Photomask suction tool

Abstract

The embodiment of the invention provides a photomask suction tool which comprises an adsorption assembly and a control assembly, and the control assembly is coupled with the adsorption assembly and is suitable for responding to an adsorption control signal and sucking gas in the adsorption assembly to form a negative pressure environment; the adsorption assembly is suitable for adsorbing the photomask in a negative pressure environment. By the adoption of the photomask suction tool, the taking-out efficiency of the photomask can be improved, and the photomask or other parts can be prevented from being damaged.

Description

Technical Field

[0001] The embodiments of the present specification relate to the field of semiconductor manufacturing technology, and more particularly to a photomask holder. Background Art

[0002] In the semiconductor manufacturing process, the mask is placed inside the lithography equipment to perform exposure, photolithography and other processes.

[0003] When a lithography device encounters an accident or fails and cannot work normally, the mask left inside the lithography device is usually removed manually.

[0004] However, due to the small internal space of the lithography equipment, it is difficult to accommodate manual operation. The manual method is inefficient and may cause damage to the mask or other components. Summary of the invention

[0005] In view of this, an embodiment of the present specification provides a photomask gripper that can improve the efficiency of removing the photomask and avoid damaging the photomask or other components.

[0006] The embodiment of the present specification provides a photomask gripper, comprising: a suction component and a control component, wherein:

[0007] The control component is coupled to the adsorption component and is adapted to suck the gas in the adsorption component in response to an adsorption control signal to form a negative pressure environment;

[0008] The adsorption component is suitable for adsorbing the photomask in a negative pressure environment.

[0009] Optionally, the control component is further adapted to release the gas sucked from the adsorption component in response to a release control signal to form a normal pressure environment.

[0010] Optionally, the photomask suction fixture further comprises: an extension rod disposed between the control component and the adsorption component, wherein a cavity is formed inside the extension rod.

[0011] Optionally, the control component includes:

[0012] Base;

[0013] A suction member, accommodated in the base, adapted to be electrically connected to a power source, and to suck gas in response to the adsorption control signal; and to discharge gas in response to the discharge control signal;

[0014] a handheld part connected to the base, on which a control switch is arranged, the control switch is connected to the suction member, and has a first state and a second state. When in the first state, the suction control signal is output to put the suction member in a working state; when in the second state, the discharge control signal is output to put the suction member in a closed state;

[0015] A vacuum pipeline is passed through the cavity in the extension rod, and a first end of the vacuum pipeline is connected to the suction member, and a second end of the vacuum pipeline is connected to the adsorption component.

[0016] Optionally, the suction member is a vacuum pump.

[0017] Optionally, a connecting hole is provided on the extension rod, and the connecting hole is close to the first end of the extension rod;

[0018] The adsorption assembly comprises a first bracket and an adsorption portion, wherein:

[0019] The first bracket has a first surface and a second surface opposite to each other, the first surface is connected to the first end of the extension rod, and the second surface is connected to the adsorption portion;

[0020] The adsorption part is connected to the vacuum pipeline of the control component through the connecting hole to form a suction channel.

[0021] Optionally, the adsorption part includes: a second bracket, an adsorption member and a connecting member, wherein:

[0022] The second bracket has a third surface and a fourth surface opposite to each other, and the third surface is connected to the second surface of the first bracket;

[0023] The adsorption member is fixedly connected to the second bracket and comprises an adsorption surface, and the adsorption surface is provided with adsorption holes;

[0024] The connecting piece is arranged on the adsorption piece and has a hollow structure so as to penetrate the adsorption hole and the vacuum pipeline.

[0025] Optionally, the adsorption part further includes: a plurality of connecting pipes and a plurality of the adsorption components, the plurality of the adsorption components are relatively arranged on both sides of the second bracket, wherein at least two adsorption components are arranged on the same side, and the adsorption components located on different sides of the second bracket are respectively connected by corresponding connecting pipes.

[0026] Optionally, the adsorption components arranged on the same side of the second bracket are arranged along the extension direction;

[0027] The adsorption components which are arranged on both sides of the second bracket and are located at diagonal positions are connected through corresponding connecting pipes.

[0028] Optionally, the photomask suction fixture further includes: an elastic member coupled between the first bracket and the second bracket.

[0029] Optionally, the photomask suction device further comprises: a plurality of sealing members, which are arranged on the suction surface of each suction member.

