Mask making device and mask making method

Abstract

The present application relates to a mask production device and a mask production method. The mask production device includes: a first process table, having a first process chamber; a second process table, having a second process chamber; a first slide rail, including a first rail body and a first sliding end and a second sliding end connected to the first rail body, the first sliding end is arranged in the first process chamber, and the second sliding end is arranged in the second process chamber; at least one conveying mechanism, which can be slidably arranged on the slide rail, and the conveying mechanism is used to operate the mask to be processed. In this way, on the one hand, the mask to be processed can be quickly rotated between the first process table and the second process table, which is conducive to improving production efficiency; on the other hand, the same set of first slide rails and conveying mechanisms can serve at least two process tables (such as the first process table and the second process table), which is conducive to reducing the number of conveying mechanisms, thereby reducing costs.

Description

Technical Field

[0001] The present application relates to the technical field of semiconductor equipment, and in particular to a mask manufacturing device and a mask manufacturing method. Background Art

[0002] With the rapid development of Ultra Large Scale Integration (ULSI), the manufacturing process of integrated circuits has become more and more complex and sophisticated. With the continuous improvement of integrated circuit processing nodes, high-end masks such as ARF (Argon Fluoride) phase shift mask (PSM) and bipolar mask are becoming more and more widely used. The production of mask plates requires processes such as development, etching, degumming and cleaning, and each process needs to be processed by different machines. However, the current mask production has the problems of high production cost and low production efficiency. Summary of the invention

[0003] Based on this, it is necessary to provide a mask manufacturing device and a mask manufacturing method to address at least one of the above problems.

[0004] In order to achieve the above-mentioned purpose, in a first aspect, an embodiment of the present application provides a mask production device, including: a first process table, having a first process chamber; a second process table, having a second process chamber; a first slide rail, including a first rail body and a first sliding end and a second sliding end connected to the first rail body, the first sliding end being arranged in the first process chamber, and the second sliding end being arranged in the second process chamber; at least one conveying mechanism, slidably arranged on the slide rail, the conveying mechanism being used to operate the mask to be processed; wherein the conveying mechanism is configured to convey the mask to be processed to the first sliding end, and the first process table processes the mask to be processed; then the conveying mechanism conveys the mask to be processed to the second sliding end, and the second process table processes the mask to be processed.

[0005] In one embodiment, the mask manufacturing device further includes a third process table having a third process chamber, and the first slide rail further includes a third sliding end connected to the first rail body, and the third sliding end is disposed in the third process chamber.

[0006] In one embodiment, the mask manufacturing device further includes a fourth process table having a fourth process chamber, and the first slide rail further includes a fourth sliding end connected to the first rail body, and the fourth sliding end is disposed in the fourth process chamber.

[0007] The number of the transport mechanisms is not less than 4.

[0008] In one of the embodiments, the mask manufacturing apparatus further includes a reagent storage assembly, and the reagent storage assembly includes a plurality of storage tanks, each of which is connected to at least one transport tube.

[0009] In the first process chamber, the second process chamber, the third process chamber and the fourth process chamber, each process chamber is connected to at least one of the storage tanks through the corresponding transport pipe.

[0010] In one embodiment, the mask manufacturing device further includes: a driving component electrically connected to the transport mechanism; and a control machine electrically connected to the first process station, the second process station, the third process station, the fourth process station and the driving component.

[0011] In one embodiment, the transport mechanism includes: a sliding assembly slidably disposed on the first slide rail; and a loading platform rotatably disposed on the sliding assembly.

[0012] Wherein, the driving assembly includes a first movable driving member and a rotating driving member, the output end of the first movable driving member is connected to the sliding assembly, and the output end of the rotating driving member is connected to the stage.

[0013] In one embodiment, the sliding assembly includes: a third slide rail, which is slidably disposed on the first slide rail and connected to the first movable driving member; a slider, which is slidably disposed on the third slide rail, and the loading platform is rotatably disposed on the slider; the driving assembly also includes a second movable driving member, and the output end of the second movable driving member is connected to the slider.

[0014] In one embodiment, the first slide rail further includes a fifth sliding end connected to the first rail body.

[0015] The mask manufacturing device further includes: a first loading box for loading the mask to be processed; and a first robotic arm configured to transfer the mask to be processed in the first loading box to the transport mechanism located at the fifth sliding end.

[0016] In one of the embodiments, the first slide rail further includes a sixth slide end connected to the first rail body; and the transport mechanism is further used to move the processed mask.

[0017] The mask manufacturing device further includes: a second loading box for loading processed mask; and a second robotic arm configured to transfer the processed mask on the transport mechanism at the sixth sliding end to the second loading box.

[0018] In one embodiment, the mask manufacturing device further includes a second slide rail connected to the first slide rail, and the second slide rail is used to transfer the transport mechanism.

[0019] In a second aspect, an embodiment of the present application provides a mask production method, which is applied to a mask production device, wherein the mask production device includes a first process table, a second process table, a first slide rail and at least one conveying mechanism; the first process table has a first process chamber, and the second process table has a second process chamber; the first slide rail includes a first rail body and a first sliding end and a second sliding end connected to the first rail body, the first sliding end is arranged in the first process chamber, and the second sliding end is arranged in the second process chamber; the conveying mechanism can be slidably arranged on the slide rail and is used to operate the mask to be processed.

