Universal alignment mechanism and photoetching machine

Abstract

The utility model relates to the technical field of semiconductor equipment, and particularly discloses a universal alignment mechanism and a photoetching machine, the universal alignment mechanism comprises a support column, a bearing table and a pushing assembly, the supporting column can be arranged on the workbench, and the bearing table is arranged on the supporting column. The bearing table is provided with a main channel and a branch channel which are communicated with each other, and the supporting column is provided with an inner channel communicated with the branch channel; a first mounting hole and a second mounting hole are formed in the bearing table, the first mounting hole communicates with the main channel, and the second mounting hole communicates with the branch channel; the first mounting hole is detachably connected with a first plugging piece; the second mounting hole is detachably connected with a second plugging piece or a communicating piece; the pushing assembly is arranged on the bearing table and comprises an air cylinder, and the air cylinder communicates with the main channel. The universal alignment mechanism disclosed by the utility model can be suitable for various types of photoetching machines, so that the processing cost and the time cost required by supplement when spare parts are missing are reduced, and the universal alignment mechanism can be temporarily called from other machines in case of urgent need.

Description

Technical Field

[0001] The utility model relates to the technical field of semiconductor equipment, in particular to a universal alignment mechanism and a photolithography machine. Background Art

[0002] A photolithography machine is a commonly used device in the semiconductor industry, used to transfer circuit patterns onto semiconductor chips. When manufacturing chips, a photolithography machine is needed to "plate" the circuit pattern onto the surface of the chip for subsequent processing. The alignment mechanism is a component in the photolithography machine that is used to push the wafer and position the wafer.

[0003] In the prior art, due to the differences in the cylinder gas supply methods and frame structures of different models, the alignment mechanism is only applicable to the corresponding model of lithography machine. When replenishing the alignment mechanism of two different models of lithography machines, due to the structural differences, both self-processing and spot purchase involve two models, which not only makes it difficult to find the source of supply but also prolongs the replenishment process, resulting in a waste of time. Utility Model Content

[0004] The purpose of the utility model is to provide a universal alignment mechanism and a photolithography machine, so as to solve the problem in the prior art that when replenishing the alignment mechanisms of two different types of photolithography machines, due to the structural differences, two models must be involved whether it is self-processing or purchasing off-the-shelf, which not only makes it difficult to find the source of supply but also prolongs the replenishment process, thereby causing a waste of time.

[0005] In order to achieve the above purpose, the utility model adopts the following technical solutions:

[0006] On the one hand, the utility model provides a universal alignment mechanism, which includes:

[0007] A support column and a bearing platform, wherein the support column can be arranged on a workbench, and the bearing platform is arranged on the support column; the bearing platform has a main channel and a branch channel that are interconnected, and the support column has an inner channel, and the inner channel is connected to the branch channel; the bearing platform is provided with a first mounting hole and a second mounting hole, and the first mounting hole is connected to the main channel, and the second mounting hole is connected to the branch channel; the first mounting hole is detachably connected to a first blocking piece, and the first blocking piece is used to block the first mounting hole; the second mounting hole is detachably connected to a second blocking piece or a connecting piece, and the second blocking piece is used to block the branch channel, and the connecting piece is used to connect the main channel and the inner channel;

[0008] A pushing component is arranged on the supporting platform, and the pushing component comprises a cylinder, and the cylinder is connected to the main channel.

[0009] As an optional scheme of the above-mentioned universal alignment mechanism, the above-mentioned first blocking member, the above-mentioned second blocking member and the above-mentioned connecting member all have external threads, the above-mentioned first mounting hole and the above-mentioned second mounting hole all have internal threads, the above-mentioned first blocking member is threadedly connected to the above-mentioned first mounting hole, and the above-mentioned second blocking member or the above-mentioned connecting member is threadedly connected to the above-mentioned second mounting hole.

[0010] As an optional scheme of the above-mentioned universal alignment mechanism, the above-mentioned pushing assembly also includes a pushing member, which is located on one side of the above-mentioned supporting platform along the first direction; the driving end of the above-mentioned cylinder is connected to the above-mentioned pushing member, for driving the above-mentioned pushing member to move along the above-mentioned first direction; the above-mentioned pushing member is used to push the wafer.

