Polishing machine
By designing the water barrier and chute structure in the polishing machine, the movement of the slide plate and the mounting plate can achieve rapid cleaning of the cleaning brush, which solves the problems of grinding powder deposition and oxidation, and improves the convenience and equipment life of the polishing machine.
Patent Information
- Application Number
- CN202420793643.5
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-04-17
- Publication Date
- 2025-02-18
- Estimated Expiration
- 2034-04-17
AI Technical Summary
During the polishing process, the ground powder is easily adsorbed and deposited on the inner wall of the excretion equipment of the polishing machine. If it is not cleaned in time, the powder will oxidize and cause damage to the polishing machine.
A polishing machine is designed, using a water barrier and a chute structure. Through the movement of the slide and mounting plate, the cleaning brush can quickly clean the inner wall of the water barrier and prevent powder deposition and oxidation.
It realizes rapid cleaning of the cooling water discharge system of the polishing machine, avoids oxidation damage of the powder, and improves the convenience of the polishing machine and the equipment life.
Smart Images
Figure CN222493656U_ABST
Abstract
Description
Technical Field
[0001] The present application relates to the technical field of polishing and grinding equipment, and in particular to a polishing machine. Background Art
[0002] Polishing machines are also called grinders and are often used for mechanical grinding, polishing and waxing. The working principle is that the motor drives the sponge or wool polishing disc installed on the polishing machine to rotate at high speed. Due to the combined effect of the polishing disc and the polishing agent and the friction with the surface to be polished, the paint surface pollution, oxide layer and shallow marks can be removed.
[0003] When the polishing machine is polishing, the friction between the polishing disc and the surface to be polished will generate heat. Most polishing machines cool down by spraying cooling water on the polishing disc, and at the same time clean the powder ground during the polishing process through the flow of cooling water. However, during the circulation of cooling water, the ground powder is easily adsorbed and deposited on the inner wall of the polishing machine's discharge device. If the residual powder is not cleaned in time, the residual powder is easily oxidized when in contact with the air, causing damage to the polishing machine. Utility Model Content
[0004] In order to improve the convenience of the polishing machine during operation, the present application provides a polishing machine.
[0005] The present application provides a polishing machine, which adopts the following technical solution:
[0006] A polishing machine comprises a chassis, a polishing assembly for polishing is installed on the chassis, a cooling assembly is installed on the chassis, the cooling assembly comprises a water retaining platform, a water flow groove is provided on the water retaining platform, a slide is provided on the water retaining platform, the slide is connected to the water flow groove, a cleaning assembly for cleaning the water retaining platform is installed on the water retaining platform, the cleaning assembly comprises a slide plate, the slide plate is slidably connected to the water retaining platform via the slide plate, a slide rod is connected to the slide plate, a mounting plate is mounted on the slide rod, and a cleaning brush is mounted on the mounting plate.
[0007] By adopting the above technical solution, the polishing component polishes the material to be polished, and during polishing, the cooling water is sprayed by the cooling component to cool the heat generated during the polishing process. The water retaining platform collects and guides the cooling water to discharge from the polishing machine. After polishing is completed, the mounting plate is driven to move in the water retaining platform by controlling the slide plate, so that the cleaning brush cleans the inner wall of the water retaining platform, which is convenient for quick cleaning of the water retaining platform and is beneficial to improving the convenience of the polishing machine during use.
[0008] In a specific feasible implementation scheme, a first guide rod and a second guide rod are installed on the slide, a limiting plate is installed on the first guide rod and the second guide rod away from one end of the slide, a pressing plate is slidably installed on the first guide rod and the second guide rod, and a spring is respectively sleeved on the first guide rod and the second guide rod, one end of the spring is connected to the slide, and the other end of the spring is connected to the pressing plate.
[0009] In a specific possible implementation manner, a groove is provided on the pressing sheet, and an anti-slip pattern is provided inside the groove.
[0010] By adopting the above technical solution, grooves and anti-slip patterns are provided on the pressing tablet, which can increase friction and facilitate pressing and quick control of the pressing tablet.
[0011] By adopting the above technical solution, during polishing, the spring pushes the pressing plate to abut against the limit plate through elastic force. At this time, the spring controls the pressing plate to lift the mounting plate so that a distance is left between the cleaning brush and the bottom wall of the water retaining platform, thereby facilitating the circulation of cooling water during polishing. At the same time, when polishing is completed, pressing the pressing plate can quickly drive the mounting plate to move downward so that the cleaning brush is close to the water retaining platform, thereby facilitating quick cleaning of the inner wall of the water retaining platform.
