94 results about "Photosensitive polymer" patented technology

The present application discloses a colored end-capped photosensitive polymer and a preparation method, use, black photoresist, and black matrix thereof, and relates to the field of photoresist technology, wherein the raw materials for preparing the colored end-capped photosensitive polymer include dianhydride monomers, alcohols, colored end-capped monomers, first diamine monomers, and second diamine monomers. End-capping the photosensitive polymer molecular chain by a colored group containing an azo structure can not only significantly improve the OD value of the black photoresist, but also enable the black photoresist to have better mechanical properties and lithographic properties.

The invention discloses a colored end-capped photosensitive polymer and a preparation method and application thereof, black photoresist and a black matrix, and relates to the technical field of photoresist, and the colored end-capped photosensitive polymer is prepared from the following raw materials: a dianhydride monomer, alcohol, a colored end-capped monomer, a first diamine monomer and a second diamine monomer. A photosensitive polymer molecular chain is terminated through a colored group containing an azo structure, so that the OD value of the black photoresist can be remarkably improved, and the black photoresist can have relatively good mechanical properties and photoetching properties.

The invention discloses a preparation method and antibacterial application of a naphthothiadiazolyl photosensitizer, and belongs to the technical field of biomedical antibacterial materials. The naphthothiadiazole-based photosensitizer provided by the invention overcomes the problem that the existing commercial photosensitizer gathers and quenches the active oxygen efficiency, and meanwhile, the antibacterial photosensitive polymer prepared based on the novel naphthothiadiazole-based photosensitizer has the unique advantages that the structure is stable, photosensitizer micromolecules are not easy to leak and the antibacterial effect is long-acting; the construction of the antibacterial polymer coating on the surface of the medical instrument in the future has important clinical application potential. The naphthothiadiazolyl photosensitizer provided by the invention has good photodynamic killing performance on drug-resistant bacteria MRSA (Methicillin Resistant Staphylococcus Aureus).

This invention provides a photosensitive conductive resin composition and its application. The photosensitive conductive resin composition comprises, by weight, the following components: 20-60 parts of a photosensitive polymer, 10-20 parts of an epoxy resin, 5-20 parts of an acrylate monomer, 0.5-5 parts of a photoinitiator, 20-60 parts of a conductive carbon filler, and 1-10 parts of an additive; the volume resistivity of the conductive carbon filler is ≤0.5 Ω·m. Through the screening and synergistic compounding of specific components, the photosensitive conductive film prepared from this resin composition exhibits excellent conductivity and peel strength, high photosensitivity resolution, and excellent developability, thus meeting the application requirements of photosensitive conductive films.

Holographic photopolymer materials, holographic photosensitive films, holographic optical elements, and display devices are provided. The holographic photopolymer material comprises a polymer matrix, a photopolymerizable monomer, and a photosensitizer. The refractive index of the photopolymerizable monomer is greater than that of the polymer matrix. The molecular structure of the polymer matrix includes a linear structure, the branched chains of the polymer matrix include activating groups, and / or the molecular structure of the polymer matrix includes a crosslinked structure. Because polymer matrices with a crosslinked molecular structure have a high glass transition temperature, holographic photopolymer materials have good heat resistance. Because holographic photopolymer materials with a linear molecular structure include activating groups that can form crosslinked structures, optical elements made from holographic photopolymer materials can have crosslinked structures, i.e., optical elements can have good heat resistance. Holographic photopolymer materials have good heat resistance, or optical elements made from holographic photopolymer materials can have good heat resistance.

In a stereolithography apparatus a material supply device for a printing material (16), in particular a photosensitive polymer, to be hardened is provided. The material supply device (10) accommodates a material cartridge (12) which in turn accommodates and completely surrounds the printing material (16). The material cartridge (12) can be connected liquid-tightly with an outlet valve unit (20) through which the printing material (16) can be discharged and which is at least partially accommodated in the material supply device (10) and is at least partially supported on or in the material supply device or is sealed with respect to the material supply device. The outlet valve unit (20) has a valve (100) which is opened and closed depending on the relative position, in particular the swivel position, of the material supply device (10) and the stereolithography apparatus.

