Heated air circulation structure of annealing furnace

Abstract

The utility model provides a hot air circulation structure of an annealing furnace, and aims to solve the technical problems that silicon wafers are heated unevenly and are difficult to meet process requirements due to the fact that air in an existing high-temperature furnace flows slowly and the temperature in a furnace chamber is uneven. The structure comprises a furnace body; a fan and a heating device are arranged on the furnace body; an air duct is arranged in the furnace body; the air duct comprises a first air duct arranged on the left side of the furnace chamber; the second air duct is arranged on the right side of the furnace chamber; the third air duct is arranged at the top of the furnace chamber; the heating device is arranged on the first air duct and / or the third air duct; airflow enters the furnace chamber from the first air duct, and hot air in the furnace chamber flows back to the first air duct through the second air duct and the third air duct under the action of the fan. According to the utility model, through the position layout of the air duct, the fan and the heating device, hot air flows horizontally and vertically in the furnace body, so that the rapid and uniform circulation of air flow is facilitated, and a silicon wafer can be uniformly heated in the furnace chamber.

Description

Technical Field

[0001] The utility model relates to the technical field of silicon wafer heating, in particular to a hot air circulation structure of an annealing furnace. Background Art

[0002] At present, the high-temperature furnace used in the early stage of solar silicon wafer processing usually has heating lamps arranged at the top or bottom of the furnace chamber. The furnace chamber is heated by lamps, and the air flow inside is slow and the temperature is uneven, usually ±10°C. With the process research of reducing costs and increasing efficiency of solar cells, the requirements for annealing furnace temperature are getting higher and higher, requiring not only precise control of furnace temperature, but also uniform temperature in the furnace chamber. When the above-mentioned high-temperature furnace processes silicon wafers, the air flow inside is slow and the temperature in the furnace chamber is uneven, which leads to uneven heating of silicon wafers and makes it difficult to meet the process requirements. Summary of the invention

[0003] In view of the above situation, in order to overcome the defects of the prior art, the purpose of the utility model is to provide an annealing furnace hot air circulation structure, which solves the technical problems of slow air flow inside the existing high-temperature furnace and uneven temperature in the furnace chamber, which leads to uneven heating of silicon wafers and makes it difficult to meet the process requirements.

[0004] In order to achieve the above purpose, the utility model provides the following technical solutions:

[0005] A hot air circulation structure of an annealing furnace comprises: a furnace body; a fan and a heating device are arranged on the furnace body; an air duct is arranged inside the furnace body; the air duct comprises: a first air duct, arranged on the left side of a furnace cavity and connected to the furnace cavity; a second air duct, arranged on the right side of the furnace cavity and connected to the furnace cavity; a third air duct, arranged on the top of the furnace cavity, one end of the third air duct is connected to the first air duct, and the other end is connected to the air outlet of the fan, and the air inlet of the fan is connected to the second air duct; the heating device is arranged on the first air duct and / or the third air duct.

[0006] When in use, the airflow enters the furnace cavity from the first air duct, and the hot air in the furnace cavity flows back to the first air duct through the second air duct and the third air duct under the action of the fan. The utility model arranges the positions of the air duct, the fan and the heating device, so that the hot air flows horizontally and vertically in the furnace body, which facilitates the rapid and uniform circulation of the airflow, and is conducive to improving the uniformity of the temperature in the furnace, so that the silicon wafer can be evenly heated in the furnace cavity; at the same time, the airflow enters the furnace cavity from the first air duct in parallel, and is discharged from the furnace cavity in parallel, so that the airflow through the furnace cavity is relatively stable, which is conducive to reducing the vibration of the silicon wafer in the furnace cavity and reducing the damage to the silicon wafer.

[0007] Optionally, a temperature detection device is provided in the air duct, and the temperature detection device and the fan are electrically connected to a control system. The control system receives communication data from the temperature detection device and regulates the fan to adjust the wind speed in the furnace body.

[0008] Optionally, a flow guide device is provided in the furnace body, a furnace cavity is formed inside the flow guide device, and an air duct is formed between the outer wall of the flow guide device and the inner wall of the furnace body.

[0009] Optionally, the air guide device has an adjustable first wind grille on the left side and an adjustable second wind grille on the right side.

[0010] Optionally, the wind grille openings on the first wind grille and the second wind grille gradually increase in size from top to bottom.

[0011] Optionally, the wind grille openings on the first wind grille and the second wind grille are staggered.

