Gate opening and closing device and gate control method

Abstract

The invention belongs to the technical field of silicon carbide material manufacturing, and discloses a gate control method and a gate opening and closing device. The gate control method comprises the following steps: driving a gate to move from a first position to a second position in response to a first signal generated by completion of atmosphere environment construction of a first cavity and / or a second cavity in a housing, and exposing an opening between the first cavity and the second cavity on the housing; in response to a second signal generated after the reaction container moves from the first cavity to the designated position of the second cavity, the gate is driven to move from the second position to the first position, and an opening, located between the first cavity and the second cavity, of the housing is closed. According to the gate control method and the gate opening and closing device, the gate can be driven to move through the driving assembly on the basis of the first signal generated by the atmosphere detection assembly and the second signal generated by the position detection assembly, so that automatic control is achieved, and the working efficiency can be effectively improved.

Description

Technical Field

[0001] The present invention belongs to the technical field of silicon carbide material manufacturing, and in particular relates to a gate switch device used in a silicon carbide material manufacturing system and a corresponding gate control method. Background Art

[0002] Silicon carbide is a representative ceramic material that is widely used throughout the industrial field due to its excellent physical, chemical and electrical properties.

[0003] In recent years, with the active progress in the development of semiconductor processing parts using silicon carbide materials, the importance of silicon carbide materials has increased. In particular, silicon carbide materials are widely used as components for etching processes in semiconductor process parts due to their high plasma tolerance. Silicon carbide materials for semiconductor etching process parts are the traditional method of manufacturing silicon carbide. Since quality and performance cannot be met by this method, chemical vapor deposition is often used in the prior art.

[0004] Chemical vapor deposition of silicon carbide uses a mixture of Si-containing gases such as SiH4, SiCl2, SiCl4 and C-containing gases such as C2H2, CH4, C3H8 as raw material gas, or CH3SiCl3, CH3SiH3, (CH3)3SiH) and the like. There are some deposition methods using monolithic raw materials, and the production of silicon carbide materials by chemical vapor deposition has the disadvantage of low productivity because the process is carried out in an intermittent chemical vapor deposition furnace. However, if the intermittent chemical vapor deposition furnace is to be improved to a continuous chemical vapor deposition furnace, the gate control problem of the reaction vessel needs to be solved. Summary of the invention

[0005] In order to solve the deficiencies of the prior art, the present invention discloses a gate control method in a first aspect, which is applied to chemical vapor deposition of silicon carbide materials, comprising:

[0006] In response to a first signal generated when the atmosphere environment of the first cavity and / or the second cavity in the housing is completed, the gate is driven to move from the first position to the second position to expose an opening on the housing between the first cavity and the second cavity;

[0007] In response to a second signal generated after the reaction container moves from the first cavity to a designated position of the second cavity, the gate is driven to move from the second position to the first position to close the opening of the cover between the first cavity and the second cavity.

[0008] A further technical solution may be that the first signal includes:

[0009] A first preparation signal, which is generated when the atmosphere environments in the first cavity and the second cavity are built and the atmosphere environments in the first cavity and the second cavity are the same;

[0010] A first completion signal is generated after the reaction in the reaction container is completed and the atmosphere environment in the second chamber is completed.

[0011] A further technical solution may be that the control method further comprises:

[0012] In response to the first signal, driving the second conveying assembly to move from the fourth position to the third position so that the second conveying assembly is matched with the first conveying assembly in the housing;

[0013] In response to the second signal, the second conveying assembly is driven to move from the third position to the fourth position, so as to release the cooperation between the second conveying assembly and the first conveying assembly.

[0014] A further technical solution may be that, when the gate is in the first position,

[0015] Detecting the air pressure of the first cavity and / or the second cavity and generating corresponding air pressure data;

[0016] Generate air pressure feedback information based on the comparison result between the air pressure data and the corresponding target air pressure data;

[0017] In response to the air pressure feedback information, the gate is driven to continue to move a set distance in a direction from the second position to the first position;

[0018] The current position of the driving gate is set as a new first position.

[0019] A further technical solution may be that, along the direction in which the reaction container moves, the housing is formed with a preparation chamber, a reaction chamber and a heat treatment chamber connected in sequence;

[0020] When the gate is disposed between the preparation chamber and the reaction chamber, the first chamber is the preparation chamber, the second chamber is the reaction chamber, and in response to the first preparation signal, the gate is driven to move to connect the preparation chamber and the reaction chamber;

[0021] When the gate is disposed between a reaction chamber and a heat treatment chamber, the first chamber is the reaction chamber, the second chamber is the heat treatment chamber, and in response to the first completion signal, the gate is driven to move to connect the reaction chamber and the heat treatment chamber.

[0022] The second aspect of the present invention further discloses a gate switch device, which is applied to silicon carbide material manufacturing equipment, comprising:

[0023] a gate, the gate being able to abut against a housing of the manufacturing device and used to seal an opening of the housing to isolate the first cavity and the second cavity of the manufacturing device from each other;

[0024] A driving assembly connected to the gate, and used to drive the gate to move between a first position and a second position;

[0025] An atmosphere detection component, disposed in the housing, for detecting the atmosphere in the first cavity and the second cavity;

[0026] a position detection component, used to detect the position of a reaction vessel of the manufacturing equipment;

[0027] A control component, electrically connected to the drive component, the position detection component and the atmosphere detection component respectively;

[0028] When the gate is in the first position, the opening of the cover shell is closed to isolate the first cavity and the second cavity;

[0029] When the gate is located at the second position, the opening of the cover shell is exposed to connect the first cavity and the second cavity.