[0030] Optionally, the photomask suction fixture further comprises: a posture adjustment component, which is passed through the cavity of the extension rod and is rotatably connected to the control component and the suction component, and is suitable for adjusting the relative posture of the suction component and the extension rod.

[0031] Optionally, the posture adjustment assembly comprises: a transmission rod, a connecting member and a rotating member, wherein:

[0032] The connecting member has a first end connected to the first end of the transmission rod and a second end connected to the first end of the rotating member;

[0033] The transmission rod has a first end fixedly connected to the base and a second end fixedly connected to the connecting member;

[0034] The second end of the rotating member is connected to the suction assembly.

[0035] Using the mask suction device provided in the embodiment of this specification, in response to the adsorption control signal, the control component can suck the gas in the adsorption component to form a negative pressure environment, thereby being able to generate an adsorption force between the adsorption component and the mask, so that the adsorption component can adsorb the mask and can be used to remove the mask from the lithography equipment. Compared with the manual method, the mask suction device in the embodiment of this specification can enter the internal space of the lithography equipment more easily through the adsorption component, and is easy to operate, thereby improving the efficiency of removing the mask, and during the mask removal process, human hands do not need to touch the mask or other components, which can avoid damage to the mask or other components.

[0036] Furthermore, since the control component is also suitable for responding to a release control signal to release the gas sucked from the adsorption component to form a normal pressure environment; and the adsorption component is also suitable for releasing the mask under a normal pressure environment, therefore, through the coordinated operation between the two, the mask can be placed in a suitable position to avoid damage to the mask.

[0037] Furthermore, since the mask holder can also include an extension rod arranged between the control component and the adsorption component, a cavity is formed inside the extension rod. Therefore, the length of the mask holder can be adjusted through the extension rod to increase the distance between the control component and the adsorption component, so that the mask holder can be applicable to different types of lithography equipment and has strong universality.

[0038] Furthermore, a connecting hole is provided on the extension rod, and the connecting hole is close to the first end of the extension rod; the adsorption assembly includes a first bracket and an adsorption part, wherein the adsorption part can be connected to the vacuum pipeline of the control component through the connecting hole to form a suction channel. By adopting the adsorption assembly of the above structure, the adsorption part and the extension rod are connected through the first bracket, which can reduce the shaking force transmitted to the adsorption part, so that the adsorption part is always in a stable state, avoiding the detachment of the photomask from the adsorption part, and improving the stability during the removal of the photomask. In addition, the adsorption part forms a suction channel through the connecting hole and the vacuum pipeline, which can be located in the cavity, and can ensure the continuity of the gas suction process.

[0039] Furthermore, since the adsorption portion can also include multiple connecting pipes and multiple adsorption components, the multiple adsorption components are relatively arranged on both sides of the second bracket, and at least two adsorption components are arranged on the same side, the adsorption components located on different sides of the second bracket are respectively connected through corresponding connecting pipes, so that independent operation between different suction channels can be achieved. Even if the working state of one of the suction channels is abnormal, at least two adsorption components in the diagonal position can generate relatively uniform adsorption force on the adsorption surface and can still adsorb the photomask, thereby improving the reliability of the photomask holder.

[0040] Furthermore, the photomask holder may also include: an elastic member, coupled between the first bracket and the second bracket. Since the elastic member acts as a buffer, it can reduce the vibration during the photomask adsorption process, so that the adsorption surface of the adsorption member can fit the photomask surface more closely, further improving the reliability of the photomask holder.

[0041] Furthermore, the photomask holder may also include: a plurality of seals, which are arranged on the adsorption surface of each adsorption component. Through the plurality of seals, the vacuum tightness of each adsorption surface can be improved, and the adsorption force between each adsorption surface and the photomask can be increased, so that the photomask holder has stronger adsorption.

[0042] Furthermore, since the mask suction fixture also includes: a position adjustment component, which is passed through the cavity of the extension rod and is rotatably connected to the control component and the suction component, the relative position of the suction component and the extension rod can be adjusted through the position adjustment component, thereby enabling the mask suction fixture to adapt to different usage environments or lithography equipment with complex structures, and has greater flexibility and universality. BRIEF DESCRIPTION OF THE DRAWINGS

[0043] In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the drawings required for use in the embodiments of the present invention or the description of the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present invention. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying creative work.

