Rack for silicon wafer production and silicon wafer feeding and discharging machine

Abstract

The utility model discloses a rack for silicon wafer production and a silicon wafer feeding and discharging machine using the same. The rack for silicon wafer production comprises a first rack and a second rack, wherein the first rack and the second rack are internally provided with accommodating spaces; the second rack is arranged on one side of the first rack, the second rack is provided with a cantilever beam capable of extending to the containing space, the second rack is provided with a first supporting platform, the cantilever beam is provided with a second supporting platform, and the first supporting platform and the second supporting platform can be spliced to form a load platform; and the first rack and the second rack are separated from each other. By adopting the structure, when the visual identification device and the silicon wafer deviation rectifying device are mounted on the first rack and the linear conveying device for conveying the silicon wafers is mounted on the second rack, vibration generated by conveying the silicon wafers by the linear conveying device only causes shaking of the second rack, and the first rack is not influenced; the working precision of the visual identification device and the silicon wafer deviation rectification device is ensured, and the production efficiency and the yield of the silicon wafer are improved.

Description

Technical Field

[0001] The utility model relates to the field of silicon wafer production, in particular to a rack used for silicon wafer production and a silicon wafer loading and unloading machine using the rack. Background Art

[0002] The silicon wafer loading and unloading machines in existing plate-type PVD equipment and RPD equipment are large in size, generally weighing about 30 tons. The rack of the silicon wafer loading and unloading machine generally adopts an integrated design, and the rack is divided into three layers. The top layer of the rack is a visual recognition device for identifying silicon wafers, the middle layer of the rack is a linear conveying device for conveying silicon wafers, and the bottom layer of the rack is a silicon wafer correction device for adjusting the position of silicon wafers.

[0003] In equipment of the same quality, if the moving speed of the linear conveyor of the silicon wafer loaders and loaders is increased, the linear conveyor will cause the frame to shake during the rapid transportation of silicon wafers. The increase in the frame shaking will reduce the working accuracy of the system composed of the visual recognition device and the silicon wafer correction device, thereby reducing the yield of the silicon wafers. Even if the weight and rigidity of the frame are directly increased by increasing the cost, the shaking of the frame can only be reduced to a certain extent. The shaking caused by the linear conveyor increasing the feeding speed cannot be completely eliminated, and thus the working accuracy and production efficiency of the silicon wafer loaders and loaders cannot be improved.

[0004] In addition, the load platform mounting surface for the load linear conveying device in the middle of the existing integrated frame is difficult to process. After the frame is welded and formed, the load platform mounting surface cannot be milled due to the obstruction of the upper layer of the frame, and it is difficult to ensure the accuracy of the load platform mounting surface through welding. Utility Model Content

[0005] The utility model aims to solve one of the problems of the prior art to at least a certain extent. To this end, the utility model proposes a rack for silicon wafer production, which can reduce production costs and at the same time avoid the vibration generated by the linear conveyor when conveying silicon wafers to other components as much as possible; the utility model also proposes a silicon wafer loading and unloading machine using the above rack, which helps to reduce the production cost of the silicon wafer loading and unloading machine and at the same time can improve the working accuracy and production efficiency of the silicon wafer loading and unloading machine.

[0006] According to some embodiments of the utility model, a rack for silicon wafer production includes a first rack and a second rack, wherein the first rack is provided with a storage space inside; the second rack is arranged on one side of the first rack, the second rack has a cantilever beam that can extend into the storage space, the second rack is provided with a first supporting platform, the cantilever beam is provided with a second supporting platform, the first supporting platform and the second supporting platform can be spliced ​​to form a load platform; wherein the first rack and the second rack are separated from each other.

[0007] A rack for silicon wafer production according to some embodiments of the utility model has the following beneficial effects:

[0008] In this embodiment, the first frame and the second frame are separated from each other, and the cantilever beam spliced ​​to form the load platform extends into the accommodating space of the first frame, and the visual recognition device for identifying silicon wafers and the silicon wafer correction device for adjusting the position of the silicon wafers can be installed on the first frame, and the linear conveying device for conveying silicon wafers can be installed on the load platform of the second frame. Therefore, when the user increases the speed of the linear conveying device to convey silicon wafers, the vibration generated by the linear conveying device conveying silicon wafers at a high speed will only cause the second frame to shake, and the shaking of the second frame will not be transmitted to the first frame, which effectively avoids the vibration generated by the linear conveying device conveying silicon wafers at a high speed to be transmitted to the visual recognition device and the silicon wafer correction device. It does not need to increase the dead weight and rigidity of the frame, which helps to reduce production costs. At the same time, it will not affect the working accuracy of the visual recognition device and the silicon wafer correction device, which helps to improve the production efficiency and yield of silicon wafers.

