Preparation method and application of MOF-derived high-entropy nitride nanosheet array
By growing MOF-derived high-entropy nitride nanosheet arrays on foam nickel substrates, the problems of low capacitance value and poor cyclic stability in supercapacitors are solved, and high-performance electrode materials are realized, suitable for supercapacitors and Flexible wearable device.
Patent Information
- Application Number
- CN202411214269.X
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2024-08-31
- Publication Date
- 2024-12-10
AI Technical Summary
The existing MOF derivative materials have low capacitance values, poor cycle stability in supercapacitors, complex preparation processes, and poor performance of traditional electrode materials in flexible wearable devices.
Using the preparation method of MOF-derived high-entropy nitride nanosheet array, the three-dimensional nanosheet array is grown by room temperature in situ by combining elements such as cobalt, nickel, copper, zinc, manganese, etc., simplifying the preparation process and improving the Electrochemical properties.
It realizes a high-entropy nitride electrode without binders and conductive agents, significantly improves cycle stability and rate performance, with an area specific capacitance of 6.4952F/cm² and a retention of up to 93.2%, making it suitable for commercial applications of supercapacitors.
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Figure CN119098580A_ABST
