Protective structure of magnetron sputtering equipment

By designing a protective structure including a protective box, a fixing part, a sealing part, a sputtering shell and a control part, the problem of poor protection of existing magnetron sputtering equipment is solved, and better electromagnetic shielding and multiple protection effects are achieved.

CN222574758UActive Publication Date: 2025-03-07SUZHOU SENWAN ELECTRONICS TECH CO LTD
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Patent Information

Application Number
CN202421356056.6
Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
Filing Date
2024-06-14
Publication Date
2025-03-07
Estimated Expiration
2034-06-14

AI Technical Summary

Technical Problem

The protective structure of existing magnetron sputtering equipment has problems such as poor protection and lack of multiple protection functions.

Method used

A protective structure including a protective box, a fixing part, a sealing part, a sputtering shell and a control part is designed. The sealing and gas management of the vacuum tube and an oxygen tube is realized through the protective box and a sealing part, and the anti-sputtering shell provides multiple protection.

Benefits of technology

It achieves better protection for magnetron sputtering equipment, enhances electromagnetic shielding effect, avoids atmosphere pollution, and ensures the sealing and multiple protection of the equipment.

✦ Generated by Eureka AI based on patent content.

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Patent Text Reader

Abstract

The utility model discloses a protection structure of magnetron sputtering equipment, which belongs to the technical field of magnetron sputtering equipment protection and comprises a protection box body, an equipment body is arranged in the protection box body, a vacuum pipe and an oxygen pipe are arranged at the bottom of the protection box body, and both the vacuum pipe and the oxygen pipe are communicated with the inside of the protection box body; the fixing part comprises a fixing strip and a fixing plate, the fixing strip supports the fixing plate, and the equipment body is located on the fixing plate; the number of the sealing parts is two, one sealing part is used for sealing the vacuum tube, and the other sealing part is used for sealing the oxygen tube; the anti-sputtering shell is positioned above the equipment body and is used for carrying out anti-sputtering protection on the equipment body; and the control part is connected with the sealing part and is used for information interaction and control. The protection structure disclosed by the utility model is better in protection effect, and realizes multiple protection on the magnetron sputtering equipment.
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Description

Technical Field

[0001] The utility model belongs to the technical field of magnetron sputtering equipment protection, and in particular relates to a protection structure of magnetron sputtering equipment. Background Art

[0002] Magnetron sputtering is mainly used for film coating and has a wide range of applications in various fields, such as various functional films, decoration, microelectronics, optics, and mechanical processing. It also plays an important role in the research of high-temperature superconducting films, ferroelectric films, giant magnetoresistance films, thin film luminescent materials, solar cells, and memory alloy films.

[0003] After searching, the Chinese patent with application number "CN201820969086.2" discloses "a magnetron sputtering device" (hereinafter referred to as the comparative document), which records that "the magnetron sputtering device of the utility model adopts a protective plate and a mesh shielding plate, which can conveniently gather sediments and avoid vacuum chamber atmosphere pollution on the one hand, and enhance the electromagnetic shielding effect at the thin wall of the vacuum chamber on the other hand. The installation and disassembly are simple, and no other pollutants are brought in. It can realize the rapid assembly of the sputtering vacuum chamber, avoiding the shortcomings of low efficiency, large errors, easy damage and deformation, and pollution of traditional domestic methods."

[0004] The comparative document utilizes a protective plate and a mesh shielding plate. Firstly, the protective plate and the mesh shielding plate can gather sediments more conveniently and avoid vacuum chamber atmosphere contamination; secondly, the protective plate and the mesh shielding plate can enhance the electromagnetic shielding effect at the thin wall of the vacuum chamber. However, the comparative document still has the problems of poor protection and lack of multiple protection functions in actual use. Utility Model Content

[0005] The utility model overcomes the shortcomings of the prior art and provides a protective structure for magnetron sputtering equipment to solve the problems existing in the prior art.