[0020] The manufacturing method includes: the transport mechanism transports the mask to be processed to the first sliding end; the first process station processes the mask to be processed; the transport mechanism transports the mask to be processed to the second sliding end; the second process station processes the mask to be processed.

[0021] In one embodiment, the mask production device also includes a third process table, a fourth process table, a first loading box, a first robot arm, a second loading box and a second robot arm; the third process table has a third process chamber, and the fourth process table has a fourth process chamber; the first slide rail also includes a third sliding end, a fourth sliding end, a fifth sliding end and a sixth sliding end connected to the first rail body, the third sliding end is arranged in the third process chamber, and the fourth sliding end is arranged in the fourth process chamber.

[0022] Before the transport mechanism transports the mask to be processed to the first sliding end, the first robot arm transfers the mask to be processed in the first loading box to the transport mechanism located at the fifth sliding end.

[0023] After the second process station processes the mask to be processed, it includes: the conveying mechanism conveys the mask to be processed to the third sliding end; the third process station processes the mask to be processed; the conveying mechanism conveys the mask to be processed to the fourth sliding end; the fourth process station processes the mask to be processed; the conveying mechanism conveys the processed mask to the sixth sliding end; the second robot arm transfers the processed mask on the conveying mechanism at the sixth sliding end to the second loading box.

[0024] The mask production device and mask production method provided in the embodiment of the present application are provided with a first process station, a second process station, a first slide rail and at least one conveying mechanism. In this way, in the process of making a mask, the conveying mechanism can convey the mask to be processed to the first sliding end, and then the first process station processes the mask to be processed, and then the conveying mechanism conveys the mask to be processed to the second sliding end, and then the second process station processes the mask to be processed. In this way, on the one hand, the mask to be processed can be quickly rotated between the first process station and the second process station, which is conducive to improving production efficiency; on the other hand, the same set of first slide rails and conveying mechanisms can serve at least two process stations (such as the first process station and the second process station), which is conducive to reducing the number of conveying mechanisms, thereby reducing costs. BRIEF DESCRIPTION OF THE DRAWINGS

[0025] In order to more clearly illustrate the technical solutions in the embodiments of the present application or the conventional technology, the drawings required for use in the embodiments or the conventional technology descriptions are briefly introduced below. Obviously, the drawings described below are only some embodiments of the present application. For ordinary technicians in this field, other drawings can be obtained based on these drawings without creative work.

[0026] FIG. 1 is a schematic structural diagram of some components of a mask manufacturing device provided in one embodiment of the present application.

[0027] FIG. 2 is a schematic structural diagram of a first slide rail, a second slide rail, and a third slide rail of the mask manufacturing device shown in FIG. 1 .

[0028] FIG. 3 is a schematic structural diagram of a reagent storage assembly of the mask manufacturing device shown in FIG. 1 .

[0029] FIG. 4 is a schematic structural diagram of some components of another mask manufacturing device provided in an embodiment of the present application.

[0030] FIG. 5 is a schematic structural diagram of a transport mechanism and a first slide rail of the mask manufacturing device shown in FIG. 1 .

[0031] FIG. 6 is a schematic diagram of a partial structure of the transport structure in FIG. 5 .

[0032] FIG. 7 is a schematic diagram of a process of manufacturing a mask provided in an embodiment of the present application.

[0033] FIG. 8 is another schematic flow chart of a mask manufacturing method provided in an embodiment of the present application.

[0034] Reference numerals: 10, mask making device; 11, first process station; 11a, first process chamber; 12, second process station; 12a, second process chamber; 13, first slide rail; 13a, first accommodating area; 13b, second accommodating area; 131, first rail body; 132, first sliding end; 133, second sliding end; 134, third sliding end; 135, fourth sliding end; 136, fifth sliding end; 137, sixth sliding end; 14, transport mechanism; 141, sliding assembly; 141-1, third slide rail; 14 1-2, slider; 142, worktable; 15, third process station; 15a, third process chamber; 16, fourth process station; 16a, fourth process chamber; 17, reagent storage assembly; 171, storage tank; 172, transport tube; 18, drive assembly; 19, control machine; 110, first loading box; 111, first robotic arm; 112, second loading box; 113, second robotic arm; 114, second slide rail; 115, alarm mechanism; 116, housing; 117, auxiliary machine; 118, fourth slide rail; 20, mask to be processed. DETAILED DESCRIPTION

[0035] In order to make the above-mentioned purposes, features and advantages of the present application more obvious and easy to understand, the specific implementation methods of the present application are described in detail below in conjunction with the accompanying drawings. In the following description, many specific details are set forth to facilitate a full understanding of the present application. However, the present application can be implemented in many other ways different from those described herein, and those skilled in the art can make similar improvements without violating the connotation of the present application, so the present application is not limited by the specific embodiments disclosed below.

