A mask-based cleaning device and cleaning method

Abstract

The present invention relates to the technical field of cleaning equipment and methods, specifically to a cleaning equipment and cleaning method based on a mask, comprising: a cleaning container, which is suitable for containing cleaning liquid; a cleaning table, which is rotatably arranged in the cleaning container around a rotation axis; a fixing member, which is suitable for fixing the mask on the cleaning table; a guide member, which is arranged on the cleaning table and is configured with at least one guide groove arranged in an opening, the first end of the mask fixed to the cleaning table extends into the opening of the guide groove and divides the opening into an expanding liquid inlet and a contracting liquid outlet, and the second end extends in a direction close to or away from the rotation axis. The present invention can effectively guide and distribute the cleaning liquid, so that it turns to concentrate on washing the back water surface after impacting the front water surface of the mask, thereby enhancing the cleaning strength of the back water surface, solving the problems of uneven double-sided cleaning effect and insufficient back water surface cleaning strength, and significantly improving the overall cleaning effect and efficiency.

Description

Technical Field

[0001] The present invention relates to the technical field of cleaning equipment and methods, and in particular to a cleaning equipment and a cleaning method based on a mask. Background Art

[0002] As a key tool in the fields of semiconductor manufacturing, flat panel display, microelectronic packaging, etc., the cleanliness of the mask directly affects the quality and production yield of the final product. During use, the mask may be affected by various contaminants, such as photoresist residues, metal particles, organic matter, inorganic particles, fingerprint grease, and chemical reaction byproducts. If these contaminants are not removed in time, it will not only cause distortion of the mask pattern transmission, but also cause defects in the subsequent photolithography process, such as short circuits, open circuits, bridging, leakage, etc. Therefore, mask cleaning is an essential pretreatment step before mask exposure.

[0003] In the prior art, the cleaning of the mask is mainly driven by manual or electric driving methods, driving the mask to swing, rotate and other movements in a special cleaning liquid, and using the impact of the liquid to wash away the contaminants attached to the grinding plate. However, no matter which path the mask moves along in the cleaning liquid, the side facing away from the water flow is always subjected to a relatively small impact force, resulting in uneven cleaning effect and difficulty in effectively removing contaminants. Therefore, in order to ensure that all parts of the mask are fully cleaned, it is often necessary to make it perform repeated and long-term reciprocating motion in the cleaning liquid, which not only prolongs a single cleaning cycle, but also reduces the overall cleaning efficiency of the mask. In view of the above problems, we provide a mask cleaning device that can improve the cleaning effect and efficiency. Summary of the invention

[0004] The object of the present invention is to provide a cleaning device and a cleaning method based on a mask, so as to solve the problems raised in the above-mentioned background technology.

[0005] According to one aspect of the present invention, a mask-based cleaning device is provided, comprising:

[0006] A cleaning container, which is suitable for containing a cleaning liquid;

[0007] A cleaning table rotatably disposed in the cleaning container about a rotation axis;

[0008] A fixing member, which is suitable for fixing the mask on the cleaning table;

[0009] And a guide member, which is arranged on the cleaning table and is constructed with at least one guide groove arranged in an opening, the first end of the mask plate fixed to the cleaning table extends into the opening of the guide groove and divides the opening into an expanding liquid inlet and a contracting liquid outlet, and the second end extends in a direction close to or away from the rotation axis.

[0010] Optionally, a plurality of guide grooves are constructed on the guide component, and the plurality of guide grooves are arranged in a circle with the rotation axis as the center.

[0011] Optionally, the cleaning device further comprises a second flow guide component in a plate-like structure, wherein the second flow guide component is arranged in the same direction as the mask plate fixed on the cleaning table, and a flushing channel is formed between the flow guide component and the mask plate, and a first end of the flushing channel is connected to the guide groove through the liquid outlet.

[0012] Optionally, the cleaning device further comprises a flow guiding member 3 in a plate-like structure, wherein the flow guiding member 3 is fixed to the second end of the flushing channel and forms a liquid outlet between the flow guiding member 2 for discharging the liquid in the flushing channel.