Photosensitive polymers and their use in photoresists for photolithographic processes are disclosed. The polymers are copolymers, with at least one monomer that includes pendant polycyclic aromatic groups and a second monomer that includes an acidic leaving group (ALG). The polymers have high resistance to etching and high development contrast.

The invention discloses a ship-borne anti-corrosion and wave-absorbing integrated super-surface elastomer and further discloses a preparation method of the elastomer, and the preparation method comprises the following steps: S1, preparing an inner protection matrix by using an anti-corrosion filler, an antioxidant, polyether amine and isocyanate; s2, preparing conductive ink by using dielectric loss filler, magnetic loss filler, a photosensitive polymer, a photoinitiator, a reactive diluent and a dispersing agent, and coating the conductive ink on the surface of the inner protection substrate in a patterned manner to form a super-surface wave-absorbing layer; s3, preparing an outer hydrophobic layer outside the metasurface wave-absorbing layer to obtain a metasurface elastomer; and S4, one side of the inner protection base body of the super-surface elastomer is attached to the outer surface of the ship electronic device, and anti-corrosion and wave-absorbing integrated packaging is achieved. The super-surface elastomer has the functions of corrosion prevention and wave absorption, is suitable for packaging and electromagnetic protection of devices such as ship-borne communication nodes and high-frequency electronic modules, and can remarkably improve the reliability and prolong the service life of the devices in a complex marine environment.

A photosensitive polymer may include repeating units represented by Formula 1 and may have a polydispersity index (PDI) of 1.1 or less.In Formula 1, R1, R2, R3, R4, R5, R6, R7, and R8 each independently may be a hydrogen atom, a C1-C3 linear or branched alkyl group, a substituted or unsubstituted C2-C3 linear or branched alkenyl group, a substituted or unsubstituted C2-C3 linear or branched alkynyl group, a substituted or unsubstituted C1-C3 alkoxy group, or a halogen element; A may be an acid-labile group having an acid desorption rate lower than that of a trialkylsilyl group; and m and n each may be an integer of 1 or more.

This application relates to a conductive polymer layer located on an electrostatic chuck. The conductive polymer layer comprises a conductive polymer and a photosensitive polymer. The conductivity of the conductive polymer facilitates charge dissipation through the conductive polymer layer, while the photosensitivity of the photosensitive polymer allows the surface of the conductive polymer layer to be optically patterned. The degree of conductivity and photosensitivity of the conductive polymer layer can be adjusted by varying the relative amounts of the conductive polymer and the photosensitive polymer.

Photoresist compositions may include a photosensitive polymer including a first repeating unit of Chemical Formula 1; a photoacid generator (PAG); and a solvent.

The invention provides a photoresponse self-repairing material as well as a preparation method and application thereof, and relates to the technical field of self-repairing materials. According to the photoresponse self-repairing material, the photosensitive polymer serves as a matrix, the modified nano silicon dioxide and the plant extraction adhesive are wrapped in the repairing material, the photosensitive polymer is triggered to be softened under ultraviolet irradiation, the modified nano silicon dioxide and the plant extraction adhesive are released, and the plant extraction adhesive expands when encountering water; a silica gel network is formed by combining modified nano silicon dioxide, and cracks are rapidly filled; meanwhile, the strength of repairing the crack notch can be effectively improved through the toughening fibers in the silica gel network. In addition, according to verification, the photoresponse self-repairing material can achieve a good repairing effect in a low-temperature or high-salinity water area, and can be widely applied to the preparation process of surface coatings of river bank revetments.

