Air inlet structure and reaction furnace
The air intake structure with dual air intake pipes addresses the issue of poor gas distribution in CVD reactors, enhancing film formation uniformity and stability through multi-directional gas intake, thus meeting industrial production needs.
Patent Information
- Application Number
- CN202420200163.3
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-01-25
- Publication Date
- 2024-12-17
- Estimated Expiration
- 2034-01-25
AI Technical Summary
Conventional tubular CVD equipment suffers from poor uniformity and stability of gas distribution at the furnace mouth, tail, and furnace, leading to poor film formation uniformity and stability, which cannot meet the increasing production capacity requirements of the photovoltaic industry.
An air intake structure for CVD reactors featuring at least two air intake pipes, one at the chamber end and one in the middle space, with ring-shaped cross-sections, allowing multi-directional gas intake to improve uniformity and stability of gas distribution within the chamber.
The improved gas distribution uniformity enhances the stability and uniformity of film formation, meeting the production capacity demands of the photovoltaic industry by optimizing the air intake structure.
Smart Images
Figure CN222182432U_ABST
Abstract
Description
Technical Field
[0001] The present disclosure relates to the technical field of photovoltaic material manufacturing, and in particular to an air intake structure and a reaction furnace. Background Art
[0002] Thin film preparation processes can be divided into two categories according to the film forming method: physical vapor deposition (PVD) and chemical vapor deposition (CVD). CVD is a technology that deposits a thin film on a substrate using a gaseous substance. CVD has the advantages of low precipitation temperature, easy control of film composition and thickness, good film uniformity and repeatability, and good step coverage. Therefore, the CVD process is widely used in the manufacturing fields of large-scale integrated circuits, optoelectronic devices, MEMS, etc. With the development of photovoltaic industry technology and the increasing demand for technology optimization, further optimization of film uniformity has become a top priority.
[0003] The thin film preparation process requires coating equipment. The uniformity of gas distribution in the CVD coating equipment directly affects the uniformity of film formation. Conventional tubular CVD equipment uses the method of air intake at the furnace mouth and exhaust at the furnace tail for coating. Conventional furnace mouth air intake usually only has a separate air intake structure at the furnace mouth position, and the gas at the furnace mouth position is relatively concentrated. With the continuous improvement of the company's industrial development and production capacity requirements, the design of machine furnace tubes has been continuously enlarged and lengthened. The conventional furnace mouth air intake structure has the problem of poor uniformity of gas distribution at the furnace mouth, furnace tail and furnace, resulting in poor uniformity and stability of film formation. Utility Model Content
[0004] In view of this, the embodiments of the present disclosure provide an air intake structure and a reaction furnace, which solve the problem of poor uniformity and stability of film formation due to poor uniformity of gas distribution in the furnace.
[0005] In a first aspect, an embodiment of the present disclosure provides an air intake structure, which is applied to a reaction furnace, wherein the reaction furnace has an elongated chamber, wherein the chamber has a first end and a second end opposite to each other in the length direction of the chamber, and a middle space located between the first end and the second end, and the air intake structure is used to transport process gas into the chamber; wherein the air intake structure comprises: at least two air intake pipes, one of which is arranged at the first end of the chamber, and the other of which is arranged in the middle space of the chamber, each of which has an air intake hole, and the process gas is transported through the air intake pipe and enters the chamber through the air intake hole; wherein the cross-sectional shape of the air intake pipe perpendicular to the length direction of the chamber comprises a ring shape or an open ring shape.
[0006] In some embodiments, the cross-sectional shape of the chamber includes a circle, and the cross-sectional shape of the air inlet pipe in a direction perpendicular to the length of the chamber includes a circular ring or an arc.
[0007] In some embodiments, the air inlet pipe is coaxially arranged with the chamber.
[0008] In some embodiments, the chamber has a bottom surface close to the ground and a top surface away from the ground, and a first side surface and a second side surface connecting the bottom surface and the top surface; wherein, the number of the air inlet holes is multiple, and the multiple air inlet holes are respectively close to the top surface of the chamber, the first side surface of the chamber, and the second side surface of the chamber.
[0009] In some embodiments, distances between adjacent air inlet holes are equal.
[0010] In some embodiments, the air inlet pipe disposed in the middle space of the chamber is located at one third of the chamber close to the first end of the chamber.