[0013] Optionally, the mask plate has a first surface and a second surface relative to each other, the second guide component has a third surface and a fourth surface relative to each other, the flushing channel is formed between the second surface and the third surface, an acute angle is formed between the third guide component and the first surface, the third guide component is attached to the second end of the mask plate, and the third guide component has a first side protruding from the first surface and a second side protruding from the fourth surface.

[0014] Optionally, the inner wall of the guide groove is a smooth arc shape.

[0015] Optionally, the cleaning device further includes a strong washing mechanism, and the strong washing mechanism includes:

[0016] A fixed frame, the fixed frame is relatively fixed to the cleaning table;

[0017] A cleaning brush, the cleaning brush being rotatably connected to the fixing frame;

[0018] a first magnet, wherein the first magnet is fixed on the cleaning brush;

[0019] A plurality of second magnets are fixed on the cleaning container and arranged at intervals along the rotation path of the first magnet. When the first magnet rotates, the first magnet exhibits attraction and repulsion characteristics with the adjacent second magnets.

[0020] Optionally, the cleaning brush includes a U-shaped bracket, a closed end of the bracket is rotatably connected to the fixed frame via a rotating shaft, the second magnet is fixedly connected to the closed end of the bracket, and an open end of the bracket is rotatably connected to two brush plates, and flexible bristles are provided on opposite sides of the two brush plates.

[0021] Optionally, the fixing frame, the guide member 1 and the cleaning table are detachably connected to each other, a polygonal column-shaped connecting column is fixedly provided on the top of the cleaning table, and the guide member 1 and the fixing frame are both provided with connecting holes adapted to the shape of the connecting column, and the guide member 1 and the fixing frame are sequentially sleeved on the connecting column and fixed by tightening nuts.

[0022] According to another aspect of the present invention, a cleaning method based on the above-mentioned mask-based cleaning device is provided, comprising the following steps:

[0023] S1: Using a fixing member to firmly mount the mask on the cleaning table, ensuring that the first end thereof is accurately inserted into the opening of the guide groove to facilitate the directional flow of the cleaning liquid;

[0024] S2: Pour a proper amount of cleaning liquid into the cleaning container to ensure that the liquid level is high enough to completely immerse the mask to ensure comprehensive and effective cleaning;

[0025] S3: The cleaning container is rotated around the rotation axis by manual or motor drive. In this process, the cleaning liquid first impacts the water-facing surface of the mask, then enters the guide groove through the liquid inlet formed at the first end of the mask, is accelerated inside the guide groove, and is strongly sprayed from the contracted liquid outlet to the back water surface of the mask, achieving high-intensity washing of the back water surface;

[0026] S4: After cleaning is completed, the waste liquid in the cleaning container is discharged. Then the cleaning table is rotated again, and the residual moisture on the surface of the mask is efficiently removed by combining the airflow and centrifugal force to accelerate the drying process;

[0027] S5: After the mask is completely dehydrated and dried, the cleaned mask is safely removed from the cleaning table to complete the entire cleaning process.

[0028] Compared with the prior art, the present invention provides a cleaning device and a cleaning method based on a mask, which have the following beneficial effects:

[0029] The present invention realizes effective guidance and distribution of the cleaning liquid by providing a guide member and a guide groove arranged in an open manner, so that the cleaning liquid can turn and concentrate on washing the back surface of the mask after impacting the front surface of the mask, thereby enhancing the cleaning strength of the back surface, thereby effectively solving the problem of uneven cleaning effect on both sides of the mask and insufficient cleaning strength on the back surface, and significantly improving the overall cleaning effect and cleaning efficiency of the mask.