[0006] In order to achieve the above-mentioned purpose, the technical solution adopted by the utility model is: a protective structure of a magnetron sputtering device, comprising

[0007] A protective box, wherein the device body is arranged in the protective box, and a vacuum tube and an oxygen tube are arranged at the bottom of the protective box, and the vacuum tube and the oxygen tube are both connected to the interior of the protective box;

[0008] A fixing part, the fixing part comprising a fixing bar and a fixing plate, the fixing bar supports the fixing plate, and the device body is located on the fixing plate;

[0009] A sealing part, wherein the number of the sealing parts is two, one of the sealing parts seals the vacuum tube, and the other sealing part seals the oxygen tube;

[0010] An anti-sputtering shell, the anti-sputtering shell is located above the device body and provides anti-sputtering protection for the device body;

[0011] A control unit is connected to the sealing unit for information exchange and control.

[0012] In a preferred embodiment of the utility model, a vacuum pressure sensor and an oxygen detector are provided in the protection box to monitor the vacuum degree and oxygen content in the protection box respectively, and the vacuum pressure sensor and the oxygen detector are both connected to the control unit.

[0013] In a preferred embodiment of the utility model, an exhaust valve is provided in the protection box to discharge the gas in the protection box, and the exhaust valve is connected to the control unit.

[0014] In a preferred embodiment of the utility model, the sealing part includes an electric telescopic rod and a sealing plug, and the electric telescopic rod drives the sealing plug to enter / withdraw from the vacuum tube or the oxygen tube to seal / unseal the vacuum tube or the oxygen tube.

[0015] In a preferred embodiment of the utility model, the electric telescopic rod is installed on the fixing plate.

[0016] In a preferred embodiment of the utility model, the anti-sputtering shell is installed in the protective box through a fixing frame.

[0017] In a preferred embodiment of the present invention, the protection structure further comprises a bottom bracket, and the bottom bracket supports the protection box.

[0018] In a preferred embodiment of the utility model, a box door is arranged on one side of the protection box body, and the box door is hinged to the protection box body.

[0019] In a preferred embodiment of the present invention, the control unit is a controller and is disposed on the outer surface of the protective box.

[0020] The utility model solves the defects existing in the background technology, and has the following beneficial effects:

[0021] (1) The protective structure of the utility model can better protect the magnetron sputtering equipment. Compared with the traditional protective structure, the protective structure of the utility model has a better protective effect and realizes multiple protections for the magnetron sputtering equipment;

[0022] (2) The existence of two sealing parts can seal the vacuum tube and the oxygen tube to avoid gas backflow when the gas is input into the protective box, and can ensure the sealing of the protective box, thereby realizing the protection of the magnetron sputtering equipment. BRIEF DESCRIPTION OF THE DRAWINGS

[0023] The utility model is further described below in conjunction with the accompanying drawings and embodiments;

[0024] Figure 1 It is a schematic diagram of the overall structure of a preferred embodiment of the utility model;

[0025] Figure 2 This is a schematic diagram of the internal structure of the protective box of the preferred embodiment of the utility model;

[0026] Figure 3 for Figure 2 The main view;

[0027] Figure 4 This is a schematic diagram of the cooperation between the sealing part and the vacuum tube or oxygen tube in the preferred embodiment of the utility model;

[0028] In the figure: 10, protective box; 11, equipment body; 12, vacuum tube; 13, oxygen tube; 14, vacuum pressure sensor; 15, oxygen detector; 16, exhaust valve; 20, fixing part; 21, fixing bar; 22, fixing plate; 30, sealing part; 31, electric telescopic rod; 32, sealing plug; 40, anti-splash shell; 50, control part; 60, fixing frame; 70, bottom bracket; 80, box door. DETAILED DESCRIPTION

[0029] The present invention will be further described below in conjunction with the accompanying drawings and specific embodiments so that those skilled in the art can better understand the present invention and implement it, but the embodiments are not intended to limit the present invention.