[0044] Figure 1 A schematic diagram of the structure of a photomask gripper according to an embodiment of the present specification is shown;

[0045] Figure 2 A schematic diagram of a partial structure of a photomask gripper in a specific application scenario in an embodiment of this specification is shown;

[0046] Figure 3 A schematic diagram of the exploded structure of a photomask gripper according to an embodiment of this specification is shown;

[0047] Figure 4 An enlarged structural diagram of a connecting member and a rotating member in an embodiment of this specification is shown. DETAILED DESCRIPTION

[0048] As described in the background art, currently the efficiency of manually removing the photomask is low and may cause damage to the photomask or other components.

[0049] In order to solve the above technical problems, the embodiment of this specification provides a photomask gripper, which may include an adsorption component and a control component. In response to the adsorption control signal, the control component can suck the gas in the adsorption component to form a negative pressure environment, thereby generating an adsorption force between the adsorption component and the photomask, so that the adsorption component can adsorb the photomask and can be used to remove the photomask from the lithography equipment. Compared with the manual method, the photomask gripper in the embodiment of this specification can enter the internal space of the lithography equipment more easily through the adsorption component, and is easy to operate, thereby improving the efficiency of removing the photomask, and during the process of removing the photomask, human hands do not need to touch the photomask or other parts, which can avoid damage to the photomask or other parts.

[0050] In order to enable those skilled in the art to better understand and implement the photomask holder in the embodiments of this specification, the following is a detailed description with reference to the accompanying drawings and through specific application examples.

[0051] Reference Figure 1 The schematic diagram of the structure of a photomask gripper in the embodiment of the present specification is shown in FIG. Figure 1 As shown, the mask gripper M may include a suction component M2 and a control component M1, wherein:

[0052] The control component M1 is coupled to the adsorption component M2 and is adapted to suck the gas in the adsorption component M2 in response to an adsorption control signal to form a negative pressure environment;

[0053] The adsorption assembly M2 is suitable for adsorbing the photomask in a negative pressure environment.

[0054] The following combination Figure 1 , briefly describe the working principle of the mask gripper M in the embodiment of this specification:

[0055] In response to the adsorption control signal, the control component M1 can suck the gas in the adsorption component M2 to form a negative pressure environment. Due to the existence of the pressure difference, an adsorption force can be formed between the adsorption component M2 and the mask, so that the adsorption component M2 can adsorb the mask and remove the mask from the lithography equipment.

[0056] Compared with the manual method, the mask gripper in the embodiment of the present invention can more easily enter the internal space of the lithography equipment through the adsorption component, and is easy to operate, thereby improving the efficiency of mask removal. During the mask removal process, human hands do not need to touch the mask or other components, which can avoid damage to the mask or other components.

[0057] In order to enable those skilled in the art to have a clearer understanding of the technical concepts, technical principles, advantages, etc. contained in the embodiments of this specification, the following is a detailed introduction through specific embodiments and in combination with specific application scenarios with reference to the accompanying drawings.

[0058] In some embodiments of this specification, after the photomask is taken out, it is usually necessary to place the photomask in a specific device to prevent the photomask from being damaged. To this end, the control component in the embodiment of this specification is also suitable for responding to the release control signal to release the gas sucked from the adsorption component to form a normal pressure environment; correspondingly, the adsorption component is also suitable for releasing the photomask in a normal pressure environment.

[0059] In specific implementations, there are differences in lithography equipment at different process nodes, and the mask may be located at different positions in the lithography equipment. In the process of removing the mask, the length of the mask gripper needs to be adjusted. Based on this, continue to refer to Figure 1 The photomask suction device M may further include an extension rod M3 disposed between the control component M1 and the adsorption component M2, and a cavity is formed inside the extension rod M3.

[0060] Therefore, by setting an extension rod between the control component and the adsorption component, the length of the mask holder can be adjusted and the distance between the control component and the adsorption component can be increased, so that the mask holder can be applicable to different types of lithography equipment and has strong universality.

[0061] The specific structures of the control components and the extension rods involved in the embodiments of this specification are schematically described below through the accompanying drawings.

[0062] Combination Figure 1 , refer to Figure 2 The schematic diagram of the local structure of the photomask gripper in a specific application scenario in the embodiment of this specification is shown in FIG. Figure 2 As shown, a specific structural schematic diagram of the control component M1 and the extension rod M3 in the embodiment of this specification is shown.