[0030] A further technical solution may be that the driving component includes:

[0031] A guide member, connected to the gate, and used to guide the gate to move;

[0032] A shell, wherein the shell is connected with the cover to form a relatively closed moving cavity, and the gate moves in the moving cavity;

[0033] A driving device is connected to the gate and is used to drive the gate to move.

[0034] A further technical solution may be that the gate comprises:

[0035] An abutting surface, used for abutting against the cover shell, wherein the abutting surface and an opposite surface of the cover shell are parallel to each other;

[0036] Along the direction from the second position toward the first position, the abutting surface is inclined toward the side where the gate is located.

[0037] A further technical solution may be that a line connecting the first position and the second position is parallel to a horizontal plane.

[0038] A further technical solution may also include:

[0039] An air pressure detection component is arranged in the housing and is used to detect the air pressure in the first cavity and the second cavity. The air pressure detection component is electrically connected to the control component.

[0040] A further technical solution may be that the cover forms an enclosed structure to constitute the first cavity and the second cavity;

[0041] The abutting surface abuts against the cover shell on all sides.

[0042] A further technical solution may also include:

[0043] A second conveying assembly, used to cooperate with the first conveying assembly disposed in the housing, the second conveying assembly being capable of moving back and forth between a third position and the second position;

[0044] When the second conveying assembly is located at the third position, the second conveying assembly is connected and matched with the first conveying assembly;

[0045] When the second conveying assembly is located at the fourth position, the second conveying assembly is disengaged from the first conveying assembly.

[0046] A further technical solution may also include:

[0047] a guide assembly connected to the second conveying assembly and used to guide the movement of the second conveying assembly;

[0048] The switching component is connected to the second conveying component and is used to drive the second conveying component to move.

[0049] The gate control method and the gate switch device adopt an automated control strategy. The driving component can accurately control the movement of the gate based on the first signal generated by the atmosphere detection component and the second signal generated by the position detection component. This signal-based automated control method significantly improves work efficiency. First, through the atmosphere detection component, the atmosphere environment in the cavity can be monitored in real time, and the opening and closing state of the gate can be controlled, thereby optimizing the process and ensuring product quality. Secondly, the position detection component provides accurate position information of the reaction container between the cavities, so that the movement of the gate can respond accurately, ensuring efficient and accurate transportation of the reaction container between the cavities. BRIEF DESCRIPTION OF THE DRAWINGS

[0050] In order to more clearly illustrate the embodiments of the present invention or the existing technical solutions, the drawings required for use in the embodiments or the description of the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments recorded in the present invention. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying creative labor.

[0051] Figure 1 This is a schematic diagram of the structure of a silicon carbide material manufacturing device according to an embodiment of the present invention;

[0052] Figure 2 Schematic diagram of the structure of the gate switch device in the embodiment of the present invention, the direction indicated by the arrow in the figure is the direction from the second position to the first position, wherein the gate is located at the first position and the second conveying assembly is located at the fourth position;

[0053] Figure 3 Another structural schematic diagram of the gate switch device in an embodiment of the present invention, the direction indicated by the arrow in the figure is the direction from the second position to the first position, wherein the gate is located at the second position and the second conveying assembly is located at the third position;

[0054] Figure 4 It is a schematic diagram of the structure of the gate in an embodiment of the present invention;

[0055] Figure 5 Schematic diagram of the flow of the gate control method in an embodiment of the present invention.

[0056] Description of reference numerals:

[0057] A, first cavity; B: second cavity; C, gate switch device;

[0058] 1. Gate; 11. Abutment surface;

[0059] 2. Cover; 21. Preparation chamber; 22. Reaction chamber; 23. Heat treatment chamber;

[0060] 3. Guide parts;

[0061] 4. The second conveying assembly;

[0062] 5. The first conveying assembly;

[0063] 6. Shell; 61. Moving cavity. DETAILED DESCRIPTION

[0064] In order to make the purpose, technical solution and advantages of the present invention clearer, the technical solution of the present invention will be clearly and completely described below in conjunction with specific embodiments and corresponding drawings. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0065] In order to improve the technical problem of low productivity of intermittent chemical vapor deposition furnaces, the applicant of this patent hopes to propose a continuous chemical vapor deposition furnace. In this type of chemical vapor deposition furnace, the reaction container passes through the preparation chamber, reaction chamber and heat treatment chamber in sequence, and the atmosphere and temperature are prepared in the preparation chamber respectively; chemical vapor deposition is completed in the reaction chamber, and the post-heat treatment and cooling operations are completed in the heat treatment chamber.