[0036] In the description of the present application, it should be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside", "outside", "clockwise", "counterclockwise", "axial", "radial", "circumferential" and the like indicate orientations or positional relationships based on the orientations or positional relationships shown in the accompanying drawings, and are only for the convenience of describing the present application and simplifying the description, and do not indicate or imply that the referred device or element must have a specific orientation, be constructed and operated in a specific orientation, and therefore should not be understood as a limitation on the present application.

[0037] In addition, the terms "first" and "second" are used for descriptive purposes only and should not be understood as indicating or implying relative importance or implicitly indicating the number of the indicated technical features. Therefore, the features defined as "first" and "second" may explicitly or implicitly include at least one of the features. In the description of this application, the meaning of "plurality" is at least two, such as two, three, etc., unless otherwise clearly and specifically defined.

[0038] In this application, unless otherwise clearly specified and limited, the terms "installed", "connected", "connected", "fixed" and the like should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection or an indirect connection through an intermediate medium, it can be the internal connection of two elements or the interaction relationship between two elements, unless otherwise clearly defined. For ordinary technicians in this field, the specific meanings of the above terms in this application can be understood according to specific circumstances.

[0039] In the present application, unless otherwise clearly specified and limited, a first feature being “above” or “below” a second feature may mean that the first and second features are in direct contact, or the first and second features are in indirect contact through an intermediate medium. Moreover, a first feature being “above”, “above”, and “above” a second feature may mean that the first feature is directly above or obliquely above the second feature, or simply means that the first feature is higher in level than the second feature. A first feature being “below”, “below”, and “below” a second feature may mean that the first feature is directly below or obliquely below the second feature, or simply means that the first feature is lower in level than the second feature.

[0040] It should be noted that when an element is referred to as being "fixed to" or "disposed on" another element, it may be directly on the other element or there may be a central element. When an element is considered to be "connected to" another element, it may be directly connected to the other element or there may be a central element at the same time. The terms "vertical", "horizontal", "upper", "lower", "left", "right" and similar expressions used herein are for illustrative purposes only and are not intended to be the only implementation method.

[0041] When used herein, the singular forms "a", "an", and "said / the" may also include plural forms, unless the context clearly indicates otherwise. It should also be understood that the terms "include / comprise" or "have" and the like specify the presence of stated features, wholes, steps, operations, components, parts, or combinations thereof, but do not exclude the possibility of the presence or addition of one or more other features, wholes, steps, operations, components, parts, or combinations thereof. At the same time, in this specification, the term "and / or" includes any and all combinations of the relevant listed items.

[0042] As described in the background technology, the production of mask requires processes such as development, etching, degumming and cleaning, and each process needs to be processed by a different machine. During the production process, a robotic arm is required to transfer the mask to be processed from the machine of the previous process to the machine of the next process.

[0043] On the one hand, since different machines use different loading boxes to load the masks to be processed, the masks to be processed also need to be transferred between different loading boxes during the process of transferring the masks to be processed. This not only reduces production efficiency, but also increases the risk of increased defective particles in the masks to be processed.

[0044] On the other hand, each machine needs to be equipped with auxiliary equipment such as robotic arms, which not only takes up more clean room area but also increases equipment costs.

[0045] On the other hand, the mask is produced by multiple machines, which has problems such as high machine vacancy rate, which is not only not conducive to improving economic benefits, but also affects the timeliness of the process and is not conducive to improving production efficiency.

[0046] On the other hand, when a machine breaks down, the mask may be scrapped and cause losses while the machine is being repaired.

[0047] In view of at least one of the above problems, the embodiment of the present application provides a mask production device and a mask production method, by setting a first process table, a second process table, a first slide rail and at least one conveying mechanism. In this way, in the process of making a mask, the conveying mechanism can convey the mask to be processed to the first sliding end, and then the first process table performs a process treatment on the mask to be processed, and then the conveying mechanism conveys the mask to be processed to the second sliding end, and then the second process table performs a process treatment on the mask to be processed. In this way, on the one hand, the mask to be processed can be quickly rotated between the first process table and the second process table, which is conducive to improving production efficiency; on the other hand, the same set of first slide rails and conveying mechanisms can serve at least two process tables (such as the first process table and the second process table), which is conducive to reducing the number of conveying mechanisms, thereby reducing costs.

[0048] Specifically, in the first aspect, as shown in FIG. 1 and FIG. 2 , the embodiment of the present application provides a mask manufacturing device 10, which includes a first process table 11, a second process table 12, a first slide rail 13 and at least one conveying mechanism 14. The first process table 11 has a first process chamber 11a; the second process table 12 has a second process chamber 12a; the first slide rail 13 includes a first rail body 131 and a first sliding end 132 and a second sliding end 133 connected to the first rail body 131, the first sliding end 132 is arranged in the first process chamber 11a, and the second sliding end 133 is arranged in the second process chamber 12a. The conveying mechanism 14 is slidably arranged on the slide rail, and the conveying mechanism 14 is used to operate the mask 20 to be processed.

