Cuprous oxide continuous production device and its control system based on parameter adjustment

Abstract

The invention relates to the field of cuprous oxide production control, and is used to solve the problem that the condition control is unstable in the cuprous oxide production process, resulting in a low yield of cuprous oxide. The invention specifically relates to a cuprous oxide continuous production device based on parameter allocation and a control system thereof. In the invention, in the cuprous oxide production process, the temperature and the pH are monitored to ensure that the temperature and the pH are within a set range, and at the same time, the single input upper limit of the pH adjustment component is obtained by calculating the current temperature, and when the pH is regulated, the input amount of the adjustment component is limited by the single input upper limit, and when the adjustment amount exceeds the standard, the pH adjustment component is input in batches to avoid temperature changes in the solution caused by the temperature change, and in the process of generating cuprous oxide, the actual precipitation amount is obtained by proportional formula analysis, and when the amount of cuprous oxide precipitation in the solution reaches the standard, the solution and the precipitation are released in time, so as to improve the yield of cuprous oxide.

Description

Technical Field

[0001] The invention relates to the field of cuprous oxide production control, in particular to a cuprous oxide continuous production device based on parameter adjustment and a control system thereof. Background Art

[0002] As a p-type semiconductor, cuprous oxide and its ultrafine powder are an important inorganic chemical raw material, which is widely used in the fields of coatings, glass, ceramics and industrial catalysis. Since the physical and chemical properties of particles are closely related to the morphology and particle size, the controllable preparation of cuprous oxide micropowders with specific morphology and particle size is an important research direction for industrial applications. At present, many methods have been reported in the literature for preparing cuprous oxide micropowders with different morphologies and particle sizes, such as electrolysis, solid phase method, liquid phase method, etc. Among them, the liquid phase method has attracted a lot of attention from researchers because the synthesized particles have the advantages of good particle size distribution, controllable morphology and good dispersion. In the prior art, using copper sulfate as the copper source, NaOH as the alkali solution, and reducing with a mild reducing agent glucose is an effective industrial continuous production method;

[0003] At present, the cuprous oxide production technology in the prior art still has shortcomings. Due to the unstable and easily disproportionated nature of cuprous oxide, the requirements for conditions in the production process of cuprous oxide are relatively strict. The conventional reaction temperature control system and pH control system in the prior art cannot well adapt to the production requirements of cuprous oxide, resulting in cuprous oxide being easily disproportionated after production, resulting in a decrease in yield, thereby affecting the production efficiency of cuprous oxide.

[0004] In view of the above technical problems, this application proposes a solution. Summary of the invention

[0005] In the present invention, during the production process of cuprous oxide, the temperature and the pH are monitored to ensure that the temperature and the pH are within a set range, and at the same time, the upper limit of the single input of the pH adjusting component is obtained by calculating the current temperature, and the input amount of the adjusting component is limited by the upper limit of the single input when the pH is regulated, and when the adjustment amount exceeds the standard, the pH adjusting component is added in batches to avoid the temperature change of the solution caused by the pH adjusting component, thereby solving the problem of unstable condition control in the production process of cuprous oxide, which leads to a low yield of cuprous oxide, and providing a cuprous oxide continuous production device based on parameter allocation and a control system thereof.

[0006] The purpose of the present invention can be achieved through the following technical solutions:

[0007] A cuprous oxide continuous production device based on parameter adjustment, characterized in that it includes a cuprous oxide continuous production device based on parameter adjustment, including a container shell, a plurality of groups of injection ports are provided on the upper part of the container shell, a discharge port is provided on the lower part of the container shell, a heating layer is provided on the inner wall of the container shell, and the heating layer heats the solution contained inside through an electric heating element provided inside the heating layer, a stirrer is rotatably connected to the lower part of the top of the container shell, and a plurality of groups of heating rollers are installed on the outer side of the stirrer;

[0008] The container shell is rotatably connected to a rotating shaft inside, the rotating shaft is located near the discharge port, and the rotating shaft is rotatably connected to a circular sealing plate outside, the circular sealing plate comprises a weighing sealing plate and a fixed sealing plate, wherein a limiting groove is provided at the edge of the weighing sealing plate, a scraper spring is slidably connected to the upper surface of the fixed sealing plate, and is in close contact with the upper surface of the fixed sealing plate, traction blocks are fixedly installed at both ends of the scraper spring, the lower surface of the traction block is slidably connected to the limiting groove, and the traction block has a built-in driving structure;

[0009] A control terminal is fixedly installed on the outside of the container shell, and a processor and a storage are arranged in the control terminal. The cuprous oxide continuous production control system based on parameter adjustment stored in the storage is operated by the processor.

