A preparation system for silicon-oxygen negative electrode materials for lithium batteries

Abstract

The present invention is applicable to the technical field of lithium electronic battery preparation, and provides a preparation system for lithium battery silicon oxygen negative electrode materials, including a chemical vapor deposition device; the chemical vapor deposition device includes an upper insulation board and a lower insulation board; a conical storage tank is fixed on the top of the upper insulation board; guide grooves are evenly arranged on the inner bottom surface of the conical storage tank; an adsorption part is slidably arranged inside the guide groove; a cleaning part is slidably arranged on the peripheral side of the adsorption part; a plurality of guide parts adapted to the corresponding cleaning parts are evenly fixed on the inner top of the upper insulation board; the device adsorbs silicon oxygen raw materials in the adsorption groove through the adsorption part, and the silicon oxygen raw materials are sent into the preparation chamber by controlling the synchronous lifting and lowering of each group of adsorption parts, and the reaction gas reacts with the encapsulation layer to form a carbon-containing film, which replaces the traditional method of directly reacting the reaction gas with the silicon oxygen raw materials piled together, thereby increasing the contact area between the silicon oxygen raw materials and the reaction gas, and improving the uniformity of the deposition composite on the surface of the deposition receptor.

Description

Technical Field

[0001] The present invention relates to the technical field of lithium electronic battery preparation, and more specifically, to a preparation system for lithium battery silicon oxygen negative electrode material. Background Art

[0002] Lithium-ion batteries occupy a dominant position in the field of power supply for portable electronic devices due to their outstanding advantages such as high energy density, excellent cycle life, high operating voltage, low self-discharge rate, and environmental friendliness. They are also an ideal power source for electric vehicles and energy storage.

[0003] Silicon monoxide (SiO) also has good lithium intercalation and deintercalation capabilities. Its volume expansion in the lithium intercalation state is smaller than that of crystalline silicon (about 200%), and it has good cycle stability and high reversible capacity. As an active material, single Si further reacts electrochemically with lithium ions. The Si generated by the reaction determines the electrochemical lithium storage capacity of silicon-based materials; Li2O and lithium silicates do not participate in the reaction, but can act as a buffer medium to inhibit the volume expansion of silicon, thereby improving the material's cycle performance.

[0004] At present, the preparation of Si-O negative electrode materials for lithium batteries mostly adopts chemical vapor deposition (CVD) process. However, since the deposition acceptor carbon matrix can only be statically deposited in the CVD reaction chamber, only a layer of sediment is attached to the surface of the deposition acceptor, and the deposition composite is unevenly covered on the surface of the deposition acceptor, and the dispersion problem of the deposition composite cannot be completely solved. Summary of the invention

[0005] In view of the shortcomings of the prior art, the purpose of the present invention is to provide a preparation system for silicon oxygen negative electrode materials for lithium batteries. The crushed silicon oxygen raw materials are piled up in a conical storage tank, and the negative pressure inside the adsorption part adsorbs the silicon oxygen raw materials in the adsorption groove, so that a wrapping layer is formed on the side surface of the adsorption cylinder. By controlling the synchronous lifting and lowering of each group of adsorption parts, a certain amount of silicon oxygen raw materials are delivered to the preparation chamber. The reaction gas reacts in the chemical vapor deposition furnace to produce a deposition composite, which is introduced into the preparation chamber through the carrier gas and reacts with the wrapping layer to form a carbon-containing film, replacing the traditional method of directly reacting the reaction gas with the stacked silicon oxygen raw materials, thereby increasing the contact area between the silicon oxygen raw materials and the reaction gas, and improving the uniformity of the deposition composite on the surface of the deposition receptor.

[0006] To achieve the above object, the present invention provides the following technical solutions:

[0007] A preparation system for silicon-oxygen negative electrode materials for lithium batteries, comprising a chemical vapor deposition device; the chemical vapor deposition device comprises an upper insulation plate and a lower insulation plate parallel to each other; a chemical vapor deposition furnace and an annular insulation plate are coaxially fixed between the upper insulation plate and the lower insulation plate; a preparation cavity is formed between the upper insulation plate, the lower insulation plate and the annular insulation plate.

[0008] A conical storage tank is fixed on the top of the upper insulation board; guide grooves are evenly arranged on the inner bottom surface of the conical storage tank; an adsorption part is slidably arranged inside the guide groove; a cleaning part is slidably arranged on the peripheral side of the adsorption part; and a plurality of guide parts matching the corresponding cleaning parts are evenly fixed on the inner top of the upper insulation board.