The present disclosure provides a quantum dot light emitting panel, a display device, and a manufacturing method. The quantum dot light emitting panel comprises: a base substrate; a cathode layer, located on a side of the base substrate; an electron transfer layer, located on a side of the cathode layer located away from the base substrate; a quantum dot light emitting layer, located on a side of the electron transfer layer located away from the cathode layer, and having at least two light emitting portions having mutually different wavelength ranges of emitted light; a photosensitive polymer film layer, located between the quantum dot light emitting layer and the electron transfer layer, having photosensitive portions in a one-to-one correspondence with the light emitting portions, and configured such that molecular chains break when the photosensitive polymer film layer is subjected to preconfigured light irradiation; and an anode layer, located on a side of the quantum dot light emitting layer located away from the photosensitive polymer film layer.

This application relates to the field of optical device technology, and provides a method, device and equipment for preparing a polymer holographic optical device. The method includes: mixing a photosensitive polymer holographic material with preset nanoparticles to obtain a mixed material; the preset nanoparticles have photosensitive active groups; covering the mixed material onto a substrate; subjecting the mixed material on the substrate to a thermosetting treatment; and irradiating the thermosetting mixed material with coherent light to obtain a polymer holographic optical device, thereby improving the refractive index modulation of the polymer holographic optical device.

A laminated pane includes first and second panes, a layer stack arranged therebetween including a first thermoplastic intermediate layer, a separating layer, a photopolymer layer with at least one holographic element, a carrier layer, and a second thermoplastic intermediate layer, wherein the photopolymer layer has a thickness of 5 μm to 50 μm, the carrier layer contains polyethylene terephthalate (PET), polyethylene (PE), polymethyl methacrylate (PMMA), polycarbonate (PC), polyamide (PA), polyvinyl chloride (PVC), and / or cellulose triacetate (TAC) and has a thickness of 20 μm to 100 μm, wherein the carrier layer is arranged directly adjacent the photopolymer layer, and the separating layer contains polyethylene (PE), polyvinyl chloride (PVC), and / or polymethyl methacrylate (PMMA) and has a thickness of 10 μm to 300 μm.

The invention discloses a fabric hybrid electronic integrated system with a stretchable interface. The fabric hybrid electronic integrated system comprises a laser modified fabric substrate, a rigid chip, a printed electrode and a printed interconnection wire. The laser modified fabric is obtained by irradiating a photosensitive polymer composite fabric with laser, can be designed in a customized manner and manufactured in one step by regulating and controlling laser parameters, and simultaneously realizes three different effects: (1) the interface bonding of a printed layer is enhanced; (2) the cross-layer short circuit of the interconnected wires is inhibited; and (3) strain isolation among the rigid chip, the elastic fabric and the interconnected wires. The mechanically enhanced and surface modified fabric realizes heterogeneous integration of a rigid chip and a circuit on the fabric, has interface stretchability, and has potential in the fields of wearable health management and human-computer interaction.

The application provides an ultrasonic response piezoelectric ionic hydrogel and application thereof, and the hydrogel is formed by cross-linking and solidification of a precursor solution under ultraviolet irradiation; components of the precursor solution include a photosensitive polymer, an ionic polymer, a photoinitiator and a solvent; the photosensitive polymer includes any one or a combination of at least two of polyether F127 diacrylate, polyhydroxyethyl methacrylate, polyethylene glycol dimethyl acrylate, methacrylated gelatin or methacrylated collagen; and the ionic polymer includes any one or a combination of at least two of epsilon-polylysine, polyethyleneimine hydrochloride, polyallylamine hydrochloride, polyquaternary ammonium salt-10 or cationic guar gum. The application uses ultrasonic waves as an external remote driving signal to non-invasively and painlessly activate the piezoelectric ionic effect of the hydrogel, generate detectable periodic voltage and current signals in the hydrogel, and has excellent treatment effect on acne and infected wound repair.

An optical laminate according to the present invention includes: a first layer that is a photopolymer layer containing a hologram; a second layer that is laminated onto the first layer; and a molecular adhesive layer that is interposed between the first layer and the second layer.