[0012] In a specific possible implementation scheme, the water retaining platform is configured to be circular, and the chute is circumferentially opened on the water retaining platform.
[0013] By adopting the above technical solution, the water retaining platform is set to be circular, which makes it easy for the skateboard to slide on the entire water retaining platform and can quickly clean up the residues.
[0014] In a specific possible implementation manner, the slide groove is an L-shaped groove, and the slide plate is also an L-shaped plate.
[0015] By adopting the above technical solution, the slide plate is installed in the slide groove, and the slide plate can be limited by the arrangement of the L-shaped slide groove and the slide plate to prevent the slide plate from sliding out of the slide groove.
[0016] In a specific possible implementation manner, the mounting plate is arranged in an arc shape close to both ends of the water retaining platform.
[0017] By adopting the above technical solution, the mounting plate is arranged in an arc shape close to both ends of the water retaining platform, which facilitates the movement of the mounting plate in the water retaining platform. At the same time, more brushes can be installed on the mounting plate to increase the cleaning range and facilitate quick cleaning of polishing residues.
[0018] In a specific possible implementation manner, the polishing assembly includes a motor, the motor is installed in the chassis, and the output shaft of the motor is fixedly connected to a polishing disk.
[0019] By adopting the above technical solution, the rotation of the polishing disc can be controlled by clicking to achieve rapid grinding and polishing of the material to be polished.
[0020] In a specific possible implementation mode, the cooling assembly further includes a faucet, which is mounted on the chassis, and a water outlet pipe for discharging cooling water is mounted on the bottom surface of the water retaining platform, and the water outlet pipe is connected to the water trough.
[0021] By adopting the above technical solution, cooling water is sprayed through the faucet, and the polishing disc is cooled by flowing water. At the same time, the cooling water can take away the polished powder to prevent the powder from being scattered in the air.
[0022] In summary, the present application includes at least one of the following beneficial technical effects:
[0023] 1. The polishing component polishes the material to be polished. During polishing, the cooling water is sprayed by the cooling component to cool the heat generated during the polishing process. The water retaining platform collects and guides the cooling water to be discharged from the polishing machine. After polishing is completed, the mounting plate is driven to move in the water retaining platform by controlling the slide plate, so that the cleaning brush cleans the inner wall of the water retaining platform, which is convenient for quick cleaning of the water retaining platform and helps to improve the convenience of the polishing machine during use.
[0024] 2. Through the setting of the pressing plate, when polishing, the spring pushes the pressing plate to abut against the limit plate through elastic force. At this time, the spring controls the pressing plate to lift the mounting plate so that a distance is left between the cleaning brush and the bottom wall of the water retaining platform, which is convenient for the circulation of cooling water during polishing; at the same time, when polishing is completed, pressing the pressing plate can quickly drive the mounting plate to move downward so that the cleaning brush is close to the water retaining platform, which is convenient for quickly cleaning the inner wall of the water retaining platform.
[0025] 3. The mounting plate is set in an arc shape close to both ends of the water retaining platform, which is convenient for the mounting plate to move in the water retaining platform. At the same time, more brushes can be installed on the mounting plate to increase the cleaning range and facilitate the rapid cleaning of polishing residues. BRIEF DESCRIPTION OF THE DRAWINGS
[0026] Figure 1 It is a schematic diagram of a polishing machine according to an embodiment of the present application.
[0027] Figure 2 It is a schematic diagram of the polishing machine of an embodiment of the present application with the box cover removed.
[0028] Figure 3 It is a cross-sectional view of the polishing machine according to an embodiment of the present application.
[0029] Figure 4 yes Figure 3 Enlarged view of point A in the middle.
[0030] Figure 5It is a schematic diagram of the installation position relationship between the pressing plate and the sliding rod of the cleaning component of the embodiment of the present application.
[0031] Figure 6 It is a schematic diagram of the arc-shaped structure of the mounting plate of the cleaning component embodying the embodiment of the present application.
[0032] Explanation of the reference numerals: 1. chassis; 2. polishing assembly; 21. motor; 22. polishing disc; 3. cooling assembly; 31. faucet; 32. water retaining platform; 33. water trough; 34. water outlet pipe; 35. cleaning assembly; 351. slide; 352. slide plate; 3531. first guide rod; 3532. second guide rod; 3533. spring; 354. limit plate; 355. pressing sheet; 3551. groove; 356. slide rod; 357. mounting plate; 358. cleaning brush; 36. box cover; 361. handle. DETAILED DESCRIPTION
[0033] The following is combined with Figure 1-6 This application is described in further detail.
