Sputtering coating processing method

Abstract

The invention discloses a sputter coating processing method, which comprises an air inlet assembly arranged on a base and a cathode column arranged beside the air outlet end of the air inlet assembly, and is characterized in that the air outlet end of the air inlet assembly is coated with a shielding air guide mechanism, and two opposite shielding correction mechanisms are arranged in a channel between the cathode column and a coating chamber. During film coating, the base and the film coating chamber are attached and locked, so that the sealing performance of the film coating chamber and the containing cavity in the base is guaranteed, then vacuumizing is conducted, process gas is injected into the containing cavity of the base through the gas inlet assembly, and the process gas enters the containing cavity and then is matched with the rotating cathode column to form plasma. When plasmas are formed, some plasmas can be sputtered to the inner wall of the base containing cavity along with rotation of the cathode column, at the moment, an air inlet pipe of the air inlet assembly is installed in the base containing cavity, an air outlet hole of the air inlet pipe is prone to making contact with the plasmas and causing blockage, and in order to avoid the situation, the air inlet pipe is wrapped and covered with an air guide mechanism; plasma is prevented from contacting with the air outlet hole in the air inlet pipe.

Description

Technical Field

[0001] The invention relates to the technology of sputtering coating field, in particular to a sputtering coating processing method. Background Art

[0002] Sputtering coating is a technology that uses ions to bombard the surface of a target material, sputtering the target atoms and depositing them on the substrate to form a thin film.

[0003] During the sputtering coating process, the vacuum level of the coating equipment, whether the plasma generated by the cathode column blocks the exhaust hole for discharging the process gas when the process gas is injected, and how to adjust the plasma channel when there is an uneven film layer on the workpiece after the coating is completed. The size of the channel can be adjusted according to the situation of the film layer coated on the previous workpiece. If there are defects in the above three issues, it will easily lead to poor efficiency of sputtering coating and affect the quality of the workpiece after coating. Summary of the invention

[0004] In view of this, the present invention aims to solve the deficiencies in the prior art, and its main purpose is to provide a sputtering coating processing method, which solves the problems of the vacuum level of the coating equipment, whether the plasma generated by the operation of the cathode column blocks the exhaust hole for discharging the process gas when the process gas is injected, and how to adjust the plasma channel when there is an uneven film layer on the workpiece after the coating is completed, so as to adjust the channel size according to the situation of the film layer coated on the previous workpiece. If there are defects in the above three problems, it will easily lead to poor efficiency of sputtering coating and affect the quality of the workpiece after coating.

[0005] To achieve the above-mentioned purpose, the present invention adopts the following technical scheme: a sputtering coating processing method, comprising an air intake assembly arranged on a base and a cathode column arranged on the side of the air outlet end of the air intake assembly, characterized in that: the air outlet end of the air intake assembly is covered with a covering air guide mechanism, and two opposing shielding correction mechanisms are arranged in the channel between the cathode column and the coating chamber, and the shielding correction mechanism is driven by a vacuum driving mechanism.

[0006] S10. Check the sample: After the coating is completed, the sample is removed from the coating chamber to check whether it is qualified; S11. Adjust the channel size: The blocking correction mechanism provides a mounting frame, multiple correction rulers and multiple blocking rulers, and an electric drive mechanism for pushing the correction ruler and the blocking ruler; any electric drive mechanism drives any correction ruler or blocking ruler to move toward the channel; and two adjacent blocking correction mechanisms are arranged opposite to each other to jointly control the channel size; S12. Drive any correction ruler / shielding ruler to move: the electric drive mechanism provides a first electric actuator corresponding to each correction ruler and a second electric actuator corresponding to each shielding ruler. The first electric actuator drives the correction ruler to adjust on the mounting frame, and the second electric actuator drives the shielding ruler to adjust on the mounting frame.

[0007] S13. Maintaining smooth movement of the correction ruler: each correction ruler is adjustable and spaced apart on the mounting frame, and a first gap is formed between two adjacent correction rulers; adjusting the correction ruler so that the shielding portion of the correction ruler extends into or out of the channel; S14. Preventing plasma from passing through the first gap at one time: each shielding ruler is adjustably arranged on the mounting frame and covers the corresponding first gap, and the shielding ruler is adjusted so that the shielding ruler covers the area corresponding to the first gap.

[0008] S15. Secondary avoidance of plasma passing through the first gap: the correction ruler provides a first flat portion and first protrusions extending toward the coating chamber from both sides of the first flat portion, and the first gap is located between the corresponding two first protrusions on two adjacent correction rulers; S16. Forming a plasma flow-blocking channel: the shielding ruler provides a second flat plate portion and second raised portions extending from both side edges of the second flat plate portion toward the first flat plate portion, the second flat plate portion shields the gap, and a curved gap is formed between the corresponding second raised portions and the first raised portions.

[0009] S20. Injecting process gas: providing an inlet assembly and an outlet hole provided on the inlet assembly for the process gas to be discharged and injected into the inner cavity of the base; S21. Plasma generation: As the cathode column rotates, it mixes with the process gas in the base to form plasma; S22. Avoid plasma blocking the gas outlet: the gas guide mechanism is provided with a door lining provided in the inner cavity of the base, and a protective cover covering the gas outlet on the air intake assembly, the protective cover is provided with a gas outlet connected to the inner cavity of the door lining, and the gas outlet is arranged in a staggered manner with the cathode column; S23. Guiding the direction of the process gas: the gas outlet is located on the first end surface of the protective cover facing the door lining, and the first end surface is spaced apart from the inner wall of the door lining to form a gas outlet channel.

[0010] S24. Adjust the air outlet direction: the air outlet direction of the air outlet hole and the air outlet direction of the air outlet are located in different directions; S25. Stagger the positions of the cathode column and the air outlet channel: the cathode column is arranged in the inner cavity of the door lining, and the distance between the cathode column and the first inner wall on the door lining is greater than the diameter of the air outlet channel.

[0011] S26. Forming a plasma processing chamber: The door lining includes a first plate and a second plate extending inwardly on both sides of the first plate, the first plate and the two second plates enclose a mounting cavity, the protective cover is provided on one of the second plates, and the first inner wall is located on the first plate; S27. Reduce the channel diameter: The two shielding correction mechanisms are respectively connected to the opposite sides of the two second plates. As the two shielding correction mechanisms move closer, the diameter of the installation cavity outlet port is reduced.