[0009] A number of rotating shafts are evenly penetrated and rotated between the upper insulation plate and the lower insulation plate; the cleaning part includes a collar; a U-shaped plate is fixed to the side surface of the collar; an extension rod is fixed to the side surface of the U-shaped plate; a first ball head is fixed to the end of the extension rod; a spiral groove matching the corresponding first ball head is opened on the side surface of the rotating shaft.

[0010] The adjacent side surfaces of the rotating shaft are respectively fixed with a first storage tray and a second storage tray; the first storage tray is placed below the second storage tray; the inner side surface of the annular heat insulation plate and the outer side surface of the chemical vapor deposition furnace are evenly provided with a number of arc grooves matching the corresponding first storage tray and the second storage tray.

[0011] The present invention is further configured as follows: a sealing cover is fixed to the top of the conical storage tank by fastening bolts; a controller and an electric push rod are installed on the top of the sealing cover in sequence; a baffle is fixed to the telescopic end of the electric push rod; and a vertical rod is fixed to the bottom surface of the baffle.

[0012] Slide rods are symmetrically fixed on the surface of the sealing cover; a gas collecting ring that slidably cooperates with the two slide rods is fixed at the bottom end of the vertical rod; ear plates are symmetrically fixed on the circumferential side of the gas collecting ring; and sliding holes that slidably cooperate with the slide rods are opened on the surface of the ear plates.

[0013] An exhaust pipe is provided on the circumferential side of the gas collecting ring; the exhaust pipe is connected to an external vacuum pump through a hose; and the output end of the controller is electrically connected to the electric push rod and the external vacuum pump respectively.

[0014] The present invention is further configured as follows: the adsorption portion includes an adsorption cylinder; a slide rail that slidably cooperates with the U-shaped plate is fixed to the circumferential side of the adsorption cylinder, and an air supply pipe is provided between the top end thereof and the bottom surface of the gas collecting ring.

[0015] A plurality of limiting holes which are slidably matched with the gas delivery pipe are evenly arranged on the top of the sealing cover; a sliding groove which is slidably matched with the sliding rail is arranged on the inner wall of the guide groove.

[0016] A plurality of adsorption grooves are evenly arranged on the side surface of the adsorption cylinder; and a plurality of adsorption holes are evenly arranged on the inner wall of the adsorption groove.

[0017] The present invention is further configured as follows: a rotating ring is slidably arranged inside the extension rod; annular rails that slide with the extension rod are fixed on two opposite sides of the rotating ring; and a plurality of curved guide plates that slide with the extension rod are evenly fixed on the inner side of the rotating ring.

[0018] The collar is in sliding cooperation with the adsorption cylinder; a plurality of guide rods are evenly and slidably arranged on the circumferential side of the collar; a scraper which is in sliding cooperation with the adsorption groove is fixed on one end of the guide rod, and a second ball head is fixed on the other end; a return spring which is sleeved on the corresponding guide rod is fixed between the second ball head and the outer circumferential side of the collar.

[0019] The present invention is further configured as follows: an arc-shaped rod coaxial with the ring is fixed on the peripheral side of the extension rod; a stopper is fixed on the end of the arc-shaped rod; a connecting plate slidingly matched with the arc-shaped rod is fixed on the outer peripheral side of the rotating ring; and a third ball head is fixed on the end of the connecting plate.

[0020] The guide part comprises an arc-shaped fixing plate, an oblique arc-shaped guide plate and a straight arc-shaped guide plate which are coaxial with the collar from top to bottom; an arc-shaped spring sleeved on the arc-shaped rod is fixed between the connecting plate and the extension rod.

[0021] The present invention is further configured as follows: a driven gear is fixed on the top of the rotating shaft; an annular plate is rotatably arranged on the top of the upper heat insulation plate; an inner gear ring meshing with each driven gear is fixed on the inner circumferential side of the annular plate.

[0022] A servo motor electrically connected to the output end of the controller is installed on the top of the upper heat insulation plate; a driving gear is fixed to the output end of the servo motor; and an outer gear ring meshing with the driving gear is fixed to the outer peripheral side of the annular plate.

[0023] The present invention is further configured as follows: an electric heating wire electrically connected to the controller via an output end is installed inside the chemical vapor deposition furnace, and a temperature sensor electrically connected to the controller input end is installed inside the chemical vapor deposition furnace; a catalytic initiator is placed inside the chemical vapor deposition furnace.

[0024] Exhaust pipes are evenly arranged on the inner side of the chemical vapor deposition furnace; an exhaust gas pipeline is arranged on the top of the upper insulation board; the exhaust gas pipeline is connected to the exhaust end of the external exhaust gas extraction pump through the pipeline.

