Immersion method of isostatic pressing graphite for semiconductors

Abstract

The invention belongs to the technical field of graphite impregnation, and discloses an isostatic pressing graphite impregnation method for a semiconductor, which comprises the following steps: S1, integrally lifting an upper cover through a telescopic cylinder, placing a graphite sample on a placement frame, and after placement is completed, splicing the upper cover with a shell again through the telescopic cylinder, s4, lifting an upper cover, a placement frame and the graphite sample through a telescopic air cylinder, and synchronously starting a cooling fan at the moment because high temperature exists on the surface of the graphite sample at the moment, so that the cooling fan can perform cooling and cleaning on the graphite sample; according to the graphite sample cooling device disclosed by the invention, the telescopic air cylinder, the upper cover, the cooling fans and other structures are matched, and the two groups of cooling fans are used for blowing and cooling the graphite sample in the middle, so that the purpose of conveniently cooling the processed graphite sample by the device is achieved.

Description

Technical Field

[0001] The invention belongs to the technical field of graphite impregnation, in particular to an isostatic graphite impregnation method for semiconductors. Background Art

[0002] Isostatic graphite is a high-performance graphite material with high density, high strength, high electrical conductivity, high thermal conductivity and good chemical resistance. In order to improve the performance of isostatic graphite, especially to improve its volume density and mechanical strength, it needs to be treated by impregnation. The impregnation method presses the impregnant (such as coal tar) into the open pores of the material at a certain temperature and pressure to form a mesh structure, thereby blocking the pores and improving the material performance.

[0003] Then, when the existing graphite impregnation device is used, the graphite sample is placed in the impregnation tank to ensure that the sample can be completely immersed in the impregnation liquid, the heating system is started, and the vacuum system is started at the same time to evacuate the impregnation tank to remove the gas and impurities in the sample and the impregnation liquid. While maintaining the vacuum state, the impregnation liquid is injected into the impregnation tank for impregnation. After completion, the excess impregnation liquid is discharged, and the graphite sample is taken out after the device is cooled as a whole.

[0004] The device cannot fix the graphite in the impregnation tank, so that the position of the graphite sample will be offset during extraction and compression, resulting in a low effect of the final impregnation product. In addition, since the overall trajectory of the impregnation liquid is static after entering the device, it cannot be guaranteed that the impregnation liquid fully impregnates the graphite sample. After the graphite sample is processed, it needs to be cleaned and dried, but there will be residual temperature when it leaves the processing area of ​​the device, which makes it inconvenient to take the graphite sample and the processed graphite sample needs to be cooled. Summary of the invention

[0005] In order to solve the problems raised in the above background technology, the present invention provides a method for impregnating isostatic graphite for semiconductors.

[0006] To achieve the above object, the present invention provides the following technical solutions:

[0007] A method for impregnating isostatic graphite for semiconductors comprises the following steps:

[0008] S1. The upper cover is lifted as a whole by a telescopic cylinder. After lifting, the upper cover as a whole and the mounting frame are exposed outside the device. At this time, the graphite sample can be placed on the mounting frame, and the graphite sample is clamped and fixed by starting the bidirectional motor. After the placement is completed, the upper cover is reassembled with the shell by the telescopic cylinder, and the internal space is sealed by a rubber sealing ring;

[0009] S2, start the vacuum pump, and the vacuum pump evacuates the inside of the shell through the vacuum pipe. After the vacuum is completed, the immersion liquid is input through the infusion port and the pipe connected to the infusion port. After the delivery of the immersion liquid is completed, the one-way valve at the infusion port is closed, so that the inside of the shell becomes sealed again, and the heating pipe is simultaneously started to heat the inside of the shell and the immersion liquid;

[0010] S3. Since the inside of the shell is in a negative pressure state, the impregnation liquid can be filled into the gap of the graphite sample to complete the processing of the graphite sample. At this time, the second servo motor can be started to drive the second connecting rod, the connecting frame and the spoiler rod to rotate to disturb the impregnation liquid inside the shell, so that it can contact the graphite sample from more angles to avoid uneven impregnation. After the processing is completed, the impregnation liquid is withdrawn;

