Dry etching air inlet nozzle and etching equipment

Abstract

The invention discloses a dry etching air inlet nozzle and etching equipment, which relate to the field of wafer processing technology, including: a sealed quick-release component, which at least includes a first ring cylinder and a second ring cylinder which are sealed and connected to each other, wherein the bottom of the second ring cylinder has a ball groove; a deflection head, the top of which is sealed and slidably embedded in the ball groove, a guide hole is opened in the middle of the deflection head, the top of the guide hole is trumpet-shaped and passes through the deflection head upward, and the bottom of the guide hole passes through the deflection head downward; a nozzle seat, which is fixedly sleeved on the bottom of the deflection head; a nozzle, which is fixedly embedded in the bottom of the nozzle seat; wherein an inner tube is fixed in the middle of the first ring cylinder, the inner tube extends downward and extends into the guide hole, the inner diameter of the guide hole is 1.05-1.1 times the outer diameter of the inner tube, the overall sealing is good, the flexibility is high, and it can be applied to different process requirements.

Description

Technical Field

[0001] The invention relates to the technical field of wafer processing, in particular to a dry etching air inlet nozzle and etching equipment. Background Art

[0002] In the field of semiconductor manufacturing, dry etching technology is a key processing technology, and its performance and stability directly affect the quality and production efficiency of products. However, the dry etching air inlet nozzle of the prior art has some shortcomings in design.

[0003] For example, the dry etching air inlet nozzles in the prior art lack sufficient flexibility in airflow control. In complex etching processes, it is often necessary to adjust the direction and distribution of the airflow according to the shape, size and material properties of the workpiece to achieve a uniform etching effect. However, traditional nozzles often use a fixed airflow channel design that cannot flexibly respond to different process requirements, making it difficult to ensure etching uniformity and affecting product quality.

[0004] For another example, the maintenance and replacement of existing nozzles are cumbersome, increasing production costs and downtime. During the continuous operation of the production line, the nozzles may need to be replaced or maintained regularly due to wear, corrosion, etc. However, the removal and installation process of traditional nozzles is cumbersome, which not only increases maintenance costs, but also may affect the continuity and stability of the production line.

[0005] Therefore, it is necessary to develop a dry etching air intake nozzle and etching equipment to solve the above problems. Summary of the invention

[0006] In order to solve the above problems, the present invention provides the following technical solution: a dry etching air inlet nozzle, comprising:

[0007] A sealed quick-release assembly, comprising at least a first ring tube and a second ring tube which are sealed and connected to each other, wherein the bottom of the second ring tube has a ball groove;

[0008] A deflection head, the top of which is sealed and slidably embedded in the ball groove, a guide hole is opened in the middle of the deflection head, the top of the guide hole is trumpet-shaped and passes through the deflection head upward, and the bottom of the guide hole passes through the deflection head downward;

[0009] A nozzle seat, which is fixedly sleeved on the bottom of the deflection head;

[0010] A nozzle, which is fixedly embedded in the bottom of the nozzle seat;

[0011] An inner tube is fixed in the middle of the first ring tube, and the inner tube extends downward and extends into the guide hole. The inner diameter of the guide hole is 1.05-1.1 times the outer diameter of the inner tube.

[0012] Further, as a preference, arc-shaped limiting grooves are provided on both sides of the deflection head, and limiting columns embedded in the limiting grooves are fixed on both sides of the second ring tube.

[0013] Further, preferably, the limiting column and the limiting groove cooperate with each other so that the deflection range of the deflection head is -15° to 15°.

[0014] Further, preferably, the outer circumference of the first ring tube is provided with a plurality of outer ring grooves with stepped cross sections, the inner circumference of the second ring tube is provided with a plurality of inner ring grooves corresponding to the outer ring grooves, and a sealing ring is provided between the outer ring grooves and the inner ring grooves.