[0066] That is to say, in the process of continuous chemical vapor deposition, the reaction vessel needs to be transported and passed through the preparation chamber, reaction chamber and heat treatment chamber in sequence. This is because when three different chambers are used to implement a segmented continuous process, since each chamber is relatively independent, when the reaction vessel completes the work in one chamber and moves to the next chamber, the previous chamber can be connected to a new reaction vessel to achieve continuous operation. That is to say, when a supply system for chemical vapor deposition equipment is provided, the preparation chamber, reaction chamber and heat treatment chamber of the continuous chemical vapor deposition furnace can operate on different reaction vessels at the same time.

[0067] The applicant has discovered that, in the process of using a continuous chemical vapor deposition furnace, it is necessary to accurately control the opening of the gate to meet the needs of moving the reaction container between multiple chambers.

[0068] In view of this, the inventor of the present invention provides a gate control method and a gate switch device applied to a continuous vapor deposition furnace to meet the above requirements.

[0069] Implementation Method 1

[0070] A first aspect of this embodiment discloses a gate control method, which is applied to chemical vapor deposition of silicon carbide materials, comprising:

[0071] In response to a first signal generated when the atmosphere environment of the first cavity A and / or the second cavity B in the housing 2 is completed, the gate 1 is driven to move from the first position to the second position to expose the opening between the first cavity A and the second cavity B on the housing 2;

[0072] In response to a second signal generated after the reaction container moves from the first cavity A to a designated position of the second cavity B, the gate 1 is driven to move from the second position to the first position to close the opening between the first cavity A and the second cavity B on the cover 2.

[0073] The second aspect of this embodiment discloses a gate switch device C, which is applied to silicon carbide material manufacturing equipment, including:

[0074] A gate 1, which can be abutted against a housing 2 of the manufacturing equipment and is used to seal an opening of the housing 2 to isolate a first cavity A and a second cavity B of the manufacturing equipment from each other;

[0075] A driving assembly (not shown in the drawings), connected to the gate 1, and used to drive the gate 1 to move between the first position and the second position;

[0076] An atmosphere detection component, disposed in the housing 2, for detecting the atmosphere in the first cavity A and the second cavity B;

[0077] a position detection component, used to detect the position of a reaction vessel of the manufacturing equipment;

[0078] A control component, electrically connected to the drive component, the position detection component and the atmosphere detection component respectively;

[0079] When the gate 1 is located at the first position, the opening of the housing 2 is closed to isolate the first cavity A and the second cavity B;

[0080] When the gate 1 is located at the second position, the opening of the cover shell 2 is exposed to connect the first cavity A and the second cavity B.

[0081] When the reaction container is located in the first cavity A, the gate 1 is located in the second position and abuts against the cover 2, sealing the opening on the cover 2 connecting the first cavity A and the second cavity B to isolate the first cavity A and the second cavity B from each other.

[0082] Specifically, in this embodiment, Figure 5 As shown, when the reaction container needs to move from the first cavity A to the second cavity B, the atmosphere detection component arranged on the cover shell 2 detects the atmosphere environment of the first cavity A and the second cavity B respectively, and sends the detection data to the control component; the control component obtains the detection data from the atmosphere detection component and analyzes it; when the detection data corresponding to the first cavity A and / or the second cavity B reaches the set range, it means that the atmosphere environment of the first cavity A and / or the second cavity B is completed, the control component generates a first signal and sends it to the drive component, and the drive component drives the gate 1 to move from the first position to the second position in response to the first signal, exposing the opening on the cover shell 2 between the first cavity A and the second cavity B, so as to connect the first cavity A and the second cavity B, so that the reaction container can pass through the opening and move from the first cavity A to the designated position of the second cavity B, as shown in FIG. Figure 2 shown.

[0083] like Figure 5 As shown, when the position detection component detects that the reaction container moves from the first cavity A to the specified position of the second cavity B, a second signal is generated and sent to the driving component; the driving component responds to the second signal to drive the gate 1 to move from the second position to the first position, closing the opening of the cover 2 between the first cavity A and the second cavity B, so as to isolate the first cavity A and the second cavity B again. Figure 3 shown.

[0084] It should be noted that, in this embodiment, Figure 1As shown, the silicon carbide material manufacturing equipment can be a continuous chemical vapor deposition furnace, including a cover 2, a gas support device and a reaction vessel. The cover 2 forms a preparation chamber 21, a reaction chamber 22 and a heat treatment chamber 23 connected in sequence; the reaction vessel is transported and passes through the preparation chamber 21, the reaction chamber 22 and the heat treatment chamber 23 in sequence; the gas support device is connected to the cover 2 to provide a gas environment. Among them, the preparation chamber 21 is used to fix and install the substrate by using a clamp, and prepare for the chemical vapor deposition process under the premise of matching the required production quantity. The reaction chamber 22 is similar to a traditional chemical vapor deposition equipment. The heat treatment chamber 23 can heat treat chemical vapor deposition products such as silicon carbide to control and improve the purity level of the product. The gate switch device C in this embodiment can be set between the preparation chamber 21 and the reaction chamber 22 to isolate or connect the preparation chamber 21 and the reaction chamber 22; it can also be set between the reaction chamber 22 and the heat treatment chamber 23 to isolate or connect the reaction chamber 22 and the heat treatment chamber 23.

