Cleaning device for graphite disc in semiconductor industry

By designing the cleaning device for graphite disks in the semiconductor industry, using rotating components, swing arm centering components and cleaning components, the problem of sediment on graphite disks affecting epitaxial quality is solved, and efficient cleaning and reuse of graphite disks is achieved. Improve the efficiency of the epitaxial process.

CN119392208AInactive Publication Date: 2025-02-07BEIJING REJE AUTOMATION

Patent Information

Application Number
CN202411973841.0
Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Filing Date
2024-12-30
Publication Date
2025-02-07
Estimated Expiration
Not applicable · inactive patent

AI Technical Summary

Technical Problem

During the epitaxial growth process of semiconductors, it is difficult to clean the deposits on the graphite disk in time, which affects the epitaxial quality and wafer performance, and the reuse efficiency of graphite disks in the prior art is low.

Method used

A cleaning device for graphite disks in the semiconductor industry is designed, including a rotating assembly, a swing arm centering assembly and a swing assembly. The existence of graphite disk is detected by the in-position sensor, and the swing arm drive part and the rotating assembly are used to drive the graphite disk to rotate. and clean it through a vacuum generator and a cleaning cantilever.

Benefits of technology

Timely cleaning of deposited particles on graphite disks is achieved, the frequency of use of graphite disks and the efficiency of epitaxial process is improved, and the impact of graphite disk sediments on wafer performance is reduced.

✦ Generated by Eureka AI based on patent content.

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Abstract

The invention discloses a cleaning device for a graphite disc in the semiconductor industry, and relates to the technical field of semiconductor epitaxy, the cleaning device comprises an upper substrate and a graphite disc, and the graphite disc is arranged on one side of the upper substrate. According to the invention, deposited particles on the graphite disc can be cleaned in time after the graphite disc process production is completed, so that the use frequency of the graphite disc is improved, the efficiency of an epitaxial process is improved, and meanwhile, the influence of graphite disc deposits on the wafer performance when the graphite disc is repeatedly used is also reduced.
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Description

Technical Field

[0001] The invention relates to the technical field of semiconductor epitaxy, in particular to a cleaning device for graphite discs in the semiconductor industry. Background Art

[0002] In the field of epitaxy in the semiconductor industry, wafers are generally placed in graphite disks and then placed in a process chamber for epitaxial growth. During the epitaxial growth process, compounds will be deposited on the wafer and particles will also be deposited on the graphite disk. Therefore, the deposits on the surface of the graphite disk need to be cleaned in time, otherwise the deposits on the surface of the graphite disk will seriously affect the quality of subsequent epitaxy growth during epitaxial growth, and have a significant impact on the performance of the wafer.

[0003] In the prior art, the graphite disc must be cleaned in time after the epitaxial growth is completed. If a new graphite disc is replaced after each process is completed, the graphite disc cannot be reused, which seriously affects the efficiency of wafer processing. If the graphite disc is reused, it will be difficult to have a good guarantee for the subsequent epitaxial quality.

[0004] Therefore, it is necessary to promptly improve the problems existing in the prior art of timely cleaning of the graphite disk after the process, increasing the frequency of use of the graphite disk and effectively improving the efficiency of the wafer process, so as to reduce the impact of graphite disk deposits on wafer performance. Summary of the invention

[0005] The object of the present invention is to provide a cleaning device for graphite discs in the semiconductor industry to solve the problems raised in the above background technology.

[0006] To achieve the above-mentioned purpose, the present invention provides the following technical solutions: a cleaning device for graphite discs in the semiconductor industry, comprising an upper substrate and a graphite disc, wherein the graphite disc is arranged on one side of the upper substrate, and a rotating assembly is arranged at the center of the other side of the upper substrate, and a swing arm centering assembly and a cleaning assembly are arranged at the edge, the rotating assembly is used for supporting the graphite disc on one side of the upper substrate, multiple groups of the swing arm centering assemblies are used for abutting and transporting the circumference of the graphite disc, and the cleaning assembly is used for cleaning the graphite disc.

[0007] As a further solution of the present invention: the swing arm centering assembly includes a swing arm driving part, a swing arm rotating driven part, a swing arm part, a sensor connecting part and an in-position sensor. The swing arm driving part is arranged on one side of the upper substrate and drives multiple groups of swing arm parts to rotate through the swing arm rotating driven part. The sensor connecting part and the in-position sensor are used for in-position detection of the graphite disc.

