Chemical vapor deposition equipment for preparing HJT battery thin film

Abstract

The utility model discloses chemical vapor deposition equipment for preparing an HJT battery film, and relates to the technical field of chemical vapor deposition, in particular to the chemical vapor deposition equipment for preparing the HJT battery film, which comprises a reaction chamber, a spray head arranged at the top of the reaction chamber and a support seat arranged at the bottom of the reaction chamber, and a height adjusting mechanism is mounted at the bottom of the inner cavity of the reaction chamber and is used for supporting and raising the height of the corresponding part of the supporting seat. According to the chemical vapor deposition equipment for preparing the HJT battery thin film, the height adjusting mechanism is arranged, a first driving motor is used for driving a lead screw to rotate, and a second sliding block can move along the lead screw, so that a second supporting rod pushes an upper sliding frame to move up and down, the height of the corresponding position of a supporting seat is adjusted, and finally the height of crystalline silicon is adjusted; the distances from all positions of the surface of the crystalline silicon to the spray head are equal, the reaction chamber does not need to be opened, and adjustment is very difficult.

Description

Technical Field

[0001] The utility model relates to the technical field of chemical vapor deposition, in particular to chemical vapor deposition equipment for preparing HJT battery thin films. Background Art

[0002] HJT cells, also called HIT cells, commonly known as heterojunction cells, are third-generation cells. Their full name is crystalline silicon heterojunction solar cells. They are silicon solar cells that use a HIT structure. This technology deposits amorphous silicon thin films on crystalline silicon. It combines the core competitiveness of crystalline silicon cells and thin-film cells, can improve the photoelectric conversion efficiency, and is one of the hot trends in high-conversion-efficiency silicon-based solar cells.

[0003] HJT battery thin film is prepared using chemical vapor deposition (CVD) equipment. Chemical vapor deposition is a process in which a gas mixture containing the atoms or molecules required for the thin film is injected into a reaction chamber, and a reaction occurs in the reaction chamber. The atoms or molecules are deposited on the surface of crystalline silicon and aggregated to form a thin film.

[0004] In the chemical vapor deposition equipment of the prior art, since the exhaust holes are opened on both sides of the support seat, the gas flow rate and pressure distribution of the reaction gas on the surface of the support seat are uneven, which in turn affects the uniform deposition of thin films on crystalline silicon. At the same time, after a period of use, certain impurity particles will be deposited on the surface of the support seat. Such impurity particles are often not evenly distributed on the entire surface of the support seat, which causes the surface of the support seat to be uneven. Therefore, it is necessary to adjust the distance from the crystalline silicon to the nozzle so that the distance from each point on the surface of the crystalline silicon to the nozzle is equal. The existing chemical vapor deposition equipment needs to open the reaction chamber and clean the surface of the support seat to make the surface of the support seat flat; or adjust the nozzle so that the nozzle and the crystalline silicon have the same inclination angle. Regardless of which method is used, the reaction chamber needs to be opened first, which is very difficult to adjust. For this reason, we provide a chemical vapor deposition equipment for the preparation of HJT battery thin films. Utility Model Content

[0005] In view of the deficiencies in the prior art, the utility model provides a chemical vapor deposition device for preparing a HJT battery thin film, which solves the problems raised in the above-mentioned background technology.

[0006] To achieve the above objectives, the utility model is implemented through the following technical solutions: a chemical vapor deposition device for preparing HJT battery thin film, comprising a reaction chamber, a nozzle installed on the top of the reaction chamber, and a support seat installed at the bottom of the reaction chamber, a height adjustment mechanism is installed at the bottom of the inner cavity of the reaction chamber, and the height adjustment mechanism is used to support and raise the height of the corresponding part of the support seat, a lower uniform air cavity is fixedly installed at the bottom of the inner cavity of the reaction chamber, an upper uniform air cavity is movably connected to the top of the lower uniform air cavity, an exhaust hole is opened at the top of the upper uniform air cavity, and an exhaust structure is connected to the bottom of the upper uniform air cavity, and a driving mechanism for driving the upper uniform air cavity to rotate is installed inside the reaction chamber.

[0007] Optionally, the height adjustment mechanism includes a lower slide fixedly mounted on the bottom of the reaction chamber, a first support rod being movably sleeved inside the lower slide, a first slider being movably sleeved on the top of the first support rod, an upper slide fixedly mounted on the bottom of the support seat, a first slide groove being provided inside the upper slide, and the first slider being clamped in the first slide groove.