[0011] As an optional scheme of the above-mentioned universal alignment mechanism, the above-mentioned pushing assembly also includes a limit member and a travel rod, the above-mentioned limit member is located on the other side of the above-mentioned supporting platform along the above-mentioned first direction away from the above-mentioned pushing member; the two ends of the above-mentioned travel rod along the above-mentioned first direction are respectively connected to the above-mentioned pushing member and the above-mentioned limit member.

[0012] As an optional solution of the universal alignment mechanism, the pushing assembly further comprises a linear bearing, the linear bearing is disposed on the supporting platform, and the travel rod is movably disposed in the linear bearing along the first direction.

[0013] As an optional scheme of the above-mentioned universal alignment mechanism, the above-mentioned travel rod and the above-mentioned linear bearing each include at least two, at least two of the above-mentioned travel rods and at least two of the above-mentioned linear bearings are arranged in a one-to-one correspondence, and at least two of the above-mentioned linear bearings are located on opposite sides of the above-mentioned support platform along the second direction.

[0014] As an optional scheme of the above-mentioned universal alignment mechanism, the above-mentioned pushing assembly also includes an adjustment block and a stroke adjustment member, the above-mentioned adjustment block is connected to the above-mentioned limit member through the above-mentioned stroke adjustment member, and the above-mentioned adjustment block and the above-mentioned supporting platform are arranged opposite to each other along the above-mentioned first direction; the above-mentioned stroke adjustment member is used to adjust the spacing of the above-mentioned adjustment block relative to the above-mentioned supporting platform along the above-mentioned first direction.

[0015] As an optional solution of the universal alignment mechanism, the pushing assembly further includes an elastic member, two ends of which are respectively connected to the supporting platform and the limiting member, and the elastic member is used for elastically resetting the limiting member.

[0016] As an optional scheme of the above-mentioned universal alignment mechanism, the above-mentioned universal alignment mechanism also includes a positioning adjustment member, which is movably arranged on the above-mentioned supporting platform along the first direction, and one end of the above-mentioned positioning adjustment member can abut against the above-mentioned support column for adjusting the spatial position of the above-mentioned support column relative to the above-mentioned supporting platform.

[0017] On the other hand, the utility model provides a photolithography machine, comprising the universal alignment mechanism as described above, wherein the photolithography machine further comprises a workbench, and the support column is arranged on the workbench.

[0018] The beneficial effects of the utility model are:

[0019] The universal alignment mechanism includes a support column, a bearing platform and a pushing assembly, wherein the support column can be arranged on a workbench, the bearing platform is arranged on the support column, and the pushing assembly is arranged on the bearing platform. The bearing platform has a main channel and a branch channel connected to each other, the support column has an inner channel, the inner channel is connected to the branch channel, and the pushing assembly includes a cylinder, the cylinder is connected to the main channel, so that the inner channel, the branch channel and the main channel can form an air path connected to the cylinder. The support platform is provided with a first mounting hole and a second mounting hole, the first mounting hole is connected to the main channel, and the second mounting hole is connected to the branch channel, wherein the first mounting hole is detachably connected to the first blocking piece, and the first blocking piece is used to block the first mounting hole, and the second mounting hole is detachably connected to the second blocking piece or the connecting piece, the second blocking piece is used to block the branch channel, and the connecting piece is used to connect the main channel and the inner channel, so that when the first mounting hole is blocked by the first blocking piece and the main channel and the inner channel are connected by the connecting piece, the external air pipe can be connected to the inner channel from the workbench to supply air to the cylinder through the inner channel, the branch channel and the main channel; when the branch channel is blocked by the second blocking piece, the external air pipe can be directly connected to the main channel through the first mounting hole to supply air to the cylinder, so that the universal alignment mechanism has two air supply modes, which is suitable for various models of lithography machines, which not only reduces the processing cost and time cost required for replenishment when spare parts are missing, but also can temporarily call the universal alignment mechanism from other machines in urgent situations. BRIEF DESCRIPTION OF THE DRAWINGS

[0020] Figure 1 A schematic diagram of the structure of the universal alignment mechanism provided in the embodiment of the utility model Figure 1 ;

[0021] Figure 2 A schematic diagram of the structure of the universal alignment mechanism provided in the embodiment of the utility model Figure 2 ;

[0022] Figure 3 This is a schematic structural diagram of some universal alignment mechanisms provided in embodiments of the utility model.