[0015] Further, as a preference, a first annular groove is formed on the outer circumference of the first annular tube, and a second annular groove is formed on the outer circumference of the second annular tube;

[0016] The sealing quick-release assembly further comprises two symmetrically arranged arc-sealing seats, which can form a ring shape when the two arc-sealing seats contact each other, and the arc-sealing seats are used to seal the first annular groove and the second annular groove;

[0017] The sealing quick-release assembly also includes a sealing sleeve, which is sleeved on the outside of the first ring tube, the second ring tube and the sealing arc seat.

[0018] Further, as a preference, a sleeve hole is opened in the middle of the nozzle seat for sleeve-mounting on the outside of the deflection head, the bottom of the sleeve hole is also connected to a main flow channel, and both sides of the main flow channel are connected to secondary flow channels;

[0019] The nozzle includes a main spray hole communicated with the main flow channel and a secondary spray hole communicated with the secondary flow channel.

[0020] Further, as a preference, a first speaker seat and a second speaker seat which are symmetrically arranged are provided in the secondary flow channel, and a blocking ball is placed between the first speaker seat and the second speaker seat for blocking the first speaker seat or the second speaker seat.

[0021] Further, as a preference, both sides of the main flow channel are connected with two secondary flow channels, which are the first secondary flow channel, the second secondary flow channel, the third secondary flow channel, and the fourth secondary flow channel in order;

[0022] The first secondary flow channel, the second secondary flow channel, the third secondary flow channel, and the fourth secondary flow channel are magnetic and are used to hinder the movement of the blocking balls, so that: when the deflection head deflects within a first angle range, the blocking balls in the first secondary flow channel and the fourth secondary flow channel block the corresponding first horn seat or the second horn seat, and the first angle range is: -8° to -4°, 4° to 8°; when the deflection head deflects beyond the first angle range, each blocking ball blocks the corresponding first horn seat or the second horn seat.

[0023] An etching device includes a dry etching air inlet nozzle, an air supply device, a micro-motion telescopic rod, and a wafer placement seat; wherein the micro-motion telescopic rod has a telescopic end, the telescopic end is hinged to a hinged disk, the hinged disk is arranged on the nozzle seat, the air supply device is used to supply air to the air supply pipe, and the air supply pipe is connected to the first ring cylinder.

[0024] Compared with the prior art, the present invention provides a dry etching air inlet nozzle and etching equipment, which have the following beneficial effects:

[0025] The present invention is provided with an inner tube, and the bottom of the inner tube extends into the guide hole, and the inner diameter of the guide hole is slightly larger than the outer diameter of the inner tube, which ensures good sealing between the inner tube and the guide hole and allows relatively small movement of the inner tube in the guide hole to adapt to the deflection angle of the deflection head, enhances the sealing between the deflection head and the ball groove, avoids gas leakage during the deflection process to a certain extent, and improves the accuracy and efficiency of etching.

[0026] In the present invention, the sealing sleeve is sleeved on the outside of the first ring tube, the second ring tube and the sealing arc seat to form an external restriction layer. It can not only further enhance the sealing performance of the entire assembly, but also protect the internal structure from corrosion by the external environment. The existence of the sealing sleeve also makes the entire sealing quick-release assembly more convenient and quick during disassembly and installation.

[0027] In the present invention, when the fluid enters the main flow channel of the nozzle seat, a part of the fluid is directly ejected through the main nozzle hole to form a main jet flow. At the same time, another part of the fluid is distributed to the auxiliary nozzle holes on both sides through the secondary flow channel to form an auxiliary jet flow. This design enables the nozzle to flexibly adjust the spray mode and coverage range under different spray requirements. BRIEF DESCRIPTION OF THE DRAWINGS

[0028] Figure 1 It is a schematic diagram of the overall structure of a dry etching air inlet nozzle;

[0029] Figure 2 It is a structural schematic diagram of a sealing quick-release assembly in a dry etching air intake nozzle;

[0030] Figure 3 A schematic diagram of the structure of a nozzle seat and a nozzle in a dry etching air inlet nozzle;

[0031] Figure 4 A schematic diagram of the structure of a secondary flow channel in a dry etching air intake nozzle;