[0011] In some embodiments, the reaction furnace includes a furnace tube and a flange mounted on the furnace tube, the furnace tube and the flange form the chamber, and the flange has an air inlet; the air intake structure also includes: a connecting pipe, at least the air intake pipe arranged in the middle space of the chamber is connected to the air inlet through the connecting pipe.
[0012] In some embodiments, the air inlet pipe disposed at the first end of the chamber is installed on the inner wall of the flange, and the air inlet includes a first air inlet and a second air inlet, the first air inlet is connected to the air inlet pipe disposed at the first end of the chamber; the connecting pipe respectively connects the second air inlet and the air inlet pipe disposed in the middle space of the chamber.
[0013] In some embodiments, the reactor further includes: a fixed structure connected to the flange and detachably connected to the air inlet pipe.
[0014] In a second aspect, an embodiment of the present disclosure provides a reaction furnace, comprising: a main body, having a chamber, the chamber having a first end and a second end opposite to each other and a middle space located between the first end and the second end, the exhaust structure of the reaction furnace being arranged at the second end of the chamber; the air intake structure as described in the first aspect is configured to transmit process gas into the chamber.
[0015] The air intake structure provided by the embodiment of the present disclosure is applied to a reactor. The reactor has a long chamber. In the length direction of the chamber, the chamber has a first end and a second end opposite to each other and a middle space between the first end and the second end. The air intake structure is used to transport process gas into the chamber. The air intake structure includes: at least two air intake pipes. One air intake pipe is arranged at the first end of the chamber, and the other air intake pipe is arranged in the middle space of the chamber. Each air intake pipe has an air intake hole, and the process gas is transmitted through the air intake pipe and enters the chamber through the air intake hole. The cross-sectional shape of the air intake pipe perpendicular to the length direction of the chamber includes a ring or an open ring. Through at least two air intake pipes and the air intake holes on the air intake pipes, multi-directional simultaneous air intake in the chamber is achieved, the uniformity of gas distribution at the first end and the second end and the middle space of the chamber is improved, and then the uniformity and stability of film formation are improved. BRIEF DESCRIPTION OF THE DRAWINGS
[0016] Figure 1 Shown is a schematic structural diagram of a reaction furnace provided in one embodiment of the present disclosure.
[0017] Figure 2 Shown is a cross-sectional view of a flange and a furnace tube provided in one embodiment of the present disclosure.
[0018] Figure 3 Shown is a schematic structural diagram of a reaction furnace provided by an embodiment of the present disclosure that does not include furnace tubes.
[0019] Figure 4 Shown is a front view of a flange and an air inlet pipe on the flange provided in an embodiment of the present disclosure.
[0020] Figure 5 Shown is a schematic diagram of the explosion structure of a reactor provided in one embodiment of the present disclosure.
[0021] Figure 6 Shown is a schematic structural diagram of a flange provided in an embodiment of the present disclosure.
[0022] Reference numerals:
[0023] 1. Reactor; 10. Air intake structure; 100. Air intake pipe; 101. First air intake pipe; 102. Second air intake pipe; 110. Air intake hole; 120. Main air intake port; 200. Connecting pipe; 20. Chamber; 201. First end of chamber; 202. Second end of chamber; 203. Middle space of chamber; 204. Bottom of chamber; 205. Top of chamber; 206. First side of chamber; 207. Second side of chamber; 300. Fixed structure; 310. Fixed shaft; 320. Fixed sheet; 30. Furnace tube; 40. Flange; 410. Air intake port; 411. First air intake port; 412. Second air intake port; 50. Air intake main pipe; 510. First air intake main pipe; 520. Second air intake main pipe. DETAILED DESCRIPTION
[0024] The following will be combined with the drawings in the embodiments of the present disclosure to clearly and completely describe the technical solutions in the embodiments of the present disclosure. Obviously, the described embodiments are only part of the embodiments of the present disclosure, not all of the embodiments. Based on the embodiments in the present disclosure, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present disclosure.
[0025] Thin film preparation processes can be divided into two categories according to the film forming method: physical vapor deposition (PVD) and chemical vapor deposition (CVD). PVD is a technology that uses physical methods to achieve material transfer, that is, evaporating or sputtering materials from the source, transferring atoms or molecules to the surface of the substrate to deposit a thin film. CVD is a technology that deposits a thin film on a substrate using gaseous substances. Compared with PVD, CVD has the advantages of low precipitation temperature, easy control of film composition and thickness, good film uniformity and repeatability, and good step coverage. Therefore, the CVD process is widely used in the manufacturing fields of large-scale integrated circuits, optoelectronic devices, MEMS, etc. Plasma Enhanced Chemical Vapor Deposition (PECVD) is a type of CVD. The low precipitation temperature is the most prominent advantage of PECVD. Therefore, PECVD has a wider range of applications. With the development of photovoltaic industry technology and the increasing demand for technology optimization, further optimization of film uniformity has become a top priority.