[0011] S4. After the impregnation process is completed, the upper cover, the mounting frame and the graphite sample are lifted up by the telescopic cylinder. Since the surface of the graphite sample is at high temperature at this time, the cooling fan is started synchronously at this time. The cooling fan can dissipate heat and cool the graphite sample, and can clean the excess impregnation liquid on the surface of the graphite sample. After the graphite sample is cooled, it will be taken out.

[0012] An isostatic graphite impregnation device for semiconductors comprises a shell, a telescopic cylinder is fixed inside the shell, an upper cover is fixed to the top of the telescopic cylinder, an air pump is fixed to the top of the upper cover, an air pump is installed at the output end of the air pump, an air pump pipe is installed at the output end of the air pump, the upper cover is connected to the output end of the air pump pipe, and a placement mechanism is fixed to the bottom end of the air pump pipe;

[0013] The placement mechanism includes a placement frame, a bidirectional motor and a first connecting rod. The placement frame is fixed to the bottom end of the upper cover, the bidirectional motor is fixed to the outside of the placement frame, the first connecting rod is fixed to the outside of the bidirectional motor, the first bevel gear is fixed to the outside of the first connecting rod, the second bevel gear is arranged on the outside of the first bevel gear, a reciprocating screw is fixed to one end of the second bevel gear, a limiting block is arranged on the outside of the reciprocating screw, and an air guide groove is opened on the outside of the limiting block.

[0014] Preferably, two groups of first connecting rods are provided, and the first connecting rods are symmetrically distributed about the central axis of the bidirectional motor. The outside of the first bevel gear is provided with several groups of equally spaced teeth, and the outside of the second bevel gear is provided with several groups of equally spaced teeth. The first bevel gear and the second bevel gear are meshingly connected, so that the device can clamp and limit two groups of graphite samples at the same time.

[0015] Preferably, two groups of the second bevel gears and reciprocating screws are provided, the second bevel gears and the reciprocating screws are symmetrically distributed about the central axis of the mounting frame, and the reciprocating screws are rotatably connected to the inside of the mounting frame.

[0016] Preferably, the internal thread of the limit block is connected to a reciprocating screw, and two groups of the limit blocks are arranged. The limit blocks are symmetrically distributed about the central axis of the reciprocating screw, and several groups of air guide grooves are opened. The air guide grooves are arranged at equal intervals. The setting of the air guide grooves can guide the wind blown by the cooling fan to the surface of the graphite sample clamped in the middle, so as to improve the efficiency of the device in cleaning and drying the graphite sample after impregnation processing.

[0017] Preferably, a rubber sealing ring is sleeved on the outside of the upper cover, a cooling fan is fixed on the outside of the upper cover, a spoiler mechanism is installed inside the shell, a heating tube is fixed at the bottom end of the shell, and an infusion port is opened at one end of the shell. By using a rubber sealing ring to fill the gap between the upper cover and the shell, the sealing of the spliced ​​upper cover and the shell can be ensured, which effectively avoids the problem of gas leakage during vacuuming resulting in poor vacuuming effect.

[0018] Preferably, the spoiler mechanism includes a second servo motor, a second connecting rod and a connecting frame, the second servo motor is fixed to the outside of the shell, a second connecting rod is fixed to one end of the second servo motor, a connecting frame is fixed to the outside of the second connecting rod, and the connecting frame is rotatably connected to the spoiler rod inside the connecting frame, which can effectively stir the impregnation liquid filled in the device, so that the graphite sample can contact the impregnation liquid in all directions, thereby improving the efficiency of the device in impregnating the graphite sample.

