Optical axis parallelism measuring method

Abstract

The invention relates to the field of optical axis parallelism measurement, and provides an optical axis parallelism measurement method, which comprises the following steps of: adjusting a collimator so that the center of a cross cursor of the collimator is aligned with the center of a cross cursor of a test card; a reflecting prism is placed on the mounting surface of the adjustable workbench, and the reflecting surface of the reflecting prism is perpendicular to the mounting surface; the adjustable workbench is adjusted, so that the reflecting prism reflects the test light path of the collimator back to the center of the test hole of the collimator, and the mounting surface is calibrated to a first state parallel to the reference line; taking away the reflecting prism from the mounting surface and replacing the reflecting prism with the optical device; the adjustable workbench is adjusted, so that the center of a cross cursor of the test card shot by the optical device coincides with the cross center of a monitoring display picture of the optical device, and the mounting surface is in a second state parallel to the optical axis of the optical device; the optical device is taken away from the mounting surface and replaced with the reflecting prism, and the deviation measured by the collimator is the optical axis parallelism of the optical device. The measurement is simple, rapid and accurate.

Description

Technical Field

[0001] The present application belongs to the technical field of optical axis parallelism measurement, and in particular, relates to an optical axis parallelism measurement method. Background Art

[0002] Optical devices such as optical lenses and integrated lens machines generally use their bottom surfaces as mounting surfaces. Optical axis parallelism measurement can quantify the inclination of the optical axis of the optical device (generally coincident with the center line) relative to the bottom surface of the optical device, and can reflect the parallel state of the optical axis of the optical device relative to the bottom surface of the optical device, and can be used as a detection indicator for the installation quality of the optical device. However, the optical axis is virtual, invisible, and intangible, and how to measure the optical axis parallelism has become an urgent problem to be solved in the industry. Summary of the invention

[0003] The embodiment of the present application provides a method for measuring the parallelism of an optical axis, aiming to solve the problem of how to measure the parallelism of an optical axis.

[0004] To achieve the above purpose, the technical solution adopted in the embodiment of the present application is:

[0005] In a first aspect, a method for measuring optical axis parallelism is provided, the method comprising the following steps:

[0006] Adjust the collimator so that the center of the cross cursor of the collimator is aligned with the center of the cross cursor of the test card, so that the line therebetween forms a reference line; wherein the test card is placed vertically and fixed in position, and the collimator is fixed in position and spaced apart from the test card;

[0007] A reflecting prism is placed on the mounting surface of the adjustable workbench between the collimator and the test card, wherein the reflecting surface of the reflecting prism facing the collimator is perpendicular to the mounting surface of the adjustable workbench;

[0008] Adjusting the adjustable workbench so that the reflective prism reflects the test light path of the collimator back to the center of the test hole of the collimator, so that the mounting surface of the adjustable workbench is calibrated to a first state parallel to the reference line;

[0009] Remove the reflecting prism from the mounting surface of the adjustable workbench in the first state and replace it with an optical device;

[0010] Adjust the adjustable workbench so that the center of the cross cursor of the test card photographed by the optical device coincides with the center of the cross of the monitoring display screen of the optical device itself, so that the line therebetween is parallel to the optical axis of the optical device, and the mounting surface of the adjustable workbench is in a second state parallel to the optical axis of the optical device;

[0011] The optical device is removed from the mounting surface of the adjustable workbench in the second state and replaced with the reflecting prism. The deviation measured by the collimator is the parallelism of the optical axis of the optical device.

[0012] In some embodiments, the adjustable worktable is capable of circumferential rotation about a vertical axis;

[0013] And / or, a side of the adjustable workbench close to the test card can pitch and swing relative to the other side thereof.

[0014] In some embodiments, in the step of placing a reflecting prism on the mounting surface of the adjustable workbench between the collimator and the test card, and in the step of removing the optical device from the mounting surface of the adjustable workbench in the second state and replacing it with the reflecting prism, the reflecting prism is positioned and installed at the same position of the mounting surface.

[0015] In some embodiments, the reflective prism is positioned and mounted at the center of the mounting surface.

[0016] In some embodiments, the reflective prism is positioned and mounted to the mounting surface via a fixing seat;

[0017] One of the fixing seat and the adjustable workbench is provided with a positioning hole, and the other one of the two is provided with a positioning column which is inserted and positioned with the positioning hole.

[0018] In some embodiments, the fixing base is fixed to the adjustable workbench by magnetic attraction.

[0019] In some embodiments, the adjustable workbench includes a substrate and a high-precision plate disposed on the substrate, and a side of the high-precision plate facing away from the substrate is the mounting surface.

[0020] In some embodiments, in the step of removing the reflective prism from the mounting surface of the adjustable workbench in the first state and replacing it with an optical device, the optical device is positioned and installed at the center of the mounting surface.

[0021] In some embodiments, the reference line is a horizontal line.

[0022] In some embodiments, the reflective prism is a rectangular parallelepiped structure.