[0010] A cuprous oxide continuous production control system based on parameter adjustment, characterized in that it includes a temperature control unit, an acid-base control unit, a precipitation statistics unit and a controller, wherein the temperature control unit is used to collect the temperature of the solution inside the container shell, perform comparative analysis based on the collected temperature, and generate a temperature control signal of the solution, and at the same time obtain the upper limit of the pH adjustment volume based on the current temperature;

[0011] The acid-base control unit is used to detect the pH of the solution, and to perform comparative analysis based on the detected pH to generate a pH control signal, and to generate a pH release volume based on the pH control signal and the pH adjustment volume upper limit;

[0012] The precipitation statistics unit is used to detect the weight distribution in the solution, analyze the precipitation amount according to the detected weight change, and generate a precipitation completion signal;

[0013] The controller controls the temperature through a temperature control signal, controls the pH of the solution through the pH release volume, gathers the precipitate on the fixed sealing plate to the weighing sealing plate through a precipitation gathering signal, and can control the rotation of the circular sealing plate through a precipitation completion signal to release the solution after precipitation.

[0014] As a preferred embodiment of the present invention, the temperature control signal generated by the temperature control unit includes a temperature increase signal and a temperature decrease signal. The process of the temperature control unit generating the temperature increase signal and the temperature decrease signal is as follows:

[0015] The temperature control unit compares the collected solution temperature with the preset production temperature, and generates a temperature qualified signal if the solution temperature is within the preset production temperature range, and generates a temperature over-limit signal if the collected solution temperature is not within the preset production temperature range;

[0016] The temperature control unit generates a temperature reduction signal when the solution temperature is higher than the preset production temperature upper limit, and generates a temperature increase signal when the solution temperature is lower than the preset production temperature lower limit.

[0017] As a preferred embodiment of the present invention, the acid-base control signal generated by the acid-base control unit includes an acid replenishment signal and an alkali replenishment signal;

[0018] The acid-base control unit collects the pH value of the solution through the sensor inside the container shell, and compares the collected current pH value of the solution with the preset production pH range. If the current pH value of the solution is greater than the upper limit of the preset production pH range, an acid replenishment signal is generated; if the current pH value of the solution is less than the lower limit of the preset production pH range, an alkali replenishment signal is generated.

[0019] As a preferred embodiment of the present invention, the method for the temperature control unit to generate the upper limit of the pH adjustment volume is:

[0020] After generating the temperature over-limit signal, the temperature control unit calculates the difference between the solution temperature and the lower limit of the production temperature range, and records it as the temperature fluctuation capacity T. The temperature control unit simultaneously obtains the solution volume V0 and the temperature T1 of the acid supplement component and the alkali supplement component injected through the injection port. The temperature control unit generates the pH adjustment volume upper limit V through formula analysis. , where k is a preset weight coefficient, and the value of k is positively correlated with the ratio of the specific heat capacity of the solution to the specific heat capacity of the acid-supplementing component or the alkali-supplementing component. The temperature control unit sends the pH adjustment volume upper limit V to the acid-base control unit.

[0021] As a preferred embodiment of the present invention, the method for the acid-base control unit to generate the pH release volume is:

[0022] After generating the acid replenishment signal or the alkali replenishment signal, the acid-base control unit inserts the current pH value of the solution, the target pH value of the adjusted solution, the pH of the acid replenishment component or the alkali replenishment component, and the volume of the solution into the pH adjustment formula for calculation to generate the acid-base adjustment amount V1;

[0023] When the acid-base control unit adjusts the pH value through the acid supplement signal or the alkali supplement signal, the acid-base adjustment amount V1 is compared with the pH adjustment volume upper limit V. If the acid-base adjustment amount V1≤PH adjustment volume upper limit V, the volume of the acid supplement component or alkali supplement component released at a single time is V1; if the acid-base adjustment amount V1>PH adjustment volume upper limit V, the volume of the acid supplement component or alkali supplement component released at a single time is V.

