Vacuum magnetic suction vibration type column planting equipment and column planting method

Abstract

The invention provides a vacuum magnetic suction vibration type column implanting device, and relates to the technical field of column implanting equipment, the vacuum magnetic suction vibration type column implanting device comprises a column suction plate, the column suction plate is provided with a column implanting site, and the shape and size of the column implanting site allow a vertical implanting component to be accommodated; the vibration device is arranged below the column suction plate, and the vibration device vibrates to enable the implanted component in the working area to jump; and the force acting device is used for applying upward force to the implantation component when the vibration device vibrates, so that the implantation component enters the column implantation site. Through the vibration device, the implanted component jumps, and by combining with the action of upward force applied to the implanted component by the force acting device, the probability that the implanted component enters the column implanting site is increased, so that the yield is increased, and the equipment is low in cost and easy to install and maintain.

Description

Technical Field

[0001] The present invention relates to the technical field of column planting equipment, and in particular to a vacuum magnetic absorption vibration type column planting equipment and a column planting method. Background Art

[0002] As the performance requirements of electronic products continue to increase, such as computers, communication equipment, consumer electronics, etc., higher requirements are placed on packaging technology, including faster signal transmission speeds and higher integration. The packaging density of chips is getting higher and higher, requiring packaging technology to be able to realize more functional units in a smaller space. Pillar planting technology can effectively reduce circuit paths and improve circuit operating speed and reliability.

[0003] With the development of the semiconductor industry, especially the progress of integrated circuit technology, pillar planting has gradually matured as a high-density connection technology. Pillar planting equipment can ensure the accuracy of the relative position of pillars and pads. Pillar planting technology was originally mainly used in high-end computers, communication equipment and other fields. With the increasing demand for high-performance and high-reliability packaging in industries such as consumer electronics, automotive electronics, and medical equipment, pillar planting technology has been applied and promoted in a wider range of application fields.

[0004] In the prior art, the column planting method is all done manually. After the substrate with glue applied is positioned by a fixture, tweezers are used to place tin columns one by one in the column planting position. The tin columns fall on the glue application position corresponding to the substrate by their own gravity, thus completing the entire column planting work. The column planting has poor stability and low efficiency, and there is room for improvement. Summary of the invention

[0005] In view of the defects in the prior art, the purpose of the present invention is to provide a vacuum magnetic absorption vibration type column planting device.

[0006] A vacuum magnetic suction vibration type column planting device provided according to the present invention includes: a column suction plate: the column suction plate is provided with a column planting site, the shape and size of the column planting site allow for accommodating an implant component in an upright state; a vibration device: the vibration device is configured below the column suction plate, and the vibration of the vibration device causes the implant component in the working area to jump; a force application device: when the vibration device vibrates, an upward force is applied to the implant component, causing the implant component to enter the column planting site.

[0007] Preferably, a tray is provided in the working area of ​​the vibration device, and the tray comprises a groove accommodating cavity for accommodating the implant component, and the upper part of the groove accommodating cavity is open.

[0008] Preferably, the force application device comprises a magnetic device, and the implant component comprises a magnetic material component; when the vibration device vibrates, the magnetic device applies an upward force to the implant component.

[0009] Preferably, the upward force exerted by the magnetic device on the implant member includes the action of a constant force or the action of a varying force.

[0010] Preferably, the force application device comprises a vacuum device, which is configured to communicate with the implantation site, and the vacuum device evacuates the implantation site; when the vibration device vibrates, the vacuum device applies an upward force to the implant component.

[0011] Preferably, the upward force applied by the vacuum device to the implant member comprises a constant force or a varying force.

[0012] Preferably, the suction column plate is clamped and fixed by a vacuum base and a pressure plate, and a magnetic device is arranged above the vacuum base.

[0013] Preferably, the column planting sites are arranged in an array on the column suction plate, and a through channel is provided above any of the column planting sites.

[0014] Preferably, the vacuum base is provided with an air inlet and outlet hose interface connected to the vacuum device, and a first cavity connecting the air inlet and outlet hose interface and any channel is formed in the vacuum base.