[0023] The beneficial effects of the optical axis parallelism measurement method provided by the present application are:

[0024] The optical axis parallelism measurement method provided in the embodiment of the present application can measure the optical axis parallelism of an optical device based on a streamlined and simplified measurement method, specifically quantify the inclination of the optical axis of the optical device relative to the bottom surface of the optical device, and accurately reflect the parallel state of the optical axis of the optical device relative to the bottom surface of the optical device. The measurement method is simple, easy, fast, and effective, the measurement error is small, and the measurement data is accurate. BRIEF DESCRIPTION OF THE DRAWINGS

[0025] In order to clearly illustrate the technical solutions in the embodiments of the present application, the drawings required for use in the embodiments or the description of the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present application. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying any creative work.

[0026] Figure 1 A flow chart of a method for measuring optical axis parallelism provided in an embodiment of the present application;

[0027] Figure 2 A schematic diagram of the structure corresponding to step S1 provided in an embodiment of the present application;

[0028] Figure 3 A schematic diagram of the structure corresponding to step S3 provided in the embodiment of the present application;

[0029] Figure 4 A schematic diagram of the structure corresponding to step S5 provided in an embodiment of the present application;

[0030] Figure 5 A schematic diagram of the structure corresponding to step S6 provided in an embodiment of the present application;

[0031] Figure 6 A schematic diagram of the structure of an assembly of an adjustable workbench, a reflecting prism and a fixing seat provided in an embodiment of the present application;

[0032] Figure 7 for Figure 6 Exploded view of the provided adjustable table, prism, and mounts.

[0033] Among them, the reference numerals in the figure are:

[0034] 10-collimator, 20-test card, 30-adjustable workbench, 31-mounting surface, 32-positioning column, 33-substrate, 34-high-precision plate, 35-fastening hole, 40-reflecting prism, 41-reflecting surface, 50-optical device, 60-fixed seat, 61-positioning hole, 62-limiting groove, 70-stable workbench, L1-reference line, L2-optical axis of the optical device. DETAILED DESCRIPTION

[0035] In order to make the technical problems, technical solutions and beneficial effects to be solved by the present application clear, the present application is described in detail below in conjunction with the accompanying drawings and examples. It should be understood that the specific embodiments described herein are only used to explain the present application and are not intended to limit the present application. If there is no special description, all implementation methods and optional implementation methods of the present application can be combined with each other to form a new technical solution. If there is no special description, all technical features and optional technical features of the present application can be combined with each other to form a new technical solution.

[0036] In the description of the present application, it should be understood that the terms "length", "width", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside", "outside", etc., indicating the orientation or position relationship, are based on the orientation or position relationship shown in the accompanying drawings, and are only for the convenience of describing the present application and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore should not be understood as a limitation on the present application.

[0037] In addition, the terms "first" and "second" are used for descriptive purposes only and should not be understood as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Therefore, a feature defined as "first" or "second" may explicitly or implicitly include one or more of the features. In the description of this application, the meaning of "plurality" is two or more, unless otherwise clearly and specifically defined.

[0038] In this application, unless otherwise clearly specified and limited, the terms "installed", "connected", "connected", "fixed" and the like should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection or an indirect connection through an intermediate medium, it can be the internal connection of two elements or the interaction relationship between two elements. For ordinary technicians in this field, the specific meanings of the above terms in this application can be understood according to specific circumstances.

[0039] Optical devices such as optical lenses and integrated lens machines generally use their bottom surfaces as mounting surfaces. Optical axis parallelism measurement can quantify the inclination of the optical axis of the optical device (generally coincident with the center line) relative to the bottom surface of the optical device, and can reflect the parallel state of the optical axis of the optical device relative to the bottom surface of the optical device, and can be used as a detection indicator for the installation quality of the optical device.

[0040] However, the optical axis is a virtual, invisible and intangible concept. How to measure the parallelism of the optical axis has become an urgent problem to be solved in the industry.

[0041] Therefore, the embodiment of the present application provides a method for measuring the parallelism of an optical axis, which can measure the parallelism of the optical axis of an optical device, can specifically quantify the inclination of the optical axis of the optical device relative to the bottom surface of the optical device, and can accurately reflect the parallel state of the optical axis of the optical device relative to the bottom surface of the optical device. The measurement method is simple and convenient, and the measurement is fast, accurate and effective.