[0025] A plurality of pumping pipes are evenly arranged through the outer peripheral side of the annular heat insulation plate; the pumping pipes are connected to an external pumping pump through a feed pipe.

[0026] The present invention is further configured as follows: a mounting opening connected to the chemical vapor deposition furnace is provided on the top of the upper heat insulation plate; and a gas supply device is fixedly installed on the mounting opening by fastening bolts.

[0027] The gas supply device includes a sealing plate covering the mounting opening; a support plate is fixed on the surface of the sealing plate; a reaction gas supply tank and a carrier gas supply tank are fixed on the top of the support plate in sequence; the reaction gas supply tank and the carrier gas supply tank are both provided with air supply pipes passing through the sealing plate; and both air supply pipes are provided with solenoid valves electrically connected to the controller.

[0028] The advantages of the present invention are:

[0029] 1. The present invention accumulates the crushed silicon-oxygen raw materials into a conical storage tank, and the negative pressure inside the adsorption part adsorbs the silicon-oxygen raw materials into the adsorption groove, so that a wrapping layer is formed on the side surface of the adsorption cylinder. A fixed amount of silicon-oxygen raw materials is delivered into the preparation chamber by controlling the synchronous lifting and lowering of each group of adsorption parts. The reaction gas reacts in the chemical vapor deposition furnace to produce a deposition compound, which is introduced into the preparation chamber through the carrier gas and reacts with the wrapping layer to form a carbon-containing film, thereby replacing the traditional method in which the reaction gas directly reacts with the accumulated silicon-oxygen raw materials, thereby increasing the contact area between the silicon-oxygen raw materials and the reaction gas, and improving the uniformity of the deposition compound covering the surface of the deposition receptor.

[0030] 2. After the carbon-containing film is formed in the present invention, the driving gear is controlled to rotate, driving each group of driven gears to rotate, thereby driving each group of rotating shafts together with the spiral grooves thereon to rotate. The rotating spiral grooves drive the first ball head to descend, thereby driving the scraper in the cleaning part to scrape the material in the adsorption tank. During this process, each group of storage trays rotate synchronously, so that the scraped material is evenly laid on the surface of the corresponding storage tray to continue to react with the deposition compound, further improving the uniformity of the deposition compound covering the surface of the deposition receptor. BRIEF DESCRIPTION OF THE DRAWINGS

[0031] Figure 1 It is a structural schematic diagram of a system for preparing silicon-oxygen negative electrode materials for lithium batteries of the present invention.

[0032] Figure 2 For the present invention Figure 1 Schematic diagram of the structure from the front view.

[0033] Figure 3 For the present invention Figure 2 A magnified image of area A.

[0034] Figure 4 For the present invention Figure 1 Schematic diagram of the structure from another angle.

[0035] Figure 5 It is a schematic structural diagram of the chemical vapor deposition device of the present invention.

[0036] Figure 6 It is a schematic structural diagram of the adsorption part of the present invention.

[0037] Figure 7 It is a schematic structural diagram of the cleaning unit of the present invention.

[0038] Figure 8 It is a structural schematic diagram of the guide part of the present invention.

[0039] Fig. 9 It is a structural schematic diagram of the adsorption part, cleaning part and guide part assembly of the present invention.

[0040] Fig.10 It is a schematic structural diagram of the gas supply device of the present invention.

[0041] Fig.11 It is a schematic structural diagram of the gas collecting ring of the present invention.

[0042] In the figure: 1. chemical vapor deposition device; 2. upper heat insulation board; 3. lower heat insulation board; 4. chemical vapor deposition furnace; 5. annular heat insulation board; 6. conical storage tank; 7. guide groove; 8. adsorption part; 9. cleaning part; 10. guide part; 11. rotating shaft; 12. sleeve ring; 13. U-shaped plate; 14. extension rod; 15. first ball head; 16. spiral groove; 17. first storage tray; 18. second storage tray; 19. sealing cover; 20. controller; 21. electric push rod; 22. baffle; 23. vertical rod; 24. slide rod; 25. gas collecting ring; 26. ear plate; 27. slide hole; 28. exhaust pipe; 29. ​​adsorption cylinder; 30. slide rail; 31. gas pipe; 32. limit hole; 33. arc groove; 34. slide Groove; 35, adsorption groove; 36, adsorption hole; 37, swivel; 38, annular rail; 39, curved guide plate; 40, guide rod; 41, scraper; 42, second ball head; 43, return spring; 44, arc rod; 45, stopper; 46, connecting plate; 47, third ball head; 48, arc fixing plate; 49, oblique arc guide plate; 50, straight arc guide plate; 51, arc spring; 52, driven gear; 53, annular plate; 54, servo motor; 55, driving gear; 56, air supply pipe; 57, carrier gas supply tank; 58, exhaust pipe; 59, extraction pipe; 60, installation port; 61, gas supply device; 62, sealing plate; 63, support plate; 64, reaction gas supply tank; 65, exhaust gas pipeline. DETAILED DESCRIPTION

[0043] It should be noted that, in the absence of conflict, the embodiments and features in the embodiments of the present application may be combined with each other. The present invention will be described in detail below with reference to the accompanying drawings and in combination with the embodiments.