[0024] As a preferred embodiment of the present invention, the precipitation statistics unit weighs the weighing seal once when the solution and the reducing agent are just released into the container shell, and records it as the initial weight. During the precipitation process, the weighing seal is detected once every preset interval and sent to the precipitation statistics unit.

[0025] The sedimentation statistics unit generates a sedimentation gathering signal before detecting the weight on the weighing sealing plate each time, and sends the sedimentation gathering signal to the controller. The controller controls the traction block to move from the initial position to the leftmost position of the weighing sealing plate away from the fixed sealing plate through the sedimentation gathering signal. During the movement, the traction block drives the scraper spring to move on the fixed sealing plate, and scrapes the sediment on the fixed sealing plate onto the weighing sealing plate;

[0026] The precipitation statistics unit records the initial weight as M0, and records each subsequent weight as Mi, i=1, 2, 3…, n. The precipitation statistics unit generates the precipitation amount Si through formula analysis. , where q is the preset weight coefficient, and the value range of q is 0.60~0.95;

[0027] The precipitation statistics unit obtains the total amount of raw material solution added to the inside of the container shell, and calculates the theoretical precipitation amount S0 based on the total amount of raw material solution. The precipitation statistics unit calculates the theoretical precipitation amount S0 and the preset product ratio to obtain the expected precipitation value Sq. The precipitation statistics unit compares the precipitation amount Si with the expected precipitation value Sq. If the precipitation amount Si is less than the expected precipitation value Sq, no reaction is made. If the precipitation amount Si is greater than the expected precipitation value Sq for the first time, a precipitation completion signal is generated.

[0028] As a preferred embodiment of the present invention, the temperature control unit sends a heating signal and a cooling signal to the controller, and the controller controls the operating temperature of the heating layer and the heating roller through the heating signal and the cooling signal to ensure that the temperature of the solution inside the container shell is stable;

[0029] The acid-base control unit sends the volume of the acid-supplementing component or the volume of the alkali-supplementing component released in a single time to the controller, and the controller releases the corresponding acid-supplementing component or the alkali-supplementing component according to the volume of the acid-supplementing component or the volume of the alkali-supplementing component;

[0030] The precipitation statistics unit sends a precipitation completion signal to the controller. After receiving the precipitation completion signal, the controller controls the rotation of the rotating shaft, drives the circular sealing plate to rotate, and releases the solution in the container shell through the discharge port.

[0031] Compared with the prior art, the present invention has the following beneficial effects:

[0032] 1. In the present invention, during the production process of cuprous oxide, the temperature is monitored to ensure that the temperature is within a set temperature range, the pH is monitored to ensure that the pH of the solution is within a set pH range, and when the pH is regulated, the pH is accurately regulated according to a pH adjustment formula, and the upper limit of a single input of a pH adjustment component is obtained by calculating the current temperature, so as to avoid the pH adjustment component bringing about a temperature change to the solution when entering the solution, thereby causing the temperature in the solution to fluctuate and affect the formation of cuprous oxide.

[0033] 2. In the present invention, during the generation process of cuprous oxide, the precipitated cuprous oxide is collected and weighed, and the change in the weighed weight is obtained according to the change in position, and the actual precipitation amount is obtained through proportional formula analysis, so that the solution and the precipitate are released in time when the amount of cuprous oxide precipitation in the solution reaches the standard, thereby avoiding the situation where the precipitate is generated for too long and causes decomposition and disproportionation, and also avoiding the solution being released in advance when the output of cuprous oxide is insufficient, thereby improving the yield of cuprous oxide. BRIEF DESCRIPTION OF THE DRAWINGS

[0034] In order to facilitate understanding by those skilled in the art, the present invention is further described below with reference to the accompanying drawings.

