TCS concentration detection device, system and method and semiconductor process equipment

Abstract

The invention relates to a TCS concentration detection device, system and method and semiconductor process equipment. The TCS concentration detection device comprises a first gas conveying unit, a concentration detection unit, a verification unit and a first purging unit. The TCS concentration detection device has the advantages that the first gas conveying unit is communicated with the concentration detection unit, and the TCS concentration is detected by adopting the mass spectrometer with higher precision and lower delay, so that the TCS concentration detection precision and effect are improved; the first gas conveying unit is communicated with the verification unit, the mixed gas is condensed and weighed to obtain the weight of the condensed liquid and the total flow of the condensed gas, and the TCS concentration is calculated according to the weight of the condensed liquid and the total flow of the condensed gas, so that a result detected by the mass spectrometry detection element is verified; and the reliability of detection results is improved.

Description

Technical Field

[0001] The present invention relates to the technical field of bubbling equipment, and in particular to a TCS concentration detection device, system, method and semiconductor process equipment. Background Art

[0002] TCS bubblers are widely used in silicon carbide epitaxial equipment and silicon epitaxial equipment in the semiconductor industry. In such equipment, TCS (trichlorosilane) is an important raw material, and its concentration is an important parameter of the epitaxial process. This patent is a method for detecting the concentration of TCS in the TCS mixed H2 output by the bubbler to ensure that the bubbler can adapt to various epitaxial machines.

[0003] At present, the concentration detection process of TCS bubbler in semiconductor factories is generally as follows: after the TCS bubbler is bubbled with H2 under pressure and flow control, the mixed gas of TCS and H2 is output, which is then sent to the concentration sensor to detect its TCS concentration after passing through the pressure control module and the flow control module at the epitaxial machine end. In addition, the concentration sensor used in this detection process is generally an optical sensor.

[0004] However, current concentration sensors are generally optical sensors, which have problems such as high detection delay and low accuracy. In addition, the existing TCS bubbler concentration detection process does not have a process that can verify the concentration sensor, and the detection structure provided by the corresponding concentration sensor cannot confirm its accuracy.

[0005] Currently, no effective solution has been proposed for the problems existing in related technologies, such as high detection delay, low accuracy, and inability to verify detection results. Summary of the invention

[0006] The purpose of the present invention is to provide a TCS concentration detection device, system, method and semiconductor process equipment to address the deficiencies in the prior art, so as to solve the problems existing in the related art such as high detection delay, low accuracy and inability to verify the detection results.

[0007] To achieve the above object, the technical solution adopted by the present invention is:

[0008] In a first aspect, the present invention provides a TCS concentration detection device, comprising:

[0009] a first gas delivery unit, the first gas delivery unit being in communication with the gas mixing device and being used for acquiring and delivering the mixed gas delivered by the gas mixing device;

[0010] a concentration detection unit, the concentration detection unit being connected to the first gas delivery unit and the tail gas treatment device respectively, and being used for performing mass spectrometry analysis on the mixed gas to obtain first concentration information of the mixed gas;

[0011] a verification unit, the verification unit being connected to the first gas delivery unit and the tail gas treatment device respectively, and being used for condensing and weighing the mixed gas to obtain second concentration information of the mixed gas to verify the first concentration information;

[0012] The first purge unit is connected to the verification unit and the exhaust gas treatment device respectively, and is used to purge the pipelines of the verification unit and the exhaust gas treatment device.

[0013] In a second aspect, the present invention further provides a TCS concentration detection system, comprising:

[0014] The TCS concentration detection device as described in the first aspect;

[0015] a gas mixing device, the gas mixing device being in communication with the TCS concentration detection device and being used for delivering a mixed gas to the TCS concentration detection device;

[0016] An exhaust gas treatment device is connected to the TCS concentration detection device and the gas mixing device, and is used to treat the exhaust gas.

[0017] In some of the embodiments, the gas mixing device comprises:

[0018] Liquid supply units, each of which is connected to a liquid source and is used to transport liquid TCS;

[0019] A carrier gas supply unit, each of which is connected to a carrier gas source and is used to deliver the carrier gas;

[0020] A mixing unit, the mixing unit is connected to the liquid supply unit, the carrier gas supply unit, the TCS concentration detection device, and the waste liquid treatment device, respectively, and is used to store liquid TCS and carrier and perform a bubbling reaction on the liquid TCS to generate a mixed gas;

[0021] a second gas delivery unit, the second gas delivery unit being connected to the mixing unit and the TCS concentration detection device respectively, and being used for delivering the mixed gas;

[0022] A second purge unit, the second purge unit is respectively connected to the purge gas source, the liquid supply unit, the carrier gas supply unit, and the second gas delivery unit, and is used to purge the pipelines of the liquid supply unit, the carrier gas supply unit, and the second gas delivery unit;

[0023] The first vacuum unit is connected to the power gas source, the second purge unit and the mixing unit respectively, and is used for performing vacuum treatment on the entire device.

[0024] In some embodiments, the exhaust gas treatment device includes:

[0025] a second vacuum unit, the second vacuum unit being in communication with the TCS concentration detection device and being used for performing a vacuum treatment on the TCS concentration detection device;

[0026] An exhaust gas treatment unit is connected to the TCS concentration detection device and the gas mixing device, and is used to treat the exhaust gas discharged by the TCS concentration detection device and the gas mixing unit.

[0027] In a third aspect, the present invention further provides a semiconductor process equipment, comprising:

[0028] The TCS concentration detection device as described in the first aspect; or

[0029] A TCS concentration detection system as described in the second aspect.

[0030] In a fourth aspect, the present invention further provides a TCS concentration detection method, which is applied to the TCS concentration detection device as described in the first aspect or the TCS concentration detection system as described in the second aspect, comprising:

[0031] The first gas delivery unit is used to obtain and deliver the mixed gas delivered by the gas mixing device;

[0032] The concentration detection unit is used to perform mass spectrometry analysis on the mixed gas to obtain first concentration information of the mixed gas;

[0033] The verification unit is used to condense and weigh the mixed gas to obtain second concentration information of the mixed gas;

[0034] By comparing the second concentration information with the first concentration information, it is determined whether the first concentration information obtained by the concentration detection unit is consistent with the actual situation.

[0035] In a fifth aspect, the present invention further provides a TCS concentration detection method, which is applied to the TCS concentration detection system as described in the second aspect, comprising:

[0036] The liquid supply unit is used to deliver liquid to the TCS concentration detection device;

[0037] The carrier gas supply unit is used to deliver carrier gas to the TCS concentration detection device;

[0038] The mixing unit is used to perform a bubbling reaction on liquid TCS and generate a mixed gas;

[0039] The second gas delivery unit is used for delivering the mixed gas;

[0040] The first gas delivery unit is used to obtain and deliver the mixed gas delivered by the gas mixing device;

[0041] The concentration detection unit is used to perform mass spectrometry analysis on the mixed gas to obtain first concentration information of the mixed gas;

[0042] The verification unit is used to condense and weigh the mixed gas to obtain second concentration information of the mixed gas;

[0043] By comparing the second concentration information with the first concentration information, it is determined whether the first concentration information obtained by the concentration detection unit is consistent with the actual situation.

[0044] The present invention adopts the above technical solution, and has the following technical effects compared with the prior art:

[0045] The present invention provides a TCS concentration detection device, system, method and semiconductor process equipment. By connecting a first gas delivery unit with a concentration detection unit, a mass spectrometer with higher accuracy and lower delay is used to detect the TCS concentration, thereby improving the accuracy and effect of TCS concentration detection. By connecting the first gas delivery unit with a verification unit, the weight of the condensed liquid and the total flow rate of the condensed gas are obtained by condensing and weighing the mixed gas, and the TCS concentration is calculated by the weight of the condensed liquid and the total flow rate of the condensed gas, so as to verify the result detected by the mass spectrometry detection element, thereby improving the reliability of the detection result. BRIEF DESCRIPTION OF THE DRAWINGS

[0046] Figure 1 is a schematic diagram of a framework of a TCS concentration detection device according to an embodiment of the present invention;

[0047] Figure 2 is a schematic diagram of a framework of a first gas delivery unit according to an embodiment of the present invention;

[0048] Figure 3 is a schematic diagram of a concentration detection unit according to an embodiment of the present invention;

[0049] Figure 4 is a schematic diagram of a framework of a verification unit according to an embodiment of the present invention;

[0050] Figure 5 is a schematic diagram of a framework of a first purge unit according to an embodiment of the present invention;

[0051] Figure 6 is a schematic diagram of a TCS concentration detection system according to an embodiment of the present invention;

[0052] Figure 7 is a schematic diagram of a gas mixing device according to an embodiment of the present invention;

[0053] Figure 8is a schematic diagram of a framework of a liquid supply unit, a carrier gas supply unit, a mixing unit, and a second gas delivery unit according to an embodiment of the present invention;

[0054] Fig. 9 is a schematic diagram of a framework of a second purge unit according to an embodiment of the present invention;

[0055] Fig.10 is a schematic diagram of a framework of a first vacuum unit according to an embodiment of the present invention;

[0056] Fig.11 is a schematic diagram of a framework of an exhaust gas treatment device according to an embodiment of the present invention;

[0057] Fig.12 is a schematic diagram of a framework of a second vacuum unit and an exhaust gas treatment unit according to an embodiment of the present invention;

[0058] Fig.13 Schematic diagram of a specific embodiment of a TCS concentration detection system according to an embodiment of the present invention.