[0032] In the figure: 1. air supply pipe; 2. sealing quick-release assembly; 3. deflection head; 4. inner tube; 5. nozzle seat; 6. hinge plate; 7. nozzle; 21. first ring cylinder; 22. first ring groove; 23. second ring cylinder; 24. second ring groove; 25. sealing arc seat; 26. sealing sleeve; 27. ball groove; 28. limiting column; 31. guide hole; 32. limiting groove; 51. sleeve hole; 52. main flow channel; 53. secondary flow channel; 71. main spray hole; 72. secondary spray hole; 531. blocking ball; 532. first horn seat; 533. second horn seat. DETAILED DESCRIPTION

[0033] The terms "first", "second", etc. in the specification and claims of the present application and the above-mentioned description of the drawings are used to distinguish similar objects, and are not necessarily used to describe a specific order or sequential order. It should be understood that the terms used in this way can be interchangeable under appropriate circumstances, which is merely a way of distinguishing the objects of the same attributes when describing them in the embodiments of the present application. In addition, the terms "including" and "having" and any of their variations are intended to cover non-exclusive inclusions, so that the process, method, system, product or equipment comprising a series of units need not be limited to those units, but may include other units that are not clearly listed or inherent to these processes, methods, products or equipment.

[0034] Example: Please refer to Figure 1-Figure 4 In an embodiment of the present invention, a dry etching gas inlet nozzle is provided, comprising:

[0035] The sealing quick-release assembly 2 at least comprises a first ring tube 21 and a second ring tube 23 which are sealed and connected to each other, wherein the bottom of the second ring tube 23 has a ball groove 27;

[0036] The deflection head 3 has a top which is sealed and slidably embedded in the ball groove 27. A guide hole 31 is opened in the middle of the deflection head 3. The top of the guide hole 31 is trumpet-shaped and passes through the deflection head 3 upwards, and the bottom of the guide hole 31 passes through the deflection head 3 downwards;

[0037] A nozzle seat 5, which is fixedly sleeved on the bottom of the deflection head 3;

[0038] A nozzle 7, which is fixedly embedded in the bottom of the nozzle seat 5;

[0039] An inner tube 4 is fixed in the middle of the first ring tube 21 . The inner tube 4 extends downward and extends into the guide hole 31 . The inner diameter of the guide hole 31 is 1.05-1.1 times the outer diameter of the inner tube 4 .

[0040] The top seal of the deflection head 3 is slidably embedded in the ball groove 27. This connection method allows the deflection head 3 to freely rotate at multiple angles in the ball groove 27, thereby adjusting the injection direction of the gas and improving the flexibility of etching.

[0041] The top of the guide hole 31 is designed to be trumpet-shaped, which helps to evenly disperse and accelerate the flow of gas and reduce the eddy current and turbulence of gas at the entrance of the guide hole 31. At the same time, the bottom of the guide hole 31 passes through the deflection head 3 downward to ensure that the gas can flow out smoothly.

[0042] And the bottom of the inner tube 4 extends into the guide hole 31, and the inner diameter of the guide hole 31 is slightly larger than the outer diameter of the inner tube 4, which not only ensures good sealing between the inner tube 4 and the guide hole 31, but also allows relatively small movement of the inner tube 4 in the guide hole 31 to adapt to the deflection angle of the deflection head 3, enhances the sealing between the deflection head 3 and the ball groove 27, avoids gas leakage during the deflection process to a certain extent, improves the accuracy and efficiency of etching, and the free rotation ability of the deflection head 3 enables the etching gas to adjust the injection direction as needed, increasing the flexibility and adaptability of etching.

[0043] In this embodiment, arc-shaped limiting grooves 32 are formed on both sides of the deflection head 3 , and limiting columns 28 embedded in the limiting grooves 32 are fixed on both sides of the second ring tube 23 .

[0044] Furthermore, the limiting column 28 and the limiting groove 32 cooperate with each other so that the deflection range of the deflection head 3 is -15° to 15°.