[0012] S30 drive occlusion correction mechanism to move: the vacuum drive mechanism provides a drive cylinder mounted laterally on one side of the base and connected to the drive cylinder piston shaft of the occlusion correction mechanism; S31 guide piston shaft: The piston shaft passes through the shaft sleeve provided on the base, and the shaft sleeve and the piston shaft are tightly fitted with two vacuum sleeve assemblies, the two vacuum sleeve assemblies are located at both ends of the shaft sleeve; Each vacuum sleeve assembly includes a rigid sleeve ring located at the inner opening of the sleeve, a clamping ring attached to the inner wall of the rigid sleeve ring, and a flexible expansion ring attached to the inner wall of the clamping ring. The rigid sleeve ring and the clamping ring squeeze the flexible expansion ring to deform. S32 supporting the piston shaft: The flexible expansion ring is provided with an extrusion groove on the wall near the clamping ring, and the corresponding wall of the clamping ring is provided with an extrusion portion, which is inserted into the extrusion groove to make the flexible expansion ring change; The opening of the extrusion groove is in a trumpet shape, the cross section of the extrusion part is in a triangular shape, and the triangular extrusion part extrude the flexible expansion ring to deform.

[0013] S33 sealed shaft sleeve: vacuum sleeve assemblies are respectively a first vacuum sleeve assembly close to the drive cylinder and a second vacuum sleeve assembly close to the correction assembly, and a sealing assembly is also sandwiched between the first vacuum sleeve assembly and the second vacuum sleeve assembly; The sealing assembly includes a plurality of O-rings and a gasket disposed between two adjacent O-rings; S34. The first sealing enhancement: the second vacuum sleeve assembly is located in the inner cavity of the shaft sleeve and is located at the installation position of the shaft sleeve and the base; the first rigid sleeve ring in the first vacuum sleeve assembly is partially exposed outside the inner cavity of the shaft sleeve, and a sleeve cap is provided on the corresponding end of the shaft sleeve, and the inner wall of the sleeve cap squeezes the first rigid sleeve ring to move in the inner cavity of the shaft sleeve toward the second vacuum sleeve assembly.

[0014] S35. Second sealing enhancement: The opening position of the shaft sleeve cap toward the drive cylinder and the opening position of the shaft sleeve toward the shielding correction mechanism are provided with sealing rings; The sealing ring is divided into a first ring body and a second ring body. The first ring body and the second ring body are provided with a plug-in portion at opposite ends. The plug-in portion is integrally formed on the side edges of the first ring body and the second ring body adjacent to the piston shaft. The two plug-in portions are respectively inserted into the gaps between the piston shaft and the shaft sleeve, and between the piston shaft and the shaft sleeve cap. One end of the sealing ring away from the plug-in portion is arranged in the concave annular groove.

[0015] S36. Support shaft sleeve: The position of the base corresponding to the installation shaft sleeve is the support part, and the wall thickness of the support part is greater than the wall thickness of other positions of the base.

[0016] Compared with the prior art, the present invention has obvious advantages and beneficial effects. Specifically, it can be seen from the above technical scheme that when preparing for coating, the base and the coating chamber are fitted and locked to ensure the sealing of the coating chamber and the cavity on the base, and then vacuuming is performed, and process gas is injected into the base cavity through the air intake assembly. After the process gas enters the cavity, it cooperates with the rotating cathode column to form plasma. When the plasma is formed, some of it will be sputtered to the inner wall of the base cavity as the cathode column rotates. At this time, the air intake pipe of the air intake assembly is installed in the base cavity, and the air outlet hole of the air intake pipe is also easy to contact with the plasma and cause blockage. In order to avoid this situation, the air intake pipe is covered with a gas guide mechanism to prevent the plasma from contacting the air outlet hole on the air intake pipe; When the plasma-containing side of the cathode column rotates to the coating chamber, the plasma targets and coats the workpiece through the channel. The workpiece needs to be coated multiple times. During coating, because the plasma is an independent individual, the thickness of the film layer on the workpiece after coating is sometimes not uniform. At this time, it is necessary to adjust the shielding and trimming mechanism to control the channel aperture to adjust the thickness of the workpiece during coating.

[0017] In order to more clearly illustrate the structural features and effects of the present invention, the present invention is described in detail below in conjunction with the accompanying drawings and specific embodiments. BRIEF DESCRIPTION OF THE DRAWINGS

[0018] Figure 1 It is a three-dimensional display diagram of Example 1 of the present invention.

[0019] Figure 2 This is a three-dimensional display diagram of the base of Example 1 of the present invention.

[0020] Figure 3 It is a side view of the base of Example 1 of the present invention.

[0021] Figure 4 This is a diagram showing the inner cavity of the base of Example 1 of the present invention.

[0022] Figure 5 It is a cross-sectional view of the base of Example 1 of the present invention.

[0023] Figure 6 It is a top view of the door lining of Example 1 of the present invention.

[0024] Figure 7 This is a display diagram of the air intake component of Example 1 of the present invention.

[0025] Figure 8 This is a display diagram of the occlusion correction mechanism of Example 1 of the present invention.

[0026] Fig. 9 The embodiment 1 of the present invention Figure 8 Enlarged view of point A.

[0027] Fig.10 This is a connection diagram of the correction ruler and the shielding ruler of Example 1 of the present invention.

[0028] Fig.11 This is a diagram showing the vacuum drive mechanism of Example 1 of the present invention.

[0029] Fig.12 This is a side view of the vacuum drive mechanism of Example 1 of the present invention.

[0030] Fig.13 It is a cross-sectional view of the vacuum drive mechanism of Example 1 of the present invention.

[0031] Fig.14 The embodiment 1 of the present invention Fig.13 Enlarged view of point B.

[0032] Fig.15 It is an exploded view of the vacuum drive mechanism of Example 1 of the present invention.

