Electrostatic chuck cleaning clamp

Abstract

The utility model relates to an electrostatic chuck cleaning clamp. The electrostatic chuck cleaning clamp comprises a plurality of connecting parts and a plurality of adjusting parts arranged on the connecting parts. Every two adjacent connecting parts are connected through one adjusting part, and the adjusting parts and the connecting parts are arranged in a matched mode to define a regular polygon containing space used for containing an electrostatic chuck. The adjusting part adjusts the size of the regular polygon containing space so as to adapt to different electrostatic chucks. According to the utility model, the electrostatic chuck can be quickly placed upside down, and the cleaning surface is ensured to be completely exposed in the cleaning liquid without being blocked; meanwhile, various cleaning clamps with different models and sizes can be defined by adjusting the position relation between the adjusting component and the connecting component, and the electrostatic chuck cleaning clamp has the advantages of being efficient and convenient to use and can well meet the actual requirement of current semiconductor factories for electrostatic chuck cleaning.

Description

Technical Field

[0001] The utility model relates to the technical field of semiconductor equipment parts cleaning, in particular to an electrostatic chuck cleaning fixture. Background Art

[0002] Electrostatic chuck is a general term for ultra-clean wafer carriers and gripping and handling equipment suitable for atmospheric or vacuum environments. In semiconductor technology, electrostatic chucks can provide soft support for large-area thin workpieces without causing scratches or wrinkles when adsorbed. Therefore, electrostatic chucks are often placed inside the cavity of semiconductor devices to carry semiconductor wafers.

[0003] like Figure 1 As shown, the electrostatic chuck comprises an aluminum base 2 and a dielectric layer adsorption disk surface 1 located above the aluminum base 2. The dielectric layer adsorption disk surface 1 is usually made of materials such as polyimide, ceramics, and glass, among which ceramic disk surfaces are the most common. Since the outer diameter of the aluminum base 2 is larger than the outer diameter of the dielectric layer adsorption disk surface 1, a boss structure is formed. In actual work, a semiconductor wafer can be adsorbed and placed on the dielectric layer adsorption disk surface 1, and the wafer placed on the dielectric layer adsorption disk surface 1 can be etched, thin film deposited, ion implanted, and other processes can be performed.

[0004] After the above process, the working environment of the electrostatic chuck is full of chemical substances such as plasma, and the surface of the dielectric layer adsorption disk 1 will adsorb a large amount of deposited ionic compounds. When the accumulation reaches a certain amount, it will contaminate or even scratch the wafer and other adsorbed objects. Therefore, the electrostatic chuck needs to be cleaned frequently.

[0005] However, due to the special material of the electrostatic chuck, whether it is scrubbed with a brush or wiped with a rag, the dielectric layer adsorption disk surface 1 of the electrostatic chuck is easily damaged. In addition, cleaning the ionic compounds deposited on the dielectric layer adsorption disk surface 1 usually requires the use of alkaline chemicals, which can easily corrode the metal base. Therefore, the cleaning of the electrostatic chuck is usually carried out by hoisting and standing it upside down, and the surface to be cleaned is placed in chemicals or pure water for cleaning to prevent the metal base from contacting the cleaning chemicals. However, hoisting requires additional tooling and fixtures to assist in positioning and fixing, or requires thinner hooks to bear heavier weights, which is more cumbersome to implement. Therefore, designing an electrostatic chuck cleaning fixture that overcomes the above-mentioned defects is an urgent problem to be solved, which can facilitate the process of cleaning the electrostatic chuck while extending the service life of the electrostatic chuck. Utility Model Content

[0006] Based on the aforementioned technical problems, the purpose of the utility model is to provide an electrostatic suction cup cleaning fixture, which can quickly realize the inverted placement of the electrostatic suction cup and ensure that the cleaning surface is completely exposed to the cleaning liquid without obstruction, and at the same time can be enclosed into various models and sizes by adjusting the positional relationship between the adjustment component and the connecting component.