[0045] The cooperation between the limiting column 28 and the limiting groove 32 can limit the deflection angle of the deflection head 3 to prevent it from being excessively deflected or deviating from a predetermined direction.

[0046] In addition, the limiting column 28 is embedded in the limiting groove 32, which not only limits the deflection range of the deflection head 3, but also enhances the connection stability between the deflection head 3 and the second ring cylinder 23. This structure can reduce looseness or damage caused by vibration or impact generated during the deflection process, and improve the overall durability and reliability of the nozzle.

[0047] In this embodiment, the outer circumference of the first ring tube 21 is provided with a plurality of outer ring grooves with stepped cross sections, and the inner circumference of the second ring tube 23 is provided with a plurality of inner ring grooves corresponding to the outer ring grooves, and a sealing ring is provided between the outer ring grooves and the inner ring grooves.

[0048] The outer circumference of the first ring tube 21 is provided with a plurality of outer ring grooves with a stepped cross section, and the inner circumference of the second ring tube 23 is provided with a plurality of inner ring grooves correspondingly. This stepped design provides a stable installation space and a good sealing interface for the sealing ring.

[0049] The sealing ring is arranged between the outer ring groove and the inner ring groove, and its shape and material can ensure that it can fit tightly between the outer ring groove and the inner ring groove when subjected to pressure, thereby effectively preventing gas leakage.

[0050] In addition, a first annular groove 22 is formed on the outer circumference of the first annular tube 21, and a second annular groove 24 is formed on the outer circumference of the second annular tube 23;

[0051] The sealing quick-release assembly 2 further includes two symmetrically arranged arc-sealing seats 25. The two arc-sealing seats 25 can form a ring shape when in contact with each other. The arc-sealing seats 25 are used to seal the first annular groove 22 and the second annular groove 24.

[0052] The sealing quick-release assembly 2 further includes a sealing sleeve 26 which is sleeved on the outside of the first annular tube 21 , the second annular tube 23 , and the sealing arc seat 25 .

[0053] A first annular groove 22 and a second annular groove 24 are respectively formed on the outer circumferences of the first annular tube 21 and the second annular tube 23 . The two annular grooves provide installation positions for the sealing arc seat 25 .

[0054] The sealing arc seat 25 is an arc-shaped structure, and the inner surface of the arc has protrusions corresponding to the first annular groove 22 and the second annular groove 24, and the two sealing arc seats 25 can form a ring when they contact each other. This design enables the sealing arc seat 25 to be tightly sealed in the first annular groove 22 and the second annular groove 24, thereby further enhancing the overall sealing performance.

[0055] In addition, the sealing sleeve 26 is sleeved on the outside of the first ring tube 21, the second ring tube 23, and the sealing arc seat 25 to form an external restriction layer. It can not only further enhance the sealing performance of the entire assembly, but also protect the internal sealing structure from erosion by the external environment. The existence of the sealing sleeve 26 also makes the entire sealing quick-release assembly more convenient and quick during disassembly and installation.

[0056] For example, the sealing sleeve 26 is configured to be threadedly connected to the first annular tube 21 or the second annular tube 23 , so that the sealing sleeve 26 can be installed or removed simply by rotating the sealing sleeve 26 .

[0057] In this embodiment, a sleeve hole 51 is opened in the middle of the nozzle seat 5 for sleeved on the outside of the deflection head 3. The bottom of the sleeve hole 51 is also connected to a main flow channel 52, and both sides of the main flow channel 52 are connected to secondary flow channels 53.

[0058] The nozzle 7 includes a main nozzle hole 71 communicating with the main flow channel 52 and a secondary nozzle hole 72 communicating with the secondary flow channel 53 .

[0059] Therefore, when the fluid enters the main flow channel 52 of the nozzle holder 5, a part of the fluid is directly ejected through the main nozzle hole 71 to form the main jet flow. At the same time, another part of the fluid is distributed to the auxiliary nozzle holes 72 on both sides through the secondary flow channel 53 to form an auxiliary jet flow. This design enables the nozzle 7 to flexibly adjust the spray mode and coverage range under different spray requirements. For example, when concentrated spraying is required, the main nozzle hole can be mainly relied on; when wider coverage is required, the main nozzle hole and the auxiliary nozzle hole can be used for spraying at the same time.