[0008] As a further solution of the present invention: the swing arm driving part includes a swing arm rotation driving motor, a synchronous wheel, a first synchronous belt and a first swing arm wheel. The swing arm rotation driving motor is fixedly installed on one side of the upper base plate, the output end of the swing arm rotation driving motor is fixedly connected to the synchronous wheel, the first swing arm wheel is transmission connected to the swing arm rotation driven part, and the synchronous wheel is transmission connected to the first swing arm wheel through the first synchronous belt.

[0009] As a further scheme of the present invention: the swing arm rotating driven part includes a first rotating rod, a second rotating rod, a third rotating rod, a second swing arm wheel, a third swing arm wheel, a fourth swing arm wheel and a second synchronous belt, one end of the first rotating rod passes through the second swing arm wheel and is fixedly connected to the first swing arm wheel, the other end of the first rotating rod is fixedly connected to the first swing arm, the second swing arm wheel, the third swing arm wheel and the fourth swing arm wheel are distributed in a ring array on one side of the upper substrate, one end of the second rotating rod is fixedly connected to the third swing arm wheel, one end of the third rotating rod is fixedly connected to the fourth swing arm wheel, the other end of the third swing arm wheel or the fourth swing arm wheel is respectively fixedly connected to the first swing arm, and the second synchronous belt is arranged around the outer sides of the second swing arm wheel, the third swing arm wheel and the fourth swing arm wheel.

[0010] As a further solution of the present invention: the swing arm part includes a first swing arm and a silicone bearing, one end of the first swing arm away from the second swing arm wheel, the third swing arm wheel or the fourth swing arm wheel is rotatably connected to the silicone bearing, the silicone bearing is movably connected to the graphite disc, and the contact surfaces of each synchronous belt and the swing arm wheel are roughened.

[0011] As a further solution of the present invention: the sensor connecting member is fixedly mounted on one side of the upper substrate, and the in-situ sensor is electrically connected to the sensor connecting member.

[0012] As a further solution of the present invention: the rotating assembly includes a disc rotation drive motor, a rotating flange and a support column, the disc rotation drive motor is fixedly installed on one side of the upper base plate, and the output end is fixedly connected to the rotating flange, one side of the support column is fixedly connected to the rotating flange, and the other side of the support column is movably connected to the graphite disc.

[0013] As a further solution of the present invention: the cleaning assembly includes a cantilever rotation drive motor, a cleaning cantilever and a vacuum generator, the cantilever rotation drive motor is fixedly mounted on one side of the upper substrate, the cleaning cantilever is suspended above the graphite disc, the cleaning cantilever is transmission-connected to the output end of the cantilever rotation drive motor, and the vacuum generator is fixedly mounted on one side of the upper substrate and the output end is connected to the cleaning cantilever.

[0014] As a further solution of the present invention: the cleaning cantilever includes a support rod clamp, a cantilever support rod, a first cantilever and a quick-plug connector, one end of the support rod clamp is fixedly connected to the output end of the cantilever rotation drive motor, the other end of the support rod clamp is fixedly connected to the cantilever support rod, the quick-plug connector is fixedly installed inside the cantilever support rod, the quick-plug connector is connected to the output end of the vacuum generator, and the first cantilever is provided with dense cleaning holes inside.

[0015] As a further solution of the present invention: it also includes a visual device, which is arranged on one side of the graphite disc and is used for monitoring the graphite disc.

[0016] Compared with the prior art, the beneficial effect of the present invention is that the present application can promptly clean the deposited particles on the graphite disc after the graphite disc process production is completed, thereby increasing the use frequency of the graphite disc, improving the efficiency of the epitaxial process, and also reducing the impact of the graphite disc deposits on the wafer performance when the graphite disc is reused.

[0017] Specifically, the present invention first detects the presence of the graphite disc through an in-place sensor, and starts to calibrate and center the graphite disc according to the given signal. Then, the cleaning swing arm of the cleaning assembly rotates to the center position of the calibrated and centered graphite disc, and positive pressure gas is introduced into the vacuum generator to make the cleaning swing arm generate vacuum. The rotating assembly drives the graphite disc to rotate for at least one circle, so that all the deposited particles on the processed graphite disc are cleaned. BRIEF DESCRIPTION OF THE DRAWINGS

