Cleaning base station for cleaning equipment and cleaning system with cleaning base station

Abstract

The invention discloses a cleaning base station for cleaning equipment and a cleaning system with the cleaning base station, and the cleaning base station comprises a base station base which is provided with a cleaning tank; the cleaning part is movably arranged in the cleaning tank, and the cleaning part has a first cleaning state and a second cleaning state; the limiting piece is arranged on the base station base and used for limiting the cleaning piece; in the first cleaning state, the limiting piece is matched with the cleaning piece, so that the cleaning piece is fixed relative to the base station base; and in the second cleaning state, the limiting piece is separated from the cleaning piece. According to the cleaning base station, when the cleaning part is switched between the first cleaning state and the second cleaning state, switching can be achieved without changing the movement direction of the mopping part, and therefore the requirement of the cleaning base station for cleaning equipment can be well lowered, and the application range of the cleaning base station can be widened.

Description

Technical Field

[0001] The present invention relates to the technical field of cleaning appliances, and in particular to a cleaning base station for cleaning equipment and a cleaning system having the same. Background Art

[0002] With the improvement of people's living standards, automatic cleaning equipment such as cleaning robots have gradually entered thousands of households, saving people a lot of energy in housework. In addition, with the rapid development of automatic cleaning equipment, cleaning robots with both sweeping and mopping functions are chosen by more and more users. During the working process of the cleaning robot with sweeping and mopping functions, it is usually equipped with a cleaning base station to mop the floor to enhance the cleaning ability of the cleaning robot, and the cleaning base station needs to have a self-cleaning function at the same time. Summary of the invention

[0003] The present invention proposes a cleaning base station for cleaning equipment, which has the advantages of wide application range, good self-cleaning effect and good user experience.

[0004] The present invention also provides a cleaning system having the cleaning base station.

[0005] A cleaning base station for cleaning equipment according to an embodiment of the present invention includes: a base station base, formed with a cleaning groove; a cleaning member movably arranged in the cleaning groove, the cleaning member having a first cleaning state and a second cleaning state; a limiting member, arranged on the base station base, for limiting the position of the cleaning member; wherein, in the first cleaning state, the limiting member cooperates with the cleaning member to fix the cleaning member relative to the base station base; and in the second cleaning state, the limiting member disengages from the cleaning member.

[0006] According to the cleaning base station for cleaning equipment of the embodiment of the present invention, the switching of the cleaning member between the first cleaning state and the second cleaning state can be realized by controlling the limit member, so that when the cleaning member switches between the first cleaning state and the second cleaning state, it is not necessary to rely on changing the movement direction of the wiping member, thereby effectively reducing the requirements of the cleaning base station for the cleaning equipment, which is conducive to improving the application scope of the cleaning base station. In addition, the cleaning base station can realize the self-cleaning of the cleaning tank, which is conducive to improving the cleanliness of the cleaning tank, and at the same time, it can effectively reduce the frequency of users cleaning the cleaning tank, which is conducive to improving the user experience.

[0007] According to some embodiments of the present invention, in the first cleaning state, the cleaning member is used to clean the wiping member of the cleaning device; in the second cleaning state, the cleaning member is rotatable to clean the cleaning tank.

[0008] According to some embodiments of the present invention, the cleaning piece is rotatably disposed in the cleaning tank, the cleaning piece includes a cleaning piece body and a rotating shaft, a rotating hole is formed on the bottom wall of the cleaning tank, the rotating shaft is rotatably engaged with the rotating hole, and the cleaning piece body is located in the cleaning tank; wherein, in the first cleaning state, in the rotation direction of the cleaning piece, the limiting piece abuts against the cleaning piece body to fix the cleaning piece relative to the base station base.

[0009] According to some embodiments of the present invention, the rotating hole is a blind hole, which is formed by the downward depression of the bottom wall of the cleaning tank, the inner peripheral wall of the rotating hole is formed with a first limiting protrusion, and the outer peripheral wall of the rotating shaft is formed with a second limiting protrusion, and the second limiting protrusion is located at the lower side of the first limiting protrusion and abuts against the first limiting protrusion in the upper and lower directions.

[0010] According to some embodiments of the present invention, a buffer structure is provided on one of the cleaning component body and the limiting component. In the first cleaning state, in the rotation direction of the cleaning component, the buffer structure is located between the limiting component and the cleaning component body.

[0011] According to some embodiments of the present invention, the buffer structure includes a buffer layer. In the rotation direction of the cleaning piece, the cleaning piece body has a first side wall and a second side wall that are oppositely arranged. The buffer layer is provided on at least one of the first side wall and the second side wall, and the buffer layer is a rubber layer.

[0012] According to some embodiments of the present invention, the area swept by the cleaning element during the rotation process is the cleaning area, and in the first cleaning state, the portion of the limiting element located in the cleaning area is the limiting portion, and in the rotation direction of the cleaning element, the limiting portion abuts against the cleaning element body, and the upper surface of at least the limiting portion of the limiting element is not higher than the upper surface of the cleaning element.

[0013] According to some embodiments of the present invention, a first cleaning structure is provided on the bottom surface of the cleaning body, the first cleaning structure is suitable for contacting the bottom wall of the cleaning tank, and the first cleaning structure includes at least one of a flexible rubber strip and a brush.

[0014] According to some embodiments of the present invention, a second cleaning structure is provided on the radial outer end surface of the cleaning element body, and the second cleaning structure is suitable for contacting with the inner peripheral wall of the cleaning tank.

[0015] According to some embodiments of the present invention, the limit member is movably provided on the base station base between a limit position and a non-limit position, and in the limit position, the limit member cooperates with the cleaning member to put the cleaning member in a first cleaning state; in the non-limit position, the limit member disengages from the cleaning member.

[0016] According to some embodiments of the present invention, the cleaning member is rotatably disposed in the cleaning tank, and the area swept by the cleaning member during rotation is the cleaning area. In the limit position, at least a portion of the limit member is located in the cleaning area, and in the non-limit position, the limit member is located on the outer peripheral side of the cleaning area.

[0017] According to some embodiments of the present invention, the cleaning element is rotatably disposed in the cleaning tank, and the area swept by the cleaning element during rotation is the cleaning area. The cleaning element can be raised and lowered between a first position and a second position, and the second position is located below the first position; wherein, in the first cleaning state, the cleaning element is located at the first position, and at least a portion of the limiting element is located within the cleaning area; and in the second cleaning state, the cleaning element is located at the second position, and the limiting element is located above the cleaning area.

[0018] According to some embodiments of the present invention, the cleaning base station further comprises a water supply assembly for supplying water to the cleaning tank, a water supply hole is formed on the inner peripheral wall of the cleaning tank, and the water supply assembly is connected to the water supply hole through a water supply channel.

[0019] According to some embodiments of the present invention, a water outlet groove is formed on the upper surface of the cleaning member, and the water of the water supply assembly is suitable for flowing into the water outlet groove, and the water in the water outlet groove is suitable for overflowing into the cleaning groove.

[0020] According to some embodiments of the present invention, in the first cleaning state, the water outlet groove is adjacent to the water supply hole, and the water supply hole is suitable for supplying water into the water outlet groove.

[0021] According to some embodiments of the present invention, the cleaning base station also includes a drainage component, which is used to discharge the sewage generated in the cleaning tank; the base station base is formed with a sewage cache cavity, and the water in the cleaning tank is suitable for flowing into the sewage cache cavity. The drainage component includes a sewage pipe and a sewage tank, and the sewage tank is connected to the sewage cache cavity through the sewage pipe.

[0022] The cleaning system according to the embodiment of the present invention comprises: the above-mentioned cleaning base station; and a cleaning device, wherein the cleaning device is suitable for cooperating with the cleaning base station, and the cleaning base station is at least used for cleaning the mopping part of the cleaning device.

[0023] According to the cleaning system of the embodiment of the present invention, the switching of the cleaning member between the first cleaning state and the second cleaning state can be realized by controlling the limit member, so that when the cleaning member switches between the first cleaning state and the second cleaning state, it is not necessary to rely on changing the movement direction of the wiping member, thereby effectively reducing the requirements of the cleaning base station for cleaning equipment, which is conducive to improving the application scope of the cleaning base station. In addition, the cleaning base station can realize the self-cleaning of the cleaning tank, which is conducive to improving the cleanliness of the cleaning tank, and at the same time, it can effectively reduce the frequency of users cleaning the cleaning tank, which is conducive to improving the user experience.

[0024] Additional aspects and advantages of the present invention will be given in part in the following description and in part will be obvious from the following description, or will be learned through practice of the present invention. BRIEF DESCRIPTION OF THE DRAWINGS

[0025] Figure 1 is a schematic diagram of a part of a cleaning base station and a mopping member according to an embodiment of the present invention;

[0026] Figure 2 is a top view of a part of a cleaning base station and a mopping member according to an embodiment of the present invention;

[0027] Figure 3 is a partial schematic diagram of a cleaning base station according to an embodiment of the present invention;

[0028] Figure 4 is a partial top view of a cleaning base station according to an embodiment of the present invention;

[0029] Figure 5 is a partial exploded diagram of a cleaning base station according to an embodiment of the present invention;

[0030] Figure 6 is a cross-sectional view along the front-to-back direction through the center of a cleaning base station according to an embodiment of the present invention;

[0031] Figure 7 yes Figure 6 A magnified image of area A;

[0032] Figure 8 is a schematic diagram of another perspective of a part of a cleaning base station according to an embodiment of the present invention;

[0033] Fig. 9 yes Figure 8 Enlarged view of area B;

[0034] Fig.10 is a schematic diagram of a cleaning part of a cleaning base station according to an embodiment of the present invention;

[0035] Fig.11is a schematic diagram of a drying air duct member, a collecting air duct member, a connecting air duct member, a suction nozzle, a filtering component and a sewage discharge pipe of a cleaning base station according to an embodiment of the present invention;

[0036] Fig.12 is a bottom side view of a drying air duct member, a collecting air duct member, a connecting air duct member and a suction nozzle of a cleaning base station according to an embodiment of the present invention;

[0037] Fig.13 is a schematic diagram of a drying air duct component, a collecting air duct component, a connecting air duct component and a suction nozzle of a cleaning base station according to an embodiment of the present invention;

[0038] Fig.14 is a schematic diagram of a drying air duct component, a collecting air duct component, and a connecting air duct component of a cleaning base station according to an embodiment of the present invention;

[0039] Fig.15 is a schematic diagram of a nozzle of a cleaning base station according to an embodiment of the present invention.