[0042] The specific implementation of this application is described in detail below in conjunction with specific embodiments:

[0043] See also Figure 1 Some embodiments of the present application provide a method for measuring optical axis parallelism, the method comprising the following steps:

[0044] S1、(Please also refer to Figure 2 ) Adjust the collimator 10 so that the center of the cross cursor of the collimator 10 is aligned with the center of the cross cursor of the test card 20, so that the line therebetween forms a reference line L1; wherein the test card 20 is placed vertically and fixed in position, and the collimator 10 is fixed in position and spaced apart from the test card 20. It should be noted that the test card 20 (also called a cross cursor test card) is placed vertically so that the cross cursor of the test card 20 is vertically aligned, and the installation position and installation state of the test card 20 are fixed. The collimator 10 is spaced apart from the test card 20, and the plane position of the collimator 10 is fixed. In this case, the posture of the collimator 10 can be adjusted until the center of the cross cursor of the collimator 10 is aligned with the center of the cross cursor of the test card 20, based on which, the reference line L1 can be formed via the line connecting the center of the cross cursor of the collimator 10 and the center of the cross cursor of the test card 20. The reference line L1 can be a horizontal line (i.e. parallel to the horizontal plane) or inclined to the horizontal line. Subsequent steps can maintain the installation position, installation state, and posture of the collimator 10 unchanged, so that the cross cursor center of the collimator 10 is aligned with the cross cursor center of the test card 20, and the line connecting the cross cursor center of the collimator 10 and the cross cursor center of the test card 20 is the reference line L1.

[0045] S2, (Please also refer to Figure 3) A reflective prism 40 is placed on the mounting surface 31 of the adjustable workbench 30 between the collimator 10 and the test card 20, and the reflective surface 41 of the reflective prism 40 facing the collimator 10 is perpendicular to the mounting surface 31 of the adjustable workbench 30. It should be noted that the spacing between the collimator 10 and the test card 20 can be used to arrange the adjustable workbench 30, that is, the adjustable workbench 30 is arranged between the collimator 10 and the test card 20, and the plane position of the adjustable workbench 30 between the collimator 10 and the test card 20 is stable and remains unchanged. The top side of the adjustable workbench 30 has a mounting surface 31. When the center of the crosshair of the collimator 10 is aligned with the center of the crosshair of the test card 20, the reflective prism 40 can be placed on the mounting surface 31 of the adjustable workbench 30, that is, the reflective prism 40 can be detachably and firmly mounted on the mounting surface 31 of the adjustable workbench 30; wherein the reflective surface 41 of the reflective prism 40 facing the collimator 10 needs to be perpendicular to the mounting surface 31 of the adjustable workbench 30, that is, the reflective prism 40 has a reflective surface 41 facing the collimator 10 and perpendicular to the mounting surface 31. The reflective prism 40 can be a reflective prism 40 in a rectangular parallelepiped shape, a triangular prism shape, or other shapes.

[0046] S3, (Please also refer to Figure 3 ) adjust the adjustable workbench 30 so that the reflecting prism 40 reflects the test light path of the collimator 10 back to the center of the test hole of the collimator 10, so that the mounting surface 31 of the adjustable workbench 30 is calibrated to a first state parallel to the reference line L1. It should be noted that the plane position of the adjustable workbench 30 between the collimator 10 and the test card 20 remains unchanged, but the posture of the adjustable workbench 30 is adjustable. In some embodiments, the posture of the adjustable workbench 30 can be adjusted based on the rotating structure design. In other embodiments, the posture of the adjustable workbench 30 can be adjusted based on the structural design of each side and each corner of the adjustable workbench 30 to adjust the position of each side and each corner. It should also be noted that, when a reflecting prism 40 is firmly mounted on the mounting surface 31 of the adjustable workbench 30 and a reflecting surface 41 of the reflecting prism 40 facing the collimator 10 is perpendicular to the mounting surface 31, the posture of the adjustable workbench 30 can be adjusted (for example, the adjustable workbench 30 is rotated in a circle, or the adjustable workbench 30 is swung left and right, or the adjustable workbench 30 is swung back and forth, etc.) until the reflecting prism 40 reflects the test light path of the collimator 10 back to the center of the test hole of the collimator 10. Based on this, since the reflecting surface 41 of the reflecting prism 40 facing the collimator 10 is perpendicular to the mounting surface 31, and since the test light path of the collimator 10 is perpendicular to the reflecting surface 41 of the reflecting prism 40 facing the collimator 10, the mounting surface 31 of the adjustable workbench 30 can be calibrated to a first state parallel to the reference line L1.

[0047] S4, (Please also refer to Figure 4) Remove the reflecting prism 40 from the mounting surface 31 of the adjustable workbench 30 in the first state and replace it with the optical device 50. It should be noted that, when the mounting surface 31 of the adjustable workbench 30 is calibrated to the first state parallel to the reference line L1, the reflecting prism 40 can be removed from the mounting surface 31 of the adjustable workbench 30 and replaced with the optical device 50. "Replace the optical device 50" means that the optical device 50 is detachably and firmly mounted on the mounting surface 31 of the adjustable workbench 30, and the bottom surface of the optical device 50 abuts against the mounting surface 31 of the adjustable workbench 30. The optical device 50 is an optical device 50 for measuring the parallelism of the optical axis, and the optical device 50 can be any optical lens with an imaging function, or a lens-in-one machine, etc.