[0033] Description of the accompanying drawings: 1 coating chamber; 10 base, 101 channel, 11 support part, 12 driving motor; 20 air intake assembly, 21 air outlet, 22 air intake pipe; 30 cathode column; 40 covering air guide mechanism, 41 door lining, 410 first inner wall, 412 first plate body, 413 second plate body, 414 installation cavity, 42 protection cover, 421 air outlet, 422 first end surface, 423 air outlet channel; 50 blocking correction mechanism, 51 mounting frame, 52 correction ruler, 522 first flat plate portion, 523 first protrusion, 521 blocking portion, 53 blocking ruler, 531 second flat plate portion, 532 second protrusion, 54 electric drive mechanism, 541 first electric actuator, 542 second electric actuator, 55 first gap, 56 bending gap, 57 box body, 571 baffle; 60 vacuum drive mechanism, 61 drive cylinder, 62 piston shaft, 63 shaft sleeve, 631 shaft sleeve inner cavity, 64 vacuum shaft sleeve assembly, 64a first vacuum shaft sleeve assembly, 64a1 first rigid sleeve ring, 64b second vacuum shaft sleeve assembly, 641 rigid sleeve ring, 642 clamping ring, 6421 extrusion part, 643 flexible expansion ring, 6431 extrusion groove, 65 sealing assembly, 651 O-ring, 652 gasket, 66 shaft sleeve cap, 67 sealing ring, 671 first circle body, 672 second circle body, 673 plug-in part, 674 ring groove. DETAILED DESCRIPTION

[0034] Please refer to Figure 1-15As shown, it shows the specific structure of the preferred first embodiment of the present invention, which is a sputtering coating processing method for generating plasma and sputtering coating a workpiece. The device is mainly used to ensure that the generated plasma does not block the outlet hole, and can also adjust the size of the channel for the plasma to pass through while ensuring the sealing of the entire device.

[0035] The sputtering coating processing method includes an air intake assembly 20 and a cathode column 30 which are arranged in cooperation with each other in a base 10. The base 10 is also provided with a covering air guide mechanism 40 covering the air intake assembly 20, two opposing shielding correction mechanisms 50 arranged in a channel 101 between the cathode column 30 and a coating chamber 1, and a vacuum driving mechanism 60 for pushing the shielding correction mechanism 50 to move.

[0036] Specifically, the sputtering coating processing method includes a base 10, which can be a target base door and is movably connected to the coating chamber. A cavity is provided on one side of the base 10 corresponding to the coating chamber, and the output ends of the air intake assembly 20, the cathode column 30, the covering air guide mechanism 40, the shielding correction mechanism 50 and the vacuum drive mechanism 60 are all provided in the cavity.

[0037] When preparing for coating, the base 10 is fitted and locked with the coating chamber to ensure the sealing of the coating chamber and the cavity on the base 10, and then vacuum is evacuated, and process gas is injected into the base cavity through the air intake assembly 20. After the process gas enters the cavity, it cooperates with the rotating cathode column 30 to form plasma. When the plasma is formed, some of it will be sputtered to the inner wall of the base cavity as the cathode column rotates. At this time, the air intake pipe 22 of the air intake assembly 20 is installed in the base cavity, and the air outlet hole of the air intake pipe 22 is also easy to contact with the plasma and cause blockage. In order to avoid this situation, the air intake pipe 22 is covered with a gas guide mechanism 40 to prevent the plasma from contacting the air outlet hole on the air intake pipe 22; When the plasma-containing side of the cathode column 30 rotates to the coating chamber 1, the plasma performs target coating on the workpiece through the channel 101. The workpiece needs to be coated multiple times. Since the plasma is an independent individual during coating, the thickness of the film layer on the workpiece after coating may not be uniform. At this time, it is necessary to adjust the shielding and trimming mechanism 50 to control the aperture of the channel 101 to adjust the thickness of the workpiece during coating.

[0038] like Figure 6 As shown, exemplarily, the covering air guide mechanism 40 includes a door lining plate 41 disposed in the inner cavity of the base 10, and a protective cover 42 covering the air outlet 21 on the air intake assembly 20, and the protective cover 42 is provided with an air outlet 421 connected to the inner cavity of the door lining plate 41, and the air outlet 421 is staggered with the cathode column 30; Specifically, compared with the existing air intake assembly used in the sputtering coating equipment, the exhaust hole for discharging the process gas is unobstructed and faces the cathode column. As the cathode column rotates, the plasma generated by the sputtering will be sputtered. When the sputtering reaches the exhaust hole, it will form an accumulation until the exhaust hole is blocked and the normal operation of the sputtering coating equipment is affected. The air intake assembly 20 used in the sputtering coating equipment prevents the sputtered plasma from directly contacting the outlet hole 21 when the cathode column 30 rotates by means of a protective cover 42 wrapped outside the outlet hole 21. In addition, in order to allow the process gas discharged from the outlet hole 21 to smoothly enter the base cavity, an outlet 421 is opened on the protective cover 42, and the outlet 421 is staggered with the cathode column 30, so as to further prevent the sputtered plasma from contacting the outlet hole 21 and blocking the outlet hole 21 due to reflection when the cathode column 30 rotates, thereby solving the problem of outlet hole 21 blockage and ensuring the normal operation of the sputtering coating equipment. The air outlet 421 is located on a first end surface 422 of the protection cover 42 facing the door lining 41 , and the first end surface 422 is spaced apart from the inner wall of the door lining 41 to form an air outlet channel 423 .

[0039] Specifically, in order to further prevent the sputtered plasma from entering the protective cover 42 through the gas outlet 421 and contacting the gas outlet 21 when the cathode column 30 rotates, the gas outlet 421 is arranged on the first end surface 422 of the base 10 corresponding to the protective cover 42, so as to increase the distance between the gas outlet 421 and the cathode column 30, thereby reducing the possibility of the sputtered plasma entering the gas outlet 421.

[0040] Specifically, one side of the protective cover 42 corresponds to the coating chamber 1, and the side opposite to the side is the first end face 422. One side of the base 10 corresponds to the coating chamber 1, and the side opposite to the side corresponds to the first end face 422. A gap is left between the two, and the gap is the air outlet channel 423.

[0041] like Figure 7 As shown, illustratively, the air outlet direction of the air outlet hole 21 and the air outlet direction of the air outlet 421 are located in different directions.

[0042] Specifically, when the cathode column 30 rotates, some of the plasma sputtered will pass through the gas outlet channel 423 and enter the gas outlet 421. At this time, if the gas outlet hole 21 corresponds to the gas outlet 421, some plasma may enter the gas outlet hole 21 and cause the gas outlet 21 to be blocked. For this reason, the gas outlet direction level position of the gas outlet 21 is set not to correspond to the gas outlet 421, so as to reduce the possibility of plasma contacting the gas outlet hole 31.

[0043] In one embodiment, the outlet direction of the gas outlet 21 corresponds to the cathode column 30. The outlet direction of the gas outlet 21 corresponds to the cathode column 30, so that the air flow path from the gas outlet 21 to the gas outlet 421 to the gas outlet channel 423 is concave, so as to reduce the possibility of contact between the plasma and the gas outlet 21.

[0044] In another embodiment, the outlet direction of the gas outlet 21 corresponds to the coating chamber 1. The outlet direction of the gas outlet 31 corresponds to the connection end between the coating chamber 1 and the channel 101. Compared with the gas outlet 21 corresponding to the cathode column 30, the flow path length of the gas flowing out of the gas outlet 21 is shortened, so that the gas can contact the cathode column 30 faster.