[0040] Reference numerals:

[0041] Cleaning base station 100;

[0042] Base station base 1;

[0043] Base body 11; cleaning tank 111; rotation hole 112; connecting notch 113; water supply hole 114;

[0044] Filter component 12; filter hole 121; connecting branch pipe 122;

[0045] Filter tank 13; sewage buffer chamber 14;

[0046] Cleaning parts 2;

[0047] Cleaning element body 21; first side wall 211; second side wall 212; first cleaning structure 213;

[0048] Rotating shaft 22; water outlet trough 23; first trough area 231; second trough area 232;

[0049] Water supply gap 24; cleaning protrusion 25;

[0050] Limiting member 3; limiting portion 31;

[0051] Sewage pipe 4;

[0052] Drying air duct member 5; Drying air duct 51;

[0053] Collecting air duct member 6; collecting air duct 61;

[0054] Suction nozzle 7;

[0055] Suction part 71; suction port 711; scraping wall 712; guide wall 713;

[0056] Sliding portion 72; first sliding portion 721; second sliding portion 722;

[0057] Communication cavity 723; first communication channel 7231; second communication channel 7232;

[0058] Connecting air duct member 8; first channel 81; second channel 82;

[0059] Sliding cavity 83; first sliding cavity 831; second sliding cavity 832; avoidance hole 84;

[0060] Driving mechanism 9; wiping member 200. DETAILED DESCRIPTION

[0061] Embodiments of the present invention are described in detail below, examples of which are shown in the accompanying drawings, wherein the same or similar reference numerals throughout represent the same or similar elements or elements having the same or similar functions. The embodiments described below with reference to the accompanying drawings are exemplary and are intended to be used to explain the present invention, and should not be construed as limiting the present invention.

[0062] The disclosure below provides many different embodiments or examples to implement different structures of the present invention. In order to simplify the disclosure of the present invention, the parts and settings of specific examples are described below. Of course, they are only examples, and the purpose is not to limit the present invention. In addition, the present invention can repeat reference numbers and / or letters in different examples. This repetition is for the purpose of simplicity and clarity, and does not itself indicate the relationship between the various embodiments and / or settings discussed. In addition, the present invention provides various specific processes and examples of materials, but those of ordinary skill in the art can be aware of the applicability of other processes and / or the use of other materials.

[0063] The following describes a cleaning base station 100 for cleaning equipment according to an embodiment of the present invention with reference to the accompanying drawings.

[0064] Among them, the cleaning base station 100 can be used to better clean the dirt adhered to the mopping member 200 of the cleaning device during the cleaning process, so that the cleanliness of the mopping member 200 of the cleaning device can be better guaranteed, which is conducive to improving the cleaning effect of the cleaning device. At the same time, it can better save the energy of the user to frequently clean the cleaning device, which is conducive to improving the user experience of the cleaning device. In a specific example, the cleaning device is a sweeping and mopping robot. After the sweeping and mopping robot runs in the cleaning mode for a certain period of time or when a large amount of dirt is accumulated on the mopping member 200 of the sweeping and mopping robot, the sweeping and mopping robot can automatically move to the cleaning base station 100 and cooperate with the cleaning base station 100 to clean the mopping member 200 of the sweeping and mopping robot through the cleaning base station 100, such as removing the dirt on the mopping member 200. After the mopping member 200 is cleaned, the sweeping and mopping robot can be separated from the cleaning base station 100 and continue the cleaning operation.

[0065] like Figure 1-Figure 15 As shown, a cleaning base station 100 for cleaning equipment according to an embodiment of the present invention includes: a base station base 1, a cleaning part 2 and a limiting part 3, the base station base 1 is formed with a cleaning groove 111, the cleaning part 2 can be movably arranged in the cleaning groove 111, the cleaning part 2 has a first cleaning state and a second cleaning state, and the limiting part 3 is arranged on the base for limiting the cleaning part 2.

[0066] In the first cleaning state, the limiting member 3 cooperates with the cleaning member 2 (i.e., the limiting member 3 is located within the movement range of the cleaning member 2 to limit the cleaning member 2) so that the cleaning member 2 is fixed relative to the base station base 1, and the cleaning member 2 is used to clean the mopping member 200 of the cleaning device. In other words, the movement of the cleaning member 2 relative to the cleaning tank 111 can be well limited by the cooperation between the limiting member 3 and the cleaning member 2. Therefore, when it is necessary to clean the mopping member 200 of the cleaning device, the mopping member 200 can be driven by the cleaning device to enter the cleaning tank 111. After entering the cleaning tank 111, the mopping member 200 can contact the cleaning member 2. The mopping member 200 is driven by the cleaning device to move, so that the mopping member 200 can generate relative movement with the cleaning member 2, so that the cleaning member 2 can clean the mopping member 200 more comprehensively, so as to improve the cleaning effect of the cleaning member 2 on the mopping member 200. At this time, the cleaning base station 100 is in the mopping member cleaning mode. After the cleaning of the mop and wiping member 200 is completed, the cleaning device can carry the clean mop and wiping member 200 to continue the cleaning operation, which is conducive to improving the cleaning effect of the cleaning device. In a specific example, after the mop and wiping member 200 enters the cleaning tank 111, it can be pressed against the cleaning member 2. Therefore, after the cleaning member 2 is fixed by the limiter 3, the moving mop and wiping member 200 and the fixed cleaning member 2 can move and rub relative to each other, so that the cleaning member 2 can remove the dirt on the mop and wiping member 200 through relative friction with the mop and wiping member 200 to achieve the cleaning operation of the cleaning base station 100 on the mop and wiping member 200.

[0067] In the second cleaning state, the stopper 3 is disengaged from the cleaning member 2, and the cleaning member 2 can move to clean the cleaning tank 111. It can be understood that in the process of cleaning the mopping member 200, the cleaning tank 111 can accommodate the dirt that falls off from the mopping member 200, so that the dirt generated in the cleaning process of the mopping member 200 can be better prevented from overflowing, and further, the dirt overflow can be better prevented from polluting the space where the cleaning base station 100 is located. Therefore, after the mopping member 200 is cleaned, the stopper 3 can be disengaged from the cleaning member 2 to enter the second cleaning state to clean the cleaning tank 111 through the cleaning member 2. At this time, the cleaning base station 100 is in the cleaning tank cleaning mode, so that the cleaning base station 100 can realize the self-cleaning of the cleaning tank 111, and the dirt generated in the cleaning process of the mopping member 200 can be prevented from accumulating in the cleaning tank 111, and further, the dirt can be prevented from accumulating in the cleaning tank 111 to breed silt or dirt, which is conducive to improving the cleanliness of the cleaning tank 111. At the same time, the frequency of the user cleaning the cleaning tank 111 can be reduced, which is beneficial to improving the user experience.

[0068] Therefore, the cleaning base station 100 can realize the switching of the cleaning part 2 between the first cleaning state and the second cleaning state by controlling the limit part 3, so that when the cleaning part 2 switches between the first cleaning state and the second cleaning state, there is no need to rely on changing the movement direction of the wiping part 200, thereby effectively reducing the requirements of the cleaning base station 100 for cleaning equipment, which is beneficial to improving the scope of application of the cleaning base station 100.

[0069] Specifically, after dirt is adhered to the mopping and wiping member 200, the cleaning device can move to the cleaning base station 100 and cooperate with the cleaning base station 100. At this time, the mopping and wiping member 200 is located in the cleaning tank 111 and pressed on the cleaning member 2. First, the cleaning member 2 is fixed relative to the base station base 1 by the stopper 3 cooperating with the cleaning member 2, and the mopping and wiping member 200 is driven by the cleaning device to move so that the mopping and wiping member 200 moves relative to the cleaning member 2, so that the cleaning member 2 can remove dirt on the mopping and wiping member 200. The cleaning tank 111 can accommodate dirt that falls off the mopping and wiping member 200. After the mopping and wiping member 200 is cleaned, the stopper 3 is controlled to disengage from the cleaning member 2, so that the cleaning member 2 can move relative to the base station base 1 under the drive of the mopping and wiping member 200, and then the dirt in the cleaning tank 111 is cleaned by the moving cleaning member 2.

[0070] According to the cleaning base station 100 for cleaning equipment of the embodiment of the present invention, the switching of the cleaning member 2 between the first cleaning state and the second cleaning state can be realized by controlling the limit member 3, so that when the cleaning member 2 switches between the first cleaning state and the second cleaning state, it is not necessary to rely on changing the movement direction of the wiping member 200, thereby reducing the requirements of the cleaning base station 100 for the cleaning equipment, which is conducive to improving the application scope of the cleaning base station 100. In addition, the cleaning base station 100 can realize self-cleaning of the cleaning tank 111, which is conducive to improving the cleanliness of the cleaning tank 111. At the same time, it can reduce the frequency of the user cleaning the cleaning tank 111, which is conducive to improving the user experience.