[0063] Among them, Figure 2 As shown, the extension rod M3 is a rod-shaped structure and has a cavity M31 inside, and the control component M1 can be inserted into the cavity M31.

[0064] It is understandable that the extension rod M3 may also be other rod-shaped structures having a cavity M31. For example, the extension rod M3 may be a cylindrical rod-shaped structure. The embodiments of this specification do not limit the specific shape and structure of the extension rod M3, as long as it has a cavity M31 for the control component M1 to pass through.

[0065] Continue to refer to Figure 2 , the control component M1 in the embodiment of this specification may include:

[0066] Base M11;

[0067] The suction member M12 is accommodated in the base M11 and is suitable for connecting with the power source ( Figure 2 (not marked) and sucking gas in response to the adsorption control signal; and releasing gas in response to the release control signal;

[0068] The handheld part M13 is connected to the base M11 and is provided with a control switch M131. The control switch M131 is connected to the suction member M12 and has a first state and a second state. When in the first state, the suction control signal is output to put the suction member M12 in a working state; when in the second state, the discharge control signal is output to put the suction member M12 in a closed state.

[0069] The vacuum pipes M14 and M15 pass through the cavity M31 in the extension rod M3, and the first ends thereof are connected to the suction member M12, and the second ends thereof are connected to the adsorption assembly.

[0070] The following combination Figure 2 , briefly describe the working principle of control component M1.

[0071] When the control switch M131 is pressed, the control switch M131 is in the first state, and can output an adsorption control signal to the suction member M12, so that the suction member M12 is in a working state. The suction member M12 can suck the gas in the adsorption component through the vacuum pipes M14 and M15 passing through the cavity M31, and the adsorption component can adsorb the photomask.

[0072] During the process of adsorbing the photomask, the control switch M131 is always in the first state, and the adsorption component can continuously adsorb the photomask.

[0073] When the mask is taken out of the lithography equipment, the control switch M131 can be released. The control switch M131 is in the second state and can output a discharge control signal to the suction member M12, so that the suction member M12 is in a closed state and discharges the gas sucked from the adsorption component. The gas is discharged to the outside, so that the adsorption component is in a normal pressure environment. There is no adsorption force between the adsorption component and the mask, and the adsorption component can release the mask.

[0074] In some embodiments of this specification, continue to refer to Figure 2 The control component M1 may further include a control circuit M16, and the control switch M131 may be connected to the suction part M12 via the control circuit M16 to control the switching state of the suction part M12.

[0075] In other embodiments, the control switch M131 may also be directly connected to the suction part M12. The embodiments of this specification do not limit this, as long as the control switch M131 can control the switch state of the suction part M12.

[0076] In some embodiments of the present specification, the suction part M12 is a vacuum pump. In other embodiments, the suction part M12 is a micro pump or other equipment or device capable of sucking gas.

[0077] In a specific implementation, different types of power supplies can be used to power the control component based on specific application scenarios. For example, a power supply (such as a battery) can be built into the control component; for another example, a power supply port is provided on the control component, and it can be powered by an external power supply. The embodiments of this specification do not limit this, as long as the control component can be powered.

[0078] It is understandable that the above description of the control component is only an example. In actual applications, those skilled in the art can adaptively select and / or transform the structure and connection relationship of the control component in the above example according to actual needs and application scenarios. This can extend more implementation plans, and the embodiments of this specification do not limit these extended solutions.

[0079] For example, Figure 2 The control switch M131 in the embodiment is realized by a button. In other examples, the control switch M131 may also be other devices with switch states, such as a button switch, a toggle switch, etc.; for another example, the projections of the base M11 and the handheld part M13 are both rectangular structures. In other examples, the projections of the base M11 and the handheld part M13 may also be other structures; for another example, Figure 2 Two vacuum lines M14 and M15 in the control component M1 are shown in FIG. 1 . In other examples, three, four or more vacuum lines may be included.

[0080] In some embodiments of the present specification, as described above, the vacuum pipeline of the control component is connected to the suction component after passing through the cavity in the extension rod. To this end, in a specific implementation, the extension rod may be provided with a connection hole, the connection hole is close to the first end of the extension rod, and the vacuum pipeline can be connected to the adsorption component through the connection hole.

[0081] Reference Figure 3 The exploded structure diagram of a mask holder in the embodiment of this specification is shown in FIG. Figure 3 As shown, a schematic diagram of the explosion structure of the adsorption component M2 in the embodiment of this specification is shown.