[0045] In the next embodiment, the gas outlet direction of the gas outlet hole 21 is consistent with the gas outlet direction of the gas outlet 421, and the gas outlet hole 21 and the gas outlet 421 are arranged in a staggered manner. When the gas outlet direction of the gas outlet hole 21 corresponds to the first inner wall 410, the length of the gas flow path is further reduced; like Figure 1 As shown, illustratively, the cathode column 30 is disposed in the inner cavity of the door lining 41 , and the distance between the cathode column 30 and the first inner wall 410 on the door lining 41 is greater than the diameter of the air outlet channel 423 .

[0046] Specifically, the side of the cathode column 30 corresponding to the first inner wall 410 is larger than the diameter of the gas outlet channel 423, so that the sputtered plasma is not easy to enter the gas outlet channel 423 when the cathode column 30 rotates, thereby reducing the possibility of plasma entering the gas outlet hole 21 and even the inner cavity of the protective cover 42 from the gas outlet channel 423.

[0047] like Figure 7 As shown, exemplarily, the door lining 41 includes a first plate body 412 and a second plate body 413 extending inward on both sides of the first plate body 412, the first plate body 412 and the two second plate bodies 413 together enclose the installation cavity 414, the protective cover 42 is arranged on one of the second plate bodies 413, and the first inner wall 410 is located on the first plate body 412.

[0048] Specifically, the first plate body 412 and the second plate body 413 are integrally formed, and the opposing surfaces of the two second plates 413 extend inwards, that is, they are close to each other, so that the second plate body 413 is inclined, and the diameter of the installation cavity 414 is reduced, so that the process gas can fill the installation cavity 414 more quickly and cooperate with the cathode column 30 to generate plasma to coat the workpiece; The two shielding correction mechanisms 50 are respectively connected to the opposite sides of the two second plates 413, and as the two shielding correction mechanisms 50 move closer together, the diameter of the outlet port of the installation cavity 414 is reduced. The shielding correction mechanism 50 is used to adjust the film thickness of the workpiece during film coating, mainly by moving its internal correction ruler and the shielding correction mechanism 50 itself to reduce the diameter of the channel 101 for plasma to pass through.

[0049] The shielding correction mechanism 50 includes a mounting frame 51, a plurality of correction rulers 52 and a plurality of shielding rulers 53, and an electric drive mechanism 54 for driving the correction rulers 52 and the shielding rulers 53; Each correction ruler 52 is adjustable and spaced apart on the mounting frame 51, and a first gap 55 is formed between two adjacent correction rulers 52; the correction ruler 52 is adjusted so that the shielding portion 521 of the correction ruler 52 extends into or out of the channel 101; Each shielding ruler 53 is adjustably disposed on the mounting frame 51 and covers the corresponding first gap 55 . The shielding ruler 53 is adjusted so that the shielding ruler 53 covers the area corresponding to the first gap 55 .

[0050] Specifically, compared with the existing sputtering coating shielding correction mechanism, the correction ruler is in the shape of a flat plate, and there is a gap between two adjacent correction rulers, which causes the plasma to leak through the gap when the correction ruler is shielded, affecting the shielding effect. The present sputtering coating and shielding correction mechanism 50 shields the first gap 55 between two adjacent correction rulers 52 by the shielding ruler 53 to avoid the plasma passing through the first gap 55 when shielding the plasma. In addition, the present device can be automatically adjusted without breaking the vacuum, and the adjustment can be completed within the time of preparing the coating workpiece. It does not take up other time, while the previous manual adjustment requires breaking the vacuum, and then spending a lot of time on manual adjustment, and then vacuuming, which usually takes about 2 hours. And the adjustment is not successful in one time, and multiple adjustments are required, and so on. In the past, the efficiency of manual adjustment was very low, and it often took one or two working hours for the equipment to operate normally.

[0051] It should be noted that under high vacuum conditions, inert gas is filled, and through the action of electric field and magnetic field, discharge forms plasma. The electrons and ions in the plasma are accelerated through the channel 101 into the coating chamber 1 under the joint action of the electric field and magnetic field and contact the workpiece in the coating chamber 1. In this process, the target material needs to be coated for multiple rounds, and the coating condition of the target material is closely related to the distribution of plasma. At this time, the width of the channel 101 is reduced by adjusting the correction ruler 52 and the shielding ruler 53, thereby limiting the amount of plasma passing through a specific position of the channel 101, so as to facilitate the user to adjust the coating condition of the target material.

[0052] like Fig. 9As shown, the electric drive mechanism 54 exemplarily includes a first electric actuator 541 corresponding to each correction ruler 52, and a second electric actuator 542 corresponding to each shielding ruler 53, wherein the first electric actuator 541 drives the correction ruler 52 to adjust on the mounting frame 51, and the second electric actuator 542 drives the shielding ruler 53 to adjust on the mounting frame 51. As the output shaft of the first electric actuator 541 extends outward, the correction ruler 52 extends into the channel 101 and shields the plasma passing through the channel 101, and as the output shaft of the first electric actuator 541 contracts inward, the correction ruler 52 no longer shields the plasma in the channel 101. The principle of the second electric actuator 542 is consistent with that of the first electric actuator 541. When the output shaft of the second electric actuator 542 extends outward, the shielding ruler 53 enters the channel 101, and when the output shaft of the second electric actuator 542 contracts inward, the shielding ruler 53 no longer shields the plasma in the channel 101.

[0053] Specifically, after a correction ruler 52 is pushed into the channel 101 by the first electric actuator 541, a shielding ruler 53 adjacent to the correction ruler 52 should be pushed into the channel 101 again, and so on, to ensure that the first gap 55 between two adjacent correction rulers 52 can be covered by the shielding ruler 53 to avoid leakage of plasma during shielding.

[0054] In addition, the correction ruler 52 and the shielding ruler 53 can be adjusted arbitrarily according to actual conditions to meet the needs in different situations.

[0055] In one embodiment, the mounting frame 51 is further provided with a box body 57 for accommodating the first electric actuator 541 and the second electric actuator 542, and a baffle 571 is provided in the box body 57 for separating the output shafts of the first electric actuator 541 and the second electric actuator 542. The baffle 571 not only separates the output shafts of the first electric actuator 541 and the second electric actuator 542, but also limits the moving direction of the output shafts of the first electric actuator 541 and the second electric actuator 542, so as to ensure that the movement of the output shafts of the first electric actuator 541 and the second electric actuator 542 will not be offset when the first electric actuator 541 and the second electric actuator 542 are not fixed. In addition, two baffles 571 are grouped together, and the two baffles 571 of the group are respectively located on both sides of the output shaft of the first electric actuator 541 or the second electric actuator 542.