[0009] In some embodiments of the present application, a support leg is provided at one end of the cantilever beam away from the second frame, and the support leg is separated from the first frame.

[0010] In some embodiments of the present application, a height-adjustable support member is provided at the lower portion of the support leg.

[0011] In some embodiments of the present application, the cantilever beam is detachably connected to the second frame, a mounting and adjusting device is provided on a side of the second frame close to the cantilever beam, and the cantilever beam is connected to the second frame through the mounting and adjusting device.

[0012] In some embodiments of the present application, the installation and adjustment device includes a connecting base, a left-right adjustment base and an up-down adjustment base, the connecting base is fixedly installed on the side of the second frame facing the cantilever beam; the left-right adjustment base is arranged on the connecting base along the up-down direction, and the left-right adjustment base is provided with left-right adjustment bolts for driving the cantilever beam to move along the left-right direction; the up-down adjustment base is arranged on the connecting base along the horizontal direction, and the up-down adjustment base is provided with up-down adjustment bolts for driving the cantilever beam to move along the up-down direction; when the cantilever beam is connected to the connecting base, the lower end of the cantilever beam is adjacent to or abuts the up-down adjustment base, and the left-right adjustment base is adjacent to or abuts the left or right side of the cantilever beam.

[0013] In some embodiments of the present application, a connecting side plate is provided at one end of the cantilever beam close to the second frame; wherein, when the cantilever beam is connected to the second frame, the connecting side plate is connected to the connecting base plate, the lower end portion of the connecting side plate is adjacent to or abuts against the up and down adjustment base, the left side portion of the connecting side plate is adjacent to or abuts against the left and right adjustment base, or the right side portion of the connecting side plate is adjacent to or abuts against the left and right adjustment base.

[0014] In some embodiments of the present application, the left and right adjustment bolts include a first pulling bolt and a first pushing bolt, the first pushing bolt is threadedly installed on the left and right adjustment base, the left and right adjustment base is provided with a first strip hole arranged in the up and down direction, and the first pulling bolt is correspondingly movably installed in the first strip hole; the up and down adjustment bolts include a second pulling bolt and a second pushing bolt, the second pushing bolt is threadedly installed on the up and down adjustment base, the up and down adjustment base is provided with a second strip hole arranged in the left and right direction, and the second pulling bolt is correspondingly movably installed in the second strip hole, the left side or right side of the connecting side plate is provided with a first bolt hole corresponding to the first pulling bolt, and the lower end of the connecting side plate is provided with a second bolt hole corresponding to the second pulling bolt; when the cantilever beam is connected to the connecting base plate, the first pulling bolt and the first pushing bolt can cooperate to drive the connecting side plate to drive the cantilever beam to move in the left and right direction, and the second pulling bolt and the second pushing bolt can cooperate to drive the connecting side plate to drive the cantilever beam to move in the up and down direction.

[0015] In some embodiments of the present application, the first frame is provided with a horizontal adjustment mechanism for adjusting the height of both ends of the cantilever beam.

[0016] In some embodiments of the present application, the horizontal adjustment mechanism includes a first horizontal adjustment base and a second horizontal adjustment base, the first horizontal adjustment base and the second horizontal adjustment base are arranged on the first frame at intervals along the length direction of the cantilever beam, the first horizontal adjustment base is located on a side of the first frame close to the second frame, and the second horizontal adjustment base is located on a side of the first frame away from the second frame, the first horizontal adjustment base is provided with a first adjusting bolt assembly capable of driving one end of the cantilever beam to move in an up and down direction, and the second horizontal adjustment base is provided with a second adjusting bolt assembly capable of driving the other end of the cantilever beam to move in an up and down direction; when the cantilever beam extends to the accommodating space, one end of the cantilever beam is located above the first horizontal adjustment base, and the other end of the cantilever beam is located above the second horizontal adjustment base; the first adjusting bolt assembly and the second adjusting bolt assembly can cooperate to drive the two ends of the cantilever beam to move in the up and down direction, so that the horizontal height of the second support platform is the same as the horizontal height of the first support platform.