[0018] Figure 1 It is a front view of an embodiment of the present invention; Figure 2 is a top view of an embodiment of the present invention; Figure 3 This is a schematic diagram of the structure of cleaning dense holes in an embodiment of the present invention; Figure 4 This is a schematic diagram of the structure of cleaning the long waist hole in an embodiment of the present invention; Figure 5 It is a schematic diagram of the structure of the in-situ sensor in an embodiment of the present invention; Figure 6 A schematic diagram of the structure of a visual device in an embodiment of the present invention; In the figure: 1, upper base plate; 20, swing arm centering assembly; 30, rotating assembly; 40, cleaning assembly; 5, graphite disc; 6, visual equipment; 21. swing arm driving part; 22. swing arm rotation driven part; 23. swing arm part; 24. sensor connecting part; 25. in-position sensor; 41. cantilever rotation driving motor; 42. cleaning cantilever; 43. vacuum generator; 211, swing arm rotation drive motor; 212, synchronous wheel; 213, first synchronous belt; 214, first swing arm wheel; 221, first rotating rod; 222, second rotating rod; 223, third rotating rod; 224, second swing arm wheel; 225, third swing arm wheel; 226, fourth swing arm wheel; 227, second synchronous belt; 231. first swing arm; 232. silicone bearing; 301, disc rotation drive motor; 302, rotating flange; 303, supporting column; 421. Support rod clamp; 422. Cantilever support rod; 423. First cantilever; 424. Quick-connect connector; 425. Cleaning dense holes; 426. Cleaning long waist holes. DETAILED DESCRIPTION

[0019] The technical solution of the present invention will be clearly and completely described below in conjunction with the accompanying drawings.

[0020] In the embodiment of the present invention, refer to Figure 1 , Figure 2 and Figure 5A cleaning device for graphite discs in the semiconductor industry comprises an upper substrate 1 and a graphite disc 5, wherein the graphite disc 5 is arranged on one side of the upper substrate 1, a rotating assembly 30 is arranged at the center of the other side of the upper substrate 1, and a swing arm centering assembly 20 and a cleaning assembly 40 are arranged at the edge, wherein the rotating assembly 30 is used for carrying the graphite disc 5 on one side of the upper substrate 1, a plurality of groups of the swing arm centering assemblies 20 are used for abutting and transporting the circumference of the graphite disc 5, and the cleaning assembly 40 is used for cleaning the graphite disc 5, the swing arm centering assembly 20 comprises a swing arm driving part 21, a swing arm rotating driven part 22, a swing arm part 23, a sensor connecting part 24 and an in-position sensor 25, and the swing arm driving part 21 is arranged on the upper substrate 1 The swing arm driving part 21 is arranged on one side of the upper substrate 1 and drives multiple groups of swing arm parts 23 to rotate through the swing arm rotation driven part 22. The sensor connecting part 24 and the in-position sensor 25 are used for in-position detection of the graphite disc 5. The swing arm driving part 21 is arranged on one side of the upper substrate 1 and drives multiple groups of swing arm parts 23 to rotate through the swing arm rotation driven part 22. The swing arm driving part 21 includes a swing arm rotation driving motor 211, a synchronous wheel 212, a first synchronous belt 213 and a first swing arm wheel 214. The swing arm rotation driving motor 211 is fixedly installed on one side of the upper substrate 1. The output end of the swing arm rotation driving motor 211 is fixedly connected to the synchronous wheel 212. The first swing arm wheel 214 is transmission-connected to the swing arm rotation driven part 22. The synchronous wheel 212 is connected to the swing arm rotation driven part 22. The swing arm rotation driven part 22 includes a first rotating rod 221, a second rotating rod 222, a third rotating rod 223, a second swing arm wheel 224, a third swing arm wheel 225, a fourth swing arm wheel 226 and a second synchronous belt 227. One end of the first rotating rod 221 passes through the second swing arm wheel 224 and is fixedly connected to the first swing arm wheel 214. The other end of the first rotating rod 221 is fixedly connected to the first swing arm 231. The second swing arm wheel 224, the third swing arm wheel 225 and the fourth swing arm wheel 226 are distributed in a circular array on one side of the upper base plate 1. One end of the second rotating rod 222 is fixedly connected to the third swing arm wheel 225. One end of the three rotating rods 223 is fixedly connected to the fourth swing arm wheel 226, and the other end of the third swing arm wheel 225 or the fourth swing arm wheel 226 is fixedly connected to the first swing arm 231 respectively. The second synchronous belt 227 is arranged around the outer sides of the second swing arm wheel 224, the third swing arm wheel 225 and the fourth swing arm wheel 226, and the contact surfaces of each synchronous belt and the swing arm wheel are roughened, that is, the first swing arm wheel 214 is fixedly connected to the first rotating rod 221, and the second swing arm wheel 224 and the first rotating rod 221 are fixedly connected to the upper side of the first swing arm wheel 214, and the second rotating rod 222 and the third swing arm wheel 225, the third rotating rod 223 and the fourth swing arm wheel 226 are fixedly connected, and the second synchronous belt 227 can be as Figure 2As shown in FIG. 1 , the outer sides of the second swing arm wheel 224 , the third swing arm wheel 225 and the fourth swing arm wheel 226 are arranged in a surrounding manner.