[0007] In order to achieve the above-mentioned purpose, the utility model provides an electrostatic chuck cleaning fixture for placing the electrostatic chuck invertedly and cleaning it, wherein the electrostatic chuck comprises an aluminum base and a dielectric layer adsorption disk surface located above the aluminum base, and the outer diameter of the aluminum base is larger than the outer diameter of the dielectric layer adsorption disk surface, and is characterized in that the electrostatic chuck cleaning fixture comprises: a plurality of connecting components and a plurality of adjusting components arranged on the connecting components; every two adjacent connecting components are connected by an adjusting component, and the adjusting component and the connecting component are cooperated to enclose a regular polygonal accommodation space for accommodating the electrostatic chuck; the adjusting component adjusts the size of the regular polygonal accommodation space to accommodate different electrostatic chucks.

[0008] When the electrostatic suction cup is placed upside down in the accommodation space, the connecting component surrounds and fixes the dielectric layer adsorption disk surface.

[0009] Preferably, a supporting component is arranged on each of the connecting components; wherein, when the electrostatic suction cup is placed inverted in the accommodating space, the upper surface of each of the supporting components contacts the surface of the aluminum base not covered by the dielectric layer adsorption disk surface, and the inner surface of each supporting component does not contact the side edge of the dielectric layer adsorption disk surface.

[0010] Optionally, both the upper surface and the inner surface of the supporting component need to be kept flat.

[0011] Optionally, the connecting component and / or the adjusting component are made of plastic or metal coated with plastic.

[0012] Optionally, the support component is made of plastic or metal coated with plastic and is a support block structure.

[0013] Optionally, the connecting component is a connecting rod, the adjusting component is an adjusting block, and the accommodating space formed by the connecting rod and the adjusting block is a square; wherein each adjusting block is respectively connected to two adjacent connecting rods, the two connecting rods respectively pass through the adjusting blocks, and keep the two connecting rods perpendicular to each other and staggered with each other.

[0014] Optionally, by moving the position of each adjustment block, the length of the end of the connecting rod extending through the adjustment block becomes longer or shorter, so as to adjust the size of the accommodating space for accommodating the electrostatic suction cup formed by the adjustment block and the connecting rod.

[0015] Optionally, the connecting component is a connecting plate, the adjusting component is a tooth groove arranged on the connecting plate, and the accommodating space formed by the connecting plate and the tooth groove is square; wherein the tooth grooves on each two adjacent connecting plates are arranged in opposite directions so that the two adjacent connecting plates can be connected by inserting and engaging with each other through the tooth grooves.

[0016] Optionally, the size of the space enclosed by the connection plate for accommodating the electrostatic chuck is adjusted by selecting the tooth groove close to the end of the connection plate or the tooth groove far from the end of the connection plate for connection.

[0017] In summary, compared with the prior art, the present invention has the following beneficial effects:

[0018] (1) The electrostatic chuck can be quickly placed upside down and the cleaning surface can be completely exposed to the cleaning liquid without any obstruction;

[0019] (2) By adjusting the positional relationship between the adjusting component and the connecting component, cleaning fixtures of various sizes and models can be formed;

[0020] (3) The structure is simple, the operation is convenient, and it is easy to use, which can well meet the actual needs of current semiconductor factories for electrostatic chuck cleaning. BRIEF DESCRIPTION OF THE DRAWINGS

[0021] Figure 1 It is a schematic diagram of the specific structure of an electrostatic chuck in the prior art;

[0022] Figure 2 This is a schematic diagram of the specific structure of the first embodiment of the utility model;

[0023] Figure 3 This is a schematic diagram of implementing an inverted placement of an electrostatic chuck in the first embodiment of the utility model;

[0024] Figure 4 This is a schematic diagram of the specific structure of the second embodiment of the utility model;

[0025] Figure 5 It is a schematic diagram of the specific structure of different process variations of the second embodiment of the utility model. DETAILED DESCRIPTION

[0026] The following is combined with Figure 1 To Attachment Figure 5 , the utility model is further explained by describing a preferred specific embodiment in detail.

[0027] It should be noted that the drawings are in a very simplified form and use non-precise proportions. They are only used to conveniently and clearly assist in explaining the implementation methods of the utility model, and are not used to limit the conditions for the implementation of the utility model. Therefore, they have no substantive technical significance. Any structural modification, change in proportional relationship or adjustment of size should still fall within the scope of the technical content disclosed by the utility model without affecting the efficacy and purpose that can be achieved by the utility model.