[0056] like Fig.10 As shown, illustratively, the correction ruler 52 includes a first flat portion 522 and first protrusions 523 extending toward the coating chamber 1 at both side edges of the first flat portion 522 , and the first gap 55 is located between the corresponding two first protrusions 523 on two adjacent correction rulers 52 .

[0057] Specifically, although the two adjacent correction rulers 52 are shielded by the shielding ruler 53, there is still a gap between the correction ruler 52 and the shielding ruler 53. When shielded, plasma can still pass through the gap and leak. For this reason, the first protrusions 523 integrally formed with the shielding ruler 53 are provided on both side edges of the correction ruler 52 opposite to the shielding ruler 53. The first protrusions 523 are in the shape of a slat. When the correction ruler 52 is concave, the concave design of the correction ruler 52, combined with the shielding ruler 53, can further prevent plasma leakage when shielded. The shielding ruler 53 includes a second flat portion 531 and second protruding portions 532 extending from both side edges of the second flat portion 531 toward the first flat portion 522 . The second flat portion 531 blocks the gap, and a curved gap 56 is formed between the corresponding second protruding portions 532 and the first protruding portions 523 .

[0058] Specifically, in order to adapt to the first protrusion 523 on the correction ruler 52, second protrusions 532 integrally formed with the shielding ruler 53 are provided on both side edges of the shielding ruler 53 opposite to the correction ruler 52, so that the shielding ruler 53 is also designed to be concave. When the correction ruler 52 and the shielding ruler 53 cooperate to shield the plasma, the curved gap 56 generated by the cooperation between the first protrusion 523 and the second protrusion 532 makes it more difficult for the plasma shielded by the correction ruler 52 and the shielding ruler 53 to leak; In addition, two adjacent shielding correction mechanisms 50 are arranged opposite to each other to jointly control the size of the channel 101, so as to better shield the plasma and enhance the quality of target coating.

[0059] In one embodiment, the shielding correction mechanism 50 is disposed on the output shaft of the vacuum driving mechanism 60, and the vacuum driving mechanism 60 drives the shielding correction mechanism 50 to approach or move away from the coating chamber 1. With the operation of the vacuum driving mechanism 60, the shielding correction mechanism 50 has two states, one is that the channel 101 is reduced as the output shaft of the vacuum driving mechanism 60 extends, and the other is that the output shaft of the vacuum driving mechanism 60 retracts and the channel 101 expands, which increases the user's selectivity during sputtering coating to improve the effect of target coating.

[0060] In another embodiment, the shielding correction mechanism 50 disposed in the base 10 is obliquely disposed on the output shaft of the vacuum driving mechanism 60. When there are two cathode columns 30 in the base 10, there are four shielding correction mechanisms 50 corresponding to the cathode columns 30, and they are opposite to each other and are located on the sides of the two cathode columns 30. At this time, in order to facilitate the shielding correction mechanism 50 to better adjust the size of the channel 101, the two shielding correction mechanisms 50 near the two side edges of the base 10 are set to be inclined, so that when the vacuum driving mechanism 60 drives the oblique shielding correction mechanism 50 to move, the size of the channel 101 can be reduced, so as to better control the shooting range.

[0061] like Fig.14 As shown, illustratively, the vacuum drive mechanism 60 includes a drive cylinder 61 installed laterally on one side of the base and a drive cylinder piston shaft 62 connected to the shading correction mechanism 50; The piston shaft 62 passes through a shaft sleeve 63 provided on the base 10, and two vacuum shaft sleeve assemblies 64 are tightly mounted between the shaft sleeve 63 and the piston shaft 62, and the two vacuum shaft sleeve assemblies 64 are respectively located at both ends of the shaft sleeve 63; Each of the vacuum sleeve assemblies 64 comprises a rigid sleeve 641 located at the opening of the inner cavity 631 of the sleeve 63, a clamping ring 642 attached to the inner wall of the rigid sleeve 641, and a flexible expansion ring 643 attached to the inner wall of the clamping ring 642. The rigid sleeve 641 and the clamping ring 642 squeeze the flexible expansion ring 643 to deform. It should be noted that by arranging vacuum sleeve assemblies 64 at both ends of the shaft sleeve 63, its sealing performance is greatly improved, and the rigid sleeve ring 641, the clamping ring 642 and the flexible expansion ring 643 are squeezed in sequence, so that the shaft sleeve 63 has a stronger sealing effect. The rigid sleeve ring 641 and the clamping ring 642 in the two vacuum sleeve assemblies 64 simultaneously play a role in stabilizing the support of the piston shaft 62, thereby supporting and guiding the piston shaft 62 of the drive cylinder 61 to prevent it from shaking, bending or breaking.

[0062] Specifically, the shielding correction mechanism 50 is driven by the radial movement of the piston shaft 62 on the base 10 to adjust the size of the channel 101 for the plasma to pass through, so that the film thickness of the film coated on the product can be adjusted according to demand; The piston shaft 62 of the driving cylinder 61 passes through the shaft sleeve 63 installed on the base 10. The traditional shaft sleeve 63 is mainly used for sealing the piston shaft 62, but in the present application, the piston shaft 62 is used horizontally, and one end of the piston shaft 62 is connected to the driving cylinder 61, and the other end is connected to the shielding correction mechanism 50. The shielding correction mechanism 50 is heavy, which causes the piston shaft 62 to shake easily when moving radially, affecting the sealing effect of the shaft sleeve 63.

[0063] To this end, a flexible expansion ring 643 and a clamping ring 642 that can be plugged into each other are arranged in the shaft sleeve 63, and a rigid sleeve ring 641 that contacts each other is arranged at one end of the clamping ring 642 away from the flexible expansion ring 643. As the rigid sleeve ring 641 squeezes the clamping ring 642, the flexible expansion ring 643 is deformed and expanded, and the two side walls contact the inner wall of the shaft sleeve 63 and the outer wall of the piston shaft 62 to enhance the sealing effect of the shaft sleeve 63.