[0019] Preferably, the second connecting rod is movably connected inside the shell, and the connecting frame is provided with several groups, and the connecting frames are distributed at equal intervals about the central axis of the second connecting rod. By providing multiple groups of second connecting rods, the effect of stirring and disturbing the immersion liquid inside the device can be improved.

[0020] Preferably, the spoiler rods are arranged in several groups, and the spoiler rods are evenly spaced about the central axis of the connecting frame. The spoiler rods can rotate when following the rotation of the second connecting rod, thereby effectively stirring and disturbing the immersion liquid inside the device, thereby improving the efficiency of the device's disturbance.

[0021] Preferably, four groups of telescopic cylinders are provided, and the telescopic cylinders are symmetrically distributed about the central axis of the shell; two groups of cooling fans are provided, and the cooling fans are symmetrically distributed about the central axis of the upper cover; the upper cover can be raised and lowered by starting the telescopic cylinders; several groups of heating tubes are provided, and the heating tubes are arranged at equal intervals at the bottom end of the shell; the heating tubes are started to heat the inside of the device and the impregnation liquid, thereby improving the efficiency of impregnation of the graphite sample.

[0022] Compared with the prior art, the present invention has the following beneficial effects:

[0023] The present invention arranges the coordination of structures such as a telescopic cylinder, an upper cover, and a heat dissipation fan, so that the device can place the graphite sample on a mounting frame and fix it, and then control the telescopic cylinder to adjust the height of the upper cover so that the upper cover is assembled with the shell body. At this time, the vacuum pump is started and the interior of the shell body is evacuated through the vacuum pipe, and the impregnation liquid can be added through the infusion port. After the impregnation process of the graphite sample is completed, the telescopic cylinder is controlled to lift the upper cover as a whole and then drive the processed graphite sample to be lifted. Since the graphite sample still has residual temperature at this time, it is not convenient to take it. When lifting the graphite sample, the heat dissipation fan is started synchronously, and the graphite sample in the middle is blown to cool it down through two groups of heat dissipation fans, so as to achieve the purpose of facilitating the device to cool down the processed graphite sample.

[0024] The present invention arranges a placement rack, a bidirectional motor, a first connecting rod and other structures in coordination, so that when the graphite sample is placed on the top of the placement rack for impregnation processing, the bidirectional motor is started, so that the bidirectional motor drives the first connecting rod and the first bevel gear to rotate, and drives the second bevel gear and the reciprocating screw to rotate. Then, through the shape of the reciprocating screw, the reciprocating screw can drive the two groups of limit blocks to move in opposite directions through its own shape when rotating, and then clamp the graphite sample placed on the top of the placement rack, so as to prevent the position of the graphite sample from being offset during the impregnation or drying process of the device, causing damage to the raw material.

[0025] The present invention arranges a second servo motor, a second connecting rod, a connecting frame and other structures in coordination, so that the device can drive the second connecting rod to rotate by starting the second servo motor, and then mobilize the connecting frame to rotate. After the impregnation liquid is poured in, when the connecting frame rotates, the spoiler rod will also rotate due to its own shape, thereby interfering with the flow direction and speed of the impregnation liquid, making the flow direction of the impregnation liquid wider and more, thereby achieving the purpose of facilitating the improvement of the device's impregnation efficiency for graphite samples. BRIEF DESCRIPTION OF THE DRAWINGS

[0026] Figure 1 It is a schematic diagram of the overall structure of the present invention;

[0027] Figure 2 It is a schematic diagram of the overall lifting structure of the present invention;

[0028] Figure 3 It is a schematic diagram of the overall lifting right view structure of the present invention;

[0029] Figure 4 It is a schematic diagram of the overall lifting cross-sectional structure of the present invention;

[0030] Figure 5 It is a schematic diagram of the overall cross-sectional structure of the present invention;

[0031] Figure 6 It is a schematic diagram of the upper cover structure of the present invention;

[0032] Figure 7 It is a schematic diagram of the upper cover structure of the present invention when viewed from above;

[0033] Figure 8 It is a schematic diagram of the structure of the spoiler mechanism of the present invention.