[0035] Figure 1 It is a schematic diagram of the main structure of the present invention;

[0036] Figure 2 It is a cross-sectional structural schematic diagram of the present invention;

[0037] Figure 3 is a system block diagram of the present invention;

[0038] Figure 4 It is a system flow chart of the present invention.

[0039] In the figure: 1. container shell; 2. filling port; 3. discharge port; 4. rotating shaft; 5. agitator; 6. heating roller; 7. weighing sealing plate; 8. fixed sealing plate; 9. heating layer; 10. scraper spring; 11. traction block; 12. limiting groove. DETAILED DESCRIPTION

[0040] The technical solution of the present invention will be clearly and completely described below in conjunction with the embodiments. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention. Embodiment 1:

[0041] See also Figure 1 - Figure 4 As shown, a cuprous oxide continuous production device based on parameter adjustment includes a container shell 1, a plurality of injection ports 2 are provided on the upper portion of the container shell 1, a discharge port 3 is provided on the lower portion of the container shell 1, a heating layer 9 is provided on the inner wall of the container shell 1, and the heating layer 9 heats the solution contained therein through an electric heating element provided therein, a stirrer 5 is rotatably connected to the lower portion of the top of the container shell 1, and a plurality of heating rollers 6 are installed on the outer side of the stirrer 5, and the solution in the container shell 1 is stirred and heated at the same time by the heating rollers 6;

[0042] A rotating shaft 4 is rotatably connected inside the container shell 1, and the rotating shaft 4 is located near the discharge port 3. A circular sealing plate is rotatably connected outside the rotating shaft 4. The circular sealing plate consists of a weighing sealing plate 7 and a fixed sealing plate 8. A limiting groove 12 is provided at the edge of the weighing sealing plate 7. A scraper spring 10 is slidably connected to the upper surface of the fixed sealing plate 8. The scraper spring 10 is an elastic hard spring and is in close contact with the upper surface of the fixed sealing plate 8. Traction blocks 11 are fixedly installed at both ends of the scraper spring 10. The lower surface of the traction block 11 is slidably connected to the limiting groove 12. The traction block 11 has a built-in driving structure. When the traction block 11 is in the initial position, the scraper spring 10 is aligned with the outer edge of the fixed sealing plate 8.

[0043] A control terminal is fixedly installed on the outside of the container shell 1. The control terminal controls the injection port 2, the discharge port 3, the traction block 11 and the circular sealing plate through a controller, and is connected to the weighing sealing plate 7 to obtain the data output by the weighing sealing plate 7. A processor and a storage are provided in the control terminal. The processor runs the cuprous oxide continuous production control system based on parameter adjustment stored in the storage. Embodiment 2:

[0044] See also Figure 1 - Figure 4As shown, a cuprous oxide continuous production control system based on parameter adjustment includes a temperature control unit, an acid-base control unit, a precipitation statistics unit and a controller, wherein the temperature control unit can collect the temperature of the solution inside the container shell 1 through a sensor located inside the container shell 1, and compare the collected solution temperature with the preset production temperature. If the solution temperature is within the preset production temperature range, a temperature qualification signal is generated; if the collected solution temperature is not within the preset production temperature range, a temperature over-limit signal is generated, and according to the temperature over-limit direction, when the solution temperature is higher than the preset production temperature upper limit, a cooling signal is generated, and when the solution temperature is lower than the preset production temperature lower limit, a heating signal is generated. The temperature control unit sends the heating signal and the cooling signal to the controller, and the controller controls the operating temperature of the heating layer 9 and the heating roller 6 through the heating signal and the cooling signal to ensure that the solution temperature inside the container shell 1 is stable;

[0045] After generating the temperature over-limit signal, the temperature control unit calculates the difference between the solution temperature and the lower limit of the production temperature range, and records it as the temperature fluctuation capacity. The temperature control unit records the temperature fluctuation capacity as T. The temperature control unit simultaneously obtains the solution volume V0 and the temperature T1 of the acid-supplementing component and the alkali-supplementing component injected through the injection port 2. The temperature control unit generates the pH adjustment volume upper limit V through formula analysis. , where k is a preset weight coefficient, and the value of k is positively correlated with the ratio of the specific heat capacity of the solution to the specific heat capacity of the acid-supplementing component or the alkali-supplementing component, and the temperature control unit sends the pH adjustment volume upper limit V to the acid-base control unit;

