Method for cleaning exposure device

Abstract

The cleaning method of the exposure appliance comprises the steps that the exposure appliance is placed in a cleaning solution to be subjected to ultrasonic cleaning, and the cleaning solution comprises a mixed solution of a sodium hydroxide solution and a hydrogen peroxide solution; washing the exposure appliance with deionized water; blowing the exposure appliance by adopting nitrogen or inert gas; and drying the exposure appliance. The method can effectively clean the surface and the hole wall of the exposure appliance, the cleaning effect is good, the yield of the subsequent coating procedure is improved, and the method is suitable for industrial application and popularization.

Description

Technical Field

[0001] The invention relates to the field of electronic semiconductor component manufacturing, and in particular to a method for cleaning an exposure device. Background Art

[0002] Exposure equipment refers to a structure with a certain opening pattern in the coating process, which is used to realize the coating pattern in a specific area. Once the exposure equipment used is contaminated, it will have a very adverse effect on the pattern. Therefore, the evaporation exposure equipment needs to be thoroughly cleaned to ensure the yield rate. The traditional method of cleaning exposure equipment is: first soak the exposure equipment in an organic solvent that can dissolve the evaporated organic material, and then soak it in pure water. However, when the organic solvent meets water, the organic material dissolved in it will precipitate, thereby forming tiny particles on the surface of the exposure equipment, which affects the yield rate of evaporation and is not conducive to promotion and application.

[0003] Therefore, there is an urgent need to provide an improved cleaning method for exposure equipment to overcome the above defects. Summary of the invention

[0004] The object of the present invention is to provide an improved method for cleaning exposure equipment, which can effectively clean the surface and hole walls of the exposure equipment, has a good cleaning effect, thereby improving the yield rate of subsequent coating processes, and is suitable for industrial promotion and use.

[0005] To achieve the above object, the cleaning method of the exposure apparatus of the present invention comprises the following steps:

[0006] The exposure device is placed in a cleaning solution for ultrasonic cleaning, wherein the cleaning solution includes a mixed solution of a sodium hydroxide solution and a hydrogen peroxide solution;

[0007] Rinse the exposure device with deionized water;

[0008] blowing the exposure tool with nitrogen or an inert gas; and

[0009] The exposure tool is dried.

[0010] Compared with the prior art, the present invention firstly adopts a mixed solution of sodium hydroxide solution and hydrogen peroxide solution as a cleaning solution, and ultrasonically cleans the exposure device under an ultrasonic device, which can effectively remove the residual stains and evaporation residues of the exposure device. Moreover, the sodium hydroxide solution and hydrogen peroxide solution are low in cost. Then, the exposure device is rinsed with deionized water to remove the residual cleaning solution. Then, nitrogen or inert gas is used for blowing to quickly blow away the water on the surface or hole wall of the exposure device without leaving any marks. Finally, the exposure device is dried. The cleaning method is simple and easy to operate, has a good cleaning effect, and is suitable for industrial promotion and use.

[0011] As a preferred embodiment, the concentration of sodium hydroxide in the sodium hydroxide solution is 150g / L-180g / L, preferably 160g / L.

[0012] As a preferred embodiment, the volume ratio of the sodium hydroxide solution to the hydrogen peroxide solution is 110:1 to 90:1, preferably 100:1.

[0013] As a preferred embodiment, the cleaning temperature of the ultrasonic cleaning is 30-35° C., and the cleaning time is 20-30 minutes.

[0014] As a preferred embodiment, the cleaning temperature of the deionized water rinse is 20-30° C., and the cleaning time is 20-30 minutes.

[0015] As a preferred embodiment, the drying temperature is 60-80° C. and the drying time is 30-50 minutes. DETAILED DESCRIPTION

[0016] The exposure apparatus cleaning method of the present invention is further described below in conjunction with the embodiments, but the present invention is not limited thereby. The method of the present invention is intended to provide an exposure apparatus cleaning method, which can effectively clean the surface and hole wall of the exposure apparatus, has a good cleaning effect, thereby improving the yield rate of the subsequent coating process, and is suitable for industrial promotion and use.