[0071] According to some embodiments of the present invention, the cleaning member 2 is rotatably disposed in the cleaning tank 111, and the cleaning member 2 includes a cleaning member body 21 and a rotating shaft 22. The bottom wall of the cleaning tank 111 is formed with a rotating hole 112, and the rotating shaft 22 is rotatably matched with the rotating hole 112, and the cleaning member body 21 is located in the cleaning tank 111. In other words, the cleaning member body 21 is rotatable relative to the cleaning tank 111 through the matching of the rotating shaft 22 and the rotating hole 112, and the stability of the cleaning member 2 when rotating relative to the cleaning tank 111 can be better guaranteed. In addition, when the cleaning member 2 rotates relative to the cleaning tank 111, the dirt in the cleaning tank 111 can be better cleaned by the cleaning member body 21, and in the rotation direction of the cleaning member 2, the area swept by the cleaning member body 21 during the rotation process can be better improved, which is conducive to improving the cleaning effect of the cleaning member 2 on the cleaning tank 111.

[0072] Among them, in the first cleaning state, in the rotation direction of the cleaning member 2, the stopper 3 abuts against the cleaning member body 21, so that the cleaning member 2 is fixed relative to the base station base 1. That is to say, when the cleaning member 2 is in the first cleaning state, at least part of the stopper 3 is located on one side of the cleaning member 2 in the rotation direction or within the coverage range, so that the rotation of the cleaning member 2 is blocked by the part of the stopper 3 located on one side of the cleaning member 2 in the rotation direction, that is, the position of the cleaning member 2 relative to the base station base 1 is fixed, and then the cleaning device can drive the mopping member 200 to move relative to the cleaning member 2, so as to realize the cleaning operation of the mopping member 200 by the cleaning member 2; when the cleaning member 2 is in the second cleaning state, the part of the stopper 3 located on one side of the cleaning member 2 in the rotation direction or withdrawn from the coverage range, so as to release the restriction of the stopper 3 on the rotation of the cleaning member 2, that is, the cleaning member 2 can rotate freely relative to the cleaning tank 111, so that the cleaning member 2 can clean the cleaning tank 111 during the rotation.

[0073] In a specific example, the cleaning device can drive the wiping member 200 to rotate, and the rotation axis of the wiping member 200 extends in the up-down direction. The cleaning device drives the wiping member 200 to rotate relative to the cleaning member 2 fixed by the limit member 3, that is, in the first cleaning state, so that the cleaning member 2 can remove the dirt on the wiping member 200 through the relative movement friction with the wiping member 200; when the cleaning member 2 is in the second cleaning state, the cleaning member 2 can automatically rotate relative to the base station base 1. Since the wiping member 200 is pressed on the cleaning member 2, the cleaning device can drive the wiping member 200 and drive the cleaning member 2 to rotate in the cleaning tank 111 through the friction between the wiping member 200 and the cleaning member 2, thereby realizing the cleaning operation of the cleaning member 2 on the cleaning tank 111, so that the coordination mode of the wiping member 200 and the cleaning member 2 is simple, which is conducive to simplifying the structure of the wiping member 200 and the cleaning member 2. In addition, when the cleaning member 2 is in the first cleaning state, the cleaning device can drive the wiping member 200 to rotate forward or reverse, so that the cleaning member 2 can clean the wiping member 200 in a clockwise or counterclockwise direction. When the cleaning member 2 is in the second cleaning state, the cleaning device can drive the wiping member 200 to rotate forward or reverse to drive the cleaning member 2 to rotate forward or reverse, so that the cleaning member 2 can clean the cleaning tank 111 in a clockwise or counterclockwise direction, which is beneficial to improve the cleaning effect of the cleaning member 2 on the wiping member 200 and the cleaning tank 111.

[0074] According to some embodiments of the present invention, the rotating hole 112 is a blind hole. That is, the rotating hole 112 only has an upward opening and does not penetrate the base station base 1, so that the rotating hole 112 can ensure the rotational cooperation with the rotating shaft 22 while preventing the liquid in the cleaning tank 111 from leaking to the outside of the base station base 1 through the rotating hole 112, thereby better preventing the leaked sewage from polluting the cleaning base station 100 and the environment near the cleaning base station 100, which is conducive to ensuring the cleanliness of the cleaning base station 100 and improving the user experience of the cleaning base station 100.

[0075] According to some optional embodiments of the present invention, the rotating hole 112 is formed by the bottom wall of the cleaning tank 111 being recessed downward. That is to say, the opening of the rotating hole 112 is located on the bottom wall of the cleaning tank 111, which can effectively reduce the difficulty of processing and forming the rotating hole 112. At the same time, the rotating hole 112 can make full use of the space of the base station base 1 located at the lower side of the cleaning tank 111, which is conducive to controlling the thickness of the base station base 1, and can effectively save the space in the cleaning tank 111 occupied by the rotating hole 112 when it cooperates with the rotating shaft 22, and the structure is compact and the layout is reasonable. In a specific example, the bottom surface of the cleaning component body 21 is in contact with the bottom wall of the cleaning tank 111. Therefore, by forming the rotating hole 112 by recessing the bottom wall of the cleaning tank 111 downward, after the rotating shaft 22 is inserted into the rotating hole 112, it can be better ensured that the bottom surface of the cleaning component body 21 is in contact with the bottom wall of the cleaning tank 111. Therefore, during the rotation of the cleaning component 2 relative to the cleaning tank 111, the bottom wall of the cleaning tank 111 can be scraped by the bottom surface of the cleaning component body 21, which is beneficial to improving the cleaning effect of the cleaning component 2 on the cleaning tank 111.

[0076] According to some optional embodiments of the present invention, the inner peripheral wall of the rotating hole 112 is formed with a first limiting protrusion, and the outer peripheral wall of the rotating shaft 22 is formed with a second limiting protrusion, and the second limiting protrusion is located at the lower side of the first limiting protrusion and abuts against the first limiting protrusion in the up-down direction. In other words, the first limiting protrusion is located at the upper side of the second limiting protrusion, and the projections of the first limiting protrusion and the second limiting protrusion on the horizontal plane at least partially overlap, so that the first limiting protrusion can better block the second limiting protrusion from moving upward, thereby better preventing the rotating shaft 22 from moving upward relative to the rotating hole 112, and further better preventing the rotating shaft 22 from escaping from the rotating hole 112, and the second limiting protrusion can rotate relative to the first limiting protrusion to ensure that the rotating shaft 22 can rotate around the up-down direction in the rotating hole 112. Therefore, through the cooperation of the first limiting protrusion and the second limiting protrusion, while ensuring that the cleaning member 2 can rotate relative to the cleaning tank 111, the cleaning member 2 is prevented from escaping from the base station base 1, so as to ensure the stability of the rotation of the cleaning member 2 relative to the cleaning tank 111. In addition, through the cooperation of the first limiting protrusion and the second limiting protrusion, the rotating shaft 22 and the rotating hole 112 form a snap fit, and the matching structure of the cleaning part 2 and the base station base 1 is simple, which can effectively reduce the difficulty of assembling the cleaning part 2 and disassembling and cleaning it later.

[0077] According to some embodiments of the present invention, a buffer structure is provided on one of the cleaning member body 21 and the stopper 3. In the first cleaning state, in the rotation direction of the cleaning member 2, the buffer structure is located between the stopper 3 and the cleaning member body 21. Thus, the buffer structure can better buffer the collision between the stopper 3 and the cleaning member body 21, thereby better avoiding the collision damage between the stopper 3 and the cleaning member body 21, so as to improve the reliability and stability of the cleaning base station 100. At the same time, the buffer structure can better prevent the collision noise generated when the stopper 3 and the cleaning member body 21 are abutted and matched, which is conducive to improving the quietness of the operation of the cleaning base station 100.

[0078] Furthermore, the buffer structure includes a buffer layer. In the rotation direction of the cleaning element 2, the cleaning element body 21 has a first side wall 211 and a second side wall 212 that are arranged opposite to each other, and a buffer layer is provided on at least one of the first side wall 211 and the second side wall 212. That is to say, the first side wall 211 is located on one side of the cleaning element body 21 in the rotation direction, and the second side wall 21 is located on the other side of the cleaning element body 21 in the rotation direction away from the first side wall 211. The buffer layer may be provided only on the first side wall 211, so that when the limiting element 3 cooperates with the first side wall 211 to limit the rotation of the cleaning element 2 in the first direction, the impact between the limiting element 3 and the first side wall 211 can be buffered by the buffer layer; the buffer layer may be provided only on the second side wall 212, so that the limiting element 3 cooperates with the second side wall 212 to limit the rotation of the cleaning element 2 in the first direction. When the cleaning part 2 is rotated in the second direction, the impact between the stopper 3 and the second side wall 212 is buffered by the buffer layer, wherein the second direction is opposite to the first direction; or the first side wall 211 and the second side wall 212 may be both provided with a buffer layer, so that the buffer layer on the first side wall 211 can buffer the impact between the stopper 3 and the first side wall 211 when the stopper 3 limits the rotation of the cleaning part 2 in the first direction, and at the same time, the buffer layer on the second side wall 212 can buffer the impact between the stopper 3 and the second side wall 212 when the stopper 3 limits the rotation of the cleaning part 2 in the second direction. The position and number of the buffer layer can be flexibly set according to design requirements, and no specific restrictions are made here.

