Preparation method of metal organic complex
The preparation of metal organic complexes through Grignard reaction and complexation reaction has solved the problems of cumbersome preparation, low yield and high cost in the prior art, and achieved efficient and low-cost industrial production.
Patent Information
- Application Number
- CN202411910403.X
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2024-12-24
- Publication Date
- 2025-03-21
AI Technical Summary
The existing preparation methods of metal organic complexes are cumbersome, have low yields and high costs, and cannot meet the needs of industrial production.
The first product is prepared by reacting Grignard reagent with (dimethylamino)acetone, and then complexing with the salt of the first metal M, metal organic complexes are prepared. This method is carried out under the protection of protective gas, with the temperature and time controllable to avoid the use of flammable and explosive substances.
It realizes simple and efficient preparation of metal organic complexes, reduces costs, improves efficiency and yields, and is suitable for industrial production.
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Figure CN119661378A_ABST
Abstract
Description
Technical Field
[0001] The present application relates to the technical field of metal organic complex synthesis, and in particular to a method for preparing a metal organic complex. Background Art
[0002] Metal oxides have attracted widespread attention due to their unique properties such as adjustable optical band gap, non-toxicity and low cost. For example, nickel oxide among metal oxides has been widely used in sensors, catalysts, antiferromagnetic materials, semiconductors and fuel cells due to its excellent chemical stability, electrochemical and optical properties; copper oxides among metal oxides, such as stable cuprous oxide and cupric oxide, have P-type semiconductor properties and are widely used in sensors, memories, photodiodes, battery anode materials, solar cells, thin film transistors and catalysts.
[0003] At present, in many fields, metal oxides are usually prepared using metal-organic complexes as precursors. For example, when using ALD technology to deposit nickel oxide films or copper oxide films, corresponding metal-organic complexes are usually used as precursors for preparation. Based on the performance requirements for nickel oxide films or copper oxide films, the requirements for the corresponding precursors are relatively high.
[0004] Among the many precursors, The metal organic complex of the structure shown in the figure has the characteristics of low boiling point and high saturated vapor pressure, and is widely used in the preparation of high-quality metal oxide films; wherein R is selected from any one of C1~C2 alkyl groups, and M is selected from any one of copper and nickel. However, the formula currently sold on the market is There are many methods for preparing metal organic complexes of the structure shown, all of which are relatively cumbersome, with low yield and high cost, which is not conducive to industrial production. Taking the preparation of bis(dimethylamino-2-methyl-2-butoxy)nickel (Ni(dmamb)2) as an example, a four-step method is usually used for preparation: the first step is to use NaH to react (CH3)2 (S + =O)(CH3I - ) extract hydrogen, and then use the (CH3)2 (S + =O)(CH2 -) undergoes epoxidation reaction with CH3(C=O)(CH2CH3) to prepare 1,2-epoxy-2-methylbutane, in the second step, LiNMe2 is used to attack the epoxy carbon in 1,2-epoxy-2-methylbutane, and dimethylamino-2-methyl-2-butanol is prepared by a ring-opening reaction, in the third step, dimethylamino-2-methyl-2-butanol is reacted with metallic sodium to prepare dimethylamino-2-methyl-2-butoxy sodium, and in the fourth step, dimethylamino-2-methyl-2-butoxy sodium and hexaammine nickel dichloride are reacted to prepare bis(dimethylamino-2-methyl-2-butoxy)nickel; in this preparation process, there are many steps and complicated operations, resulting in a low overall yield and high cost, and a large amount of flammable and explosive substances such as metallic sodium, LiNMe2, NaH, etc. are used in the preparation process, which cannot meet the needs of industrial production. Summary of the invention
[0005] Based on this, some embodiments of the present application provide a method for preparing a metal-organic complex to solve the problems in the related art such as complicated preparation of metal-organic complexes, low yield, high cost, and inability to meet industrial production needs.
[0006] In a first aspect, a method for preparing a metal organic complex is provided, comprising:
[0007] A Grignard reaction is performed between a Grignard reagent and (dimethylamino)acetone to prepare a first product; wherein the Grignard reagent comprises: R-MgX, R is selected from any one of C1-C2 alkyl groups, and X is selected from any one of chlorine, bromine and iodine; the general formula of the first product is shown in the following formula (I):
[0008] (I);
[0009] The first product is subjected to a complex reaction with a salt of a first metal M to prepare the metal organic complex; wherein the general formula of the metal organic complex is as shown in the following formula (II):
[0010] (II);
[0011] M is selected from any one of copper and nickel.