[0028] Unless otherwise defined, all technical and scientific terms used in the specification of this application have the same meaning as those commonly understood by those skilled in the art to which this application belongs. The terms used in the specification of this application are only for the purpose of describing specific embodiments and are not intended to limit this application. The term "and / or" used in the specification of this application includes any and all combinations of one or more related listed items.

[0029] The utility model provides an electrostatic chuck cleaning fixture, which is used for placing the electrostatic chuck invertedly and cleaning it. The electrostatic chuck cleaning fixture comprises: a plurality of connecting components and a plurality of adjusting components arranged on the connecting components.

[0030] Wherein, every two adjacent connecting components are connected by an adjusting component, and the adjusting component and the connecting component are cooperatively arranged to enclose and form a accommodating space for accommodating the electrostatic suction cup, and the size of the accommodating space matches the size of the electrostatic suction cup; wherein, when the electrostatic suction cup is inverted and placed in the accommodating space, the connecting component can surround and fix the surface of the dielectric layer adsorption disk 1, and at this time, the aluminum base 2 is located above the connecting component, and the upper surface of the connecting component is in contact with the surface of the aluminum base 2 not covered by the dielectric layer adsorption disk surface 1, so as to provide support.

[0031] Among them, each of the adjusting components can adjust the accommodating space to be a regular polygon by adjusting the relative position between itself and the connected connecting component, so that each of the connecting components is tangent to the side edge portion of the dielectric layer adsorption disk surface 1, thereby surrounding and clamping the dielectric layer adsorption disk surface 1, thereby achieving stable inverted placement of the electrostatic suction cup.

[0032] Furthermore, each of the connecting components is also provided with a supporting component. When the electrostatic chuck is placed upside down in the accommodation space, the upper surface of each supporting component contacts the surface of the aluminum base 2 that is not covered by the dielectric layer adsorption disk surface 1, so as to increase the contact area with the electrostatic chuck, so as to make the support for the entire electrostatic chuck more stable and reliable; and the inner surface of each supporting component contacts the side of the dielectric layer adsorption disk surface 1, which can protect the dielectric layer adsorption disk surface 1 while surrounding and fixing it. Therefore, the upper surface and the inner surface of the supporting component need to be kept flat.

[0033] like Figure 2 and Figure 3 As shown, in the first embodiment of the utility model, the cleaning fixture encloses a square accommodation space as an example for detailed description. In this embodiment, the connecting parts are four connecting rods 31, and the adjusting parts are four adjusting blocks 32. Among them, each adjusting block 32 is respectively connected to two adjacent connecting rods 31; specifically, when each adjusting block 32 is connected, the two connecting rods 31 respectively pass through the adjusting block 32 vertically, and keep the two connecting rods 31 perpendicular to each other, and the two connecting rods 31 are staggered in the vertical direction to avoid mutual interference. Among them, by moving the position of each adjusting block 32, the length of the end of the connecting rod 31 extending after passing through the adjusting block 32 becomes longer or shorter, so as to play an adjusting role, so as to control the size of the accommodation space for accommodating the electrostatic suction cup formed by the cooperation of the adjusting block 32 and the connecting rod 31, so that when the electrostatic suction cup is inverted and placed in the accommodation space, the four connecting rods 31 can surround and fix the dielectric layer adsorption disk surface 1.

[0034] In the above-mentioned first embodiment of the utility model, the supporting component adopts four supporting blocks 33, each of which is vertically penetrated by a connecting rod 31 and is arranged in the middle position of each connecting rod 31, so as to ensure the support of the aluminum base 2 while being tangentially in contact with the edge part of the dielectric layer adsorption disk; wherein the upper surfaces of the four supporting blocks 33 are maintained at the same height.