[0026] The thin film preparation process requires the use of coating equipment. The uniformity of gas distribution in the CVD coating equipment directly affects the uniformity of film formation. Conventional tubular CVD equipment uses the method of intake at the furnace mouth and exhaust at the furnace tail for coating. Conventional furnace mouth air intake usually only has a separate air intake structure at the furnace mouth position, and the gas at the furnace mouth position is relatively concentrated. With the continuous improvement of the company's industrial development and production capacity requirements, the design of machine furnace tubes has been continuously enlarged and lengthened. The conventional furnace mouth air intake structure has the problem of poor uniformity of gas distribution at the furnace mouth, furnace tail and furnace, resulting in poor uniformity and stability of film formation, which cannot meet the company's production capacity requirements.
[0027] In response to the above problems, the embodiments of the present disclosure provide an air intake optimization solution suitable for PECVD equipment, so as to further optimize the uniformity of gas distribution at the furnace mouth and furnace tail as well as in the furnace, so as to improve the uniformity and stability of film formation, thereby meeting the enterprise's production capacity requirements.
[0028] The air intake structure provided by the embodiment of the present disclosure is applied to a reactor. The reactor has a long chamber. In the length direction of the chamber, the chamber has a first end and a second end opposite to each other and a middle space between the first end and the second end. The air intake structure is used to transport process gas into the chamber. The air intake structure includes: at least two air intake pipes. One air intake pipe is arranged at the first end of the chamber, and the other air intake pipe is arranged in the middle space of the chamber. Each air intake pipe has an air intake hole, and the process gas is transmitted through the air intake pipe and enters the chamber through the air intake hole. The cross-sectional shape of the air intake pipe perpendicular to the length direction of the chamber includes a ring or an open ring. Through at least two air intake pipes and the air intake holes on the air intake pipes, simultaneous air intake in multiple positions and directions in the chamber is achieved, thereby improving the uniformity of the gas concentration at the first end and the second end and the middle space of the chamber, thereby improving the uniformity and stability of the film formation.
[0029] The specific structure of the air intake structure is described below in conjunction with the embodiments.
[0030] Figure 1 Shown is a schematic structural diagram of a reaction furnace provided in one embodiment of the present disclosure. Figure 2 Shown is a cross-sectional view of a chamber provided in accordance with an embodiment of the present disclosure. Figure 3 Shown is a schematic structural diagram of a reaction furnace provided by an embodiment of the present disclosure that does not include furnace tubes. Figure 4 FIG. 1 is a front view of a flange and an air inlet pipe on the flange provided by an embodiment of the present disclosure. Figures 1 to 4 As shown, the air intake structure 10 is applied to a reactor 1. The reactor 1 has a long chamber 20. In the length direction of the chamber 20, the chamber 20 has a first end 201 and a second end 202 opposite to each other and a middle space 203 between the first end 201 and the second end 202. The exhaust structure of the reactor 1 is arranged at the second end 202 of the chamber 20. The air intake structure 10 is used to transmit process gas into the chamber 20. Among them, the air intake structure 10 includes: at least two air intake pipes 100. One air intake pipe 100 is arranged at the first end 201 of the chamber 20, and the other air intake pipe 100 is arranged in the middle space 203 of the chamber 20. Each air intake pipe 100 has an air intake hole 110, and the process gas is transmitted through the air intake pipe 100 and enters the chamber 20 through the air intake hole 110. The cross-sectional shape of the air intake pipe 100 perpendicular to the length direction of the chamber 20 includes a ring or an open ring. By arranging the air inlet pipe 100 at the first end 201 and the middle space 203 of the chamber 20, air can be simultaneously introduced into the first end 201 and the middle space 203 of the chamber 20, thereby improving the air intake efficiency, reducing the distribution distance of the process gas entering the chamber 20, and improving the distribution uniformity of the process gas.
