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Exposure parameter determining method and apparatus, and readable medium

A technology of exposure parameters and exposure values, applied in the field of image processing, can solve the problems of slow speed and low efficiency of AE algorithm

Active Publication Date: 2018-11-06
BEIJING TUSEN ZHITU TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

The adjustment of exposure parameters is an important factor to ensure the image quality. At present, the commonly used AE adjustment method is to adjust the exposure time (Exposure Time, ET) and exposure gain (Exposure Gain, G), step by step to approach the image to the ideal exposure. , causing the current AE algorithm to generally have the problem of slow speed and low efficiency

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  • Exposure parameter determining method and apparatus, and readable medium
  • Exposure parameter determining method and apparatus, and readable medium
  • Exposure parameter determining method and apparatus, and readable medium

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Embodiment Construction

[0065] The exposure parameter determination method, device and readable medium provided by the embodiments of the present invention are used to quickly determine the exposure parameters when the imaging device adopts the automatic exposure algorithm, and ensure the image quality of the frame image obtained by using the determined exposure parameters .

[0066] The preferred embodiments of the present invention will be described below in conjunction with the accompanying drawings. It should be understood that the preferred embodiments described here are only used to illustrate and explain the present invention, and are not intended to limit the present invention, and in the absence of conflict, the present invention The embodiments and the features in the embodiments can be combined with each other.

[0067] In order to facilitate understanding of the present invention, in the technical terms involved in the present invention:

[0068] 1. Exposure time: (Exposure Time, ET), al...

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Abstract

The invention discloses an exposure parameter determining method and apparatus, and a readable medium, and belongs to the technical field of image processing. In the method and apparatus provided by the invention, an exposure evaluation value of a current frame of image and a current exposure parameter are determined; and the exposure parameter for shooting the next frame of image is determined according to the current exposure parameter and a target exposure value of the next frame of image. As the exposure parameter for shooting the next frame of image is determined by using the exposure evaluation value of the current frame of image, the exposure parameter for shooting the current frame of image, namely, the current exposure parameter, and the target exposure value of the next frame ofimage, on one hand, the quick determination of the exposure parameter is achieved, and on the other hand, the image quality of the next frame of image shot by using the determined exposure parameter is also guaranteed.

Description

technical field [0001] The present invention relates to the technical field of image processing, in particular to a method, device and readable medium for determining exposure parameters. Background technique [0002] With the improvement of human living standards and industrial modernization, imaging devices (such as cameras) are increasingly used in various industries in daily life, such as consumer photography, industrial machine vision, quality inspection and automatic driving, etc. Wait. Some algorithms are built into the camera to enable the system to automatically perform feature extraction and recognition on images, such as face recognition, industrial defect detection and security monitoring, etc. At this point, image quality is the most important foundation. If the quality of the original image output by the camera is not good (such as blurry or insufficient detail), it will be difficult for the back-end system to recognize it. [0003] To solve this problem, th...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H04N5/235
CPCH04N23/70H04N23/73
Inventor 刘淼孙杰
Owner BEIJING TUSEN ZHITU TECH CO LTD
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