[0012] Optionally, the first wind grille or the second wind grille includes: a plate body; an adjustment component, which is arranged on the plate body at intervals; the adjustment component includes a first adjustment plate and a second adjustment plate that can slide relative to each other, and the second adjustment plate can adjust the size of the wind grille opening when it slides relative to the first adjustment plate.

[0013] Optionally, the inner wall of the furnace is provided with a heat insulation structure.

[0014] Optionally, a fan air guide tube and a partition are installed on the fan, one end of the partition is connected to the inner wall of the furnace body, and the other end is connected to the guide device.

[0015] Optionally, a plurality of furnace cavities are arranged in the furnace body, and an air duct is arranged outside each furnace cavity.

[0016] Compared with the prior art, the beneficial effects of the utility model are:

[0017] The utility model arranges the positions of the air duct, fan and heating device so that the hot air flows horizontally and vertically in the furnace body, which is convenient for the rapid and uniform circulation of the airflow, and is beneficial to improving the uniformity of the temperature in the furnace, so that the silicon wafer can be evenly heated in the furnace cavity; at the same time, the airflow enters the furnace cavity in parallel from the first air duct and is discharged in parallel from the furnace cavity, so that the airflow through the furnace cavity is relatively stable, which is beneficial to reduce the vibration of the silicon wafer in the furnace cavity and reduce the damage to the silicon wafer. With the setting of the temperature detection device, it can not only display the real-time temperature of different positions in the furnace in time, and timely feedback to the control system, but also be beneficial to timely adjust the wind speed and temperature in the furnace cavity, avoid large temperature deviation, and reduce the difficulty of control. The temperature in the furnace cavity of the utility model can be accurately controlled, the temperature is uniform, and the furnace cavity can reach the ±3℃ index. BRIEF DESCRIPTION OF THE DRAWINGS

[0018] In order to more clearly illustrate the technical solutions of the embodiments of the present application, the drawings required for use in the description of the embodiments will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present application. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying any creative work.

[0019] Figure 1 It is a structural schematic diagram of the utility model.

[0020] Figure 2 for Figure 1 Sectional view of AA.

[0021] Figure 3 for Figure 1 Cross-sectional view of BB.

[0022] Figure 4 This is a working principle diagram of the utility model.

[0023] Figure 5 It is a schematic structural diagram of an embodiment of the first air grille in the utility model.

[0024] Figure 6 for Figure 5 A magnified view of the structure in the middle.

[0025] Figure numerals: 1, furnace body; 11, furnace cavity; 12, gas filling pipe; 1a, first air duct; 1b, second air duct; 1c, third air duct; 2, fan; 3, heating device; 4, guide device; 41, first wind grid; 411, plate body; 412, adjustment component; 4121, first adjustment plate; 4122, second adjustment plate; 42, second wind grid; 5, thermal insulation structure; 6, partition; 7, connecting plate. DETAILED DESCRIPTION

[0026] In the following, only some exemplary embodiments are briefly described. As those skilled in the art will appreciate, the described embodiments may be modified in various ways without departing from the spirit or scope of the embodiments of the present invention. Therefore, the drawings and descriptions are considered to be exemplary and non-restrictive in nature.

[0027] In the description of the embodiments of the present utility model application, it needs to be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside", "outside", "clockwise", "counterclockwise", "axial", "radial", "circumferential", "end", "side", etc., indicating the orientation or position relationship, are based on the orientation or position relationship shown in the accompanying drawings, and are only for the convenience of describing the embodiments of the present utility model application and simplifying the description, and do not indicate or imply that the referred device or element must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as a limitation on the embodiments of the present utility model application.

[0028] In addition, the terms "first" and "second" are used for descriptive purposes only and should not be understood as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Therefore, a feature defined as "first" or "second" may explicitly or implicitly include one or more of the features. In the description of the embodiments of the present utility model application, the meaning of "multiple" is two or more, unless otherwise clearly and specifically defined.

[0029] In the embodiments of the present utility model application, unless otherwise clearly specified and limited, the terms "install", "connect", "connect", "fix" and the like should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection, an electrical connection, or a communication; it can be a direct connection, or an indirect connection through an intermediate medium, it can be the internal connection of two elements or the interaction relationship between two elements. For ordinary technicians in this field, the specific meanings of the above terms in the embodiments of the present utility model application can be understood according to the specific circumstances.