[0048] S5, (Please also refer to Figure 4 ) Adjust the adjustable workbench 30 so that the center of the cross cursor of the test card 20 photographed by the optical device 50 coincides with the center of the cross of the monitoring display screen of the optical device 50 itself, so that the connecting line therebetween is parallel to (for example, coincides with) the optical axis L2 of the optical device 50, and the mounting surface 31 of the adjustable workbench 30 is in the second state parallel to the optical axis L2 of the optical device 50. It should be noted that, in the case where the optical device 50 is detachably and firmly mounted on the mounting surface 31 of the adjustable workbench 30, the posture of the adjustable workbench 30 can be adjusted (for example, the adjustable workbench 30 is rotated in a circle, or the adjustable workbench 30 is swung left and right, or the adjustable workbench 30 is swung back and forth, etc.) until the center of the cross cursor of the test card 20 photographed by the optical device 50 coincides with the center of the cross of the monitoring display screen of the optical device 50 itself (the optical device 50 is in the shooting state, and can be zoomed or fixed). This step is mainly to confirm the position of the optical axis L2 of the optical device 50. When the center of the cross cursor of the test card 20 photographed by the optical device 50 coincides with the center of the cross cursor of the monitoring display screen of the optical device 50 itself, the line connecting the center of the cross cursor of the test card 20 photographed by the optical device 50 and the center of the cross cursor of the monitoring display screen of the optical device 50 itself is parallel to the optical axis L2 of the optical device 50, and the mounting surface 31 of the adjustable workbench 30 is in the second state parallel to the optical axis L2 of the optical device 50 after adjustment.

[0049] S6, (Please also refer to Figure 5) Remove the optical device 50 from the mounting surface 31 of the adjustable workbench 30 in the second state and replace it with the reflecting prism 40. The deviation measured by the collimator 10 is the parallelism of the optical axis of the optical device 50. It should be noted that, when the mounting surface 31 of the adjustable workbench 30 is adjusted to the second state, the optical device 50 can be removed from the mounting surface 31 of the adjustable workbench 30 and replaced with the reflecting prism 40. The reflecting prism 40 is the same reflecting prism 40 as the reflecting prism 40 in step S2. “Replace the reflecting prism 40” means that the reflecting prism 40 is detachably and firmly mounted on the mounting surface 31 of the adjustable workbench 30, and the reflecting surface 41 of the reflecting prism 40 facing the collimator 10 is perpendicular to the mounting surface 31 of the adjustable workbench 30. After replacing the reflective prism 40, the reflective surface 41 of the reflective prism 40 facing the collimator 10 can reflect the test light path of the collimator 10 back to the collimator 10, but (compared with step S3) it may not be able to reflect back to the center of the test hole of the collimator 10 along the original path. The collimator 10 can measure the deviation (generally the angle deviation value) between the test loop reflected by the reflective prism 40 in step S6 and the test loop reflected by the reflective prism 40 in step S3. The deviation is the parallelism of the optical axis of the optical device 50. Theoretically, if the deviation measured by the collimator 10 is small, it indicates that the parallelism of the optical axis of the optical device 50 is high, that is, the optical axis L2 of the optical device 50 is close to the ideal state of "parallel to the bottom surface of the optical device 50". On the contrary, if the deviation measured by the collimator 10 is large, it indicates that the parallelism of the optical axis of the optical device 50 is low, and the optical axis L2 of the optical device 50 deviates greatly from the ideal state of "parallel to the bottom surface of the optical device 50", and needs to be adjusted or corrected.

[0050] Theoretically, if the parallelism of the optical axis of the optical device 50 is high enough, that is, the optical axis L2 of the optical device 50 is substantially parallel to the bottom surface of the optical device 50, then in step S5, there is basically no need to adjust the posture of the adjustable workbench 30, so that the center of the cross cursor of the test card 20 photographed by the optical device 50 can be made to coincide with the center of the cross cursor of the monitoring display screen of the optical device 50 itself. In this case, the second state of the mounting surface 31 is substantially equivalent to the first state, and the deviation measured by the collimator 10 in step S6 is substantially 0.

[0051] In summary, the optical axis parallelism measurement method provided in the embodiment of the present application can measure the optical axis parallelism of the optical device 50 based on a streamlined and simplified measurement method, specifically quantify the inclination of the optical axis L2 of the optical device 50 relative to the bottom surface of the optical device 50, and accurately reflect the parallel state of the optical axis L2 of the optical device 50 relative to the bottom surface of the optical device 50. The measurement method is simple, convenient, fast, and effective, the measurement error is small, and the measurement data is accurate.

[0052] In addition, components such as the test card 20, the collimator 10, and the adjustable workbench 30 are commonly used tools in the production process of optical lenses. The optical axis parallelism measurement method provided in the embodiment of the present application can directly utilize these tools commonly used in the production process of optical lenses, and add a reflective prism 40 to complete the optical axis parallelism test. Therefore, the test cost is relatively low.

