Silicon-based nano powder and laser manufacturing method thereof

Abstract

The invention discloses a silicon-based nano powder manufacturing method, and belongs to the field of inorganic nonmetal powder materials. The method comprises the following steps: bombarding silicon-based glass by laser to generate micro powder, and directionally adsorbing the micro powder to a glass substrate to generate nano powder. According to the method, the nano powder generated by bombarding the silicon-based glass by laser is innovatively adopted to replace a traditional nano powder manufacturing method, and the average particle size of the silicon-based nano powder can be regulated and controlled by changing laser process parameters; according to the method, the problems of complex process conditions, high environmental protection cost and the like are effectively avoided while the particle size is reduced. The method has more application prospects in materials such as glass, ceramics, electronics, plastics and the like.

Description

Technical Field

[0001] The invention belongs to the field of inorganic non-metallic powder materials, and in particular relates to a silicon-based nano powder and a laser manufacturing method thereof. Background Art

[0002] Nano-scale silicon-based glass powder has become an important inorganic filler because of its many excellent physical and chemical properties. For example, silicon dioxide nanopowder has been widely used in high-tech fields such as copper clad laminates and epoxy molding fillers, aerospace, coatings, paints, adhesives, catalysts, medicine, precision casting, high-end ceramics, high-voltage components and daily cosmetics due to its superior properties such as high dielectric, heat, moisture and corrosion resistance, high filling content, low expansion, low stress, low impurities, low friction coefficient and low price.

[0003] The current mainstream processes for preparing silica nanopowders, including flame melting, plasma method, precipitation method, sol-gel method, microemulsion method and gas phase method, all have limitations. The flame melting method is to melt high-purity quartz into liquid at 2100℃ to 2500℃, and then obtain spherical silicon dioxide powder after spraying and cooling. The main disadvantages are large particle size, high energy consumption, and can only produce powders with a size of 5 microns or more; the plasma method is to melt and gasify silicon micropowder in the high-temperature field of the plasma moment, and then form powder during the rapid cooling process. The main disadvantages are that the particle size distribution is very wide and the energy consumption is high; the precipitation method uses water glass and acidifier as raw materials, adds surfactants in time and controls the reaction temperature at the same time, and adds stabilizers when the solution reaches a certain pH value. The resulting precipitate is washed, dried, and calcined to obtain nanopowder. The main disadvantages are complex process conditions and high environmental protection costs; the sol-gel method is to add acid to reduce the alkalinity to induce the polymerization reaction of silicate, so that the particle size of the high-polymer silicate ions in the form of colloidal particles in the system continues to increase, forming a silica sol with opalescent characteristics. After forming a sol, the colloidal particles are adsorbed on the surface through the hydrated Na + The bridging effect of the two solvents condenses to form silica gel, and after filtering, drying and calcining, nanopowders are obtained. The main disadvantages are complicated process, high environmental protection cost, and it is difficult to achieve industrial production; the microemulsion method uses two immiscible solvents to form a uniform emulsion under the action of surfactant, so that the nucleation, production, aggregation, agglomeration and other processes are confined to a tiny spherical droplet, and the solid phase is precipitated from the emulsion to form particles. The main disadvantages are harsh process conditions, high environmental protection cost, and it is difficult to achieve industrial production; the gas phase method is to generate particles by high-temperature hydrolysis and condensation of chlorosilane in a hydrogen-oxygen flame, and then obtain the particles through post-treatment processes such as sudden cooling, sudden aggregation of particles, gas-solid separation, and deacidification. The particles are amorphous powders, use organic reagents, and have high environmental protection costs.

[0004] The existing traditional preparation methods are complex, low in efficiency, high in production cost, and the product particle size is uncontrollable. In addition, for example, the gas phase method uses a large amount of volatile and corrosive ammonia water, which not only requires high sealing of production equipment, but also has risks in storage and transportation, and has certain harm to the environment. Therefore, it is necessary to develop a new, efficient, environmentally friendly preparation method that can accurately control the particle size. Summary of the invention

[0005] In order to overcome the deficiencies of the above-mentioned prior art, the present invention provides a silicon-based nanopowder and a laser manufacturing method thereof, wherein a laser light source in a powder production system is used to bombard a masterbatch to produce silicon-based nanopowder, and the average particle size of the silicon-based nanopowder is regulated by changing laser process parameters; the nanopowder obtained by the bombardment is then adsorbed onto a collection substrate by a drainage device through a powder collection system, thereby obtaining silicon-based nanopowder with uniform particle size. This nanopowder material has good application prospects in the fields of glass, ceramics, electronics, plastics, etc.

