Surface polishing equipment

Abstract

The utility model belongs to the technical field of machining equipment, and particularly relates to surface polishing equipment which comprises a machine body, a surface polishing device, a polishing device and a polishing device. The supporting part is arranged on the working table; the lifting rotating mechanism is arranged on the supporting part; the polishing disc is arranged on the lifting rotating mechanism; the polishing agent dispersing mechanism is arranged on the polishing surface of the polishing disc and is used for uniformly dispersing a polishing agent; the polishing agent recycling mechanism is arranged in the machine body and used for recycling the used polishing agent; wherein the polishing disc is located above the polishing area, and compared with the prior art, the polishing effect can be effectively improved, and the production cost is reduced.

Description

Technical Field

[0001] The utility model belongs to the technical field of mechanical processing equipment, in particular to a surface polishing equipment. Background Art

[0002] Polishing refers to a processing method that uses mechanical, chemical or electrochemical effects to reduce the surface roughness of a workpiece to obtain a bright and flat surface. It is a modification process of the workpiece surface using polishing tools and abrasive particles or other polishing media. Polishing cannot improve the dimensional accuracy or geometric shape accuracy of the workpiece, but is aimed at obtaining a smooth surface or mirror gloss, and is sometimes used to eliminate gloss. In the prior art, polishing wheels are usually used as polishing tools, and the products are polished one by one manually, such as a surface polishing machine disclosed in the patent with application number CN201410255100.9, which includes an operating box and two sets of polishing devices fixed to the operating box, and the operating box is provided with an exhaust port, and the exhaust port is located between the two sets of polishing devices;

[0003] During the use of existing surface polishing equipment, the polishing agent is not dispersed evenly during the addition process, which reduces the polishing effect and is prone to waste. At the same time, the polishing agent cannot be effectively recovered after use, further increasing the production cost, so it is necessary to make improvements. Utility Model Content

[0004] The purpose of the utility model is to provide a surface polishing device to effectively improve the polishing effect and recycle the polishing agent in view of the above-mentioned existing technical problems.

[0005] In view of this, the utility model provides a surface polishing device, comprising:

[0006] A machine body, wherein a work surface is provided on the machine body, and a polishing area is provided on the work surface;

[0007] A support portion, the support portion being arranged on a work surface;

[0008] A lifting and rotating mechanism, wherein the lifting and rotating mechanism is arranged on the supporting part;

[0009] A polishing disc, wherein the polishing disc is arranged on the lifting and rotating mechanism;

[0010] Also includes:

[0011] A polishing agent dispersing mechanism, wherein the polishing agent dispersing mechanism is arranged on the polishing surface of the polishing disc and is used to evenly disperse the polishing agent;

[0012] A polishing agent recovery mechanism, which is arranged in the machine body and is used to recover the used polishing agent;

[0013] Wherein, the polishing disc is located above the polishing area.

[0014] In the present technical solution, through the setting of the polishing dispersion mechanism, the polishing agent can be evenly dispersed on the polishing surface of the workpiece during the polishing process, thereby effectively improving the polishing effect and making it less likely to waste the polishing agent. Moreover, through the setting of the polishing agent recovery mechanism, the polishing agent can be effectively recovered after use, thereby reducing production costs.

[0015] In the above technical solution, further, the polishing agent dispersing mechanism also includes:

[0016] A dispersion groove, wherein the dispersion groove is in a cross shape;

[0017] A dispersion nozzle, wherein the dispersion nozzle is arranged at the center of the dispersion tank;

[0018] The dispersion groove is arranged on the polishing surface of the polishing disc and extends from the center to the edge of the polishing disc. The dispersion nozzle has four liquid outlets, which respectively correspond to the four extension directions of the dispersion groove.

[0019] In the above technical solution, further, it also includes:

[0020] A liquid blocking sheet, wherein the liquid blocking sheet comprises a plurality of sheets, and the plurality of liquid blocking sheets are evenly spaced and distributed along the extension direction of the dispersion groove;

[0021] The sizes of the plurality of liquid blocking sheets gradually increase from the center to the edge of the polishing plate.