[0064] In addition, the clamping ring 642 can also support and guide the piston shaft 62, so that the piston shaft 62 is not prone to shaking when moving radially, and reduce the possibility of bending and breaking of the piston shaft 62. Of course, the clamping ring 642 can support the piston shaft 62, because the clamping ring 642 is made of metal or rigid material and has good rigidity; An extrusion groove 6431 is provided on the wall of the flexible expansion ring 643 close to the clamping ring 642 , and an extrusion portion 6421 is provided on the corresponding wall of the clamping ring 642 . The extrusion portion 6421 is inserted into the extrusion groove 6431 to deform the flexible expansion ring 643 .

[0065] Specifically, in order to facilitate the deformation of the flexible expansion ring 643 under the extrusion of the clamping ring 642 so as to tightly contact the inner wall of the shaft sleeve 63 and the outer wall of the piston shaft 62, an extrusion groove 6431 is provided on the side of the flexible expansion ring 643 opposite to the clamping ring 642, and the end of the clamping ring 642 corresponding to the flexible expansion ring 643 is provided with an extrusion portion 6421 integrally formed on the clamping ring 642. When the extrusion portion 6421 is inserted into the extrusion groove 6431, the flexible expansion ring 643 is deformed.

[0066] Specifically, the flexible expansion ring 643 has a displacement space with the extrusion groove 6431 formed thereon, so that the side wall of the flexible expansion ring 643 corresponding to the extrusion groove 6431 has a displacement space. When the extrusion portion 6421 is inserted into the extrusion groove 6431 and the extrusion portion 6421 is larger than the extrusion groove 6431, the position of the flexible expansion ring 643 where the extrusion groove 6431 is formed is deformed, and the flexible expansion ring 643 is tightly pressed against the inner wall of the shaft sleeve 63 and the outer wall of the piston shaft 62, so as to enhance the sealing effect of the shaft sleeve 63. The opening of the extrusion groove 6431 is in a trumpet shape, and the cross section of the extrusion portion 6421 is in a triangular shape. The triangular extrusion portion 6421 squeezes the flexible expansion ring 643 to deform.

[0067] Specifically, in order to allow the extrusion groove 6431 to produce a cavity expansion after the extrusion portion 6421 is inserted, the extrusion groove 6431 is configured to be a trumpet-mouth shape, with the trumpet mouth being wide at the insertion end and narrow at the tail end, and the cross-section of the extrusion portion 6421 inserted into the extrusion groove 6431 is a triangular arc, which is adapted to the trumpet mouth to ensure the tightness of the two after the extrusion portion 6421 is inserted into the extrusion groove 6431.

[0068] Of course, the extrusion portion 6421 is larger than the extrusion groove 6431 so that after the extrusion portion 6421 is inserted into the extrusion groove 6431, the flexible expansion ring 43 is deformed and expanded; The position of the base 10 corresponding to the installation shaft sleeve 63 is a support portion 11 , and the wall thickness of the support portion 11 is greater than the wall thickness of other positions of the base 10 .

[0069] Specifically, the base 10 is relatively thin, while the shaft sleeve 63 is longer than the thickness of the base 10 . In order to better support the shaft sleeve 63 , a supporting portion 11 is installed on the base 10 to better support the shaft sleeve 63 .

[0070] like Fig.15As shown, exemplarily, the two vacuum sleeve assemblies 64 are respectively a first vacuum sleeve assembly 64a close to the drive cylinder 61 and a second vacuum sleeve assembly 64b close to the correction assembly, and a sealing assembly 65 is further sandwiched between the first vacuum sleeve assembly 64a and the second vacuum sleeve assembly 64b.

[0071] Specifically, the vacuum sleeve assembly 64 includes two vacuum sleeve assemblies 64, which are arranged at the inlet end and the outlet end of the sleeve 63 to enhance the sealing effect of the sleeve 63. In addition, the sealing assembly 65 sandwiched between the two vacuum sleeve assemblies 64 can further enhance the sealing effect of the sleeve 63.

[0072] It should be noted that the rigid sleeve 641 is made of copper. When copper is used, the rigid sleeve 641 has a good lubrication effect and can ensure its rigidity. During assembly, the rigid sleeve 461 in a vacuum sleeve assembly 64 sequentially squeezes the clamping ring 642, the flexible expansion ring 643, the sealing assembly 65, another flexible expansion ring 643 in another vacuum sleeve assembly 64, the clamping ring 642 and the rigid sleeve 641 to enhance the sealing of the shaft sleeve 63. In addition, the copper rigid sleeve 641 can also guide the piston shaft 62 to move radially; like Fig.15 As shown, illustratively, the sealing assembly 65 includes a plurality of O-rings 651 and a gasket 652 disposed between two adjacent O-rings 651. The O-rings 651 and the gaskets 652 cooperate to ensure the sealing of the shaft sleeve 63; like Figure 1 As shown, illustratively, the second vacuum sleeve assembly 64b is located in the shaft sleeve inner cavity 631 and is located at the installation position of the shaft sleeve 63 and the base 10; the first rigid sleeve ring 64a1 in the first vacuum sleeve assembly 64a is partially exposed outside the shaft sleeve inner cavity 631, and a sleeve cap 66 is provided on the corresponding end of the shaft sleeve 63, and the inner wall of the sleeve cap 66 squeezes the first rigid sleeve ring 64a1 to move in the shaft sleeve inner cavity 631 toward the second vacuum sleeve assembly 64b.

[0073] Specifically, the inner wall of the shaft sleeve cap 66 is provided with an internal thread, and the corresponding end of the shaft sleeve 63 is provided with an external thread, and the two threads are installed in coordination. As the user twists the shaft sleeve 63, the inner wall of the shaft sleeve 63 contacts the first rigid sleeve ring 64a1 and moves into the shaft sleeve inner cavity 631, and squeezes the clamping ring 642, the flexible expansion ring 643, the sealing assembly 65, another flexible expansion ring 643 in another vacuum shaft sleeve assembly 64, the clamping ring 642 and the rigid sleeve ring 641 in turn.