[0049] Here, it should be noted that the first process chamber 11a of the first process station 11 is used to perform the first process on the mask plate 20 to be processed, and the second process chamber 12a of the second process station 12 is used to perform the second process on the mask plate 20 to be processed. The sliding end refers to the area that the motion mechanism can reach on the first slide rail 13. The first sliding end 132 is arranged in the first process chamber 11a, which means that the transport mechanism 14 can move into the first process chamber 11a through the first slide rail 13. The second sliding end 133 is arranged in the second process chamber 12a, which means that the transport mechanism 14 can move into the second process chamber 12a through the first slide rail 13.

[0050] In one example, the first process station 11 is a developing machine, and the second process station 12 is an etching machine. In another example, the first process station 11 is an etching machine, and the second process station 12 is a degumming machine. In yet another example, the first process station 11 is a degumming machine, and the second process station 12 is a cleaning machine.

[0051] The mask manufacturing device 10 provided in the embodiment of the present application is provided with a first process table 11, a second process table 12, a first slide rail 13 and at least one conveying mechanism 14. Thus, in the process of manufacturing the mask, the conveying mechanism 14 can convey the mask 20 to be processed to the first sliding end 132, and then the first process table 11 performs the first process on the mask 20 to be processed, and then the conveying mechanism 14 conveys the mask 20 to be processed to the second sliding end 133, and then the second process table 12 performs the second process on the mask 20 to be processed. In this way, on the one hand, the mask plate 20 to be processed can be quickly rotated between the first process table 11 and the second process table 12, which improves production efficiency compared to the method of transferring the mask plate 20 to be processed between different loading boxes by manual handling or mechanical arms; on the other hand, the same set of first slide rails 13 and conveying mechanism 14 can serve at least two process tables (such as the first process table 11 and the second process table 12). Compared with the method in the related art that each machine corresponds to a set of conveying mechanisms, the present application reduces the number of conveying mechanisms, which not only reduces the equipment cost, but also reduces the space occupied by the equipment; on the other hand, different process tables perform different processes, which can avoid the problem of particle contamination caused by the mixed use of the same chamber. On the other hand, when the conveying mechanism 14 transports the mask plate 20 to be processed from the first process chamber 11a to the second process chamber 12a, it is not necessary to move the mask plate 20 to be processed, thereby reducing the risk of damage caused by the rotation of the mask plate 20 to be processed between different machines.

[0052] It should be noted that the track type and arrangement of the first track can be in any manner, and the embodiment of the present application does not specifically limit the track type and arrangement of the first track.

[0053] In one embodiment, the mask manufacturing device 10 further includes a third process table 15, the third process table 15 has a third process chamber 15a, the first slide rail 13 further includes a third sliding end 134 connected to the first rail body 131, and the third sliding end 134 is disposed in the third process chamber 15a. It can be understood that the third process chamber 15a of the third process table 15 is used to perform the third process on the mask 20 to be processed.

[0054] In this way, it is equivalent to integrating three process tables (such as the first process table 11, the second process table 12 and the third process table 15) into the same manufacturing device. On the one hand, it is conducive to further improving production efficiency. On the other hand, the same set of first slide rails 13 and conveying mechanism 14 can serve the three process tables, thereby further reducing equipment costs and equipment space occupied.

[0055] In one example, the first process station 11 is a developing machine, the second process station 12 is an etching machine, and the third process station 15 is a degumming machine. In another example, the first process station 11 is an etching machine, the second process station 12 is a degumming machine, and the third process station 15 is a cleaning machine.

[0056] In one embodiment, the mask manufacturing device 10 further includes a fourth process table 16 having a fourth process chamber 16a, and the first slide rail 13 further includes a fourth sliding end 135 connected to the first rail body 131, and the fourth sliding end 135 is disposed in the fourth process chamber 16a.

[0057] In this way, it is equivalent to integrating four process tables (such as the first process table 11, the second process table 12, the third process table 15 and the fourth process table 16) into the same manufacturing device. On the one hand, it is conducive to further improving production efficiency. On the other hand, the same set of first slide rails 13 and conveying mechanism 14 can serve the four process tables, thereby further reducing equipment costs and equipment space occupied.

[0058] In one embodiment, the number of the transport mechanisms 14 is not less than 4. That is, the number of the transport mechanisms 14 is not less than the number of the process tables. In this way, in the process of making a mask, four process tables can be operated at the same time, that is, four masks 20 to be processed are processed at the same time, thus improving the utilization rate of the process tables, thereby reducing the vacancy rate of the process tables, which is conducive to improving economic benefits and production efficiency.

[0059] In one example, the first process station 11 is a developing machine, the second process station 12 is an etching machine, the third process station 15 is a degumming machine, and the fourth process station 16 is a cleaning machine. In this way, the machines for the four major processes of mask production are integrated into one device, reducing the cost and labor cost of the mask factory to purchase multiple machines.

[0060] In one embodiment, as shown in FIG. 1 and FIG. 3 , the mask manufacturing device 10 further includes a reagent storage assembly 17, which includes a plurality of storage tanks 171, each of which is connected to at least one transport pipe 172. In the first process chamber 11a, the second process chamber 12a, the third process chamber 15a, and the fourth process chamber 16a, each process chamber is connected to at least one storage tank 171 through a corresponding transport pipe 172. In this way, the reagent used in the mask manufacturing process can be transported to the corresponding process chamber through the reagent storage assembly 17. In this way, the reagent storage modules corresponding to different process stations are integrated together, which is conducive to reducing the space occupied by the equipment.