[0022] In the above technical solution, further, the polishing agent recovery mechanism also includes:

[0023] A collecting tank, which is disposed in the machine body and below the polishing area of ​​the work surface;

[0024] A separator, wherein a separation chamber is provided in the separator, a spiral conveying shaft is provided in the separation chamber, a chip discharge port is provided at the bottom of the right end of the separator, and a liquid discharge port is provided at the left end of the separator;

[0025] An electromagnet, which is arranged in the separator and located below the separation chamber;

[0026] Wherein, the separator is arranged at an angle, a leakage hole is arranged on the polishing area, and the separation chamber is communicated with the collection tank.

[0027] In the above technical solution, further, it also includes:

[0028] A ventilation channel is provided on the back side of the polishing disc.

[0029] The beneficial effects of the utility model are:

[0030] 1. Through the setting of the polishing dispersion mechanism, the polishing agent can be evenly dispersed on the polishing surface during the polishing process of the workpiece, thereby effectively improving the polishing effect and not easily wasting the polishing agent;

[0031] 2. Through the setting of the polishing agent recovery mechanism, the polishing agent can be effectively recovered after use, thereby reducing the production cost;

[0032] 3. The setting of ventilation channels can improve the heat dissipation performance of the polishing disc and reduce the overheating of the polishing disc. BRIEF DESCRIPTION OF THE DRAWINGS

[0033] In order to more clearly illustrate the embodiments of the utility model or the technical solutions in the prior art, the drawings required for use in the embodiments or the description of the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the utility model. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying creative labor.

[0034] Figure 1 It is a schematic structural diagram of a specific implementation method of the utility model.

[0035] Figure 2 This is a schematic diagram of the structure of the polishing agent dispersing mechanism of the utility model.

[0036] Figure 3 This is a schematic diagram of the structure of the polishing agent recovery mechanism of the utility model.

[0037] Figure 4 This is a schematic diagram of the structure of the separator of the utility model.

[0038] Figure 5 This is a schematic diagram of the ventilation channel structure of the utility model.

[0039] The symbols in the figure are:

[0040] 1-machine body, 100-polishing area, 2-support part, 3-lifting and rotating mechanism, 4-polishing disc, 5-polishing agent dispersing mechanism, 50-dispersing tank, 51-dispersing nozzle, 52-liquid blocking sheet, 6-polishing agent recovery mechanism, 60-collecting tank, 61-separator, 62-separation chamber, 63-screw conveying shaft, 64-chip discharge port, 65-liquid discharge port, 66-electromagnet, 7-ventilation channel. DETAILED DESCRIPTION

[0041] The following will be combined with the drawings in the embodiments of the utility model to clearly and completely describe the technical solutions in the embodiments of the utility model. Obviously, the described embodiments are only part of the embodiments of the utility model, not all of the embodiments. Based on the embodiments of the utility model, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the utility model.

[0042] In the description of the present application, it should be noted that the terms used herein are only for describing specific embodiments, and are not intended to limit the exemplary embodiments according to the present application. For ease of description, the sizes of the various parts shown in the drawings are not drawn according to the actual proportional relationship. The technology, methods and equipment known to ordinary technicians in the relevant field may not be discussed in detail, but in appropriate cases, the technology, methods and equipment should be regarded as part of the authorization specification. In all examples shown and discussed here, any specific value should be interpreted as merely exemplary, rather than as a limitation. Therefore, other examples of the exemplary embodiments may have different values. It should be noted that similar numbers and letters represent similar items in the following drawings, so once an item is defined in one drawing, it does not need to be further discussed in subsequent drawings.

[0043] Embodiment 1:

[0044] The embodiment of the present application provides a surface polishing device, comprising: a body 1, a work surface is provided on the body 1, and a polishing area 100 is provided on the work surface; a support part 2, the support part 2 is provided on the work surface; a lifting and rotating mechanism 3, the lifting and rotating mechanism 3 is provided on the support part 2; a polishing disc 4, the polishing disc 4 is provided on the lifting and rotating mechanism 3;

[0045] The machine body 1 also includes: a polishing agent dispersing mechanism 5, which is arranged on the polishing surface of the polishing disc 4 and is used to evenly disperse the polishing agent; a polishing agent recovery mechanism 6, which is arranged in the machine body 1 and is used to recover the used polishing agent;

[0046] The polishing plate 4 is located above the polishing area 100 .