[0031] The process gas enters the chamber 20 through the air inlet holes 110 of at least two air inlet pipes 100, respectively. The process gas entering the chamber 20 from the air inlet hole 110 of the air inlet pipe 100 disposed at the first end 201 of the chamber 20 flows from the first end 201 of the chamber 20 to the middle space 203 of the chamber 20, then flows to the second end 202 of the chamber 20, and is discharged from the chamber 20 through the exhaust structure. The process gas entering the chamber 20 from the air inlet hole 110 of the air inlet pipe 100 disposed at the middle space 203 of the chamber 20 flows from the middle space 203 of the chamber 20 to the second end 202 of the chamber 20, and is discharged from the chamber 20 through the exhaust structure.
[0032] The shape of the cross section of the chamber 20 can be circular, rectangular, or other shapes. According to the length of the chamber 20, a plurality of air inlet pipes 100 can be arranged in the chamber 20. There can be two or three air inlet pipes 100, or even more than three. The arrangement positions of the plurality of air inlet pipes 100 in the chamber 20 can be adjusted as needed. The plurality of air inlet pipes 100 can be arranged in the middle space 203 of the chamber 20, and can be arranged between one third and one half of the chamber 20 near the first end 201 of the chamber 20. The spacing between adjacent air inlet pipes 100 can be the same or different, as long as the uniformity of the gas distribution in the chamber 20 is optimal.
[0033] The air inlet pipe 100 is provided with an air inlet main port 120. The air inlet main port 120 is provided outside the reaction furnace 1. The air inlet main port 120 is connected to the air inlet main pipe 50. The air inlet device passes the process gas into the air inlet pipe 100 through the air inlet main pipe 50 and the air inlet main port 120, and enters the chamber 20 through the air inlet hole 110 of the air inlet pipe 100.
[0034] The main air inlet port 120 is fixed to the main air inlet pipe 50. The main air inlet port 120 may be non-detachably connected to the main air inlet pipe 50 by welding, bonding, etc., or the main air inlet port 120 may be detachably connected to the main air inlet pipe 50 by bolts, nuts, screws, buckles, magnetism, etc.
[0035] A plurality of air inlet holes 110 may be provided on the air inlet pipe 100. The number of air inlet holes 110 on different air inlet pipes 100 may be the same or different. The distances between adjacent air inlet holes 110 on the same air inlet pipe 100 may be equal or different. The plurality of air inlet holes 110 may be used to divert the process gas, reduce the impact of the process gas on the air inlet in the chamber 20, and improve the uniformity of the process gas deposition film.
[0036] The cross-sectional shape of the air inlet 110 may be circular, rectangular, or other polygonal or irregular shapes. The shape of the air inlet 110 is not specifically limited in this embodiment.
[0037] The directions of each air inlet hole 110 on the same air inlet pipe 100 may be the same or different. The directions of the air inlet holes 110 on different air inlet pipes 100 may be the same or different.
[0038] The diameters of the air inlet holes 110 on the same air inlet pipe 100 may be the same or different. The diameters of the air inlet holes 110 on different air inlet pipes 100 may be the same or different.
[0039] The air intake structure 10 provided in the embodiment of the present disclosure is applied to a reactor 1. The reactor 1 has a long chamber 20. In the length direction of the chamber 20, the chamber 20 has a first end 201 and a second end 202 opposite to each other and a middle space 203 located between the first end 201 and the second end 202. The air intake structure 10 is used to transmit process gas into the chamber 20. The air intake structure 10 includes: at least two air intake pipes 100. One air intake pipe 100 is arranged at the first end 201 of the chamber 20, and the other air intake pipe 100 is arranged in the middle space 203 of the chamber 20. Each air intake pipe 100 has an air intake hole 110, and the process gas is transmitted through the air intake pipe 100 and enters the chamber 20 through the air intake hole 110. The cross-sectional shape of the air intake pipe 100 perpendicular to the length direction of the chamber 20 includes a ring or an open ring. By means of at least two air inlet pipes 100 and the air inlet holes 110 on the air inlet pipes 100, air can be simultaneously inhaled at multiple positions and directions in the chamber 20, thereby improving the uniformity of gas concentration at the first end 201 and the second end 202 and the middle space 203 of the chamber 20, and thereby improving the uniformity and stability of film formation.
[0040] In some embodiments, the cross-sectional shape of the air inlet pipe 100 perpendicular to the length direction of the chamber 20 includes an annular shape or an open annular shape. The annular shape may be a circular ring or a rectangular ring, or a ring of other shapes. A plurality of air inlet holes 110 are distributed on the annular air inlet pipe 100 to divert the industrial gas, further improve the uniformity of the air intake, and improve the uniformity and stability of the film formation.