[0030] In the embodiments of the utility model application, unless otherwise clearly specified and limited, the first feature being "above" or "below" the second feature may include the first and second features being in direct contact, or may include the first and second features not being in direct contact but being in contact through another feature between them. Moreover, the first feature being "above", "above" and "above" the second feature includes the first feature being directly above and obliquely above the second feature, or simply indicates that the first feature is higher in level than the second feature. The first feature being "below", "below" and "below" the second feature includes the first feature being directly below and obliquely below the second feature, or simply indicates that the first feature is lower in level than the second feature.

[0031] The disclosure below provides many different embodiments or examples for realizing different structures of the embodiments of the utility model application. In order to simplify the disclosure of the embodiments of the utility model application, the components and settings of specific examples are described below. Of course, they are only examples, and the purpose is not to limit the embodiments of the utility model application. In addition, the embodiments of the utility model application can repeat reference numbers and / or reference letters in different examples, and this repetition is for the purpose of simplification and clarity, and does not itself indicate the relationship between the various embodiments and / or settings discussed.

[0032] The embodiments of the present utility model are described in detail below with reference to the accompanying drawings.

[0033] like Figure 1~Figure 4 As shown, the embodiment of the utility model application provides a hot air circulation structure of an annealing furnace, including a furnace body 1 and a fan 2 and a heating device 3 arranged on the furnace body 1. The furnace body 1 is provided with an air duct formed outside the furnace cavity 11, and the air duct includes a first air duct 1a, a second air duct 1b and a third air duct 1c. The first air duct 1a is arranged on the left side of the furnace cavity 11 and is connected to the furnace cavity 11; the second air duct 1b is arranged on the right side of the furnace cavity 11 and is connected to the furnace cavity 11; the third air duct 1c is arranged on the top of the furnace cavity 11, one end of which is connected to the first air duct 1a, and the other end is connected to the air outlet of the fan 2, and the air inlet of the fan 2 is connected to the second air duct 1b. The heating device 3 is arranged in the first air duct 1a and / or the third air duct 1c. A precision-controlled air supply pipe 12 connected to the third air duct 1c is arranged on the top of the furnace body 1. The air flow enters the furnace cavity 11 from the first air duct 1a. The hot air in the furnace cavity 11 flows back to the first air duct 1a through the second air duct 1b and the third air duct 1c under the action of the fan 2.

[0034] When in use, the furnace chamber 11 is first filled with protective gas, such as nitrogen, and then the heating device 3 starts to heat the gas. At the same time, the axial flow fan 2 is running to stir the gas circulation. The gas in the second air duct 1b is drawn to the third air duct 1c by the axial flow fan 2, and the pressure of the right air duct 1b is reduced. The hot air in the first air duct 1a is blown into the furnace chamber 11 from the left side of the furnace chamber 11 in parallel, and then enters the second air duct 1b from the right side of the furnace chamber 11. The hot air is drawn to the third air duct 1c by the axial flow fan 2 through the second air duct 1b. The hot air forms vortex wind in the third air duct 1c and enters the spiral air duct and then enters the first air duct 1a. It is heated by the heating device 3 to form a cycle. The hot air flows horizontally and vertically in the furnace body, so that the air circulation speed is faster, which is conducive to the uniform heating of the silicon wafer in the furnace chamber. The above-mentioned position layout method causes the airflow entering and exiting the furnace chamber to be blown in and discharged in parallel, which is conducive to reducing the vibration of the silicon wafer in the furnace chamber and reducing the damage to the silicon wafer.

[0035] Optionally, the fan 2 is an axial flow fan.

[0036] Optionally, the heating device 3 is disposed at the connection point between the first air duct 1a and the second air duct 1c, and the gas drawn to the third air duct 1c by the fan 2 is heated by the heating device 3 and then sent into the furnace chamber 11 through the first air duct 1a.

[0037] Optionally, the heating device 3 is a heating rod, and the heating rod is arranged at the upper end of the first air duct 1a.

[0038] Optionally, the lower end of the heating rod is extended to the lower part of the third air duct 1c, which is beneficial to improving the heating effect.

[0039] Optionally, a temperature detection device is provided in the air duct, and the temperature detection device and the fan 2 are both electrically connected to the control system, and the control system receives the communication data of the temperature detection device and regulates the fan 2 to adjust the wind speed in the furnace body 1. As an implementation scenario, the temperature detection device adopts a thermocouple detection device. The temperature detection device can timely display the real-time temperature of different positions in the furnace, and timely feed back to the control system to timely adjust the wind speed in the furnace.

[0040] Optionally, the heating device is electrically connected to a control system, and the control system receives communication data from the temperature detection device and regulates the heating device to adjust the heating temperature of the heating device.

[0041] Optionally, a plurality of temperature detection devices are provided.