[0044] It should be noted that, unless otherwise specified, all technical and scientific terms used in this application have the same meanings as commonly understood by ordinary technicians in the technical field to which this application belongs.

[0045] In the present invention, unless otherwise specified, the directions used, such as "up" and "down", usually refer to the directions shown in the drawings, or to the vertical, perpendicular or gravity directions; similarly, for ease of understanding and description, "left" and "right" usually refer to the left and right shown in the drawings; "inside" and "outside" refer to the inside and outside relative to the outline of each component itself, but the above-mentioned directions are not used to limit the present invention.

[0046] For example, see Figure 1-11 , the present invention provides the following technical solutions:

[0047] A preparation system for silicon-oxygen negative electrode materials for lithium batteries, specifically, comprises a chemical vapor deposition device 1; the chemical vapor deposition device 1 comprises an upper insulation board 2 and a lower insulation board 3 which are parallel to each other; a chemical vapor deposition furnace 4 and an annular insulation board 5 are coaxially fixed between the upper insulation board 2 and the lower insulation board 3; a preparation chamber is formed between the upper insulation board 2, the lower insulation board 3 and the annular insulation board 5; a conical material storage tank 6 is fixed on the top of the upper insulation board 2; guide grooves 7 are evenly provided on the inner bottom surface of the conical material storage tank 6; an adsorption portion 8 is slidably provided inside the guide groove 7; a cleaning portion 9 is slidably provided on the side surface around the adsorption portion 8; a plurality of guide portions 10 which are compatible with the corresponding cleaning portions 9 are evenly fixed on the inner top of the upper insulation board 2 A number of rotating shafts 11 are evenly arranged to penetrate and rotate between the upper insulation plate 2 and the lower insulation plate 3; the cleaning part 9 includes a collar 12; a U-shaped plate 13 is fixed to the side surface of the collar 12; an extension rod 14 is fixed to the side surface of the U-shaped plate 13; a first ball head 15 is fixed to the end of the extension rod 14; a spiral groove 16 matching the corresponding first ball head 15 is opened on the side surface of the rotating shaft 11; a first receiving tray 17 and a second receiving tray 18 are respectively fixed to the side surfaces of adjacent rotating shafts 11; the first receiving tray 17 is placed below the second receiving tray 18; a number of arc grooves 33 matching the corresponding first receiving tray 17 and the second receiving tray 18 are evenly arranged on the inner side surface of the annular insulation plate 5 and the outer side surface of the chemical vapor deposition furnace 4.

[0048] Working principle of the first embodiment:

[0049] The crushed silicon-oxygen raw materials are piled into a conical storage tank 6, and the negative pressure inside the adsorption part 8 adsorbs the silicon-oxygen raw materials. A certain amount of silicon-oxygen raw materials are delivered into the preparation chamber by controlling the synchronous lifting and lowering of each group of adsorption parts 8. The reaction gas reacts in the chemical vapor deposition furnace 4 to produce a deposition composite, which is introduced into the preparation chamber through the carrier gas and reacts with the encapsulation layer to form a carbon-containing film, thereby replacing the traditional method in which the reaction gas directly reacts with the stacked silicon-oxygen raw materials, thereby increasing the contact area between the silicon-oxygen raw materials and the reaction gas, and improving the uniformity of the deposition composite on the surface of the deposition receptor.

[0050] After the carbon-containing film is formed, each group of driven gears is controlled to rotate, driving each group of rotating shafts 11 together with the spiral grooves 16 thereon to rotate. The rotating spiral grooves 16 drive the first ball head 15 to descend, thereby driving the cleaning part 9 to scrape the material. During this process, each group of storage trays rotates synchronously, so that the scraped material is evenly laid on the surface of the corresponding storage tray to continue to react with the reaction gas, further improving the uniformity of the deposition composite on the surface of the deposition receptor.