[0015] According to a column planting method provided by the present invention, the column planting method comprises the following steps:

[0016] adding an implant component into the tray body;

[0017] The force application device and the vibration device are turned on, and the implanted component is sucked into the implantation site under the combined action of vacuum, vibration and magnetic force to complete the implantation;

[0018] Turn off the force application device and the vibration device, remove the redundant implanted components on the surface of the column laying board, and complete the column laying action.

[0019] Compared with the prior art, the present invention has the following beneficial effects:

[0020] 1. The present invention uses a vibration device to make the implant component bounce, and cooperates with the force application device to apply an upward force to the implant component, which helps to increase the probability of the implant component entering the implantation site, thereby helping to improve the yield rate, and the equipment cost is low, easy to install and maintain.

[0021] 2. The present invention overcomes the gravity of the implant component by means of vibration, magnetic attraction and vacuum suction to suck the implant component into the implantation site on the suction column plate, which helps to increase the probability of the implant component entering the implantation site. BRIEF DESCRIPTION OF THE DRAWINGS

[0022] Other features, objects and advantages of the present invention will become more apparent from the detailed description of non-limiting embodiments made with reference to the following drawings:

[0023] Figure 1 This is a schematic diagram of the overall structure of the column planting device mainly embodied in the present invention;

[0024] Figure 2 This is a schematic diagram of the structure of the column support mainly embodied in the present invention;

[0025] Figure 3 This is a schematic diagram of the vacuum air circuit structure of the present invention;

[0026] Figure 4 It is a structural schematic diagram of the present invention mainly embodying the column planting site on the column suction plate.

[0027] As shown in the figure:

[0028] Implant component 1 Groove receiving cavity 6

[0029] Tray body 2 Inlet and outlet hose interface 7

[0030] Press plate 3 First cavity 8

[0031] Vacuum Base 4 Channels 9

[0032] Suction column plate 5 Column planting site 10 DETAILED DESCRIPTION

[0033] The present invention is described in detail below in conjunction with specific embodiments. The following embodiments will help those skilled in the art to further understand the present invention, but are not intended to limit the present invention in any form. It should be noted that, for those of ordinary skill in the art, several changes and improvements can also be made without departing from the concept of the present invention. These all belong to the protection scope of the present invention.

[0034] It should be emphasized that the implant component 1 of the present application can be a columnar structure or a spherical structure. The device of the technical solution of the present application is particularly suitable for columnar implant components 1, and can also be suitable for spherical implant components 1.

[0035] Embodiment 1

[0036] like Figure 1 , Figure 2 , Figure 3 as well as Figure 4As shown, a vacuum magnetic absorption vibration type column planting device provided according to the present invention includes a column suction plate 5, a vibration device and a force application device. A column planting site 10 is arranged on the column suction plate 5, and the shape and size of the column planting site 10 allow for accommodating an implant component 1 in an upright state. The vibration device is arranged below the column suction plate 5, and the vibration of the vibration device causes the implant component 1 in the working area to jump. When the vibration device vibrates, the force application device applies an upward force to the implant component 1, causing the implant component 1 to enter the column planting site 10.

[0037] During operation, the implant component 1 is put into the working area of ​​the vibration device, and the vibration device is started to make the implant component 1 in the working area jump. At the same time, the force device applies an upward force to the implant component 1, causing the implant component 1 to enter the implant column site 10, and the force device of the present application at least satisfies the requirement of being able to overcome the gravity of the implant component 1. Furthermore, the force device of the technical solution of the present application can apply a constant force to the implant component 1, and can also apply a variable force to the implant component 1. When the force device applies a variable force to the implant component 1, the posture of the implant component 1 can be adjusted, which helps to improve the efficiency of the implant component 1 entering the implant column site 10 upward.