[0012] Optionally, the preparation method satisfies at least one of the following conditions:
[0013] (1) The Grignard reaction and the complex reaction are both carried out under the protection of protective gas;
[0014] (2) The temperature of the Grignard reaction is 10°C to 25°C, and the time is 2h to 4h;
[0015] (3) The temperature of the complexation reaction is 80°C to 110°C, and the time is 3h to 5h;
[0016] (4) The salt of the first metal M is selected from metal halide salts.
[0017] Optionally, the Grignard reagent and (dimethylamino)acetone are subjected to a Grignard reaction to prepare the first product, comprising: under the protection of a protective gas,
[0018] Mixing the Grignard reagent and the (dimethylamino)acetone at 0° C. to 5° C. to prepare a first reaction solution of the Grignard reagent and the (dimethylamino)acetone;
[0019] Raising the temperature of the first reaction solution to 10° C. to 25° C. and reacting for 2 h to 4 h to obtain a first solution, wherein the first solution contains the first product;
[0020] The first product is made to react with a salt of a first metal M to prepare the metal organic complex, comprising: under the protection of a protective gas,
[0021] adding the first metal M salt and the first solvent to the first solution to obtain a second reaction solution;
[0022] The temperature of the second reaction solution is raised to 80° C. to 110° C. and reacted for 3 h to 5 h to prepare the metal organic complex.
[0023] Optionally, under the protection of a protective gas, the Grignard reagent and the (dimethylamino)acetone are mixed at 0° C. to 5° C. to prepare a first reaction solution of the Grignard reagent and the (dimethylamino)acetone, comprising: under the protection of a protective gas,
[0024] preparing a second solution of the Grignard reagent;
[0025] Cooling the second solution to 0°C-5°C;
[0026] The (dimethylamino)acetone is added to the second solution, and the temperature of the second solution and the (dimethylamino)acetone during the adding process is maintained at 0° C. to 5° C.
[0027] Optionally, the solvent used in the second solution is at least one selected from tetrahydrofuran, 2-methyltetrahydrofuran, methyl tert-butyl ether and n-butyl ether.
[0028] Optionally, the first solvent is selected from at least one of toluene and xylene.
[0029] Optionally, the volume ratio of the second solution to the first solvent is 1:1 to 1:5.
[0030] Optionally, in formula (II), M is copper, R is methyl, and the purity of the metal organic complex is greater than or equal to 99%, and the yield is greater than or equal to 89%.
[0031] Optionally, in formula (II), M is nickel, R is methyl, and the purity of the metal organic complex is greater than or equal to 98%, and the yield is greater than or equal to 91%.
[0032] Optionally, in formula (II), M is nickel, R is ethyl, and the purity of the metal organic complex is greater than or equal to 98%, and the yield is greater than or equal to 93%.
[0033] The beneficial effects of the above-mentioned method for preparing the metal organic complex are as follows:
[0034] The first product is prepared by subjecting a Grignard reagent and (dimethylamino)acetone to a Grignard reaction, and then the first product is subjected to a complexation reaction with a salt of a first metal M to prepare a metal organic complex. The preparation method of the metal organic complex is simple and efficient, does not require the use of flammable and explosive substances, can reduce costs, and improve efficiency. Moreover, due to the simple steps, the overall yield can be effectively improved, and the method is suitable for industrial production, thereby solving the problems in the related art of complicated preparation of metal organic complexes, low yield, high cost, and failure to meet the needs of industrial production. BRIEF DESCRIPTION OF THE DRAWINGS
[0035] Figure 1 A schematic flow chart of a method for preparing a metal organic complex provided in an embodiment of the present application. DETAILED DESCRIPTION
[0036] In order to make the above-mentioned purposes, features and advantages of the present application more obvious and easy to understand, the specific implementation methods of the present application are described in detail below in conjunction with the accompanying drawings. In the following description, many specific details are set forth to facilitate a full understanding of the present application. However, the present application can be implemented in many other ways different from those described herein, and those skilled in the art can make similar improvements without violating the connotation of the present application, so the present application is not limited by the specific embodiments disclosed below.