[0061] Exemplarily, the storage tank 171 may include a sulfuric acid storage tank 171 , a hydrogen peroxide storage tank 171 , an ammonia water storage tank 171 , a carbon dioxide water storage tank 171 , a deionized water storage tank 171 , an etching solution storage tank 171 , a developing solution storage tank 171 , and the like. Among them, the developer storage tank 171, the carbon dioxide water storage tank 171, and the deionized water storage tank 171 are connected to the first process chamber 11a through the corresponding transportation pipe 172, the carbon dioxide water storage tank 171, the deionized water storage tank 171, and the etching liquid storage tank 171 are connected to the second process chamber 12a through the corresponding transportation pipe 172, the carbon dioxide water storage tank 171, the deionized water storage tank 171, the concentrated sulfuric acid storage tank 171, the hydrogen peroxide storage tank 171, and the ammonia water storage tank 171 are connected to the third process chamber 15a through the corresponding transportation pipe 172, and the carbon dioxide water storage tank 171, the deionized water storage tank 171, the concentrated sulfuric acid storage tank 171, the hydrogen peroxide storage tank 171, and the ammonia water storage tank 171 are connected to the fourth process chamber 16a through the corresponding transportation pipe 172.

[0062] In one embodiment, as shown in FIG. 1 and FIG. 4 , the mask manufacturing device 10 further includes a driving assembly 18 and a control machine 19, wherein the driving assembly 18 is electrically connected to the conveying mechanism 14; the control machine 19 is electrically connected to the first process station 11, the second process station 12, the third process station 15, the fourth process station 16 and the driving assembly 18. Thus, the control machine 19 can control the driving assembly 18 to work, so that the conveying mechanism 14 conveys the mask 20 to be processed to a predetermined process chamber, and then the control machine 19 controls the predetermined process station to perform process processing.

[0063] In one embodiment, as shown in FIG. 5 and FIG. 6 , the transport mechanism 14 includes a sliding assembly 141 and a loading platform 142 . The sliding assembly 141 is slidably disposed on the first slide rail 13 , and the loading platform 142 is rotatably disposed on the sliding assembly 141 .

[0064] The driving assembly 18 includes a first mobile driving member (not shown) and a rotating driving member (not shown). The output end of the first mobile driving member is connected to the sliding assembly 141, and is used to drive the sliding assembly 141 to slide on the first slide rail 13. The output end of the rotating driving member is connected to the stage 142, and is used to drive the stage 142 to rotate on the sliding assembly 141.

[0065] In this way, after the transport mechanism 14 transports the mask plate 20 to be processed to the predetermined process chamber, the process chamber is closed, and the predetermined process table processes the mask plate 20 to be processed. During the processing, if the mask plate 20 to be processed needs to be rotated, the stage 142 can be controlled to rotate.

[0066] Compared with the related art in which different machines have different loading boxes and in the process of transferring the mask plate 20 to be processed, it is necessary to transfer the mask plate 20 to be processed between different loading boxes. The above arrangement eliminates the need to transfer the mask plate 20 to be processed between different loading boxes, thereby improving production efficiency.

[0067] In one embodiment, the sliding assembly 141 includes a third slide rail 141-1 and a slider 141-2. The third slide rail 141-1 is slidably disposed on the first slide rail 13 and is connected to the first movable driving member; the slider 141-2 is slidably disposed on the third slide rail 141-1, and the stage 142 is rotatably disposed on the slider 141-2; the driving assembly 18 also includes a second movable driving member, the output end of which is connected to the slider 141-2 and is used to drive the slider 141-2 to slide on the third slide rail 141-1. In this way, the stage 142 can have a greater degree of freedom of movement, so that the transport mechanism 14 can adjust the position of the mask 20 to be processed according to the actual situation, thereby facilitating the process table to perform process processing.

[0068] It should be noted that the first mobile driving member, the second mobile driving member and the rotating driving member may be motors, and the third slide rail 141-1 may be provided with a first pulley, and the first mobile driving member drives the first pulley to rotate, thereby driving the third slide rail 141-1 to move on the first slide rail 13. The slider 141-2 may be provided with a second pulley, and the second mobile driving member drives the second pulley to rotate, thereby driving the slider 141-2 to move on the third slide rail 141-1. The output shaft of the rotating driving member is connected to the stage 142, thereby driving the stage 142 to rotate.

[0069] In one embodiment, as shown in FIG. 1 and FIG. 2 , the first slide rail 13 further includes a fifth slide end 136 connected to the first rail body 131. The mask manufacturing apparatus 10 further includes a first loading box 110 and a first robotic arm 111, wherein the first loading box 110 is used to load the mask 20 to be processed, and the first robotic arm 111 is configured to transfer the mask 20 to be processed in the first loading box 110 to the transport mechanism 14 located at the fifth slide end 136.

