Simple device and system for treating all-vanadium liquid flow

By designing a simple all-vana liquid flow treatment device, the combination of storage structure, filter assembly, sealing assembly and flushing assembly is used to solve the problems of complex structure and high maintenance costs of existing devices, and simplify the structure and reduce costs. Effect.

CN119419314APending Publication Date: 2025-02-11NANJING TAOBO ENERGY TECH CO LTD
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Patent Information

Application Number
CN202411387458.7
Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Filing Date
2024-10-02
Publication Date
2025-02-11

AI Technical Summary

Technical Problem

The existing all-vanadium liquid flow treatment device has complex structure, high operation and high maintenance costs, and is difficult to promote in micro-enterprises.

Method used

A simple device for treating all vanadium liquid flow is designed, including a storage structure, a filter assembly, a sealing assembly and a flushing assembly. The combination of mechanical sealing, pneumatic sealing and flushing assembly is realized. Effective handling and maintenance.

Benefits of technology

The device structure is simplified, the cost of use is reduced, and it is convenient for maintenance, suitable for promotion of micro-enterprises, and the existing device structure is solved.

✦ Generated by Eureka AI based on patent content.

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Abstract

The invention discloses a simple device and system for treating all-vanadium liquid flow, and the device comprises a material storage structure which is hollow, and the upper and lower ends of the material storage structure are respectively provided with a feed port and a discharge port; a filtering assembly dividing the internal space of the material storage structure into two connected areas is further arranged in the material storage structure, and the feeding port and the discharging port correspond to the areas respectively. The plugging assembly is communicated with the position of the feeding port of the material storage structure, mechanical plugging and air pressure plugging at the position of the feeding port are achieved, liquid backflow is avoided, and the internal safety of the material storage structure is guaranteed; the flushing assembly is arranged close to the feeding opening of the material storage structure, and the flushing assembly and the plugging assembly are arranged in a staggered mode; by means of the design, the structure of the device is greatly simplified, normal treatment of all-vanadium liquid flow is guaranteed, due to the structural arrangement, the use cost can be reduced, maintenance is convenient even if faults occur in the later period, microminiature enterprises can be popularized, and the defects of an existing device in use are overcome.
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Description

Technical Field

[0001] The invention belongs to the technical field of all-vanadium liquid flow treatment, and in particular relates to a simple device and system for treating all-vanadium liquid flow. Background Art

[0002] All-vanadium liquid flow battery is a secondary battery that uses vanadium ion solutions of different valence states as positive and negative active materials, and utilizes the electrochemical redox reaction between vanadium ions of different valence states to store and release energy. It is characterized by long service life, low cost, simple maintenance, deep discharge, and environmental friendliness. In particular, its energy capacity and power output can be separated. With the development of vanadium battery technology, people have begun to pay attention to the issue of electrolyte recycling. In the treatment of all-vanadium liquid flow, special equipment is required for operation.

[0003] At present, the overall structure of the device for treating all-vanadium liquid flow is complex and difficult to operate. It cannot be effectively promoted in micro-small enterprises. In addition, once this type of equipment fails, it requires professional maintenance, so the maintenance cost is also high. Therefore, there are great limitations in actual use and there is room for improvement. Summary of the invention

[0004] The object of the present invention is to provide a simplified device and system for treating all-vanadium liquid flow, so as to solve the problems of complex structure and high use cost of the existing all-vanadium liquid treatment device mentioned in the above background technology.

[0005] To achieve the above-mentioned purpose, the present invention provides the following technical solutions: a simple device for processing all-vanadium liquid flow, comprising a storage structure, which is hollow inside and has a feed port and a discharge port at the upper and lower ends respectively; a filtering component is also arranged inside the storage structure to divide its internal space into two connected areas, and the feed port and the discharge port each correspond to an area; a plugging component is connected to the feed port position of the storage structure, and realizes mechanical plugging and air pressure plugging of the feed port position to avoid liquid reflux and ensure the internal safety of the storage structure; a flushing component is arranged near the feed port of the storage structure and is staggered with the plugging component; the flushing component is connected to the storage structure, and the liquid for flushing the all-vanadium liquid flow is injected to flush the storage structure to ensure normal use in the later stage.