[0079] According to some optional embodiments of the present invention, the buffer layer is a rubber layer. The rubber material is light in weight, has excellent elasticity and low investment cost. Therefore, the energy absorption effect of the buffer layer can be improved to improve the buffering effect of the buffer layer between the cleaning part body 21 and the stopper 3. At the same time, the influence of the buffer layer on the overall weight of the cleaning part 2 can be reduced, and the cost investment of the buffer layer can be reduced.

[0080] According to some embodiments of the present invention, the area swept by the cleaning member 2 during the rotation process is the cleaning area. In the first cleaning state, the portion of the stopper 3 located in the cleaning area is the stopper 31. In the rotation direction of the cleaning member 2, the stopper 31 abuts against the cleaning member body 21. In other words, the dirt in the cleaning area can be cleaned by the cleaning member 2. In the first cleaning state, the stopper 31 is located on one side or within the coverage of the cleaning member body 21 in the rotation direction, so that the abutment of the stopper 31 with the cleaning member body 21 can better block the rotation of the cleaning member 2 relative to the cleaning tank 111. Further, at least the upper surface of the stopper 31 of the stopper 3 is not higher than the upper surface of the cleaning member 2. That is, in the first cleaning state, at least the upper surface of the stopper 31 on the stopper 3 is not higher than the upper surface of the cleaning member 2, such as, the upper plane of the stopper 31 can be flush with the upper surface of the cleaning member 2, or the upper surface of the stopper 31 can be lower than the upper surface of the cleaning member 2. Therefore, when the wiping member 200 rotates relative to the cleaning member 2 in the first cleaning state, the limiting portion 31 can be prevented from blocking the rotation of the wiping member 200, thereby reducing the rotational resistance of the wiping member 200, which is beneficial to increasing the rotation speed of the wiping member 200 and improving the cleaning efficiency of the cleaning member 2 on the wiping member 200.

[0081] According to some embodiments of the present invention, the bottom surface of the cleaning member body 21 is provided with a first cleaning structure 213, and the first cleaning structure 213 is suitable for contacting the bottom wall of the cleaning tank 111. Therefore, during the rotation of the cleaning member 2 relative to the cleaning tank 111, the first cleaning structure 213 can generate friction with the bottom wall of the cleaning tank 111, so that the dirt on the bottom wall of the cleaning tank 111 can be scraped by the first cleaning structure 213, which can better prevent the dirt from adhering and accumulating on the bottom wall of the cleaning tank 111, which is conducive to improving the cleaning effect of the cleaning member 2 on the cleaning tank 111 to improve the cleanliness of the cleaning tank 111.

[0082] Furthermore, the first cleaning structure 213 includes at least one of a flexible rubber strip, a brush, a cotton cloth, a sponge, and the like. In some embodiments, the first cleaning structure 213 may be a flexible rubber strip, so that the first cleaning structure 213 may be well fitted on the bottom wall of the cleaning tank 111, that is, the first cleaning structure 213 may be more closely abutted against the bottom wall of the cleaning tank 111, so that during the rotation of the cleaning member 2 relative to the cleaning tank 111, the first cleaning structure 213 may more comprehensively and thoroughly scrape the dirt on the bottom wall of the cleaning tank 111, which is conducive to improving the cleaning effect of the first cleaning structure 213 on the bottom wall of the cleaning tank 111; the first cleaning structure 213 may also be a brush, so that during the rotation of the cleaning member 2 relative to the cleaning tank 111, the dirt on the bottom wall of the cleaning tank 111 may be well scrubbed by the brush, and the sewage may flow through the gap of the brush to reduce the resistance to the sewage in the cleaning tank 111; of course, the first cleaning structure 213 may also be composed of a flexible rubber strip and a brush, that is, a part of the first cleaning structure 213 is a flexible rubber strip, and the other part is a brush, and the specific composition of the first cleaning structure 213 may be flexibly adjusted according to design requirements.

[0083] According to some embodiments of the present invention, the radial outer end surface of the cleaning member body 21 is provided with a second cleaning structure, and the second cleaning structure is suitable for contacting the inner circumferential wall of the cleaning tank 111. The radial outer end surface of the cleaning member body 21 here refers to the side of the cleaning member body 21 opposite to the inner circumferential wall of the cleaning tank 111 in the length direction of the cleaning member 2. Thus, during the rotation of the cleaning member 2 relative to the cleaning tank 111, friction can be generated with the inner circumferential wall of the cleaning tank 111 through the second cleaning structure, so that the dirt on the inner circumferential wall of the cleaning tank 111 can be scraped by the second cleaning structure, which can better prevent the dirt from adhering and accumulating on the inner circumferential wall of the cleaning tank 111, which is conducive to improving the cleaning effect of the cleaning member 2 on the cleaning tank 111 to improve the cleanliness of the cleaning tank 111. Among them, the second cleaning structure can include at least one of a flexible rubber strip, a brush, a cotton cloth, a sponge, etc.

[0084] It should be noted that the above is only an example of some specific structures of the first cleaning structure 213 and the second cleaning structure to facilitate understanding of the cleaning method of the first cleaning structure 213 and the second cleaning structure for the cleaning tank 111. The first cleaning structure 213 and the second cleaning structure can be any cleaning parts with cleaning ability, such as those that can scrape the inner wall of the cleaning tank 111. There is no specific limitation on the specific structure and material of the first cleaning structure 213 and the second cleaning structure.

[0085] According to some embodiments of the present invention, the limiting member 3 is movably disposed on the base station base 1 in a limiting position and a non-limiting position. In the limiting position, the limiting member 3 cooperates with the cleaning member 2; in the non-limiting position, the limiting member 3 is disengaged from the cleaning member 2. That is, when the limiting member 3 moves to the limiting position, the limiting member 3 can limit the rotation of the cleaning member 2 relative to the cleaning tank 111 so that the cleaning member 2 is fixed relative to the base station base 1, and the cleaning member 2 is in the first cleaning state at this time; when the limiting member 3 moves to the non-limiting position, the limiting effect of the limiting member 3 on the cleaning member 2 is released, so that the cleaning member 2 can move relative to the cleaning tank 111 so as to clean the cleaning tank 111 through the cleaning member 2, and the cleaning member 2 is in the second cleaning state. That is, the switching of the cleaning member 2 between the first cleaning state and the second cleaning state can be realized by moving the limiting member 3 between the limiting position and the non-limiting position, which can effectively reduce the difficulty of switching the cleaning member 2 between the first cleaning state and the second cleaning state. At the same time, there is no need to rely on changing the movement direction of the wiping member 200 to achieve this, thereby effectively reducing the requirements of the cleaning base station 100 for the cleaning equipment, which is beneficial to improving the scope of application of the cleaning base station 100.

[0086] Further, the cleaning member 2 is rotatably arranged in the cleaning tank 111, and the area swept by the cleaning member 2 during the rotation process is the cleaning area. In the limit position, at least part of the limit member 3 is located in the cleaning area. Thus, the rotation of the cleaning member 2 relative to the cleaning tank 111 can be blocked by the part of the limit member 3 located in the cleaning area, so as to keep the cleaning member 2 in the first cleaning state. In the non-limiting position, the limit member 3 is located on the outer peripheral side of the cleaning area. Thus, the interference between the limit member 3 in the non-limiting position and the cleaning member 2 can be better avoided, so that the limit member 3 in the non-limiting position can be better avoided to block the rotation of the cleaning member 2, so that the cleaning member 2 can be kept in the second cleaning state that can rotate relative to the cleaning tank 111.

[0087] In a specific example, the cleaning tank 111 is roughly circular, and the rotation axis of the cleaning member 2 extends in the up-down direction, so that the cleaning member 2 can form a circular cleaning area during the rotation. Therefore, the cleaning member 2 can be in the shape of a strip with the same length as the diameter of the cleaning tank 111, and the center position in the length direction can be rotatably arranged at the center position of the cleaning tank 111, or it can be in the shape of a strip with the same length as the radius of the cleaning tank 111, and one end in the length direction can be rotatably arranged at the center position of the cleaning tank 111, or it can be in the shape of a sector with the same radius as the radius of the cleaning tank 111, and the axis position can be rotatably arranged at the center position of the cleaning tank 111, and so on. The cleaning member 2 can form a circular cleaning area during the rotation to ensure that the cleaning area can cover any place in the cleaning tank 111, thereby effectively reducing the requirements on the shape and size of the cleaning member 2, and has a wide range of applications.

[0088] According to some embodiments of the present invention, the cleaning member 2 is rotatably disposed in the cleaning tank 111, and the area swept by the cleaning member 2 during the rotation process is the cleaning area. The cleaning member 2 can be raised and lowered between a first position and a second position, and the second position is located below the first position, wherein in the first cleaning state, the cleaning member 2 is located in the first position, and at least part of the position limiting member 3 is located in the cleaning area. In other words, when the cleaning member 2 is required to be in the first cleaning state, the cleaning member 2 is controlled to rise until at least part of the position limiting member 3 is located on one side of the cleaning member 2 in the rotation direction or within the coverage range. At this time, the cleaning member 2 is in the first position, and the rotation of the cleaning member 2 relative to the cleaning tank 111 is limited by the part of the position limiting member 3 located in the cleaning area. In addition, the wiping member 200 covers the cleaning member 2, so that when the cleaning member 2 rises and moves toward the first position, it also moves upward relative to the wiping member 200. Therefore, when the cleaning member 2 is in the first position, the cleaning member 2 can be more closely attached to the wiping member 200, thereby increasing the friction resistance between the wiping member 200 and the cleaning member 2, and further increasing the cleaning force of the cleaning member 2 on the wiping member 200 when the wiping member 200 rotates relative to the cleaning member 2, which is beneficial to improving the cleaning effect of the cleaning member 2 on the wiping member 200.