[0035] Specifically, in the practical application of the first embodiment described above, the cleaning fixture can move and adjust the size of the enclosed square space, so as to allow for the common use of electrostatic chucks of various product sizes. When the connecting rod 31 and the adjusting block 32 form a square with a side length of 300 mm, a 12-inch electrostatic chuck can be placed; when the connecting rod 31 and the adjusting block 32 form a square with a side length of 200 mm, an 8-inch electrostatic chuck can be placed; when the connecting rod 31 and the adjusting block 32 form a square with a side length of 150 mm, a 6-inch electrostatic chuck can be placed; and so on, a set of fixtures can be compatible with the cleaning of electrostatic chucks of various specifications and sizes.

[0036] Furthermore, in the first embodiment described above, the specific use process of the electrostatic chuck cleaning fixture is as follows: first, the fixture is placed in a cleaning tank, and the positional relationship between the connecting rod 31 and the adjusting block 32 of the fixture is adjusted according to the size of the electrostatic chuck product currently to be cleaned, so as to form an enclosed square accommodation space; secondly, the dielectric layer adsorption disk surface 1 of the electrostatic chuck is placed upside down in the square accommodation space enclosed by the fixture, at which time the surface of the aluminum base 2 not covered by the dielectric layer adsorption disk surface 1 contacts the upper surface of each support block 33 to achieve a supporting effect, and the dielectric layer The edge portion of the adsorption disk surface 1 is in tangential contact with the inner surface of each of the support blocks 33 to achieve a fixing effect, thereby realizing the unobstructed and fully exposed stable inverted placement of the dielectric layer adsorption disk surface of the electrostatic suction cup; then, deionized water and / or chemical liquid are injected into the cleaning tank to completely immerse the dielectric layer adsorption disk surface 1 of the electrostatic suction cup therein; then, the dielectric layer adsorption disk surface 1 of the electrostatic suction cup is subjected to a cleaning process such as immersion, ultrasonic cleaning or brush cleaning in the cleaning tank according to a predetermined process; finally, after cleaning, the electrostatic suction cup is taken out and dried for next use.

[0037] In the second embodiment of the present utility model, Figure 4 and Figure 5 As shown, the cleaning fixture encloses a square accommodating space as an example for detailed description. In this embodiment, the connecting components are four connecting plates 41, and the adjusting components are teeth grooves 42 arranged on the connecting plates. Among them, the teeth grooves 42 on each two adjacent connecting plates 41 need to maintain different orientations, that is, the teeth grooves 42 of one connecting plate 41 are facing upward, and the teeth grooves 42 of another adjacent connecting plate 41 must be facing downward, so that the two adjacent connecting plates 41 can be connected by inserting and biting each other through the teeth grooves 42. Among them, by selecting the teeth grooves 42 closer to the end of the connecting plate 41 for connection, or the teeth grooves 42 farther away from the end of the connecting plate 41 for connection, the adjustment effect is exerted to control the size of the space enclosed by the connecting plate 41 for accommodating the electrostatic suction cup.

[0038] Alternatively, if Figure 4 and Figure 5 As shown, the tooth grooves 42 can be arranged on the entire connecting plate 41 , or can be arranged only at two ends of the connecting plate 41 .

[0039] Correspondingly, in the second embodiment of the present utility model, the connecting plate 41 may also be provided with a supporting member ( Figure 4 , Figure 5 In the second embodiment of the present invention, the supporting member may also adopt a supporting block 33.

[0040] Correspondingly, in the above-mentioned second embodiment, the specific use process of the electrostatic suction cup cleaning fixture is similar to the steps in the first embodiment, the difference being that, in this embodiment, first, the fixture is placed in a cleaning tank, and the positional relationship of the tooth grooves 42 connecting adjacent connecting plates 41 of the fixture is adjusted according to the size of the electrostatic suction cup product currently to be cleaned to form an enclosed square accommodating space, and the subsequent steps are the same.

[0041] In other embodiments of the present invention, the accommodating space enclosed by the cleaning fixture is other regular polygons, such as regular triangles. Regular hexagons are also feasible solutions, which are variations that can be easily thought of by those skilled in the art.

[0042] Optionally, the connecting component, the adjusting component and the supporting component are all made of soft materials, such as plastic or metal material coated with plastic, which can play a role in buffering and reducing friction when the electrostatic suction cup is placed inverted, and effectively avoid friction damage to the metal base of the electrostatic suction cup caused by the cleaning fixture.