[0059] The accompanying drawings are marked as follows: 100, TCS concentration detection device; 110, first gas delivery unit; 111, first gas delivery element; 112, second gas delivery element; 113, third gas delivery element; 120, concentration detection unit; 121, fourth gas delivery element; 122, fifth gas delivery element; 123, mass spectrometer detection element; 130, verification unit; 131, sixth gas delivery element; 132, condensation element; 133, seventh gas delivery element; 134, liquid delivery element; 135, storage element; 136, flow detection element; 137, weight detection element; 140, first purge unit; 141, eighth gas delivery element; 142, ninth gas delivery element; 143, tenth gas delivery element; 144, eleventh gas delivery element; 145, twelfth gas delivery element; 146, thirteenth gas delivery element; 147, fourteenth gas delivery element;

[0060] 200, gas mixing device; 210, liquid supply unit; 211, liquid supply element; 220, carrier gas supply unit; 221, carrier gas supply element; 230, mixing unit; 231, mixing element; 240, second gas delivery unit; 241, fifteenth gas delivery element; 250, second purge unit; 251, sixteenth gas delivery element; 252, seventeenth gas delivery element; 253, eighteenth gas delivery element; 254, nineteenth gas delivery element; 255, twentieth gas delivery element; 260, first vacuum unit; 261, first vacuum pump element; 262, twenty-first gas delivery element; 263, twenty-second gas delivery element; 264, twenty-third gas delivery element;

[0061] 300, exhaust gas treatment device; 310, second vacuum unit; 311, second vacuum pump element; 312, twenty-fourth gas delivery element; 313, twenty-fifth gas delivery element; 314, twenty-sixth gas delivery element; 320, exhaust gas treatment unit; 321, exhaust gas treatment element. DETAILED DESCRIPTION

[0062] In order to make the purpose, technical solutions and advantages of the present application clearer, the present application is described and illustrated below in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are only used to explain the present application and are not intended to limit the present application. Based on the embodiments provided in the present application, all other embodiments obtained by ordinary technicians in the field without making creative work are within the scope of protection of the present application.

[0063] Obviously, the drawings described below are only some examples or embodiments of the present application. For ordinary technicians in this field, the present application can also be applied to other similar scenarios based on these drawings without creative work. In addition, it can also be understood that although the efforts made in this development process may be complicated and lengthy, for ordinary technicians in this field related to the content disclosed in this application, some changes in design, manufacturing or production based on the technical content disclosed in this application are just conventional technical means, and should not be understood as insufficient content disclosed in this application.

[0064] Reference to "embodiments" in this application means that a particular feature, structure, or characteristic described in conjunction with the embodiments may be included in at least one embodiment of the present application. The appearance of the phrase in various locations in the specification does not necessarily refer to the same embodiment, nor is it an independent or alternative embodiment that is mutually exclusive with other embodiments. It is explicitly and implicitly understood by those of ordinary skill in the art that the embodiments described in this application may be combined with other embodiments without conflict.

[0065] Unless otherwise defined, the technical terms or scientific terms involved in this application should be understood by people with ordinary skills in the technical field to which this application belongs. The words "one", "a", "a", "the" and the like involved in this application do not indicate a quantitative limitation, and may represent the singular or plural. The terms "include", "comprise", "have" and any of their variations involved in this application are intended to cover non-exclusive inclusions; for example, a process, method, system, product or device that includes a series of steps or modules (units) is not limited to the listed steps or units, but may also include steps or units that are not listed, or may also include other steps or units inherent to these processes, methods, products or devices. The words "connect", "connected", "coupled" and the like involved in this application are not limited to physical or mechanical connections, but may include electrical connections, whether direct or indirect. The "multiple" involved in this application refers to two or more. "And / or" describes the association relationship of associated objects, indicating that there may be three relationships, for example, "A and / or B" can represent: A exists alone, A and B exist at the same time, and B exists alone. The character " / " generally indicates that the objects before and after are in an "or" relationship. The terms "first", "second", "third", etc. involved in this application are only used to distinguish similar objects and do not represent a specific ordering of the objects.

[0066] Example 1

[0067] This embodiment relates to a TCS concentration detection device in the present invention.

[0068] An exemplary embodiment of the present invention is as follows Figure 1 As shown, a TCS concentration detection device 100 includes a first gas delivery unit 110, a concentration detection unit 120, a verification unit 130 and a first purge unit 140. The first gas delivery unit 110 is connected to the gas mixing device, and is used to obtain and deliver the mixed gas delivered by the gas mixing device; the concentration detection unit 120 is respectively connected to the first gas delivery unit 110 and the exhaust gas treatment device, and is used to perform mass spectrometry analysis on the mixed gas to obtain first concentration information of the mixed gas; the verification unit 130 is respectively connected to the first gas delivery unit 110 and the exhaust gas treatment device 300, and is used to condense and weigh the mixed gas to obtain second concentration information of the mixed gas to verify the first concentration information; the first purge unit 140 is respectively connected to the verification unit 130 and the exhaust gas treatment device, and is used to purge the verification unit 130 and the exhaust gas treatment device.

[0069] like Figure 2As shown, the first gas delivery unit 110 includes a first gas delivery element 111, a second gas delivery element 112 and a third gas delivery element 113. The first gas delivery element 111 is connected to the gas mixing device 200, and is used to obtain and deliver the mixed gas delivered by the gas mixing device; the second gas delivery element 112 is respectively connected to the first gas delivery element 111 and the concentration detection unit 120, and is used to deliver the mixed gas to the concentration detection unit 120; the third gas delivery element 113 is respectively connected to the first gas delivery element 111 and the verification unit 130, and is used to deliver the mixed gas to the verification unit 130.

[0070] Specifically, the first end of the first gas delivery element 111 is connected to the gas mixing device, and the second end of the first gas delivery element 111 is connected in parallel to the second gas delivery element 112 and the third gas delivery element 113. In some embodiments, the first gas delivery element 111 includes but is not limited to a stainless steel tube.

[0071] Specifically, the first end of the second gas delivery element 112 is connected to the second end of the first gas delivery element 111, and the second end of the second gas delivery element 112 is connected to the concentration detection unit 120. In some embodiments, the second gas delivery element 112 includes but is not limited to a stainless steel tube.

[0072] Specifically, the first end of the third gas delivery element 113 is connected to the second end of the first gas delivery element 111, and the second gas delivery element 112 and the third gas delivery element 113 are arranged in parallel, and the second end of the third gas delivery element 113 is connected to the verification unit 130. It should be noted that the first end and the second end of the third gas delivery element 113 are respectively two ends in the length direction thereof.

[0073] In some of the embodiments, the third gas delivery element 113 includes, but is not limited to, a stainless steel tube.

[0074] Furthermore, the first gas delivery unit 110 also includes a first control valve element, a second control valve element, a first pressure control element, a first flow control element and a first pressure monitoring element. Among them, the first control valve element is arranged on the second gas delivery element 112, and is used to control the circulation of the second gas output element; the second control valve element is arranged on the third gas delivery element 113, and is used to control the circulation of the third gas delivery element 113; the first pressure control element is arranged on the first gas delivery element 111, and is used to adjust the gas pressure of the first gas delivery element 111; the first flow control element is arranged on the first gas delivery element 111, and is used to adjust the gas flow of the first gas delivery element 111; the first pressure monitoring element is connected to the first gas delivery element 111, and is used to monitor the pressure in the first gas delivery element 111 in real time.

[0075] In some of the embodiments, the first control valve element includes, but is not limited to, a diaphragm valve, for example, a first pneumatic diaphragm valve.

[0076] In some of the embodiments, the second control valve element includes, but is not limited to, a diaphragm valve, for example, a second pneumatic diaphragm valve.

[0077] In some of the embodiments, the first pressure control element includes but is not limited to a PC pressure controller.

[0078] It should be noted that the first flow control element is located downstream of the first pressure control element.

[0079] In some of the embodiments, the first flow control element includes but is not limited to a gas mass flow controller.

[0080] It should be noted that the first pressure monitoring element is located downstream of the first pressure control element and upstream of the first flow control element. In some embodiments, the first pressure monitoring element includes but is not limited to a pressure sensor.

[0081] like Figure 3 As shown, the concentration detection unit 120 includes a fourth gas delivery element 121, a fifth gas delivery element 122 and a mass spectrometer detection element 123. The fourth gas delivery element 121 is connected to the first gas delivery unit 110, and is used to obtain and deliver the mixed gas; the fifth gas delivery element 122 is respectively connected to the fourth gas delivery element 121 and the exhaust gas treatment device, and is used to deliver the exhaust gas to the exhaust gas treatment device; the mass spectrometer detection element 123 is respectively connected to the fourth gas delivery element 121 and the exhaust gas treatment device, and is used to perform mass spectrometry analysis on the mixed gas to obtain the first concentration information of the mixed gas.