[0038] like Figure 1 As shown, specifically, the vibration device of the present application can adopt the vibration machine in the prior art, and the working area of ​​the vibration device is provided with a tray body 2, and the tray body 2 is installed on the upper surface of the working area of ​​the vibration device. The tray body 2 includes a groove accommodating cavity 6 for accommodating the implant member 1, and the upper part of the groove accommodating cavity 6 is open. The groove accommodating cavity 6 provided on the tray body 2 limits the movement range of the implant member 1 in the working area of ​​the vibration device. More specifically, the depth of the groove accommodating cavity 6 is greater than the maximum jumping height of the implant member 1 under the action of the vibration device.

[0039] Furthermore, the implant component 1 of the present application may include a tin column. This embodiment is only described by taking the tin column as an example, and does not limit the material of the implant component 1. The force application device includes a magnetic device and / or a vacuum device.

[0040] like Figure 2 , Figure 3 as well as Figure 4 As shown, in a feasible implementation, the force application device includes a magnetic device, and the implant component 1 includes a magnetic material component. Specifically, the implant component 1 includes a magnetic material component, which can be a magnetic coating layer attached to the surface of the tin column. When the vibration device vibrates, the magnetic device applies an upward force to the implant component 1.

[0041] The column suction plate 5 is fixed by the vacuum base 4 and the pressing plate 3, and the vacuum base 4 is located above the pressing plate 3. A magnetic device is arranged above the vacuum base 4. The magnetic device can also be embedded and installed inside the vacuum base 4. The column planting sites 10 are arranged in an array on the column suction plate 5, and a through channel 9 is arranged above any of the column planting sites 10. The vacuum base 4 is provided with an air inlet and outlet hose interface 7 connected to the vacuum device, and a first cavity 8 is formed in the vacuum base 4 to connect the air inlet and outlet hose interface 7 and any channel 9.

[0042] More specifically, the upward force exerted by the magnetic device on the implant component 1 includes a constant force or a variable force. When the electromagnet maintains a stable and continuous current, the magnetic device exerts a constant upward force on the implant component 1. When the electromagnet maintains a variable and continuous current, the magnetic device exerts a variable upward force on the implant component 1. The technical solution of the present application also provides a method for implementing a magnetic device with a variable force, where a permanent magnet is placed on an orthogonal motion track, so that the orthogonal motion track drives the permanent magnet to move in a plane, forming a variable magnetic field, thereby exerting a variable upward force on the implant component 1.

[0043] In another feasible embodiment: the force application device includes a vacuum device, and the vacuum device is configured to communicate with the implantation column site 10. When the vibration device vibrates, the vacuum device applies an upward force to the implant component 1. The implantation column sites 10 are arranged in an array on the suction column plate 5. The upward suction force of the implantation column site 10 on the implantation component 1 is achieved by vacuuming the vacuum device.

[0044] Further, the upward force applied by the vacuum device to the implant component 1 includes a constant force or a variable force. When the vacuum device maintains a stable vacuum degree and suction rate, the vacuum device applies a constant upward force to the implant component 1. When the vacuum device maintains a stable vacuum degree and a variable suction rate, the vacuum device applies a variable upward force to the implant component 1.

[0045] It should be noted that the present application preferably uses a magnetic device and a vacuum device at the same time, and by setting the electromagnet to maintain a continuously changing current and / or the vacuum device to maintain a changing suction rate, an upward changing force is applied to the implant component 1 to improve the implantation efficiency and the implantation success rate.

[0046] More specifically, during use, the staff or the robot arm can grab and move the suction column plate 5 with the help of the handle. During operation, the integral installation structure consisting of the vacuum base 4, the suction column plate 5 and the pressing plate 3 can be directly placed on the tray body 2, or the integral installation structure consisting of the vacuum base 4, the suction column plate 5 and the pressing plate 3 can be placed above the tray body 2 with the help of auxiliary equipment such as tooling and a robot arm.

[0047] Embodiment 2

[0048] Based on the first embodiment, according to a novel column planting device provided by the present invention, the magnetic field strength of the magnetic component, the vacuuming rate of the vacuum component and the frequency of the vibration device can all be designed according to actual needs.