[0070] In this way, before making the mask, the mask 20 to be processed can be loaded into the first loading box 110, and then the mask making device 10 starts working, the first robot arm 111 transfers the mask 20 to be processed in the first loading box 110 to the conveying mechanism 14, and the conveying mechanism 14 transfers the mask 20 to be processed to the predetermined process chamber.

[0071] In one embodiment, the first slide rail 13 further includes a sixth slide end 137 connected to the first rail body 131; the transport mechanism 14 is also used to move the processed mask. Here, the mask to be processed 20 becomes a processed mask after being processed by the first process station 11, the second process station 12, the third process station 15 and the fourth process station 16.

[0072] The mask manufacturing apparatus 10 further includes a second loading box 112 and a second robot arm 113. The second loading box 112 is used to load processed masks. The second robot arm 113 is configured to transfer the processed masks on the transport mechanism 14 at the sixth sliding end 137 to the second loading box 112.

[0073] In this way, after the mask is processed, the processed mask can be loaded into the second loading box 112, so that the operator can perform the next operation.

[0074] It should be noted that the first loading box 110 and the second loading box 112 may be integrated devices for wafer loading and testing.

[0075] In one embodiment, the mask manufacturing device 10 further includes a second slide rail 114 connected to the first slide rail 13 , and the second slide rail 114 is used for the transfer and transportation mechanism 14 .

[0076] Here, the second slide rail 114 is equivalent to a transfer station. When the process table of the mask making device 10 is down, the transport mechanism 14 can move to the second slide rail 114 to transport the mask 20 to be processed to the transfer station. The operator repairs the process table. After the repair is completed, the transport mechanism 14 transports the mask 20 to be processed to the original process chamber, and then performs the process. In this way, the operator will not damage the mask 20 to be processed during the repair process.

[0077] In one embodiment, as shown in FIG2 , the mask manufacturing device 10 further includes a fourth slide rail 118 connected to the first slide rail 13, and the fourth slide rail 118 is used to park the idle conveying mechanism 14. In this way, the idle conveying mechanism 14 is parked on the fourth slide rail 118, so that the idle conveying mechanism 14 can be prevented from causing obstruction to the conveying mechanism 14 in operation.

[0078] In one embodiment, as shown in FIG2 , the first slide rail 13 is surrounded to form a first accommodating area 13a and a second accommodating area 13b, the drug storage assembly 17 is disposed in the first accommodating area 13a, and the drive assembly 18 is disposed in the second accommodating area 13b. In this way, the positions of the components of the mask making device 10 can be reasonably arranged to minimize the occupied space of the mask making device 10.

[0079] In one embodiment, the mask making device 10 further includes an alarm mechanism 115, a housing 116 and an auxiliary machine 117, wherein the auxiliary machine 117 includes a power distribution box and a liquid supply component. Among them, the first process table 11, the second process table 12, the third process table 15, the fourth process table 16, the first slide rail 13, the conveying mechanism 14, the reagent storage component 17, the driving component 18, the second slide rail 114 and the fourth slide rail 118 are all arranged in the housing 116, so that, on the one hand, it can help reduce the risk of particle contamination caused by the rotation of the mask 20 to be processed between different process tables, and on the other hand, it is convenient to integrate the above components together. By setting the alarm mechanism 115, the operator can obtain the operation status of the process table in time, which is convenient for the operator to handle in time.

[0080] In the second aspect, the embodiment of the present application provides a mask production method, which is applied to a mask production device 10. Referring to FIG. 1 to FIG. 6, the mask production device 10 includes a first process table 11, a second process table 12, a first slide rail 13 and at least one conveying mechanism 14; the first process table 11 has a first process chamber 11a, and the second process table 12 has a second process chamber 12a; the first slide rail 13 includes a first rail body 131 and a first sliding end 132 and a second sliding end 133 connected to the first rail body 131, the first sliding end 132 is arranged in the first process chamber 11a, and the second sliding end 133 is arranged in the second process chamber 12a; the conveying mechanism 14 is slidably arranged on the slide rail and is used to operate the mask 20 to be processed. It should be noted that the mask production device 10 here can be the same as the mask production device 10 in the embodiment of the first aspect.

[0081] As shown in FIG. 7 , the manufacturing method specifically includes the following steps.

[0082] S200 : the transport mechanism 14 transports the mask 20 to be processed to the first sliding end 132 .

[0083] S300: The first process station 11 processes the mask plate 20 to be processed. Exemplarily, the first process station 11 may be a developing machine. In S300, first, the deionized water storage tank 171 supplies deionized water to the first process chamber 11a, and the deionized water is used to rinse the mask plate 20 to be processed. Then, the developer storage tank 171 supplies developer to the first process chamber 11a, and the developer and deionized water are mixed for pre-development. Then, the developer is used for development for 15-20 minutes. Then, the transport mechanism 14 rotates the mask plate 20 to be processed for 5 minutes to spin dry the developed mask plate 20 to be processed.

[0084] S400 : the transport mechanism 14 transports the mask 20 to be processed to the second sliding end 133 .

[0085] S500: The second process station 12 processes the mask plate 20 to be processed. Exemplarily, the second process station 12 may be an etching machine. In S500, the carbon dioxide water storage tank 171 supplies carbon dioxide water to the second process chamber 12a, the deionized water storage tank 171 supplies deionized water to the second process chamber 12a, and the etching liquid storage tank 171 supplies etching liquid to the second process chamber 12a.