[0030] The present invention provides a second flow guide member with a plate-like structure, which is arranged in the same direction as the mask fixed on the cleaning table to form a flushing channel. On the one hand, the mutual cancellation of the kinetic energy of the cleaning liquid between adjacent flow guide grooves is effectively avoided, ensuring that the impact force of the cleaning liquid on both sides of the mask is sufficient, thereby enhancing the cleaning effect; on the other hand, the narrow and long flushing channel constructed by the second flow guide member enables the cleaning liquid to maintain a high-speed flow, and implements efficient and uniform flushing on the back water surface of the mask, thereby significantly improving the back water surface cleaning quality and overall cleaning efficiency;

[0031] The present invention realizes multiple functions such as unidirectional flow, flow guidance, shielding protection and smooth discharge of the cleaning liquid by setting the third flow guide component, effectively solves the problems of kinetic energy dispersion of the cleaning liquid, insufficient cleaning force on the back surface, and poor drainage, and further improves the cleaning effect and cleaning efficiency of both sides of the mask (i.e., the first surface and the second surface);

[0032] The present invention provides a strong washing mechanism, which works in conjunction with the original flushing method. While the cleaning liquid flushes the mask, the swinging brushing action of the cleaning brush further enhances the ability to strip and remove pollutants, thereby achieving deeper and more comprehensive removal of pollutants on both sides of the mask, solving the problem that a single cleaning method may not be able to take into account both cleaning efficiency and cleaning quality. BRIEF DESCRIPTION OF THE DRAWINGS

[0033] Figure 1 A schematic diagram showing the disassembled structure of the annular member of the present invention;

[0034] Figure 2 It is a schematic diagram of the three-dimensional structure of the present invention;

[0035] Figure 3 For the present invention Figure 2 A schematic diagram of the enlarged structure at point A;

[0036] Figure 4 It is a schematic diagram of the partial explosion structure of the present invention;

[0037] Figure 5 It is a schematic structural diagram of the fixing frame, the cleaning brush and the first magnet of the present invention;

[0038] Figure 6 It is a schematic structural diagram of the flow guiding component 1 and the flow guiding component 2 of the present invention;

[0039] Figure 7 A schematic structural diagram showing the flow direction of the cleaning liquid when the present invention only includes the flow guide component;

[0040] Figure 8 A structural schematic diagram showing the flow direction of the cleaning liquid when the present invention only includes the first flow guide member and the second flow guide member;

[0041] Fig. 9 A schematic structural diagram showing the flow direction of the cleaning liquid when the present invention includes the flow guide member 1, the flow guide member 2 and the flow guide member 3;

[0042] Fig.10 It is a schematic diagram of the main structure of the present invention.

[0043] In the figure: 1, cleaning container; 2, cleaning table; 3, guide member 1; 4, guide groove; 5, liquid inlet; 6, liquid outlet; 7, guide member 2; 7-a, third surface; 7-b, fourth surface; 8, flushing channel; 9, guide member 3; 9-a, first side; 9-b, second side; 10, liquid discharge port; 11, mask; 11-a, first surface; 11-b, second surface; 12, fixing frame; 13, first magnet; 14, second magnet; 15, bracket; 16, rotating shaft; 17, brush plate; 18, connecting column; 19, connecting hole; 20, fastening nut; 21, discharge port; 22, supporting leg; 23, motor; 24, first limiting groove; 25, second limiting groove; 26, annular member; 27, plug-in column; 28, plug-in hole; 29, ultrasonic transducer. DETAILED DESCRIPTION

[0044] The following will be combined with the drawings in the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0045] Example: See Figures 1 to 10 According to one aspect of an embodiment of the present invention, a mask-based cleaning device is provided, comprising a cleaning container 1, a cleaning table 2, a fixing member and a flow guide member 3. In this example, the top of the cleaning container 1 is open, and the cleaning container 1 is suitable for containing cleaning liquid. The bottom of the side wall of the cleaning container 1 is provided with a drain port 21 with a ball valve. The ball valve structure allows the operator to accurately control the discharge of the cleaning liquid, so as to quickly and thoroughly discharge the waste liquid after the cleaning is completed, or adjust the liquid level as needed during the cleaning process. The bottom of the cleaning container 1 is provided with a supporting leg 22 to support it from the ground;