[0034] In the figure: 1. shell; 2. telescopic cylinder; 3. upper cover; 4. vacuum pump; 5. vacuum pipe; 6. placement mechanism; 601. placement frame; 602. bidirectional motor; 603. first connecting rod; 604. first bevel gear; 605. second bevel gear; 606. reciprocating screw; 607. limit block; 608. air guide groove; 7. rubber sealing ring; 8. cooling fan; 9. spoiler mechanism; 901. second servo motor; 902. second connecting rod; 903. connecting frame; 904. spoiler rod; 10. heating tube; 11. infusion port. DETAILED DESCRIPTION

[0035] The following will be combined with the drawings in the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0036] like Figures 1 to 8 As shown, the present invention provides an isostatic graphite impregnation device for semiconductors, including a shell 1, a telescopic cylinder 2 is fixed inside the shell 1, an upper cover 3 is fixed to the top of the telescopic cylinder 2, an exhaust pump 4 is fixed to the top of the upper cover 3, an exhaust pipe 5 is installed at the output end of the exhaust pump 4, the output end of the exhaust pipe 5 is connected to the upper cover 3, a placement mechanism 6 is fixed to the bottom end of the exhaust pipe 5, and a rubber sealing ring 7 is sleeved on the outside of the upper cover 3.

[0037] The above solution is adopted: the gap at the connection between the shell 1 and the upper cover 3 is filled by the rubber sealing ring 7 when the upper cover 3 and the shell 1 are assembled, so as to ensure that a closed space is formed when the shell 1 and the upper cover 3 are connected, and prevent gas leakage during vacuuming, resulting in poor final impregnation results of the device.

[0038] A cooling fan 8 is fixed to the outside of the upper cover 3, four groups of telescopic cylinders 2 are provided, and the telescopic cylinders 2 are symmetrically distributed about the central axis of the shell 1, two groups of cooling fans 8 are provided, and the cooling fans 8 are symmetrically distributed about the central axis of the upper cover 3, a spoiler mechanism 9 is installed inside the shell 1, a heating tube 10 is fixed to the bottom end of the shell 1, and several groups of heating tubes 10 are provided, and the heating tubes 10 are arranged at equal intervals at the bottom end of the shell 1, and an infusion port 11 is opened at one end of the shell 1.

[0039] The above scheme is adopted: after the graphite sample is placed on the mounting frame 601 and fixed, the telescopic cylinder 2 is controlled to adjust the height of the upper cover 3 so that the upper cover 3 is assembled with the shell 1. At this time, the vacuum pump 4 is started and the interior of the shell 1 is evacuated through the vacuum pipe 5. The impregnation liquid can be added through the infusion port 11, and the interior of the shell 1 and the impregnation liquid are heated by starting the heating tube 10 so that they can be more smoothly filled into the internal gap of the graphite sample. After completing the impregnation process of the graphite sample, the telescopic cylinder 2 is controlled to lift the upper cover 3 as a whole and then drive the processed graphite sample to lift. Since the graphite sample still has residual temperature at this time, it is not convenient to take it. When lifting the graphite sample, the cooling fan 8 is started synchronously, and the two groups of cooling fans 8 are used to blow air to cool the graphite sample in the middle.

[0040] like Figures 1 to 8 As shown, the spoiler mechanism 9 includes a second servo motor 901, a second connecting rod 902 and a connecting frame 903. The second servo motor 901 is fixed to the outside of the shell 1. The second connecting rod 902 is fixed to one end of the second servo motor 901. The connecting frame 903 is fixed to the outside of the second connecting rod 902. The second connecting rod 902 is movably connected to the inside of the shell 1. The connecting frame 903 is provided with a plurality of groups. The connecting frames 903 are evenly spaced about the central axis of the second connecting rod 902. The inside of the connecting frame 903 is rotatably connected with a spoiler rod 904. The spoiler rod 904 is provided with a plurality of groups. The spoiler rod 904 is evenly spaced about the central axis of the connecting frame 903.