[0046] The acid-base control unit collects the pH value of the solution through the sensor inside the container shell 1, and compares the collected current pH value of the solution with the preset production pH range. If the current pH value of the solution is greater than the preset upper limit of the production pH range, an acid replenishment signal is generated. If the current pH value of the solution is less than the preset lower limit of the production pH range, an alkali replenishment signal is generated. The acid-base control unit adjusts the pH value of the solution through the acid replenishment signal and the alkali replenishment signal to ensure the stability of the pH value during production. When the pH value control unit performs acid replenishment, a strong acid solution is used as the acid replenishment component, and when the pH value control unit performs alkali replenishment, a strong alkali solution is used as the alkali replenishment component;

[0047] After generating the acid replenishment signal or the alkali replenishment signal, the acid-base control unit records the current pH value of the solution as P, the adjusted pH value of the solution as P1, and the pH of the acid replenishment component or the alkali replenishment component as P2. The acid-base control unit generates the acid-base adjustment amount V1 according to the formula analysis. ;

[0048] When the acid-base control unit adjusts the pH value through the acid supplement signal or the alkali supplement signal, the acid-base adjustment amount V1 is compared with the pH adjustment volume upper limit V. If the acid-base adjustment amount V1 ≤ the pH adjustment volume upper limit V, the volume of the acid supplement component or the alkali supplement component released at a single time is V1. If the acid-base adjustment amount V1 > the pH adjustment volume upper limit V, the volume of the acid supplement component or the alkali supplement component released at a single time is V, so that when the pH value is adjusted, the temperature in the solution is not affected, thereby affecting the generation of cuprous oxide;

[0049] The acid-base control unit sends the volume of the acid-supplementing component or the volume of the alkali-supplementing component released in a single time to the controller, and the controller releases the corresponding acid-supplementing component or the volume of the alkali-supplementing component according to the volume of the acid-supplementing component or the volume of the alkali-supplementing component. Embodiment three:

[0050] See also Figure 1 - Figure 4 As shown, the precipitation statistics unit obtains the weight detected by the weighing seal 7 through the weighing seal 7. When the solution and the reducing agent are just released into the container shell 1, the weighing seal 7 is weighed once and recorded as the initial weight. During the precipitation process, the weighing seal 7 is detected once every preset interval and sent to the precipitation statistics unit.

[0051] Before the weight on the weighing sealing plate 7 is detected each time, the sedimentation statistics unit generates a sedimentation gathering signal and sends the sedimentation gathering signal to the controller. The controller controls the traction block 11 to move from the initial position to the leftmost position of the weighing sealing plate 7 away from the fixed sealing plate 8 through the sedimentation gathering signal. During the movement, the traction block 11 drives the scraper spring 10 to move on the fixed sealing plate 8, and scrapes the sediment on the fixed sealing plate 8 onto the weighing sealing plate 7;

[0052] The precipitation statistics unit records the initial weight as M0, and records each subsequent weight as Mi, i=1, 2, 3…, n. The precipitation statistics unit generates the precipitation amount Si through formula analysis. , where q is the preset weight coefficient, and the value range of q is 0.60~0.95;

[0053] The precipitation statistics unit obtains the total amount of the raw material solution added to the container shell 1, and calculates the theoretical precipitation amount S0 according to the total amount of the raw material solution. The precipitation statistics unit calculates the theoretical precipitation amount S0 and the preset product ratio to obtain the precipitation expected value Sq. The precipitation statistics unit compares the precipitation amount Si with the precipitation expected value Sq. If the precipitation amount Si is less than the precipitation expected value Sq, no reaction is made. If the precipitation amount Si is greater than the precipitation expected value Sq for the first time, a precipitation completion signal is generated.

[0054] The precipitation statistics unit sends a precipitation completion signal to the controller. After receiving the precipitation completion signal, the controller controls the rotating shaft 4 to rotate, driving the circular sealing plate to rotate, releasing the solution in the container shell 1 through the discharge port 3, and entering the sedimentation tank for subsequent steps such as precipitation capture and filtration.