[0074] The opening position of the shaft sleeve cap 66 facing the drive cylinder 61 and the opening position of the shaft sleeve 63 facing the shielding correction mechanism 50 are both provided with sealing rings 67. There are two sealing rings 67, one of which is located in the inner cavity of the shaft sleeve cap 66 and the other is located in the inner cavity of the shaft sleeve 63, so as to enhance the sealing effect between the shaft sleeve cap 66 and the shaft sleeve 63; like Figure 1 As shown, illustratively, the sealing ring 67 is divided into a first ring body 671 and a second ring body 672, and the first ring body 671 and the second ring body 672 are provided with a plug-in portion 673 at opposite ends, and the plug-in portion 673 is integrally formed on the side edges of the first ring body 671 and the second ring body 672 adjacent to the piston shaft 62, and the two plug-in portions 673 are respectively inserted into the gaps between the piston shaft 62 and the shaft sleeve 63, and between the piston shaft 62 and the shaft sleeve cap 66; The end of the sealing ring 67 away from the plug-in part 673 is arranged in a concave annular groove 674. The plug-in part 673 arranged on the first ring body 671 is inserted into the gap between the piston shaft 62 and the shaft sleeve cap 66, while the plug-in part 673 on the second ring body 672 is inserted into the gap between the piston shaft 62 and the shaft sleeve 63. To ensure the sealing protection effect of the shaft sleeve 63 and the shaft sleeve cap 66. In addition, in order to make the sealing ring 67 fill the gap better, an annular groove 674 is provided at one end of the sealing ring 67 away from the plug-in part 73. When the sealing ring 67 is squeezed by external force, the force-bearing diameter of the annular groove 674 is narrowed, and the plug-in part 673 is squeezed and moves toward the inner cavity of the gap.

[0075] In summary, the design focus of the present invention is that the base 10 is buckled with the coating chamber 1, and the side of the base 10 corresponding to the coating chamber 1 includes a mounting cavity 414 and a channel 101 connecting the mounting cavity 414 and the coating chamber 1; The cathode column 30, the air inlet assembly 20 and the covering air guide mechanism 40 are located in the installation cavity 414; During coating, the inner cavity of the fitted base 10 and the coating chamber 1 are evacuated, and then the process gas is transported to the outlet hole 21 in the installation cavity 414 through the air inlet pipe 22 on the air inlet assembly 20 for discharge, so that the process gas can better contact the cathode column 30 in the installation cavity 414. At this time, the drive motor 12 is fixed on the top of the base 10, and the output shaft of the drive motor 12 is plugged into the installation cavity 414 and connected to the cathode column 30. The cathode column 30 is driven by the drive motor 12 to rotate and cooperate with the process gas under the action of the electric field and the magnetic field to discharge and form plasma, which is used for sputtering coating of the workpiece in the coating chamber 1.

[0076] It should be noted that during the plasma generation process, in order to prevent the cathode column 30 from rotating and causing some plasma to be thrown out and contact the gas outlet 21 on the gas inlet pipe 22, resulting in the gas outlet 21 being blocked and unable to discharge the process gas, a protective cover 42 including a gas outlet 421 is covered on the gas inlet pipe 22. While the protective cover 42 prevents the plasma from contacting the gas inlet hole 21, the process gas is normally injected into the installation cavity 414 through the gas outlet 421.

[0077] After coating, the correction ruler 52 or the shielding ruler 53 is controlled to move toward the channel 101 according to the film condition on the workpiece after coating, so as to reduce the size of the channel 101. In addition, the entire shielding correction mechanism 50 can also gradually reduce the size of the channel 101 under the push of the vacuum driving mechanism 60, further facilitating the user to adjust the coating condition of the workpiece without breaking the vacuum.

[0078] In addition, when the vacuum driving mechanism 60 pushes the shielding correction mechanism 50, it can also use the vacuum sleeve assembly 64, the first vacuum sleeve assembly 64a, the first rigid sleeve ring 64a1, the second vacuum sleeve assembly 64b, the rigid sleeve ring 641, the clamping ring 642 and the flexible expansion ring 643 to ensure that the piston shaft 62 of the driving cylinder 61 drives the shielding correction mechanism 50 to move without shaking, bending or breaking to affect the vacuum state of the entire equipment.

[0079] The above description is only a preferred embodiment of the present invention and does not limit the technical scope of the present invention. Therefore, any slight modifications, equivalent changes and modifications made to the above embodiments based on the technical essence of the present invention are still within the scope of the technical solution of the present invention.

Claims

1. A sputtering coating method, comprising an air inlet assembly (20) disposed on a base (10) and a cathode column (30) disposed on the side of an air outlet end of the air inlet assembly (20), characterized in that: The air outlet end of the air inlet assembly (20) is covered with a covering air guide mechanism (40), and two opposing shielding correction mechanisms (50) are provided in the channel (101) between the cathode column (30) and the coating chamber (1), and the shielding correction mechanisms (50) are driven by the vacuum driving mechanism (60).

2. A sputtering coating method according to claim 1, characterized in that: The method further comprises the following steps of the shading correction mechanism (50): S10. Check the sample: After the coating is completed, the sample is removed from the coating chamber (1) to check whether it is qualified; S11. Adjusting the size of the channel: The shielding correction mechanism (50) provides a mounting frame (51), a plurality of correction rulers (52) and a plurality of shielding rulers (53), and an electric drive mechanism (54) for driving the correction rulers (52) and the shielding rulers (53); any electric drive mechanism (54) drives any correction ruler (52) or shielding ruler (53) to move toward the channel (101); and two adjacent shielding correction mechanisms (50) are arranged opposite to each other to jointly control the size of the channel (101); S12. Driving any correction ruler / shielding ruler to move: the electric drive mechanism (54) provides a first electric actuator (541) corresponding to each correction ruler (52), and a second electric actuator (542) corresponding to each shielding ruler (53), the first electric actuator (541) drives the correction ruler (52) to be adjusted on the mounting frame (51), and the second electric actuator (542) drives the shielding ruler (53) to be adjusted on the mounting frame (51).

3. A sputtering coating method according to claim 2, characterized in that: The method further comprises the following steps of the shading correction mechanism (50): S13. Maintaining smooth movement of the correction ruler: each correction ruler (52) is adjustable and spaced apart on the mounting frame (51), and a first gap (55) is formed between two adjacent correction rulers (52); adjusting the correction ruler (52) so that the shielding portion (521) of the correction ruler (52) extends into or out of the channel (101); S14. Preventing plasma from passing through the first gap at one time: each shielding ruler (53) is adjustably arranged on the mounting frame (51) and covers the corresponding first gap (55), and the shielding ruler (53) is adjusted so that the shielding ruler (53) covers the area corresponding to the first gap (55).

4. A sputtering coating method according to claim 3, characterized in that: The method further comprises the following steps of the shading correction mechanism (50): S15. Secondary prevention of plasma passing through the first gap: the correction ruler (52) provides a first flat plate portion (522) and first protrusions (523) extending from both side edges of the first flat plate portion (522) toward the coating chamber (1), and the first gap (55) is located between the corresponding two first protrusions (523) on two adjacent correction rulers (52); S16. Forming a plasma flow-blocking channel: the shielding ruler (53) provides a second flat plate portion (531) and second raised portions (532) extending from both side edges of the second flat plate portion (531) toward the first flat plate portion (522); the second flat plate portion (531) shields a gap, and a curved gap (56) is formed between the corresponding second raised portion (532) and the first raised portion (523).