[0051] For example 2, please refer to Figure 1-11 , this embodiment 2 makes the following improvements on the basis of embodiment 1. Specifically, a sealing cover 19 is fixed to the top of the conical storage tank 6 by fastening bolts; a controller 20 and an electric push rod 21 are installed on the top of the sealing cover 19 in sequence; a baffle 22 is fixed to the telescopic end of the electric push rod 21; a vertical rod 23 is fixed to the bottom surface of the baffle 22; sliding rods 24 are symmetrically fixed to the surface of the sealing cover 19; a gas collecting ring 25 that slides with the two sliding rods 24 is fixed to the bottom end of the vertical rod 23; ear plates 26 are symmetrically fixed to the side surfaces of the gas collecting ring 25; sliding holes 27 that slide with the sliding rod 24 are opened on the surface of the ear plates 26; an exhaust pipe 28 is connected to the side surfaces of the gas collecting ring 25; the exhaust pipe 28 is connected to the external vacuum pump through a hose; the output end of the controller 20 is electrically connected to the electric push rod 21 and the external vacuum pump respectively.

[0052] The adsorption part 8 includes an adsorption cylinder 29; a slide rail 30 that slides with the U-shaped plate 13 is fixed on the side surface of the adsorption cylinder 29, and a gas pipe 31 is connected between the top of the adsorption cylinder 29 and the bottom surface of the gas collecting ring 25; a plurality of limit holes 32 that slide with the gas pipe 31 are evenly provided on the top of the sealing cover 19; a slide groove 34 that slides with the slide rail 30 is provided on the inner wall of the guide groove 7; a plurality of adsorption grooves 35 are evenly provided on the side surface of the adsorption cylinder 29; a plurality of adsorption holes 36 are evenly provided on the inner wall of the adsorption groove 35.

[0053] Working principle of the second embodiment:

[0054] In the initial state, each group of adsorption cylinders 29 is placed in the conical storage tank 6, and the external vacuum pump is controlled to start and evacuate the air collecting ring 25 and the inside of each group of adsorption cylinders 29, so that a negative pressure environment is formed inside each group of adsorption cylinders 29, thereby adsorbing the silicon oxide material in the conical storage tank 6 in the adsorption groove 35, so that a wrapping layer is formed for each group of adsorption grooves 35 on the outer peripheral side of the adsorption cylinder 29.

[0055] The electric push rod 21 is controlled to start and retract, driving the gas collecting ring 25 to descend along the slide rod 24, thereby driving each group of adsorption cylinders 29 to descend from the conical storage tank 6 into the preparation chamber. At this time, the top of each group of adsorption cylinders 29 blocks the corresponding guide groove 7 to complete the quantitative adsorption of the silicon-oxygen material, thereby increasing the contact area between the subsequent silicon-oxygen material and the reaction gas.

[0056] For example 3, please refer to Figure 1-11 , the third embodiment makes the following improvements on the basis of the second embodiment. Specifically, a swivel 37 is slidably provided inside the extension rod 14; an annular rail 38 that slides with the extension rod 14 is fixed on both opposite sides of the swivel 37; a plurality of curved guide plates 39 that slide with the extension rod 14 are evenly fixed on the inner peripheral side of the swivel 37; the collar 12 slides with the adsorption cylinder 29; a plurality of guide rods 40 are evenly penetrated and slidably provided on the peripheral side of the collar 12; a scraper 41 that slides with the adsorption groove 35 is fixed at one end of the guide rod 40, and a second ball head 42 is fixed at the other end thereof; a reset spring 43 that is sleeved on the corresponding guide rod 40 is fixed between the second ball head 42 and the outer peripheral side of the collar 12.

[0057] An arc-shaped rod 44 coaxial with the collar 12 is fixed to the side surface of the extension rod 14; a stopper 45 is fixed to the end of the arc-shaped rod 44; a connecting plate 46 slidingly matched with the arc-shaped rod 44 is fixed to the outer side surface of the rotating ring 37; a third ball head 47 is fixed to the end of the connecting plate 46; the guide part 10 includes an arc-shaped fixing plate 48 coaxial with the collar 12 from top to bottom, an oblique arc-shaped guide plate 49 and a straight arc-shaped guide plate 50; an arc-shaped spring 51 mounted on the arc-shaped rod 44 is fixed between the connecting plate 46 and the extension rod 14.

[0058] A driven gear 52 is fixed to the top of the rotating shaft 11; an annular plate 53 is rotatably provided on the top of the upper heat insulation plate 2; an inner gear ring is fixed to the inner peripheral side of the annular plate 53 and meshes with each driven gear 52; a servo motor 54 electrically connected to the output end of the controller 20 is installed on the top of the upper heat insulation plate 2; a driving gear 55 is fixed to the output end of the servo motor 54; an outer gear ring is fixed to the outer peripheral side of the annular plate 53 and meshes with the driving gear 55.