[0082] In the embodiments of this specification, Figure 3 As shown, the adsorption assembly M2 may include: a first bracket M21 and an adsorption portion M22, wherein:

[0083] The first bracket M21 has a first surface and a second surface opposite to each other, the first surface is connected to the first end of the extension rod M3, and the second surface is connected to the adsorption portion M22;

[0084] The adsorption part M22, through the connection hole ( Figure 3 The vacuum pipeline (not shown) is connected to the control component to form a suction channel.

[0085] By connecting the adsorption part and the extension rod through the first bracket, the shaking force transmitted to the adsorption part can be reduced, so that the adsorption part is always in a stable state, preventing the mask from detaching from the adsorption part, and improving the stability of the mask removal process. In addition, the adsorption part can be located in the cavity through the connection hole and the vacuum pipeline to form a suction channel, which can ensure the continuity of the gas suction process.

[0086] In some embodiments of this specification, Figure 3 As shown, the first bracket M21 is in a "cross" or "X" shape with four corners.

[0087] In other embodiments, the first bracket M21 may also be disc-shaped. The present specification does not limit the shape of the first bracket M21 as long as it can be connected to the adsorption portion.

[0088] In a specific implementation, the adsorption part may include: a second bracket, an adsorption member and a connecting member, wherein:

[0089] The second bracket has a third surface and a fourth surface relative to each other, and the third surface is connected to the second surface of the first bracket; the adsorption component is fixedly connected to the second bracket, and includes an adsorption surface, and the adsorption surface is provided with adsorption holes; the connecting component is arranged on the adsorption component and has a hollow structure to penetrate the adsorption hole and the vacuum pipeline.

[0090] Specifically, since the second bracket is fixedly connected to the adsorption member, the extension rod and the adsorption part can be connected by connecting the third surface of the second bracket to the second surface of the first bracket. In addition, the adsorption surface and the vacuum pipeline can be connected by a connecting member with a hollow structure provided on the adsorption member to form a corresponding suction channel, and the gas in the adsorption part is sucked out by the suction member through the suction channel, and the adsorption surface of the adsorption part can adsorb the photomask.

[0091] As a specific example, Figure 3 As shown, the second bracket M221 has the same shape as the first bracket M21, both of which are in a "cross" or "X" shape and have four corners. Figure 3 The adsorption members M222 to M225 shown in the figure can be fixedly connected to the four corners of the second bracket M221, and the adsorption members have an adsorption surface (for example, the adsorption members M222 to M225 all have an adsorption surface, and the adsorption surface is located on the inner side of the adsorption members 222 to 225 along the paper surface), and the adsorption surface can be in direct contact with the photomask.

[0092] In other embodiments, when the second bracket M221 and the first bracket M21 are both disc-shaped, the adsorption component can also be fixedly connected to any area of ​​the second bracket M221.

[0093] It can be understood that, in the adsorption part with the above structure, each adsorption member is provided with a connecting member, and the suction member can suck the gas in each adsorption part through the suction channel formed by each connecting member and the vacuum pipeline.

[0094] During the actual working process, the inventor found that if the working state of any adsorption component in the adsorption part is abnormal (for example, the adsorption component is damaged or the adsorption surface is blocked and cannot generate adsorption force), the adsorption force of the adsorption surface is unevenly distributed. During the removal process, the mask may fall off, or even the generated adsorption force may not be able to adsorb the mask.

[0095] For example, Figure 3 As shown, if the adsorption member M222 is damaged, when the photomask is taken out, there is no adsorption force between the adsorption surface of the adsorption member M222 and the photomask, and the photomask may fall.

[0096] Based on this, in some embodiments of this specification, continue to refer to Figure 3 The adsorption portion M22 may further include a plurality of connecting pipes and a plurality of the adsorption components, wherein at least two adsorption components are arranged on the same side, and the adsorption components located on different sides of the second bracket are respectively connected through corresponding connecting pipes.

[0097] In a specific implementation, each connecting pipeline can work independently of each other.

[0098] As a specific example, continue to refer to Figure 3 The adsorption part M22 may include two connecting pipes M228 and M229 (since the connecting pipes 228 and 229 are arranged on the fourth surface of the second bracket M221, Figure 3 In the figure, the connecting pipeline is represented by a dotted line), four adsorption components M222 to M225, and two adsorption components M222 and M223 are arranged on the same side of the second bracket M221, and two adsorption components M224 and M225 are arranged on the other side of the second bracket M221. The adsorption components M222 and M224 located on different sides of the second bracket can be connected through a connecting pipeline M229.