[0046] The cleaning table 2 is rotatably arranged in the cleaning container 1 around a rotation axis. In this example, the cleaning table 2 is circular, and the central axis of the cleaning table 2 is the rotation axis. The driving mode of the cleaning table 2 is driven by a motor 23. The motor 23 is installed at the bottom of the cleaning container 1. The output shaft of the motor 23 passes through the bottom of the cleaning container 1 and is firmly connected to the cleaning table 2 through a sealed bearing to ensure stable transmission and good sealing during the rotation process. The motor 23 driving mode has the advantages of smooth operation and controllable speed, providing an efficient and reliable rotational power source for the cleaning process. In addition, considering different usage scenarios and user needs, the driving mode of the cleaning table 2 is not limited to the motor 23 drive. In other embodiments, a manual driving scheme can be selected, such as a shaft member fixedly arranged in the middle of the cleaning table 2, one end of which is rotatably connected to the bottom of the cleaning table 2 through a bearing seat, and the other end extends to the outside of the cleaning container 1 and is equipped with a driving handle. The operator can drive the cleaning table 2 to rotate by rotating the handle to achieve manual control of the rotation speed and direction of the cleaning table 2, which is particularly suitable for occasions where the power supply is limited or the cleaning parameters need to be finely adjusted;

[0047] The fixing member is suitable for fixing the mask 11 on the cleaning table 2. In this example, the fixing member includes a first limiting groove 24, which is arranged on the top of the cleaning table 2 and is adapted to the thickness of the mask 11. The mask 11 can be accurately positioned and fixed on the cleaning table 2 by properly embedding the lower side of the mask 11 into the first limiting groove 24. Although the first limiting groove 24 is used as a fixing method in this example, the structural form of the fixing member is not limited thereto. Any design that can ensure that the mask 11 is stably fixed on the cleaning table 2 is within the scope of consideration, such as a clamping device, an adsorption structure, a snap-on system, etc. As long as it can meet the fixing requirements and does not hinder the cleaning process, it can be used as a feasible solution for the fixing member;

[0048] The flow guide member 3 is arranged on the cleaning table 2 and is configured with at least one flow guide groove 4 arranged in an open manner. The first end of the mask 11 fixed to the cleaning table 2 extends into the opening of the flow guide groove 4 and divides the opening into an expanding liquid inlet 5 and a contracting liquid outlet 6, and the second end of the mask 11 extends in a direction close to or away from the rotation axis. It can be understood that the flow guide member 3 can be arranged at the center position of the cleaning table 2 or at the edge position of the cleaning table 2. When the flow guide member 3 is arranged at the center position of the cleaning table 2, the second end of the mask 11 extends in a direction away from the rotation axis, and when the flow guide member 3 is arranged at the edge position of the cleaning table 2, the second end of the mask 11 extends in a direction close to the rotation axis.

[0049] When the above scheme is implemented, the mask 11 fixed on the cleaning table 2 rotates in one direction in the cleaning liquid of the cleaning container 1 together with the cleaning table 2. During this process, after the cleaning liquid impacts the water-facing surface of the mask 11, it is guided to the guide groove 4 of the guide member 3 through the liquid inlet 5, and then discharged to the back water surface of the mask 11 through the liquid outlet 6 of the guide groove 4, so that the back water surface of the mask 11 is rinsed with greater intensity, thereby achieving the effect of simultaneously rinsing the two surfaces of the mask 11, which can not only improve the cleaning effect of the mask 11, but also shorten the cleaning time of the mask 11, thereby improving the cleaning efficiency of the mask 11.

[0050] As a preferred embodiment, in this example, a plurality of guide grooves 4 are constructed on the guide member 1 3, and the plurality of guide grooves 4 are arranged in a circle with the rotation axis as the center. A mask plate 11 can be placed in each guide groove 4, so that multiple mask plates 11 can be cleaned at the same time, further improving the cleaning efficiency of the mask plates 11.