[0017] According to some embodiments of the utility model, the silicon wafer loading and unloading machine includes the above-mentioned frame, the first frame is provided with a visual recognition device and a silicon wafer correction device, the cantilever beam extends into the accommodating space, and the load platform is provided with a linear conveying device for conveying silicon wafers.

[0018] The silicon wafer loading and unloading machines according to some embodiments of the utility model have the following beneficial effects:

[0019] The silicon wafer loading and unloading machine of this embodiment adopts the above-mentioned frame. The first frame is provided with a visual recognition device and a silicon wafer correction device. The cantilever beam of the second frame extends to the inside of the accommodating space of the first frame. The load platform is provided with a linear conveying device for conveying silicon wafers. Since the first frame and the second frame are separated from each other, when the user increases the speed of the linear conveying device in conveying silicon wafers, the vibration generated by the linear conveying device in conveying silicon wafers at a high speed will only cause the second frame to shake, and the shaking of the second frame will not be transmitted to the first frame, which effectively avoids the vibration generated by the linear conveying device in conveying silicon wafers at a high speed to be transmitted to the visual recognition device and the silicon wafer correction device. It does not need to increase the dead weight and rigidity of the frame, which helps to reduce production costs. At the same time, it will not affect the working accuracy of the visual recognition device and the silicon wafer correction device, which helps to improve the production efficiency and yield of silicon wafers. BRIEF DESCRIPTION OF THE DRAWINGS

[0020] Figure 1 This is a schematic diagram of the structure of a rack for silicon wafer production in some embodiments of the utility model;

[0021] Figure 2 yes Figure 1A front view of a rack for silicon wafer production is shown;

[0022] Figure 3 yes Figure 1 A schematic diagram of an exploded structure of a rack for silicon wafer production in which a first rack and a second rack are separated from each other is shown;

[0023] Figure 4 yes Figure 1 A parts diagram of a second rack in a rack for silicon wafer production is shown;

[0024] Figure 5 yes Figure 1 A schematic diagram of a local structure of a rack for silicon wafer production when a cantilever beam is removed from a second rack is shown;

[0025] Figure 6 yes Figure 1 A schematic diagram of the structure of a rack for silicon wafer production in which a cantilever beam is located inside a receiving space of a first rack;

[0026] Figure 7 yes Figure 1 The enlarged schematic diagram of point A in the middle;

[0027] Figure 8 yes Figure 1 The enlarged schematic diagram of point B in the middle;

[0028] Fig. 9 It is a structural schematic diagram of a silicon wafer loading and unloading machine of certain embodiments of the utility model. DETAILED DESCRIPTION

[0029] Embodiments of the present embodiment are described in detail below, and examples of the embodiments are shown in the accompanying drawings, wherein the same or similar reference numerals throughout represent the same or similar elements or elements having the same or similar functions. The embodiments described below with reference to the accompanying drawings are exemplary and are only used to explain the present embodiment, and should not be construed as limiting the present embodiment.

[0030] The drawings used in this embodiment are schematic and principle and are only used to facilitate the description of this embodiment and simplify the description. Therefore, they should not be understood as limiting this embodiment.

[0031] In the description of this embodiment, "several" means one or more, "more" means more than two, "greater than", "less than", "exceed", etc. are understood to exclude the number itself, and "above", "below", "within", etc. are understood to include the number itself. If there is a description of "first" or "second", it is only used for the purpose of distinguishing technical features, and cannot be understood as indicating or implying relative importance or implicitly indicating the number of the indicated technical features or implicitly indicating the order of the indicated technical features.

[0032] In the description of this embodiment, unless otherwise clearly defined, terms such as setting, installing, connecting, etc. should be understood in a broad sense, and technicians in the relevant technical field can reasonably determine the specific meanings of the above terms in this embodiment based on the specific content of the technical solution.

[0033] Figures 1 to 8 It is a schematic diagram of some embodiments of a rack for silicon wafer production of the utility model.