[0037] Unless the context requires otherwise, throughout the specification and claims, the term "including" is to be interpreted as an open, inclusive meaning, that is, "including, but not limited to". In the description of the specification, the terms "one embodiment", "some embodiments", "exemplary embodiments", "exemplarily" or "some examples" and the like are intended to indicate that specific features, structures, materials or characteristics associated with the embodiment or example are included in at least one embodiment or example of the present disclosure. The schematic representation of the above terms does not necessarily refer to the same embodiment or example. In addition, the specific features, structures, materials or characteristics may be included in any one or more embodiments or examples in any appropriate manner.
[0038] Exemplary embodiments are described herein with reference to cross-sectional views and / or plan views that are idealized exemplary drawings. In the drawings, the thickness of layers and regions are exaggerated for clarity. Therefore, variations in shape relative to the drawings due to, for example, manufacturing techniques and / or tolerances are conceivable. Therefore, the exemplary embodiments should not be interpreted as being limited to the shapes of the regions shown herein, but include shape deviations due to, for example, manufacturing. For example, an etched region shown as a rectangle will typically have curved features. Therefore, the regions shown in the drawings are schematic in nature, and their shapes are not intended to illustrate the actual shape of regions of the device, and are not intended to limit the scope of the exemplary embodiments.
[0039] In this document, "for example", "such as", "example", "for example", etc. are used for descriptive purposes, indicating that the previous and subsequent different technical solutions are related in terms of the content covered, but should not be understood as limiting the previous technical solution, nor can they be understood as limiting the scope of protection of this document. In this document, unless otherwise specified, A (such as B) means that B is a non-limiting example of A, and it can be understood that A is not limited to B.
[0040] In this article, "optionally", "optional", and "optional" mean optional, that is, any one of the two parallel options of "yes" or "no". If there are multiple "options" in a technical solution, unless otherwise specified and there is no contradiction or mutual restriction, each "option" is independent.
[0041] Herein, descriptions such as "optionally contain", "optionally include", etc., mean "contain or not contain". "Optional component X" means component X exists or does not exist, or means containing or not containing the component X.
[0042] In this document, the terms "first", "second", etc. in "the first aspect", "the second aspect", etc. are used for descriptive purposes only and cannot be understood as indicating or implying relative importance or quantity, nor can they be understood as implicitly indicating the importance or quantity of the indicated technical features.
[0043] Unless otherwise defined, all technical and scientific terms used herein have the same meaning as those commonly understood by those skilled in the art to which this application belongs. The terms used herein in the specification of this application are only for the purpose of describing specific embodiments and are not intended to limit this application.
[0044] In this article, the technical features described in an open manner include closed technical solutions composed of the listed features, and also include open technical solutions containing the listed features.
[0045] In this document, "at least one" means more than one, such as one, two and more than two. "Multiple" or "several" means at least two, such as two, three, etc.
[0046] Herein, when it comes to a numerical interval (i.e., a numerical range), unless otherwise specified, the distribution of the optional numerical values within the numerical interval is considered to be continuous and includes the two numerical endpoints (i.e., the minimum and maximum values) of the numerical interval, and each numerical value between the two numerical endpoints. Unless otherwise specified, when a numerical interval only refers to integers within the numerical interval, including the two endpoint integers of the numerical range, and each integer between the two endpoints, is equivalent to directly listing each integer. When multiple numerical ranges are provided to describe features or characteristics, these numerical ranges can be combined. In other words, unless otherwise specified, the numerical ranges disclosed herein should be understood to include any and all sub-ranges included therein. The "numerical value" in the numerical interval can be any quantitative value, such as a number, a percentage, a ratio, etc. "Numerical interval" allows broadly including numerical interval types such as percentage intervals, ratio intervals, and ratio intervals.
[0047] In this article, when it comes to percentage concentration, unless otherwise specified, it refers to the final concentration. The final concentration refers to the proportion of the added component in the system after the addition of the component.
[0048] In this article, if there are multiple steps involved in the method flow, unless there is a clear different description in this article, there is no strict order restriction for the execution of these steps, and they can be executed in other orders than described. Moreover, any step can include multiple sub-steps or multiple stages, and these sub-steps or stages are not necessarily executed at the same time, but can be executed at different times, and their execution order is not necessarily sequential, but can be executed in turn, alternating or simultaneously with other steps or parts of sub-steps or stages of other steps.