[0060] Specifically, a first horn seat 532 and a second horn seat 533 symmetrically arranged are provided in the secondary flow channel 53 , and a blocking ball 531 is placed between the first horn seat 532 and the second horn seat 533 for blocking the first horn seat 532 or the second horn seat 533 .

[0061] The first horn seat 532 and the second horn seat 533 are symmetrically arranged in the secondary flow channel 53, and a blocking ball 531 is placed between them. The blocking ball 531 can block the first horn seat 532 or the second horn seat 533 as needed, thereby controlling the flow direction of the fluid. This design allows the on-off state of the secondary flow channel 53 to be changed by adjusting the position of the blocking ball 531.

[0062] Furthermore, both sides of the main flow channel 52 are connected with two secondary flow channels 53, which are the first secondary flow channel, the second secondary flow channel, the third secondary flow channel, and the fourth secondary flow channel in order;

[0063] The first secondary flow channel, the second secondary flow channel, the third secondary flow channel, and the fourth secondary flow channel are magnetic and are used to hinder the movement of the blocking balls 531, so that: when the deflection head 3 deflects within a first angle range, the blocking balls 531 in the first secondary flow channel and the fourth secondary flow channel block the corresponding first horn seat 532 or the second horn seat 533, and the first angle range is: -8° to -4°, 4° to 8°; when the deflection head 3 deflects beyond the first angle range, each blocking ball 531 blocks the first horn seat 532 or the second horn seat 533 accordingly.

[0064] When deflected within the first angle range, the blocking balls 531 in the first and fourth secondary flow channels will block the corresponding first horn seat or second horn seat respectively, so that the injection is mainly carried out through the main flow channel 52 and the unblocked secondary flow channels (the second and third secondary flow channels).

[0065] Within this range, the spraying may be more concentrated and uniform, and sufficient spraying flow rate is guaranteed.

[0066] The deflection exceeding the first angle range refers to: the deflection angle is between -15° and -8°, and between 8° and 15°;

[0067] At this time, the blocking balls 531 in all the secondary flow channels will move to the corresponding horn seats for blocking, which will cause the injection flow to be mainly carried out through the main flow channel 52, while the contribution of the secondary flow channels will be significantly reduced.

[0068] In this case, the jet concentration may change because the jet flow is mainly concentrated in the jet area corresponding to the main channel 52. The purpose of such design is to achieve more concentrated jetting at a specific angle to adapt to different process requirements.

[0069] An etching device includes a dry etching air inlet nozzle, an air supply device, a micro-motion telescopic rod, and a wafer placement seat; wherein the micro-motion telescopic rod has a telescopic end, the telescopic end is hinged to a hinged disk 6, the hinged disk 6 is arranged on the nozzle seat 5, the air supply device is used to supply air to the air supply pipe 1, and the air supply pipe 1 is connected to the first ring tube 21.

[0070] The etching equipment achieves efficient and precise etching operations on the wafer surface by controlling the supply of etching gas, the spray direction, and the fine-tuning of the nozzle holder and the nozzle.

[0071] What is described above is only a preferred specific implementation manner of the present invention, but the protection scope of the present invention is not limited thereto. Any technician familiar with the technical field can make equivalent replacements or changes according to the technical scheme and inventive concept of the present invention within the technical scope disclosed by the present invention, which should be covered by the protection scope of the present invention.