[0041] In some embodiments, the cross-section of the chamber 20 includes a circular shape. The cross-section of the air intake pipe 100 perpendicular to the length of the chamber 20 includes a circular ring or an arc shape. The shape of the air intake pipe 100 is adapted to the shape of the chamber 20 to further improve the uniformity of the air intake.
[0042] In this embodiment, the cross-section of the chamber 20 is circular. The air inlet pipe 100 is an open ring, one end of the open ring is the main air inlet port 120, and the other end is closed. A plurality of air inlet holes 110 are distributed on the open ring air inlet pipe 100. Each air inlet hole 110 on the same air inlet pipe 100 faces the center of the annular air inlet pipe 100.
[0043] In some embodiments, the air inlet pipe 100 is coaxially arranged with the chamber 20. A plurality of air inlet holes 110 are distributed on the air inlet pipe 100, and the air inlet holes 110 are evenly arranged or arranged at a set distance. In this embodiment, the apertures of the air inlet holes 110 on the same air inlet pipe 100 are the same, and the industrial gas enters the chamber 20 from multiple directions, simultaneously, and in the same amount, further improving the uniformity of the air intake.
[0044] In some embodiments, the chamber 20 has a bottom surface 204 close to the ground, a top surface 205 away from the ground, and a first side surface 206 and a second side surface 207 connecting the bottom surface 204 and the top surface 205. There are multiple air inlet holes 110. The multiple air inlet holes 110 are respectively close to the top surface 205 of the chamber 20, the first side surface 206 of the chamber 20, and the second side surface 207 of the chamber 20. The air inlet holes 110 are not provided on the air inlet pipe 100 and close to the bottom surface 204 of the chamber 20, so that the air inlet holes 110 can be prevented from blowing up the deposited particles at the bottom of the chamber 20, thereby avoiding the appearance of black spots on the film-forming surface to ensure the film-forming quality.
[0045] In some embodiments, the distances between adjacent gas inlet holes 110 are equal. That is, the gas inlet holes 110 are evenly distributed on the gas inlet pipe 100, so as to improve the uniformity of the distribution of the process gas in the chamber 20 by using the uniform distribution of multiple gas inlet holes 110, and also improve the uniformity of the industrial gas deposition to ensure the uniformity and stability of the film formation.
[0046] In addition, the distances between adjacent air inlet holes 110 may also be unequal, that is, the air inlet holes 110 are distributed at set intervals on the air inlet pipe 100 to present a local sparse distribution and a local dense distribution.
[0047] Regardless of whether the air inlet holes 110 are evenly distributed on the air inlet pipe 100, or are partially sparsely distributed or locally densely distributed on the air inlet pipe 100, as long as the process gas can be diverted and the impact of the process gas on the air intake in the chamber 20 can be reduced, while ensuring the uniformity of the process gas distribution, the uniformity and stability of the process gas deposition film can be ensured.
[0048] In some embodiments, the air inlet pipe 100 disposed in the middle space 203 of the chamber 20 is located at one third of the chamber 20 near the first end 201 of the chamber 20. Since the flow direction of the process gas is from the first end 201 of the chamber 20 to the second end 202 of the chamber 20, the process gas will eventually converge at the second end 202 of the chamber 20. Therefore, the focus is on further optimizing the distribution uniformity of the industrial gas in the middle space 203 of the chamber 20. Finally, after experimental verification, the air inlet pipe 100 is disposed here, and the distribution uniformity of the industrial gas in the chamber 20 is optimal.
[0049] In some embodiments, the reaction furnace 1 includes a furnace tube 30 and a flange 40 sleeved on the furnace tube 30. The furnace tube 30 and the flange 40 form a chamber 20. The flange 40 has an air inlet 410. The air inlet structure 10 also includes: a connecting pipe 200. The air inlet pipe 100 disposed at least in the middle space 203 of the chamber 20 is connected to the air inlet 410 through the connecting pipe 200.
[0050] According to the length of the chamber 20, two or more air inlets 410 may be provided at the bottom of the flange 40. One air inlet 410 is connected to an air inlet pipe 100. Another air inlet 410 is connected to a connecting pipe 200, and the connecting pipe 200 is connected to another air inlet pipe 100. One air inlet 410 is connected to an air inlet main pipe 50, so as to achieve synchronous air intake to the first end 201 of the chamber 20 and the middle space 203 of the chamber 20 at the same time, so as to improve the air intake rate and air intake uniformity of the chamber 20.