[0059] An electric heating wire electrically connected to the controller 20 through the output end is installed inside the chemical vapor deposition furnace 4, and a temperature sensor electrically connected to the input end of the controller 20 is installed inside the chemical vapor deposition furnace 4; a catalytic initiator is placed inside the chemical vapor deposition furnace 4; an exhaust pipe 58 is evenly penetrated through the inner side of the chemical vapor deposition furnace 4; a waste gas pipe 65 is penetrated and connected to the top of the upper insulation board 2; the waste gas pipe 65 is connected to the exhaust end of the external waste gas extraction pump through a pipe; a number of extraction pipes 59 are evenly penetrated through the outer side of the annular insulation board 5; the extraction pipe 59 is connected to the external extraction pump through a delivery pipe.

[0060] An installation port 60 connected to the chemical vapor deposition furnace 4 is provided on the top of the upper insulation plate 2; a gas supply device 61 is fixedly installed on the installation port 60 by fastening bolts; the gas supply device 61 includes a sealing plate 62 covering the installation port 60; a support plate 63 is fixed on the surface of the sealing plate 62; a reaction gas supply tank 64 and a carrier gas supply tank 57 are fixed on the top of the support plate 63 in sequence; the reaction gas supply tank 64 and the carrier gas supply tank 57 are both provided with an air supply pipe 56 passing through the sealing plate 62; both air supply pipes 56 are provided with an electromagnetic valve electrically connected to the controller 20.

[0061] Working principle of the third embodiment:

[0062] Before the quantitative adsorption of the silicon oxide material into the preparation chamber, the solenoid valve corresponding to the air delivery pipe 56 on the carrier gas supply tank 57 is opened, and the carrier gas is controlled to first be passed into the chemical vapor deposition furnace 4 and the preparation chamber in sequence, and at the same time, the external vacuum pump is controlled to discharge the air in the chemical vapor deposition furnace 4 and the preparation chamber through the exhaust gas delivery pipe 65; the electric heating wire is controlled to start, and the internal temperature of the chemical vapor deposition furnace 4 is monitored in real time through the temperature sensor. When the internal temperature reaches the set reaction temperature, the solenoid valve corresponding to the air delivery pipe 56 on the reaction gas supply tank 64 is controlled to open, so that the reaction gas enters the chemical vapor deposition furnace 4. The reaction gas reacts in the chemical vapor deposition furnace 4 to produce a deposition compound, which is transported into the preparation chamber through each group of exhaust pipes 58 by the carrier gas, thereby improving the uniform mixing efficiency of the deposition compound in the preparation chamber, and reacts with each group of encapsulation layers to form a carbon-containing film on the surface of the silicon oxide material, thereby improving the preparation efficiency.

[0063] During the descent of each group of adsorption cylinders 29, each group of scrapers 41 is stored in the sleeve ring 12, and the third ball head 47 is attached to the oblique side of the oblique arc guide plate 49. When each group of adsorption cylinders 29 is placed in the preparation chamber, the servo motor 54 is controlled to start, driving the driving gear 55 to rotate, thereby driving the outer gear ring together with the annular plate 53 to rotate synchronously, and then driving the inner gear ring to rotate, so that each group of driven gears 52 rotate synchronously, thereby driving each group of rotating shafts 11 together with the spiral groove 16 thereon to rotate, so that the first ball head 15 slides along the inside of the spiral groove 16, driving the cleaning part 9 to slide and descend along the slide rail 30. During the descent of the cleaning part 9, the third ball head 47 slides from the oblique arc guide plate 49 to the side of the straight arc guide plate 50. In this process, the third ball head 47 is driven The ball head 47 together with the connecting plate 46 slide along the arc rod 44, and the arc spring 51 is compressed, so that the second ball head 42 slides from the inner side of the rotating ring 37 to the curved guide plate 39, and the corresponding return spring 43 is compressed. Each group of scrapers 41 moves toward the direction close to the adsorption cylinder 29 until the scraper 41 is close to the adsorption groove 35. During the continuous descending process of the cleaning part 9, the scraper 41 is driven to scrape the material adsorbed on the inner wall of the adsorption groove 35. During this process, the corresponding first receiving tray 17 and the corresponding second receiving tray 18 rotate synchronously, so that the fallen material is evenly laid on the corresponding receiving tray, and further reacts with the deposition compound, thereby further improving the uniformity of the deposition compound covering the surface of the deposition receptor.

[0064] After the film is formed on the surface of the silicon oxide material, the corresponding waste gas in the preparation chamber is extracted through the waste gas pipe 65 by an external vacuum pump, and the silicon oxide negative electrode material is extracted from the corresponding storage tray by controlling and starting the external vacuum pump, thereby improving the preparation efficiency.