[0006] In order to achieve the above purpose, the present invention adopts the following technical solutions:

[0007] The present invention provides a laser manufacturing method for silicon-based nanopowder, which is characterized in that it comprises the following steps:

[0008] Step 1. Powder generation stage: The silicon-based masterbatch is bombarded by a laser light source to produce silicon-based nanopowder;

[0009] Step 2. Powder collection stage: The generated silicon-based nanopowder is drained and adsorbed onto a substrate and collected.

[0010] Preferably, in step 1, the silicon-based masterbatch is placed in a target material slot of a powder generation system, and the powder generation system includes a laser light source, a beam conversion, an indicator light and a galvanometer.

[0011] Preferably, the laser light source is selected from a CO2 laser or a fiber laser, and the wavelength of the laser light source is 1.0 to 10.6 μm, and the power range is 20 W to 100 W, so as to optimize the particle size and yield of the silicon-based nanopowder.

[0012] Preferably, the drainage and adsorption adopts at least one of an electrostatic drainage device, a temperature field drainage device, a gravity drainage device and a magnetic field drainage device, wherein, when the electrostatic drainage device is adopted, the voltage difference between the two poles is set to guide and adsorb the nanopowder onto the substrate; the collecting substrate is selected from at least one of a flat substrate, a bowl-shaped substrate and a grooved substrate.

[0013] The present invention also provides a silicon-based nanopowder prepared by the above-mentioned laser manufacturing method of silicon-based nanopowder, characterized in that the average particle size of the silicon-based nanopowder can be adjusted by changing the laser process parameters, and the average particle size of the prepared silicon-based nanopowder ranges from 50 to 200 nm.

[0014] Compared with the prior art, the present invention has the following beneficial effects:

[0015] 1) The silicon-based nanopowder manufacturing method of the present invention uses a laser light source to bombard the masterbatch. The average particle size of the silicon-based nanopowder can be adjusted by changing the laser process parameters. Through the interaction between the laser and the masterbatch, silicon-based nanopowder with uniform particle size can be obtained while simplifying the process. The preparation process is simple, green and pollution-free, and has low energy consumption.

[0016] 2) Through the drainage device of the powder collection system, the generated nano powder can be accurately drained to the substrate and effectively collected. This avoids the loss and contamination of the powder and improves the purity and quality of the product.

[0017] 3) The present invention combines laser bombardment with powder collection. This technical combination not only improves the preparation efficiency of nanopowders, but also provides new ideas and methods for the research and development and application of nanomaterials. BRIEF DESCRIPTION OF THE DRAWINGS

[0018] Figure 1 : Flow chart of the preparation process of silicon-based nanopowder in the present invention;

[0019] Figure 2 : The microscopic morphology and particle size distribution of the silicon dioxide nanopowder obtained by bombardment when the laser power is 60W in Example 1 of the present invention;

[0020] Figure 3 :Microstructure and particle size distribution of commercial silica nanopowders;

[0021] Figure 4 : The average particle size of the silicon dioxide nanopowder in Example 1 of the present invention varies with laser power;

[0022] Figure 5 : The microscopic morphology and particle size distribution of the high borosilicate nanopowder obtained by laser bombardment in Example 2 of the present invention. DETAILED DESCRIPTION

[0023] The specific embodiments of the present invention are further described below in conjunction with the accompanying drawings. It should be noted that the description of these embodiments is used to help understand the present invention, but does not constitute a limitation of the present invention. In addition, the technical features involved in the various embodiments of the present invention described below can be combined with each other as long as they do not conflict with each other.

[0024] Example 1: Preparation of silicon dioxide nanopowder by laser bombardment, the steps are as follows:

[0025] 1) According to the characteristics of quartz glass materials, select corresponding process parameters and import the process parameters into the laser bombardment system;

[0026] 2) Place the prepared quartz glass material in the target material groove, ensuring that the position is stable and the material surface is flat.

[0027] 3) starting the laser bombardment system, using a 10.6 micron CO2 continuous laser to bombard the quartz glass in the target material groove to produce quartz glass nanopowder, and the laser power was set to 20 W, 30 W, 40 W, 50 W, 60 W, 70 W, 80 W, and 90 W respectively;

[0028] 4) Using an electrostatic adsorption device, by setting the voltage difference between the negative electrodes to 5V, the generated quartz glass nanopowder is guided and collected onto a glass substrate.

