A kind of manufacturing method of mems lithium battery

Abstract

The invention discloses a method for manufacturing a MEMS lithium battery, which comprises separately manufacturing a first casing on which a cavity is formed and a positive electrode of the battery is integrally formed in the cavity, and a second casing made of the same material as the first casing , forming a cavity connected to the first shell on it, and integrally forming the negative electrode of the battery in the cavity; then packaging the first shell and the second shell together to form a battery. The preparation process of the lithium battery of the present invention is simple, can be produced in batches, and reduces production costs; can greatly improve the consistency and reliability of battery preparation; can make the electrode change from a two-dimensional structure to a three-dimensional structure, greatly increasing the surface area of ​​the electrode, reducing The charge transfer resistance increases the number of ion migration, which greatly improves the energy density and power density of the battery; it can shorten the ion migration distance and shorten the charging time of the battery.

Description

technical field

[0001] The invention relates to the field of battery manufacturing, and more particularly to a method for manufacturing a MEMS lithium battery. Background technique

[0002] Micro-Electro-Mechanical System (MEMS), also known as micro-electro-mechanical system, micro-system or micro-machine, is developed on the basis of microelectronic technology (semiconductor manufacturing technology), which integrates lithography, corrosion, High-tech electromechanical devices manufactured by thin film, LIGA, silicon micromachining, non-silicon micromachining and precision machining technologies.

[0003] MEMS integrates micro-sensors, micro-actuators, micro-mechanical structures, micro-power and micro-energy sources, signal processing and control circuits, high-performance electronic integrated devices, interfaces, and communications. It is a revolutionary new technology and is widely used in high-tech In the industry, its system size is several millimeters or even smalle...

Examples

preparation example Construction

[0054] The invention also discloses a method for preparing a chip battery, comprising the following steps:

[0055] Use semiconductor material as the substrate, evaporate a layer of Au / Cr by sputtering or electron beam, Au thickness is 100-500nm, preferably 200nm, Cr thickness is 10-50nm, preferably 20nm, use dry film (negative resist) as photoresist Perform photolithography, and then chemically etch to remove Au / Cr in other parts to form lead-out electrodes;

[0056] Deposit a layer of metal on the upper surface of the substrate, such as Au, Al, preferably aluminum, and then fix a layer of dry film on the upper surface of the substrate as a photoresist for photolithography to form a micro-column array pattern, and remove the column array by chemical etching Metals other than metals are then etched using a deep etching process to form a microcolumn array and the pool body of the battery's first housing;

[0057] Modifying and immobilizing nanomaterials on the surface of the m...

technical field

[0001] The invention relates to the field of battery manufacturing, and more particularly to a method for manufacturing a MEMS lithium battery. Background technique

[0002] Micro-Electro-Mechanical System (MEMS), also known as micro-electro-mechanical system, micro-system or micro-machine, is developed on the basis of microelectronic technology (semiconductor manufacturing technology), which integrates lithography, corrosion, High-tech electromechanical devices manufactured by thin film, LIGA, silicon micromachining, non-silicon micromachining and precision machining technologies.

[0003] MEMS integrates micro-sensors, micro-actuators, micro-mechanical structures, micro-power and micro-energy sources, signal processing and control circuits, high-performance electronic integrated devices, interfaces, and communications. It is a revolutionary new technology and is widely used in high-tech In the industry, its system size is several millimeters or even smalle...

Examples

preparation example Construction

[0054] The invention also discloses a method for preparing a chip battery, comprising the following steps:

[0055] Use semiconductor material as the substrate, evaporate a layer of Au / Cr by sputtering or electron beam, Au thickness is 100-500nm, preferably 200nm, Cr thickness is 10-50nm, preferably 20nm, use dry film (negative resist) as photoresist Perform photolithography, and then chemically etch to remove Au / Cr in other parts to form lead-out electrodes;

[0056] Deposit a layer of metal on the upper surface of the substrate, such as Au, Al, preferably aluminum, and then fix a layer of dry film on the upper surface of the substrate as a photoresist for photolithography to form a micro-column array pattern, and remove the column array by chemical etching Metals other than metals are then etched using a deep etching process to form a microcolumn array and the pool body of the battery's first housing;

[0057] Modifying and immobilizing nanomaterials on the surface of the m...

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