[0021] Therefore, the swing arm driving unit 21 drives the swing arm rotation driving motor 211 and the synchronous wheel 212 to rotate. After the synchronous wheel 212 rotates, the first swing arm wheel 214 is driven to rotate through the first synchronous belt 213 covered on its outer side. Because the first swing arm wheel 214 is coaxially arranged with the second swing arm wheel 224, the first rotating rod 221 and the first swing arm 231, the second swing arm wheel 224 drives the third swing arm wheel 225 and the fourth swing arm wheel 226 to move through the second synchronous belt 227, and one end of the third swing arm wheel 225 is fixedly connected to the first swing arm 231 through the second rotating rod 222, and one end of the fourth swing arm wheel 226 is fixedly connected to the first swing arm 231 through the third rotating rod 223. Therefore, the three groups of first swing arms 231 can move and contact and support the graphite disc 5, thereby realizing the transportation operation of the graphite disc 5.

[0022] Other embodiments of the present invention: Figure 2 In a top view, the swing arm portion 23 includes a first swing arm 231 and a silicone bearing 232. One end of the first swing arm 231 away from the second swing arm wheel 224, the third swing arm wheel 225 or the fourth swing arm wheel 226 is rotatably connected to the silicone bearing 232. The silicone bearing 232 is movably connected to the graphite disc 5, and the second synchronous belt 227 can be as shown. Figure 2 As shown in the figure, they are arranged in a surrounding manner around the outer sides of the second swing arm wheel 224, the third swing arm wheel 225 and the fourth swing arm wheel 226. Therefore, the first swing arm 231 contacts the silicone bearing 232, and the silicone bearing 232 contacts the graphite disc 5. The three groups of silicone bearings 232 can be used to clamp and transport the graphite disc 5. The three groups of silicone bearings 232 can also be used to position the graphite disc 5 during its rotation, to ensure that the graphite disc 5 will not fall out of the equipment due to the centrifugal force generated by the operation of the rotating component 30.

[0023] Other embodiments of the present invention: Figure 1 and Figure 5 The sensor connector 24 is fixedly mounted on one side of the upper substrate 1 , and the in-situ sensor 25 is electrically connected to the sensor connector 24 .

[0024] Other embodiments of the present invention: Figure 1The rotating assembly 30 includes a disc rotating drive motor 301, a rotating flange 302 and a supporting column 303. The disc rotating drive motor 301 is fixedly installed on one side of the upper substrate 1, and the output end is fixedly connected to the rotating flange 302. One side of the supporting column 303 is fixedly connected to the rotating flange 302, and the other side of the supporting column 303 is movably connected to the graphite disc 5. The graphite disc 5 can be placed on the end of the supporting column 303 away from the rotating flange 302. After the disc rotating drive motor 301 drives the rotating flange 302 to rotate and the rotating flange 302 drives the supporting column 303 to rotate, the power can be synchronously transmitted to one side of the graphite disc 5, thereby realizing the rotation effect of the graphite disc 5.