[0051] See also Figure 8 In one embodiment, the cleaning device may further include a guide member 2 7 in a plate-like structure, the guide member 2 7 is arranged in the same direction as the mask 11 fixed on the cleaning table 2, a flushing channel 8 is formed between the guide member and the mask 11, and a first end of the flushing channel 8 is connected to the guide groove 4 through the liquid outlet 6. On the one hand, since the liquid inlet 5 and the liquid outlet 6 of two adjacent guide grooves 4 have opposite liquid flow directions, and the guide member 2 7 effectively separates the liquid inlet 5 and the liquid outlet 6 of the adjacent guide grooves 4, it is prevented that the opposite liquid flow directions between the two cause the kinetic energy to cancel each other, ensuring that the cleaning liquid maintains sufficient impact force when impacting the double sides of the mask 11, thereby enhancing the cleaning effect; on the other hand, the addition of the guide member 2 7 prompts the back surface of the mask 11 to form a narrow and continuous strip-shaped flushing channel 8, thereby, the cleaning liquid flowing out of the guide groove 4 at a high speed can maintain a high flow rate in the channel, and the back surface of the mask 11 is efficiently and comprehensively flushed, which significantly improves the cleaning quality and uniformity of the back surface, and further consolidates the overall cleaning efficiency.

[0052] See also Fig. 9In one embodiment, the cleaning device further comprises a flow guide member 3 9 in a plate-like structure, the flow guide member 3 9 is fixed to the second end of the flushing channel 8 and forms a liquid outlet 10 for the liquid in the flushing channel 8 to be discharged between the flow guide member 2 7. The flow guide member 3 9 is arranged at the second end of the flushing channel 8, which effectively blocks the reverse inflow of the cleaning liquid, ensures the unidirectional flow of the liquid in the channel, and strengthens the directional flushing effect of the cleaning liquid on the back surface of the mask 11. In addition, in this example, the mask 11 has a first surface 11-a and a second surface 11-b opposite to each other, the flow guide member 2 7 has a third surface 7-a and a fourth surface 7-b opposite to each other, the flushing channel 8 is formed between the second surface 11-b and the third surface 7-a, the flow guide member 3 9 forms an acute angle with the first surface 11-a, the flow guide member 3 9 is arranged on the second end of the mask 11, and the flow guide member 3 9 has a first side 9-a protruding from the first surface 11-a and a second side 9-b protruding from the fourth surface 7-b. It can be understood that the first surface 11-a of the mask plate 11 is the water-facing surface of the mask plate 11, and the second surface 11-b of the mask plate 11 is the back water surface of the mask plate 11. The first side 9-a of the guide member three 9 is protruded from the first surface 11-a of the mask plate 11. This layout helps to guide more cleaning liquid to flow to the water-facing surface of the mask plate 11, thereby enhancing the flushing effect on the back water surface (first surface 11-a) of the mask plate 11; the second side 9-b of the guide member three 9 is protruded from the fourth surface 7-b of the mask plate 11, and the second side 9-b of the guide member three 9 forms a shielding structure for the liquid discharge port 10, which ensures that the cleaning liquid in the flushing channel 8 is not disturbed by external resistance and is smoothly discharged through the liquid discharge port 10, and effectively avoids liquid reflux, thereby improving the flushing efficiency of the back water surface (second surface 11-b) of the mask plate 11.

[0053] As a preferred embodiment, in this example, the inner wall of the guide groove 4 is a smooth arc shape. On the one hand, the arc-shaped inner wall helps the cleaning liquid to slide smoothly in the guide groove 4, significantly reducing the kinetic energy loss of the fluid due to contact surface friction, ensuring that the cleaning liquid still has sufficient impact force after being transferred to the flushing channel 8, and implementing efficient flushing on both sides of the mask 11; on the other hand, the smooth arc-shaped inner wall structure effectively reduces the direct impact force of the cleaning liquid on the guide groove 4 during high-speed flow, reduces the early wear of the material surface caused by impact, thereby extending the service life of the guide groove 4 and ensuring the long-term stable operation of the cleaning equipment.