[0053] like Figure 2 , Figure 3 , Figure 4 , Figure 5 As shown, in some embodiments, the adjustable workbench 30 and the collimator 10 can be placed on the same stable workbench 70. Based on this, the adjustable workbench 30 and the collimator 10 can be supported based on the stable workbench 70, and the positions of the adjustable workbench 30 and the collimator 10 can be raised to facilitate operation, thereby improving the convenience of operation. Of course, in other embodiments, the stable workbench 70 can be omitted.

[0054] See also Figure 2 , Figure 3 , Figure 4 , Figure 5 In some embodiments of the present application, the adjustable workbench 30 can rotate in a circle around a vertical axis; and / or, a side of the adjustable workbench 30 close to the test card 20 can pitch and swing relative to the other side thereof.

[0055] It should be noted that the posture of the adjustable workbench 30 is adjustable. In some embodiments, the adjustment freedom of the posture of the adjustable workbench 30 is mainly: the adjustable workbench 30 can rotate in a circle around the vertical axis. In other embodiments, the adjustment freedom of the posture of the adjustable workbench 30 is mainly: the side of the adjustable workbench 30 close to the test card 20 can pitch and swing around the horizontal axis relative to the other side thereof (that is, the side of the adjustable workbench 30 away from the test card 20). In other embodiments, the adjustment freedom of the posture of the adjustable workbench 30 includes: the adjustable workbench 30 can rotate in a circle around the vertical axis, and the side of the adjustable workbench 30 close to the test card 20 can pitch and swing around the horizontal axis relative to the other side thereof.

[0056] Among them, "the adjustable workbench 30 can rotate in a circle around a vertical axis" and "the side of the adjustable workbench 30 close to the test card 20 can pitch and swing relative to the other side thereof" can be realized based on the rotation structure design.

[0057] Among them, the "vertical axis" and the "horizontal axis" can intersect in the same plane (the intersection point can be at the center or not at the center), or they can intersect in different planes.

[0058] By adopting the above scheme, the degree of freedom of adjustment of the posture of the adjustable workbench 30 can be adapted to meet the test needs, and the posture of the adjustable workbench 30 can be adjusted to "make the reflective prism 40 reflect the test light path of the collimator 10 back to the center of the test hole of the collimator 10" based on the circular rotation and pitch swing in step S3, and the posture of the adjustable workbench 30 can be adjusted to "make the center of the cross cursor of the test card 20 photographed by the optical device 50 coincide with the center of the cross of the monitoring display screen of the optical device 50 itself" based on the circular rotation and pitch swing in step S5. Based on this, the ease of operation and flexibility of the posture adjustment of the adjustable workbench 30 can be improved, the posture of the adjustable workbench 30 can be adjusted finely, the ease of operation and flexibility of the optical axis parallelism measurement method can be improved, and the measurement efficiency and accuracy can be improved.

[0059] Of course, in other embodiments, the adjustment freedom of the posture of the adjustable workbench 30 may be but is not limited to three-axis rotation (ie, the adjustable workbench 30 can rotate in a circle, swing left and right, swing back and forth), etc.

[0060] See also Figure 1 , Figure 3 , Figure 5 In some embodiments of the present application, in the step of placing the reflecting prism 40 on the mounting surface 31 of the adjustable workbench 30 between the collimator 10 and the test card 20, and in the step of removing the optical device 50 from the mounting surface 31 of the adjustable workbench 30 in the second state and replacing it with the reflecting prism 40, the reflecting prism 40 is positioned and installed at the same position of the mounting surface 31.

[0061] It should be noted that in the step of “placing the reflective prism 40 on the mounting surface 31 of the adjustable workbench 30 between the collimator 10 and the test card 20” in step S2, and in the step of “removing the optical device 50 from the mounting surface 31 of the adjustable workbench 30 in the second state and replacing it with the reflective prism 40” in step S6, the reflective prism 40 is positioned and installed at the same position of the mounting surface 31 twice. “The same position of the mounting surface 31” can be the exact center of the mounting surface 31, or can be offset from the exact center of the mounting surface 31.

[0062] By adopting the above scheme, the reflecting prism 40 can be positioned and installed at the same position on the mounting surface 31 of the adjustable workbench 30 in both steps S2 and S6. Based on this, the error introduced by the change of the placement position of the reflecting prism 40 on the mounting surface 31 can be reduced, the position consistency of the two reflections of the reflecting prism 40 in steps S3 and S6 can be maintained, the consistency of the measurement conditions can be maintained, the collimator 10 can be convenient to measure the deviation, the measurement accuracy and measurement reliability can be improved, and it is conducive to accurately measuring the parallelism of the optical axis of the optical device 50.

[0063] Furthermore, positioning and installing the reflecting prism 40 at the same position on the mounting surface 31 of the adjustable workbench 30 in both steps S2 and S6 can reduce the time for aligning and adjusting the reflecting prism 40, thereby helping to speed up the measurement process, reduce the difficulty of operation, and improve measurement efficiency.