[0085] As can be seen from the above, the reaction vessels in different cavities (preparation chamber 21, reaction chamber 22 and heat treatment chamber 23) represent different processes; accordingly, each cavity needs to construct a corresponding atmosphere environment in order to meet the respective process requirements. Therefore, by using the atmosphere detection component to detect the atmosphere environment of each cavity, the preparation status of each cavity can be obtained in real time; when the detection data corresponding to the first cavity A and / or the second cavity B reaches the set range, it means that the atmosphere environment of the first cavity A and / or the second cavity B is completed, and it also means that the reaction vessel can enter the next process. In other words, through the setting of the atmosphere detection component, the process status can be monitored in real time, and the gate 1 can be automatically controlled based on the detection data detected by the atmosphere detection component. Among them, the atmosphere environment can include parameters such as air pressure, composition, component content, and temperature.

[0086] It is worth mentioning that the gate switch device C can be set between the two cavities as described above, for connecting or closing the two cavities; it can also be set at the opening of any cavity, only for closing or opening the opening of the cavity.

[0087] The gate 1 control method and the gate switch device C in this embodiment adopt an automated control strategy. The driving component can accurately control the movement of the gate 1 based on the first signal generated by the atmosphere detection component and the second signal generated by the position detection component. This signal-based automated control method significantly improves work efficiency. First, through the atmosphere detection component, the atmosphere environment in the cavity can be monitored in real time, and the opening and closing state of the gate 1 can be controlled, thereby optimizing the process and ensuring product quality. Secondly, the position detection component provides accurate position information of the reaction container between the cavities, so that the movement of the gate 1 can respond accurately, ensuring efficient and accurate transportation of the reaction container between the cavities.

[0088] In some embodiments, the first signal comprises:

[0089] A first preparation signal, which is generated when the atmosphere environments in the first cavity A and the second cavity B are completed and the atmosphere environments in the first cavity A and the second cavity B are the same;

[0090] A first completion signal is generated after the reaction in the reaction container is completed and the atmosphere environment in the second chamber B is completed.

[0091] When the gate 1 is arranged between the preparation chamber 21 and the reaction chamber 22, the first cavity A is the preparation chamber 21, and the second cavity B is the reaction chamber 22. It can be seen from the above that the reaction vessel needs to be prepared for the chemical vapor deposition process in the preparation chamber 21, and after the reaction chamber 22 is prepared, it moves to the reaction chamber 22. Since the atmosphere required for the chemical vapor deposition process needs to be constructed in the reaction chamber 22; but when the reaction vessel moves from the preparation chamber 21 to the reaction chamber 22, the gate 1 needs to be opened to connect the preparation chamber 21 and the reaction chamber 22. In the process of connecting the reaction chamber 22 and the preparation chamber 21, air flow will be generated, which may affect the atmosphere that has been prepared in the reaction chamber 22; this makes it necessary to rebuild the atmosphere in the reaction chamber 22 after the reaction vessel moves to the reaction chamber 22 and closes the gate 1, which greatly affects the production efficiency.

[0092] Therefore, it is necessary to construct the same atmosphere environment as the reaction chamber 22 in the preparation chamber 21 to reduce the impact of the atmosphere environment in the reaction chamber 22 during the movement of the reaction container from the preparation chamber 21 to the reaction chamber 22. The first preparation signal generated after the atmosphere environment in the preparation chamber 21 and the reaction chamber 22 is constructed represents that the preparation work for the reaction container to move from the preparation chamber 21 to the reaction chamber 22 has been completed. In response to the first preparation signal, the drive component drives the gate 1 to move from the first position to the second position, exposing the opening between the preparation chamber 21 and the reaction chamber 22 on the cover 2, so that the reaction container can move from the preparation chamber 21 to the reaction chamber 22. At this time, since the atmosphere environments of the preparation chamber 21 and the reaction chamber 22 are the same, the reaction container has little impact on the atmosphere environment in the reaction chamber 22 when it moves; after the reaction container moves to the specified position of the reaction chamber 22 and the gate 1 is closed, the next process can be carried out quickly, which greatly saves efficiency.

[0093] When the gate 1 is arranged between the reaction chamber 22 and the heat treatment chamber 23, the first cavity A is the reaction chamber 22, and the second cavity B is the heat treatment chamber 23. As can be seen from the above, the reaction container may affect the atmosphere of the two connected cavities during movement. Therefore, constructing an atmosphere in the heat treatment chamber 23 can, on the one hand, meet the atmosphere requirements required for heat treatment; on the other hand, it can reduce the influence between the reaction chamber 22 and the heat treatment chamber 23 when they are connected, thereby improving work efficiency. The first completion signal generated after the atmosphere in the heat treatment chamber 23 is constructed represents that the preparation work for the reaction container to move from the reaction chamber 22 to the heat treatment chamber 23 has been completed. In response to the first completion signal, the drive assembly drives the gate 1 to move from the second position to the first position, closing the opening between the first cavity A and the second cavity B on the cover 2, so that the reaction container can move from the reaction chamber 22 to the heat treatment chamber 23. In this way, the atmosphere in the reaction chamber 22 is less affected and can be quickly restored to the required atmosphere to meet process requirements and improve work efficiency; and the atmosphere in the heat treatment chamber 23 has been constructed, and after the reaction container moves to the heat treatment chamber 23, heat treatment can be carried out quickly to improve work efficiency.