[0023] In the figure:

[0024] 1. Support column; 11. Inner channel; 2. Carrying platform; 21. Main channel; 22. Branch channel; 23. First mounting hole; 24. Second mounting hole; 3. First blocking member; 4. Second blocking member; 5. Connecting member; 6. Pushing assembly; 61. Cylinder; 62. Pushing member; 63. Limiting member; 64. Travel rod; 65. Linear bearing; 66. Adjusting block; 67. Travel adjusting member; 68. Elastic member; 7. Positioning adjusting member. DETAILED DESCRIPTION

[0025] The technical solution of the utility model will be described clearly and completely below in conjunction with the accompanying drawings. Obviously, the described embodiments are part of the embodiments of the utility model, not all of the embodiments. Based on the embodiments of the utility model, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the utility model.

[0026] In the description of the present utility model, it should be noted that the orientation or positional relationship indicated by the terms "center", "up", "down", "left", "right", "vertical", "horizontal", "inside", "outside", etc. is based on the orientation or positional relationship shown in the drawings, and is only for the convenience of describing the present utility model and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as a limitation on the present utility model. In addition, the terms "first" and "second" are only used for descriptive purposes and cannot be understood as indicating or implying relative importance. Among them, the terms "first position" and "second position" are two different positions, and the first feature "above", "above" and "above" the second feature include the first feature being directly above and obliquely above the second feature, or simply indicates that the first feature is higher in level than the second feature. The first feature "below", "below" and "below" the second feature include the first feature being directly below and obliquely below the second feature, or simply indicates that the first feature is lower in level than the second feature.

[0027] In the description of the present invention, it should be noted that, unless otherwise clearly specified and limited, the terms "installation", "connection" and "connection" should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection, or it can be indirectly connected through an intermediate medium, or it can be the internal communication of two components. For ordinary technicians in this field, the specific meanings of the above terms in the present invention can be understood according to specific circumstances.

[0028] The embodiments of the present invention are described in detail below, and examples of the embodiments are shown in the accompanying drawings, wherein the same or similar reference numerals throughout represent the same or similar elements or elements having the same or similar functions. The embodiments described below with reference to the accompanying drawings are exemplary and are only used to explain the present invention, and cannot be understood as limiting the present invention.

[0029] The utility model provides a universal alignment mechanism, which is used for pushing a wafer to position the wafer.

[0030] like Figure 1 to Figure 3 As shown, the universal alignment mechanism includes a support column 1, a bearing platform 2 and a pushing assembly 6. The support column 1 can be arranged on a workbench, the bearing platform 2 is arranged on the support column 1, and the pushing assembly 6 is arranged on the bearing platform 2. The bearing platform 2 has a main channel 21 and a branch channel 22 that are interconnected, the support column 1 has an inner channel 11, the inner channel 11 is connected to the branch channel 22, and the pushing assembly 6 includes a cylinder 61, the cylinder 61 is connected to the main channel 21, so that the inner channel 11, the branch channel 22 and the main channel 21 can form an air path connecting the cylinder 61. Optionally, the universal alignment mechanism also includes a positioning adjustment member 7, the positioning adjustment member 7 is movably arranged on the bearing platform 2 along a first direction (i.e., the X direction in the figure), one end of the positioning adjustment member 7 can abut against the support column 1, and is used to adjust the spatial position of the support column 1 relative to the bearing platform 2, so that after adjusting the position of the positioning adjustment member 7, the positioning adjustment member 7 can be made to abut the support column 1, so that the relative position of the support column 1 and the bearing platform 2 is finely adjusted, thereby meeting the actual working condition requirements.

[0031] The support platform 2 is provided with a first mounting hole 23 and a second mounting hole 24, wherein the first mounting hole 23 is connected to the main channel 21, and the second mounting hole 24 is connected to the branch channel 22, wherein the first mounting hole 23 is detachably connected to the first blocking member 3, and the first blocking member 3 is used to block the first mounting hole 23, and the second mounting hole 24 is detachably connected to the second blocking member 4 or the connecting member 5, and the second blocking member 4 is used to block the branch channel 22, and the connecting member 5 is used to connect the main channel 21 and the inner channel 11, so that when the first mounting hole 23 is blocked by the first blocking member 3, the main channel 21 and the inner channel 11 are connected by the connecting member 5. 1, the external air pipe can be connected to the inner channel 11 from the workbench to supply air to the cylinder 61 through the inner channel 11, the branch channel 22 and the main channel 21; when the branch channel 22 is blocked by the second blocking member 4, the external air pipe can be directly connected to the main channel 21 through the first mounting hole 23 to supply air to the cylinder 61, so that the universal alignment mechanism has two air supply modes, which is suitable for various types of photolithography machines, reducing the processing cost and time cost required for replenishment when spare parts are missing, and can also temporarily call the universal alignment mechanism from other machines in urgent need. Among them, the connecting member 5 has a connecting channel connecting the main channel 21 and the inner channel 11.