[0064] See also Figure 1 , Figure 3 , Figure 5 In some embodiments of the present application, the reflective prism 40 is positioned and installed at the center of the installation surface 31 .

[0065] By adopting the above scheme, the reflecting prism 40 can be positioned and installed at the center of the mounting surface 31 of the adjustable workbench 30 in both the placements in step S2 and step S6. Based on this, the installation position of the reflecting prism 40 on the mounting surface 31 can be optimized, the consistency of the installation position of the reflecting prism 40 in the two placements in step S2 and step S6 can be improved, the error introduced by the change of the placement position of the reflecting prism 40 on the mounting surface 31 can be reduced, and the influence of the posture adjustment of the adjustable workbench 30 on the reflecting prism 40 can be balanced, so as to maintain the consistency of the measurement conditions and improve the measurement accuracy and reliability.

[0066] Of course, in other embodiments, the reflecting prism 40 may be positioned and installed at the same position of the mounting surface 31 of the adjustable workbench 30 during the two placements in step S2 and step S6, and “the same position of the mounting surface 31” may deviate from the exact center of the mounting surface 31.

[0067] See also Figure 6 , Figure 7 In some embodiments of the present application, the reflective prism 40 is positioned and mounted to the mounting surface 31 through a fixing seat 60. One of the fixing seat 60 and the adjustable workbench 30 is provided with a positioning hole 61, and the other of the two is provided with a positioning column 32 that is positioned and plugged into the positioning hole 61.

[0068] It should be noted that the reflective prism 40 can be quickly and accurately positioned and installed on the mounting surface 31 by means of the fixing seat 60. In some embodiments, the fixing seat 60 is provided with a positioning hole 61, and the adjustable workbench 30 is provided with a positioning column 32 that is arranged in a one-to-one correspondence with the positioning hole 61 and is positioned and plugged in. In other embodiments, the adjustable workbench 30 is provided with a positioning hole 61, and the fixing seat 60 is provided with a positioning column 32 that is arranged in a one-to-one correspondence with the positioning hole 61 and is positioned and plugged in. Among them, the positioning holes 61 and the positioning columns 32 that are positioned and plugged in are a group of positioning structures, and the fixing seat 60 and the mounting surface 31 of the adjustable workbench 30 can be positioned and installed via one or more groups of positioning structures.

[0069] In some embodiments, the fixing seat 60 is provided with a limiting groove 62, and the reflective prism 40 is limitedly inserted into the limiting groove 62 of the fixing seat 60. Of course, in other embodiments, the relative position and relative state between the reflective prism 40 and the fixing seat 60 can be stabilized by other methods.

[0070] By adopting the above scheme, the positioning hole 61 and the positioning column 32 can be positioned and plugged together, so that the reflective prism 40 can be quickly and accurately positioned and installed on the mounting surface 31 of the adjustable workbench 30 by means of the fixing seat 60. Based on this, the positioning and installation of the fixing seat 60 and the mounting surface 31 can be achieved without additional tools or fasteners, the installation process of the reflective prism 40 can be simplified, the installation efficiency, installation stability and installation reliability of the reflective prism 40 relative to the mounting surface 31 can be improved, the convenience of disassembly and assembly of the reflective prism 40 and the fixing seat 60 as a whole relative to the mounting surface 31 can be improved, and the consistency of the installation position of the reflective prism 40 and the fixing seat 60 as a whole relative to the mounting surface 31 after multiple placements can be improved, thereby helping to speed up the measurement process, reduce the difficulty of operation, and improve the measurement efficiency, measurement accuracy and measurement reliability.

[0071] Of course, in other embodiments, the reflective prism 40 may be directly positioned and mounted on the mounting surface 31 , or may be positioned and mounted on the mounting surface 31 by other components (such as fasteners).

[0072] See also Figure 6 , Figure 7 In some embodiments of the present application, the fixing base 60 is fixed to the adjustable workbench 30 by magnetic attraction.

[0073] It should be noted that, in some embodiments, the fixing seat 60 is a magnetic metal part, and the adjustable workbench 30 has a magnet, so that the fixing seat 60 and the adjustable workbench 30 can be fixed by magnetic attraction. In other embodiments, the adjustable workbench 30 is a magnetic metal part, and the fixing seat 60 has a magnet, so that the fixing seat 60 and the adjustable workbench 30 can be fixed by magnetic attraction. In other embodiments, the fixing seat 60 and the adjustable workbench 30 respectively have magnets, so that the fixing seat 60 and the adjustable workbench 30 can be fixed by magnetic attraction.

[0074] By adopting the above solution, on the basis of the fixed seat 60 and the adjustable workbench 30 being positioned and matched via the positioning hole 61 and the positioning column 32, the fixed seat 60 and the adjustable workbench 30 can be fixed by magnetic attraction to enhance the stability therebetween. Based on this, the installation efficiency, installation stability, installation reliability and disassembly convenience of the fixed seat 60 relative to the installation surface 31 can be improved, thereby helping to speed up the measurement process, reduce the difficulty of operation and improve the measurement efficiency.