[0042] Optionally, a temperature detection device is provided at the upper end and / or the lower end of the first air duct 1a.

[0043] In one embodiment, a flow guide device 4 is disposed in the furnace body 1 , a furnace cavity 11 for accommodating silicon wafers is formed inside the flow guide device 4 , and an air duct is formed between the outer wall of the flow guide device 4 and the inner wall of the furnace body 1 .

[0044] Optionally, a heat-insulating structure 5 is provided on the inner wall of the furnace body 1, and an air duct is formed between the heat-insulating structure 5 and the outer wall of the flow-guiding device 4. As an implementation scenario, the heat-insulating structure 5 uses heat-insulating cotton.

[0045] Furthermore, the left side of the flow guide device 4 has an adjustable first air grille 41, and the right side has an adjustable second air grille 42. When in use, the airflow enters the furnace chamber 11 from the first air duct 1a through the first air grille 41, and enters the second air duct 1b from the second air grille 42. The hot air in the second air duct 1b enters the third air duct 1c under the action of the fan 2, and is heated by the heating device 3 in the third air duct 1c and / or the first air duct 1a, and then flows back from the first air duct 1a to the furnace chamber 11. The left and right sides of the flow guide device 4 are adjustable air grilles, which can ensure the consistency of the air flow rate up and down.

[0046] The air grille openings on the first air grille 41 and the second air grille 42 can be adjusted according to different requirements. The size of the hot air, that is, the air inlet and air outlet of the furnace chamber 11, can be adjusted by adjusting the size of the air grille openings.

[0047] Optionally, the air grille openings on the first air grille 41 and the second air grille 42 are gradually enlarged from top to bottom, which is beneficial to ensure the uniformity of the temperature in the furnace chamber 11 from top to bottom.

[0048] Optionally, the air grille openings on the first air grille 41 and the second air grille 42 are staggered.

[0049] In one embodiment, reference Figure 2 As shown, a fan air guide tube and a partition 6 are installed on the fan 2. One end of the partition 6 is connected to the inner wall of the furnace body 1, and the other end is connected to the guide device 4.

[0050] Optionally, there is a gap between the partition 6 and the guide device 4 , and a connecting plate 7 is arranged in the gap. The upper end of the connecting plate 7 is connected to the bottom of the partition 6 , and the lower end is connected to the top of the guide device 4 .

[0051] In one embodiment, a plurality of furnace chambers are arranged in the furnace body 1, and correspondingly, independent air ducts are arranged outside the furnace chambers. Figure 1 As shown, the top of the furnace body 1 corresponding to the furnace cavity is provided with a gas supply pipe 12 and a fan 2, an air duct is formed on the outside of each furnace cavity, and a heating device is provided in the first air duct. Optionally, two fans are arranged at intervals on the furnace body corresponding to each furnace cavity. By independently setting up multiple furnace cavities, the heating effect of the silicon wafer can be improved. The temperature of each furnace cavity is controlled separately, which can reduce the temperature difference, and is also conducive to the circulation of hot air to ensure the uniformity of temperature.

[0052] In one embodiment, if Figure 5 and Figure 6 As shown, the first air grille 41 includes a plate body 411, on which a plurality of adjustment components 412 are arranged at intervals, and the adjustment component 411 includes a first adjustment plate 4121 and a second adjustment plate 4122 that can slide relatively, and the first adjustment plate 4121 and the plate body 411 corresponding to the first adjustment plate 4121 are both provided with connected air grille openings, and the second adjustment plate 4122 is also provided with air grille openings, and when the second adjustment plate 4122 slides relative to the first adjustment plate 4121, the overlap of the air grille openings on the two adjustment plates can be adjusted, thereby adjusting the size of the air grille opening and the air volume. The second air grille 42 has a substantially same structure as the first air grille 41.

[0053] In another embodiment, reference Figure 5 and Figure 6As shown, the first air grille 41 includes a plate body 411, and a plurality of air grille openings are provided on the plate body 411. Adjustment components 412 are respectively provided on both sides of the air grille openings. The adjustment components 412 include two relatively slidable first adjustment plates 4121 and second adjustment plates 4122. The first adjustment plate 4121 is connected to the plate body 411, and the second adjustment plate 4122 is slidably connected to the first adjustment plate 4121. When the second adjustment plate 4122 slides, the overlap between the second adjustment plate 4122 and the air grille opening can be adjusted, thereby adjusting the size of the air grille opening and the air volume. The second air grille 42 has a substantially same structure as the first air grille 41.