[0041] The above scheme is adopted: by starting the second servo motor 901 to drive the second connecting rod 902 to rotate, and then mobilizing the connecting frame 903 to rotate. After the immersion liquid is poured in, when the connecting frame 903 rotates, the spoiler rod 904 will also rotate due to its own shape, thereby interfering with the flow direction and speed of the immersion liquid, so that the flow direction of the immersion liquid is wider and more.

[0042] like Figures 1 to 8 As shown, the placement mechanism 6 includes a placement frame 601, a bidirectional motor 602 and a first connecting rod 603. The placement frame 601 is fixed to the bottom end of the upper cover 3. The bidirectional motor 602 is fixed to the outside of the placement frame 601. The first connecting rod 603 is fixed to the outside of the bidirectional motor 602. The first bevel gear 604 is fixed to the outside of the first connecting rod 603. The second bevel gear 605 is arranged on the outside of the first bevel gear 604. The first connecting rod 603 is provided with two groups, and the first connecting rod 603 is symmetrically distributed about the central axis of the bidirectional motor 602. The first bevel gear 604 is provided with a plurality of groups of equally spaced teeth on the outside, and the second bevel gear 605 is provided with a plurality of groups of equally spaced teeth on the outside, and the first bevel gear 604 and the second bevel gear 605 are meshingly connected.

[0043] like Figures 1 to 8As shown, a reciprocating screw 606 is fixed to one end of the second bevel gear 605, and two groups of the second bevel gear 605 and the reciprocating screw 606 are arranged, and the second bevel gear 605 and the reciprocating screw 606 are symmetrically distributed about the central axis of the mounting frame 601, and the reciprocating screw 606 is rotatably connected to the inside of the mounting frame 601, and a limiting block 607 is arranged on the outside of the reciprocating screw 606, and an air guide groove 608 is opened on the outside of the limiting block 607, and the reciprocating screw 606 is connected to the inner thread of the limiting block 607, and two groups of limiting blocks 607 are arranged, and the limiting blocks 607 are symmetrically distributed about the central axis of the reciprocating screw 606, and a plurality of groups of air guide grooves 608 are opened, and the air guide grooves 608 are arranged at equal intervals.

[0044] The above scheme is adopted: by starting the bidirectional motor 602, the bidirectional motor 602 drives the first connecting rod 603 and the first bevel gear 604 to rotate, and drives the second bevel gear 605 and the reciprocating screw 606 to rotate, and then through the shape of the reciprocating screw 606, the reciprocating screw 606 can drive the two sets of limit blocks 607 to move in opposite directions through its own shape when rotating, thereby clamping the graphite sample placed on the top of the mounting frame 601.

[0045] The working principle and use process of the present invention are as follows: after the graphite sample is placed on the mounting rack 601 and fixed, the telescopic cylinder 2 is controlled to adjust the height of the upper cover 3 so that the upper cover 3 is assembled with the shell 1. At this time, the vacuum pump 4 is started and the interior of the shell 1 is evacuated through the vacuum pipe 5. The impregnation liquid can be added through the infusion port 11, and the interior of the shell 1 and the impregnation liquid are heated by starting the heating tube 10 so that they can be more smoothly filled into the internal gap of the graphite sample. After the impregnation process of the graphite sample is completed, the telescopic cylinder 2 is controlled to lift the upper cover 3 as a whole and then drive the processed graphite sample to be lifted. Since the graphite sample still has residual temperature at this time, it is not convenient to take it. When lifting the graphite sample, the cooling fan 8 is started synchronously, and the middle graphite sample is blown to cool down by two groups of cooling fans 8. When the graphite sample is placed on the top of the mounting rack 601 for impregnation process, the double fans are started. To the motor 602, the bidirectional motor 602 drives the first connecting rod 603 and the first bevel gear 604 to rotate, driving the second bevel gear 605 and the reciprocating screw 606 to rotate, and then through the shape of the reciprocating screw 606, the reciprocating screw 606 can drive the two sets of limit blocks 607 to move in opposite directions through its own shape when rotating, thereby clamping the graphite sample placed on the top of the mounting frame 601 to prevent the position of the graphite sample from shifting during the impregnation or drying process of the device, and when the graphite sample is inside the device, the second servo motor 901 is started to drive the second connecting rod 902 to rotate, thereby mobilizing the connecting frame 903 to rotate. After the impregnation liquid is poured in, when the connecting frame 903 rotates, the spoiler rod 904 will also rotate through its own shape, thereby interfering with the flow direction rate of the impregnation liquid, making the flow direction of the impregnation liquid wider and more, thereby improving the overall efficiency of the device in impregnating the graphite sample.