[0017] The cleaning method of the exposure apparatus of the present invention comprises the following steps:

[0018] The exposure device is placed in a cleaning solution for ultrasonic cleaning, wherein the cleaning solution includes a mixed solution of a sodium hydroxide solution and a hydrogen peroxide solution;

[0019] Rinse the exposure device with deionized water;

[0020] blowing the exposure tool with nitrogen or an inert gas; and

[0021] The exposure tool is dried.

[0022] The present invention firstly uses a mixed solution of sodium hydroxide solution and hydrogen peroxide solution as a cleaning solution, and ultrasonically cleans the exposure device under an ultrasonic device, which can effectively remove the residual stains and evaporation residues of the exposure device. In addition, the sodium hydroxide solution and hydrogen peroxide solution are low in cost. Then, the exposure device is rinsed with deionized water to remove the residual cleaning solution. Then, nitrogen or inert gas is used for blowing to quickly blow away the water on the surface or hole wall of the exposure device without leaving marks. Finally, the exposure device is dried. The cleaning method is simple and easy to implement, and the cleaning effect is good, which is suitable for industrial promotion and use.

[0023] Specifically, as an embodiment, a cleaning solution is first prepared. The cleaning solution includes a mixed solution of a sodium hydroxide solution and a hydrogen peroxide solution. Preferably, the concentration of sodium hydroxide in the sodium hydroxide solution is 150g / L-180g / L, such as 160g / L is preferred; the volume ratio of the sodium hydroxide solution to the hydrogen peroxide solution is 110:1 to 90:1, such as 100:1 is preferred. Sodium hydroxide and hydrogen peroxide are effective cleaning agents that can effectively remove oxides and other contaminants after vapor deposition of the exposure equipment, and the specific ratio of the cleaning solution can further optimize the cleaning effect. Furthermore, combined with ultrasonic cleaning, the cleaning temperature is 30-35°C, and the cleaning time is 20-30 minutes, so that the cleaning effect is more significant.

[0024] Next, the exposure equipment is rinsed with deionized water at a temperature of 20-30°C for 20-30 minutes. For example, the exposure equipment may be rinsed with a circulating flow or a spraying method to remove the cleaning solution from the previous cleaning.

[0025] Next, the rinsed exposure equipment is continuously purged with nitrogen or inert gas until no water vapor is blown out, and the water on the surface or hole wall of the exposure equipment is quickly blown away without leaving any marks.

[0026] Finally, the exposure device is dried at low temperature, the drying temperature of the baking oven is 60-80°C, and the drying time is 30-50 minutes.

[0027] Therefore, the cleaning method of the present invention can effectively clean the surface and hole wall of the exposure device, with good cleaning effect, thereby improving the yield rate of the subsequent coating process. Moreover, the cleaning method is simple and easy to implement, the raw materials are easy to obtain and the cost is low, and it is suitable for industrial promotion and use.

[0028] The above disclosure is only a preferred embodiment of the present invention, which certainly cannot be used to limit the scope of rights of the present invention. Therefore, equivalent changes made according to the scope of the patent application of the present invention are still within the scope covered by the present invention.

Claims

1. A method for cleaning an exposure device, characterized in that: The following steps are involved: The exposure device is placed in a cleaning solution for ultrasonic cleaning, wherein the cleaning solution includes a mixed solution of a sodium hydroxide solution and a hydrogen peroxide solution; Rinse the exposure device with deionized water; Blowing the exposure apparatus with nitrogen or an inert gas; as well as The exposure tool is dried.

2. The method for cleaning an exposure tool according to claim 1, wherein: The concentration of sodium hydroxide in the sodium hydroxide solution is 150g / L-180g / L.

3. The method for cleaning an exposure tool according to claim 1, wherein: The volume ratio of the sodium hydroxide solution to the hydrogen peroxide solution is 110:1 to 90:

1.

4. The method for cleaning an exposure tool according to claim 1, wherein: The volume ratio of the sodium hydroxide solution to the hydrogen peroxide solution is 100:

1.

5. The method for cleaning an exposure tool according to claim 1, wherein: The cleaning temperature of the ultrasonic cleaning is 30-35° C., and the cleaning time is 20-30 minutes.

6. The method for cleaning an exposure tool according to claim 1, wherein: The deionized water rinse has a cleaning temperature of 20-30° C. and a cleaning time of 20-30 minutes.

7. The method for cleaning an exposure tool according to claim 1, wherein: The drying temperature of the drying is 60-80° C., and the drying time is 30-50 minutes.