[0054] Of course, the first wind grille 41 and the second wind grille 42 can also be other types of adjustable wind grilles, as long as the air volume can be adjusted. Those skilled in the art can set them according to actual needs, and the embodiments of the present application do not limit this.

[0055] A method for using the hot air circulation structure of an annealing furnace: first, fill the furnace cavity with protective gas, such as nitrogen, and then the heating device 3 starts to heat the gas in the first air duct 1a, while the axial flow fan 2 runs to stir the gas circulation, the gas in the second air duct 1b is drawn to the third air duct 1c by the axial flow fan 2, the pressure of the right air duct 1b is reduced, and the hot air in the first air duct 1a is blown into the furnace cavity 11 in parallel through the left adjustable first air grid 41, and then enters the second air duct 1b through the right adjustable second air grid 42. The hot air is drawn to the third air duct 1c by the axial flow fan 2 through the second air duct 1b, and the hot air forms a vortex wind in the third air duct 1c and enters the spiral air duct and then enters the first air duct 1a, and is heated by the heating device 3 to form a circulation, so that the furnace cavity 11 can reach the ±3°C index.

[0056] Parts not described in detail in this embodiment are well-known techniques in the art.

[0057] The above is only a specific implementation of the utility model, but the protection scope of the utility model is not limited thereto. Any technician familiar with the technical field can easily think of various changes or substitutions within the technical scope disclosed by the utility model, which should be included in the protection scope of the utility model. Therefore, the protection scope of the utility model should be based on the protection scope of the claims.

Claims

1. A hot air circulation structure of an annealing furnace, characterized in that: include: Furnace body (1); The furnace body (1) is provided with a fan (2) and a heating device (3); The furnace body (1) is provided with an air duct inside; the air duct comprises: A first air duct (1a) is arranged on the left side of the furnace cavity (11) and is in communication with the furnace cavity (11); A second air duct (1b) is arranged on the right side of the furnace cavity (11) and is in communication with the furnace cavity (11); a third air duct (1c) arranged at the top of the furnace chamber (11), one end of the third air duct (1c) being connected to the first air duct (1a), and the other end being connected to the air outlet of the fan (2), and the air inlet of the fan (2) being connected to the second air duct (1b); The heating device (3) is arranged on the first air duct (1a) and / or the third air duct (1c).

2. The hot air circulation structure of an annealing furnace according to claim 1, characterized in that: A temperature detection device is provided in the air duct, and the temperature detection device and the fan (2) are both electrically connected to a control system. The control system receives communication data from the temperature detection device and regulates the fan (2) to adjust the wind speed in the furnace body (1).

3. The hot air circulation structure of an annealing furnace according to claim 1, characterized in that: The inner wall of the furnace body (1) is provided with a heat insulation structure (5).

4. A hot air circulation structure for an annealing furnace according to claim 1, 2 or 3, characterized in that: A flow guide device (4) is provided in the furnace body (1), a furnace cavity (11) is formed inside the flow guide device (4), and an air duct is formed between the outer wall of the flow guide device (4) and the inner wall of the furnace body (1).

5. The hot air circulation structure of an annealing furnace according to claim 4, characterized in that: The air guide device (4) has an adjustable first air grille (41) on the left side and an adjustable second air grille (42) on the right side.

6. The hot air circulation structure of an annealing furnace according to claim 5, characterized in that: The wind grille openings on the first wind grille (41) and the second wind grille (42) gradually increase in size from top to bottom.

7. The hot air circulation structure of an annealing furnace according to claim 5, characterized in that: The wind grille openings on the first wind grille (41) and the second wind grille (42) are arranged in a staggered manner.

8. The hot air circulation structure of an annealing furnace according to claim 5, characterized in that: The first wind grille (41) or the second wind grille (42) comprises: Plate(411); A plurality of groups of adjustment components (412) are arranged at intervals on the plate body (411); The adjustment component (412) comprises a first adjustment plate (4121) and a second adjustment plate (4122) which are relatively slidable, and the second adjustment plate (4122) can adjust the size of the air grille opening when sliding relative to the first adjustment plate (4121).

9. The hot air circulation structure of an annealing furnace according to claim 4, characterized in that: The fan (2) is provided with a fan air guide tube and a partition (6); one end of the partition (6) is connected to the inner wall of the furnace body (1), and the other end is connected to the guide device (4).

10. The hot air circulation structure of an annealing furnace according to claim 1, characterized in that: A plurality of furnace cavities (11) are arranged in the furnace body (1), and an air duct is arranged outside each furnace cavity (11).

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