The invention discloses a photosensitive resin composition as well as a preparation method and application thereof. The photosensitive resin composition comprises the following components in parts by weight: 0.5-2 parts of perovskite nanoparticles, 20-40 parts of photosensitive macromolecules, 1-10 parts of a photoacid compound, 0.5-1 part of a surfactant and 60-70 parts of a solvent, the photoacid compound is selected from at least one of triaryl sulfonated salt, diaryl sulfonium salt, sulfonate and sulfonate; the photosensitive polymer comprises a styrene chain segment and / or an acrylate chain segment. The photosensitive resin composition has high refractive index, high transparency and high resolution patterning and is suitable for manufacturing a micro lens array, and the refractive index of a micro lens formed by the photosensitive resin composition can be increased to 1.65-1.89 by introducing the perovskite nanoparticles.

The invention discloses a developing solution and a method for inhibiting polymerization of a photosensitive material, the developing solution comprises two or more inorganic alkaline compounds and one or more additives with the following structural formula, and the developing solution is a solution obtained by diluting a concentrated developing solution according to a volume ratio of 1%-4%; the developing solution is prepared from the mixed inorganic alkaline compound, the specific additive and the combination of the mixed inorganic alkaline compound and the specific additive, the mixed inorganic alkaline provides a stable alkaline environment, and the additive with a specific structure can effectively inhibit a polymerization reaction of a photosensitive material and a photoresist monomer material; therefore, the problems of uncontrollable cross-linked product anti-sticking and short equipment maintenance period of the photosensitive polymer in the existing sodium carbonate developing solution are solved, the generation of precipitates in the developing solution is reduced, the adhesion of the polymer to the surface of a copper-clad plate is inhibited, the product yield is improved, the working period of the developing solution is prolonged, and the production cost is reduced.

The invention relates to a photoresponsive self-initiated cross-linked hydrogel, and raw materials, a preparation method and application thereof. The method comprises the following steps: carrying out amidation reaction on a carboxyl-containing natural polymer and aminobenzophenone to obtain the photoresponsive self-initiated cross-linked hydrogel; or the amino-containing natural polymer and carboxyl benzophenone are subjected to an amidation reaction to obtain the amino-containing natural polymer. The photoresponsive self-initiation cross-linked polymer can be used as a macromolecular photoinitiator of a photosensitive polymer, and an aqueous solution of a single polymer of the photoresponsive self-initiation cross-linked polymer can be cross-linked under the irradiation of light with specific wavelength to form hydrogel, so that the photoinitiator can be effectively prevented from generating toxicity due to permeation.

The invention provides a resin composition, a photosensitive insulating adhesive film containing the same and application, and the resin composition comprises the following components in parts by weight: 30-60 parts of a photosensitive polymer; 10 to 30 parts of epoxy resin; 5 to 20 parts of an acrylic ester monomer; 0.5 to 5 parts of a photoinitiator; 0.05 to 1 part of a sensitizer; 10 to 40 parts of filler; the photoinitiator is prepared from a combination of 2-dimethylamino-2-(4-methyl) benzyl-1-[4-(4-morpholinyl) phenyl]-1-butanone and a phosphorus oxide type photoinitiator. The photosensitive insulating adhesive film prepared from the resin composition provided by the invention has relatively high glass transition temperature, relatively low CTE performance, excellent peel strength, relatively high photosensitive resolution and excellent easy-to-develop characteristic, and can meet the application requirements of the photosensitive insulating adhesive film.

The application provides a light response self-repairing material and a preparation method and application thereof, and relates to the technical field of self-repairing materials.The light response self-repairing material takes a photosensitive polymer as a matrix, modified nanosilica and a plant extraction adhesive are wrapped in the self-repairing material, under ultraviolet irradiation, the photosensitive polymer is softened and the modified nanosilica and the plant extraction adhesive are released, the plant extraction adhesive expands when meeting water, and a silica gel network is formed by combining the modified nanosilica, so that cracks are rapidly filled; meanwhile, the toughening fibers in the silica gel network can effectively improve the strength of the repaired crack gap. In addition, it has been verified that the light response self-repairing material can achieve good repair effect in low-temperature or high-salinity water, and can be widely applied to the preparation process of river revetment surface coating.