[0030] This embodiment provides a protective structure for a magnetron sputtering device, which can better protect the magnetron sputtering device. Compared with the traditional protective structure, the protective structure of the utility model has a better protective effect and realizes multiple protections for the magnetron sputtering device.

[0031] Combination Figures 1 to 4 As shown, the protective structure of this embodiment includes a protective box 10, a fixing part 20, a sealing part 30, a sputtering protection shell 40 and a control part 50. The equipment body 11 of the magnetron sputtering equipment is located in the protective box 10. The fixing part 20 installs the equipment body 11 to ensure the smooth operation of the magnetron sputtering. The sealing part 30 seals the bottom of the protective box 10, and the sputtering protection shell 40 can play an anti-sputtering role when the equipment body 11 is working. The control part 50 controls the whole to realize information interaction.

[0032] In this embodiment, a vacuum tube 12 and an oxygen tube 13 are provided at the bottom of the protective box 10. The vacuum tube 12 and the oxygen tube 13 are both connected to the interior of the protective box 10. The vacuum tube 12 can be connected to an external vacuum pump to form and maintain a vacuum state in the protective box 10. The oxygen tube 13 can be connected to an external air pump to pass oxygen into the protective box 10 to meet the working requirements of the equipment body 11.

[0033] Furthermore, a vacuum pressure sensor 14 and an oxygen detector 15 are provided in the protective box 10 to monitor the vacuum degree and the oxygen content in the protective box 10 respectively. The vacuum pressure sensor 14 and the oxygen detector 15 are both connected to the control unit 50, and the control unit 50 receives the signals of the vacuum pressure sensor 14 and the oxygen detector 15, thereby obtaining the data of the vacuum degree and the oxygen content in the protective box 10.

[0034] In this embodiment, an exhaust valve 16 is provided in the protective box 10 to exhaust the gas in the protective box 10. The exhaust valve 16 is connected to the control unit 50. The exhaust valve 16 of this embodiment is an electric valve, which is controlled by the control unit 50. When the air pressure in the protective box 10 is too high, the gas in the protective box 10 is exhausted through the exhaust valve 16 to reduce the internal pressure and avoid the explosion of the protective box 10.

[0035] Combination Figure 2 and Figure 3 As shown, the fixing part 20 of this embodiment includes a fixing bar 21 and a fixing plate 22. The fixing bar 21 supports the fixing plate 22. The equipment body 11 is located on the fixing plate 22. The equipment body 11 includes a target, an anode plate and a substrate. Through the provided substrate, when the neutral target atoms or molecules in the sputtered particles are deposited on the substrate, they will form a thin film on the surface of the substrate, thereby completing the magnetron sputtering operation.

[0036] Combination Figure 3 and Figure 4 As shown, the number of sealing parts 30 in this embodiment is two, one sealing part 30 seals the vacuum tube 12, and the other sealing part 30 seals the oxygen tube 13. The sealing part 30 includes an electric telescopic rod 31 and a sealing plug 32. The electric telescopic rod 31 drives the sealing plug 32 to enter / withdraw from the vacuum tube 12 or the oxygen tube 13 to seal / unseal the vacuum tube 12 or the oxygen tube 13. The sealing part 30 can seal the vacuum tube 12 and the oxygen tube 13 respectively, so that a vacuum state is formed and maintained in the protective box 10. In actual use, the opening and closing of the vacuum tube 12 or the oxygen tube 13 can be adjusted according to the use requirements of the equipment body 11.

[0037] In this embodiment, the electric telescopic rod 31 is installed on the fixing plate 22 , and the electric telescopic rod 31 in this embodiment is an electric cylinder telescopic rod.

[0038] In this embodiment, the sputtering-proof shell 40 is located above the equipment body 11. The sputtering-proof shell 40 is installed in the protective box 10 through the fixing frame 60. The sputtering-proof shell 40 protects the target of the equipment body 11 to prevent it from sputtering to other parts, thereby achieving the purpose of multiple protection.