[0049] In view of the problems in the related art that the preparation of metal organic complexes is complicated, the yield is low, the cost is high, and it cannot meet the needs of industrial production, the specific implementation methods of this application are described as follows:
[0050] In a first aspect, some embodiments of the present application provide a method for preparing a metal organic complex, such as Figure 1 As shown, the preparation method comprises:
[0051] S11), allowing a Grignard reagent and (dimethylamino)acetone to undergo a Grignard reaction to prepare a first product; wherein the Grignard reagent comprises: R-MgX, R is selected from any one of C1-C2 alkyl groups, and X is selected from any one of chlorine, bromine and iodine; the general formula of the first product is shown in the following formula (I):
[0052] (I);
[0053] S12), allowing the first product to undergo a complex reaction with a salt of a first metal M to prepare a metal organic complex; wherein the general formula of the metal organic complex is shown in the following formula (II):
[0054] (II); Wherein, in formula (II), M is selected from any one of copper and nickel.
[0055] In the preparation method of the metal-organic complex provided in the embodiment of the present application, a first product is prepared by subjecting a Grignard reagent and (dimethylamino)acetone to a Grignard reaction, and then the first product is subjected to a complexation reaction with a salt of a first metal M to prepare the metal-organic complex. The preparation method of the metal-organic complex is simple and efficient, does not require the use of flammable and explosive substances, can reduce costs, and improve efficiency. Moreover, due to the simplicity of the steps, the overall yield can be effectively improved, and the method is suitable for industrial production, thus solving the problems of complicated preparation of metal-organic complexes, low yield, high cost, and inability to meet the needs of industrial production in the related art.
[0056] In some embodiments, the Grignard reaction and the complex reaction are both carried out under the protection of a protective gas, which can improve the reaction stability and reduce the generation of impurities.
[0057] In some embodiments, the temperature of the Grignard reaction is 10° C. to 25° C., and the time is 2 h to 4 h.
[0058] In some embodiments, the temperature of the complexation reaction is 80° C. to 110° C., and the time is 3 h to 5 h.
[0059] In some embodiments, in step S12), the salt of the first metal M is selected from metal halide salts.
[0060] For example, the salt of the first metal M may be nickel chloride, nickel bromide, copper bromide, or the like.
[0061] In some embodiments, S11), a Grignard reaction is performed between a Grignard reagent and (dimethylamino)acetone to prepare a first product, comprising: under the protection of a protective gas,
[0062] Mixing the Grignard reagent and (dimethylamino)acetone at 0° C. to 5° C. to prepare a first reaction solution of the Grignard reagent and (dimethylamino)acetone;
[0063] Raise the temperature of the first reaction solution to 10° C. to 25° C. and react for 2 h to 4 h to obtain a first solution, wherein the first solution contains a first product;
[0064] S12), causing the first product to undergo a complex reaction with a salt of a first metal M to prepare a metal organic complex, comprising: under the protection of a protective gas,
[0065] Adding a salt of a first metal M and a first solvent to the first solution to obtain a second reaction solution;
[0066] The temperature of the second reaction solution is raised to 80° C. to 110° C. and reacted for 3 h to 5 h to prepare a metal organic complex.
[0067] In these embodiments, there is no need to separate the first product, which can reduce the deterioration of the first product. During the whole process, the first product is kept under the protection of a protective gas to react with the salt of the first metal M, which can improve the reaction stability and reduce impurities. In addition, the reaction steps are fewer, which can reduce the product loss caused by the separation process.
[0068] In some embodiments, under the protection of a protective gas, the Grignard reagent and (dimethylamino) acetone are mixed at 0°C to 5°C to prepare a first reaction solution of the Grignard reagent and (dimethylamino) acetone, comprising: under the protection of a protective gas,
[0069] preparing a second solution of the Grignard reagent;
[0070] Cool the second solution to 0°C~5°C;
[0071] Add (dimethylamino)acetone to the second solution, and keep the temperature of the second solution and (dimethylamino)acetone mixed at 0°C to 5°C during the addition process.
[0072] In some embodiments, the solvent used in the second solution is at least one selected from tetrahydrofuran, 2-methyltetrahydrofuran, methyl tert-butyl ether and n-butyl ether.
[0073] In some embodiments, the first solvent is selected from at least one of toluene and xylene.
[0074] In some embodiments, the volume ratio of the second solution to the first solvent is 1:1 to 1:5.
[0075] In some embodiments, in formula (II), M is copper, R is methyl, and the purity of the metal organic complex is greater than or equal to 99%, and the yield is greater than or equal to 89%.