[0089] Furthermore, in the second cleaning state, the cleaning member 2 is located in the second position, and the limit member 3 is located above the cleaning area, that is, the limit member 3 is arranged above the bottom wall of the cleaning tank 111. By lifting and lowering the cleaning member 2 between the first position and the second position, the positional relationship between the cleaning member 2 and the limit member 3 in the up and down directions can be better adjusted to achieve the switching of the cleaning member 2 between the first cleaning state and the second cleaning state. When the cleaning member 2 is in the second position, it is spaced apart from the limit member 3 in the up and down directions, thereby better avoiding the limit member 3 from interfering with the rotation of the cleaning member 2 relative to the cleaning tank 111, so that the cleaning member 2 can be maintained in the second cleaning state where it can rotate relative to the cleaning tank 111. In addition, when the cleaning member 2 needs to switch to the second cleaning state to clean the cleaning tank 111, the cleaning member 2 gradually moves away from the limiting member 3 when it descends, and at the same time, the distance between the cleaning member 2 and the bottom wall of the cleaning tank 111 can be shortened. For example, when the cleaning member 2 is in the second position, the bottom surface of the cleaning member 2 can abut against the bottom wall of the cleaning tank 111, thereby better ensuring the cleaning effect of the cleaning member 2 on the bottom wall of the cleaning tank 111 when it rotates relative to the cleaning tank 111.

[0090] According to some embodiments of the present invention, the cleaning base station 100 further includes a water supply component for supplying water to the cleaning tank 111. The water supply component may be an upper water pipe, the two ends of which are respectively connected to the cleaning tank 111 and an external water source such as a tap water pipe, so that the external water source can directly enter the cleaning tank 111 through the upper water pipe; the water supply component may also be a water supply tank provided at the cleaning base station 100, the water supply tank is connected to the cleaning tank 111, and the user can manually add water to the water supply tank so that the water in the water supply tank can flow into the cleaning tank 111; the water supply component may also include an upper water pipe and a water supply tank, the two ends of which are respectively connected to an external water source such as a tap water pipe and a water supply tank, the water supply tank is connected to the cleaning tank 111, and the external water source can automatically add water to the water supply tank.

[0091] In a specific example, a water supply hole 114 is formed on the inner peripheral wall of the cleaning tank 111, and the water supply assembly is connected to the water supply hole 114 through a water supply channel. That is, a water flow channel connected between the water supply assembly and the cleaning tank 111 can be formed through the water supply channel and the water supply hole 114, so that the water in the water supply assembly can be discharged into the cleaning tank 111 through the water supply channel and the water supply hole 114. When the cleaning member 2 is in the first cleaning state, water is injected into the cleaning tank 111, so that the water in the cleaning tank 111 can better wet the mopping member 200, and the water can better absorb and dissolve dirt such as dust on the mopping member 200, so that the dirt on the mopping member 200 can be separated from the mopping member 200 together with the water, which is conducive to improving the cleaning effect of the mopping member 200. In addition, when the cleaning member 2 is in the second cleaning state, by injecting water into the cleaning tank 111, the cleaning member 2 can better stir the water in the cleaning tank 111 to drive the dirt in the cleaning tank 111 to flow, which is beneficial to improving the cleaning effect of the cleaning member 2 on the cleaning tank 111. In addition, by arranging the water supply hole 114 on the inner peripheral wall of the cleaning tank 111, the space in the cleaning tank 111 can be fully utilized, and the water supply channel can be hidden outside the inner peripheral wall of the cleaning tank 111, and the layout is ingenious and reasonable.

[0092] Optionally, the water supply component includes a water supply tank connected to the water supply hole 114. When clean water is contained in the water supply tank, clean water can be continuously injected into the cleaning tank 111, so that the inner wall of the cleaning tank 111 can be flushed by clean water under the drive of the cleaning member 2, which is conducive to further improving the cleanliness of the cleaning tank 111. Among them, clean water can be stored in the water supply tank, and of course, clean water mixed with detergent can be added to the water supply tank, and disinfectant can also be added to the water supply tank, etc., to enhance the cleaning power of the liquid in the water supply tank on the cleaning tank 111, which is conducive to ensuring the cleanliness of the cleaning tank 111. There is no specific restriction on the type of liquid stored in the water supply tank.

[0093] According to some optional embodiments of the present invention, a water outlet groove 23 is formed on the upper surface of the cleaning member 2, and the water in the water supply tank is suitable for flowing into the water outlet groove 23, and the water in the water outlet groove 23 is suitable for overflowing into the cleaning tank 111. That is to say, a certain amount of water can be stored in the water outlet 23. Therefore, when the cleaning member 2 is in the first cleaning state, the mop 200 is pressed on the cleaning member 2 and can sweep across the water outlet 23 when rotating relative to the cleaning member 2, so that the mop 200 can be wetted by the water in the water outlet 23. The water can better absorb and dissolve dirt such as dust on the mop 200, so that the dirt on the mop 200 can be separated from the mop 200 together with the water. In addition, clean water can be continuously injected into the water outlet 23 from the water supply tank, that is, the mop 200 can be repeatedly cleaned by dipping it in the clean water in the water outlet 23, which can better avoid the sewage in the cleaning tank 111 from causing secondary pollution to the mop 200, which is beneficial to improving the cleaning effect of the cleaning base station 100 on the mop 200.

[0094] Furthermore, in the first cleaning state, the water outlet groove 23 is adjacent to the water supply hole 114, and the water supply hole 114 is suitable for supplying water into the water outlet groove 23. That is to say, when the cleaning member 2 is in the first cleaning state, the water in the water supply tank can flow into the water outlet groove 23 through the water supply channel and the water supply hole 114, so as to ensure that the mopping and wiping member 200 is continuously wetted with the clean water in the water outlet groove 23 during the cleaning process of the mopping and wiping member 200, so as to improve the cleaning efficiency and cleaning effect of the mopping and wiping member 200; when the cleaning member 2 is in the second cleaning state, the water in the water supply tank can flow directly into the cleaning groove 111 through the water supply hole 114 to clean the cleaning groove 111, so as to improve the cleaning effect of the cleaning member 2 on the cleaning groove 111.

[0095] According to some optional embodiments of the present invention, the cleaning member 2 is rotatably disposed in the cleaning tank 111, and the rotation axis of the cleaning member 2 extends in the up-down direction. Thus, the area swept by the cleaning member 2 in the horizontal direction can be increased, so that the stirring effect of the cleaning member 2 on the dirt in the cleaning tank 111 can be improved, which is beneficial to further prevent the accumulation of solid dirt on the inner wall of the cleaning tank 111, and at the same time, the cleaning area of ​​the cleaning member 2 on the cleaning tank 111 can be increased, which is beneficial to improve the cleaning effect of the cleaning member 2 on the cleaning tank 111.

[0096] The radial outer end surface of the cleaning member 2 is formed with a water supply gap 24, and the radial outer end surface of the cleaning member 2 refers to the side wall of the cleaning member 2 facing the inner peripheral wall of the cleaning tank 111 in the length direction. The water supply gap 24 penetrates the side wall of the water outlet tank 23, and in the first cleaning state, the water supply gap 24 is opposite to the water supply hole 114. That is to say, when the cleaning member 2 is in the first cleaning state, the water supply gap 24 and the water supply hole 114 are arranged relative to each other in the radial direction of the cleaning tank 111, so that the water flowing out of the water supply hole 114 can enter the water outlet tank 23 through the water supply gap 24, so as to realize the water supply tank to add water to the water outlet tank 23. Therefore, by setting the water supply gap 24, the cleaning member 2 can reduce the difficulty of adding water from the water supply hole 114 to the water outlet tank 23 on the basis of rotating the cleaning tank 111 relative to the cleaning tank 111, and the structure is simple.

[0097] Furthermore, the water outlet groove 23 includes a first groove area 231 and a second groove area 232, the first groove area 231 is located radially outside the second groove area 232, and the water supply gap 24 is formed on the side wall of the first groove area 231. That is to say, when the cleaning element 2 is in the first cleaning state, the first groove area 231 is located between the water supply hole 114 and the second groove area 232 and is connected to the second groove area 232, the first groove area 231 is arranged adjacent to the water supply hole 114 compared to the second groove area 232, the water supply gap 24 is formed on the side wall of the first groove area 231 facing the water supply hole 114, i.e. radially outside, the water flowing out of the water supply hole 114 enters the first groove area 231 through the water supply gap 24, and flows along the first groove area 231 to the second groove area 232, thereby ensuring that the water outlet groove 23 can be filled with water, so as to realize the water supply tank to add water to the water outlet groove 23.

[0098] In the first cleaning state, the wiping member 200 covers the second groove area 232, and the first groove area 231 is exposed to the outer peripheral side of the wiping member 200. That is, when the cleaning member 2 is in the first cleaning state and the wiping member 200 rotates relative to the cleaning member 2, the outer peripheral edge of the wiping member 200 does not exceed the radial outer end edge of the second groove area 232, that is, the wiping member 200 is wetted by the water in the second groove area 232. Therefore, it is better to avoid that the wiping member 200 covers the first groove area 231 to block the water supply hole 114 and the water supply gap 24, which affects the water supply hole 114 to add water to the water outlet groove 23, thereby ensuring that the water flowing out of the water supply hole 114 can stably enter the first groove area 231 through the water supply gap 24 and flow into the second groove area 232 to wet the wiping member 200.