[0054] See also Figure 2 , Figure 3 , Figure 4 and Figure 5In one embodiment, the cleaning device further includes a strong washing mechanism, which includes a fixed frame 12, a cleaning brush, a first magnet 13 and a plurality of second magnets 14, wherein the fixed frame 12 is relatively fixed to the cleaning table 2; the cleaning brush is rotatably connected to the fixed frame 12; the first magnet 13 is fixed to the cleaning brush; a plurality of second magnets 14 are fixedly arranged on the cleaning container 1 and arranged at intervals along the rotation path of the first magnet 13, and when the first magnet 13 rotates, it exhibits the characteristics of attraction and repulsion with the adjacent second magnets 14. Specifically, the cleaning brush includes a U-shaped bracket 15, one closed end of the bracket 15 is rotatably connected to the fixed frame 12 through a rotating shaft 16, the second magnet 14 is fixedly connected to the closed end of the bracket 15, and one open end of the bracket 15 is rotatably connected to two brush plates 17, and the two brush plates 17 are provided with flexible bristles on the opposite sides. The two brush plates 17 of the bracket 15 are clamped on both sides of the mask 11. When the cleaning table 2 rotates, the first magnet 13 and the adjacent second magnet 14 on the cleaning brush alternately present attractive force and repulsive force during the rotation process. This magnetic interaction drives the bracket 15 of the cleaning brush to perform reciprocating swinging motion around the rotating shaft 16. During the swinging process, the flexible bristles on the brush plate 17 simultaneously and carefully brush both sides of the mask 11, which complements the original flushing method and removes the contaminants on both sides of the mask 11 in a deeper and more comprehensive manner.

[0055] As a preferred embodiment, in this example, multiple second magnets 14 are fixed on the inner side of an annular component 26, two plug-in posts 27 are provided at the bottom of the annular component 26, and plug-in holes 28 compatible with the two plug-in posts 27 are provided at the top of the cleaning container 1. In this way, multiple second magnets 14 can be disassembled and assembled together, which facilitates the disassembly and assembly of the internal structure of the cleaning container 1 such as the fixed frame 12 and the cleaning brush.

[0056] As a preferred embodiment, in this example, the fixing frame 12, the flow guide member 13 and the washing table 2 are detachably connected, a polygonal column 18 is fixedly provided on the top of the washing table 2, and the flow guide member 13 and the fixing frame 12 are provided with connection holes 19 adapted to the shape of the connection column 18, and the flow guide member 13 and the fixing frame 12 are successively sleeved on the connection column 18 and fixed by the fastening nut 20. During assembly, the flow guide member 13 is first sleeved on the connection column 18, and then the fixing frame 12 is also sleeved on the connection column 18, and is firmly locked by the fastening nut 20. This detachable connection method greatly simplifies the assembly process of the fixing frame 12, the flow guide member 13 and the washing table 2, and improves the assembly efficiency and convenience of the equipment. In order to further simplify the assembly structure and reduce the difficulty of operation, the flow guide member 13 and the flow guide member 2 adopt an integrated structure, and the two are seamlessly integrated, without the need for additional assembly steps, saving assembly time.

[0057] As a preferred embodiment, in this example, the fixing component also includes a second limiting groove 25, which is arranged at the bottom of the fixing frame 12 and is adapted to the thickness of the mask plate 11. When fixing the mask plate 11, not only can the lower side edge be effectively positioned through the first limiting groove 24, but the upper side edge of the mask plate 11 can also be firmly clamped with the help of the second limiting groove 25, thereby realizing simultaneous constraints on the upper and lower ends, ensuring that the mask plate 11 remains in a precise and stable fixed state throughout the cleaning process, avoiding shaking or displacement during the cleaning process that affects the cleaning effect, thereby further improving the fixing reliability and cleaning accuracy of the cleaning equipment on the mask plate 11.

[0058] In another embodiment, an ultrasonic transducer 29 is also provided at the bottom of the cleaning container 1. When the ultrasonic function is activated, high-frequency ultrasonic energy can be released into the internal space of the cleaning container 1. These energies are converted into microscopic cavitation effects in the cleaning liquid in the cleaning container 1, forming countless tiny bubbles that expand and burst rapidly, generating strong shock wave flows, thereby performing a comprehensive and detailed deep cleaning of the mask 11 immersed in the cleaning liquid. Therefore, the cleaning table 2 in the cleaning container 1 can be maintained at a relatively low speed, which can effectively prevent accidental impact damage to the mask 11 caused by high-speed water flow, and can fully utilize the advantages of ultrasonic cleaning technology to achieve efficient removal of pollutants on the surface of the mask 11 and in the fine pores, thereby improving the cleaning quality and the service life of the mask 11.