[0076] In some embodiments, in formula (II), M is nickel, R is methyl, and the purity of the metal organic complex is greater than or equal to 98%, and the yield is greater than or equal to 91%.
[0077] In some embodiments, in formula (II), M is nickel, R is ethyl, and the purity of the metal organic complex is greater than or equal to 98%, and the yield is greater than or equal to 93%.
[0078] In a second aspect, some embodiments of the present application provide a use of a metal-organic complex prepared by the method for preparing a metal-organic complex as described in the first aspect as a precursor in the preparation of a metal oxide.
[0079] For example, the metal organic complex can be used as a precursor to prepare a corresponding metal oxide film through atomic layer deposition. The metal oxide film has high quality and can meet the requirements of atomic layer deposition.
[0080] For example, the metal oxide film can be used as a resistance switch in semiconductor storage. By applying a voltage to the metal oxide film, the resistance switching characteristics of the metal oxide film can be used to achieve rapid switching between conduction and insulation.
[0081] In order to objectively evaluate the technical effects of the embodiments of the present application, the present application will be described in detail and exemplarily through the following embodiments and comparative examples.
[0082] In the following examples and comparative examples, all raw materials can be purchased commercially, and in order to maintain the reliability of the experiment, the raw materials used in the following examples and comparative examples have the same physical and chemical parameters or are prepared by the same processing method.
[0083] Example 1
[0084] Example 1 provides a bis(dimethylamino-2-methyl-2-butoxy)nickel (Ni(dmamb)2), the preparation method of which is as follows:
[0085] (1) Under nitrogen atmosphere, add 1.44 L of 2 M tetrahydrofuran solution of ethylmagnesium bromide into a 5000 mL three-necked flask. After cooling to 0°C, add 283.2 g of (dimethylamino)acetone dropwise to the tetrahydrofuran solution of ethylmagnesium bromide, keeping the temperature no higher than 5°C (the temperature fluctuates between 0°C and 5°C). After the addition is complete, raise the temperature to 20°C and react for 2 h.
[0086] (2) After the reaction in step (1) for 2 h, 2 L of toluene was added to the three-necked flask, and then 168.5 g of anhydrous nickel chloride was added, and the temperature was raised to 100 ° C. and the reaction was continued for 5 h. After the reaction was completed, the filtrate was filtered, concentrated, and distilled under reduced pressure to obtain 366.5 g of a green product. The purity was calculated from the NMR spectrum to be 98.2%, and the yield was 93.2%.
[0087] The NMR data of the green product are as follows: 1H NMR (C6D6): δ = 2.37 (6H, d), 2.28 (6H,d), 1.83 (4H, m), 1.66 (4H, m), 1.35 (6H, d), 0.93 (6H, t).
[0088] Example 2
[0089] Example 2 provides a bis(dimethylamino-2-methyl-2-propoxy)nickel (Ni(dmamp)2), the preparation method of which is as follows:
[0090] (1) Under nitrogen atmosphere, add 0.31 L of 2-methyltetrahydrofuran solution of methylmagnesium bromide (3 M) to a 3000 mL three-necked flask. After cooling to 0°C, add 93.76 g of (dimethylamino)acetone dropwise to the 2-methyltetrahydrofuran solution of methylmagnesium bromide, keeping the temperature no higher than 5°C (the temperature fluctuates between 0°C and 5°C). After the addition is complete, raise the temperature to 25°C and react for 3 h.
[0091] (2) After the reaction in step (1) for 3 h, 1.3 L of toluene was added to the three-necked flask, and then 58.6 g of anhydrous chlorinated chloride was added, and the temperature was raised to 80 ° C. and the reaction was continued for 3 h. After the reaction was completed, the mixture was filtered, the filtrate was concentrated, and the filtrate was sublimated under reduced pressure to obtain 119.8 g of a brown product. The purity was calculated from the NMR spectrum to be 98.8%, and the yield was 91.1%.
[0092] The NMR data of the brown product are as follows: 1 H NMR (C6D6): δ =2.33 (6H, s), 1.73 (2H,s), 1.38 (6H, s).
[0093] Example 3
[0094] Example 3 provides a bis(dimethylamino-2-methyl-2-butoxy)copper (Cu(dmamb)2), the preparation method of which is as follows:
[0095] (1) Under nitrogen atmosphere, add 0.2 L of 2 M tetrahydrofuran solution of ethylmagnesium bromide to a 3000 mL three-necked flask. After cooling to 0°C, add 40 g of (dimethylamino)acetone dropwise to the tetrahydrofuran solution of ethylmagnesium bromide, keeping the temperature no higher than 5°C (the temperature fluctuates between 0°C and 5°C). After the addition is complete, raise the temperature to 10°C and react for 4 h.
