Projection objective of a microlithographic projection exposure apparatus

a technology of exposure apparatus and projection objective, which is applied in the direction of microlithography exposure apparatus, printers, instruments, etc., can solve the problems of undesired impairment of imaging properties, undesired impairment of projection objective imaging properties,

Inactive Publication Date: 2009-09-10
CARL ZEISS SMT GMBH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Benefits of technology

This solution effectively compensates for position changes caused by deformations, maintaining the imaging quality by adjusting the optical element's position automatically, thereby preventing undesired impairments and ensuring accurate image projection.

Problems solved by technology

It has however been found that the bending is not only accompanied by the desired corrective effect; rather, undesired impairment of the imaging properties of the projection objective can also occur.
Such undesired impairment of the imaging properties, however, may also be caused by optical elements which are not bent but otherwise deformed in order to correct imaging errors, as is known per se in the prior art.

Method used

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  • Projection objective of a microlithographic projection exposure apparatus
  • Projection objective of a microlithographic projection exposure apparatus
  • Projection objective of a microlithographic projection exposure apparatus

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Embodiment Construction

[0038]FIG. 1 shows a simplified representation of a meridian section through a projection objective, denoted overall by 10, of a microlithographic projection exposure apparatus. The projection objective, which is also described in PCT / EP03 / 04015 assigned to the Applicant, is used to project a reduced image of structures contained in a reticle 11 onto a photosensitive layer 12, which consists of a photoresist and is applied on a substrate 13. The reticle 11 is arranged in an object plane OP and the photosensitive layer 12 is arranged in an image plane IP of the projection objective 10.

[0039]After passing through the reticle 11, projection light 14 indicated by dashes in FIG. 1 which is generated by an illuminating device of the projection exposure apparatus and has a wavelength of 157 nm in the exemplary embodiment represented, travels through a plane-parallel plate 15 and a lens L1 into a beam splitter cube 16. There, the projection light 14 is reflected by a polarisation-selective ...

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Abstract

A projection objective of a microlithographic projection exposure apparatus has a plurality of optical elements, for example lenses or mirrors. The objective furthermore includes an actuator for exerting a mechanical force that deforms a selected optical element of the projection objective. A manipulator modifies the spatial position of one of the optical elements as a function of the force exerted by the actuator.

Description

CROSS-REFERENCE TO RELATED APPLICATIONS[0001]This is a continuation of U.S. patent application Ser. No. 11 / 464,934, filed Aug. 16, 2006, which is a continuation of International Patent Application PCT / EP2005 / 000947, filed on Feb. 1, 2005 and claims priority of German Patent Application 10 2004 008 285.5 filed Feb. 20, 2004. The full disclosure of these earlier applications is incorporated herein by reference.BACKGROUND OF THE INVENTION[0002]1. Field of the Invention[0003]The invention relates to a projection objective for microlithographic projection exposure apparatus, such as those used for the production of large-scale integrated electrical circuits and other microstructured components. The invention relates in particular to projection objectives in which at least one optical element can be deformed with the aid of an actuator. The invention furthermore relates to a method for correcting optical properties of such a projection objective.[0004]2. Description of the Prior Art[0005]...

Claims

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Application Information

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Patent Type & AuthorityApplications(United States)
IPC IPC(8): G03B27/54G03F7/20
CPCG03F7/70825G03F7/70266G02B13/18G02B13/24G03F7/20
InventorFISCHER, JUERGEN
OwnerCARL ZEISS SMT GMBH