[0025] Other embodiments of the present invention: Figure 1 , Figure 2 , Figure 3 and Figure 4 The cleaning assembly 40 includes a cantilever rotation drive motor 41, a cleaning cantilever 42 and a vacuum generator 43. The cantilever rotation drive motor 41 is fixedly mounted on one side of the upper substrate 1. The cleaning cantilever 42 is suspended above the graphite disc 5. The cleaning cantilever 42 is transmission-connected to the output end of the cantilever rotation drive motor 41. The vacuum generator 43 can generate a vacuum environment to suck away the deposited particles on the graphite disc 5. The vacuum generator 43 is fixedly mounted on one side of the upper substrate 1 and outputs The end is connected to the cleaning cantilever 42, and the cleaning cantilever 42 includes a support rod clamp 421, a cantilever support rod 422, a first cantilever 423 and a quick-plug connector 424. One end of the support rod clamp 421 is fixedly connected to the output end of the cantilever rotation drive motor 41, and the other end of the support rod clamp 421 is fixedly connected to the cantilever support rod 422. The quick-plug connector 424 is fixedly installed inside the cantilever support rod 422. The quick-plug connector 424 is connected to the output end of the vacuum generator 43, and the The first cantilever 423 is provided with cleaning dense holes 425 or cleaning long waist holes 426 inside, that is, the cleaning cantilever 42 fixes the cantilever support rod 422 with the output end of the cantilever rotation drive motor 41 to ensure the rotation function of the first cantilever 423, and the quick-insert connector 424 connects the output end of the vacuum generator 43 with the first cantilever 423 to ensure the vacuum adsorption function of the first cantilever 423, and at the same time, the cleaning dense holes 425 or the cleaning long waist holes 426 can well realize the vacuum adsorption function of the first cantilever 423. In addition, the cleaning method used by the first cantilever 423 in the cleaning assembly 40 can be vacuum cleaning or positive pressure blowing cleaning, and the openings at the cleaning location near the graphite disk 5 in the first cantilever 423 can be long waist holes or dense small holes. The first cantilever 423 can be rotated or lifted for cleaning, so this is only exemplary, and technicians in this field can make the above corresponding adjustments to the first cantilever 423 according to actual conditions, but such changes do not exceed the protection scope of the present disclosure.

[0026] Other embodiments of the present invention: Figure 6 , and also includes a visual device 6, which is arranged on one side of the graphite disc 5 and is used for monitoring the graphite disc 5. Specifically, the visual device 6 can monitor the graphite residues remaining on the graphite disc 5. The principle is to detect the flatness of the graphite disc 5. When foreign matter such as graphite residues exists on the graphite disc 5, it will affect the flatness of the graphite disc 5, thereby causing the visual device 6 to alarm to remind personnel to handle it.

[0027] The working principle of the present invention is: Figure 1 and Figure 2 In actual work, the swing arm rotation drive motor 211 drives the three swing arm parts 23 to rotate in the same direction to complete the clamping and centering of the graphite disc 5, and after the position sensor 25 sends a signal, the cantilever rotation drive motor 41 can drive the first cantilever 423 to rotate to the center position of the graphite disc 5, and then the vacuum generator 43 is turned on to make the first cantilever 423 generate vacuum gas. At this time, the disc rotation drive motor 301 drives the graphite disc 5 to rotate at least one circle, which can complete the cleaning operation of the entire graphite disc 5.

[0028] What is described above is only a preferred specific implementation manner of the present invention, but the protection scope of the present invention is not limited thereto. Any technician familiar with the technical field can make equivalent replacements or changes according to the technical scheme and inventive concept of the present invention within the technical scope disclosed by the present invention, which should be covered by the protection scope of the present invention.

Claims

1. A cleaning device for graphite discs in the semiconductor industry, characterized in that: The invention comprises an upper substrate (1) and a graphite disc (5), wherein the graphite disc (5) is arranged on one side of the upper substrate (1), and a rotating assembly (30) is arranged at the center of the other side of the upper substrate (1), and a swing arm centering assembly (20) and a cleaning assembly (40) are arranged at the edge, wherein the rotating assembly (30) is used for supporting the graphite disc (5) on one side of the upper substrate (1), a plurality of groups of the swing arm centering assemblies (20) are used for abutting and transporting the graphite disc (5) at the circumference, and the cleaning assembly (40) is used for cleaning the graphite disc (5).

2. A cleaning device for graphite discs in the semiconductor industry according to claim 1, characterized in that: The swing arm centering assembly (20) comprises a swing arm driving part (21), a swing arm rotating driven part (22), a swing arm part (23), a sensor connecting part (24) and an in-position sensor (25); the swing arm driving part (21) is arranged on one side of the upper base plate (1) and drives a plurality of groups of swing arm parts (23) to rotate via the swing arm rotating driven part (22); and the sensor connecting part (24) and the in-position sensor (25) are used for in-position detection of the graphite disc (5).

3. A cleaning device for graphite discs in the semiconductor industry according to claim 2, characterized in that: The swing arm driving part (21) comprises a swing arm rotation driving motor (211), a synchronous wheel (212), a first synchronous belt (213) and a first swing arm wheel (214); the swing arm rotation driving motor (211) is fixedly mounted on one side of the upper base plate (1); the output end of the swing arm rotation driving motor (211) is fixedly connected to the synchronous wheel (212); the first swing arm wheel (214) is transmission-connected to the swing arm rotation driven part (22); and the synchronous wheel (212) is transmission-connected to the first swing arm wheel (214) via the first synchronous belt (213).