[0034] Reference Figures 1 to 8 , and mainly refer to Figures 4 to 8 According to some embodiments of the utility model, a rack for silicon wafer production is provided. For the convenience of description, it is sometimes referred to as a "rack" hereinafter. A rack for silicon wafer production includes a first rack 100 and a second rack 200. In the present embodiment, the first rack 100 and the second rack 200 are both roughly in the shape of a rectangular parallelepiped. A receiving space 110 is provided inside the first rack 100. The receiving space 110 is a cavity that passes through the first rack 100, that is, openings connected to the receiving space 110 are provided on opposite sides of the first rack 100. The second rack 200 is provided on one side of the first rack 100. The second rack 200 has a cantilever beam 210 that can extend into the receiving space 110. Specifically, the cantilever beam 210 can pass through the opening on the side wall of the first rack 100 and extend into the receiving space 110. The second frame 200 is provided with a first support platform, and the cantilever beam 210 is provided with a second support platform. The first support platform and the second support platform can be spliced ​​to form a load platform. In this embodiment, the first support platform is provided on the upper end surface of the second frame 200, and the second support platform is provided on the upper surface of the cantilever beam 210, so the load platform extends from the upper end surface of the second frame 200 to the upper end surface of the cantilever beam 210. In this embodiment, the first frame 100 and the second frame 200 are separated from each other, that is, the first frame 100 and the second frame 200 are two independent and separated components, the cantilever beam 210 extends to the inside of the accommodating space 110, and the cantilever beam 210 is suspended inside the accommodating space 110.

[0035] The rack of the present embodiment has the above-mentioned structure, so that when the rack is applied to a silicon wafer loading and unloading machine, the visual recognition device for identifying silicon wafers and the silicon wafer correction device for adjusting the position of silicon wafers of the silicon wafer loading and unloading machine can be installed on the first rack 100, and the linear conveying device for conveying silicon wafers can be installed on the load platform of the second rack 200. When the user increases the speed of the linear conveying device in conveying silicon wafers, the vibration generated by the high-speed conveying of silicon wafers by the linear conveying device will only cause the second rack 200 to shake. Since the first rack 100 and the second rack 200 are separated from each other, the shaking of the second rack 200 will not be transmitted to the first rack 100, which effectively avoids the vibration generated by the high-speed conveying of silicon wafers by the linear conveying device being transmitted to the visual recognition device and the silicon wafer correction device. There is no need to increase the dead weight and rigidity of the rack, which helps to reduce production costs. At the same time, it will not affect the working accuracy of the visual recognition device and the silicon wafer correction device, which helps to improve the production efficiency and yield of silicon wafers.

[0036] Reference Figures 1 to 4 In order to make the cantilever beam 210 more stable and not swing up and down when the load platform bears the load, in some embodiments of the present utility model, a support leg 220 is provided at one end of the cantilever beam 210 away from the second frame 200, and the support leg 220 is separated from the first frame 100. Further, a height-adjustable support member 221 is provided at the lower part of the support leg 220. In some embodiments of the present utility model, the support member 221 includes a base, and a screw member is provided on the upper surface of the base, and the screw member is threadedly connected with the support leg 220. When necessary, the user can turn the screw member forward or reverse relative to the support leg 220, and the screw member can drive the base to move closer to or away from the support leg 220, thereby adjusting the height of the support member 221, thereby adjusting the overall height of the cantilever beam 210 supported by the support leg 220 to meet different needs. By using the support legs 220 to support one end of the cantilever beam 210 away from the second frame 200, the cantilever beam 210 can remain stable without swinging up and down when the load platform bears the load.

[0037] It is understandable that in the above embodiment, the support member 221 includes a base and a screw member. In other embodiments of the utility model, the support member 221 can also adopt other structures, such as the support member 221 includes a plurality of gaskets of different thicknesses. Users can stack gaskets of different thicknesses according to actual needs to form support members 221 of different thicknesses, so that the support member 221 can support the above support leg 220 and adjust the height of the support member 221 to meet the needs of users.

[0038] Reference Figures 4 to 6In order to facilitate the production, processing and transportation of the second frame 200, in some embodiments of the present invention, the cantilever beam 210 and the second frame 200 are detachably connected. Therefore, the cantilever beam 210 and the second frame 200 can be produced separately, which helps to reduce the production cost of the second frame 200. The cantilever beam 210 and the second frame 200 can also be transported separately, which helps to reduce the overall volume of the second frame 200, facilitate transportation, and reduce production costs.

[0039] In order to enable the cantilever beam 210 to be accurately spliced ​​with the second frame 200, in certain embodiments of the present invention, a mounting adjustment device is provided on a side of the second frame 200 close to the cantilever beam 210, and the cantilever beam 210 is connected to the second frame 200 via the mounting adjustment device. Through the mounting adjustment device, the cantilever beam 210 can be accurately installed at the position set by the second frame 200, thereby enabling the second support platform of the cantilever beam 210 and the first support platform of the second frame 200 to be accurately spliced ​​to form a load platform.