[0099] According to some optional embodiments of the present invention, in the rotation direction of the cleaning member 2, the width of the first slot area 231 is greater than the width of the second slot area 232. Thus, the size of the first slot area 231 in the rotation direction of the cleaning member 2 can be increased, so as to reserve a larger setting space for the water supply gap 24, that is, a water supply gap 24 with a larger width can be set on the first slot area 231, so as to reduce the difficulty of aligning the water supply hole 114 with the water supply gap 24, and at the same time, the water storage capacity of the first slot area 231 can be increased, so as to better ensure the water supply capacity from the first slot area 231 to the second slot area 232, and prevent the second slot area 232 from being cut off and affecting the cleaning effect of the mopping member 200.

[0100] According to some optional embodiments of the present invention, the bottom wall of the second trough area 232 is lower than the bottom wall of the first trough area 231. That is, the bottom wall of the water outlet trough 23 extends downward from the first trough area 231 toward the second trough area 232. As a result, the water in the first trough area 231 can automatically flow into the second trough area 232 along the bottom wall of the water outlet trough 23 under the action of gravity, so as to ensure the supply of water in the second trough area 232.

[0101] According to some optional embodiments of the present invention, the cleaning base station 100 further includes a drainage component, which is used to discharge the sewage generated in the cleaning tank 111. The drainage component can be a drainage pipe, and the two ends of the drainage pipe are respectively connected to the cleaning tank 111 and the sewer pipe such as the sewer, so that the sewage in the cleaning tank 111 can be directly discharged into the sewer pipe through the drainage pipe; the drainage component can also be a sewage tank provided in the cleaning base station 100, and the sewage tank can be connected to the cleaning tank 111 through the sewage pipe 4, and the sewage in the cleaning tank 111 can flow into the sewage tank, and the user can manually clean the sewage in the sewage tank; the drainage component can also include a sewage tank and a drainage pipe, and the two ends of the drainage pipe are respectively connected to the sewage tank and the sewer pipe such as the sewer, and the sewage tank can be connected to the cleaning tank 111 through the sewage pipe 4, so that the sewage in the sewage tank can be automatically discharged into the sewer through the drainage pipe.

[0102] In a specific example, the cleaning base station 100 includes a water supply component and a drainage component. The water supply component is used to supply water to the cleaning tank 111, and the drainage component is used to discharge the sewage generated in the cleaning tank 111. The water supply component and the drainage component together constitute a water supply and drainage module.

[0103] Optionally, the base station base 1 is formed with a sewage buffer chamber 14, and the water in the cleaning tank 111 is suitable for flowing into the sewage buffer chamber 14. The drainage component includes a sewage pipe 4 and a sewage tank, and the sewage tank and the sewage buffer chamber 14 are connected through the sewage pipe 4. That is to say, the sewage in the sewage buffer chamber 14 can flow into the sewage tank through the sewage pipe 4, so that the water in the cleaning tank 111 can continue to flow into the sewage buffer chamber 14, which can better avoid the water in the cleaning tank 111 exceeding the upper limit of the capacity of the cleaning tank 111 and causing overflow. In addition, the sewage generated during the operation of the cleaning base station 100 is temporarily stored in the sewage tank, so that the user can clean the sewage tank according to the amount of sewage stored in the sewage tank, so that the cleaning base station 100 can simultaneously realize the functions of cleaning the mopping member 200, self-cleaning and sewage recycling, which can better improve the automation level of the cleaning base station 100 to reduce the user's operation and help improve the user's experience.

[0104] Reference below Figure 1-Figure 15 A cleaning base station 100 for cleaning equipment according to a specific embodiment of the present invention is described. It should be noted that the following description is only exemplary and intended to be used to explain the present invention, and should not be construed as limiting the present invention.

[0105] The cleaning base station 100 includes a base station base 1, a cleaning component 2, a limiting component 3, a sewage pipe 4, a sewage tank, a drying and collecting component, a connecting air duct component 8, a driving mechanism 9 and a water supply tank.

[0106] The base station base 1 includes a base body 11 and a filter component 12. Two cleaning grooves 111 arranged in the left and right directions are formed on the base body 11. Each cleaning groove 111 is circular or approximately circular. The cleaning member 2 is in the shape of a long strip extending in the radial direction of the cleaning groove 111. The cleaning member 2 is rotatable around the center of the cleaning groove 111 and is arranged in the cleaning groove 111. A rotating hole 112 is formed on the bottom wall of each cleaning groove 111. The rotating hole 112 is a blind hole with an opening upward. The opening of the rotating hole 112 is located on the bottom wall of the cleaning groove 111. The cleaning member 2 includes a cleaning member The main body 21 and the rotating shaft 22 are arranged on the bottom surface of the cleaning component body 21. The rotating shaft 22 is arranged near the center position of the cleaning component body 21 in the length direction. The rotating shaft 22 is rotatably arranged in the rotating hole 112 along the circumference of the cleaning groove 111. A first limiting protrusion is arranged on the inner peripheral wall of the rotating hole 112, and a second limiting protrusion is arranged on the outer peripheral wall of the rotating shaft 22. After the cleaning component 2 is assembled on the base body 11, the second limiting protrusion is located at the lower side of the first limiting protrusion, so as to limit the cleaning component 2 from moving upward and leaving the rotating hole 112 through the cooperation of the first limiting protrusion and the second limiting protrusion. Furthermore, a first cleaning structure 213 is provided on the bottom surface of the cleaning element body 21, and the first cleaning structure 213 contacts the bottom wall of the cleaning tank 111. A second cleaning structure is provided on the radial outer end surface of the cleaning element body 21, and the second cleaning structure contacts the inner circumferential wall of the cleaning tank 111. When the cleaning element 2 rotates relative to the cleaning tank 111, the bottom wall of the cleaning tank 111 is brushed by the first cleaning structure 213, and the inner circumferential wall of the cleaning tank 111 is brushed by the second cleaning structure.

[0107] Furthermore, the base body 11 and the filter component 12 jointly define a filter tank 13 and a sewage buffer chamber 14 arranged in the up-down direction. The filter component 12 is provided with a connecting branch pipe 122, which passes through the filter component 12 in the up-down direction. The connecting branch pipe 122 is arranged at the rear end of the filter component 12, and the lower end of the connecting branch pipe 122 protrudes from the lower surface of the filter component 12 and is spaced apart from the bottom wall of the sewage buffer chamber 14. In the direction from front to rear, the bottom wall of the sewage buffer chamber 14 extends downwardly at an angle, and the upper end of the connecting branch pipe 122 protrudes from the upper surface of the filter component 12 and is connected to the sewage pipe 4. The end of the sewage pipe 4 away from the connecting branch pipe 122 is connected to the sewage tank.

[0108] In addition, the upper surface of the filter component 12 constitutes the bottom wall of the filter tank 13, and the bottom wall of the filter tank 13 is lower than the bottom wall of the cleaning tank 111. A plurality of filter holes 121 penetrating from top to bottom are formed on the filter component 12, and the plurality of filter holes 121 together constitute a filter structure on the bottom wall of the filter tank 13. The filter tank 13 is located between the two cleaning tanks 111, and the side walls of the two cleaning tanks 111 adjacent to the filter tank 13 are both formed with a through-connecting notch 113. The cleaning tank 111 is connected to the filter tank 13 through the connecting notch 113, and the bottom wall of the connecting notch 113 is flush with the bottom wall of the cleaning tank 111. The left and right ends of the front side of the filter tank 13 extend into the two cleaning tanks 111 respectively, and in the direction from the cleaning tank 111 toward the filter tank 13, the bottom wall of the cleaning tank 111 extends downwardly to form a guide surface.

[0109] The drying and collecting assembly includes a drying assembly, a collecting assembly, a suction nozzle 7 and a connecting air duct member 8. The drying assembly includes a drying air duct member 5, a heating member and a drying fan, a drying air duct 51 is formed in the drying air duct member 5, the drying fan and the heating member are arranged in the drying air duct 51, the collecting assembly includes a collecting air duct member 6, a collecting fan and a dust collecting member, the collecting air duct member 6 and the drying air duct member 5 are arranged at intervals along the left and right directions, the drain pipe 4 is located between the collecting air duct member 6 and the drying air duct member 5, a collecting air duct 61 is formed in the collecting air duct member 6, the collecting fan is arranged in the collecting air duct 61, a dust collecting chamber is formed in the dust collecting member, the suction nozzle 7 is slidably arranged in the connecting air duct member 8 along the front-back direction, and in the direction from bottom to top, the drying air duct 51 and the collecting air duct 61 extend obliquely in directions away from each other, and the cross-sectional areas of the drying air duct 51 and the collecting air duct 61 gradually increase.

[0110] Furthermore, the connecting duct member 8 forms a first channel 81 connected to the drying duct 51, a second channel 82 connected to the collecting duct 61, a sliding cavity 83 and an avoidance hole 84 connected to the first channel 81 and the second channel 82, the first channel 81 and the second channel 82 extend in the up and down directions, and the first channel 81 and the second channel 82 are also connected through the sliding cavity 83. Among them, the sliding chamber 83 includes a first sliding chamber 831 and a second sliding chamber 832 extending in the front-to-back direction and arranged in the left-to-right direction. The rear end of the first sliding chamber 831 is connected to the lower end of the first channel 81, and the end of the first channel 81 away from the first sliding chamber 831, that is, the upper end, is connected to the outlet end of the drying air duct 51. A first control valve is provided near the outlet end of the drying air duct 51, and the first control valve is used to control the connection and disconnection of the drying air duct 51 and the first channel 81; the rear end of the second sliding chamber 832 is connected to the rear end of the first sliding chamber 831 and the second channel 82, and the end of the second channel 82 away from the second sliding chamber 832, that is, the upper end, is connected to the inlet end of the collecting air duct 61. A second control valve is provided near the inlet end of the collecting air duct 61, and the second control valve is used to control the connection and disconnection of the collecting air duct 61 and the second channel 82. In addition, the avoidance hole 84 is located between the first sliding cavity 831 and the second sliding cavity 832 and penetrates the connecting air duct member 8 in the up and down direction. The avoidance hole 84 is located above the connecting branch pipe 122. The sewage pipe 4 is passed through the avoidance hole 84, and in the direction from front to rear, the sewage pipe 4 extends upward at an angle.