[0034] Example:
[0035] The present application embodiment discloses a polishing machine, referring to Figure 1 and Figure 2 , including a chassis 1, a polishing component 2 is installed on the chassis 1, and a cooling component 3 is installed on the chassis 1 for cooling during polishing.
[0036] The polishing component 2 is used to polish the material to be polished, and the cooling component 3 is used to cool the heat generated during the polishing process, which is beneficial to improving the convenience of the polishing machine during use.
[0037] Reference Figure 2 and Figure 3 The polishing assembly 2 includes a motor 21 , which is fixedly installed in the chassis 1 . The motor 21 is vertically arranged with the output shaft facing upward, and the output shaft of the motor 21 is fixedly connected to a polishing disc 22 .
[0038] The motor 21 drives the polishing disc 22 to rotate, so as to quickly polish the material to be polished.
[0039] Reference Figure 1 , Figure 2 and Figure 3The cooling assembly 3 includes a faucet 31, which is fixedly mounted on the chassis 1 and connected to a connecting pipe for accessing a water source. The cooling assembly 3 also includes a water retaining platform 32, which is fixedly mounted on the chassis 1 and is arranged in a circular shape. The polishing disc 22 is arranged in the water retaining platform 32 and the horizontal height of the top surface of the water retaining platform 32 is higher than the horizontal height of the top surface of the polishing disc 22. A water trough 33 is provided on the water retaining platform 32, and a water outlet pipe 34 is connected to the bottom surface of the water retaining platform 32, and the water outlet pipe 34 is connected to the water trough 33. A box cover 36 is installed to match the outer contour of the water retaining platform 32, and a handle 361 is fixedly installed on the box cover 36.
[0040] When the polishing machine needs to be used, the control handle 361 can quickly open the box cover 36. When polishing is performed, the faucet 31 is opened to allow cooling water to flow to the polishing disc 22. The flowing water flowing out of the faucet 31 is used to take away the heat generated by the polishing disc 22 during polishing, thereby achieving a cooling effect. The cooling water is blocked by the water retaining platform 32 and flows into the water tank 33, and finally flows out from the outlet pipe 34. Using the water retaining platform 32 to block the cooling water can facilitate the collection of cooling water during the polishing process and prevent the cooling water from polluting the working environment. At the same time, when polishing is completed, the box cover 36 is covered on the water retaining platform 32 to prevent external dust and foreign matter from falling on the polishing disc 22 or falling into the water retaining platform 32, thereby protecting the polishing machine.
[0041] Reference Figure 4 and Figure 5 A cleaning assembly 35 for cleaning polishing residues is installed on the water retaining platform 32 , and a slide groove 351 is circumferentially opened on the water retaining platform 32 . In this embodiment, the slide groove 351 is an L-shaped slide groove 351 , and the slide groove 351 is connected to the water trough 33 . The cleaning assembly 35 includes a slide plate 352, which is slidably mounted on the water retaining platform 32. The slide plate 352 is an L-shaped plate. The slide plate 352 is slidably connected to the water retaining platform 32 through a slide groove 351. A first guide rod 3531 and a second guide rod 3532 are fixedly mounted on one end of the slide plate 352 extending out of the slide groove 351. The first guide rod 3531 and the second guide rod 3532 are both vertically arranged. The first guide rod 3531 and the second guide rod 3532 are fixedly connected to a limiting plate 354 at one end away from the slide plate 352. A pressing plate 355 is slidably connected to the first guide rod 3531 and the second guide rod 3532. The first guide rod 3531 and the second guide rod 3532 are both sleeved with a spring 3533. One end of the spring 3533 is fixedly connected to the slide plate 352, and the other end of the spring 3533 is fixedly connected to the bottom surface of the pressing plate 355. In this embodiment, a groove 3551 is formed on the pressing sheet 355 , and anti-slip patterns are arranged in the groove 3551 on the pressing sheet 355 .
[0042] Reference Figure 4 and Figure 6The pressing plate 355 is fixedly connected with a slide bar 356, which is vertically arranged, passes through the slide plate 352 and is slidably connected to the slide plate 352, and a mounting plate 357 is fixedly installed on one end of the slide bar 356 away from the pressing plate 355, and a cleaning brush 358 is fixedly installed on the bottom surface of the mounting plate 357. In this embodiment, both ends of the mounting plate 357 close to the side wall of the water retaining platform 32 are set in an arc shape.