[0082] Specifically, the first end of the fourth gas delivery element 121 is connected to the second end of the second gas delivery element 112, and the second end of the fourth gas delivery element 121 is connected to the mass spectrometer detection element 123. In some embodiments, the fourth gas delivery element 121 includes but is not limited to a stainless steel tube.

[0083] Specifically, the first end of the fifth gas delivery element 122 is in communication with the fourth gas delivery element 121, and the second end of the fifth gas delivery element 122 is in communication with the tail gas treatment device. In some embodiments, the fifth gas delivery element 122 includes but is not limited to a stainless steel tube.

[0084] In some of the embodiments, the mass spectrometry detection element 123 includes but is not limited to a mass spectrometer.

[0085] It should be noted that the gas flow rate that can be passed into the mass spectrometer detection element 123 is limited. In the case where the mixed gas flow rate delivered by the fourth gas delivery element 121 is too much, the fifth gas delivery element 122 can play the role of bypassing the flow.

[0086] Furthermore, the concentration detection unit 120 further includes a third control valve element and a first check valve element. The third control valve element is disposed in the fourth gas delivery element 121 to control the flow of the fourth gas delivery element 121; the first check valve element is disposed in the fifth gas delivery element 122 to prevent the gas in the fifth gas delivery element 122 from flowing back.

[0087] In some of the embodiments, the third control valve element includes, but is not limited to, a diaphragm valve, for example, a third pneumatic diaphragm valve.

[0088] In some of the embodiments, the first one-way valve element includes, but is not limited to, a one-way valve, for example, a first one-way valve.

[0089] like Figure 4 As shown, the verification unit 130 includes a sixth gas delivery element 131 , a condensation element 132 , a seventh gas delivery element 133 , a liquid delivery element 134 , a storage element 135 , a flow detection element 136 and a weight detection element 137 . Among them, the sixth gas delivery element 131 is connected to the first gas delivery unit 110 and the first purge unit 140 respectively, and is used to obtain and transport the mixed gas; the condensation element 132 is connected to the sixth gas delivery element 131, and is used to condense the mixed gas and obtain condensed gas and condensed liquid; the seventh gas delivery element 133 is connected to the condensation element 132, the first purge unit 140, and the exhaust gas treatment device 300 respectively, and is used to transport the condensed gas to the exhaust gas treatment device; the liquid delivery element 134 is connected to the condensation element 132, and is used to obtain and transport the condensed liquid; the storage element 135 is connected to the liquid delivery element 134, and is used to store the condensed liquid; the flow detection element 136 is arranged on the seventh gas delivery element 133, and is used to detect the flow of the condensed gas; the weight detection element 137 is arranged at the bottom of the storage element 135, and is used to detect the mass of the condensed liquid in the storage element 135.

[0090] Specifically, the first end of the sixth gas delivery element 131 is connected to the second end of the third gas delivery element 113, and the second end of the sixth gas delivery element 131 is connected to the gas inlet end of the condensation element 132. It should be noted that the first end and the second end of the sixth gas delivery element 131 are respectively two ends in the length direction thereof.

[0091] In some of the embodiments, the sixth gas delivery element 131 includes, but is not limited to, a stainless steel tube.

[0092] Specifically, the condensing element 132 includes a condensing tank, a refrigerator, a first coolant pipeline element, and a second coolant pipeline element. The condensing tank is connected to the third gas delivery element 113, the exhaust gas treatment device 300, and the storage element 135 through the sixth gas delivery element 131, the seventh gas delivery element 133, and the liquid delivery element 134, respectively, for condensing the mixed gas and obtaining condensed gas and condensed liquid; the first end of the first coolant pipeline element is connected to the condensing tank, and the second end of the first coolant pipeline element is connected to the refrigerator; the first end of the second coolant pipeline element is connected to the refrigerator, and the second end of the second coolant pipeline element is connected to the condensing tank; the refrigerator can deliver coolant to the condensing tank, and cool the coolant after heat exchange, so as to realize the recycling of the coolant.

[0093] More specifically, the condensing tank further includes an air inlet, an air outlet, a liquid drain, a first cooling port, and a second cooling port. The air inlet is provided at the top of the condensing tank for communicating with the second end of the sixth gas delivery element 131; the air outlet is provided at the top of the condensing tank for communicating with the seventh gas delivery element 133; the liquid drain is provided at the bottom of the condensing tank for communicating with the liquid delivery element 134; the first cooling port is provided at the side wall of the condensing tank for communicating with the first coolant pipeline element; the second cooling port is provided at the side wall of the condensing tank for communicating with the second coolant pipeline element.

[0094] It should be noted that the temperature in the condensation tank is -15°C to -5°C; preferably, the temperature in the condensation tank is -10°C.

[0095] In some of these embodiments, the condensation tank includes, but is not limited to, a stainless steel tank.

[0096] In some of the embodiments, the refrigerator includes but is not limited to a chiller refrigerator.

[0097] In some of the embodiments, the first coolant line component includes, but is not limited to, a stainless steel tube.

[0098] In some of the embodiments, the second coolant line component includes, but is not limited to, a stainless steel tube.

[0099] Specifically, the first end of the seventh gas delivery element 133 is in communication with the gas outlet of the condensation tank, and the second end of the seventh gas delivery element 133 is in communication with the tail gas treatment device 300. In some embodiments, the seventh gas delivery element 133 includes but is not limited to a stainless steel tube.

[0100] Specifically, the first end of the liquid delivery element 134 is communicated with the liquid discharge port of the condensation tank, and the second end of the liquid delivery element 134 is communicated with the storage element 135. In some embodiments, the liquid delivery element 134 includes but is not limited to a stainless steel tube.

[0101] Specifically, the storage element 135 is in communication with the liquid delivery element 134 and is used to collect the condensed liquid generated in the condensation element 132 .

[0102] In some of the embodiments, the storage element 135 includes but is not limited to a storage bottle.

[0103] In some of these embodiments, the flow sensing element 136 includes, but is not limited to, a flow meter.

[0104] In some of the embodiments, the weight detection element 137 includes but is not limited to an electronic scale.

[0105] Furthermore, the verification unit 130 also includes a fourth control valve element, a fifth control valve element, a second one-way valve element, a sixth control valve element, a seventh control valve element and a second pressure monitoring element. Among them, the fourth control valve element is arranged at the air inlet end of the condensation element 132, and is used to control the circulation between the sixth gas delivery element 131 and the condensation element 132; the fifth control valve element is arranged at the air outlet end of the condensation element 132, and is used to control the circulation between the seventh gas delivery element 133 and the condensation element 132; the second one-way valve element is arranged at the seventh gas delivery element 133, and is used to prevent the gas in the seventh gas delivery element 133 from backflowing; the sixth control valve element is arranged at the liquid discharge end of the condensation element 132, and is used to control the circulation between the condensation element 132 and the liquid delivery element 134; the seventh control valve element is arranged at the liquid delivery element 134, and is used to control the circulation of the liquid delivery element 134; the second pressure monitoring element is arranged at the seventh gas delivery element 133, and is used to monitor the pressure of the seventh gas delivery element 133 in real time.

[0106] In some of the embodiments, the fourth control valve element includes, but is not limited to, a diaphragm valve, for example, a fourth pneumatic diaphragm valve.

[0107] In some of the embodiments, the fifth control valve element includes, but is not limited to, a diaphragm valve, for example, a fifth pneumatic diaphragm valve.

[0108] It should be noted that the second one-way valve element is located downstream of the fifth control valve element.

[0109] In some of these embodiments, the second one-way valve element includes, but is not limited to, a one-way valve, for example, a second one-way valve.

[0110] In some of the embodiments, the sixth control valve element includes, but is not limited to, a diaphragm valve, for example, a first manual diaphragm valve.

[0111] In some of the embodiments, the seventh control valve element includes but is not limited to a diaphragm valve, for example, a second manual diaphragm valve.

[0112] It should be noted that the second pressure monitoring element is located downstream of the second one-way valve element.

[0113] In some of these embodiments, the second pressure monitoring element includes, but is not limited to, a pressure sensor.

[0114] like Figure 5 As shown, the first purge unit 140 includes an eighth gas delivery element 141 , a ninth gas delivery element 142 , a tenth gas delivery element 143 , an eleventh gas delivery element 144 , a twelfth gas delivery element 145 , a thirteenth gas delivery element 146 and a fourteenth gas delivery element 147 . Among them, the eighth gas delivery element 141 is connected to the purge gas source for obtaining and delivering the purge gas; the ninth gas delivery element 142 is respectively connected to the eighth gas delivery element 141 and the air intake structure of the verification unit 130 for delivering the purge gas to the verification unit; the tenth gas delivery element 143 is respectively connected to the air intake structure and the exhaust gas treatment device of the verification unit 130 for delivering the waste gas; the eleventh gas delivery element 144 is respectively connected to the eighth gas delivery element 141 and the exhaust structure of the verification unit 130 for delivering the purge gas; the twelfth gas delivery element 145 is respectively connected to the exhaust structure and the exhaust gas treatment device of the verification unit 130 for delivering the waste gas; the thirteenth gas delivery element 146 is respectively connected to the eighth gas delivery element 141 and the drainage structure of the verification unit 130 for delivering the purge gas; the fourteenth gas delivery element 147 is respectively connected to the drainage structure and the exhaust gas treatment device of the verification unit 130 for delivering the waste gas.