[0055] The preferred embodiments of the present invention disclosed above are only used to help explain the present invention. The preferred embodiments do not describe all the details in detail, nor do they limit the invention to only specific implementation methods. Obviously, many modifications and changes can be made according to the content of this specification. This specification selects and specifically describes these embodiments in order to better explain the principles and practical applications of the present invention, so that those skilled in the art can understand and use the present invention well. The present invention is limited only by the claims and their full scope and equivalents.

Claims

1. A continuous production device for cuprous oxide based on parameter adjustment, characterized in that: The container shell comprises a container shell, wherein a plurality of injection ports are provided on the upper part of the container shell, a discharge port is provided on the lower part of the container shell, a heating layer is provided on the inner wall of the container shell, and the heating layer heats the solution contained therein through an electric heating element provided therein, and a stirrer is rotatably connected to the lower part of the top of the container shell, and a plurality of heating rollers are installed on the outer side of the stirrer; The container shell is rotatably connected to a rotating shaft inside, the rotating shaft is located near the discharge port, and the rotating shaft is rotatably connected to a circular sealing plate outside, the circular sealing plate comprises a weighing sealing plate and a fixed sealing plate, wherein a limiting groove is provided at the edge of the weighing sealing plate, a scraper spring is slidably connected to the upper surface of the fixed sealing plate, and is in close contact with the upper surface of the fixed sealing plate, traction blocks are fixedly installed at both ends of the scraper spring, the lower surface of the traction block is slidably connected to the limiting groove, and the traction block has a built-in driving structure; A control terminal is fixedly installed on the outside of the container shell, and a processor and a storage are arranged in the control terminal, and the cuprous oxide continuous production control system based on parameter adjustment stored in the storage is operated by the processor; Also included is a control system for a cuprous oxide continuous production device based on parameter adjustment, including a temperature control unit, an acid-base control unit, a precipitation statistics unit, and a controller, wherein the temperature control unit is used to collect the temperature of the solution inside the container shell, perform comparative analysis based on the collected temperature, and generate a temperature control signal for the solution, and simultaneously obtain an upper limit of the pH adjustment volume based on the current temperature; The acid-base control unit is used to detect the pH of the solution, and to perform comparative analysis based on the detected pH to generate a pH control signal, and to generate a pH release volume based on the pH control signal and the pH adjustment volume upper limit; The precipitation statistics unit is used to detect the weight distribution in the solution, analyze the precipitation amount according to the detected weight change, and generate a precipitation completion signal; The controller controls the temperature through a temperature control signal, controls the pH of the solution through the pH release volume, gathers the precipitate on the fixed sealing plate to the weighing sealing plate through a precipitation gathering signal, and can control the rotation of the circular sealing plate through a precipitation completion signal to release the solution after precipitation.

2. The cuprous oxide continuous production device based on parameter adjustment according to claim 1 is characterized in that: The temperature control signal generated by the temperature control unit includes a temperature increase signal and a temperature decrease signal. The process of the temperature control unit generating the temperature increase signal and the temperature decrease signal is as follows: The temperature control unit compares the collected solution temperature with the preset production temperature, and generates a temperature qualified signal if the solution temperature is within the preset production temperature range, and generates a temperature over-limit signal if the collected solution temperature is not within the preset production temperature range; The temperature control unit generates a temperature reduction signal when the solution temperature is higher than the preset production temperature upper limit, and generates a temperature increase signal when the solution temperature is lower than the preset production temperature lower limit.

3. The cuprous oxide continuous production device based on parameter adjustment according to claim 1, characterized in that: The acid-base control signal generated by the acid-base control unit includes an acid replenishment signal and an alkali replenishment signal; The acid-base control unit collects the pH value of the solution through the sensor inside the container shell, and compares the collected current pH value of the solution with the preset production pH range. If the current pH value of the solution is greater than the upper limit of the preset production pH range, an acid replenishment signal is generated; if the current pH value of the solution is less than the lower limit of the preset production pH range, an alkali replenishment signal is generated.