[0111] Further, the suction nozzle 7 constitutes the stopper 3, and the suction nozzle 7 includes a suction portion 71 and a sliding portion 72. The suction portion 71 is arranged at the front end of the sliding portion 72, and the suction portion 71 is located in the filter tank 13. A suction port 711 is formed in the suction portion 71. In the direction from back to front, the suction port 711 extends downwardly and obliquely. The suction port 711 is in a flat shape extending in the left and right directions. The upper side wall of the suction port 711 is formed as a guide wall 713. The guide wall 713 extends from back to front. The suction port 711 extends downwardly in an inclined direction, and the lower side wall of the suction port 711 is formed as a scratch wall 712. The front end edge of the guide wall 713 extends out of the front end edge of the scratch wall 712. The thickness of the scratch wall 712 gradually increases from front to rear, and the front end edge of the scratch wall 712 abuts against the bottom wall of the filter tank 13. The driving mechanism 9 is arranged on the outer peripheral side of the base body 11 and is connected to the suction nozzle 7 to drive the suction nozzle 7 to reciprocate in the front and rear directions relative to the connecting air duct member 8.

[0112] Secondly, a connecting cavity 723 connected to the suction port 711 is formed in the sliding portion 72. The sliding portion 72 includes a first sliding portion 721 and a second sliding portion 722 arranged in the left-right direction. The connecting branch pipe 122 and the drain pipe 4 are both located between the first sliding portion 721 and the second sliding portion 722. The front ends of the first sliding portion 721 and the second sliding portion 722 are both connected to the rear end of the suction portion 71. A first connecting channel 7231 is formed in the first sliding portion 721. The front end of the first connecting channel 7231 is connected to the suction port 711. The second sliding portion 722 is provided with a first connecting channel 7231. A second connecting channel 7232 is formed, a front end of the second connecting channel 7232 is connected to the suction port 711, the first sliding portion 721 is slidably disposed in the first sliding cavity 831 along the front-to-back direction, the second sliding portion 722 is slidably disposed in the second sliding cavity 832 along the front-to-back direction, the suction port 711 is connected to the drying air duct 51 through the first connecting channel 7231, the first sliding cavity 831 and the first channel 81, and the suction port 711 is also connected to the collecting air duct 61 through the second connecting channel 7232, the second sliding cavity 832 and the second channel 82.

[0113] The area swept by the cleaning member 2 when rotating relative to the cleaning tank 111 constitutes the cleaning area, and the suction nozzle 7 has a limiting position and a non-limiting position. In the limiting position, the suction part 71 moves forward relative to the filter connecting air duct member 8 until at least part of the suction part 71 extends into the cleaning area, and the part of the suction part 71 located in the cleaning area is formed as a limiting part 31, and the rotation of the cleaning member 2 is blocked by the limiting part 31 so that the cleaning member 2 is in the first cleaning state, and the upper surface of the limiting part 31 is not higher than the upper surface of the cleaning member 2; in the non-limiting position, the suction part 71 moves backward relative to the filter connecting air duct member 8 until the suction part 71 is located at the outer peripheral side of the cleaning area, so as to release the restriction of the suction nozzle 7 on the cleaning member 2, so that the cleaning member 2 can rotate relative to the cleaning tank 111, and the cleaning member 2 is in the second cleaning state. Secondly, a buffer structure is provided in the area where the cleaning body 21 abuts against the suction nozzle 7. The side walls of the cleaning body 21 opposite to each other in the circumferential direction of the cleaning body 2 are respectively the first side wall 211 and the second side wall 212, and a buffer layer is provided on both the first side wall 211 and the second side wall 212.

[0114] Furthermore, a water outlet groove 23 and a cleaning protrusion 25 arranged along the length direction of the cleaning member 2 are formed on the upper surface of the cleaning member body 21, and the water outlet groove 23 and the cleaning protrusion 25 are respectively located on both sides of the rotating shaft 22. The water outlet groove 23 includes a first groove area 231 and a second groove area 232 arranged along the length direction of the cleaning member 2. The first groove area 231 is located between the inner peripheral wall of the cleaning groove 111 and the second groove area 232. In the circumferential direction of the cleaning groove 111, the width of the first groove area 231 is greater than the width of the second groove area 232. The first groove area 231 is located on the side of the second groove area 232 away from the rotating shaft 22, and the bottom wall of the second groove area 232 is lower than the bottom wall of the first groove area 231. The mopping member 200 of the cleaning device covers the second groove area 232, and at least a part of the first groove area 231 is located on the outer peripheral side of the mopping member 200. Secondly, a water supply gap 24 is formed on the radial outer wall of the first groove area 231, and a water supply hole 114 is formed on the inner wall of the cleaning groove 111. The water supply box is connected to the water inlet end of the water supply hole 114 through a water supply channel. The water supply hole 114 is arranged adjacent to the filter groove 13. When the cleaning part 2 is in the first cleaning state, the water supply hole 114 and the water supply gap 24 are arranged relative to each other in the radial direction of the cleaning groove 111.

[0115] Specifically, when the wiping member 200 of the cleaning device needs to be cleaned, the cleaning device moves to the cleaning base station 100 and cooperates with the cleaning base station 100, such as locking, to ensure the stability of the wiping member 200 during the cleaning process. At this time, the two wiping members 200 of the cleaning device are respectively located in the two cleaning grooves 111 and are respectively pressed on the two cleaning members 2. First, the driving mechanism 9 drives the suction nozzle 7 to move forward to the limit position. Therefore, when the cleaning device drives the two wiping members 200 to rotate, the cleaning member 2 is driven to rotate by the friction between the cleaning member 2 and the cleaning member 2. When the cleaning member 2 rotates to the position against the suction nozzle 7 located at the limit position, the cleaning member 2 is fixed relative to the cleaning groove 111, and the cleaning member 2 is in the first cleaning state. The impact between the suction nozzle 7 and the cleaning member 2 can be better buffered by the buffer layer on the cleaning member 2. Among them, the wiping member 200 located on the left side is suitable for rotating in the clockwise direction so that the cleaning member 2 on the left side abuts against the left side wall of the suction nozzle 7, and the wiping member 200 located on the right side is suitable for rotating in the counterclockwise direction so that the cleaning member 2 on the right side abuts against the right side wall of the suction nozzle 7, so as to prevent the cleaning member 2 in the first cleaning state from blocking the filter tank 13.

[0116] After the cleaning member 2 is fixed in the first cleaning state by the suction nozzle 7, the water supply tank injects water into the first tank area 231 through the water supply channel, the water supply hole 114 and the water supply gap 24, and the water entering the first tank area 231 continues to flow into the second tank area 232. The cleaning device continues to drive the mop 200 to rotate relative to the cleaning member 2, so that the part of the mop 200 that sweeps the water outlet tank 23 is wetted, and the dirt on the mop 200 can be cleaned by the mutual friction between the cleaning protrusion 25 on the upper surface of the cleaning member body 21 and the mop 200, so that the dirt on the mop 200 can enter the cleaning tank 111 with the water flow, thereby completing the cleaning operation of the mop 200. In this process, the generated sewage can enter the filter tank 13 through the connecting gap 113.

[0117] After the mopping member 200 has finished cleaning, the driving mechanism 9 drives the suction nozzle 7 to move backward to the non-limiting position to release the limiting effect of the suction nozzle 7 on the cleaning member 2, so that under the action of the friction between the mopping member 200 and the cleaning member 2, the mopping member 200 can drive the cleaning member 2 to rotate relative to the cleaning tank 111, and brush the bottom wall of the cleaning tank 111 through the first cleaning structure 213, and brush the inner peripheral wall of the cleaning tank 111 through the second cleaning structure. The water supply tank can inject water into the cleaning tank 111 through the water supply channel and the water supply hole 114 to rinse the inner wall of the cleaning tank 111 under the stirring of the cleaning member 2. When the cleaning member 2 rotates relative to the cleaning tank 111, the cleaning member 2 sweeps over the part of the filter tank 13 located in the cleaning tank 111, and the stirring of the cleaning member 2 can drive the dirt in the cleaning tank 111 into the filter tank 13. During the cleaning process of the mopping member 200 and the cleaning tank 111 , the drying air duct 51 can be closed by the first control valve, and the collecting air duct 61 can be closed by the second control valve to prevent water vapor from entering the drying air duct 51 and the collecting air duct 61 .

