pH meter, a first flow regulating valve, a thermometer, a first circulation pump, a first pressure controller, a flow meter and a check valve are arranged on a pipeline connecting the outlet of the polishing liquid tank and the inlet of the parts tank; Alternatively, a pH meter, a first flow regulating valve, a first two-way solenoid valve, a thermometer, a first circulation pump, a first pressure controller, a flow meter and a check valve are arranged on the pipeline connecting the outlet of the polishing liquid tank and the inlet of the parts tank.

6. The chemical polishing device according to claim 1, characterized in that: A third three-way valve and a fourth three-way valve are provided on the pipeline between the inlet of the waste liquid tank and the inlet of the first circulating water tank; The first interface of the third three-way valve is connected to the inlet of the waste liquid tank, the second interface of the third three-way valve is used to connect to the outlet of the parts tank, the third interface of the third three-way valve is connected to the first interface of the fourth three-way valve, the second interface of the fourth three-way valve is connected to the inlet of the second circulating water tank, and the third interface of the fourth three-way valve is connected to the inlet of the first circulating water tank.

7. A polishing method using the chemical polishing device according to any one of claims 1 to 6, characterized in that: The following steps are involved: Polishing: drain the polishing liquid in the polishing liquid tank into the parts tank, polish the parts in the parts tank, and drain the polishing liquid in the parts tank into the polishing liquid tank; Waste liquid cleaning: drain the water in the first circulating water tank into the parts tank, clean the polishing liquid remaining in the parts tank and the pipeline, and after the cleaning is completed, drain the remaining polishing liquid into the waste liquid tank; Primary circulating water cleaning: the water in the first circulating water tank is drained into the parts tank to clean the parts in the parts tank. After the cleaning is completed, the water in the parts tank is drained into the first circulating water tank; Secondary circulating water cleaning: The water in the second circulating water tank is drained into the parts tank to clean the parts in the parts tank. After the cleaning is completed, the water in the parts tank is drained into the second circulating water tank; Drying: Take out the parts in the parts slot and dry them.

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