[0040] Reference Figure 4 , Figure 5 and Figure 6In order to facilitate the production and processing of the installation and adjustment device, in some embodiments of the utility model, the installation and adjustment device includes a connecting base plate 300, a left-right adjustment base 310 and an up-down adjustment base 320. The connecting base plate 300 is fixedly installed on the side of the second frame 200 facing the cantilever beam 210; the left-right adjustment base 310 is arranged on the connecting base plate 300 along the up-down direction, and the left-right adjustment base 310 is provided with left-right adjustment bolts for driving the cantilever beam 210 to move along the left-right direction. The up-down adjustment base 320 is arranged on the connecting base plate 300 along the horizontal direction, and the up-down adjustment base 320 is provided with up-down adjustment bolts for driving the cantilever beam 210 to move along the up-down direction. In this embodiment, the left-right adjustment base 310 and the up-down adjustment base 320 are perpendicular to each other, and the left-right adjustment base 310 and the up-down adjustment base 320 are spliced ​​to form a right-angle piece. When the cantilever beam 210 is connected to the connecting substrate 300, the end of the cantilever beam 210 first approaches or fits the connecting substrate 300. At this time, the lower end of the cantilever beam 210 is adjacent to or abuts the upper and lower adjustment base 320, and the left and right adjustment base 310 is adjacent to or abuts the left or right side of the cantilever beam 210. At this time, the user screws the left and right adjustment bolts and the upper and lower adjustment bolts to move the end of the cantilever beam 210 along the left and right directions and the upper and lower directions, so that the cantilever beam 210 is aligned with the set position of the connecting substrate 300, and then the cantilever beam 210 is locked to the connecting substrate 300 by using the locking bolts. In this embodiment, a plurality of locking bolts connected to the cantilever beam 210 are provided on the surface of the connecting substrate 300, which are fixedly connected to the end of the cantilever beam 210 through the plurality of locking bolts, so that the cantilever beam 210 is fixedly connected to the connecting substrate 300. The cantilever beam 210 and the second frame 200 are detachably connected. By adopting the above-mentioned installation and adjustment device, the cantilever beam 210 can be accurately installed on the second frame 200, which is convenient for assembly.

[0041] In order to better connect the cantilever beam 210 to the connection base plate 300, specifically, a connection side plate 211 is provided at one end of the cantilever beam 210 close to the second frame 200. When the cantilever beam 210 is connected to the second frame 200, the connection side plate 211 is adjacent to or in contact with the connection base plate 300, the lower end of the connection side plate 211 is adjacent to or in contact with the up-and-down adjustment base 320, the left side of the connection side plate 211 is adjacent to or in contact with the left-and-right adjustment base 310, or the right side of the connection side plate 211 is adjacent to or in contact with the left-and-right adjustment base 310. The user turns the left and right adjustment bolts and the up and down adjustment bolts to move the end of the cantilever beam 210 in the left and right directions and the up and down directions, that is, the end of the cantilever beam 210 moves in the three-dimensional space, so that the connecting side plate 211 is aligned with the set position of the connecting base plate 300, and then the connecting side plate 211 and the connecting base plate 300 are locked together with bolts, so that the cantilever beam 210 is accurately installed on the second frame 200.