[0086] In the mask manufacturing method provided by the embodiment of the present application, during the mask manufacturing process, the conveying mechanism 14 can convey the mask 20 to be processed to the first sliding end 132, and then the first process station 11 processes the mask 20 to be processed, and then the conveying mechanism 14 conveys the mask 20 to be processed to the second sliding end 133, and then the second process station 12 processes the mask 20 to be processed. In this way, on the one hand, the mask 20 to be processed can be quickly rotated between the first process station 11 and the second process station 12, which improves the production efficiency compared with the manual handling and the transfer of the mask 20 to be processed between different loading boxes by a robot arm; on the other hand, the same set of first slide rails 13 and conveying mechanism 14 can serve at least two process stations (such as the first process station 11 and the second process station 12). Compared with the method in the related art that each machine station corresponds to a set of conveying mechanisms, the present application reduces the number of conveying mechanisms, which not only reduces the equipment cost, but also reduces the occupied space of the equipment.

[0087] In one embodiment, as shown in Figures 1 and 2, the mask manufacturing device 10 also includes a third process table 15, a fourth process table 16, a first loading box 110, a first robot arm 111, a second loading box 112 and a second robot arm 113; the third process table 15 has a third process chamber 15a, and the fourth process table 16 has a fourth process chamber 16a; the first slide rail 13 also includes a third sliding end 134, a fourth sliding end 135, a fifth sliding end 136 and a sixth sliding end 137 connected to the first rail body 131, the third sliding end 134 is disposed in the third process chamber 15a, and the fourth sliding end 135 is disposed in the fourth process chamber 16a.

[0088] 8 , S200 : the transport mechanism 14 transports the mask plate 20 to be processed to the first sliding end 132 , before which the following steps are also included.

[0089] S100 : the first robot arm 111 transfers the mask 20 to be processed in the first loading box 110 to the transport mechanism 14 located at the fifth sliding end 136 .

[0090] Further, S500: the second process station 12 processes the mask plate 20 to be processed, and then further includes the following steps.

[0091] S600 : the transport mechanism 14 transports the mask 20 to be processed to the third sliding end 134 .

[0092] S700: The third process station 15 processes the mask plate 20 to be processed. Exemplarily, the third process station 15 may be a degumming machine. The carbon dioxide water storage tank 171 supplies carbon dioxide water to the third process chamber 15a, the deionized water storage tank 171 supplies deionized water to the third process chamber 15a, the concentrated sulfuric acid storage tank 171 supplies concentrated sulfuric acid to the third process chamber 15a, the hydrogen peroxide storage tank 171 supplies hydrogen peroxide to the third process chamber 15a, and the ammonia water storage tank 171 supplies ammonia water to the third process chamber 15a.

[0093] S800 : the transport mechanism 14 transports the mask 20 to be processed to the fourth sliding end 135 .

[0094] S900: The fourth process station 16 processes the mask plate 20 to be processed. Exemplarily, the fourth process station 16 may be a cleaning machine. The carbon dioxide water storage tank 171 supplies carbon dioxide water to the fourth process chamber 16a, the deionized water storage tank 171 supplies deionized water to the fourth process chamber 16a, the concentrated sulfuric acid storage tank 171 supplies concentrated sulfuric acid to the fourth process chamber 16a, the hydrogen peroxide storage tank 171 supplies hydrogen peroxide to the fourth process chamber 16a, and the ammonia water storage tank 171 supplies ammonia water to the fourth process chamber 16a.

[0095] S1000 : The transport mechanism 14 transports the processed mask to the sixth sliding end 137 .

[0096] S1100: The second robot arm 113 transfers the processed mask on the conveying mechanism 14 located at the sixth sliding end 137 to the second loading box 112. In this way, all the steps of mask production are completed.

[0097] In one of the embodiments, if a process station crashes, the mask production device 10 operates according to the following process: first, the alarm mechanism 115 sounds an alarm, then the transport mechanism 14 transports the mask plate 20 to be processed to the second slide rail 114, and then the process personnel repair the process station. After the repair is completed, the transport mechanism 14 transports the mask plate 20 to be processed to the process chamber at the time of the crash, and continues to process the mask plate 20 to be processed.

[0098] In the description of this specification, the description with reference to the terms "some embodiments", "other embodiments", "ideal embodiments", etc. means that the specific features, structures, materials or characteristics described in conjunction with the embodiment or example are included in at least one embodiment or example of the present application. In this specification, the schematic descriptions of the above terms do not necessarily refer to the same embodiment or example.

[0099] The technical features of the above-described embodiments may be arbitrarily combined. To make the description concise, not all possible combinations of the technical features of the above-described embodiments are described. However, as long as there is no contradiction in the combination of these technical features, they should be considered to be within the scope of this specification.

[0100] The above-described embodiments only express several implementation methods of the present application, and the descriptions thereof are relatively specific and detailed, but they cannot be construed as limiting the scope of the patent application. It should be pointed out that, for a person of ordinary skill in the art, several variations and improvements can be made without departing from the concept of the present application, and these all belong to the protection scope of the present application. Therefore, the protection scope of the patent application shall be subject to the attached claims.