[0115] It should be noted that the purge gas is high-purity argon.

[0116] Specifically, the first end of the eighth gas delivery element 141 is connected to the purge gas source, and the second end of the eighth gas delivery element 141 is respectively connected to the ninth gas delivery element 142, the eleventh gas delivery element 144 and the thirteenth gas delivery element 146. In some embodiments, the eighth gas delivery element 141 includes but is not limited to a stainless steel tube.

[0117] Specifically, the first end of the ninth gas delivery element 142 is connected to the second end of the eighth gas delivery element 141, the second end of the ninth gas delivery element 142 is connected to the sixth gas delivery element 131, and the connection between the ninth gas delivery element 142 and the sixth gas delivery element 131 is located upstream of the fourth control valve element. In some embodiments, the ninth gas delivery element 142 includes but is not limited to a stainless steel tube.

[0118] Specifically, the first end of the tenth gas delivery element 143 is connected to the sixth gas delivery element 131, and the connection between the tenth gas delivery element 143 and the sixth gas delivery element 131 is located upstream of the fourth control valve element, and the second end of the tenth gas delivery element 143 is connected to the exhaust gas treatment device. In some embodiments, the tenth gas delivery element 143 includes but is not limited to a stainless steel pipe.

[0119] Specifically, the first end of the eleventh gas delivery element 144 is connected to the second end of the eighth gas delivery element 141, the second end of the eleventh gas delivery element 144 is connected to the seventh gas delivery element 133, and the connection point between the eleventh gas delivery element 144 and the seventh gas delivery element 133 is located downstream of the fifth control valve element. In some embodiments, the eleventh gas delivery element 144 includes but is not limited to a stainless steel tube.

[0120] Specifically, the first end of the twelfth gas delivery element 145 is connected to the seventh gas delivery element 133, and the connection between the twelfth gas delivery element 145 and the seventh gas delivery element 133 is located downstream of the fifth control valve element, and the second end of the twelfth gas delivery element 145 is connected to the exhaust gas treatment device. In some embodiments, the twelfth gas delivery element 145 includes but is alternatively a stainless steel pipe.

[0121] Specifically, the first end of the thirteenth gas delivery element 146 is in communication with the second end of the eighth gas delivery element 141, the second end of the thirteenth gas delivery element 146 is in communication with the liquid delivery element 134, and the connection point between the thirteenth gas delivery element 146 and the liquid delivery element 134 is located between the sixth control valve element and the seventh control valve element. In some embodiments, the thirteenth gas delivery element 146 includes but is not limited to a stainless steel tube.

[0122] Specifically, the first end of the fourteenth gas delivery element 147 is in communication with the liquid delivery element 134, and the connection point between the fourteenth gas delivery element 147 and the liquid delivery element 134 is located between the sixth control valve element and the seventh control valve element, and the second end of the fourteenth gas delivery element 147 is in communication with the exhaust gas treatment device. In some embodiments, the fourteenth gas delivery element 147 includes but is not limited to a stainless steel tube.

[0123] Further, the first purge unit 140 also includes an eighth control valve element, a third one-way valve element, a fourth one-way valve element, a ninth control valve element, a tenth control valve element, a fifth one-way valve element, a sixth one-way valve element, an eleventh control valve element, a twelfth control valve element, a seventh one-way valve element, an eighth one-way valve element, a thirteenth control valve element and a third pressure monitoring element. wherein, an eighth control valve element is disposed on the ninth gas delivery element 142 to control the circulation of the ninth gas delivery element 142; a third one-way valve element is disposed on the ninth gas delivery element 142 to prevent the gas in the ninth gas delivery element 142 from flowing back; a fourth one-way valve element is disposed on the tenth gas delivery element 143 to prevent the gas in the tenth gas delivery element 143 from flowing back; a ninth control valve element is disposed on the tenth gas delivery element 143 to control the circulation of the tenth gas delivery element 143; a tenth control valve element is disposed on the eleventh gas delivery element 144 to control the circulation of the eleventh gas delivery element 144; a fifth one-way valve element is disposed on the eleventh gas delivery element 144 to prevent the gas in the eleventh gas delivery element 144 from flowing back; a sixth one-way valve element is disposed on the twelfth gas delivery element 145, Used to prevent the backflow of the twelfth gas delivery element 145; the eleventh control valve element is arranged on the twelfth gas delivery element 145, and is used to control the circulation of the twelfth gas delivery element 145; the twelfth control valve element is arranged on the thirteenth gas delivery element 146, and is used to control the circulation of the thirteenth gas delivery element 146; the seventh one-way valve element is arranged on the thirteenth gas delivery element 146, and is used to prevent the gas in the thirteenth gas delivery element 146 from backflow; the eighth one-way valve element is arranged on the fourteenth gas delivery element 147, and is used to prevent the gas in the fourteenth gas delivery element 147 from backflow; the thirteenth control valve element is arranged on the fourteenth gas delivery element 147, and is used to control the circulation of the fourteenth gas delivery element; the third pressure monitoring element is connected with the eighth gas delivery element 141, and is used to monitor the pressure of the eighth gas delivery element 141 in real time.

[0124] In some of the embodiments, the eighth control valve element includes, but is not limited to, a diaphragm valve, for example, a sixth pneumatic diaphragm valve.

[0125] It should be noted that the third one-way valve element is located downstream of the eighth control valve element.

[0126] In some of the embodiments, the third one-way valve element includes but is not limited to a one-way valve, for example, a third one-way valve.

[0127] In some of the embodiments, the fourth one-way valve element includes but is not limited to a one-way valve, for example, a fourth one-way valve.

[0128] It should be noted that the ninth control valve element is located downstream of the fourth one-way valve element.

[0129] In some of the embodiments, the ninth control valve element includes but is not limited to a diaphragm valve, for example, a seventh pneumatic diaphragm valve.

[0130] In some of the embodiments, the tenth control valve element includes, but is not limited to, a diaphragm valve, for example, an eighth pneumatic diaphragm valve.

[0131] It should be noted that the fifth one-way valve element is located downstream of the tenth control valve element.

[0132] In some of the embodiments, the fifth one-way valve element includes but is not limited to a one-way valve, for example, a fifth one-way valve.

[0133] In some of the embodiments, the sixth one-way valve element includes but is not limited to a one-way valve, for example, a sixth one-way valve.

[0134] It should be noted that the eleventh control valve element is located downstream of the sixth one-way valve element.

[0135] In some of the embodiments, the eleventh control valve element includes but is not limited to a diaphragm valve, for example, a ninth pneumatic diaphragm valve.

[0136] In some of the embodiments, the twelfth control valve element includes, but is not limited to, a diaphragm valve, for example, a tenth pneumatic diaphragm valve.

[0137] It should be noted that the seventh one-way valve element is located downstream of the twelfth control valve element.

[0138] In some of the embodiments, the seventh one-way valve element includes but is not limited to a one-way valve, for example, a seventh one-way valve.

[0139] In some of the embodiments, the eighth one-way valve element includes but is not limited to a one-way valve, for example, an eighth one-way valve.

[0140] It should be noted that the thirteenth control valve element is located downstream of the eighth one-way valve element.

[0141] In some of the embodiments, the thirteenth control valve element includes but is not limited to a diaphragm valve, for example, an eleventh pneumatic diaphragm valve.

[0142] In some of these embodiments, the third pressure monitoring element includes but is not limited to a pressure sensor.

[0143] The method of using this embodiment is as follows:

[0144] (I) Gas analysis

[0145] Turning on the first pressure control element and the first flow control element to adjust the pressure and flow of the mixed gas transported in the first gas transport element 111, thereby ensuring the stability of the mixed gas in the first gas transport element 111;

[0146] The first control valve element and the third control valve element are opened, and the mixed gas is delivered to the mass spectrometer detection element 123 through the first gas delivery element 111, the second gas delivery element 112, and the fourth gas delivery element 121. The mass spectrometer detection element 123 can detect the mixed gas, thereby obtaining the concentration of TCS gas in the mixed gas and obtaining the first concentration information;

[0147] (ii) Condensation

[0148] Open the second control valve element and the fourth control valve element, so that the first gas delivery element 111, the sixth gas delivery element 131, and the condensation element 132 are connected to each other, so that the mixed gas flows into the condensation element 132, and the condensation element 132 condenses the mixed gas to obtain condensed liquid and condensed gas;

[0149] (III) Condensed liquid collection

[0150] Open the sixth control valve element and the seventh control valve element, so that the condensation element 132, the liquid delivery element 134, and the storage element 135 are interconnected, so that the condensed liquid flows into the interior of the storage element 135;

[0151] (IV) Condensation gas measurement

[0152] The fifth control valve element is opened to make the condensation element 132 communicate with the seventh gas delivery element 133, and the flow detection element 136 can detect the condensed gas flowing through the seventh gas delivery element 133, so as to obtain the total flow of the condensed gas;

[0153] (V) Purge

[0154] Open the twelfth control valve element and the thirteenth control valve element, so that the eighth gas delivery element 141, the thirteenth gas delivery element 146, the liquid delivery element 134, the fourteenth gas delivery element 147, and the exhaust gas treatment device 300 are connected, so that the liquid delivery element 134 can be purged;

[0155] (VI) Condensate liquid measurement

[0156] The staff separates the storage element 135 from the liquid delivery element 134 and places the storage element 135 on the weight detection element 137 to obtain the weight of the condensed liquid inside the storage element 135;

[0157] (VII) Verification

[0158] The second concentration information is calculated by the total flow of the condensed gas and the weight of the condensed liquid. By comparing the second concentration information with the first concentration information, it is determined whether the result detected by the mass spectrometer detection element 123 is consistent with the actual situation.