[0049] Specifically, the setting of the magnetic field strength of the magnetic component is related to the shape and weight of the implant component 1 .

[0050] The shape of the cylindrical object: Generally speaking, the longer the cylinder, the greater the magnetic force required. This is because a long cylinder may produce a greater leverage effect, increasing the risk of tilting or shifting. The larger the diameter of the cylinder, the larger the contact area, and generally requires a stronger magnetic force to ensure stable adsorption. A flat cylinder end face is easier to adsorb than an arc-shaped cylinder end face because it provides a larger contact area.

[0051] Weight of cylindrical objects: Weight is proportional to the required magnetic force. The heavier the object, the greater the magnetic force required to overcome gravity and maintain stable adsorption. The magnetic force should be at least greater than the weight of the object, and a safety factor is usually set, such as 1.5-2 times the weight of the object.

[0052] The magnetic force calculation can be expressed by a simplified magnetic force calculation formula:

[0053] F=μ*B^2*A / (2*μ0)

[0054] Where: F = magnetic force (N); μ = magnetic permeability of the material; B = magnetic induction intensity (T); A = contact area (m^2); μ0 = vacuum permeability (4π×10^-7H / m).

[0055] This application provides a specific implementation as a reference:

[0056] Assume that the smallest diameter column (0.15 mm) is used;

[0057] A=π*(0.15 / 2000)^2=1.77×10^-8m^2;

[0058] Assume that the magnetic induction intensity B = 0.5T (this is a typical magnetic induction intensity of a permanent magnet);

[0059] F=(0.5^2*1.77×10^-8) / (2*4π×10^-7);

[0060] F≈0.000884N=0.884mN.

[0061] Calculation of vacuum adsorption force:

[0062] The calculation formula of vacuum adsorption force is:

[0063] F=P*A

[0064] Where: F = vacuum adsorption force (N); P = pressure difference (Pa); A = contact area (m^2).

[0065] This application provides a specific implementation as a reference:

[0066] The same minimum diameter column (0.15 mm) was used;

[0067] A=π*(0.15 / 2000)^2=1.77×10^-8m^2;

[0068] Assume that the vacuum pressure difference we use is P = 50kPa (this is a typical industrial vacuum system pressure);

[0069] F = 50000*1.77×10^-8;

[0070] F = 0.000885N = 0.885mN.

[0071] Comparison and analysis:

[0072] For the smallest diameter pillars (0.15 mm), the calculated magnetic and vacuum forces are very close, both around 0.88-0.89 mN. However, these forces still need to be compared with gravity and other forces such as surface tension.

[0073] Gravity calculation: Assuming that the column material is steel (density is about 7800kg / m^3), the length is 1.5mm (10 times the diameter), the volume V = π*(0.15 / 2000)^2*0.0015 = 2.65×10^-11m^3, and the weight W = 7800*2.65×10^-11*9.81≈2.03×10^-6N = 0.00203mN.

[0074] Safety factor consideration: Assuming a 20-fold safety factor is required, the total force required = 0.00203*20 = 0.0406 mN.

[0075] Force distribution: Since the calculated magnetic attraction force and vacuum adsorption force are much greater than the required total force, you can choose to use only one of the forces, or use a combination of the two forces. For example, you can choose: vacuum adsorption force: 0.0365mN (90% of the required total force) magnetic attraction force: 0.0041mN (10% of the required total force).

[0076] Adjustment parameters: For vacuum adsorption, the vacuum pressure can be reduced to about 2.06kPa to achieve a force of 0.0365mN. For magnetic attraction, the magnetic induction intensity can be reduced to about 0.1T to achieve a force of 0.0041mN.