4. The cuprous oxide continuous production device based on parameter adjustment according to claim 3 is characterized in that: The method for the temperature control unit to generate the upper limit of the pH adjustment volume is: After generating the temperature over-limit signal, the temperature control unit calculates the difference between the solution temperature and the lower limit of the production temperature range, and records it as the temperature fluctuation capacity T. The temperature control unit simultaneously obtains the solution volume V0 and the temperature T1 of the acid supplement component and the alkali supplement component injected through the injection port. The temperature control unit generates the pH adjustment volume upper limit V through formula analysis. , where k is a preset weight coefficient, and the value of k is positively correlated with the ratio of the specific heat capacity of the solution to the specific heat capacity of the acid-supplementing component or the alkali-supplementing component. The temperature control unit sends the pH adjustment volume upper limit V to the acid-base control unit.

5. The cuprous oxide continuous production device based on parameter adjustment according to claim 3 is characterized in that: The method for the acid-base control unit to generate the pH release volume is: After generating the acid replenishment signal or the alkali replenishment signal, the acid-base control unit inserts the current pH value of the solution, the target pH value of the adjusted solution, the pH of the acid replenishment component or the alkali replenishment component, and the volume of the solution into the pH adjustment formula for calculation to generate the acid-base adjustment amount V1; When the acid-base control unit adjusts the pH value through the acid supplement signal or the alkali supplement signal, the acid-base adjustment amount V1 is compared with the pH adjustment volume upper limit V. If the acid-base adjustment amount V1≤PH adjustment volume upper limit V, the volume of the acid supplement component or alkali supplement component released at a single time is V1; if the acid-base adjustment amount V1>PH adjustment volume upper limit V, the volume of the acid supplement component or alkali supplement component released at a single time is V.

6. The cuprous oxide continuous production device based on parameter adjustment according to claim 1, characterized in that: The precipitation statistics unit weighs the sealing plate once when the solution and the reducing agent are just released into the container shell, and records the weight as the initial weight. During the precipitation process, the sealing plate is tested once every preset interval and sent to the precipitation statistics unit; The sedimentation statistics unit can generate a sedimentation gathering signal and send the sedimentation gathering signal to the controller. The controller controls the traction block to move from the initial position to the leftmost position of the weighing sealing plate away from the fixed sealing plate through the sedimentation gathering signal. During the movement, the traction block drives the scraper spring to move on the fixed sealing plate, and scrapes the sediment on the fixed sealing plate onto the weighing sealing plate; The precipitation statistics unit records the initial weight as M0, and records each subsequent weight as Mi, i=1, 2, 3…, n. The precipitation statistics unit generates the precipitation amount Si through formula analysis. , where q is the preset weight coefficient, and the value range of q is 0.60~0.95; The precipitation statistics unit obtains the total amount of raw material solution added to the inside of the container shell, and calculates the theoretical precipitation amount S0 based on the total amount of raw material solution. The precipitation statistics unit calculates the theoretical precipitation amount S0 and the preset product ratio to obtain the expected precipitation value Sq. The precipitation statistics unit compares the precipitation amount Si with the expected precipitation value Sq. If the precipitation amount Si is less than the expected precipitation value Sq, no reaction is made. If the precipitation amount Si is greater than the expected precipitation value Sq for the first time, a precipitation completion signal is generated.

7. The cuprous oxide continuous production device based on parameter adjustment according to claim 1, characterized in that: The temperature control unit sends a heating signal and a cooling signal to the controller, and the controller controls the operating temperature of the heating layer and the heating roller through the heating signal and the cooling signal. The acid-base control unit sends the volume of the acid-supplementing component or the volume of the alkali-supplementing component released in a single time to the controller, and the controller releases the corresponding acid-supplementing component or the alkali-supplementing component according to the volume of the acid-supplementing component or the volume of the alkali-supplementing component; The precipitation statistics unit sends a precipitation completion signal to the controller. After receiving the precipitation completion signal, the controller controls the rotation of the rotating shaft, drives the circular sealing plate to rotate, and releases the solution in the container shell through the discharge port.

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