[0006] As a preferred technical solution in the present invention, the material storage structure is a barrel body, the material inlet of the barrel body is connected to a liquid inlet pipe, and the material outlet is installed with a liquid outlet pipe, the bottom end of the barrel body is also connected to an impurity discharge pipe, and the impurity discharge pipe and the liquid inlet pipe are in the same area, so that impurities in the all-vanadium liquid flow can be directly discharged from the impurity discharge pipe.

[0007] As a preferred technical solution in the present invention, the filter assembly includes an inner spacer ring fixed inside the barrel body, and the surface of the inner spacer ring is evenly provided with through holes, through which the two areas are connected, and the all-vanadium liquid flow injected by the liquid inlet pipe can be filtered, and the filtered liquid can be discharged from the liquid outlet pipe.

[0008] As a preferred technical solution in the present invention, the blocking member includes a nitrogen pipe connected to the liquid inlet pipe, and also includes a baffle rotatably arranged in the liquid inlet pipe. A supporting plate is also fixed inside the liquid inlet pipe, and a spring is also arranged between the supporting plate and the baffle. When not blocking, the baffle and the nitrogen pipe are arranged at an obtuse angle, and when blocking, the baffle and the nitrogen pipe are rotated from an obtuse angle to a straight angle, so that the inside of the liquid inlet pipe is blocked by the baffle, and at the same time, the nitrogen pipe continuously sprays nitrogen, which can fill the liquid inlet pipe with nitrogen, thereby achieving comprehensive blocking of the inside of the liquid inlet pipe and avoiding liquid reflux.

[0009] As a preferred technical solution in the present invention, the flushing assembly includes a connecting pipe arranged at an equal angle on the top side of the liquid inlet pipe, the connecting pipe is connected to the interior of the barrel body, and the outsides of multiple connecting pipes are connected to an annular water pipe, and the annular water pipe is connected to a water injection pipe connected to an external water supply device. When flushing the barrel body, water is injected into the barrel body through a source to achieve flushing of the inner wall of the barrel body.

[0010] As a preferred technical solution in the present invention, the nitrogen pipe and the annular water pipe do not contact each other, ensuring that normal installation is not affected; the outer diameters of the nitrogen pipe and the annular water pipe are equal.

[0011] As a preferred technical solution in the present invention, the center of the baffle is lower than the center of the nitrogen pipe, so as to ensure that the nitrogen blown out of the nitrogen pipe can drive the baffle to flip in only one direction.

[0012] The present invention also discloses a simplified system for processing all-vanadium liquid flow, including a device for processing all-vanadium liquid flow, the system including a main control terminal, the main control terminal is connected to a transmission module, the transmission module is connected to an impurity removal module for opening and closing an impurity removal pipe, and a blocking module for opening and closing a nitrogen pipe, the main control terminal is also connected to an autonomous operation module for automatically realizing the opening and closing of the impurity removal pipe and the nitrogen pipe, and a setting module for opening and closing the impurity removal pipe and the nitrogen pipe after reaching a set threshold, the autonomous operation module and the setting module are connected to a backup module for recording parameters during operation.

[0013] Compared with the prior art, the present invention has the following beneficial effects:

[0014] Through the design of the present invention, the structure of the device is greatly simplified, and the normal processing of the all-vanadium liquid flow is guaranteed. This structural setting can reduce the cost of use and is convenient for maintenance even when a failure occurs in the later stage, so that it can be promoted in micro-small enterprises and improve the shortcomings of existing devices in use. BRIEF DESCRIPTION OF THE DRAWINGS

[0015] Figure 1 It is a structural schematic diagram of the present invention;

[0016] Figure 2 is a cross-sectional view of the present invention;

[0017] Figure 3 For the present invention Figure 2 A magnified schematic diagram of the middle A area;

[0018] Figure 4 It is a system diagram of the present invention.