Photoresist films are described such as those that include a first photoresist layer including a first photosensitive polymer and a second photoresist layer that includes a second photosensitive polymer, the second photoresist layer being disposed at two or more different positions in a direction perpendicular to a surface of the first photoresist layer, and wherein the second photosensitive polymer is hydrogen bonded, covalently bonded, or ionically bonded to the first photosensitive polymer. Also described are methods of manufacturing an integrated circuit device using a photoresist film.

The application provides a cyclohexanone photosensitizer shown in a formula I, a preparation method of the cyclohexanone photosensitizer, a mixed photosensitizer containing the cyclohexanone photosensitizer, a photopolymerization composition and a photopolymer film, wherein the cyclohexanone photosensitizer has the structural formula shown in the formula I, wherein R1 and R2 are each independently selected from hydrogen or C1-C4 alkyl. The cyclohexanone photosensitizer provided by the application replaces a benzene ring with thiophene, shows excellent absorption performance in a green laser wavelength range, is well matched with a 532nm laser, and provides more candidate photosensitizers for the development of green photosensitive polymer films.

Disclosed are a photosensitive polymer including a repeating unit of Chemical Formula 1 or Chemical Formula 2 derived from a vinyl heteroaromatic compound and a resist composition including the same.In Chemical Formula 1 or 2, R1 and R2 are hydrogen or a methyl group, X is a carbon, sulfur, or a nitrogen atom, and n is 1 or 2.

A photopolymer composition for hologram formation, comprising: a polymer matrix comprising a siloxane-based polymer and a (meth)acrylate polymer containing one or more reactive functional groups in the side chains, a holographic recording method, and an optical element are provided.

The invention discloses a method for manufacturing a photosensitive polymer dielectric layer on a patterned substrate, which comprises the following steps of: cleaning the surface of the substrate by using plasma, and baking the cleaned substrate; coating a photosensitive polymer medium adhesive by adopting a dynamic adhesive dripping method, starting to drip the photosensitive polymer medium adhesive at a constant speed at a high rotating speed of the substrate, continuously dripping the adhesive until the substrate rotates at a low rotating speed, keeping adhesive uniformizing at a low rotating speed until the adhesive uniformizing is finished after the adhesive dripping is stopped, and performing soft baking on the coated substrate; performing alignment exposure on the substrate by using ultraviolet light matched with a patterned mask; developing the substrate by using a developing solution to obtain a graphical medium glue layer; and curing the graphical dielectric glue layer in an anaerobic high-temperature environment to obtain the graphical dielectric layer. According to the invention, the coverage problem of traditional static coating can be solved, and the manufacturing of a bubble-free, high-uniformity and high-adhesion polymer dielectric layer is realized.

The invention belongs to the technical field of intelligent sensing materials, and particularly relates to an electric sensing coating, a coating, a preparation method, a curing method and application. The invention relates to an electric sensing coating. The coating comprises a matrix and a functional material dispersed in the matrix, the functional material comprises nematic phase liquid crystals, a crystal violet lactone-bisphenol A complex and a plasticizer; the matrix comprises a photosensitive polymer and a photoinitiator; phase separation can occur in the ultraviolet curing process of the electric sensing coating, so that the functional material forms a micron-sized confinement block in the matrix.

To suppress color shift of a hologram before and after adhesion in an optical laminate constituted by adhering a photopolymer layer containing the hologram to a separate layer.SOLUTION: An optical laminate includes: a first layer which is a photopolymer layer containing a hologram; a second layer laminated to the first layer; and a molecular adhesive layer interposed between the first layer and the second layer.SELECTED DRAWING: Figure 1