[0077] Conclusion: For the smallest size of pillars, both vacuum adsorption and magnetic attraction can provide sufficient force. Considering the need to implant a large number of pillars and minimize the interference between adjacent pillars, it is recommended to mainly use vacuum adsorption force, supplemented by a small amount of magnetic attraction force. For pillars with larger diameters (up to 0.4mm), the force will increase accordingly, but the principle still applies. In practical applications, it may be necessary to adjust the size and proportion of the force according to the specific situation (such as pillar material, environmental conditions, etc.). Furthermore, an adjustable system can be designed that can dynamically adjust the vacuum pressure and magnetic field strength according to pillars of different sizes and materials.

[0078] In a specific case:

[0079] Take a column with a diameter of 0.4 mm and assume its length is 3 mm as an example;

[0080] Magnetic attraction calculation:

[0081] F = (B^2*A) / (2*μ0);

[0082] A=π*(0.4 / 2000)^2=1.26×10^-7m^2;

[0083] Assume that the magnetic induction intensity remains unchanged, B = 0.5T;

[0084] F=(0.5^2*1.26×10^-7) / (2*4π×10^-7);

[0085] F≈0.00628N=6.28mN.

[0086] Calculation of vacuum adsorption force:

[0087] Use the formula: F = P * A;

[0088] A=π*(0.4 / 2000)^2=1.26×10^-7m^2;

[0089] Maintain the same pressure difference, P = 50kPa;

[0090] ^

[0091] F = 50000*1.26×10-7;

[0092] F = 0.0063N = 6.3mN.

[0093] Gravity calculation:

[0094] Assume that the column material is still steel (density is about 7800kg / m^3) and the length is 3mm;

[0095] Volume V = π*(0.4 / 2000)^2*0.003=3.77×10^-10m^3;

[0096] Weight W = 7800*3.77×10^-10*9.81≈2.88×10^-5N=0.0288mN.

[0097] Safety factor considerations:

[0098] Maintaining a safety factor of 20 times, the total force required = 0.0288*20 = 0.576mN.

[0099] Force distribution: The calculated magnetic and vacuum forces are much greater than the total required force. The strength of these forces can be significantly reduced: for example, you can choose: vacuum force: 0.518mN (90% of the total required force); magnetic force: 0.058mN (10% of the total required force).

[0100] Adjust parameters: For vacuum adsorption, we can reduce the vacuum pressure to about 4.11kPa to achieve a force of 0.518mN. For magnetic attraction, we can reduce the magnetic induction intensity to about 0.054T to achieve a force of 0.058mN.

[0101] Analysis and conclusion: For the largest size of the column (0.4mm diameter, 3mm length), the required force is significantly greater than the smallest size of the column, but it is still much less than the maximum force that can be provided by the magnetic attraction and vacuum adsorption at full power. Both vacuum adsorption and magnetic attraction can easily provide sufficient force, and even significantly reduce their strength. Due to the need to implant a large number of columns and considering the minimized interference between adjacent columns, it is still recommended to mainly use vacuum adsorption force, supplemented by a small amount of magnetic attraction. Compared with the smallest size column, the largest size column requires about 14 times the force (0.576mN vs 0.0406mN). This means that the system needs to have enough adjustment range to accommodate columns of different sizes.

[0102] Furthermore, the advantages and disadvantages of magnetic attraction, vibration, and vacuum adsorption when planting columns are as follows:

[0103]

[0104]

[0105] This application combines magnetic adsorption, vacuum adsorption and vibration to create a more efficient and reliable system for inserting cylindrical objects into holes. Specifically:

[0106] Initial positioning and alignment: Magnetic attraction can start to work as soon as the column approaches the orifice, helping with initial positioning and alignment. This is because the magnetic force can attract the column at a certain distance, guiding it to the approximately correct position even if it is not perfectly aligned.

[0107] Stable grip: Vacuum suction can be activated when the cylinder approaches the orifice, providing a stable and controlled grip. This method is suitable for a variety of materials and can ensure that the cylinder will not fall out during the insertion process.

[0108] Overcoming resistance and self-alignment: The vibration system can provide slight vibrations during the insertion process to help overcome friction between the post and the hole wall and possible sticking. The vibration can also promote the self-alignment of the post, making it easier to slide into the hole.