[0051] In this embodiment, Figures 1 to 6 As shown, the flange 40 includes two air inlets 410, namely a first air inlet 411 and a second air inlet 412. Two air inlet pipes 100 are provided, namely a first air inlet pipe 101 and a second air inlet pipe 102. The first air inlet pipe 101 is located at the first end 201 of the chamber 20. The second air inlet pipe 102 is located in the middle space 203 of the chamber 20 and is located at one third of the first end 201 of the chamber 20.
[0052] The first air inlet 411 is connected to the first air inlet pipe 101. The second air inlet 412 is connected to one end of the connecting pipe 200. The other end of the connecting pipe 200 extends along the length direction of the chamber 20. The other end of the connecting pipe 200 is connected to the second air inlet pipe 102. The first air inlet 411 is connected to the first air inlet main pipe 510. The second air inlet 412 is connected to the second air inlet main pipe 520.
[0053] The first air inlet 411 is fixedly connected to the first air inlet pipe 101. The first air inlet 411 may be non-detachably connected to the main air inlet port 120 of the first air inlet pipe 101 by welding, bonding, etc., or the first air inlet 411 may be detachably connected to the main air inlet port 120 of the first air inlet pipe 101 by bolts, nuts, screws, buckles, magnetic attraction, etc. In this embodiment, the first air inlet 411 is connected to the main air inlet port 120 of the first air inlet pipe 101 by an air pipe fixing ring and an air pipe sealing ring to ensure the stability and sealing of the connection.
[0054] One end of the connecting tube 200 is fixedly connected to the second air inlet 412. One end of the connecting tube 200 may be non-detachably connected to the second air inlet 412 by welding, bonding, etc., or one end of the connecting tube 200 may be detachably connected to the second air inlet 412 by bolts, nuts, screws, buckles, magnetic attraction, etc. In this embodiment, one end of the connecting tube 200 is connected to the second air inlet 412 by an air pipe fixing ring and an air pipe sealing ring to ensure the stability and sealing of the connection.
[0055] The other end of the connecting pipe 200 is fixedly connected to the second air intake pipe 102. The other end of the connecting pipe 200 can be non-detachably connected to the air intake main port 120 of the second air intake pipe 102 by welding, bonding, etc., or the other end of the connecting pipe 200 can be detachably connected to the air intake main port 120 of the second air intake pipe 102 by bolts, nuts, screws, buckles, magnetic attraction, etc. In this embodiment, the other end of the connecting pipe 200 is connected to the air intake main port 120 of the second air intake pipe 102 by an air pipe fixing ring and an air pipe sealing ring to ensure the stability and sealing of the connection.
[0056] In some embodiments, the air intake structure 10 further includes a fixing structure 300. The fixing structure 300 is connected to the flange 40 and is detachably connected to the air intake pipe 100.
[0057] In this embodiment, the first air inlet pipe 101 is disposed on the inner wall of the flange 40 , and the first air inlet pipe 101 is fixed by the fixing structure 300 .
[0058] In this embodiment, the fixing structure 300 includes a fixing shaft 310 and a fixing plate 320. The fixing shaft 310 is fixedly connected to the flange 40. The fixing plate 320 is sleeved on the fixing shaft 310 and is rotatably connected to the fixing shaft 310. The fixing plate 320 is crimped to the first air inlet pipe 101.
[0059] like Figure 1 and Figure 2 As shown, the reaction furnace 1 includes: a main body and the air intake structure 10 mentioned in the above embodiment. The main body has a chamber 20. The chamber 20 has a first end 201 and a second end 202 opposite to each other and a middle space 203 located between the first end 201 and the second end 202. The exhaust structure of the reaction furnace 1 is arranged at the second end 202 of the chamber 20. The air intake structure 10 is configured to transmit process gas into the chamber 20. At a specific temperature of the reaction furnace 1, the process gas is deposited on the substrate to form a thin film.
[0060] The phrases "one embodiment", "an embodiment", etc. mentioned in the specification indicate that the embodiment described may include a specific feature, structure or characteristic, but not every embodiment may include the specific feature, structure or characteristic. In addition, such phrases do not necessarily refer to the same embodiment. In addition, when a specific feature, structure or characteristic is described in conjunction with an embodiment, it is within the knowledge of those skilled in the art to implement such feature, structure or characteristic in conjunction with other embodiments, whether explicitly or not explicitly described.