[0094] In some embodiments, the drive assembly may include:

[0095] A guide member 3, connected to the gate 1, and used for guiding the gate 1 to move;

[0096] A housing 6, wherein the housing 6 is connected to the cover shell 2 to form a relatively closed moving chamber 61, and the gate moves in the moving chamber 61;

[0097] A driving device (not shown in the drawings) is connected to the gate 1 and is used to drive the gate 1 to move.

[0098] Specifically, the guide member 3 can be a combination of a slide rail and a slider, or the guide member 3 can also be a combination of a guide rod and a guide hole. The above two guide structures are both widely used guide structures in the prior art, and therefore will not be described in detail here. Importantly, the combination of the outer shell 6 and the cover shell 2 forms a relatively closed movable cavity 61, in which the gate 1 can move in the movable cavity 61. The purpose of this design is twofold: first, the movable cavity 61 provides the necessary space for the movement of the gate 1; second, when the gate 1 is exposed to the opening of the cover shell 2, the outer shell 6 can still form a relative seal with the cover shell 2, thereby effectively preventing outside air from entering the interior of the cover shell 2, avoiding adverse effects on the atmosphere of the first cavity A and the second cavity B in the cover shell 2.

[0099] The driving device may be a cylinder or an electric cylinder. Due to the requirements of the chemical deposition process, the strength of the cavity is required to be high. Therefore, in order to meet the requirements, the weight of the gate 1 is relatively large. Therefore, in some preferred embodiments, the driving device may be an oil cylinder.

[0100] Implementation Method 2

[0101] This embodiment provides a gate switch device C and a gate 1 control method. This embodiment is a further improvement made based on the first embodiment, and the improvement is as follows: Figure 4 As shown, the gate 1 comprises:

[0102] The abutting surface 11 is used to abut against the cover shell 2 , and the abutting surface 11 and an opposite surface of the cover shell 2 are parallel to each other.

[0103] Specifically, Figure 4 As shown, the first position is located at the position where the opening of the housing 2 is located, and the second position is located at one side of the housing 2. In other words, the gate 1 moves from the second position to the first position, which means that the gate 1 moves from one side of the housing 2 to the position where the opening of the housing 2 is located to close the opening. When the gate 1 is located at the first position, the abutting surface 11 of the gate 1 can abut on the housing 2.

[0104] In some embodiments, the abutting surface 11 and the opposite surface of the cover shell 2 are designed to be parallel to each other. This configuration ensures that the parts of the abutting surface 11 that are in contact with the cover shell 2 are evenly stressed, thereby ensuring the reliability of the closure. Further, in some embodiments, a sealing material is provided between the abutting surface 11 and the opposite surface of the cover shell 2. When the abutting surface 11 abuts against the cover shell 2, uniform pressure can be applied to the sealing material, thereby achieving effective closure. In these embodiments, by setting the abutting surface 11 and the opposite surface of the cover shell 2 to be parallel, the sealing material between the two can withstand pressure evenly, avoiding the problem of local over-extrusion. This uniform pressure distribution not only improves the sealing performance of the sealing material, but also extends its service life.

[0105] It is worth noting that in this embodiment, Figure 4 As shown, along the direction from the second position to the first position, the abutting surface 11 is inclined toward the side where the gate 1 is located. In this way, when the gate 1 moves from the second position to the first position, the distance between the abutting surface 11 of the gate 1 and the opposite surface of the cover 2 gradually decreases. Through this design, the gate 1 can not only move to the specified position in the linear motion from the first position to the second position, but also achieve abutment with the opposite surface of the cover 2 at the same time. This integrated action simplifies the operation process, while effectively reducing the complexity of the entire structure, improving the reliability of the structure and the convenience of maintenance.

[0106] In some embodiments, the line between the first position and the second position is perpendicular to the horizontal plane. For example, the first position is between the first cavity A and the second cavity B, and the second position is above the cover 2; the gate 1 moves up and down in the longitudinal direction to close or expose the opening of the cover 2. In this embodiment, the movement direction of the gate 1 is the same as the gravity direction of the gate 1, and under the gravity of the gate 1, the gate 1 has a tendency to move from the second position to the first position. Combined with the inclined setting of the abutment surface 11, the gate 1 naturally tends to approach the opposite surface of the cover 2 under the action of gravity. Therefore, when the gate 1 is in the first position, the abutment surface 11 can always maintain abutment with the opposite surface of the cover 2 without the action of external force, so that the sealing material between the abutment surface 11 and the cover 2 is continuously squeezed, thereby maintaining good sealing performance.

[0107] In some other embodiments, the line connecting the first position and the second position is parallel to the horizontal plane. Figure 1 , Figure 2 and Figure 3 As shown, the first position is located between the first cavity A and the second cavity B, and the second position is located on one side of the housing 2. In this case, the gate 1 moves left and right in the lateral direction to close or expose the opening of the housing 2. Unlike the vertical movement embodiment mentioned above, the movement of the gate 1 in this embodiment mainly depends on the drive assembly. This movement mode driven by the drive assembly allows for more precise control of the movement of the gate 1, and also provides a basis for intelligent control. In this way, precise adjustment of the movement of the gate 1 can be achieved to meet higher-level operational requirements.