[0042] In order to better drive the end of the cantilever beam 210 to move relative to the connecting base plate 300 in a three-dimensional space, specifically, the left and right adjusting bolts include a first pulling bolt 311 and a first pushing bolt 312, the first pushing bolt 312 is threadedly installed on the left and right adjusting base 310, the left and right adjusting base 310 is provided with a first strip hole 313 arranged along the up and down direction, and the first pulling bolt 311 is correspondingly movably installed in the first strip hole 313; the up and down adjusting bolts include a second pulling bolt 321 and a second pushing bolt 322, the second pushing bolt 322 is threadedly installed on the up and down adjusting base 320, the up and down adjusting base 320 is provided with a second strip hole 323 arranged along the left and right direction, and the second pulling bolt 321 is correspondingly movably installed in the second strip hole 323; the left or right side of the connecting side plate 211 is provided with a first bolt hole corresponding to the first pulling bolt 311, and the lower end of the connecting side plate 211 is provided with a second bolt hole corresponding to the second pulling bolt 321. When the cantilever beam 210 is connected to the connecting base plate 300, the connecting side plate 211 is adjacent to or attached to the connecting base plate 300, the lower end of the connecting side plate 211 is adjacent to or abuts against the upper and lower adjustment base 320, the left side portion of the connecting side plate 211 is adjacent to or abuts against the left and right adjustment base 310, or the right side portion of the connecting side plate 211 is adjacent to or abuts against the left and right adjustment base 310, and the first thrust bolt 312 is turned, and the first thrust bolt 312 can push the connecting side plate 211 to drive the cantilever beam 210 to move away from the left and right adjustment base 310 along the left and right directions, and the first pull bolt 311 is turned to be threadedly connected with the first bolt hole of the connecting side plate 211, and the first pull bolt 311 can pull the connecting side plate 211 to drive the cantilever beam 210 to move in the left and right directions. 0 moves along the left and right directions close to the left and right adjustment base 310, so the first pulling bolt 311 and the first pushing bolt 312 can cooperate to drive the connecting side plate 211 to drive the cantilever beam 210 to move along the left and right directions; the second pushing bolt 322 is screwed, and the second pushing bolt 322 can push the connecting side plate 211 to drive the cantilever beam 210 to move upward, and the second pulling bolt 321 is screwed and connected with the second bolt hole at the lower end of the connecting side plate 211, and the second pulling bolt 321 can pull the connecting side plate 211 to drive the cantilever beam 210 to move downward, so the second pulling bolt 321 and the second pushing bolt 322 can cooperate to drive the connecting side plate 211 to drive the cantilever beam 210 to move along the up and down directions. By adopting the above structure, it is convenient for users to adjust the installation position of the cantilever beam 210 and the second frame 200 through the installation adjustment device, and the operation is simple and convenient.

[0043] It can be understood that in the above embodiment, the left and right adjustment bolts include a first pull bolt 311 and a first push bolt 312, and the up and down adjustment bolts include a second pull bolt 321 and a second push bolt 322. In other embodiments of the utility model, the left and right adjustment bolts include three first pull bolts 311 and two first push bolts 312, and the up and down adjustment bolts include three second pull bolts 321 and two second push bolts 322. Figure 5 , three first pull bolts 311 and two first push bolts 312 are evenly arranged in sequence along the vertical direction on the left-right adjustment base 310, one second push bolt 322 is located between two adjacent first pull bolts 311, and another second push bolt 322 is located between two other adjacent first pull bolts 311; three second pull bolts 321 and two second push bolts 322 are evenly arranged in sequence along the horizontal direction on the vertical adjustment base 320, one second push bolt 322 is located between two adjacent second pull bolts 321, and another second push bolt 322 is located between two other adjacent second pull bolts 321. By adopting the above structure, the user can turn the left-right adjustment bolts and the vertical adjustment bolts, so that the end of the cantilever beam 210 can move more smoothly and is not easy to tilt.

[0044] Reference Figure 1 , Figure 6 , Figure 7 and Figure 8In order to keep the second support platform of the cantilever beam 210 and the first support platform of the second frame 200 level, in some embodiments of the present utility model, the first frame 100 is provided with a horizontal adjustment mechanism for adjusting the height of both ends of the cantilever beam 210. Specifically, the horizontal adjustment mechanism includes a first horizontal adjustment base 410 and a second horizontal adjustment base 420, which are arranged on the first frame 100 at intervals along the length direction of the cantilever beam 210, the first horizontal adjustment base 410 and the second horizontal adjustment base 420 are located on the side of the first frame 100 close to the second frame 200, and the second horizontal adjustment base 420 is located on the side of the first frame 100 away from the second frame 200, and the first horizontal adjustment base 410 is provided with a first adjustment bolt assembly capable of driving one end of the cantilever beam 210 to move in the up and down directions. In this embodiment, the first adjusting bolt assembly includes at least one first tension bolt and at least one first thrust bolt, and the second horizontal adjustment base 420 is provided with a second adjusting bolt assembly capable of driving the other end of the cantilever beam 210 to move in the up and down directions, and the second adjusting bolt assembly includes at least one second tension bolt and at least one second thrust bolt; when the cantilever beam 210 extends to the accommodating space 110, one end of the cantilever beam 210 is located above the first horizontal adjustment base 410, and the other end of the cantilever beam 210 is located above the second horizontal adjustment base 420; the cantilever beam 210 is located at the second horizontal adjustment base 420. A first tension threaded hole matched with a first tension bolt is provided at one end above a horizontal adjustment base 410, and a second tension threaded hole is provided at the other end of the cantilever beam 210 located above a second horizontal adjustment base 420. The user can push one end of the cantilever beam 210 upward by turning the first thrust bolt, and the first tension bolt is threadedly connected to the first tension threaded hole by turning the first tension bolt, so that the first tension bolt can pull one end of the cantilever beam 210 to move downward and fall, and the second thrust bolt is turned, so that the second thrust bolt can push the other end of the cantilever beam 210 upward, and the second The tension bolt is threadedly connected to the second tension threaded hole, and the second tension bolt can pull the other end of the cantilever beam 210 to move downward and drop. By adopting the above structure, the first adjusting bolt assembly and the second adjusting bolt assembly can cooperate to drive the two ends of the cantilever beam 210 to move in the up and down directions, so that the horizontal heights of the two ends of the cantilever beam 210 can be kept consistent, and at the same time, the horizontal height of the second support platform is the same as the horizontal height of the first support platform. At this time, the user can connect and fix the cantilever beam 210 to the second frame 200 by installing the adjustment device.