[0043] To sum up, the utility model provides an electrostatic chuck cleaning fixture, which can quickly realize the inverted placement of the electrostatic chuck and ensure that the cleaning surface is completely exposed to the cleaning liquid without obstruction; at the same time, by adjusting the positional relationship between the adjusting component and the connecting component, it can be enclosed into cleaning fixtures of various models and sizes, and has the characteristics of high efficiency and convenience, and can well meet the actual needs of current semiconductor factories for electrostatic chuck cleaning.

[0044] Although the content of the utility model has been described in detail through the above preferred embodiments, it should be appreciated that the above description should not be considered as a limitation of the utility model. After reading the above content, various modifications and substitutions of the utility model will be obvious to those skilled in the art. Therefore, the protection scope of the utility model should be limited by the attached claims.

Claims

1. An electrostatic chuck cleaning fixture, used to place the electrostatic chuck invertedly and clean it, the electrostatic chuck comprising an aluminum base and a dielectric layer adsorption disk surface located above the aluminum base, and the outer diameter of the aluminum base is larger than the outer diameter of the dielectric layer adsorption disk surface, characterized in that: The electrostatic chuck cleaning fixture comprises: a plurality of connecting components and a plurality of adjusting components arranged on the connecting components; Every two adjacent connecting parts are connected by an adjusting part, and the adjusting part and the connecting part are arranged in cooperation to enclose and form a regular polygonal accommodation space for accommodating the electrostatic chuck; The adjusting component adjusts the size of the regular polygonal accommodation space to accommodate different electrostatic chucks; When the electrostatic suction cup is placed upside down in the accommodation space, each of the connecting components is tangent to the side edge portion of the dielectric layer suction disk surface, and the connecting components surround and fix the dielectric layer suction disk surface.

2. The electrostatic chuck cleaning fixture according to claim 1, characterized in that: A supporting component is provided on each of the connecting components; When the electrostatic suction cup is placed upside down in the accommodating space, the upper surface of each supporting component contacts the surface of the aluminum base not covered by the dielectric layer adsorption disk surface, and the inner surface of each supporting component contacts the side edge of the dielectric layer adsorption disk surface.

3. The electrostatic chuck cleaning fixture according to claim 2, characterized in that: The upper surfaces of the supporting components are located at the same height.

4. The electrostatic chuck cleaning fixture according to claim 3, characterized in that: The upper surface and the inner surface of the supporting component need to be kept flat.

5. The electrostatic chuck cleaning fixture according to claim 1, characterized in that: The connecting component and / or the adjusting component are made of plastic or metal coated with plastic.

6. The electrostatic chuck cleaning fixture according to claim 4, characterized in that: The support component is made of plastic or metal coated with plastic and is a support block structure.

7. The electrostatic chuck cleaning fixture according to any one of claims 1 to 6, characterized in that: The connecting component is a connecting rod, the adjusting component is an adjusting block, and the accommodating space formed by the connecting rod and the adjusting block is a square; Wherein, each adjusting block is respectively connected to two adjacent connecting rods, and the two connecting rods respectively pass through the adjusting blocks, and the two connecting rods are kept perpendicular to each other and staggered with each other.

8. The electrostatic chuck cleaning fixture according to claim 7, characterized in that: By moving the position of each adjusting block, the length of the end of the connecting rod extending through the adjusting block becomes longer or shorter, so as to adjust the size of the accommodating space for accommodating the electrostatic suction cup formed by the cooperative arrangement of the adjusting block and the connecting rod.

9. The electrostatic chuck cleaning fixture according to any one of claims 1 to 6, characterized in that: The connecting component is a connecting plate, the adjusting component is a tooth groove arranged on the connecting plate, and the accommodating space formed by the connecting plate and the tooth groove is a square; The teeth on each two adjacent connecting plates are arranged in opposite directions, so that the two adjacent connecting plates can be connected by inserting and engaging with each other through the teeth.

10. The electrostatic chuck cleaning fixture according to claim 9, characterized in that: The size of the space enclosed by the connection plate for accommodating the electrostatic chuck is adjusted by selecting the tooth groove close to the end of the connection plate or the tooth groove far from the end of the connection plate for connection.

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