[0096] (2) After the reaction in step (1) for 4 h, 1 L of toluene was added to the three-necked flask, and then 45 g of anhydrous copper bromide was added, and the temperature was raised to 110° C. and the reaction was continued for 4 h. After the reaction was completed, the filtrate was filtered, concentrated, and distilled under reduced pressure to obtain 51.1 g of a red product. The purity of the product was calculated by elemental analysis to be 99%, and the yield was 89.4%.
[0097] Theoretical value of elemental analysis of the red product: C, 48.71; H, 9.54; Found value: C, 48.66; H, 9.59.
[0098] Comparative Example 1
[0099] Comparative Example 1 provides a bis(dimethylamino-2-methyl-2-butoxy)nickel (Ni(dmamb)2), the preparation method of which is as follows:
[0100] (1) Using NaH to react (CH3)2(S + =O)(CH3I - ) extract hydrogen, and then use the (CH3)2 (S + =O)(CH2 - ) undergoes epoxidation reaction with CH3(C=O)(CH2CH3) to prepare 1,2-epoxy-2-methylbutane. The specific reaction equation is shown below, and the yield is 90%.
[0101] (2) LiNMe2 was used to attack the epoxy carbon in 1,2-epoxy-2-methylbutane to prepare dimethylamino-2-methyl-2-butanol through a ring-opening reaction. The specific reaction equation is shown below. The yield was 53%.
[0102] (3) Sodium dimethylamino-2-methyl-2-butoxy was prepared by reacting dimethylamino-2-methyl-2-butanol with metallic sodium, with a yield of 73%.
[0103] (4) Bis(dimethylamino-2-methyl-2-butoxy)nickel was prepared by reacting dimethylamino-2-methyl-2-butoxysodium with hexaammine nickel dichloride in a yield of 82.6%.
[0104] The comprehensive yield of bis(dimethylamino-2-methyl-2-butoxy)nickel was calculated to be 28.8%.
[0105] Comparative Example 2
[0106] Comparative Example 2 provides a bis(dimethylamino-2-methyl-2-propoxy)nickel (Ni(dmamp)2), the preparation method of which is basically the same as that of Comparative Example 1, except that:
[0107] In step (1), 1,2-epoxy-2-methylbutane is replaced by 1,2-epoxy-2-methylpropane. Accordingly, in step (2), dimethylamino-2-methyl-2-propanol is prepared, and in step (3), dimethylamino-2-methyl-2-propoxy sodium is prepared.
[0108] The calculated comprehensive yield of bis(dimethylamino-2-methyl-2-propoxy)nickel is 25.4%.
[0109] Comparative Example 3
[0110] Comparative Example 3 provides a bis(dimethylamino-2-methyl-2-butoxy)copper (Cu(dmamb)2), the preparation method of which is basically the same as that of Comparative Example 1, except that:
[0111] In step (4), hexaammine nickel dichloride is replaced by copper dimethoxide.
[0112] The calculated comprehensive yield of bis(dimethylamino-2-methyl-2-butoxy)copper is 39.8%.
[0113] By comparing Example 1 and Comparative Example 1, it can be seen that the yield of the preparation method provided in Example 1 of the present application is relatively high, which can reach 93.2%, while the comprehensive yield of Comparative Example 1 is only 28.8%, and a variety of flammable and explosive substances are used in the preparation process.
[0114] By comparing Example 2 and Comparative Example 2, it can be seen that the yield of the preparation method provided by Example 2 of the present application is relatively high, which can reach 91.1%, while the comprehensive yield of Comparative Example 2 is only 25.4%, and a variety of flammable and explosive substances are used in the preparation process.
[0115] By comparing Example 3 and Comparative Example 3, it can be seen that the yield of the preparation method provided by Example 3 of the present application is relatively high, which can reach 89.4%, while the comprehensive yield of Comparative Example 2 is only 39.8%, and a variety of flammable and explosive substances are used in the preparation process.
[0116] In summary, the preparation method of the metal organic complex provided in the embodiment of the present application is simple and efficient, does not require the use of flammable and explosive substances, can reduce costs and improve efficiency, and because the steps are simple, the overall yield can be effectively improved, and it is suitable for industrial production, which solves the problems of cumbersome preparation of metal organic complexes, low yield, high cost, and inability to meet the needs of industrial production in the related art.
