Pigmented photoresist composition and cured matter thereof

Abstract

The invention provides an alkali developable colored photosensitive resin composition which ensures satisfactory surface curability and curing depth during exposure and can form a colored pattern excellent in resolution even when a thick colored pattern is formed by a photography process, and the cured material of the composition. The colored photosensitive resin composition contains (A) a carboxylic resin, (B) a photopolymerization initiator, (C) a photosensitive monomer and (D) a pigment, wherein the colored photosensitive resin composition contains (B-1) a phosphine oxide-based photo-radical polymerization initiator and (B-2) a photo-cationic polymerization initiator as the photopolymerization initiator (B) and contains (C-1) a cationic curable monomer as the photosensitive monomer (C).

Description

technical field [0001] The present invention relates to an alkali-developable colored photosensitive resin composition that can be patterned by photolithography and a cured product thereof, and more particularly, to an alkali-developable coloring photosensitive resin composition suitable for forming a plasma display panel (PDP), a field emission display ( Structural supports (referred to as spacers, ribs or partitions), electrode (conductor circuit) patterns, FED), liquid crystal display devices (LCD), fluorescent display devices, image transfer devices, printed wiring boards, hybrid integrated circuits, etc. A dielectric (resistance) pattern, a black matrix pattern, a colored pattern such as a solder resist, an alkali-developable colored photosensitive resin composition excellent in resolution and adhesion, and a cured product thereof. Background technique [0002] Conventionally, as a method for forming a pattern of a colored photosensitive resin composition, a colored pho...

AI Technical Summary

Problems solved by technology

However, when a photosensitive resin composition containing a pigment is used to form a pattern by photolithography, since the pigment prevents the transmission of ultraviolet rays or absorbs ultraviolet rays, there is a significant shortage of exposure, and a sufficient surface cannot be obtained during exposure. Tendency for Cure and Cure Depth

As a result, there are problems such as easy occurrence of undercuts in the development process and poor adhesion to substrates.

[0004] In addition, the cured coating film patterned by photolithography has insufficient curability, and there is a problem that sufficient adhesion cannot be obtained when it is used as it is.

In addition, there is also a method of further thermally curing such an insufficiently cured coating film to improve curability, but substrates such as polypropylene, polyethylene, polyethylene terephthalate, etc. are deformed by heating. Therefore, there is still a problem that the thermal curing process cannot be adopted.

[0005] In addition, in the case of forming a thick-film colored pattern by photolithography, if the exposure amount of ultraviolet radiation is increased in order to achieve deep curability, the halo will become larger, that is, relative to the pattern cross-sectional surface (upper part). ), the line width of the middle part (center part) and the deepest part (bottom) become larger, and there is a problem that the resolution decreases.