[0099] Continue to refer to Figure 3 The adsorption components M222 and M223 arranged on the same side of the second bracket M221, and the adsorption components M224 and M225 on the same side can be arranged along the extension direction; the adsorption components relatively arranged on both sides of the second bracket M221 and in diagonal positions are respectively connected through corresponding connecting pipes. For example, the adsorption components M222 and M224 relatively arranged on both sides of the second bracket M221 and in diagonal positions can be connected through a connecting pipe M229, and the adsorption components M223 and M225 relatively arranged on both sides of the second bracket M221 and in diagonal positions can be connected through a connecting pipe M228.

[0100] By adopting the above-mentioned connection method, since the adsorption components relatively arranged on both sides of the second bracket and in the diagonal position are connected through a connecting pipe, that is, at least two adsorption components in the diagonal position share a suction channel, and different suction channels operate independently, even if the working state of one of the suction channels is abnormal, at least two adsorption components in the diagonal position can generate relatively uniform adsorption force on the adsorption surface and can still adsorb the photomask, thereby improving the reliability of the photomask suction device.

[0101] In the embodiments of this specification, continue to refer to Figure 3 , Figure 3 The dotted arrow L in the figure is used to illustrate the corresponding relationship between the angles of the first bracket M21 and the second bracket M221. In a specific implementation, the first bracket M21 and the second bracket M221 can be connected as shown by the arrow L.

[0102] It should be noted that the above description of the adsorption component is only an example. In actual applications, those skilled in the art can adaptively select and / or modify the structure and connection relationship of the control component in the above example according to actual needs and application scenarios. This can extend more implementation plans, and the embodiments of this specification do not limit these extended solutions.

[0103] For example, Figure 3The projections of the adsorption members M222 to M225 are all rectangular. In other examples, the projections of the adsorption members M222 to M225 may be circular ring structures. For example, Figure 3 It is shown that the connecting member M227 is located on the adsorbing member M225, and the connecting member M226 is located on the adsorbing member M224. In other examples, the connecting member M227 may be located on the adsorbing member M222, and the connecting member M226 may be located on the adsorbing member M223. For another example, Figure 3 Only two connecting parts are shown in the figure. In other examples, four connecting parts may be included, each of which is located on the corresponding adsorption part.

[0104] In the specific implementation, continue to refer to Figure 3 The photomask holder M may further include an elastic member M4 coupled between the first bracket M21 and the second bracket M224.

[0105] More specifically, the elastic member M4 may be coupled between the second surface of the first bracket M21 and the third surface of the second bracket M224.

[0106] By setting an elastic member M4 between the first bracket M21 and the second bracket M224, the elastic member M4 plays a buffering role, which can reduce the vibration during the mask adsorption process, so that the adsorption surface of the adsorption member can fit the mask surface more closely, further improving the reliability of the mask holder.

[0107] As a specific example, Figure 3 As shown, the elastic member M4 may include springs M41 to M44, and the springs M41 to M44 may be coupled between four corresponding corners of the first bracket M21 and the second bracket M221.

[0108] It is understood that the types, quantities, and positions of the elastic members between the first bracket and the second bracket are described by way of example. Figure 3 The first bracket M21 and the second bracket M221 are both "cross" or "X" shaped, so the first bracket M21 and the second bracket M221 can be connected by coupling the four springs M41 to M44 to the opposite diagonals of the first bracket M21 and the second bracket M221 respectively.

[0109] In other examples, when the first bracket and the second bracket are both disc-shaped, the spring may be located between opposite edges of the first bracket and the second bracket; or the elastic component may also be other elastic objects such as rubber bands.

[0110] In the embodiments of this specification, by sucking the gas in the adsorption part, a corresponding adsorption force can be generated to remove the mask from the photolithography device. In the specific implementation, there may be a situation where the adsorption force is insufficient. Please refer to Figure 3The photomask suction device M2 may further include: a plurality of sealing members M61 to M64, which are arranged on the suction surface of each suction member.

[0111] For example, the seal M61 may be disposed on the adsorption surface of the adsorption part M222, the seal M62 may be disposed on the adsorption surface of the adsorption part M225, the seal M63 may be disposed on the adsorption surface of the adsorption part M223, and the seal M64 may be disposed on the adsorption surface of the adsorption part M224.