[0019] In the figure:

[0020] 100, barrel body; 101, liquid inlet pipe; 102, impurity discharge pipe; 103, nitrogen pipe; 104, liquid outlet pipe; 105, inner spacer ring; 105a, through hole; 106, supporting plate; 107, spring; 108, baffle;

[0021] 200. Annular water pipe; 201. Water injection pipe; 202. Connecting pipe. DETAILED DESCRIPTION

[0022] The following will be combined with the drawings in the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0023] See also Figures 1 to 4 The present invention provides a technical solution: a simple device for treating all-vanadium liquid flow, comprising:

[0024] A material storage structure, which is hollow inside and has a feed inlet and a discharge inlet at the upper and lower ends respectively; a filtering component is also arranged inside the material storage structure to divide its internal space into two connected areas, and the feed inlet and the discharge inlet each correspond to one area;

[0025] A plugging component is connected to the feed inlet of the storage structure and realizes mechanical plugging and air pressure plugging of the feed inlet to avoid liquid backflow and ensure the internal safety of the storage structure;

[0026] A flushing component is arranged near the feed inlet of the storage structure and is staggered with the plugging component; the flushing component is connected to the storage structure and injects liquid for flushing the all-vanadium liquid flow to flush the storage structure and ensure normal use in the later stage.

[0027] In this embodiment, the material storage structure is a barrel body 100, and a liquid inlet pipe 101 is connected to the material inlet of the barrel body 100, and a liquid outlet pipe 104 is installed on the material outlet. The bottom end of the barrel body 100 is also connected to a drainage pipe 102. The drainage pipe 102 and the liquid inlet pipe 101 are in the same area, so that impurities in the all-vanadium liquid flow can be directly discharged from the drainage pipe 102.

[0028] In this embodiment, the filter assembly includes an inner spacer ring 105 fixed inside the barrel body 100, and the surface of the inner spacer ring 105 is evenly provided with through holes 105a, through which the two areas are connected, and the all-vanadium liquid flow injected by the liquid inlet pipe 101 can be filtered, and the filtered liquid can be discharged from the liquid outlet pipe 104.

[0029] In this embodiment, the blocking member includes a nitrogen pipe 103 connected to the liquid inlet pipe 101, and also includes a baffle 108 rotatably arranged in the liquid inlet pipe 101. A supporting plate 106 is also fixed inside the liquid inlet pipe 101, and a spring 107 is also arranged between the supporting plate 106 and the baffle 108. When not blocking, the baffle 108 and the nitrogen pipe 103 are arranged at an obtuse angle, and when blocking, the baffle 108 and the nitrogen pipe 103 are rotated from an obtuse angle to a straight angle, so that the inside of the liquid inlet pipe 101 is blocked by the baffle 108. At the same time, the nitrogen pipe 103 continuously sprays nitrogen, which can fill the liquid inlet pipe 101 with nitrogen, thereby achieving comprehensive blocking of the inside of the liquid inlet pipe 101 and avoiding liquid reflux.

[0030] In this embodiment, the flushing assembly includes a connecting pipe 202 arranged at an equal angle on the top side of the liquid inlet pipe 101, the connecting pipe 202 is connected to the interior of the barrel body 100, and the outside of the multiple connecting pipes 202 is connected to an annular water pipe 200, and the annular water pipe 200 is connected to a water injection pipe 201 connected to an external water supply device. When flushing the barrel body 100, the inner wall of the barrel body 100 is flushed after water is injected into the barrel body 100 through a water source.

[0031] In this embodiment, the nitrogen pipe 103 and the annular water pipe 200 do not contact each other, ensuring that normal installation is not affected; the outer diameters of the nitrogen pipe 103 and the annular water pipe 200 are equal.

[0032] In this embodiment, the center of the baffle 108 is lower than the center of the nitrogen pipe 103, so as to ensure that the nitrogen blown out of the nitrogen pipe 103 can drive the baffle 108 to flip in only one direction.