[0047] In this embodiment, through the setting of the polishing dispersion mechanism, the polishing agent can be evenly dispersed on the polishing surface of the workpiece during the polishing process, thereby effectively improving the polishing effect and making it less likely to waste the polishing agent. In addition, through the setting of the polishing agent recovery mechanism 6, the polishing agent can be effectively recovered after use, thereby reducing production costs.

[0048] Embodiment 2:

[0049] This embodiment provides a surface polishing device, which, in addition to the technical solutions of the above embodiments, also has the following technical features: the polishing agent dispersing mechanism 5 also includes: a dispersing groove 50, which is in a cross shape; a dispersing nozzle 51, which is arranged at the center of the dispersing groove 50;

[0050] The dispersion groove 50 is disposed on the polishing surface of the polishing disc 4 and extends from the center to the edge of the polishing disc 4 . The dispersion nozzle 51 has four liquid outlets, which correspond to the four extension directions of the dispersion groove 50 .

[0051] The liquid blocking sheet 52 is also included. The liquid blocking sheet 52 has a plurality of sheets. The plurality of liquid blocking sheets 52 are evenly spaced and distributed along the extending direction of the dispersion groove 50.

[0052] The sizes of the plurality of liquid blocking sheets 52 gradually increase from the center to the edge of the polishing plate 4 .

[0053] Moreover, it also includes a polishing agent delivery mechanism, which is a conventional structure, including a polishing agent storage box and a polishing agent delivery pump. The lifting and rotating mechanism 3 is a conventional mechanism, including a lifting motor and a rotating motor. The polishing disc 4 can be connected to the lifting and rotating mechanism 3 in a conventional manner, such as a rotating shaft connected to the polishing disc 4, and a driven bevel gear is provided on the rotating shaft. The driving end of the rotating motor drives the rotating shaft to rotate through the engagement of the active bevel gear and the driven bevel gear. A polishing agent delivery channel is opened on the rotating shaft, the polishing agent delivery pump is connected to the polishing agent delivery channel, and the dispersion nozzle 51 is connected to the polishing delivery channel.

[0054] In this embodiment, during the polishing process of the workpiece surface, the polishing agent can be sprayed to the dispersion groove 50 through the dispersion nozzle 51. Under the action of a plurality of liquid blocking sheets 52, the polishing agent is blocked in sections so as to fall evenly on the polishing surface. At the same time, the cross-shaped dispersion groove 50 can further evenly distribute the polishing agent on the polishing surface, thereby effectively improving the polishing effect and preventing the phenomenon of polishing agent waste from occurring easily.

[0055] Embodiment 3:

[0056] This embodiment provides a surface polishing device, which, in addition to the technical solutions of the above embodiments, also has the following technical features: the polishing agent recovery mechanism 6 also includes: a collecting tank 60, which is arranged in the machine body 1 and is located below the polishing area 100 of the worktable; a separator 61, in which a separation chamber 62 is arranged, in which a spiral conveying shaft 63 is arranged, a chip discharge port 64 is arranged at the bottom of the right end of the separator 61, and a liquid discharge port 65 is arranged at the left end of the separator 61; an electromagnet 66, which is arranged in the separator 61 and is located below the separation chamber 62;

[0057] The separator 61 is arranged at an angle, a liquid leakage hole is arranged on the polishing area 100 , and the separation chamber 62 is communicated with the collection tank 60 .

[0058] Moreover, an equipment cavity is opened inside the machine body 1, and the separator 61 can be installed in the equipment cavity in a conventional manner. A movable door is installed on the left side of the machine body 1 for opening the equipment cavity. A slag collecting box is installed on the front side of the machine body 1. The collection area of ​​the slag collecting box is located below the chip discharge port 64. The screw conveying shaft 63 can be driven to rotate by a screw conveying motor, the discharge port 65 can be connected to the polishing agent storage box, and the electromagnet 66 can be energized when the polishing equipment is started.