[0008] Optionally, a second slide groove is provided inside the lower slide frame, a second slider is clamped inside the second slide groove, a second support rod is movably sleeved outside the second slider, and a top of the second support rod is movably sleeved with the first slider.

[0009] Optionally, a drive motor 1 is fixedly mounted on one end of the lower slide frame close to the second slide slot, a lead screw is connected to the output shaft of the drive motor 1, the lead screw is movably sleeved inside the lower slide frame, and the second slider is threadedly sleeved on the outside of the lead screw.

[0010] Optionally, the upper air cavity is in a circular ring structure, the upper air cavity surrounds the outside of the support seat, and the air extraction holes are symmetrically distributed about the center of the support seat.

[0011] Optionally, the driving mechanism includes a second driving motor fixedly mounted on the bottom of the reaction chamber, the top of the second driving motor output shaft extends to the interior of the reaction chamber, a driving wheel is fixedly mounted on the top of the second driving motor output shaft, and the driving wheel is transmission-connected to the inner side of the upper air cavity.

[0012] Optionally, the air extraction structure includes an air extraction pipe connected to the bottom of the upper air cavity, there are two air extraction pipes and they are symmetrically distributed about the support seat, and the bottom of the air extraction pipe is connected to the pump body through a three-way pipe.

[0013] The utility model provides a chemical vapor deposition device for preparing HJT battery thin film, which has the following beneficial effects:

[0014] 1. The chemical vapor deposition equipment for preparing HJT battery thin film is provided with a height adjustment mechanism. The drive motor is used to drive the lead screw to rotate, so that the second slider can move along the lead screw, thereby the second support rod pushes the upper slide to move up and down, and the height of the corresponding position of the support seat is adjusted. Finally, the height of the crystalline silicon is adjusted so that the distance from each part of the crystalline silicon surface to the nozzle is equal. There is no need to open the reaction chamber, and the adjustment is very difficult.

[0015] 2. The chemical vapor deposition equipment for preparing HJT battery thin film is capable of continuously adjusting the position of the exhaust holes by setting an upper uniform air cavity and utilizing a second driving motor to drive a driving wheel to rotate, and then the driving wheel drives the upper uniform air cavity to rotate. The exhaust holes are symmetrically distributed about the center of the support seat, which can make the gas flow rate and pressure distribution inside the reaction chamber more uniform, thereby improving the uniformity of crystalline silicon thin film deposition. BRIEF DESCRIPTION OF THE DRAWINGS

[0016] Figure 1 It is a schematic diagram of the structure of the utility model;

[0017] Figure 2 It is a schematic diagram of the structure of the utility model in cross section;

[0018] Figure 3 This is a schematic diagram of the structure of the air extraction hole of the utility model;

[0019] Figure 4 It is a structural schematic diagram of the height adjustment mechanism of the utility model;

[0020] Figure 5 It is a structural schematic diagram of the lead screw of the utility model.

[0021] In the figure: 1. reaction chamber; 2. nozzle; 3. support seat; 4. height adjustment mechanism; 401. lower slide; 402. first support rod; 403. first slider; 404. upper slide; 405. first slide groove; 406. second slide groove; 407. second slider; 408. second support rod; 5. driving motor 1; 501. lead screw; 6. lower uniform air cavity; 7. upper uniform air cavity; 8. exhaust hole; 9. exhaust pipe; 10. pump body; 11. driving motor 2; 12. driving wheel; 13. sealing member. DETAILED DESCRIPTION

[0022] The technical solutions in the embodiments of the present invention will be described clearly and completely below in conjunction with the drawings in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, rather than all of the embodiments.