5. The sputtering coating method according to claim 1, characterized in that: The method also includes the following steps of an air intake assembly (20) and a covering air guide mechanism (40): S20. Injecting process gas: providing an air inlet assembly (20) and an air outlet hole (21) provided on the air inlet assembly (20) for discharging the process gas and injecting it into the inner cavity of the base (10); S21. Plasma generation: As the cathode column (30) rotates, it mixes with the process gas in the base (10) to form a plasma; S22. Preventing plasma from blocking the gas outlet: the covering gas guide mechanism (40) provides a door lining plate (41) disposed in the inner cavity of the base (10), and a protective cover (42) covering the gas outlet hole (21) on the air inlet component (20), the protective cover (42) is provided with a gas outlet (421) connected to the inner cavity of the door lining plate (41), and the gas outlet (421) is arranged in a staggered manner with the cathode column (30); S23. Guiding the direction of the process gas: the gas outlet (421) is located on the first end surface (422) of the protective cover (42) facing the door lining (41), and the first end surface (422) is spaced apart from the inner wall of the door lining (41) to form a gas outlet channel (423).

6. A sputtering coating method according to claim 5, characterized in that: The method further comprises the following steps of covering the air guide mechanism (40): S24. Adjust the outlet direction: the outlet direction of the outlet hole (21) and the outlet direction of the outlet (421) are located in different directions; S25. The positions of the cathode column and the air outlet channel are staggered: the cathode column (30) is arranged in the inner cavity of the door lining (41), and the distance between the cathode column (30) and the first inner wall (410) on the door lining (41) is greater than the diameter of the air outlet channel (423).

7. A sputtering coating method according to claim 6, characterized in that: The method further comprises the following steps of covering the air guide mechanism (40): S26. Forming a plasma processing chamber: the door lining (41) comprises a first plate body (412) and second plates (413) extending inwardly on both sides of the first plate body (412), the first plate body (412) and the two second plates (413) together enclose the installation chamber (414), the protective cover (42) is arranged on one of the second plates (413), and the first inner wall (410) is located on the first plate body (412); S27. Reducing the channel diameter: The two shielding correction mechanisms (50) are respectively connected to the opposite surfaces of the two second plates (413), and as the two shielding correction mechanisms (50) move closer together, the diameter of the outlet port of the installation cavity (414) is reduced.

8. The sputtering coating method according to claim 1, characterized in that: The method further comprises the following steps of the vacuum drive mechanism (60): S30. Driving the shading correction mechanism to move: The vacuum drive mechanism (60) provides a drive cylinder (61) laterally mounted on one side of the base and a drive cylinder piston shaft (62) connected to the shading correction mechanism (50); S31. Guide the piston shaft: The piston shaft (62) passes through a shaft sleeve (63) provided on the base (10), and two vacuum sleeve assemblies (64) are tightly mounted between the shaft sleeve (63) and the piston shaft (62), and the two vacuum sleeve assemblies (64) are respectively located at both ends of the shaft sleeve (63); Each of the vacuum sleeve assemblies (64) comprises a rigid sleeve ring (641) located at the opening of the inner cavity (631) of the sleeve (63), a clamping ring (642) attached to the inner wall of the rigid sleeve ring (641), and a flexible expansion ring (643) attached to the inner wall of the clamping ring (642); the rigid sleeve ring (641) and the clamping ring (642) squeeze the flexible expansion ring (643) to deform; S32. Supporting the piston shaft: An extrusion groove (6431) is provided on the wall of the flexible expansion ring (643) close to the clamping ring (642), and an extrusion portion (6421) is provided on the corresponding wall of the clamping ring (642), and the extrusion portion (6421) is inserted into the extrusion groove (6431) to deform the flexible expansion ring (643); The opening of the extrusion groove (6431) is in the shape of a trumpet, and the cross-section of the extrusion portion (6421) is in the shape of a triangle. The triangular extrusion portion (6421) squeezes the flexible expansion ring (643) to deform.

9. A sputtering coating method according to claim 8, characterized in that: The method further comprises the following steps of the vacuum drive mechanism (60): S33. Sealed shaft sleeve: The vacuum sleeve assembly (64) is respectively a first vacuum sleeve assembly (64a) close to the drive cylinder (61) and a second vacuum sleeve assembly (64b) close to the correction assembly, and a sealing assembly (65) is also sandwiched between the first vacuum sleeve assembly (64a) and the second vacuum sleeve assembly (64b); The sealing assembly (65) comprises a plurality of O-rings (651) and a gasket (652) provided between two adjacent O-rings (651); S34. First sealing enhancement: the second vacuum sleeve assembly (64b) is located in the shaft sleeve inner cavity (631) and is located at the installation position of the shaft sleeve (63) and the base (10); the first rigid sleeve ring (64a1) in the first vacuum sleeve assembly (64a) is partially exposed outside the shaft sleeve inner cavity (631), and a sleeve cap (66) is provided on the corresponding end of the shaft sleeve (63), and the inner wall of the sleeve cap (66) squeezes the first rigid sleeve ring (64a1) in the shaft sleeve inner cavity (631) to move toward the second vacuum sleeve assembly (64b).

10. A sputtering coating method according to claim 9, characterized in that: The method further comprises the following steps of the vacuum drive mechanism (60): S35. Second sealing enhancement: The opening position of the shaft sleeve cap (66) toward the drive cylinder (61) and the opening position of the shaft sleeve (63) toward the shielding correction mechanism (50) are both provided with a sealing ring (67); The sealing ring (67) is divided into a first ring body (671) and a second ring body (672). The first ring body (671) and the second ring body (672) are provided with plug-in parts (673) at opposite ends. The plug-in parts (673) are integrally formed on the side edges of the first ring body (671) and the second ring body (672) adjacent to the piston shaft (62). The two plug-in parts (673) are respectively inserted into the gaps between the piston shaft (62) and the shaft sleeve (63), and between the piston shaft (62) and the shaft sleeve cap (66); One end of the sealing ring (67) away from the plug-in portion (673) is arranged in a concave annular groove (674); S36. Support shaft sleeve: The position of the base (10) corresponding to the mounting shaft sleeve (63) is the support portion (11), and the wall thickness of the support portion (11) is greater than the wall thickness of other positions of the base (10).

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