Claims

1. A dry etching air inlet nozzle, characterized in that: include: A sealing quick-release assembly (2), comprising at least a first ring tube (21) and a second ring tube (23) which are sealed and connected to each other, wherein the bottom of the second ring tube (23) has a ball groove (27); a deflection head (3), the top of which is sealingly slidably embedded in the ball groove (27), and a guide hole (31) is opened in the middle of the deflection head (3), the top of which is trumpet-shaped and passes through the deflection head (3) upward, and the bottom of the guide hole (31) passes through the deflection head (3) downward; a nozzle seat (5), which is fixedly sleeved on the bottom of the deflection head (3); a nozzle (7), which is fixedly embedded in the bottom of the nozzle seat (5); wherein an inner tube (4) is fixed in the middle of the first ring tube (21), the inner tube (4) extends downward and extends into the guide hole (31), and the inner diameter of the guide hole (31) is 1.05-1.1 times the outer diameter of the inner tube (4); A sleeve hole (51) is provided in the middle of the nozzle seat (5) for sleeve-mounting on the outside of the deflection head (3); the bottom of the sleeve hole (51) is also connected to a main flow channel (52); both sides of the main flow channel (52) are connected to secondary flow channels (53); the nozzle (7) comprises a main spray hole (71) connected to the main flow channel (52) and a secondary spray hole (72) connected to the secondary flow channel (53); A first horn seat (532) and a second horn seat (533) are symmetrically arranged in the secondary flow channel (53); a blocking ball (531) is placed between the first horn seat (532) and the second horn seat (533) for blocking the first horn seat (532) or the second horn seat (533); Both sides of the main flow channel (52) are connected to two secondary flow channels (53), which are, in order, the first secondary flow channel, the second secondary flow channel, the third secondary flow channel, and the fourth secondary flow channel; the first secondary flow channel, the second secondary flow channel, the third secondary flow channel, and the fourth secondary flow channel are magnetic and are used to hinder the movement of the blocking balls (531), and make: when the deflection head (3) deflects within a first angle range, the blocking balls (531) in the first secondary flow channel and the fourth secondary flow channel block the corresponding first horn seat (532) or the second horn seat (533), and the first angle range is: -8° to -4°, 4° to 8°; when the deflection head (3) deflects beyond the first angle range, each blocking ball (531) blocks the first horn seat (532) or the second horn seat (533) accordingly.

2. A dry etching gas inlet nozzle according to claim 1, characterized in that: Arc-shaped limiting grooves (32) are provided on both sides of the deflection head (3), and limiting columns (28) embedded in the limiting grooves (32) are fixed on both sides of the second ring tube (23).

3. A dry etching gas inlet nozzle according to claim 2, characterized in that: The limiting column (28) and the limiting groove (32) cooperate with each other so that the deflection range of the deflection head (3) is -15° to 15°.

4. The dry etching gas inlet nozzle according to claim 1, characterized in that: The outer circumference of the first annular tube (21) is provided with a plurality of outer annular grooves with stepped cross sections, and the inner circumference of the second annular tube (23) is provided with a plurality of inner annular grooves corresponding to the outer annular grooves, with sealing rings being provided between the outer annular grooves and the inner annular grooves.

5. A dry etching gas inlet nozzle according to claim 4, characterized in that: The first annular tube (21) is provided with a first annular groove (22) on its outer circumference, and the second annular tube (23) is provided with a second annular groove (24) on its outer circumference. The sealing quick-release assembly (2) further comprises two symmetrically arranged sealing arc seats (25), which can form an annular shape when the two sealing arc seats (25) are in contact with each other, and the sealing arc seats (25) are used to seal the first annular groove (22) and the second annular groove (24). The sealing quick-release assembly (2) further comprises a sealing sleeve (26), which is sleeved on the outside of the first annular tube (21), the second annular tube (23), and the sealing arc seats (25).

6. An etching device, characterized in that: It comprises a dry etching air inlet nozzle, an air supply device, a micro-motion telescopic rod, and a wafer placement seat as described in any one of claims 1 to 5; wherein the micro-motion telescopic rod has a telescopic end, the telescopic end is hinged to a hinge plate (6), the hinge plate (6) is arranged on the nozzle seat (5), the air supply device is used to supply air to the air supply pipe (1), and the air supply pipe (1) is connected to the first ring tube (21).

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