Large-area uniform sputtering rotary vertical vacuum magnetron sputtering coating structure

Abstract

The utility model provides a rotary vertical vacuum magnetron sputtering coating structure capable of realizing large-area uniform sputtering, which is provided with a vacuum box body, an inclined plane baffle block and a plane baffle block are arranged on two sides of the vacuum box body, the rear ends of the inclined plane baffle block and the plane baffle block are connected and arranged on the vacuum box body through a gear rack mechanism, and the inclined plane baffle block and the plane baffle block are arranged on the vacuum box body. Two groups of end heads and a rotary target material are mounted in the vacuum box body, six groups of process air pipes are mounted on the inner side of the rotary target material, nozzles are arranged on the process air pipes, and the vacuum box body is provided with a vacuum box door; according to the large-area uniform sputtering rotary vertical vacuum magnetron sputtering coating structure, neutral atoms splashed by bombarding the target material by positive ions generated by argon ionization are directly deposited or reacted and deposited on the substrate to form a film layer, so that the process conditions such as argon and temperature in the sputtering process can be effectively layered and independently controlled; and the thickness and density of the film layer are controlled by controlling the inclined plane stop block and the plane stop block, so that the film coating efficiency and quality are effectively improved.

Description

Technical Field

[0001] The utility model relates to the technical field of magnetron sputtering coating, in particular to a rotary vertical vacuum magnetron sputtering coating structure for large-area uniform sputtering. Background Art

[0002] Types of physical vapor deposition include evaporation, sputtering and ion plating. Among the many physical vapor deposition technologies, rotary vertical vacuum magnetron sputtering has been actively studied and widely used in production practice due to its wide applicability, strong adhesion, high deposition rate, large coating area and production continuity. However, how to improve the uniformity of rotary vertical vacuum magnetron sputtering, improve the consistency of the film layer, reduce production costs and enhance product competitiveness is the top priority of research and application of rotary vertical vacuum magnetron sputtering. Currently, the existing technical equipment has the disadvantages of short target material, short magnetic field, uneven heating of the heater and small processing area, which makes The thickness and uniformity of the coating are poor, and the quality is poor; for this reason, the applicant has designed a rotary vertical vacuum magnetron sputtering coating structure with large-area uniform sputtering according to actual production needs, which adopts target extension, magnetic field extension, heater extension, segmented gas distribution, segmented heating and segmented online adjustment baffle setting, and uses positive ions generated by argon ionization to bombard the target material and the neutral atoms sputtered are deposited on the substrate to form a film layer. It can effectively and independently control the argon oxygen, temperature and other process conditions in the sputtering process in layers, and control the thickness and density of the film layer by controlling the inclined block and the plane block, thereby effectively improving the efficiency and quality of the coating. Utility Model Content

[0003] In order to solve the above technical problems, the utility model proposes a rotary vertical vacuum magnetron sputtering coating structure with large-area uniform sputtering, which comprises a vacuum box, bevel blocks and plane blocks are installed on both sides of the vacuum box, the rear ends of the bevel blocks and the plane blocks are connected and installed on the vacuum box through a gear rack mechanism, two groups of rotating targets are installed in the vacuum box, both ends of the rotating targets are installed in the vacuum box through end heads, six groups of process air pipes are installed on the inner side of the rotating targets, nozzles are arranged on the process air pipes, and a vacuum box door is arranged on the vacuum box; the rotary vertical vacuum magnetron sputtering coating structure with large-area uniform sputtering adopts positive ions generated by argon ionization to bombard the target material and the neutral atoms sputtered are directly deposited or reaction-deposited on the substrate to form a film layer, which can effectively and independently control the process conditions such as argon and temperature in the sputtering process in layers, and the thickness and density of the film layer are controlled by controlling the bevel blocks and the plane blocks, thereby effectively improving the efficiency and quality of the coating.