[0159] The advantages of this embodiment are that by connecting the first gas delivery unit with the concentration detection unit, the TCS concentration is detected by using a mass spectrometer with higher accuracy and lower delay, thereby improving the accuracy and effect of TCS concentration detection; by connecting the first gas delivery unit with the verification unit, the weight of the condensed liquid and the total flow rate of the condensed gas are obtained by condensing and weighing the mixed gas, and the TCS concentration is calculated by the weight of the condensed liquid and the total flow rate of the condensed gas, so as to verify the results detected by the mass spectrometry detection element, thereby improving the reliability of the detection results.

[0160] Example 2

[0161] This embodiment relates to the TCS concentration detection system in the invention.

[0162] like Figure 6 As shown, a TCS concentration detection system comprises the TCS concentration detection device 100, the gas mixing device 200 and the tail gas treatment device 300 as described in Example 1. The gas mixing device 200 is respectively connected to the TCS concentration detection device 100 and the waste liquid treatment device, and is used to deliver the mixed gas to the TCS concentration detection device 100; the tail gas treatment device 300 is respectively connected to the TCS concentration detection device 100 and the gas mixing device 200, and is used to treat the tail gas.

[0163] like Figure 7As shown, the gas mixing device 200 includes a liquid supply unit 210 , a carrier gas supply unit 220 , a mixing unit 230 , a second gas delivery unit 240 , a second purge unit 250 and a first vacuum unit 260 . Among them, the liquid supply unit 210 is respectively connected to the liquid source for conveying liquid TCS; the carrier gas supply unit 220 is respectively connected to the carrier gas source for conveying carrier gas; the mixing unit 230 is respectively connected to the liquid supply unit 210, the carrier gas supply unit 220 and the TCS concentration detection device 100, for storing liquid TCS and carrier gas and bubbling liquid TCS to produce a mixed gas; the second gas delivery unit 240 is respectively connected to the mixing unit 230 and the TCS concentration detection device 100, for obtaining and delivering the mixed gas to the TCS concentration detection device; the second purge unit 250 is respectively connected to the purge gas source, the liquid supply unit 210, the carrier gas supply unit 220, and the second gas delivery unit 240, for purging the liquid supply unit 210, the carrier gas supply unit 220, and the second gas delivery unit 240; the first vacuum unit 260 is respectively connected to the power gas source, the mixing unit 230, the second purge unit 250, and the exhaust gas treatment device 300, for vacuum treatment of the entire device.

[0164] like Figure 8 As shown, the liquid supply unit 210 includes a liquid supply element 211. The liquid supply element 211 is connected to the liquid source, the mixing unit 230, and the second purge unit 250 respectively, and is used to transport liquid TCS to the mixing unit 230.

[0165] Specifically, a first end of the liquid supply element 211 is in communication with the liquid source, and a second end of the liquid supply element 211 is in communication with the mixing unit 230 .

[0166] In some of the embodiments, the liquid supply element 211 includes but is not limited to a stainless steel tube.

[0167] Furthermore, the liquid supply unit 210 further includes a fourteenth control valve element, wherein the fourteenth control valve element is disposed on the liquid supply element 211 and is used to control the flow of the liquid supply element 211 .

[0168] In some of the embodiments, the fourteenth control valve component includes, but is not limited to, a diaphragm valve.

[0169] Specifically, the fourteenth control valve element includes a third manual diaphragm valve and a twelfth pneumatic diaphragm valve, wherein the third manual diaphragm valve is disposed in the liquid supply element 211 ; the twelfth pneumatic diaphragm valve is disposed in the liquid supply element 211 and is located downstream of the third manual diaphragm valve.

[0170] like Figure 8As shown, the carrier gas supply unit 220 includes a carrier gas supply element 221 . The carrier gas supply element 221 is respectively connected to the carrier gas source, the mixing unit 230 , and the second purge unit 250 , and is used to deliver the carrier gas to the mixing unit 230 .

[0171] It should be noted that the carrier gas is H2.

[0172] Specifically, a first end of the carrier gas supply element 221 is communicated with the carrier gas source, and a second end of the carrier gas supply element 221 is communicated with the mixing unit 230 .

[0173] In some embodiments, the carrier gas supply element 221 includes but is not limited to a stainless steel tube.

[0174] Furthermore, the carrier gas supply unit 220 also includes a fifteenth control valve element, a ninth one-way valve element, a second pressure control element, a second flow control element and a fourth pressure monitoring element. Among them, the fifteenth control valve element is arranged on the carrier gas supply element 221, and is used to control the circulation of the carrier gas supply element 221; the ninth one-way valve element is arranged on the carrier gas supply element 221, and is used to prevent the gas of the carrier gas supply element 221 from backflowing; the second pressure control element is arranged on the carrier gas supply element 221, and is used to adjust the pressure of the carrier gas supply element 221; the second flow control element is arranged on the carrier gas supply element 221, and is used to adjust the flow of the carrier gas supply element 221; the fourth pressure monitoring element is connected with the carrier gas supply element 221, and is used to monitor the pressure of the carrier gas supply element 221 in real time.

[0175] In some embodiments, the fifteenth control valve element includes but is not limited to a diaphragm valve, for example, a fourth manual diaphragm valve and a thirteenth pneumatic diaphragm valve, wherein the thirteenth pneumatic diaphragm valve is located downstream of the fourth manual diaphragm valve.

[0176] It should be noted that the ninth one-way valve element is located downstream of the second manual diaphragm valve and upstream of the fifteenth pneumatic diaphragm valve.

[0177] In some of the embodiments, the ninth one-way valve element includes but is not limited to a one-way valve, for example, a ninth one-way valve.

[0178] It should be noted that the second pressure control element is located downstream of the second manual diaphragm valve and upstream of the ninth one-way valve element.

[0179] In some of these embodiments, the second pressure control element includes, but is not limited to, a PC pressure regulator.

[0180] It should be noted that the second flow control element is located downstream of the second pressure control element and upstream of the ninth one-way valve element.

[0181] In some of the embodiments, the second flow control element includes but is not limited to a gas mass flow controller.

[0182] In some of these embodiments, the fourth pressure monitoring element includes but is not limited to a pressure sensor.

[0183] It should be noted that the fourth pressure monitoring element is located downstream of the second pressure control element and upstream of the second flow control element.

[0184] like Figure 8 As shown, the mixing unit 230 includes a mixing element 231. The mixing element 231 is respectively connected to the liquid supply unit 210, the carrier gas supply unit 220, the second gas delivery unit 240, the first vacuum unit 260, the TCS concentration detection device 100, and the waste liquid treatment device, and is used to perform a bubbling reaction on the liquid TCS and generate a mixed gas.

[0185] Specifically, the mixing element 231 is connected to the liquid supply element 211, the carrier gas supply element 221, the second gas delivery unit 240, and the first vacuum unit 260, respectively, for bubbling the liquid TCS delivered to the inside of the mixing element 231 and generating a mixed gas of gaseous TCS and H2.

[0186] More specifically, the mixing element 231 also includes a liquid replenishment inlet, a carrier gas inlet, a mixed gas outlet, a waste liquid outlet, a cooling inlet and a cooling outlet. Among them, the liquid replenishment inlet is opened at the top of the mixing element 231 and is connected to the second end of the liquid supply element 211; the carrier gas inlet is opened at the top of the mixing element 231 and is connected to the second end of the carrier gas supply element 221; the mixed gas outlet is opened at the top of the mixing element 231 and is connected to the second gas delivery unit 240; the waste liquid outlet is opened at the bottom wall of the side wall of the mixing element 231 and is connected to the waste liquid treatment device; the cooling inlet is opened at the side wall of the mixing element 231 and is connected to the chiller refrigerator through a pipeline; the cooling outlet is opened at the side wall of the mixing element 231 and is connected to the chiller refrigerator through a pipeline.

[0187] It should be noted that the cooling inlet and the cooling outlet can circulate the coolant between the mixing element 231 and the chiller refrigerator, thereby maintaining the stability of the interior of the mixing element 231.