[0033] The present invention also discloses a simplified system for processing all-vanadium liquid flow, including a device for processing all-vanadium liquid flow, the system including a main control terminal, the main control terminal is connected to a transmission module, the transmission module is connected to an impurity removal module for opening and closing the impurity removal pipe 102, and a blocking module for opening and closing the nitrogen pipe 103, the main control terminal is also connected to an autonomous operation module for automatically realizing the opening and closing of the impurity removal pipe 102 and the nitrogen pipe 103, and a setting module for opening and closing the impurity removal pipe 102 and the nitrogen pipe 103 after reaching a set threshold, and a backup module is connected to the autonomous operation module and the setting module for recording the parameters in operation.

[0034] Although embodiments of the present invention have been shown and described (see the above detailed description for details), it will be appreciated by those skilled in the art that various changes, modifications, substitutions and variations may be made to these embodiments without departing from the principles and spirit of the present invention, and the scope of the present invention is defined by the appended claims and their equivalents.

Claims

1. A simplified device for treating all-vanadium liquid flow, characterized in that: include A material storage structure, which is hollow inside and has a feed inlet and a discharge inlet at the upper and lower ends respectively; a filtering component is also arranged inside the material storage structure to divide its internal space into two connected areas, and the feed inlet and the discharge inlet each correspond to one area; A plugging component is connected to the feed inlet of the material storage structure and realizes mechanical plugging and air pressure plugging of the feed inlet; A flushing component is arranged near the feed inlet of the storage structure and is staggered with the plugging component; the flushing component is connected with the storage structure and injects liquid for flushing the all-vanadium liquid flow.

2. A simplified device for treating all-vanadium liquid flow according to claim 1, characterized in that: The material storage structure is a barrel body (100), a liquid inlet pipe (101) is connected to the material inlet of the barrel body (100), and a liquid outlet pipe (104) is installed on the material outlet. The bottom end of the barrel body (100) is also connected to a waste pipe (102), and the waste pipe (102) and the liquid inlet pipe (101) are located in the same area.

3. A simplified device for treating all-vanadium liquid flow according to claim 2, characterized in that: The filter assembly comprises an inner spacer ring (105) fixed inside the barrel body (100), and the surface of the inner spacer ring (105) is evenly provided with through holes (105a).

4. A simplified device for treating all-vanadium liquid flow according to claim 2, characterized in that: The blocking member comprises a nitrogen pipe (103) connected to the liquid inlet pipe (101), and also comprises a baffle (108) rotatably arranged in the liquid inlet pipe (101); a supporting plate (106) is also fixed inside the liquid inlet pipe (101); a spring (107) is also arranged between the supporting plate (106) and the baffle (108); when not blocking, the baffle (108) and the nitrogen pipe (103) are arranged at an obtuse angle; when blocking, the baffle (108) and the nitrogen pipe (103) rotate from an obtuse angle to a straight angle.

5. A simplified device for treating all-vanadium liquid flow according to claim 4, characterized in that: The flushing assembly comprises a connecting pipe (202) arranged at an equal angle on the top side of the liquid inlet pipe (101), the connecting pipe (202) being connected to the inside of the barrel body (100), and the outside of the plurality of connecting pipes (202) being connected to an annular water pipe (200), and the annular water pipe (200) being connected to a water injection pipe (201) connected to an external water supply device.

6. A simplified device for treating all-vanadium liquid flow according to claim 5, characterized in that: The nitrogen pipe (103) and the annular water pipe (200) do not contact each other; the outer diameters of the nitrogen pipe (103) and the annular water pipe (200) are equal.

7. A simplified device for treating all-vanadium liquid flow according to claim 4, characterized in that: The center of the baffle (108) is lower than the center of the nitrogen pipe (103).

8. A simplified system for treating all-vanadium liquid flow, comprising the device for treating all-vanadium liquid flow according to any one of claims 1 to 7, characterized in that: The system comprises a main control terminal, the main control terminal is connected to a transmission module, the transmission module is connected to an impurity removal module for opening and closing an impurity removal pipe (102), and a blocking module for opening and closing a nitrogen pipe (103), the main control terminal is also connected to an autonomous operation module for automatically opening and closing the impurity removal pipe (102) and the nitrogen pipe (103), and a setting module for opening and closing the impurity removal pipe (102) and the nitrogen pipe (103) after reaching a set threshold, and a backup module is connected to the autonomous operation module and the setting module for recording parameters in operation.