[0108] In some other embodiments, the gate switch device C may further include:

[0109] An air pressure detection component is disposed in the housing 2 and is used to detect the air pressure in the first cavity A and the second cavity B. The air pressure detection component is electrically connected to the control component.

[0110] The air pressure detection component is arranged in the housing 2, and its main function is to monitor the air pressure in the first cavity A and the second cavity B. The control component can receive the air pressure data provided by the air pressure detection component in real time, so as to accurately monitor the air pressure changes in the first cavity A and the second cavity B. This configuration not only lays the foundation for intelligent control, but also directly improves the quality of the product by ensuring the stability of the air pressure during the process. In addition, the ability to monitor the air pressure in real time significantly enhances safety and reliability, and effectively reduces the potential risk of accidents caused by air pressure fluctuations or abnormalities.

[0111] In some other embodiments, the air pressure data collected by the air pressure detection component can not only be used to monitor the air pressure changes in the first cavity A and the second cavity B, but can also be directly used as an important basis for the control component to control the gate 1. Specifically,

[0112] When the gate 1 is located at the first position, the air pressure of the first cavity A and / or the second cavity B is detected, and corresponding air pressure data is generated;

[0113] Generate air pressure feedback information based on the comparison result between the air pressure data and the corresponding target air pressure data;

[0114] In response to the air pressure feedback information, the gate 1 is driven to continue to move a set distance in a direction from the second position to the first position;

[0115] The current position of the driving gate 1 is set as a new first position.

[0116] The difference between the air pressure data in the cavity and the corresponding target air pressure data may be caused by the insufficient sealing performance of gate 1. The reasons for the insufficient sealing performance of gate 1 mainly include the following points: 1. When the abutment pressure between the abutment surface 11 of gate 1 and the opposite surface of cover shell 2 is insufficient, the sealing material may not be fully squeezed, resulting in poor sealing effect; 2. Over time, the sealing material between gate 1 and cover shell 2 may shrink due to aging, resulting in decreased sealing performance. Both of these situations will affect the sealing effect of gate 1, resulting in a difference between the air pressure in the cavity and the target air pressure. Therefore, timely detection and maintenance of the sealing performance of gate 1 is crucial to ensure the stability of the process and product quality. In this embodiment, the gas detection component detects the air pressure of the cavity and sends the air pressure data to the controller; the controller compares the detected air pressure data with the corresponding target air pressure data, and generates air pressure feedback information if there is a difference between the two; in response to the air pressure feedback information, the gate 1 is driven to continue to move a set distance in the direction of the second position pointing to the first position, so as to increase the abutment pressure between the abutment surface 11 of the gate 1 and the opposite surface of the cover 2 or continue to extrude the aged sealing material to restore the sealing performance of the gate 1. In addition, the current position of the driven gate 1 is set as the new first position to ensure that the gate 1 can maintain the sealing performance during the next use. Through the above-mentioned steps of detecting air pressure, generating feedback information, driving the gate 1 to move and updating the position, there are at least the following advantages:

[0117] 1. Ensure that the air pressure in the first cavity A and the second cavity B is maintained within the set target range, thereby optimizing the process and product quality;

[0118] 2. Improve the automation level of the system, reduce the need for manual intervention, and improve operational efficiency and reliability;

[0119] 3. Through continuous position adjustment, dynamic response to air pressure changes can be achieved, enhancing the flexibility and adaptability of the system;

[0120] 4. Prevent production interruption or equipment damage caused by unstable air pressure and extend the service life of the system.

[0121] It is worth noting that the sealing performance of the aged sealing material can be restored by increasing the extrusion pressure in the initial stage. However, once the sealing material ages to a certain extent, this method of increasing the pressure will no longer be effective. Therefore, in some embodiments, a third position may be provided; along the direction from the second position to the first position, the third position is located after the first position. When the gate 1 is in the third position, it means that the sealing performance of the sealing material is insufficient and needs to be replaced. Specifically, the controller monitors the current first position of the gate 1, and compares the current first position with the set third position. If the distance between the two is less than the set threshold, a warning message is generated. The purpose of this warning message is to notify the staff and prompt them to replace the sealing material to ensure the normal operation and safety of the system.

[0122] Implementation Method 3

[0123] This embodiment is a further improvement based on the first embodiment or the second embodiment, and the improvement is that: the cover shell 2 forms an enclosed structure to constitute the first cavity A and the second cavity B;

[0124] The abutting surface 11 abuts against the cover shell 2 on all sides.

[0125] The housing 2 is designed as an enclosed structure for forming a first cavity A and a second cavity B. This structural design enables the housing 2 to effectively surround and define the space of the two cavities. In addition, since the abutting surface 11 is in close contact with the housing 2 on all sides, such a configuration ensures that the contact between the abutting surface 11 and the housing 2 is uniform and tight, thereby forming an effective seal between the abutting surface 11 and the housing 2. Such a sealing configuration helps prevent external substances from entering the cavity while maintaining the stability of the internal environment of the cavity, which is crucial to ensuring the smooth progress of the process and the quality of the product.