4. A cleaning device for graphite discs in the semiconductor industry according to claim 3, characterized in that: The swing arm rotating driven part (22) comprises a first rotating rod (221), a second rotating rod (222), a third rotating rod (223), a second swing arm wheel (224), a third swing arm wheel (225), a fourth swing arm wheel (226) and a second synchronous belt (227); one end of the first rotating rod (221) passes through the second swing arm wheel (224) and is fixedly connected to the first swing arm wheel (214); the other end of the first rotating rod (221) is fixedly connected to the first swing arm (231); the second swing arm wheel (224), the third swing arm wheel (225) and the fourth swing arm wheel (226) are connected to the second synchronous belt (227); 5) and a fourth swing arm wheel (226) are distributed in an annular array on one side of the upper base plate (1), one end of the second rotating rod (222) is fixedly connected to the third swing arm wheel (225), one end of the third rotating rod (223) is fixedly connected to the fourth swing arm wheel (226), the other end of the third swing arm wheel (225) or the fourth swing arm wheel (226) is respectively fixedly connected to the first swing arm (231), and the second synchronous belt (227) is arranged around the outer sides of the second swing arm wheel (224), the third swing arm wheel (225) and the fourth swing arm wheel (226).

5. A cleaning device for graphite discs in the semiconductor industry according to claim 4, characterized in that: The swing arm portion (23) comprises a first swing arm (231) and a silicone bearing (232); one end of the first swing arm (231) away from the second swing arm wheel (224), the third swing arm wheel (225) or the fourth swing arm wheel (226) is rotatably connected to the silicone bearing (232); the silicone bearing (232) is movably connected to the graphite disc (5); and the contact surfaces of each synchronous belt and the swing arm wheel are roughened.

6. A cleaning device for graphite discs in the semiconductor industry according to claim 5, characterized in that: The sensor connecting member (24) is fixedly mounted on one side of the upper substrate (1), and the in-situ sensor (25) is electrically connected to the sensor connecting member (24).

7. A cleaning device for graphite discs in the semiconductor industry according to claim 6, characterized in that: The rotating assembly (30) comprises a disc rotating drive motor (301), a rotating flange (302) and a support column (303); the disc rotating drive motor (301) is fixedly mounted on one side of the upper base plate (1), and the output end is fixedly connected to the rotating flange (302); one side of the support column (303) is fixedly connected to the rotating flange (302), and the other side of the support column (303) is movably connected to the graphite disc (5).

8. A cleaning device for graphite discs in the semiconductor industry according to claim 7, characterized in that: The cleaning assembly (40) comprises a cantilever rotation drive motor (41), a cleaning cantilever (42) and a vacuum generator (43); the cantilever rotation drive motor (41) is fixedly mounted on one side of the upper substrate (1); the cleaning cantilever (42) is suspended above the graphite disc (5); the cleaning cantilever (42) is transmission-connected to the output end of the cantilever rotation drive motor (41); and the vacuum generator (43) is fixedly mounted on one side of the upper substrate (1) and the output end is connected to the cleaning cantilever (42).

9. A cleaning device for graphite discs in the semiconductor industry according to claim 8, characterized in that: The cleaning cantilever (42) comprises a support rod clamp (421), a cantilever support rod (422), a first cantilever (423) and a quick-insert connector (424); one end of the support rod clamp (421) is fixedly connected to the output end of the cantilever rotation drive motor (41); the other end of the support rod clamp (421) is fixedly connected to the cantilever support rod (422); the quick-insert connector (424) is fixedly mounted inside the cantilever support rod (422); the quick-insert connector (424) is connected to the output end of the vacuum generator (43); and the first cantilever (423) is provided with cleaning dense holes (425) inside.

10. A cleaning device for graphite discs in the semiconductor industry according to claim 9, characterized in that: It also includes a visual device (6), which is arranged on one side of the graphite disc (5) and is used to monitor the graphite disc (5).

Citation Information

Patent Citations

  • Substrate cleaning apparatus and vacuum processing system

    CN102728580A

  • MOCVD reaction chamber cleaning device and cleaning method thereof

    CN114369811A

  • Cleaning device

    JP1996330217A

  • Substrate rotating / holding device and substrate processing device

    JP2013171918A

  • Substrate processing apparatus, substrate processing method, and substrate holding apparatus

    TW200507979A

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