[0023] See also Figures 1 to 5The utility model provides a technical solution: a chemical vapor deposition device for preparing HJT battery thin film, comprising a reaction chamber 1, a nozzle 2 installed on the top of the reaction chamber 1, and a support seat 3 installed at the bottom of the reaction chamber 1. A height adjustment mechanism 4 is installed at the bottom of the inner cavity of the reaction chamber 1. The height adjustment mechanism 4 is used to support and raise the height of the corresponding part of the support seat 3. The height adjustment mechanism 4 includes a lower slide frame 401 fixedly installed at the bottom of the reaction chamber 1. The inner part of the lower slide frame 401 is movably sleeved with a first support rod 402. By adjusting the first support rod The angle between the rod 402 and the second support rod 408 can adjust the height between the lower slide 401 and the upper slide 404, adjust the height of the corresponding position of the support seat 3, and finally adjust the height of the crystalline silicon so that the distance from the surface of the crystalline silicon to the nozzle is equal. The top of the first support rod 402 is movably sleeved with a first slider 403, and the bottom of the support seat 3 is fixedly installed with an upper slide 404. The interior of the upper slide 404 is provided with a first slide groove 405. By setting the first slide groove 405, the first slider 403 is in the first slide groove 405. The first slide groove 405 has a limiting effect on the first slider 403, so that the first slider 403 moves more stably. The first slider 403 is clamped in the first slide groove 405. The lower slide frame 401 is provided with a second slide groove 406 inside. The second slide groove 406 is clamped with a second slider 407 inside. By providing the second slider 407, the second slide groove 406 slides horizontally inside the second slider 407, which can improve the stability of the movement of the second slider 407. The second slider 407 is movably sleeved with a second support outside. Rod 408, the top of the second support rod 408 is movably connected with the first slider 403, and a driving motor 5 is fixedly installed on one end of the lower slide frame 401 close to the second slide groove 406, and a screw 501 is connected to the output shaft of the driving motor 5. The screw 501 is movably connected to the inside of the lower slide frame 401, and the second slider 407 is threadedly connected to the outside of the screw 501. The screw 501 is driven to rotate by the driving motor 5, so that the second slider 407 can move along the screw 501, thereby adjusting the inclination angle of the second support rod 408.

[0024] See also Figures 2 to 3 A lower uniform air cavity 6 is fixedly installed at the bottom of the inner cavity of the reaction chamber 1, and an upper uniform air cavity 7 is movably sleeved on the top of the lower uniform air cavity 6. An exhaust hole 8 is opened on the top of the upper uniform air cavity 7. The upper uniform air cavity 7 is annular in structure. The upper uniform air cavity 7 surrounds the outside of the support seat 3, and the exhaust holes 8 are symmetrically distributed about the center of the support seat 3. By setting the exhaust holes 8, the exhaust holes 8 are symmetrically distributed about the center of the support seat 3, and air can be exhausted from all around the support seat 3, so that the gas flow rate and pressure distribution inside the reaction chamber 1 are more uniform.

[0025] See also Figure 1 to Figure 2The bottom of the upper evenly distributed air cavity 7 is connected to an exhaust structure, which includes an exhaust pipe 9 connected to the bottom of the upper evenly distributed air cavity 7. There are two exhaust pipes 9 and they are symmetrically distributed about the support seat 3. The bottom of the exhaust pipe 9 is connected to the pump body 10 through a three-way pipe. The gas inside the reaction chamber 1 is extracted outward through the pump body 10, so that the gas inside the reaction chamber 1 can flow downward continuously. A driving mechanism for driving the upper evenly distributed air cavity 7 to rotate is installed inside the reaction chamber 1.

[0026] See also Figures 2 to 3 The driving mechanism includes a driving motor 11 fixedly mounted at the bottom of the reaction chamber 1, the top of the output shaft of the driving motor 11 extends to the inside of the reaction chamber 1, and a driving wheel 12 is fixedly mounted on the top of the output shaft of the driving motor 11. The driving wheel 12 is connected to the inner side of the upper evenly distributed air cavity 7 by transmission. The driving motor 11 drives the driving wheel 12 to rotate, and then the driving wheel 12 drives the upper evenly distributed air cavity 7 to rotate, so that the position of the air extraction hole 8 can be continuously adjusted, so that the gas flow rate and pressure distribution inside the reaction chamber 1 can be made more uniform. A sealing member 13 is mounted on the output shaft of the driving motor 11, and the sealing member 13 is fixedly mounted inside the reaction chamber 1. The sealing member 13 is a 109 type mechanical seal. By setting the sealing member 13, the sealing member 13 can seal the output shaft of the driving motor 11 to prevent the inside and outside of the reaction chamber 1 from being connected.

[0027] In summary, when the chemical vapor deposition equipment for preparing HJT battery thin film is used, the lead screw 501 is driven to rotate by driving motor 1 5, so that the second slider 407 can move along the lead screw 501, and the second slider 407 is used to push the second support rod 408 to rise and fall, so that the height adjustment mechanism 4 supports and adjusts the height of the corresponding position of the support seat 3, and finally adjusts the height of the crystalline silicon so that the distance from each part of the crystalline silicon surface to the nozzle is equal. When the pump body 10 is evacuating air, the driving motor 2 11 drives the driving wheel 12 to rotate, so that the upper uniform air cavity 7 can rotate slowly, and the position of the exhaust hole 8 can be continuously adjusted. The exhaust holes 8 are symmetrically distributed about the center of the support seat 3, so that the gas flow rate and pressure distribution inside the reaction chamber 1 can be more uniform, thereby improving the uniformity of crystalline silicon thin film deposition.