[0188] It should be noted that the volume of the mixing element 231 is 20L to 30L; preferably, the volume of the mixing element 231 is 25L.

[0189] It should be noted that, in actual operation, the liquid TCS inside the mixing element 231 is between 16L and 23L; preferably, the liquid TCS inside the mixing element 231 is between 19L and 20L.

[0190] In some of these embodiments, the mixing element 231 includes, but is not limited to, a bubbling barrel.

[0191] Furthermore, the mixing unit 230 also includes a sixteenth control valve element, a liquid level monitoring element and a temperature monitoring element. The sixteenth control valve element is arranged in the mixing element 231, and is used to control the flow of the mixing element 231 with the liquid supply unit 210, the carrier gas supply unit 220, the second gas delivery unit 240, and the waste liquid treatment device; the liquid level monitoring element is arranged inside the mixing element 231, and is used to monitor the liquid level inside the mixing element 231 in real time; the temperature monitoring element is arranged inside the mixing element 231, and is used to monitor the liquid temperature inside the mixing element 231 in real time.

[0192] In some embodiments, the sixteenth control valve element includes but is not limited to a diaphragm valve, for example, a fifth manual diaphragm valve, a sixth manual diaphragm valve, a seventh manual diaphragm valve and an eighth manual diaphragm valve. The fifth manual diaphragm valve is disposed at the liquid replenishment inlet of the mixing element 231 to control the flow between the mixing element 231 and the liquid supply element 211; the sixth manual diaphragm valve is disposed at the carrier gas inlet of the mixing element 231 to control the flow between the mixing element 231 and the carrier gas supply element 221; the seventh manual diaphragm valve is disposed at the mixed gas outlet of the mixing element 231 to control the flow between the mixing element 231 and the second gas delivery unit 240; the eighth manual diaphragm valve is disposed at the waste liquid outlet of the mixed gas to control the flow between the mixing element 231 and the waste liquid treatment device.

[0193] In some of the embodiments, the liquid level monitoring element includes but is not limited to a liquid level sensor.

[0194] In some of the embodiments, the temperature monitoring element includes but is not limited to a temperature sensor.

[0195] like Figure 8 As shown, the second gas delivery unit 240 includes a fifteenth gas delivery element 241. The fifteenth gas delivery element 241 is connected to the mixing unit 230, the second purge unit 250, and the TCS concentration detection device 100, respectively, for obtaining and delivering the mixed gas to the TCS concentration detection device 100.

[0196] Specifically, a first end of the fifteenth gas delivery element 241 is communicated with the gas mixture outlet of the mixing element 231 , and a second end of the fifteenth gas delivery element 241 is communicated with a first end of the first gas delivery element 111 .

[0197] In some of the embodiments, the fifteenth gas delivery element 241 includes, but is not limited to, a stainless steel tube.

[0198] Furthermore, the second gas delivery unit 240 further includes a seventeenth control valve element and a fifth pressure monitoring element. The seventeenth control valve element is disposed on the fifteenth gas delivery element 241 to control the flow of the fifteenth gas delivery element 241; the fifth pressure monitoring element is connected to the fifteenth gas delivery element 241 to monitor the pressure of the fifteenth gas delivery element 241 in real time.

[0199] In some embodiments, the seventeenth control valve element includes but is not limited to a diaphragm valve, for example, a ninth manual diaphragm valve and a fourteenth pneumatic diaphragm valve, wherein the fourteenth pneumatic diaphragm valve is located upstream of the ninth manual diaphragm valve.

[0200] It should be noted that the fifth pressure monitoring element is located downstream of the fourteenth pneumatic diaphragm valve and upstream of the ninth manual diaphragm valve.

[0201] In some of these embodiments, the fifth pressure monitoring element includes but is not limited to a pressure sensor.

[0202] like Fig. 9 As shown, the second purge unit 250 includes a sixteenth gas delivery element 251, a seventeenth gas delivery element 252, an eighteenth gas delivery element 253, a nineteenth gas delivery element 254 and a twentieth gas delivery element 255. The sixteenth gas delivery element 251 is connected to the purge gas source for delivering the purge gas; the seventeenth gas delivery element 252 is respectively connected to the sixteenth gas delivery element 251 and the liquid supply unit 210 for delivering the purge gas to the liquid supply unit 210; the eighteenth gas delivery element 253 is respectively connected to the sixteenth gas delivery element 251 and the carrier gas supply unit 220 for delivering the purge gas to the carrier gas supply unit 220; the nineteenth gas delivery element 254 is respectively connected to the sixteenth gas delivery element 251 and the second gas delivery unit 240 for delivering the purge gas to the second gas delivery unit 240; the twentieth gas delivery element 255 is respectively connected to the sixteenth gas delivery element 251 and the first vacuum unit 260 for delivering the purge gas to the first vacuum unit 260.

[0203] It should be noted that the purge gas is high-purity argon.

[0204] Specifically, a first end of the sixteenth gas delivery element 251 is connected to the purge gas source, and a second end of the sixteenth gas delivery element 251 is connected to the seventeenth gas delivery element 252 , the eighteenth gas delivery element 253 , the nineteenth gas delivery element 254 , and the twentieth gas delivery element 255 , respectively.

[0205] In some of the embodiments, the sixteenth gas delivery element 251 includes, but is not limited to, a stainless steel tube.

[0206] Specifically, the first end of the seventeenth gas delivery element 252 is connected to the second end of the sixteenth gas delivery element 251, the second end of the seventeenth gas delivery element 252 is connected to the liquid supply element 211, and the connection point between the seventeenth gas delivery element 252 and the liquid supply element 211 is located downstream of the twelfth pneumatic diaphragm valve.

[0207] In some of these embodiments, the seventeenth gas delivery element 252 includes, but is not limited to, a stainless steel tube.

[0208] Specifically, the first end of the eighteenth gas delivery element 253 is connected to the second end of the sixteenth gas delivery element 251, the second end of the eighteenth gas delivery element 253 is connected to the carrier gas supply element 221, and the connection point between the eighteenth gas delivery element 253 and the carrier gas supply element 221 is located downstream of the thirteenth pneumatic diaphragm valve.

[0209] In some of these embodiments, the eighteenth gas delivery element 253 includes, but is not limited to, a stainless steel tube.

[0210] Specifically, the first end of the nineteenth gas delivery element 254 is communicated with the second end of the sixteenth gas delivery element 251, the second end of the nineteenth gas delivery element 254 is communicated with the fifteenth gas delivery element 241, and the connection point between the nineteenth gas delivery element 254 and the fifteenth gas delivery element 241 is located upstream of the fourteenth pneumatic diaphragm valve.

[0211] In some of these embodiments, the nineteenth gas delivery element 254 includes, but is not limited to, a stainless steel tube.

[0212] Specifically, the first end of the twentieth gas delivery element 255 is communicated with the second end of the sixteenth gas delivery element 251 , and the second end of the twentieth gas delivery element 255 is communicated with the first vacuum unit 260 .

[0213] In some of these embodiments, the twentieth gas delivery element 255 includes, but is not limited to, a stainless steel tube.

[0214] Further, the second purge unit 250 also includes an eighteenth control valve element, a tenth check valve element, a nineteenth control valve element, a twentieth control valve element, a twenty-first control valve element, a twenty-second control valve element and a sixth pressure monitoring element. Among them, the eighteenth control valve element is arranged on the sixteenth gas delivery element 251, and is used to control the circulation of the sixteenth gas delivery element 251; the tenth one-way valve element is arranged on the sixteenth gas delivery element 251, and is used to prevent the gas inside the sixteenth gas delivery element 251 from backflow; the nineteenth control valve element is arranged on the seventeenth gas delivery element 252, and is used to control the circulation of the seventeenth gas delivery element 252; the twentieth control valve element is arranged on the eighteenth gas delivery element 253, and is used to control the circulation of the eighteenth gas delivery element 253; the twenty-first control valve element is arranged on the nineteenth gas delivery element 254, and is used to control the circulation of the nineteenth gas delivery element 254; the twenty-second control valve element is arranged on the twentieth gas delivery element 255, and is used to control the circulation of the twentieth gas delivery element 255; the sixth pressure monitoring element is connected with the sixteenth gas delivery element 251, and is used to monitor the pressure of the sixteenth gas delivery element 251 in real time.

[0215] In some embodiments, the eighteenth control valve element includes but is not limited to a diaphragm valve, for example, a tenth manual diaphragm valve and a fifteenth pneumatic diaphragm valve, wherein the fifteenth pneumatic diaphragm valve is located downstream of the tenth manual diaphragm valve.

[0216] It should be noted that the tenth one-way valve element is located downstream of the eighth manual diaphragm valve and upstream of the seventeenth pneumatic diaphragm valve.

[0217] In some of these embodiments, the tenth one-way valve element includes, but is not limited to, a one-way valve, for example, a tenth one-way valve.

[0218] In some of these embodiments, the tenth one-way valve element includes, but is not limited to, a one-way valve, for example, a tenth one-way valve.