[0032] Specifically, the first blocking member 3, the second blocking member 4 and the connecting member 5 all have external threads, the first mounting hole 23 and the second mounting hole 24 all have internal threads, the first blocking member 3 is threadedly connected to the first mounting hole 23, and the second blocking member 4 or the connecting member 5 is threadedly connected to the second mounting hole 24, so that the connection sealing between the first blocking member 3 and the first mounting hole 23, the second blocking member 4 and the second mounting hole 24, and the connecting member 5 and the second mounting hole 24 can be improved through the threaded connection to prevent gas leakage. Optionally, after the connecting member 5 is connected to the second mounting hole 24, sealing gaskets are provided at both ends of the connecting member 5, so as to further improve the sealing.

[0033] Furthermore, the pushing assembly 6 also includes a push piece 62, which is located on one side of the carrier 2 along the first direction, and the driving end of the cylinder 61 is connected to the push piece 62, which is used to drive the push piece 62 to move along the first direction, and the push piece 62 is used to push the wafer, so that under the action of the cylinder 61 driving the push piece 62, the automation of wafer movement and positioning can be achieved, wherein the push piece 62 is connected to a pusher for pushing the wafer. At the same time, the pushing assembly 6 also includes a limiter 63 and a travel rod 64, and the limiter 63 is located on the other side of the carrier 2 along the first direction away from the push piece 62, and the two ends of the travel rod 64 along the first direction are respectively connected to the push piece 62 and the limiter 63, so that through the setting of the limiter 63, the moving stroke of the push piece 62 can be limited to avoid excessive moving stroke of the push piece 62 and damage to the wafer.

[0034] like Figure 3 As shown, the pushing assembly 6 also includes a linear bearing 65, which is arranged on the supporting platform 2, and the travel rod 64 is movably arranged in the linear bearing 65 along the first direction, so that the linear bearing 65 can ensure the stability of the movement of the travel rod 64 and prevent the push member 62 from shaking and position shifting. Optionally, the travel rod 64 and the linear bearing 65 each include at least two, at least two travel rods 64 and at least two linear bearings 65 are arranged one by one, and at least two linear bearings 65 are located on opposite sides of the supporting platform 2 along the second direction (i.e., the Y direction in the figure), so as to further improve the stability of the movement of the travel rod 64. Among them, the first direction and the second direction are arranged perpendicular to each other.

[0035] like Figure 1 and Figure 2As shown, the pushing assembly 6 also includes an adjustment block 66 and a stroke adjustment member 67. The adjustment block 66 is connected to the limit member 63 through the stroke adjustment member 67, and the adjustment block 66 is arranged relative to the bearing platform 2 along the first direction. The stroke adjustment member 67 is used to adjust the spacing of the adjustment block 66 relative to the bearing platform 2 along the first direction, so that after adjusting the position of the adjustment block 66, the moving stroke of the push member 62 can be adjusted to meet the actual working condition requirements. At the same time, the pushing assembly 6 also includes an elastic member 68, the two ends of the elastic member 68 are respectively connected to the bearing platform 2 and the limit member 63, and the elastic member 68 is used to elastically reset the limit member 63, so that the push member 62 returns to its position.

[0036] The present embodiment also provides a photolithography machine, comprising the universal alignment mechanism as described above, the photolithography machine also comprising a workbench, and the support column 1 is arranged on the workbench, so that the photolithography machine can reduce the processing cost and time cost required for replenishing spare parts when they are missing by using the universal alignment mechanism, and the photolithography machine can temporarily call the universal alignment mechanism from other models of machines to deal with emergencies.