[0061] It should be understood that “on,” “above,” and “over” in this disclosure should be interpreted in the broadest manner, so that “on” not only means “directly on something,” but also includes the meaning of “on something” with intervening features or layers therebetween, and “above” or “over” not only includes the meaning of “above” or “over,” but also may include the meaning of “above” or “over something” with no intervening features or layers therebetween (i.e., directly on something).
[0062] Additionally, spatially relative terms, such as "below," "below," "beneath," "above," "above," etc., may be used herein for ease of description to describe the relationship of one component or feature to other components or features as shown in the figures. The spatially relative terms are intended to encompass different orientations of the component in use or operation in addition to the orientation depicted in the figures. The device may be otherwise oriented (rotated 90 degrees or at other orientations), and the spatially relative descriptors used herein may likewise be interpreted accordingly.
[0063] It should be noted that, in this article, the terms "include", "comprises" or any other variations thereof are intended to cover non-exclusive inclusion, so that a process, method, article or device including a series of elements includes not only those elements, but also other elements not explicitly listed, or also includes elements inherent to such process, method, article or device. In the absence of further restrictions, an element defined by the sentence "comprises a ..." does not exclude the existence of other identical elements in the process, method, article or device including the element.
[0064] The above description is only a preferred embodiment of the present disclosure and is not intended to limit the present disclosure. Any modifications, equivalent substitutions, etc. made within the spirit and principles of the present disclosure should be included in the protection scope of the present disclosure.
Claims
1. An air intake structure, characterized in that: Applied to a reaction furnace, the reaction furnace has a long chamber, the chamber has a first end and a second end opposite to each other in the length direction of the chamber, and a middle space located between the first end and the second end, and the air intake structure is used to transmit process gas into the chamber; Wherein, the air intake structure comprises: at least two air inlet pipes, one of which is disposed at the first end of the chamber, and the other of which is disposed in the middle space of the chamber, each of which has an air inlet hole, and the process gas is transmitted through the air inlet pipe and enters the chamber through the air inlet hole; Wherein, the cross-sectional shape of the air inlet pipe in a direction perpendicular to the length of the chamber includes a ring or an open ring.
2. The air intake structure according to claim 1, characterized in that: The cross-sectional shape of the chamber includes a circle, and the cross-sectional shape of the air inlet pipe in a direction perpendicular to the length of the chamber includes a circular ring or an arc.
3. The air intake structure according to claim 2, characterized in that: The air inlet pipe is coaxially arranged with the chamber.
4. The air intake structure according to any one of claims 1 to 3, characterized in that: The chamber has a bottom surface close to the ground and a top surface away from the ground, and a first side surface and a second side surface connecting the bottom surface and the top surface; There are multiple air inlet holes, and the multiple air inlet holes are respectively close to the top surface of the chamber, the first side surface of the chamber, and the second side surface of the chamber.
5. The air intake structure according to claim 4, characterized in that: The distances between adjacent air inlet holes are equal.
6. The air intake structure according to any one of claims 1 to 3, characterized in that: The air inlet pipe disposed in the middle space of the chamber is located at one third of the chamber close to the first end of the chamber.
7. The air intake structure according to any one of claims 1 to 3, characterized in that: The reaction furnace comprises a furnace tube and a flange sleeved on the furnace tube, the furnace tube and the flange form the chamber, and the flange has an air inlet; The air intake structure further comprises: A connecting pipe, at least the air inlet pipe arranged in the middle space of the chamber is connected to the air inlet through the connecting pipe.
8. The air intake structure according to claim 7, characterized in that: The air inlet pipe arranged at the first end of the chamber is installed on the inner wall of the flange, and the air inlet includes a first air inlet and a second air inlet, the first air inlet is connected to the air inlet pipe arranged at the first end of the chamber; the connecting pipe respectively connects the second air inlet and the air inlet pipe arranged in the middle space of the chamber.
9. The air intake structure according to claim 8, characterized in that: Also includes: A fixing structure is connected to the flange and is detachably connected to the air inlet pipe.
10. A reactor, characterized in that: include: a body having a chamber having opposing first and second ends and a central space between the first and second ends; The gas inlet structure according to any one of claims 1 to 9, configured to deliver process gas into the chamber.