[0219] In some of the embodiments, the nineteenth control valve element includes but is not limited to a diaphragm valve, for example, a sixteenth pneumatic diaphragm valve.

[0220] In some of the embodiments, the twentieth control valve element includes but is not limited to a diaphragm valve, for example, a seventeenth pneumatic diaphragm valve.

[0221] In some of the embodiments, the twenty-first control valve element includes but is not limited to a diaphragm valve, for example, an eighteenth pneumatic diaphragm valve.

[0222] In some of the embodiments, the twenty-second control valve element includes but is not limited to a diaphragm valve, for example, the nineteenth pneumatic diaphragm valve.

[0223] It should be noted that the connection point between the sixth pressure monitoring element and the sixteenth gas delivery element 251 is located downstream of the seventeenth pneumatic diaphragm valve.

[0224] In some of these embodiments, the sixth pressure monitoring element includes but is not limited to a pressure sensor.

[0225] like Fig.10 As shown, the first vacuum unit 260 includes a first vacuum pump element 261, a twenty-first gas delivery element 262, a twenty-second gas delivery element 263 and a twenty-third gas delivery element 264. The first vacuum pump element 261 is connected to the second purge unit 250 to form a vacuum negative pressure at the end of the second purge unit 250; the twenty-first gas delivery element 262 is respectively connected to the power gas source and the first vacuum pump element 261 to deliver the power gas; the twenty-second gas delivery element 263 is respectively connected to the first vacuum pump element 261 and the exhaust gas treatment device 300 to deliver the exhaust gas; the twenty-third gas delivery element 264 is respectively connected to the mixing unit 230 and the exhaust gas treatment device 300 to deliver the exhaust gas.

[0226] Specifically, the first vacuum pump element 261 is in communication with the second end of the twentieth gas delivery element 255 , so as to form a vacuum negative pressure at the second end of the twentieth gas delivery element 255 .

[0227] In some of these embodiments, the first vacuum pump element 261 includes, but is not limited to, a Venturi vacuum pump.

[0228] Specifically, a first end of the twenty-first gas delivery element 262 is in communication with the power gas source, and a second end of the twenty-first gas delivery element 262 is in communication with the first vacuum pump element 261 .

[0229] In some of these embodiments, the twenty-first gas delivery element 262 includes, but is not limited to, a stainless steel tube.

[0230] Specifically, a first end of the twenty-second gas delivery element 263 is in communication with the first vacuum pump element 261 , and a second end of the twenty-second gas delivery element 263 is in communication with the exhaust gas treatment device 300 .

[0231] In some of the embodiments, the twenty-second gas delivery element 263 includes, but is not limited to, a stainless steel tube.

[0232] Specifically, a first end of the twenty-third gas delivery element 264 is in communication with the twenty-second gas delivery element 263 , and a second end of the twenty-third gas delivery element 264 is in communication with the mixing element 231 .

[0233] In some of these embodiments, the twenty-third gas delivery element 264 includes, but is not limited to, a stainless steel tube.

[0234] Furthermore, the first vacuum unit 260 further includes a pressure relief valve element and a seventh pressure monitoring element. The pressure relief valve element is disposed on the twenty-third gas delivery element 264 for relieving pressure on the mixing unit 230; the seventh pressure monitoring element is connected to the twentieth gas delivery element 255 for real-time monitoring of the pressure of the twentieth gas delivery element 255.

[0235] It should be noted that, when the pressure inside the twenty-third gas delivery element 264 exceeds 100 psi, the pressure relief valve element can relieve the pressure inside the mixing element 231 .

[0236] In some of these embodiments, the pressure relief valve element includes, but is not limited to, a safety valve.

[0237] It should be noted that the connection point between the seventh pressure monitoring element and the twentieth gas delivery element 255 is located downstream of the twenty-second control valve element.

[0238] In some of the embodiments, the seventh pressure monitoring element includes but is not limited to a pressure sensor.

[0239] like Fig.11 As shown, the tail gas treatment device 300 includes a second vacuum unit 310 and a tail gas treatment unit 320. The second vacuum unit 310 is connected to the TCS concentration detection device 100, and is used to perform vacuum treatment on the TCS concentration detection device 100; the tail gas treatment unit 320 is connected to the TCS concentration detection device 100 and the gas mixing device 200, and is used to treat the exhaust gas discharged from the TCS concentration detection device 100 and the gas mixing unit 230.

[0240] like Fig.12 As shown, the second vacuum unit 310 includes a second vacuum pump element 311, a twenty-fourth gas delivery element 312, a twenty-fifth gas delivery element 313, and a twenty-sixth gas delivery element 314. The second vacuum pump element 311 is connected to the TCS concentration detection device 100, and is used to form a vacuum negative pressure at the end of the TCS concentration detection device 100; the twenty-fourth gas delivery element 312 is respectively connected to the concentration detection unit 120 of the TCS concentration detection device 100 and the second vacuum pump element 311, and is used to transport waste gas; the twenty-fifth gas delivery element 313 is respectively connected to the verification unit 130 of the TCS concentration detection device 100 and the twenty-fourth gas delivery element 312, and is used to transport waste gas; the twenty-sixth gas delivery element 314 is respectively connected to the second vacuum pump element 311 and the tail gas treatment unit 320, and is used to transport waste gas.

[0241] Specifically, the second vacuum pump element 311 is connected to the TCS concentration detection device 100 and the tail gas treatment unit 320 through the twenty-fourth gas delivery element 312 and the twenty-sixth gas delivery element 314 , respectively, for forming a vacuum negative pressure at the end of the twenty-fourth gas delivery element 312 .

[0242] In some of these embodiments, the second vacuum pump component 311 includes, but is not limited to, a vacuum pump.

[0243] Specifically, a first end of the twenty-fourth gas delivery element 312 is in communication with the mass spectrometer detection element 123 , and a second end of the twenty-fourth gas delivery element 312 is in communication with the second vacuum pump element 311 .

[0244] In some of these embodiments, the twenty-fourth gas delivery element 312 includes, but is not limited to, a stainless steel tube.

[0245] Specifically, the first end of the twenty-fifth gas delivery element 313 is connected to the tenth gas delivery element 143, the twelfth gas delivery element 145, and the fourteenth gas delivery element 147 respectively, the second end of the twenty-fifth gas delivery element 313 is connected to the twenty-fourth gas delivery element 312, and the connection point between the twenty-fifth gas delivery element 313 and the twenty-fourth gas delivery element 312 is located upstream of the second vacuum pump element 311.

[0246] In some of these embodiments, the twenty-fifth gas delivery element 313 includes, but is not limited to, a stainless steel tube.

[0247] Specifically, a first end of the twenty-sixth gas delivery element 314 is in communication with the second vacuum pump element 311 , and a second end of the twenty-sixth gas delivery element 314 is in communication with the tail gas treatment unit 320 .

[0248] In some of these embodiments, the twenty-sixth gas delivery element 314 includes, but is not limited to, a stainless steel tube.

[0249] like Fig.12 As shown, the exhaust gas treatment unit 320 includes an exhaust gas treatment element 321. The exhaust gas treatment element 321 is connected to the TCS concentration detection device 100 and the mixing unit 230 respectively, and is used to treat the exhaust gas discharged from the TCS concentration detection device 100 and the mixing unit 230.

[0250] Specifically, the exhaust gas treatment element 321 is communicated with the seventh gas delivery element 133 and the twenty-sixth gas delivery element 314 respectively, and is used to collect and treat the exhaust gas.

[0251] In some of the embodiments, the exhaust gas treatment element 321 includes but is not limited to a scrubber.

[0252] The method of using this embodiment is as follows:

[0253] (1) Liquid supply

[0254] Open the fourteenth control valve element and the sixteenth control valve element, so that the liquid source is connected to the mixing element 231 through the liquid supply element 211, and liquid TCS can be delivered to the mixing element 231;

[0255] (II) Carrier gas supply

[0256] Open the fifteenth control valve element and the sixteenth control valve element, so that the carrier gas source is connected to the mixing element 231 through the carrier gas supply element 221, and the carrier gas can be delivered to the mixing element 231;

[0257] Open the second pressure control element and the second flow control element to adjust the pressure and flow of the carrier gas transported in the carrier gas supply element 221;

[0258] (III) Mixed gas transportation

[0259] Open the seventeenth control valve element and the sixteenth control valve element, so that the mixing element 231 is connected to the first gas delivery element 111 through the fifteenth gas delivery element 241;

[0260] (IV) Gas analysis

[0261] Turning on the first pressure control element and the first flow control element to adjust the pressure and flow of the mixed gas transported in the first gas transport element 111, thereby ensuring the stability of the mixed gas in the first gas transport element 111;

[0262] The first control valve element and the third control valve element are opened, and the mixed gas is delivered to the mass spectrometer detection element 123 through the first gas delivery element 111, the second gas delivery element 112, and the fourth gas delivery element 121. The mass spectrometer detection element 123 can detect the mixed gas, thereby obtaining the concentration of TCS gas in the mixed gas and obtaining the first concentration information;