[0045] It should be noted that after the cantilever beam 210 is spliced ​​and fixed to the second frame 200, it is necessary to release the connection between the first adjusting bolt assembly and the cantilever beam 210, and release the connection between the second adjusting bolt assembly and the cantilever beam 210, so that the cantilever beam 210 and the first frame 100 remain separated from each other. Specifically, the first tension bolt, the first thrust bolt, the second tension bolt, and the second thrust bolt can be removed to prevent the vibration of the cantilever beam 210 from being transmitted to the first frame 100 through one or more of the first tension bolt, the first thrust bolt, the second tension bolt, and the second thrust bolt.

[0046] Reference Figures 1 to 9 According to certain embodiments of the present invention, a silicon wafer loading and unloading machine includes the above-mentioned racks, a visual recognition device 500 is provided on the upper part of the first rack 100, a silicon wafer correction device 600 is provided on the lower part of the first rack 100, a cantilever beam 210 of the second rack 200 extends to the inside of the accommodation space 110, the cantilever beam 210 is located between the visual recognition device 500 and the silicon wafer correction device 600, and a linear conveying device 700 for conveying silicon wafers is provided on the load platform of the second rack 200, and the linear conveying device 700 extends to the inside of the accommodation space 110. Since the above-mentioned visual recognition device 500, silicon wafer correction device 600 and linear conveying device 700 are conventional technologies in the art, they are not described in detail here.

[0047] The silicon wafer loading and unloading machine of this embodiment adopts the above-mentioned racks, wherein the visual recognition device 500 is arranged on the upper part of the first rack 100, the silicon wafer correction device 600 is arranged on the lower part of the first rack 100, the cantilever beam 210 of the second rack 200 extends into the accommodating space 110 of the first rack 100, and the load platform is provided with a linear conveying device 700 for conveying silicon wafers. Since the first rack 100 and the second rack 200 are separated from each other, when the user increases the speed of conveying silicon wafers by the linear conveying device 700, the linear conveying device 700 can be used to convey the silicon wafers. The vibration caused by the high-speed conveying of silicon wafers by the linear conveying device 700 will only cause the second frame 200 to vibrate, while the vibration of the second frame 200 will not be transmitted to the first frame 100, effectively avoiding the vibration caused by the high-speed conveying of silicon wafers by the linear conveying device 700 from being transmitted to the visual recognition device 500 and the silicon wafer correcting device 600. It does not need to increase the dead weight and rigidity of the frame, which helps to reduce production costs. At the same time, it will not affect the working accuracy of the visual recognition device 500 and the silicon wafer correcting device 600, which helps to improve the production efficiency and yield of silicon wafers.

[0048] Although examples of the present embodiment have been shown and described, those skilled in the art will appreciate that various changes, modifications, substitutions and variations may be made to the embodiments without departing from the principles and spirit of the present embodiment, and the scope of the present embodiment is defined by the claims and their equivalents.

Claims

1. A rack for silicon wafer production, characterized in that: include: A first frame, wherein a receiving space is provided inside the first frame; A second frame is arranged at one side of the first frame, the second frame has a cantilever beam that can extend into the accommodation space, the second frame is provided with a first support platform, the cantilever beam is provided with a second support platform, and the first support platform and the second support platform can be spliced ​​to form a load platform; The first rack and the second rack are separated from each other.

2. A rack for silicon wafer production according to claim 1, characterized in that: A support leg is disposed at one end of the cantilever beam away from the second frame, and the support leg is separated from the first frame.

3. A rack for silicon wafer production according to claim 2, characterized in that: A height-adjustable support member is arranged at the lower part of the support leg.