[0046] It should be noted that, in this article, relational terms such as first and second, etc. are only used to distinguish one entity or operation from another entity or operation, and do not necessarily require or imply any such actual relationship or order between these entities or operations. Moreover, the terms "include", "comprise" or any other variants thereof are intended to cover non-exclusive inclusion, so that a process, method, article or device including a series of elements includes not only those elements, but also other elements not explicitly listed, or also includes elements inherent to such process, method, article or device.

[0047] Although embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that various changes, modifications, substitutions and variations may be made to the embodiments without departing from the principles and spirit of the present invention, and that the scope of the present invention is defined by the appended claims and their equivalents.

Claims

1. A method for impregnating isostatic graphite for semiconductors, characterized in that: The following steps are involved: S1. The upper cover (3) is lifted as a whole by the telescopic cylinder (2). After the lifting, the upper cover (3) as a whole and the mounting frame (601) are exposed outside the device. At this time, the graphite sample can be placed on the mounting frame (601), and the graphite sample is clamped and fixed by starting the bidirectional motor (602). After the placement is completed, the upper cover (3) is reassembled with the shell (1) by the telescopic cylinder (2), and the internal space thereof is sealed by the rubber sealing ring (7); S2, starting the vacuum pump (4), which evacuates the interior of the housing (1) through the vacuum pipe (5). After the vacuum is completed, the immersion liquid is input through the infusion port (11) and a pipe connected to the infusion port (11). After the immersion liquid is delivered, the one-way valve at the infusion port (11) is closed, so that the interior of the housing (1) becomes sealed again, and the heating pipe (10) is simultaneously started to heat the interior of the housing (1) and the immersion liquid; S3. Since the interior of the housing (1) is in a negative pressure state, the impregnation liquid can be filled into the gaps in the graphite sample to complete the processing of the graphite sample. At this time, the second servo motor (901) can be started to drive the second connecting rod (902), the connecting frame (903) and the spoiler rod (904) to rotate to disturb the impregnation liquid inside the housing (1), so that the impregnation liquid can contact the graphite sample from more angles to avoid uneven impregnation. After the processing is completed, the impregnation liquid is withdrawn; S4. After the impregnation process is completed, the upper cover (3), the mounting frame (601) and the graphite sample are lifted up by the telescopic cylinder (2). Since the surface of the graphite sample is at high temperature at this time, the cooling fan (8) is started synchronously at this time. The cooling fan (8) can dissipate heat and cool down the graphite sample, and can clean up the excess impregnation liquid on the surface of the graphite sample. After the graphite sample is cooled, it is taken out.