[0126] According to the above description, the reaction container needs to move between the first cavity A and the second cavity B. Therefore, the present invention needs to set a conveying structure to achieve effective conveying of the reaction container. However, since the gate 1 needs to move during operation and finally abuts against the cover 2, the traditional conveying structure may interfere with the movement of the gate 1 and affect its normal operation. Therefore, in some embodiments, such as Figure 2 and Figure 3 As shown, the gate switch device C may also include:

[0127] A second conveying assembly 4, used to cooperate with the first conveying assembly 5 arranged in the housing 2, and the second conveying assembly 4 can move back and forth between the third position and the second position;

[0128] When the second conveying assembly 4 is located at the third position, the second conveying assembly 4 is connected and matched with the first conveying assembly 5;

[0129] When the second conveying assembly 4 is located at the fourth position, the second conveying assembly 4 is released from the first conveying assembly 5 .

[0130] Accordingly, if Figure 5 As shown, the gate 1 control method also includes:

[0131] In response to the first signal, the second conveying assembly 4 is driven to move from the fourth position to the third position, so that the second conveying assembly 4 is matched with the first conveying assembly 5 in the housing 2;

[0132] In response to the second signal, the second conveying assembly 4 is driven to move from the third position to the fourth position, so that the cooperation between the second conveying assembly 4 and the first conveying assembly 5 is released.

[0133] In this embodiment, if Figure 2 and Figure 3 As shown, the first conveying assembly 5 is arranged in the housing 2, and the second conveying assembly 4 is arranged outside the housing 2. The first conveying assembly 5 can reciprocate between the third position and the second position to connect or separate with the second conveying assembly 4. When the driving assembly responds to the first signal and drives the gate 1 to move from the second position to the first position, that is, from the outside of the housing 2 to between the two cavities, the second conveying assembly 4 will move from the third position to the fourth position, thereby releasing the cooperation with the first conveying assembly 5 and making room for the movement of the gate 1, as shown in FIG. Figure 3 shown.

[0134] In addition, if Figure 5 As shown, when the driving component responds to the second signal, the gate 1 is driven to move from the second position to the first position, that is, from the outside of the housing 2 to between the two cavities. In this process, the movement of the gate 1 provides the necessary space for the second conveying component 4 to move from the fourth position to the third position and re-establish the connection with the first conveying component 5, as shown in FIG. Figure 2 shown.

[0135] The cleverness of this design is that it allows the movement of the gate 1 and the second conveying assembly 4 to not interfere with each other, ensuring the smoothness and efficiency of the system operation. By coordinating the movement of the gate 1 and the second conveying assembly 4, efficient transportation of the reaction container between the chambers is achieved, while avoiding possible motion interference problems.

[0136] It is worth noting that in this embodiment, by arranging the first conveying assembly 5 inside the housing 2 and utilizing the enclosed structure of the housing 2, when the gate 1 abuts against the housing 2, it is possible to achieve effective sealing of the cavity while maintaining a high sealing performance. This design ensures the environmental stability of the cavity during the reaction vessel transportation process, which is crucial to ensuring the smooth progress of the process and product quality. In addition, by coordinating the movement of the gate 1 and the second conveying assembly 4, while achieving efficient transportation of the reaction vessel, it is ensured that the sealing performance of the cavity is not affected. This coordinated operation mechanism not only improves the operating efficiency of the system, but also enhances the overall performance and reliability of the system.

[0137] Furthermore, in this embodiment, the movement of the second conveying assembly 4 is also performed in the movement chamber 61 .

[0138] In this embodiment, in order to ensure the stability of the reaction container transportation, the first conveying component 5 and the second conveying component 4 can be conveying rollers.

[0139] In some embodiments, the gate switch device C further includes:

[0140] A guide assembly, connected to the second conveying assembly 4, and used to guide the movement of the second conveying assembly 4;

[0141] The switching component is connected to the second conveying component 4 and is used to drive the second conveying component 4 to move.

[0142] Through the coordinated work of the guide component and the switching component, the gate switch device C of the present invention can achieve efficient and precise control of the second conveying component 4, thereby ensuring smooth and safe conveyance of the reaction containers between the cavities.

[0143] The guide assembly can be a combination of a slide rail and a slider, or a combination of a guide rod and a guide hole. The above two guide structures are widely used in the prior art, so they are not described in detail here. The guide assembly has substantially the same function as the above guide member 3. The switching assembly can be a cylinder or an electric cylinder.

[0144] In some embodiments, Figure 2 and Figure 3 As described above, the guide member 3 of the present invention is not only used to guide the movement of the gate 1, but also can be used as a guide component to guide the movement of the second conveying component 4. This means that the second conveying component 4 and the gate 1 share the same guide structure, thereby simplifying the system design and improving the space utilization efficiency.

[0145] Similarly, the driving device for driving the gate 1 to move can also be used as a switching component for driving the second conveying component 4. This design allows the second conveying component 4 and the gate 1 to share the same driving device, further reducing the complexity of the system while ensuring the coordination and consistency of the operation.

[0146] This integrated design not only improves the automation level and operating efficiency of the system, but also enhances the reliability and maintenance convenience of the system. In addition, the design of shared guide structure and drive device also reduces production costs, making the entire system more economical and efficient.