[0065] Obviously, the above-described embodiments are only a part of the embodiments of the present invention, rather than all the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work should fall within the scope of protection of the present invention.

[0066] It should be noted that the terms used herein are only for describing specific embodiments and are not intended to limit the exemplary embodiments according to the present application. As used herein, unless the context clearly indicates otherwise, the singular form is also intended to include the plural form. In addition, it should be understood that when the terms "comprise" and / or "include" are used in this specification, it indicates the presence of features, steps, operations, devices, components and / or combinations thereof.

[0067] It should be noted that the terms "first", "second", etc. in the specification and claims of the present application and the above-mentioned drawings are used to distinguish similar objects, and are not necessarily used to describe a specific order or sequence. It should be understood that the numbers used in this way can be interchanged where appropriate, so that the embodiments of the present application described herein can be implemented in an order other than those illustrated or described herein.

[0068] The above description is only a preferred embodiment of the present invention and is not intended to limit the present invention. For those skilled in the art, the present invention may have various modifications and variations. Any modification, equivalent replacement, improvement, etc. made within the spirit and principle of the present invention shall be included in the protection scope of the present invention.

[0069] The above is only a preferred embodiment of the present invention, and the protection scope of the present invention is not limited to the above embodiments. All technical solutions under the concept of the present invention belong to the protection scope of the present invention. It should be pointed out that for ordinary technicians in this technical field, some improvements and modifications without departing from the principle of the present invention should also be regarded as the protection scope of the present invention.

Claims

1. A system for preparing silicon-oxygen negative electrode materials for lithium batteries, comprising a chemical vapor deposition device (1); characterized in that: The chemical vapor deposition device (1) comprises an upper heat insulation plate (2) and a lower heat insulation plate (3) which are parallel to each other; a chemical vapor deposition furnace (4) and an annular heat insulation plate (5) are coaxially fixed between the upper heat insulation plate (2) and the lower heat insulation plate (3); a preparation chamber is formed between the upper heat insulation plate (2), the lower heat insulation plate (3) and the annular heat insulation plate (5); A conical material storage tank (6) is fixed on the top of the upper heat insulation board (2); a guide groove (7) is evenly provided on the inner bottom surface of the conical material storage tank (6); an adsorption portion (8) is slidably provided inside the guide groove (7); a cleaning portion (9) is slidably provided on the side surface of the adsorption portion (8); and a plurality of guide portions (10) that are compatible with the corresponding cleaning portions (9) are evenly fixed on the inner top of the upper heat insulation board (2); A plurality of rotating shafts (11) are evenly and rotatably arranged between the upper heat insulation plate (2) and the lower heat insulation plate (3); the cleaning portion (9) comprises a collar (12); a U-shaped plate (13) is fixed to the side surface of the collar (12); an extension rod (14) is fixed to the side surface of the U-shaped plate (13); a first ball head (15) is fixed to the end of the extension rod (14); a spiral groove (16) matching the corresponding first ball head (15) is provided on the side surface of the rotating shaft (11); A first receiving tray (17) and a second receiving tray (18) are respectively fixed to the side surfaces of the adjacent rotating shafts (11); the first receiving tray (17) is placed below the second receiving tray (18); the inner side surface of the annular heat insulation plate (5) and the outer side surface of the chemical vapor deposition furnace (4) are evenly provided with a plurality of arc grooves (33) that are compatible with the corresponding first receiving tray (17) and the second receiving tray (18); The adsorption portion (8) comprises an adsorption cylinder (29); a slide rail (30) slidably matched with the U-shaped plate (13) is fixed on the circumferential side surface of the adsorption cylinder (29), and a gas delivery pipe (31) is provided between the top end thereof and the bottom surface of the gas collecting ring (25); a plurality of limit holes (32) slidably matched with the gas delivery pipe (31) are evenly provided on the top of the sealing cover (19); a slide groove (34) slidably matched with the slide rail (30) is provided on the inner wall of the guide groove (7); a plurality of adsorption grooves (35) are evenly provided on the circumferential side surface of the adsorption cylinder (29); and a plurality of adsorption holes (36) are evenly provided on the inner wall of the adsorption groove (35); A rotating ring (37) is slidably arranged inside the extension rod (14); an annular rail (38) slidably matched with the inside of the extension rod (14) is fixed to two opposite side surfaces of the rotating ring (37); a plurality of curved guide plates (39) slidably matched with the inside of the extension rod (14) are evenly fixed to the inner peripheral side surface of the rotating ring (37); the sleeve ring (12) is slidably matched with the adsorption cylinder (29); a plurality of guide rods (40) are evenly penetrated and slidably arranged on the peripheral side surface of the sleeve ring (12); a scraper (41) slidably matched with the adsorption groove (35) is fixed to one end of the guide rod (40), and a second ball head (42) is fixed to the other end; a return spring (43) sleeved on the corresponding guide rod (40) is fixed between the second ball head (42) and the outer peripheral side surface of the sleeve ring (12); An arc-shaped rod (44) coaxial with the collar (12) is fixed on the peripheral side of the extension rod (14); a stopper (45) is fixed on the end of the arc-shaped rod (44); a connecting plate (46) slidably engaged with the arc-shaped rod (44) is fixed on the outer peripheral side of the rotating ring (37); a third ball head (47) is fixed on the end of the connecting plate (46); the guide portion (10) comprises an arc-shaped fixing plate (48) coaxial with the collar (12) from top to bottom, an oblique arc-shaped guide plate (49) and a straight arc-shaped guide plate (50); an arc-shaped spring (51) sleeved on the arc-shaped rod (44) is fixed between the connecting plate (46) and the extension rod (14).