[0112] By arranging a sealing member on the adsorption surface of each adsorption member, the vacuum tightness of each adsorption surface can be improved, and the adsorption force between each adsorption surface and the photomask can be increased, so that the photomask holder has stronger adsorption.

[0113] It should be noted that the number of the above-mentioned sealing members and their positions on the adsorption surface are only examples. In specific implementations, the number and positions of the sealing members can be flexibly set according to needs. The embodiments of this specification do not limit the number of sealing members.

[0114] In the process of removing the photomask, since there are many parts inside the lithography equipment and the grasping path is complicated, it is necessary to adjust the position of the photomask clamp in the lithography equipment to adapt to different types of lithography equipment.

[0115] In some embodiments of the present specification, the photomask suction fixture may further include: a posture adjustment component, which is passed through the cavity of the extension rod and is rotatably connected to the control component and the suction component, and is suitable for adjusting the relative posture of the suction component and the extension rod.

[0116] As a specific example, referring to Figure 2 and Figure 3 , the posture adjustment component may include: a transmission rod M52, a connecting member M51 and a rotating member M53, wherein:

[0117] The connecting member M51 has a first end connected to the first end of the transmission rod M52, and a second end connected to the first end of the rotating member M53;

[0118] The transmission rod M52, a second end of which is fixedly connected to the base M11;

[0119] The second end of the rotating member M53 is connected to the suction assembly.

[0120] Specifically, since the extension rod M3 in the embodiment of the present specification is rotatably connected to the hand-held part M13, a driving force can be generated when the hand-held part M13 is rotated, and the driving force can be transmitted to the connecting part M51 through the transmission rod M52. Since the first end of the rotating part M53 is connected to the connecting part M51, and the second end is connected to the suction assembly (specifically, connected to the first bracket M21), the rotating part M53 can be rotated under the driving force, thereby realizing the adjustment of the relative position of the suction assembly and the extension rod, so that the mask suction fixture can adapt to different usage environments or lithography equipment with complex structures, and has greater flexibility and universality.

[0121] In some embodiments of this specification, Figure 4 The connecting member M51 and the rotating member M53 can adjust the relative position of the suction assembly and the extension rod through the meshing action of the transmission gear member.

[0122] The following combination Figures 1 to 4 , describing in detail the process of the mask suction device adsorbing the mask in the embodiment of this specification.

[0123] When the control switch M131 is pressed, the control switch M131 is in the first state, and can output an adsorption control signal to the suction member M12, so that the suction member M12 is in a working state. The suction member M12 can suck the gas in the adsorption members M222 to M225 through the vacuum pipes M14 and M15, the connectors M226 and M227, and the connecting pipes M228 and M229 that pass through the cavity M31. The adsorption surfaces of the adsorption members M222 to M225 can generate adsorption force to adsorb the photomask.

[0124] When the grasping path is complex, for example, there is an angle between the extension direction of the adsorption component M2 and the extension rod M3, since the extension rod M3 in the embodiment of the present specification is rotatably connected to the hand-held part M13, a corresponding driving force can be generated by rotating the hand-held part M13, and the driving force can be transmitted to the connecting part M51 through the transmission rod M52. Since the first end of the rotating part M53 is connected to the connecting part M51 and the second end is connected to the first bracket M21, the rotating part M53 can rotate under the driving force, thereby realizing the adjustment of the relative position of the suction component and the extension rod.

[0125] During the process of taking out the photomask, the control switch M131 is always in the first state, and the adsorbing members M222 to M225 can continuously adsorb the photomask.

[0126] When the mask is taken out of the lithography equipment, the control switch M131 can be released. The control switch M131 is in the second state and can output a discharge control signal to the suction member M12, so that the suction member M12 is in a closed state, and the gas sucked from the adsorption members M222 to M225 is discharged through the suction channel formed by the vacuum pipes M14 and M15, the connectors M226 and M227, the connecting pipes M228 and the M229 connectors. The adsorption component M2 can release the mask.

[0127] It is understood that the terms "first", "second", etc. are used for descriptive purposes only and are not to be understood as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Thus, a feature defined by the terms "first", "second", etc. may explicitly or implicitly include one or more of the features.