[0147] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of the embodiments of the present invention rather than to limit them. Although the embodiments of the present invention have been described in detail with reference to the preferred embodiments, those skilled in the art should understand that the technical solutions of the embodiments of the present invention can still be modified or replaced by equivalents, and these modifications or equivalent replacements cannot cause the modified technical solutions to deviate from the scope of the technical solutions of the embodiments of the present invention.

Claims

1. A gate control method, applied to chemical vapor deposition of silicon carbide material, characterized in that: include: In response to a first signal generated when the atmosphere environment of the first cavity and / or the second cavity in the housing is completed, the gate is driven to move from the first position to the second position to expose an opening on the housing between the first cavity and the second cavity; In response to a second signal generated after the reaction container moves from the first cavity to a designated position of the second cavity, the gate is driven to move from the second position to the first position to close the opening of the cover between the first cavity and the second cavity.

2. The gate control method according to claim 1, characterized in that: The first signal includes: A first preparation signal, which is generated when the atmosphere environments in the first cavity and the second cavity are built and the atmosphere environments in the first cavity and the second cavity are the same; A first completion signal is generated after the reaction in the reaction container is completed and the atmosphere environment in the second chamber is completed.

3. The gate control method according to claim 1, characterized in that: The control method further comprises: In response to the first signal, driving the second conveying assembly to move from the fourth position to the third position so that the second conveying assembly is matched with the first conveying assembly in the housing; In response to the second signal, the second conveying assembly is driven to move from the third position to the fourth position, so as to release the cooperation between the second conveying assembly and the first conveying assembly.

4. The gate control method according to claim 1, characterized in that: When the gate is in the first position, Detecting the air pressure of the first cavity and / or the second cavity and generating corresponding air pressure data; Generate air pressure feedback information based on the comparison result between the air pressure data and the corresponding target air pressure data; In response to the air pressure feedback information, the gate is driven to continue to move a set distance in a direction from the second position to the first position; The current position of the driving gate is set as a new first position.

5. The gate control method according to claim 2, characterized in that: Along the moving direction of the reaction container, the cover shell is formed with a preparation chamber, a reaction chamber and a heat treatment chamber connected in sequence; When the gate is disposed between the preparation chamber and the reaction chamber, the first chamber is the preparation chamber, the second chamber is the reaction chamber, and in response to the first preparation signal, the gate is driven to move to connect the preparation chamber and the reaction chamber; When the gate is disposed between a reaction chamber and a heat treatment chamber, the first chamber is the reaction chamber, the second chamber is the heat treatment chamber, and in response to the first completion signal, the gate is driven to move to connect the reaction chamber and the heat treatment chamber.

6. A gate switch device, applied to silicon carbide material manufacturing equipment, characterized in that: include: a gate, the gate being able to abut against a housing of the manufacturing device and used to seal an opening of the housing to isolate the first cavity and the second cavity of the manufacturing device from each other; A driving assembly connected to the gate, and used to drive the gate to move between a first position and a second position; An atmosphere detection component, disposed in the housing, for detecting the atmosphere in the first cavity and the second cavity; a position detection component, used to detect the position of a reaction vessel of the manufacturing equipment; A control component, electrically connected to the drive component, the position detection component and the atmosphere detection component respectively; When the gate is in the first position, the opening of the cover shell is closed to isolate the first cavity and the second cavity; When the gate is located at the second position, the opening of the cover shell is exposed to connect the first cavity and the second cavity.

7. The gate switch device according to claim 6, characterized in that: The drive assembly comprises: A guide member, connected to the gate, and used to guide the gate to move; A shell, wherein the shell is connected with the cover to form a relatively closed moving cavity, and the gate moves in the moving cavity; A driving device is connected to the gate and is used to drive the gate to move.

8. The gate switch device according to claim 6, characterized in that: The gate comprises: An abutting surface, used for abutting against the cover shell, wherein the abutting surface and an opposite surface of the cover shell are parallel to each other; Along the direction from the second position toward the first position, the abutting surface is inclined toward the side where the gate is located.

9. The gate switch device according to claim 8, characterized in that: A line connecting the first position and the second position is parallel to a horizontal plane.

10. The gate switch device according to claim 6, characterized in that: Also includes: An air pressure detection component is arranged in the housing and is used to detect the air pressure in the first cavity and the second cavity. The air pressure detection component is electrically connected to the control component.

11. The gate switch device according to claim 8, characterized in that: The cover shell forms an enclosed structure to constitute the first cavity and the second cavity; The abutting surface abuts against the cover shell on all sides.

12. The gate switch device according to claim 11, characterized in that: Also includes: A second conveying assembly, used to cooperate with the first conveying assembly disposed in the housing, the second conveying assembly being capable of moving back and forth between a third position and the second position; When the second conveying assembly is located at the third position, the second conveying assembly is connected and matched with the first conveying assembly; When the second conveying assembly is located at the fourth position, the second conveying assembly is disengaged from the first conveying assembly.

13. The gate switch device according to claim 12, characterized in that: Also includes: A guiding component is connected to the second conveying component and is used to guide the second conveying component to move; and a switching component is connected to the second conveying component and is used to drive the second conveying component to move.

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