[0075] Of course, in other embodiments, the fixed seat 60 and the adjustable workbench 30 can achieve positioning cooperation only based on the positioning holes 61 and the positioning columns 32. Alternatively, the fixed seat 60 and the adjustable workbench 30 can achieve positioning cooperation through the positioning holes 61 and the positioning columns 32, and stabilize the relative position and relative state through other detachable connection methods.

[0076] See also Figure 6 , Figure 7 In some embodiments of the present application, the adjustable workbench 30 includes a substrate 33 and a high-precision plate 34 disposed on the substrate 33 , and the side of the high-precision plate 34 facing away from the substrate 33 is a mounting surface 31 .

[0077] It should be noted that the high-precision plate 34 is a high-precision finely ground flat plate disposed on the substrate 33. The side of the high-precision plate 34 facing away from the substrate 33 is the mounting surface 31. Based on this, since the processing accuracy of the high-precision plate 34 is high, the flatness of the mounting surface 31 can be improved.

[0078] By adopting the above scheme, by making the adjustable workbench 30 include a substrate 33 and a high-precision plate 34 arranged on the substrate 33, on the one hand, a more stable and flatter mounting surface 31 can be provided based on the high-precision plate 34 with high processing accuracy, thereby improving the flatness of the mounting surface 31, improving the stability of the reflective prism 40 and the optical device 50 when they are installed on the mounting surface 31, reducing the error introduced due to the poor flatness of the mounting surface 31, and improving the measurement accuracy of the parallelism of the optical axis. On the other hand, based on the combined structure of the substrate 33 and the high-precision plate 34, the overall rigidity and stability of the adjustable workbench 30 can be improved, and the processing cost of the adjustable workbench 30 can be reduced.

[0079] Of course, in other embodiments, the adjustable workbench 30 may adopt other structural designs. For example, the adjustable workbench 30 may only include the high-precision plate 34, and so on.

[0080] See also Figure 1 , Figure 4 In some embodiments of the present application, in the step of removing the reflective prism 40 from the mounting surface 31 of the adjustable workbench 30 in the first state and replacing it with the optical device 50 (ie, step S4), the optical device 50 is positioned and installed at the center of the mounting surface 31.

[0081] By adopting the above scheme, the optical device 50 can be positioned and installed at the center of the mounting surface 31 of the adjustable workbench 30 in step S4. Based on this, the mounting position of the optical device 50 on the mounting surface 31 can be optimized, the error introduced by the change of the placement position of the optical device 50 can be reduced to a large extent, the influence of the placement position of the optical device 50 on the measurement result can be reduced to a large extent, the influence of the posture adjustment of the adjustable workbench 30 on the optical device 50 can be balanced, so as to maintain the consistency of the measurement conditions, facilitate the collimator 10 to measure the deviation, improve the measurement accuracy and measurement reliability, and facilitate the accurate measurement of the parallelism of the optical axis of the optical device 50.

[0082] This embodiment is particularly suitable for application in combination with the embodiment of "the reflecting prism 40 is positioned and installed at the center of the mounting surface 31". Such a setting can improve the centrality and consistency of multiple placement positions of the reflecting prism 40 and the placement position of the optical device 50, thereby maintaining the consistency of the measurement conditions and improving the measurement accuracy and reliability.

[0083] like Figure 6 , Figure 7 As shown, in some embodiments, a plurality of fastening holes 35 are provided on the mounting surface 31, and the optical device 50 can be positioned and mounted on the mounting surface 31 by fasteners (such as screws, etc.) aligning and connecting the fastening holes 35. Of course, in other embodiments, the optical device 50 can be positioned and mounted on the mounting surface 31 in other ways.

[0084] Of course, in other embodiments, the optical device 50 can be positioned and installed at any position of the installation surface 31 as needed.

[0085] See also Figure 1 , Figure 2 In some embodiments of the present application, the reference line L1 is a horizontal line.

[0086] By adopting the above scheme, by making the reference line L1 formed in step S1 a horizontal line, the first state of the mounting surface 31 of the adjustable workbench 30 calibrated in step S3 can be made horizontal (i.e., a horizontal plane), the workload of adjusting the posture of the adjustable workbench 30 in step S3 can be reduced, and a horizontal and stable reference plane can be provided. Moreover, in the subsequent steps, the installation of the optical device 50 in step S4 can be facilitated, the workload of adjusting the posture of the adjustable workbench 30 in step S5 can be reduced, and the collimator 10 in step S6 can be facilitated to directly obtain the deviation based on the horizontal plane, thereby facilitating the rapid and accurate measurement of the parallelism of the optical axis of the optical device 50, and improving the measurement accuracy, measurement reliability, and measurement efficiency.

[0087] Of course, in other embodiments, since the collimator 10 measures the deviation and difference of the previous and next data, the reference line L1 may not be a horizontal line, but may be inclined to the horizontal line.