[0043] Reference Figure 4 and Figure 5 When polishing, the spring 3533 pushes the pressing plate 355 to contact the limiting plate 354 through elastic force. At this time, the spring 3533 controls the pressing plate 355 to lift the mounting plate 357 so that the cleaning brush 358 is at a distance from the bottom wall of the water retaining platform 32, which is convenient for the circulation of cooling water during polishing. When polishing is completed, the pressing plate 355 is pressed downward, and the pressing plate 355 slides downward on the first guide rod 3531 and the second guide rod 3532. The pressing plate 355 pushes the sliding rod 356 and the mounting plate 357 to move downward, thereby driving the cleaning brush 358 to move downward to a distance for cleaning the water retaining platform 32. The pressing plate 355 is pushed to control the sliding plate 352 to slide along the slide groove 351 on the water retaining platform 32, thereby driving the cleaning brush 358 to move inside the water retaining platform 32, so as to clean the grinding residues adsorbed and deposited on the inner wall of the water retaining platform 32, and finally discharge them from the water outlet pipe 34. By pushing the pressing sheet 355 to control the installation plate 357 to move in the water retaining platform 32, the water retaining platform 32 can be quickly cleaned, which is beneficial to improving the convenience of the polishing machine during use.
[0044] The implementation principle of the embodiment of the present application is: the polishing disc 22 is controlled to rotate by the motor 21 to polish the material to be polished, and cooling water is sprayed by the faucet 31 during polishing to cool the heat generated during the polishing process, and the water retaining platform 32 collects and guides the cooling water to flow into the outlet pipe 34 to discharge the polishing machine. After the polishing is completed, the mounting plate 357 is controlled to move in the water retaining platform 32 by pushing the pressing plate 355, so that the cleaning brush 358 cleans the inner wall of the water retaining platform 32, which is convenient for quick cleaning of the water retaining platform 32, which is beneficial to improving the convenience of the polishing machine during use.
[0045] The above are all preferred embodiments of the present application, and the protection scope of the present application is not limited thereto. Therefore, any equivalent changes made according to the structure, shape, and principle of the present application should be included in the protection scope of the present application.
Claims
1. A polishing machine, characterized in that: The invention comprises a chassis (1), wherein a polishing assembly (2) for performing polishing is mounted on the chassis (1), a cooling assembly (3) is mounted on the chassis (1), the cooling assembly (3) comprises a water retaining platform (32), the water retaining platform (32) is mounted on the chassis (1), a water trough (33) is provided on the water retaining platform (32), a slide groove (351) is provided on the water retaining platform (32), the slide groove (351) is communicated with the water trough (33), a cleaning assembly (35) for cleaning the water retaining platform (32) is mounted on the water retaining platform (32), the cleaning assembly (35) comprises a slide plate (352), the slide plate (352) is slidably connected to the water retaining platform (32) via the slide groove (351), the slide plate (352) is connected to a slide rod (356), a mounting plate (357) is mounted on the slide rod (356), and a cleaning brush (358) is mounted on the mounting plate (357).
2. A polishing machine according to claim 1, characterized in that: The slide plate (352) is mounted with a first guide rod (3531) and a second guide rod (3532); a limit plate (354) is mounted on one end of the first guide rod (3531) and the second guide rod (3532) away from the slide plate (352); a pressing plate (355) is slidably mounted on the first guide rod (3531) and the second guide rod (3532); a spring (3533) is sleeved on the first guide rod (3531) and the second guide rod (3532) respectively; one end of the spring (3533) is connected to the slide plate (352), and the other end of the spring (3533) is connected to the pressing plate (355).
3. A polishing machine according to claim 2, characterized in that: The pressing sheet (355) is provided with a groove (3551), and the pressing sheet (355) is provided with an anti-slip pattern.
4. A polishing machine according to claim 1, characterized in that: The water retaining platform (32) is configured to be circular, and the slide groove (351) is opened on the water retaining platform (32) in a circular shape.
5. A polishing machine according to claim 4, characterized in that: The slide groove (351) is an L-shaped groove, and the slide plate (352) is also an L-shaped plate.
6. A polishing machine according to claim 1, characterized in that: The mounting plate (357) is arranged in an arc shape close to both ends of the water retaining platform (32).
7. A polishing machine according to claim 1, characterized in that: The polishing assembly (2) comprises a motor (21), the motor (21) being mounted in the chassis (1), and the output shaft of the motor (21) being fixedly connected to a polishing disc (22).
8. A polishing machine according to claim 1, characterized in that: The cooling assembly (3) further comprises a faucet (31), wherein the faucet (31) is mounted on the chassis (1), and a water outlet pipe (34) for discharging cooling water is mounted on the bottom surface of the water retaining platform (32), wherein the water outlet pipe (34) is connected to the water trough (33).