[0039] Furthermore, the protective structure of this embodiment also includes a bottom bracket 70, which supports the protective box 10. A box door 80 is provided on one side of the protective box 10, and the box door 80 is hinged to the protective box 10. The control unit 50 is a controller and is arranged on the outer surface of the protective box 10. In actual use, the protective box 10 can be opened through the box door 80 to facilitate the taking and placing of materials.

[0040] In summary, the protective structure of this embodiment can better protect the magnetron sputtering equipment. Compared with the traditional protective structure, the protective structure of the utility model has a better protective effect and realizes multiple protections for the magnetron sputtering equipment. The presence of the two sealing parts 30 can seal the vacuum tube 12 and the oxygen tube 13, so as to avoid gas backflow when inputting gas into the protective box 10, and ensure the sealing of the protective box 10, thereby realizing the protection of the magnetron sputtering equipment.

[0041] Obviously, the above embodiments are merely examples for the purpose of clear explanation and are not intended to limit the implementation methods. For those skilled in the art, other different forms of changes or modifications can be made based on the above description. It is not necessary and impossible to list all the implementation methods here. The obvious changes or modifications derived from these are still within the scope of protection of the invention of the utility model.

Claims

1. A protective structure for a magnetron sputtering device, characterized in that: include A protective box (10), wherein a device body (11) is arranged inside the protective box (10), and a vacuum tube (12) and an oxygen tube (13) are arranged at the bottom of the protective box (10), and the vacuum tube (12) and the oxygen tube (13) are both connected to the interior of the protective box (10); A fixing part (20), the fixing part (20) comprising a fixing strip (21) and a fixing plate (22), the fixing strip (21) supporting the fixing plate (22), and the device body (11) being located on the fixing plate (22); A sealing part (30), wherein the number of the sealing parts (30) is two, one of the sealing parts (30) seals the vacuum tube (12), and the other of the sealing parts (30) seals the oxygen tube (13); An anti-sputtering shell (40), the anti-sputtering shell (40) being located above the device body (11) and providing anti-sputtering protection to the device body (11); A control unit (50), the control unit (50) is connected to the sealing unit (30) for information exchange and control.

2. The protective structure of a magnetron sputtering device according to claim 1, characterized in that: A vacuum pressure sensor (14) and an oxygen detector (15) are provided in the protection box (10) to monitor the vacuum degree and oxygen content in the protection box (10) respectively. The vacuum pressure sensor (14) and the oxygen detector (15) are both connected to the control unit (50).

3. The protective structure of a magnetron sputtering device according to claim 1, characterized in that: An exhaust valve (16) is provided in the protection box (10) to exhaust the gas in the protection box (10), and the exhaust valve (16) is connected to the control unit (50).

4. The protective structure of a magnetron sputtering device according to claim 1, characterized in that: The sealing part (30) comprises an electric telescopic rod (31) and a sealing plug (32), wherein the electric telescopic rod (31) drives the sealing plug (32) to enter / extract from the vacuum tube (12) or the oxygen tube (13), thereby sealing / unsealing the vacuum tube (12) or the oxygen tube (13).

5. The protective structure of a magnetron sputtering device according to claim 4, characterized in that: The electric telescopic rod (31) is mounted on the fixing plate (22).

6. The protective structure of a magnetron sputtering device according to claim 1, characterized in that: The anti-sputtering shell (40) is installed in the protective box (10) via a fixing frame (60).

7. The protective structure of a magnetron sputtering device according to claim 1, characterized in that: The protection structure also includes a bottom bracket (70), and the bottom bracket (70) supports the protection box (10).

8. The protective structure of a magnetron sputtering device according to claim 1, characterized in that: A box door (80) is provided on one side of the protection box body (10), and the box door (80) is hinged to the protection box body (10).

9. The protective structure of a magnetron sputtering device according to claim 1, characterized in that: The control unit (50) is a controller and is arranged on the outer surface of the protection box (10).

Citation Information

Patent Citations

  • Magnetic control sputtering equipment

    CN208762572U