[0037] Obviously, the above embodiments of the present invention are merely examples for clearly illustrating the present invention, and are not intended to limit the implementation methods of the present invention. For those skilled in the art, other different forms of changes or modifications can be made based on the above description. It is not necessary and impossible to list all implementation methods here. Any modifications, equivalent substitutions, and improvements made within the spirit and principles of the present invention shall be included in the protection scope of the claims of the present invention.

Claims

1. A universal alignment mechanism, characterized in that: include: A support column (1) and a bearing platform (2), wherein the support column (1) can be arranged on a workbench, and the bearing platform (2) is arranged on the support column (1); the bearing platform (2) has a main channel (21) and a branch channel (22) that are connected to each other, and the support column (1) has an inner channel (11), and the inner channel (11) is connected to the branch channel (22); the bearing platform (2) is provided with a first mounting hole (23) and a second mounting hole (24), and the first mounting hole (23) is connected to the main channel (21) and the branch channel (22) The first mounting hole (23) is detachably connected to a first blocking member (3), and the first blocking member (3) is used to block the first mounting hole (23); the second mounting hole (24) is detachably connected to a second blocking member (4) or a connecting member (5), and the second blocking member (4) is used to block the branch channel (22), and the connecting member (5) is used to connect the main channel (21) and the inner channel (11); A pushing component (6), wherein the pushing component (6) is arranged on the supporting platform (2), and the pushing component (6) comprises a cylinder (61), and the cylinder (61) is connected to the main channel (21).

2. The universal alignment mechanism according to claim 1, characterized in that: The first blocking member (3), the second blocking member (4) and the connecting member (5) all have external threads, the first mounting hole (23) and the second mounting hole (24) all have internal threads, the first blocking member (3) is threadedly connected to the first mounting hole (23), and the second blocking member (4) or the connecting member (5) is threadedly connected to the second mounting hole (24).

3. The universal alignment mechanism according to claim 1, characterized in that: The pushing component (6) also includes a pushing member (62), and the pushing member (62) is located on one side of the supporting platform (2) along the first direction; the driving end of the cylinder (61) is connected to the pushing member (62) and is used to drive the pushing member (62) to move along the first direction; the pushing member (62) is used to push the wafer.

4. The universal alignment mechanism according to claim 3, characterized in that: The pushing assembly (6) further comprises a limit member (63) and a travel rod (64); the limit member (63) is located on the other side of the supporting platform (2) away from the push member (62) along the first direction; and the two ends of the travel rod (64) along the first direction are respectively connected to the push member (62) and the limit member (63).

5. The universal alignment mechanism according to claim 4, characterized in that: The pushing assembly (6) further comprises a linear bearing (65), wherein the linear bearing (65) is arranged on the supporting platform (2), and the travel rod (64) is movably arranged in the linear bearing (65) along the first direction.

6. The universal alignment mechanism according to claim 5, characterized in that: The travel rod (64) and the linear bearing (65) each include at least two, the at least two travel rods (64) and the at least two linear bearings (65) are arranged in a one-to-one correspondence, and the at least two linear bearings (65) are located on opposite sides of the supporting platform (2) along the second direction.

7. The universal alignment mechanism according to claim 4, characterized in that: The pushing assembly (6) further comprises an adjusting block (66) and a stroke adjusting member (67); the adjusting block (66) is connected to the limiting member (63) via the stroke adjusting member (67); and the adjusting block (66) and the supporting platform (2) are arranged opposite to each other along the first direction; the stroke adjusting member (67) is used to adjust the spacing between the adjusting block (66) and the supporting platform (2) along the first direction.

8. The universal alignment mechanism according to claim 4, characterized in that: The pushing assembly (6) further comprises an elastic member (68), two ends of the elastic member (68) are respectively connected to the supporting platform (2) and the limiting member (63), and the elastic member (68) is used for elastically resetting the limiting member (63).

9. The universal alignment mechanism according to claim 1, characterized in that: The universal alignment mechanism also includes a positioning adjustment member (7), which is movably arranged on the support platform (2) along a first direction, and one end of the positioning adjustment member (7) can abut against the support column (1) to adjust the spatial position of the support column (1) relative to the support platform (2).

10. A photolithography machine, characterized in that: It comprises the universal alignment mechanism as claimed in any one of claims 1 to 9, the lithography machine further comprises a workbench, and the support column (1) is arranged on the workbench.

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