[0028] In the description of the present utility model, it should be noted that the orientation or position relationship indicated by the terms "center", "upper", "lower", "left", "right", "vertical", "horizontal", "inside", "outside", etc. is based on the orientation or position relationship shown in the drawings, which is only for the convenience of describing the present utility model and simplifying the description, and does not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as a limitation of the present utility model; the terms "first", "second", and "third" are only used for descriptive purposes, and cannot be understood as indicating or implying relative importance. In addition, unless otherwise clearly specified and limited, the terms "installed", "connected", and "connected" should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection, or it can be indirectly connected through an intermediate medium, or it can be the internal communication of two elements. For ordinary technicians in this field, the specific meanings of the above terms in the present utility model can be understood according to specific circumstances. Moreover, the terms "comprises," "comprising," or any other variations thereof are intended to cover non-exclusive inclusion, such that a process, method, article, or apparatus that includes a list of elements includes not only those elements but also other elements not expressly listed, or also includes elements inherent to such process, method, article, or apparatus.

[0029] Although embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that various changes, modifications, substitutions and variations may be made to the embodiments without departing from the principles and spirit of the present invention, and that the scope of the present invention is defined by the appended claims and their equivalents.

Claims

1. A chemical vapor deposition device for preparing a HJT battery thin film, comprising a reaction chamber (1), a nozzle (2) installed at the top of the reaction chamber (1), and a support base (3) installed at the bottom of the reaction chamber (1), characterized in that: A height adjustment mechanism (4) is installed at the bottom of the inner cavity of the reaction chamber (1), and the height adjustment mechanism (4) is used to support and raise the height of the corresponding part of the support seat (3). A lower uniform air cavity (6) is fixedly installed at the bottom of the inner cavity of the reaction chamber (1), and an upper uniform air cavity (7) is movably connected to the top of the lower uniform air cavity (6). An exhaust hole (8) is opened at the top of the upper uniform air cavity (7), and the bottom of the upper uniform air cavity (7) is connected to an exhaust structure. A driving mechanism for driving the upper uniform air cavity (7) to rotate is installed inside the reaction chamber (1).

2. The chemical vapor deposition equipment for preparing HJT battery thin film according to claim 1, characterized in that: The height adjustment mechanism (4) comprises a lower slide frame (401) fixedly mounted on the bottom of the reaction chamber (1); a first support rod (402) is movably sleeved inside the lower slide frame (401); a first slider (403) is movably sleeved on the top of the first support rod (402); an upper slide frame (404) is fixedly mounted on the bottom of the support seat (3); a first slide groove (405) is provided inside the upper slide frame (404); and the first slider (403) is clamped in the first slide groove (405).

3. The chemical vapor deposition equipment for preparing HJT battery thin film according to claim 2, characterized in that: A second slide groove (406) is provided inside the lower slide frame (401), a second slider (407) is clamped inside the second slide groove (406), a second support rod (408) is movably sleeved outside the second slider (407), and the top of the second support rod (408) is movably sleeved with the first slider (403).

4. The chemical vapor deposition equipment for preparing HJT battery thin film according to claim 3, characterized in that: A driving motor 1 (5) is fixedly mounted on one end of the lower slide frame (401) close to the second slide groove (406); a lead screw (501) is connected to the output shaft of the driving motor 1 (5); the lead screw (501) is movably sleeved inside the lower slide frame (401); and the second slider (407) is threadedly sleeved outside the lead screw (501).

5. The chemical vapor deposition equipment for preparing HJT battery thin film according to claim 1, characterized in that: The upper air cavity (7) is in the form of a circular ring structure, the upper air cavity (7) surrounds the outside of the support seat (3), and the air extraction holes (8) are symmetrically distributed about the center of the support seat (3).

6. The chemical vapor deposition equipment for preparing HJT battery thin film according to claim 1, characterized in that: The driving mechanism comprises a second driving motor (11) fixedly mounted at the bottom of the reaction chamber (1), the top of the output shaft of the second driving motor (11) extending into the interior of the reaction chamber (1), a driving wheel (12) fixedly mounted at the top of the output shaft of the second driving motor (11), and the driving wheel (12) being in driving connection with the inner side of the upper air cavity (7).

7. The chemical vapor deposition equipment for preparing HJT battery thin film according to claim 1, characterized in that: The air extraction structure comprises an air extraction pipe (9) connected to the bottom of the upper air cavity (7), the number of the air extraction pipes (9) being two and being symmetrically distributed about the support seat (3), and the bottom of the air extraction pipe (9) being connected to the pump body (10) via a three-way pipe.

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