[0109] Precise control: Magnetic force can provide the main vertical force to help control the descent speed. Vacuum adsorption can accurately control the position of the column to prevent lateral deviation. Vibration can adjust the frequency and amplitude as needed to adapt to different insertion stages.

[0110] Adaptability: This combined system can adapt to various materials and shapes of columns: For magnetic materials, it can mainly rely on magnetic adsorption. For non-magnetic materials, it can mainly use vacuum adsorption. The vibration system can be used for all types of materials.

[0111] Overcoming their respective shortcomings: The disadvantage of magnetic adsorption that the strength varies with distance can be compensated by vacuum adsorption. The problem of vacuum adsorption being sensitive to surface conditions can be partially alleviated by vibration. The instability that may be caused by vibration can be offset by the stabilizing effect of magnetic and vacuum adsorption.

[0112] Optimization of the insertion process: Initial stage: mainly use magnetic force for rough positioning. Contact stage: start vacuum suction to ensure stable grasping. Insertion stage: turn on vibration and gradually reduce magnetic and vacuum suction to let the column slide into the hole in a controlled state. Final positioning: magnetic or vacuum suction can be increased briefly to ensure that the column is fully in place.

[0113] Improved success rate: By combining these three methods, the system can better cope with various possible problems, such as: imperfect initial alignment; tiny burrs or irregularities on the hole wall; slight defects on the column surface; interference from environmental factors (such as vibration or airflow).

[0114] Real-time adjustment: The insertion process can be monitored by sensors, and the size of the three forces and vibration parameters can be adjusted in real time to obtain the best effect.

[0115] Adaptation to different sizes: This combined system can more easily adapt to different sized columns and holes, simply by adjusting the parameters of the individual subsystems.

[0116] Combining magnetic attraction, vacuum attraction, and vibration can create a highly flexible and effective system. This approach can significantly increase the probability of successfully inserting a cylindrical object into a hole while reducing the potential for problems during the insertion process. Although this system may be more complicated to initially set up and control, it provides greater reliability and adaptability, especially when dealing with cylinders of various materials, shapes, and sizes. In application scenarios that require high precision and high success rates, this combined approach may bring significant benefits.

[0117] Embodiment 3

[0118] Based on the first or second embodiment, a column planting method according to the present invention includes:

[0119] The implant component 1 is added into the tray body 2 .

[0120] The force application device and the vibration device are turned on to evacuate the air, so that a negative pressure air chamber is formed at the implantation site 10. The implant component 1 is sucked into the implantation site 10 under the combined effects of vacuum, vibration and magnetic force to complete the implantation.

[0121] The force application device and the vibration device are turned off, and the redundant implanted components 505 on the surface of the column laying plate 304 are removed to complete the column laying action.

[0122] Specifically, the column planting jig is installed on the vibration device and the electromagnetic device;

[0123] After the air inlet and outlet hose interface 7 is connected to the trachea and the vacuum is turned on, the air inlet and outlet hose interface 7, the first cavity 8, the channel 9 and the column planting site 10 form a negative pressure air chamber;

[0124] Pour the implant component 1 into the groove receiving cavity 6 of the tray body 2;

[0125] The column falls into the column planting position 10 due to the combined effects of gravity, vacuum, vibration, shaking and magnetic force to complete the column planting;

[0126] If an electromagnetic device is used, the last step is to turn off the electromagnetic device and remove the excess columns on the surface of the column suction plate 5.

[0127] A few points to note:

[0128] The surface of the cylinder is magnetically coated;

[0129] During the vibration of the column, the vibration frequency of the vibration device can be dynamically adjusted to ensure that the column does not jump out of the cavity;

[0130] Electromagnetic devices can control the magnitude of magnetic force by adjusting the magnitude of the current;

[0131] The vibration device generally has a seesaw shaking mechanism, a gyratory shaking mechanism, and a reciprocating shaking mechanism. These three types of mechanisms can further improve the yield rate of column planting;

[0132] The three shaking mechanisms mentioned above can also be separated from the vibration device and exist independently;

[0133] The electromagnetic device and the vacuum structure may both exist separately, or either of the electromagnetic device and the vacuum structure may be used in conjunction with the vibration device.