[0004] In order to achieve the above purpose, the technical solution adopted by the utility model is:

[0005] A rotary vertical vacuum magnetron sputtering coating structure for large-area uniform sputtering, comprising a vacuum box, a gear rack mechanism, a bevel stopper, a plane stopper, a rotating target, an end head, a process air pipe, a nozzle and a vacuum box door, characterized in that: the rotary vertical vacuum magnetron sputtering coating structure for large-area uniform sputtering is provided with a vacuum box, bevel stops are installed at the upper and lower ends of the vacuum box, and a plane stopper is installed in the middle, the rear ends of the bevel stops and the plane stops are installed in the vacuum box through a gear rack mechanism, and a partial structure of the gear rack mechanism passes through the vacuum box and extends to the outside, two groups of rotating targets are installed inside the vacuum box, both ends of the rotating targets are installed inside the vacuum box through the end heads, six groups of process air pipes are installed in the middle of the vacuum box, nozzles are arranged on the process air pipes, and the process air pipes are located on the inner sides of the two groups of rotating targets, the vacuum box is provided with a vacuum box door, and a sealing strip is arranged on the vacuum box door.

[0006] Furthermore, the rotary vertical vacuum magnetron sputtering coating structure for large-area uniform sputtering is provided with a gear rack mechanism, the gear rack mechanism is provided with a shell, the rear end of the shell is provided with a rack and a gear, the rear end of the gear is connected to the rotating shaft, and the rear end of the rotating shaft is provided with a knob.

[0007] Furthermore, the rotary vertical vacuum magnetron sputtering coating structure for large-area uniform sputtering is provided with process gas pipes, and six groups of process gas pipes are provided, and each group of process gas pipes is independently supplied with gas.

[0008] Furthermore, the rotary vertical vacuum magnetron sputtering coating structure for large-area uniform sputtering is provided with an end head, a rotating structure is provided inside the end head, and the rotating structure is connected to the rotating shafts at both ends of the rotating target material.

[0009] The benefits of this application are:

[0010] 1. The rotary vertical vacuum magnetron sputtering coating structure with large-area uniform sputtering extends the target material, magnetic field, heater, segmented gas distribution, segmented heating and segmented online adjustment baffle, which can process large-area coated objects;

[0011] 2. The rotary vertical vacuum magnetron sputtering coating structure with large-area uniform sputtering can control the thickness and density of the film layer by controlling the inclined stopper and the plane stopper, thereby improving product quality and processing efficiency;

[0012] 3. The rotary vertical vacuum magnetron sputtering coating structure for large-area uniform sputtering adopts a rotary vertical structure, which makes the processing operation more convenient and quick. BRIEF DESCRIPTION OF THE DRAWINGS

[0013] Figure 1 It is a schematic diagram of the overall structure of the utility model;

[0014] Figure 2 The local structure of the utility model is shown in FIG. Figure 1 ;

[0015] Figure 3 The local structure of the utility model is shown in FIG. Figure 2 ;

[0016] Figure 4 The local structure of the utility model is shown in FIG. Figure 3 .

[0017] The markings in the figure are: 1. vacuum box; 2. rack and pinion mechanism; 2-1. outer shell; 2-2. rack; 2-3. gear; 2-4. rotating shaft; 2-5. knob; 3. inclined stopper; 4. flat stopper; 5. rotating target; 6. end; 7. process air pipe; 8. nozzle; 9. vacuum box door. DETAILED DESCRIPTION

[0018] The present invention is further described in detail below in conjunction with the accompanying drawings and specific implementation methods:

[0019] like Figure 1-2 As shown, a rotary vertical vacuum magnetron sputtering coating structure for large-area uniform sputtering is shown, including a vacuum box 1, a gear rack mechanism 2, an inclined stopper 3, a plane stopper 4, a rotating target 5, an end 6, a process gas pipe 7, a nozzle 8 and a vacuum box door 9, as shown in FIG. Figure 1 As shown, the rotary vertical vacuum magnetron sputtering coating structure for large-area uniform sputtering is provided with a vacuum box 1, which is made of steel plates welded, and the vacuum box 1 is provided with inclined stoppers 3 at the upper and lower ends, and a plane stopper 4 is provided in the middle, and the rear ends of the inclined stoppers 3 and the plane stoppers 4 are installed in the vacuum box 1 through a gear rack mechanism 2, as shown. Figure 2As shown, the rack and pinion mechanism 2 is provided with a shell 2-1, and a rack 2-2 and a gear 2-3 are provided at the rear end of the shell 2-1. The rear end of the gear 2-3 is connected to the rotating shaft 2-4, and a knob 2-5 is provided at the rear end of the rotating shaft 2-4. Part of the structure of the rack and pinion mechanism 2 passes through the vacuum box 1 and extends to the outside. The part passing through the vacuum box 1 is the rotating shaft 2-4, and a knob 2-5 is provided at the rear end of the rotating shaft 2-4. Two groups of rotating targets 5 are installed inside the vacuum box 1. Both ends of the rotating target 5 are installed inside the vacuum box 1 through an end head 6. A rotating structure is provided inside the end head 6. The rotating structure is connected to the rotating shafts at both ends of the rotating target 5. The rotation of the rotating target 5 is controlled by the end head 6. Six groups of process air pipes 7 are installed in the middle of the vacuum box 1. The process air pipes 7 are provided with nozzles 8. Each group of process air pipes 7 is operated independently. Gas supply can independently control different process gas pipes 7, the process gas pipes 7 are located inside the two groups of rotating target materials 5, the vacuum box body 1 is provided with a vacuum box door 9, and the vacuum box door 9 is provided with a sealing strip; the rotary vertical vacuum magnetron sputtering coating structure for large-area uniform sputtering extends the target material, extends the magnetic field, extends the heater, distributes gas in sections, heats in sections and adjusts the baffle in sections online, which can process large-area coated objects, and can control the thickness and density of the film layer by controlling the inclined block and the plane block, thereby improving product quality and processing efficiency. The rotary vertical type is adopted, and the processing operation is more convenient and quick. The positive ions generated by argon ionization bombard the target material, and the neutral atoms sputtered are directly deposited or reaction-deposited on the substrate to form a film layer, which can effectively control the process conditions such as argon and temperature in the sputtering process in layers and independently, thereby effectively improving the efficiency and quality of the coating.

[0020] The above is only a preferred embodiment of the present invention and does not constitute any other limitation on the present invention. Any modification or equivalent change made based on the technical essence of the present invention still falls within the scope of protection required by the present invention.

Claims

1. A rotary vertical vacuum magnetron sputtering coating structure for large-area uniform sputtering, comprising a vacuum box (1), a gear rack mechanism (2), an inclined stopper (3), a plane stopper (4), a rotating target (5), an end (6), a process gas pipe (7), a nozzle (8) and a vacuum box door (9), characterized in that: The rotary vertical vacuum magnetron sputtering coating structure for large-area uniform sputtering is provided with a vacuum box (1), the vacuum box (1) is provided with inclined surface blocks (3) at the upper and lower ends, and a plane block (4) is provided in the middle, the rear ends of the inclined surface blocks (3) and the plane block (4) are installed in the vacuum box (1) through a gear rack mechanism (2), and a part of the gear rack mechanism (2) passes through the vacuum box (1) and extends to the outside, two groups of rotating target materials (5) are installed in the vacuum box (1), and the two ends of the rotating target materials (5) are installed in the vacuum box (1) through end heads (6), six groups of process air pipes (7) are installed in the middle of the vacuum box (1), and nozzles (8) are provided on the process air pipes (7), and the process air pipes (7) are located inside the two groups of rotating target materials (5), and the vacuum box (1) is provided with a vacuum box door (9), and a sealing strip is provided on the vacuum box door (9).

2. The rotary vertical vacuum magnetron sputtering coating structure for large-area uniform sputtering according to claim 1 is characterized in that: The rotary vertical vacuum magnetron sputtering coating structure for large-area uniform sputtering is provided with a gear rack mechanism (2), the gear rack mechanism (2) is provided with a housing (2-1), a rack (2-2) and a gear (2-3) are provided at the rear end of the housing (2-1), the rear end of the gear (2-3) is connected to a rotating shaft (2-4), and a knob (2-5) is provided at the rear end of the rotating shaft (2-4).

3. The rotary vertical vacuum magnetron sputtering coating structure for large-area uniform sputtering according to claim 1 is characterized in that: The rotary vertical vacuum magnetron sputtering coating structure for large-area uniform sputtering is provided with a process gas pipe (7), and the process gas pipe (7) is provided with six groups, and each group of process gas pipes (7) is independently supplied with gas.

4. The rotary vertical vacuum magnetron sputtering coating structure for large-area uniform sputtering according to claim 1 is characterized in that: The rotary vertical vacuum magnetron sputtering coating structure for large-area uniform sputtering is provided with an end head (6), a rotating structure is provided inside the end head (6), and the rotating structure is connected to the rotating shafts at both ends of the rotating target material (5).

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