2. A system for preparing silicon-oxygen negative electrode materials for lithium batteries according to claim 1, characterized in that: A sealing cover (19) is fixed to the top of the conical storage tank (6) by means of fastening bolts; a controller (20) and an electric push rod (21) are sequentially mounted on the top of the sealing cover (19); a baffle (22) is fixed to the telescopic end of the electric push rod (21); a vertical rod (23) is fixed to the bottom surface of the baffle (22); Slide rods (24) are symmetrically fixed on the surface of the sealing cover (19); a gas collecting ring (25) that is slidably matched with the two slide rods (24) is fixed at the bottom end of the vertical rod (23); ear plates (26) are symmetrically fixed on the side surface of the gas collecting ring (25); and sliding holes (27) that are slidably matched with the slide rods (24) are opened on the surface of the ear plates (26); An air extraction pipe (28) is provided on the circumferential side of the air collecting ring (25); the air extraction pipe (28) is connected to an external vacuum pump via a hose; and the output end of the controller (20) is electrically connected to the electric push rod (21) and the external vacuum pump, respectively.

3. A system for preparing silicon-oxygen negative electrode materials for lithium batteries according to claim 2, characterized in that: A driven gear (52) is fixed on the top of the rotating shaft (11); an annular plate (53) is rotatably provided on the top of the upper heat insulation plate (2); an inner gear ring meshing with each driven gear (52) is fixed on the inner circumferential side surface of the annular plate (53); A servo motor (54) electrically connected to an output end of a controller (20) is mounted on the top of the upper heat insulation plate (2); a driving gear (55) is fixed to the output end of the servo motor (54); and an outer gear ring meshing with the driving gear (55) is fixed to the outer peripheral side surface of the annular plate (53).

4. A system for preparing silicon-oxygen negative electrode materials for lithium batteries according to claim 3, characterized in that: An electric heating wire electrically connected to the controller (20) via an output end is installed inside the chemical vapor deposition furnace (4), and a temperature sensor electrically connected to the input end of the controller (20) is installed inside the chemical vapor deposition furnace (4); a catalytic initiator is placed inside the chemical vapor deposition furnace (4); Exhaust pipes (58) are evenly arranged on the inner circumference of the chemical vapor deposition furnace (4); an exhaust gas delivery pipe (65) is arranged on the top of the upper heat insulation board (2); the exhaust gas delivery pipe (65) is connected to the exhaust end of an external exhaust gas extraction pump via an exhaust pipe; A plurality of material extraction pipes (59) are evenly arranged through the outer peripheral side surface of the annular heat insulation plate (5); the material extraction pipes (59) are connected to an external material extraction pump via a material delivery pipe.

5. A system for preparing silicon-oxygen negative electrode materials for lithium batteries according to claim 4, characterized in that: The top of the upper heat insulation plate (2) is provided with a mounting opening (60) which is in communication with the chemical vapor deposition furnace (4); a gas supply device (61) is fixedly mounted on the mounting opening (60) by means of fastening bolts; The gas supply device (61) comprises a sealing plate (62) covering the mounting opening (60); a support plate (63) is fixed on the surface of the sealing plate (62); a reaction gas supply tank (64) and a carrier gas supply tank (57) are fixed in sequence on the top of the support plate (63); the reaction gas supply tank (64) and the carrier gas supply tank (57) are both provided with an air supply pipe (56) penetrating the sealing plate (62); and both air supply pipes (56) are provided with a solenoid valve electrically connected to the controller (20).

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