[0029] The microscopic morphology and particle size distribution of the silicon dioxide nanopowder obtained in Example 1 of the present invention are as follows: Figure 2 As shown, the average particle size of the quartz glass nanopowder is 90nm. By comparing the microscopic morphology and particle size distribution of the silicon dioxide nanopowder obtained by laser bombardment in Example 1 of the present invention ( Figure 2 ) and the microstructure and particle size distribution of commercial silica nanopowders ( Figure 3 ) It can be seen that the particle size of the quartz glass powder produced by laser bombardment is comparable to that of commercial SiO2 nanopowder, but the powder distribution of this embodiment is more uniform than that of commercial powder; according to the variation of the average particle size of the silicon dioxide nanopowder with the laser power in Example 1 of the present invention Figure 4 It can be concluded that as the laser power increases, the average particle size of the silica nanopowder obtained by bombardment decreases accordingly. Therefore, the average particle size of the powder can be controlled by changing the laser process parameters as needed. The present invention solves the problems of the existing traditional preparation method being complicated, low in efficiency, high in production cost, and uncontrollable product particle size. The embodiment of the present invention does not use any other raw materials except the masterbatch, and the product after laser bombardment is only the target nanopowder, which has low environmental harm.

[0030] Example 2: Preparation of borosilicate nanopowder by laser bombardment, the steps are as follows:

[0031] 1) According to the characteristics of high borosilicate glass material, select corresponding process parameters and import the process parameters into the laser bombardment system;

[0032] 2) Place high borosilicate glass into the target material groove;

[0033] 3) Laser bombards the borosilicate glass in the target material groove to produce borosilicate glass powder. Laser parameters: 10.6 micron CO2 continuous laser, power 30W;

[0034] 4) The borosilicate powder is collected on the glass substrate through an electrostatic adsorption device, and the voltage difference between the positive and negative electrodes is 7V;

[0035] Microscopic morphology and particle size distribution of high borosilicate glass nanopowder obtained by bombardment at a laser power of 30 W in Example 2 of the present invention Figure 5 The results were statistically analyzed, and the results showed that the average particle size of the high borosilicate glass nanopowder obtained by bombardment was 120 nm. Therefore, the preparation of high borosilicate glass nanopowder can also be achieved through the present invention.

[0036] It should be pointed out that for ordinary technicians in this technical field, without departing from the principles of the present invention, the technical solutions and inventive concepts of the present invention can be equivalently replaced or changed, which should be covered by the protection scope of the present invention.

Claims

1. A laser manufacturing method for silicon-based nanopowder, characterized in that: The following steps are involved: Step 1. Powder generation stage: The silicon-based masterbatch is bombarded by a laser light source to produce silicon-based nanopowder; Step 2. Powder collection stage: The generated silicon-based nanopowder is drained and adsorbed onto a substrate and collected.

2. The laser manufacturing method of silicon-based nanopowder according to claim 1, characterized in that: In the step 1, the silicon-based masterbatch is placed in a target material slot of a powder generation system, and the powder generation system includes a laser light source, a beam conversion, an indicator light, and a galvanometer.

3. The laser manufacturing method of silicon-based nanopowder according to claim 2, characterized in that: The laser light source is selected from a CO2 laser or a fiber laser, and the wavelength of the laser light source is 1.0 to 10.6 μm, and the power range is 20 W to 100 W, so as to optimize the particle size and yield of the silicon-based nano powder.

4. The laser manufacturing method of silicon-based nanopowder according to claim 1, characterized in that: The drainage and adsorption adopts at least one of an electrostatic drainage device, a temperature field drainage device, a gravity drainage device and a magnetic field drainage device, wherein when the electrostatic drainage device is adopted, the voltage difference between the two poles is set to guide and adsorb the nanopowder onto the substrate; the collecting substrate is selected from at least one of a flat substrate, a bowl-shaped substrate and a grooved substrate.

5. A silicon-based nanopowder prepared by the laser production method of silicon-based nanopowder according to any one of claims 1 to 4, characterized in that: The average particle size of the silicon-based nanopowder can be adjusted by changing the laser process parameters, and the average particle size of the silicon-based nanopowder obtained is in the range of 50 to 200 nm.

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