4. The rack for silicon wafer production according to claim 1, characterized in that: The cantilever crossbeam is detachably connected to the second frame, a mounting and adjusting device is provided on a side of the second frame close to the cantilever crossbeam, and the cantilever crossbeam is connected to the second frame via the mounting and adjusting device.

5. A rack for silicon wafer production according to claim 4, characterized in that: The installation and adjustment device comprises a connecting base plate, a left-right adjustment base and a top-bottom adjustment base, wherein the connecting base plate is fixedly mounted on a side of the second frame facing the cantilever beam; The left-right adjustment base is arranged on the connection base plate along the up-down direction, and the left-right adjustment base is provided with left-right adjustment bolts for driving the cantilever beam to move along the left-right direction; The up-down adjustment base is arranged on the connecting base plate along the horizontal direction, and the up-down adjustment base is provided with up-down adjustment bolts for driving the cantilever beam to move along the up-down direction; When the cantilever beam is connected to the connection substrate, the lower end of the cantilever beam is adjacent to or abuts against the up-and-down adjustment base, and the left-and-right adjustment base is adjacent to or abuts against the left or right side of the cantilever beam.

6. The rack for silicon wafer production according to claim 5, characterized in that: A connecting side plate is provided at one end of the cantilever beam close to the second frame; Wherein, when the cantilever beam is connected to the second frame, the connecting side plate is connected to the connecting base plate, the lower end of the connecting side plate is adjacent to or abuts against the up and down adjustment base, the left side of the connecting side plate is adjacent to or abuts against the left and right adjustment base, or the right side of the connecting side plate is adjacent to or abuts against the left and right adjustment base.

7. A rack for silicon wafer production according to claim 6, characterized in that: The left-right adjustment bolts include a first pulling bolt and a first pushing bolt, the first pushing bolt is threadedly mounted on the left-right adjustment base, the left-right adjustment base is provided with first strip holes arranged in the up-down direction, and the first pulling bolt is correspondingly and movably mounted in the first strip holes; The up-and-down adjustment bolt comprises a second pulling bolt and a second pushing bolt, wherein the second pushing bolt is threadedly mounted on the up-and-down adjustment base, and the up-and-down adjustment base is provided with second strip holes arranged in the left-right direction, and the second pulling bolt is correspondingly and movably mounted in the second strip holes. A first bolt hole corresponding to the first pull bolt is opened on the left side or the right side of the connecting side plate, and a second bolt hole corresponding to the second pull bolt is opened on the lower end of the connecting side plate; When the cantilever beam is connected to the connecting base plate, the first pulling bolt and the first pushing bolt can cooperate to drive the connecting side plate to drive the cantilever beam to move in the left and right directions, and the second pulling bolt and the second pushing bolt can cooperate to drive the connecting side plate to drive the cantilever beam to move in the up and down directions.

8. The rack for silicon wafer production according to claim 4, characterized in that: The first frame is provided with a horizontal adjustment mechanism for adjusting the height of both ends of the cantilever beam.

9. A rack for silicon wafer production according to claim 8, characterized in that: The horizontal adjustment mechanism comprises a first horizontal adjustment base and a second horizontal adjustment base, the first horizontal adjustment base and the second horizontal adjustment base are arranged on the first frame at intervals along the length direction of the cantilever beam, the first horizontal adjustment base is located on a side of the first frame close to the second frame, and the second horizontal adjustment base is located on a side of the first frame away from the second frame, the first horizontal adjustment base is provided with a first adjustment bolt assembly capable of driving one end of the cantilever beam to move in the up-down direction, and the second horizontal adjustment base is provided with a second adjustment bolt assembly capable of driving the other end of the cantilever beam to move in the up-down direction; When the cantilever beam extends to the accommodation space, one end of the cantilever beam is located above the first horizontal adjustment base, and the other end of the cantilever beam is located above the second horizontal adjustment base; The first adjusting bolt assembly and the second adjusting bolt assembly can cooperate to drive the two ends of the cantilever beam to move in the up and down directions, so that the horizontal height of the second supporting platform is the same as the horizontal height of the first supporting platform.

10. Silicon wafer loading and unloading machine, characterized in that: It comprises a rack for silicon wafer production as described in any one of claims 1 to 9, wherein the first rack is provided with a visual recognition device and a silicon wafer correction device, the cantilever beam extends into the accommodating space, and the load platform is provided with a linear conveying device for conveying silicon wafers.

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