[0088] See also Figure 3 , Figure 5 , Figure 6 , Figure 7 In some embodiments of the present application, the reflective prism 40 is a rectangular parallelepiped structure.

[0089] By adopting the above scheme, by making the reflecting prism 40 a rectangular parallelepiped structure, the reflecting prism 40 can have a standardized and regularized shape and size, so that the reflecting prism 40 can be more easily positioned and installed with the mounting surface 31 of the adjustable workbench 30, so that the reflecting prism 40 can form a larger contact area and support area with the mounting surface 31 of the adjustable workbench 30, and the installation convenience and installation stability of the reflecting prism 40 on the mounting surface 31 can be improved. In addition, since the rectangular reflecting prism 40 has clear edges, angles and sides, the reflecting prism 40 can clearly have a reflecting surface 41 facing the collimator 10 and perpendicular to the mounting surface 31 after being installed on the mounting surface 31, and the reflecting surface 41 of the reflecting prism 40 has a better perpendicularity to the mounting surface 31, so that the reflecting prism 40 can accurately reflect the test light path of the collimator 10, and the measurement precision, measurement accuracy and measurement reliability can be improved.

[0090] Of course, in other embodiments, the reflective prism 40 may be in other shapes, such as a triangular prism, etc. It is only necessary that the reflective prism 40 has a reflective surface 41 facing the collimator 10 and perpendicular to the mounting surface 31 .

[0091] The above description is only a preferred embodiment of the present application and is not intended to limit the present application. Any modifications, equivalent substitutions or improvements made within the spirit and principles of the present application should be included in the protection scope of the present application.

Claims

1. A method for measuring optical axis parallelism, characterized in that: The optical axis parallelism measurement method comprises the following steps: Adjust the collimator so that the center of the cross cursor of the collimator is aligned with the center of the cross cursor of the test card, so that the line therebetween forms a reference line; wherein the test card is placed vertically and fixed in position, and the collimator is fixed in position and spaced apart from the test card; A reflecting prism is placed on the mounting surface of the adjustable workbench between the collimator and the test card, wherein the reflecting surface of the reflecting prism facing the collimator is perpendicular to the mounting surface of the adjustable workbench; Adjusting the adjustable workbench so that the reflective prism reflects the test light path of the collimator back to the center of the test hole of the collimator, so that the mounting surface of the adjustable workbench is calibrated to a first state parallel to the reference line; Remove the reflecting prism from the mounting surface of the adjustable workbench in the first state and replace it with an optical device; Adjust the adjustable workbench so that the center of the cross cursor of the test card photographed by the optical device coincides with the center of the cross of the monitoring display screen of the optical device itself, so that the line therebetween is parallel to the optical axis of the optical device, and the mounting surface of the adjustable workbench is in a second state parallel to the optical axis of the optical device; The optical device is removed from the mounting surface of the adjustable workbench in the second state and replaced with the reflecting prism. The deviation measured by the collimator is the parallelism of the optical axis of the optical device.

2. The optical axis parallelism measuring method according to claim 1, characterized in that: The adjustable workbench can rotate in a circle around a vertical axis; And / or, a side of the adjustable workbench close to the test card can pitch and swing relative to the other side thereof.

3. The optical axis parallelism measuring method according to claim 1, characterized in that: In the step of placing a reflecting prism on the mounting surface of the adjustable workbench between the collimator and the test card, and in the step of removing the optical device from the mounting surface of the adjustable workbench in the second state and replacing it with the reflecting prism, the reflecting prism is positioned and installed at the same position of the mounting surface.

4. The optical axis parallelism measuring method according to claim 3, characterized in that: The reflecting prism is positioned and installed at the center of the installation surface.

5. The optical axis parallelism measuring method according to claim 3, characterized in that: The reflecting prism is positioned and mounted on the mounting surface via a fixing seat; One of the fixing seat and the adjustable workbench is provided with a positioning hole, and the other one of the two is provided with a positioning column which is inserted and positioned with the positioning hole.

6. The optical axis parallelism measuring method according to claim 5, characterized in that: The fixing seat is fixed to the adjustable workbench by magnetic attraction.

7. The optical axis parallelism measuring method according to any one of claims 1 to 6, characterized in that: The adjustable workbench comprises a base plate and a high-precision plate arranged on the base plate, and the side of the high-precision plate facing away from the base plate is the mounting surface.

8. The optical axis parallelism measuring method according to any one of claims 1 to 6, characterized in that: In the step of removing the reflecting prism from the mounting surface of the adjustable workbench in the first state and replacing it with an optical device, the optical device is positioned and installed at the center of the mounting surface.

9. The optical axis parallelism measuring method according to any one of claims 1 to 6, characterized in that: The reference line is a horizontal line.

10. The optical axis parallelism measuring method according to any one of claims 1 to 6, characterized in that: The reflecting prism is a rectangular parallelepiped structure.

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