[0059] According to another aspect of an embodiment of the present invention, a cleaning method based on the above-mentioned cleaning device based on the mask 11 is provided, comprising the following steps:

[0060] S1: Using a fixing member to firmly mount the mask 11 on the cleaning table 2, ensuring that the first end thereof is accurately inserted into the opening of the guide groove 4 to facilitate the directional flow of the cleaning liquid;

[0061] S2: injecting a proper amount of cleaning liquid into the cleaning container 1, ensuring that the liquid level is high enough to completely immerse the mask 11, so as to ensure comprehensive and effective cleaning;

[0062] S3: The cleaning container 1 is rotated around the rotation axis manually or by the motor 23. In this process, the cleaning liquid first impacts the water-facing surface of the mask 11, then enters the guide groove 4 through the liquid inlet 5 formed at the first end of the mask 11, is accelerated inside the guide groove 4, and is strongly sprayed from the constricted liquid outlet 6 to the back water surface of the mask 11, thereby achieving high-intensity washing of the back water surface;

[0063] S4: After the cleaning is completed, the waste liquid in the cleaning container 1 is discharged. Then the cleaning table 2 is rotated again, and the residual water on the surface of the mask 11 is efficiently removed by combining the airflow and the centrifugal force, thereby accelerating the drying process;

[0064] S5: After the mask 11 is completely dehydrated and dried, the cleaned mask 11 is safely removed from the cleaning station 2, completing the entire cleaning process.

[0065] Working principle: First, the mask 11 is clamped and fixed on the cleaning table 2 by a fixing component so that its first end extends into the opening of the guide groove 4. Then, an appropriate amount of cleaning liquid is added into the cleaning container 1 to ensure that the mask 11 is completely immersed. Then, the motor 23 is turned on to rotate the cleaning table 2 in one direction in the cleaning liquid. After the cleaning liquid impacts the water-facing surface of the mask 11, it enters the guide groove 4 through the liquid inlet 5, and the back surface of the mask 11 is rinsed at high speed by the shrink-mouth liquid outlet 6 to achieve double-sided synchronous and efficient cleaning. During this period, the cleaning brush swings under the attraction and repulsion of the first magnet 13 and the second magnet 14, and the brush plate 17 brushes both sides of the mask 11 to remove pollutants in coordination with the rinsing. Finally, the motor 23 is turned off, the ball valve is opened, and the waste liquid is discharged through the drain port 21. The motor 23 is started again, and the airflow and centrifugal force are used to remove the moisture on the surface of the mask 11. After cleaning and drying, the cleaned mask 11 is safely removed from the cleaning table 2.

[0066] Although embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that various changes, modifications, substitutions and variations may be made to the embodiments without departing from the principles and spirit of the present invention, and that the scope of the present invention is defined by the appended claims and their equivalents.

Claims

1. A cleaning device based on a mask, characterized in that: include: A cleaning container (1) adapted to contain a cleaning liquid; A cleaning table (2) is rotatably disposed in the cleaning container (1) around a rotation axis; A fixing member, which is suitable for fixing the mask (11) on the cleaning platform (2); and a flow guide component (3) which is arranged on the cleaning table (2) and is configured with at least one flow guide groove (4) arranged in an open manner, wherein the first end of the mask plate (11) fixed to the cleaning table (2) extends into the opening of the flow guide groove (4) and divides the opening into an expanding liquid inlet (5) and a contracting liquid outlet (6), and the second end extends in a direction approaching or away from the rotation axis; a plurality of the flow guide grooves (4) are configured on the flow guide component (3), and the plurality of the flow guide grooves (4) are arranged in a circumference with the rotation axis as the center.

2. The mask-based cleaning device according to claim 1, characterized in that: It also comprises a second flow guide member (7) in a plate-like structure, the second flow guide member (7) being arranged in the same direction as a mask plate (11) fixed on the cleaning table (2), a flushing channel (8) being formed between the second flow guide member (7) and the mask plate (11), and a first end of the flushing channel (8) being connected to the flow guide groove (4) via the liquid outlet (6).