[0128] Moreover, the terms "first", "second", etc. are used to distinguish similar objects, and are not necessarily used to describe a particular order or to indicate importance. It is understood that the terms used in this way can be interchanged where appropriate, so that the embodiments of the present specification described herein can be implemented in an order other than those illustrated or described herein.

[0129] Although the embodiments of this specification are disclosed as above, the present invention is not limited thereto. Any person skilled in the art can make various changes and modifications without departing from the spirit and scope of the present invention, so the protection scope of the present invention shall be subject to the scope defined by the claims.

Claims

1. A photomask gripper, characterized in that: include: Adsorption assembly and control assembly, wherein: The control component is coupled to the adsorption component and is adapted to suck the gas in the adsorption component in response to an adsorption control signal to form a negative pressure environment; The adsorption component is suitable for adsorbing the photomask in a negative pressure environment.

2. The photomask gripper according to claim 1, characterized in that: The control component is further adapted to release the gas sucked from the adsorption component in response to a release control signal to form a normal pressure environment; The adsorption assembly is also suitable for releasing the photomask under normal pressure.

3. The photomask gripper according to claim 2, characterized in that: Also includes: An extension rod is arranged between the control component and the adsorption component, and a cavity is formed inside the extension rod.

4. The photomask gripper according to claim 3, characterized in that: The control component comprises: Base; A suction member, accommodated in the base, adapted to be electrically connected to a power source, and to suck gas in response to the adsorption control signal; and to discharge gas in response to the discharge control signal; a handheld part connected to the base, on which a control switch is arranged, the control switch is connected to the suction member, and has a first state and a second state. When in the first state, the suction control signal is output to put the suction member in a working state; when in the second state, the discharge control signal is output to put the suction member in a closed state; A vacuum pipeline is passed through the cavity in the extension rod, and a first end of the vacuum pipeline is connected to the suction member, and a second end of the vacuum pipeline is connected to the adsorption component.

5. The photomask gripper according to claim 4, characterized in that: The suction member is a vacuum pump.

6. The photomask gripper according to claim 5, characterized in that: The extension rod is provided with a connection hole, and the connection hole is close to the first end of the extension rod; The adsorption assembly comprises a first bracket and an adsorption portion, wherein: The first bracket has a first surface and a second surface opposite to each other, the first surface is connected to the first end of the extension rod, and the second surface is connected to the adsorption portion; The adsorption part is connected to the vacuum pipeline of the control component through the connecting hole to form a suction channel.

7. The photomask gripper according to claim 6, characterized in that: The adsorption part includes: a second bracket, an adsorption member and a connecting member, wherein: The second bracket has a third surface and a fourth surface opposite to each other, and the third surface is connected to the second surface of the first bracket; The adsorption member is fixedly connected to the second bracket and comprises an adsorption surface, and the adsorption surface is provided with adsorption holes; The connecting piece is arranged on the adsorption piece and has a hollow structure so as to penetrate the adsorption hole and the vacuum pipeline.

8. The photomask gripper according to claim 7, characterized in that: The adsorption part also includes: a plurality of connecting pipes and a plurality of the adsorption components, wherein the plurality of the adsorption components are relatively arranged on both sides of the second bracket, wherein at least two adsorption components are arranged on the same side, and the adsorption components located on different sides of the second bracket are respectively connected through corresponding connecting pipes.

9. The photomask gripper according to claim 7, characterized in that: The adsorption member arranged on the same side of the second bracket is arranged along the extension direction; The adsorption components which are arranged on both sides of the second bracket and are located at diagonal positions are connected through corresponding connecting pipes.

10. The photomask holder according to any one of claims 7 to 9, characterized in that: Also includes: An elastic member is coupled between the first bracket and the second bracket.

11. The photomask holder according to any one of claims 7 to 9, characterized in that: Also includes: A plurality of sealing members are arranged on the adsorption surface of each adsorption member.

12. The photomask gripper according to claim 4, characterized in that: Also includes: The posture adjustment component is inserted into the cavity of the extension rod and is rotatably connected to the control component and the suction component, and is suitable for adjusting the relative posture of the suction component and the extension rod.

13. The photomask gripper according to claim 12, characterized in that: The posture adjustment assembly comprises: a transmission rod, a connecting member and a rotating member, wherein: The connecting member has a first end connected to the first end of the transmission rod and a second end connected to the first end of the rotating member; The transmission rod has a first end fixedly connected to the base and a second end fixedly connected to the connecting member; The second end of the rotating member is connected to the suction assembly.

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