[0134] It should be further explained that the column planting device and column planting method of the present application are also applicable to ball planting.

[0135] In the description of the present application, it should be understood that the terms "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside", "outside", etc., indicating orientations or positional relationships, are based on the orientations or positional relationships shown in the accompanying drawings, and are only for the convenience of describing the present application and simplifying the description, and do not indicate or imply that the referred device or element must have a specific orientation, be constructed and operated in a specific orientation, and therefore should not be understood as a limitation on the present application.

[0136] The above describes the specific embodiments of the present invention. It should be understood that the present invention is not limited to the above specific embodiments, and those skilled in the art can make various changes or modifications within the scope of the claims, which does not affect the essence of the present invention. In the absence of conflict, the embodiments of the present application and the features in the embodiments can be combined with each other arbitrarily.

Claims

1. A vacuum magnetic vibration column planting device, characterized in that: include: A column suction plate (5): the column suction plate (5) is provided with a column implantation site (10), the shape and size of the column implantation site (10) allowing for the accommodation of an implanted component (1) in an upright state; Vibration device: the vibration device is arranged below the suction column plate (5), and the vibration device vibrates to cause the implanted component (1) in the working area to jump; A force application device: when the vibration device vibrates, an upward force is applied to the implant component (1), so that the implant component (1) enters the implantation site (10).

2. The vacuum magnetic absorption vibration type column planting device according to claim 1, characterized in that: The working area of ​​the vibration device is provided with a tray, the tray comprising a groove accommodating cavity (6) for accommodating the implant component (1), and the upper part of the groove accommodating cavity (6) is open.

3. The vacuum magnetic absorption vibration type column planting device according to claim 1, characterized in that: The force application device comprises a magnetic device, and the implant component (1) comprises a magnetic material component; When the vibration device vibrates, the magnetic device exerts an upward force on the implant component (1).

4. The vacuum magnetic absorption vibration type column planting device according to claim 3, characterized in that: The upward force exerted by the magnetic device on the implant component (1) includes the effect of a constant force or the effect of a varying force.

5. The vacuum magnetic absorption vibration type column planting device according to claim 1, characterized in that: The force application device comprises a vacuum device, the vacuum device is configured to communicate with the column planting site (10), and the vacuum device evacuates the column planting site (10); When the vibration device vibrates, the vacuum device applies an upward force to the implant component (1).

6. The vacuum magnetic absorption vibration type column planting device according to claim 5, characterized in that: The upward force applied by the vacuum device to the implant component (1) includes a constant force or a variable force.

7. The vacuum magnetic absorption vibration type column planting device according to claim 1, characterized in that: The suction column plate (5) is clamped and fixed by the vacuum base (4) and the pressure plate (3), and a magnetic device is arranged above the vacuum base (4).

8. The vacuum magnetic absorption vibration type column planting device according to claim 7, characterized in that: The column planting sites (10) are arranged in an array on the column suction plate (5), and a through channel (9) is arranged above any of the column planting sites (10).

9. The vacuum magnetic absorption vibration type column planting device according to claim 8, characterized in that: The vacuum base (4) is provided with an air inlet and outlet hose interface (7) connected to a vacuum device, and a first cavity (8) is formed in the vacuum base (4) and is connected to the air inlet and outlet hose interface (7) and any channel (9).

10. A column planting method, characterized in that: Using the vacuum magnetic vibration column planting device according to any one of claims 1 to 9, the column planting method includes the following steps: Adding the implant component (1) into the tray body (2); The force application device and the vibration device are turned on, and the implant component (1) is sucked into the implantation site (10) under the combined effects of vacuum, vibration and magnetic force to complete the implantation; The force application device and the vibration device are turned off, and the redundant implanted components (505) on the surface of the column laying plate (304) are removed to complete the column laying action.

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