3. The mask-based cleaning device according to claim 2, characterized in that: It also includes a flow-guiding component three (9) in a plate-like structure, wherein the flow-guiding component three (9) is fixed to the second end of the flushing channel (8) and forms a liquid discharge port (10) between the flow-guiding component two (7) for discharging the liquid in the flushing channel (8).

4. The mask-based cleaning device according to claim 3, characterized in that: The mask plate (11) has a first surface (11-a) and a second surface (11-b) relative to each other, the second flow guide component (7) has a third surface (7-a) and a fourth surface (7-b) relative to each other, the flushing channel (8) is formed between the second surface (11-b) and the third surface (7-a), an acute angle is formed between the third flow guide component (9) and the first surface (11-a), the third flow guide component (9) is attached to the second end of the mask plate (11), and the third flow guide component (9) has a first side (9-a) protruding from the first surface (11-a) and a second side (9-b) protruding from the fourth surface (7-b).

5. A mask-based cleaning device according to any one of claims 1 to 3, characterized in that: The inner wall of the guide groove (4) is in a smooth arc shape.

6. The mask-based cleaning device according to claim 4, characterized in that: It also includes a strong washing mechanism, which includes: A fixed frame (12), wherein the fixed frame (12) and the cleaning table (2) are relatively fixed; a cleaning brush, the cleaning brush being rotatably connected to the fixing frame (12); A first magnet (13), wherein the first magnet (13) is fixed on the cleaning brush; A plurality of second magnets (14) are fixedly mounted on the cleaning container (1) and arranged at intervals along the rotation path of the first magnet (13); when the first magnet (13) rotates, the first magnet (13) exhibits attraction and repulsion characteristics with adjacent second magnets (14).

7. The mask-based cleaning device according to claim 6, characterized in that: The cleaning brush comprises a U-shaped bracket (15), one closed end of the bracket (15) is rotatably connected to the fixed frame (12) via a rotating shaft (16), the second magnet (14) is fixedly connected to the closed end of the bracket (15), and the open end of the bracket (15) is rotatably connected to two brush plates (17), and the two brush plates (17) are provided with flexible bristles on opposite sides.

8. The mask-based cleaning device according to claim 7, characterized in that: The fixing frame (12), the flow guide component (1) and the cleaning table (2) are detachably connected to each other; a polygonal column-shaped connecting column (18) is fixedly provided on the top of the cleaning table (2); the flow guide component (1) and the fixing frame (12) are both provided with connecting holes (19) adapted to the shape of the connecting column (18); the flow guide component (3) and the fixing frame (12) are sequentially sleeved on the connecting column (18) and fixed by means of a tightening nut (20).

9. A cleaning method based on the mask cleaning device according to any one of claims 6 to 8, characterized in that: The following steps are involved: S1: Using a fixing member to firmly mount the mask plate (11) on the cleaning table (2), ensuring that the first end thereof is accurately inserted into the opening of the guide groove (4) to facilitate the directional flow of the cleaning liquid; S2: injecting a proper amount of cleaning liquid into the cleaning container (1), ensuring that the liquid level is high enough to completely immerse the mask (11) to ensure comprehensive and effective cleaning; S3: The cleaning container (1) is rotated around the rotation axis by manual or motor (23) driving. During this process, the cleaning liquid first impacts the water-facing surface of the mask (11), then enters the guide groove (4) through the liquid inlet (5) formed at the first end of the mask (11), is accelerated inside the guide groove (4), and is strongly sprayed from the constricted liquid outlet (6) toward the water-retaining surface of the mask (11), thereby achieving high-intensity washing of the water-retaining surface; S4: After the cleaning is completed, the waste liquid in the cleaning container (1) is discharged, and then the cleaning table (2) is rotated again, and the residual moisture on the surface of the mask (11) is efficiently removed by combining the airflow and the centrifugal force, thereby accelerating the drying process; S5: After the mask plate (11) is completely dehydrated and dried, the cleaned mask plate (11) is safely removed from the cleaning table (2), completing the entire cleaning process.

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