[0118] Furthermore, the sewage in the dirt entering the filter tank 13 can flow downward into the sewage buffer chamber 14 through the multiple filter holes 121 on the bottom wall of the filter tank 13, and flow in the direction close to the connecting branch pipe 122, and then discharge the sewage into the sewage tank for storage through the sewage pipe 4. The filtering structure can intercept solid dirt on the filter component 12, and enter the drying mode after the cleaning tank 111 is cleaned. In the drying mode, the first control valve is controlled to open the drying air duct 51, and the second control valve is controlled to close the collecting air duct 61, so that the drying air duct 51 is connected with the first channel 81. Driven by the drying fan, the hot air in the drying air duct 51 is discharged into the filter tank 13 through the first channel 81, the sliding cavity 83, the first connecting channel 7231, the second connecting channel 7232 and the suction port 711, and further escapes into the cleaning tank 111 through the connecting gap 113, so that the drying component can dry the dirt in the filter tank 13 and the mopping member 200 in the cleaning tank 111. Before the solid dirt in the filter tank 13 is dried, the suction nozzle 7 is located at the rear end of the filter hole 121. After the dirt in the filter tank 13 is dried, the solid dirt collection mode is entered. In the solid dirt collection mode, the first control valve is controlled to close the drying air duct 51, and the second control valve is controlled to open the collecting air duct 61, so that the collecting air duct 61 is connected to the second channel 82, and the driving mechanism 9 drives the suction nozzle 7 to move forward to scrape the solid dirt on the filter structure through the scratch wall 712 so that the solid dirt can be separated from the filter structure, and under the action of the collecting fan, the solid dirt in the filter tank 13 enters the dust collecting chamber through the suction port 711, the first connecting channel 7231, the second connecting channel 7232, the sliding cavity 83, the second channel 82 and the collecting air duct 61 until the solid dirt in the filter tank 13 is completely collected.

[0119] The cleaning system according to an embodiment of the present invention will be described below with reference to the accompanying drawings.

[0120] The cleaning system according to the embodiment of the present invention includes: a cleaning base station 100 and a cleaning device, the cleaning device is suitable for cooperating with the cleaning base station 100, and the cleaning base station 100 is at least used to clean the mopping and wiping member 200 of the cleaning device. For example, the cleaning base station 100 can only clean the mopping and wiping member 200 of the cleaning device, and the cleaning base station 100 can also clean the body of the cleaning device, etc., which is not specifically limited here. Therefore, through the cooperation between the cleaning base station 100 and the cleaning device, the cleanliness of the mopping and wiping member 200 can be better guaranteed to improve the cleaning effect of the cleaning device, and the automation level of the cleaning system can be better improved, which is conducive to improving the user experience.

[0121] Specifically, the cleaning device can drive the mop 200 to sweep and mop the ground by moving. When a lot of dirt is stuck to the mop 200, the cleaning device can move to the cleaning base station 100 and cooperate with the cleaning base station 100 to clean the mop 200 through the cleaning base station 100. After the mop 200 is cleaned, the cleaning device continues to sweep the ground until the ground cleaning operation is completed.

[0122] According to the cleaning system of the embodiment of the present invention, the switching of the cleaning member 2 between the first cleaning state and the second cleaning state can be realized by controlling the limit member 3, so that when the cleaning member 2 switches between the first cleaning state and the second cleaning state, it is not necessary to rely on changing the movement direction of the wiping member 200, thereby reducing the requirements of the cleaning base station 100 for cleaning equipment, which is conducive to improving the application scope of the cleaning base station 100. In addition, the cleaning base station 100 can realize self-cleaning of the cleaning tank 111, which is conducive to improving the cleanliness of the cleaning tank 111. At the same time, it can reduce the frequency of users cleaning the cleaning tank 111, which is conducive to improving the user experience.

[0123] In the present invention, unless otherwise clearly specified and limited, the terms "installed", "connected", "connected", "fixed" and the like should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be directly connected or indirectly connected through an intermediate medium, it can be the internal connection of two elements or the interaction relationship between two elements. For ordinary technicians in this field, the specific meanings of the above terms in the present invention can be understood according to specific circumstances.

[0124] In the description of this specification, the description with reference to the terms "one embodiment", "some embodiments", "example", "specific example", or "some examples" etc. means that the specific features, structures, materials or characteristics described in conjunction with the embodiment or example are included in at least one embodiment or example of the present invention. In this specification, the schematic representations of the above terms do not necessarily refer to the same embodiment or example. Moreover, the specific features, structures, materials or characteristics described may be combined in any one or more embodiments or examples in a suitable manner. In addition, those skilled in the art may combine and combine the different embodiments or examples described in this specification and the features of the different embodiments or examples, without contradiction.

[0125] Although the embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that various changes, modifications, substitutions and variations may be made to the embodiments without departing from the principles and spirit of the present invention, and that the scope of the present invention is defined by the claims and their equivalents.

Claims

1. A cleaning base station for cleaning equipment, characterized in that: include: The base station base is formed with a cleaning tank; A cleaning member is movably disposed in the cleaning tank, and the cleaning member has a first cleaning state and a second cleaning state; A limiting member, provided on the base station base, for limiting the position of the cleaning member; Wherein, in the first cleaning state, the limiting member cooperates with the cleaning member to fix the cleaning member relative to the base station base; In the second cleaning state, the limiting member is disengaged from the cleaning member.

2. The cleaning base station according to claim 1, characterized in that: In the first cleaning state, the cleaning member is used to clean the wiping member of the cleaning device; in the second cleaning state, the cleaning member can rotate to clean the cleaning tank.

3. The cleaning base station according to claim 1, characterized in that: The cleaning member is rotatably disposed in the cleaning tank, the cleaning member comprises a cleaning member body and a rotating shaft, a rotating hole is formed on the bottom wall of the cleaning tank, the rotating shaft is rotatably engaged with the rotating hole, and the cleaning member body is located in the cleaning tank; Wherein, in the first cleaning state, in the rotation direction of the cleaning member, the limiting member abuts against the cleaning member body, so that the cleaning member is fixed relative to the base station base.

4. The cleaning base station according to claim 3, characterized in that: The rotating hole is a blind hole, which is formed by the bottom wall of the cleaning tank being recessed downward. The inner peripheral wall of the rotating hole is formed with a first limiting protrusion, and the outer peripheral wall of the rotating shaft is formed with a second limiting protrusion. The second limiting protrusion is located at the lower side of the first limiting protrusion and abuts against the first limiting protrusion in the upper and lower directions.

5. The cleaning base station according to claim 3, characterized in that: A buffer structure is provided on one of the cleaning member body and the limiting member. In the first cleaning state, in the rotation direction of the cleaning member, the buffer structure is located between the limiting member and the cleaning member body.

6. The cleaning base station according to claim 5, characterized in that: The buffer structure includes a buffer layer. In the rotation direction of the cleaning element, the cleaning element body has a first side wall and a second side wall that are oppositely arranged. The buffer layer is arranged on at least one of the first side wall and the second side wall, and the buffer layer is a rubber layer.

7. The cleaning base station according to claim 3, characterized in that: The area swept by the cleaning element during rotation is the cleaning area. In the first cleaning state, the portion of the limiting element located in the cleaning area is the limiting portion. In the rotation direction of the cleaning element, the limiting portion abuts against the cleaning element body, and the upper surface of at least the limiting portion of the limiting element is not higher than the upper surface of the cleaning element.

8. The cleaning base station according to claim 3, characterized in that: The bottom surface of the cleaning member body is provided with a first cleaning structure, the first cleaning structure is suitable for contacting with the bottom wall of the cleaning tank, and the first cleaning structure includes at least one of a flexible rubber strip and a brush.

9. The cleaning base station according to claim 3, characterized in that: A second cleaning structure is disposed on the radial outer end surface of the cleaning member body, and the second cleaning structure is suitable for contacting with the inner peripheral wall of the cleaning tank.

10. The cleaning base station according to claim 1, characterized in that: The limiting member is movably arranged on the base station base between a limiting position and a non-limiting position. In the limiting position, the limiting member cooperates with the cleaning member to put the cleaning member in a first cleaning state; in the non-limiting position, the limiting member is disengaged from the cleaning member.

11. The cleaning base station according to claim 10, characterized in that: The cleaning member is rotatably disposed in the cleaning tank, and the area swept by the cleaning member during rotation is the cleaning area. In the limit position, at least a portion of the limit member is located in the cleaning area, and in the non-limit position, the limit member is located on the outer peripheral side of the cleaning area.

12. The cleaning base station according to claim 1, characterized in that: The cleaning member is rotatably disposed in the cleaning tank, and the area swept by the cleaning member during the rotation process is the cleaning area. The cleaning member can be raised and lowered between a first position and a second position, and the second position is located below the first position; Wherein, in the first cleaning state, the cleaning element is located at the first position, and at least a portion of the limiting element is located in the cleaning area; in the second cleaning state, the cleaning element is located at the second position, and the limiting element is located above the cleaning area.

13. The cleaning base station according to any one of claims 1 to 12, characterized in that: It also includes a water supply assembly for supplying water to the cleaning tank; a water supply hole is formed on the inner peripheral wall of the cleaning tank, and the water supply assembly is connected to the water supply hole through a water supply channel.

14. The cleaning base station according to claim 13, characterized in that: A water outlet groove is formed on the upper surface of the cleaning member, and the water of the water supply assembly is suitable for flowing into the water outlet groove, and the water in the water outlet groove is suitable for overflowing into the cleaning groove.

15. The cleaning base station according to claim 14, characterized in that: In the first cleaning state, the water outlet groove is adjacent to the water supply hole, and the water supply hole is suitable for supplying water into the water outlet groove.

16. The cleaning base station according to claim 13, characterized in that: It also includes a drainage component, which is used to discharge the sewage generated in the cleaning tank; the base station base is formed with a sewage cache cavity, and the water in the cleaning tank is suitable for flowing into the sewage cache cavity. The drainage component includes a sewage pipe and a sewage tank, and the sewage tank is connected to the sewage cache cavity through the sewage pipe.

17. A cleaning system, characterized in that: include: A cleaning base station, wherein the cleaning base station is a cleaning base station according to any one of claims 1 to 16; A cleaning device, wherein the cleaning device is suitable for cooperating with the cleaning base station, and the cleaning base station is at least used for cleaning the mopping and wiping parts of the cleaning device.

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