2. An isostatic graphite impregnation device for semiconductors, using the isostatic graphite impregnation method for semiconductors according to claim 1, comprising a housing (1), characterized in that: A telescopic cylinder (2) is fixed inside the shell (1), an upper cover (3) is fixed to the top of the telescopic cylinder (2), an air pump (4) is fixed to the top of the upper cover (3), an air pump (5) is installed at the output end of the air pump (4), the output end of the air pump (4) is connected to the upper cover (3), and a placement mechanism (6) is fixed to the bottom end of the air pump (5); The placement mechanism (6) comprises a placement frame (601), a bidirectional motor (602) and a first connecting rod (603); the placement frame (601) is fixed to the bottom end of the upper cover (3); the bidirectional motor (602) is fixed to the outside of the placement frame (601); the first connecting rod (603) is fixed to the outside of the bidirectional motor (602); the first bevel gear (604) is fixed to the outside of the first connecting rod (603); the second bevel gear (605) is arranged on the outside of the first bevel gear (604); a reciprocating screw (606) is fixed to one end of the second bevel gear (605); a limit block (607) is arranged on the outside of the reciprocating screw (606); and an air guide groove (608) is opened on the outside of the limit block (607).

3. The isostatic graphite impregnation equipment for semiconductors according to claim 2, characterized in that: The first connecting rod (603) is provided with two groups, and the first connecting rod (603) is symmetrically distributed about the central axis of the bidirectional motor (602). The outside of the first bevel gear (604) is provided with a plurality of groups of teeth with equal spacing, and the outside of the second bevel gear (605) is provided with a plurality of groups of teeth with equal spacing. The first bevel gear (604) and the second bevel gear (605) are meshingly connected.

4. The isostatic graphite impregnation equipment for semiconductors according to claim 2, characterized in that: The second bevel gear (605) and the reciprocating screw (606) are provided in two groups. The second bevel gear (605) and the reciprocating screw (606) are symmetrically distributed about the central axis of the mounting frame (601). The reciprocating screw (606) is rotatably connected to the inside of the mounting frame (601).

5. The isostatic graphite impregnation equipment for semiconductors according to claim 2, characterized in that: The internal thread of the limit block (607) is connected to the reciprocating screw rod (606), and the limit block (607) is provided with two groups. The limit blocks (607) are symmetrically distributed about the central axis of the reciprocating screw rod (606), and the air guide grooves (608) are opened in a plurality of groups, and the air guide grooves (608) are arranged at equal intervals.

6. The isostatic graphite impregnation equipment for semiconductors according to claim 2, characterized in that: The outer portion of the upper cover (3) is sleeved with a rubber sealing ring (7), a cooling fan (8) is fixed to the outer portion of the upper cover (3), a spoiler mechanism (9) is installed inside the shell (1), a heating tube (10) is fixed to the bottom end of the shell (1), and an infusion port (11) is opened at one end of the shell (1).

7. The isostatic graphite impregnation equipment for semiconductors according to claim 6, characterized in that: The spoiler mechanism (9) comprises a second servo motor (901), a second connecting rod (902) and a connecting frame (903); the second servo motor (901) is fixed to the outside of the housing (1); a second connecting rod (902) is fixed to one end of the second servo motor (901); a connecting frame (903) is fixed to the outside of the second connecting rod (902); and a spoiler rod (904) is rotatably connected to the inside of the connecting frame (903).

8. The isostatic graphite impregnation equipment for semiconductors according to claim 7, characterized in that: The second connecting rod (902) is movably connected inside the housing (1), and a plurality of connecting frames (903) are provided. The connecting frames (903) are distributed at equal intervals about the central axis of the second connecting rod (902).

9. The isostatic graphite impregnation equipment for semiconductors according to claim 7, characterized in that: The spoiler rods (904) are arranged in a plurality of groups, and the spoiler rods (904) are distributed at equal intervals about the central axis of the connecting frame (903).

10. The isostatic graphite impregnation equipment for semiconductors according to claim 6, characterized in that: The telescopic cylinders (2) are provided in four groups, and the telescopic cylinders (2) are symmetrically distributed about the central axis of the shell (1); the heat dissipation fans (8) are provided in two groups, and the heat dissipation fans (8) are symmetrically distributed about the central axis of the upper cover (3); and the heating tubes (10) are provided in a plurality of groups, and the heating tubes (10) are arranged at equal intervals at the bottom end of the shell (1).

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