Claims

1. A mask manufacturing device, characterized in that: include: A first process station having a first process chamber; The first process station is a developing machine station; A second process station having a second process chamber; The second process station is an etching machine; A first slide rail, comprising a first rail body and a first sliding end and a second sliding end connected to the first rail body, wherein the first sliding end is disposed in the first process chamber, and the second sliding end is disposed in the second process chamber; At least one conveying mechanism is slidably disposed on the slide rail, and the conveying mechanism is used to move the mask to be processed; wherein the conveying mechanism is configured to convey the mask to be processed to the first sliding end, and the first process station processes the mask to be processed; then the conveying mechanism conveys the mask to be processed to the second sliding end, and the second process station processes the mask to be processed; The mask manufacturing device further includes a third process table, the third process table has a third process cavity, and the third process table is a degumming machine table; the first slide rail further includes a third sliding end connected to the first rail body, and the third sliding end is arranged in the third process cavity; The mask manufacturing device further includes a fourth process table, the fourth process table has a fourth process chamber, and the fourth process table is a cleaning machine; the first slide rail further includes a fourth sliding end connected to the first rail body, and the fourth sliding end is arranged in the fourth process chamber; the number of the conveying mechanisms is not less than 4; The mask making device further comprises a reagent storage assembly, wherein the reagent storage assembly comprises a plurality of storage tanks, each of which is connected to at least one transport pipe; In the first process chamber, the second process chamber, the third process chamber and the fourth process chamber, each process chamber is connected to at least one of the storage tanks through the corresponding transport pipe.

2. The mask manufacturing device according to claim 1, characterized in that: The mask making device also includes: a driving assembly, electrically connected to the conveying mechanism; A control machine is electrically connected to the first process station, the second process station, the third process station, the fourth process station and the driving component.

3. The mask manufacturing device according to claim 2, characterized in that: The transport mechanism comprises: A sliding assembly, slidably disposed on the first slide rail; A loading platform, rotatably disposed on the sliding assembly; Wherein, the driving assembly includes a first movable driving member and a rotating driving member, the output end of the first movable driving member is connected to the sliding assembly, and the output end of the rotating driving member is connected to the stage.

4. The mask manufacturing device according to claim 3, characterized in that: The sliding assembly comprises: a third slide rail, slidably disposed on the first slide rail and connected to the first moving drive member; The slider is slidably disposed on the third slide rail, and the loading platform is rotatably disposed on the slider; the driving assembly also includes a second movable driving member, and the output end of the second movable driving member is connected to the slider.

5. The mask manufacturing device according to claim 1, characterized in that: The first slide rail further includes a fifth sliding end connected to the first rail body; The mask making device also includes: A first loading box, used for loading the mask to be processed; The first robot arm is configured to transfer the mask to be processed in the first loading box to the transport mechanism located at the fifth sliding end.

6. The mask manufacturing device according to claim 1, characterized in that: The first slide rail further comprises a sixth slide end connected to the first rail body; the transport mechanism is also used to move the processed mask; The mask making device also includes: A second loading box, used for loading a processed mask; The second robot arm is configured to transfer the processed mask on the transport mechanism located at the sixth sliding end to the second loading box.

7. The mask manufacturing device according to claim 1, characterized in that: The mask manufacturing device further comprises a second slide rail connected to the first slide rail, and the second slide rail is used for transferring the transport mechanism.

8. A mask manufacturing method, applied to a mask manufacturing device, characterized in that: The mask making device comprises a first process table, a second process table, a first slide rail and at least one conveying mechanism; the first process table has a first process cavity, and the second process table has a second process cavity; the first slide rail comprises a first rail body and a first sliding end and a second sliding end connected to the first rail body, the first sliding end is arranged in the first process cavity, and the second sliding end is arranged in the second process cavity; the conveying mechanism is slidably arranged on the slide rail and is used to operate the mask to be processed; the mask making device also comprises a third process table, a fourth process table, a first loading box, a first robot arm, a second loading box and a second robot arm; the third process table has a third process cavity, and the fourth process table has a fourth process cavity; the first slide rail also comprises a third sliding end, a fourth sliding end, a fifth sliding end and a sixth sliding end connected to the first rail body, the third sliding end is arranged in the third process cavity, and the fourth sliding end is arranged in the fourth process cavity; The production method comprises: The first robot arm transfers the mask to be processed in the first loading box to the transport mechanism located at the fifth sliding end; The transport mechanism transports the mask to be processed to the first sliding end; The first process station processes the mask to be processed; The transport mechanism transports the mask to be processed to the second sliding end; The second process station processes the mask to be processed; The transport mechanism transports the mask to be processed to the third sliding end; The third process station processes the mask to be processed; The transport mechanism transports the mask to be processed to the fourth sliding end; The fourth process station processes the mask to be processed; The transport mechanism transports the processed mask to the sixth sliding end; The second robot arm transfers the processed mask on the transport mechanism located at the sixth sliding end to the second loading box.

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