[0117] The technical features of the above-described embodiments may be arbitrarily combined. To make the description concise, not all possible combinations of the technical features in the above-described embodiments are described. However, as long as there is no contradiction in the combination of these technical features, they should be considered to be within the scope of this specification.
[0118] The above-described embodiments only express several implementation methods of the present application, and the descriptions thereof are relatively specific and detailed, but they cannot be construed as limiting the scope of the patent application. It should be pointed out that, for a person of ordinary skill in the art, several variations and improvements can be made without departing from the concept of the present application, and these all belong to the protection scope of the present application. Therefore, the protection scope of the patent application shall be subject to the attached claims.
Claims
1. A method for preparing a metal organic complex, characterized in that: include: A Grignard reaction is performed between a Grignard reagent and (dimethylamino)acetone to prepare a first product; wherein the Grignard reagent comprises: R-MgX, R is selected from any one of C1-C2 alkyl groups, and X is selected from any one of chlorine, bromine and iodine; the general formula of the first product is shown in the following formula (I): (I); The first product is subjected to a complex reaction with a salt of a first metal M to prepare the metal organic complex; wherein the general formula of the metal organic complex is as shown in the following formula (II): (II); M is selected from any one of copper and nickel.
2. The method for preparing a metal organic complex according to claim 1, characterized in that: The preparation method satisfies at least one of the following conditions: (1) The Grignard reaction and the complex reaction are both carried out under the protection of protective gas; (2) The temperature of the Grignard reaction is 10°C to 25°C, and the time is 2h to 4h; (3) The temperature of the complexation reaction is 80°C to 110°C, and the time is 3h to 5h; (4) The salt of the first metal M is selected from metal halide salts.
3. The method for preparing a metal organic complex according to claim 1, characterized in that: The method comprises: mixing the Grignard reagent and the (dimethylamino)acetone at 0° C. to 5° C. under the protection of a protective gas to prepare a first reaction solution of the Grignard reagent and the (dimethylamino)acetone; Raising the temperature of the first reaction solution to 10° C. to 25° C. and reacting for 2 h to 4 h to obtain a first solution, wherein the first solution contains the first product; The first product is subjected to a complex reaction with a salt of a first metal M to prepare the metal organic complex, comprising: adding the salt of the first metal M and a first solvent to the first solution under the protection of a protective gas to obtain a second reaction solution; The temperature of the second reaction solution is raised to 80° C. to 110° C. and reacted for 3 h to 5 h to prepare the metal organic complex.
4. The method for preparing a metal organic complex according to claim 3, characterized in that: Under the protection of a protective gas, the Grignard reagent and the (dimethylamino)acetone are mixed at 0° C. to 5° C. to prepare a first reaction solution of the Grignard reagent and the (dimethylamino)acetone, comprising: under the protection of a protective gas, preparing a second solution of the Grignard reagent; Cooling the second solution to 0°C-5°C; The (dimethylamino)acetone is added to the second solution, and the temperature of the second solution and the (dimethylamino)acetone during the adding process is maintained at 0° C. to 5° C.
5. The method for preparing a metal organic complex according to claim 4, characterized in that: The solvent used in the second solution is at least one selected from tetrahydrofuran, 2-methyltetrahydrofuran, methyl tert-butyl ether and n-butyl ether.
6. The method for preparing a metal organic complex according to claim 3, characterized in that: The first solvent is selected from at least one of toluene and xylene.
7. The method for preparing a metal organic complex according to claim 4, characterized in that: The volume ratio of the second solution to the first solvent is 1:1-1:
5.
8. The method for preparing a metal organic complex according to any one of claims 1 to 7, characterized in that: In formula (II), M is copper, R is methyl, the purity of the metal organic complex is greater than or equal to 99%, and the yield is greater than or equal to 89%.
9. The method for preparing a metal organic complex according to any one of claims 1 to 7, characterized in that: In formula (II), M is nickel, R is methyl, and the purity of the metal organic complex is greater than or equal to 98%, and the yield is greater than or equal to 91%.
10. The method for preparing a metal organic complex according to any one of claims 1 to 7, characterized in that: In formula (II), M is nickel, R is ethyl, and the purity of the metal organic complex is greater than or equal to 98%, and the yield is greater than or equal to 93%.
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