[0059] In this embodiment, after use, the polishing agent flows downward from the polishing area 100 into the collecting tank 60, and finally enters the separation chamber 62 of the separator 61 from the collecting tank 60. The polishing agent flows downward along the inclined separator 61. When the polishing agent flows in the separation chamber 62, the metal debris contained in the polishing agent is adsorbed by the electromagnet 66, and the polishing agent is discharged from the drain port 65. The metal debris adsorbed by the electromagnet 66 is driven by the rotation of the spiral conveying rod and finally discharged from the chip discharge port 64. Compared with the prior art, the utility model can effectively recycle the polishing agent and effectively reduce the production cost.

[0060] Embodiment 4:

[0061] This embodiment provides a surface polishing device, which, in addition to the technical solutions of the above embodiments, also has the following technical features, and further includes: a ventilation channel 7 , which is arranged on the back side of the polishing disk 4 .

[0062] In this embodiment, the provision of the ventilation channel 7 can improve the heat dissipation performance of the polishing disc 4 and reduce the overheating phenomenon of the polishing disc 4.

[0063] The embodiments of the present application are described above in conjunction with the accompanying drawings. In the absence of conflict, the embodiments in the present application and the features in the embodiments can be combined with each other. The present application is not limited to the above-mentioned specific implementation methods. The above-mentioned specific implementation methods are merely illustrative and not restrictive. Under the guidance of the present application, ordinary technicians in this field can also make many forms without departing from the purpose of the present application and the scope of protection of the claims, all of which are within the protection of the present application.

Claims

1. A surface polishing device comprising: A machine body (1), wherein the machine body (1) is provided with a work surface, and the work surface is provided with a polishing area (100); A support portion (2), wherein the support portion (2) is arranged on a work surface; A lifting and rotating mechanism (3), wherein the lifting and rotating mechanism (3) is arranged on the supporting part (2); A polishing disc (4), wherein the polishing disc (4) is arranged on the lifting and rotating mechanism (3); It is characterized by further comprising: A polishing agent dispersing mechanism (5), wherein the polishing agent dispersing mechanism (5) is arranged on the polishing surface of the polishing disc (4) and is used to evenly disperse the polishing agent; A polishing agent recovery mechanism (6), wherein the polishing agent recovery mechanism (6) is arranged in the machine body (1) and is used to recover the used polishing agent; Wherein, the polishing disc (4) is located above the polishing area (100).

2. A surface polishing device according to claim 1, characterized in that: The polishing agent dispersing mechanism (5) further comprises: A dispersion groove (50), wherein the dispersion groove (50) is in a cross shape; A dispersion nozzle (51), wherein the dispersion nozzle (51) is arranged at the center of the dispersion tank (50); The dispersion groove (50) is arranged on the polishing surface of the polishing disc (4) and extends from the center to the edge of the polishing disc (4); the dispersion nozzle (51) has four liquid outlets, and the four liquid outlets correspond to the four extension directions of the dispersion groove (50) respectively.

3. A surface polishing device according to claim 2, characterized in that: Also includes: A liquid blocking sheet (52), wherein the liquid blocking sheet (52) comprises a plurality of sheets, and the plurality of liquid blocking sheets (52) are evenly spaced and distributed along the extension direction of the dispersion groove (50); The sizes of the plurality of liquid blocking sheets (52) gradually increase from the center to the edge of the polishing plate (4).

4. A surface polishing device according to claim 1, characterized in that: The polishing agent recovery mechanism (6) further comprises: A collecting tank (60), the collecting tank (60) being arranged in the machine body (1) and located below the polishing area (100) of the work surface; A separator (61), wherein a separation chamber (62) is provided in the separator (61), a screw conveying shaft (63) is provided in the separation chamber (62), a chip discharge port (64) is provided at the bottom of the right end of the separator (61), and a liquid discharge port (65) is provided at the left end of the separator (61); an electromagnet (66), the electromagnet (66) being disposed in the separator (61) and located below the separation chamber (62); The separator (61) is arranged at an angle, a liquid leakage hole is arranged on the polishing area (100), and the separation chamber (62) is connected to the collection tank (60).

5. A surface polishing device according to claim 1, characterized in that: Also includes: A ventilation channel (7) is arranged on the back side of the polishing disc (4).

Images