[0263] (V) Condensation

[0264] Open the second control valve element and the fourth control valve element, so that the first gas delivery element 111, the sixth gas delivery element 131, and the condensation element 132 are connected to each other, so that the mixed gas flows into the condensation element 132, and the condensation element 132 condenses the mixed gas to obtain condensed liquid and condensed gas;

[0265] (VI) Condensate Collection

[0266] Open the sixth control valve element and the seventh control valve element, so that the condensation element 132, the liquid delivery element 134, and the storage element 135 are interconnected, so that the condensed liquid flows into the interior of the storage element 135;

[0267] (VII) Condensation gas measurement

[0268] The fifth control valve element is opened to make the condensation element 132 communicate with the seventh gas delivery element 133, and the flow detection element 136 can detect the condensed gas flowing through the seventh gas delivery element 133, so as to obtain the total flow of the condensed gas;

[0269] (VIII) First Purge

[0270] Open the twelfth control valve element and the thirteenth control valve element, so that the eighth gas delivery element 141, the thirteenth gas delivery element 146, the liquid delivery element 134, the fourteenth gas delivery element 147, and the exhaust gas treatment device 300 are connected, so that the liquid delivery element 134 can be purged;

[0271] (IX) Condensate liquid measurement

[0272] The staff separates the storage element 135 from the liquid delivery element 134 and places the storage element 135 on the weight detection element 137 to obtain the weight of the condensed liquid inside the storage element 135;

[0273] (X) Verification

[0274] The second concentration information is calculated by the total flow of the condensed gas and the weight of the condensed liquid. By comparing the second concentration information with the first concentration information, it is determined whether the result detected by the mass spectrometer detection element 123 is consistent with the actual situation.

[0275] (11) Second Purge

[0276] In the case where subsequent TCS concentration verification is required, the entire equipment needs to be purged, that is, the eighteenth control valve element, the nineteenth control valve element, the twentieth control valve element, the twenty-first control valve element, and the twenty-second control valve element are opened, and the purge gas flows through the sixteenth gas delivery element 251, the seventeenth gas delivery element 252, the eighteenth gas delivery element 253, the nineteenth gas delivery element 254, and the twentieth gas delivery element 255 to the liquid supply element 211, the carrier gas supply element 221, and the fifteenth gas delivery element 241, thereby purging the entire pipeline to improve the cleanliness of the entire pipeline.

[0277] The advantage of this embodiment is that, by connecting the gas mixing device with the TCS concentration detection device, the gas mixing device can realize the bubbling reaction of liquid TCS to generate a mixed gas, and the TCS concentration detection device can detect the TCS concentration in the mixed gas; furthermore, by connecting the exhaust gas treatment device with the gas mixing device and the TCS concentration detection device, the exhaust gas generated by the gas mixing device and the TCS concentration detection device can be treated.

[0278] Example 3

[0279] This embodiment relates to the TCS concentration detection method of the present invention.

[0280] A TCS concentration detection method, applied to the TCS concentration detection device 100 as described in Example 1 or the TCS concentration detection system as described in Example 2, comprises:

[0281] The first gas delivery unit 110 is used to obtain and deliver the mixed gas delivered by the gas mixing device 200;

[0282] The concentration detection unit 120 is used to perform mass spectrometry analysis on the mixed gas to obtain first concentration information of the mixed gas;

[0283] The verification unit 130 is used to condense and weigh the mixed gas to obtain second concentration information of the mixed gas;

[0284] By comparing the second concentration information with the first concentration information, it is determined whether the first concentration information obtained by the concentration detection unit 120 is consistent with the actual situation.

[0285] Specifically, the TCS concentration detection method refers to Example 1.

[0286] More specifically, the TCS concentration detection method of this embodiment is as follows:

[0287] (1) turning on the first pressure control element and the first flow control element to adjust the pressure and flow of the mixed gas transported in the first gas transport element 111, thereby ensuring the stability of the mixed gas in the first gas transport element 111;

[0288] (2) opening the first pneumatic diaphragm valve and the third pneumatic diaphragm valve, and delivering the mixed gas to the mass spectrometer detection element 123 through the first gas delivery element 111, the second gas delivery element 112, and the fourth gas delivery element 121;

[0289] (3) The mass spectrometer detection element 123 can detect the mixed gas, thereby obtaining the concentration of TCS gas in the mixed gas and obtaining first concentration information;

[0290] (4) opening the second pneumatic diaphragm valve and the fourth pneumatic diaphragm valve, so that the first gas delivery element 111, the sixth gas delivery element 131, and the condensation element 132 are interconnected, so that the mixed gas flows into the condensation element 132, and the condensation element 132 condenses the mixed gas to obtain condensed liquid and condensed gas;

[0291] (5) opening the sixth pneumatic diaphragm valve and the seventh pneumatic diaphragm valve so that the condensation element 132, the liquid delivery element 134, and the storage element 135 are interconnected, thereby allowing the condensed liquid to flow into the interior of the storage element 135;

[0292] (6) Opening the fifth pneumatic diaphragm valve so that the condensing element 132 is connected to the seventh gas delivery element 133, and the flow detection element 136 can detect the condensed gas flowing through the seventh gas delivery element 133, thereby obtaining the total flow of the condensed gas;

[0293] (7) Opening the twelfth pneumatic diaphragm valve and the thirteenth pneumatic diaphragm valve, so that the eighth gas delivery element 141, the thirteenth gas delivery element 146, the liquid delivery element 134, the fourteenth gas delivery element 147, and the exhaust gas treatment device 300 are connected, so that the liquid delivery element 134 can be purged;

[0294] (8) The staff separates the storage element 135 from the liquid delivery element 134 and places the storage element 135 on the weight detection element 137 to obtain the weight of the condensed liquid inside the storage element 135;

[0295] (9) The second concentration information is calculated by the total flow rate of the condensed gas and the weight of the condensed liquid. The second concentration information is compared with the first concentration information to determine whether the result detected by the mass spectrometer detection element 123 is consistent with the actual result.

[0296] Example 4

[0297] This embodiment relates to the TCS concentration detection method of the present invention.

[0298] A TCS concentration detection method, applied to the TCS concentration detection system as described in Example 2, comprising:

[0299] The gas mixing device 200 is used to obtain liquid TCS and carrier gas and mix them to form a mixed gas and transport the mixed gas to the TCS concentration detection device 100;

[0300] The first gas delivery unit 110 is used to obtain and deliver the mixed gas delivered by the gas mixing device 200;

[0301] The concentration detection unit 120 is used to perform mass spectrometry analysis on the mixed gas to obtain first concentration information of the mixed gas;

[0302] The verification unit 130 is used to condense and weigh the mixed gas to obtain second concentration information of the mixed gas;

[0303] By comparing the second concentration information with the first concentration information, it is determined whether the first concentration information obtained by the concentration detection unit 120 is consistent with the actual situation.

[0304] Specifically, the gas mixing device 200 is used to obtain liquid TCS and carrier gas, mix them to form a mixed gas, and transport the mixed gas to the TCS concentration detection device 100, including:

[0305] The liquid supply unit 210 is used to deliver liquid to the TCS concentration detection device 100;

[0306] The carrier gas supply unit 220 is used to deliver carrier gas to the TCS concentration detection device 100;

[0307] The mixing unit 230 is used to perform a bubbling reaction on the liquid TCS and generate a mixed gas;

[0308] The second gas delivery unit 240 is used to deliver the mixed gas.

[0309] Specifically, the TCS concentration detection method refers to Example 2.

[0310] More specifically, based on Example 3, the TCS concentration detection method of this embodiment further includes:

[0311] (1) manually opening the third manual diaphragm valve and the fifth manual diaphragm valve, and opening the fourteenth pneumatic diaphragm valve, so that the liquid source is connected to the mixing element 231 through the liquid supply element 211, and liquid TCS can be delivered to the mixing element 231;

[0312] (2) manually opening the fourth manual diaphragm valve and the sixth manual diaphragm valve, and opening the fifteenth pneumatic diaphragm valve, so that the carrier gas source is connected to the mixing element 231 through the carrier gas supply element 221, and the carrier gas can be delivered to the mixing element 231;

[0313] (3) opening the second pressure control element and the second flow control element to adjust the pressure and flow of the carrier gas transported in the carrier gas supply element 221;

[0314] (4) Manually open the seventh manual diaphragm valve and the ninth manual diaphragm valve, and open the sixteenth pneumatic diaphragm valve, so that the mixing element 231 is connected to the first gas delivery element 111 through the fifteenth gas delivery element 241 .

[0315] Among them, (1) to (4) of this embodiment are performed before (1) to (9) of embodiment 3. That is, (1) to (9) of embodiment 3 are numbered as (5) to (13) in this embodiment.

[0316] Example 5

[0317] This embodiment relates to the semiconductor process equipment in the present invention.

[0318] A semiconductor process equipment includes the TCS concentration detection device 100 as described in Example 1, or the TCS concentration detection system as described in Example 2.

[0319] Semiconductor process equipment also includes a liquid source, a carrier gas source, a power gas source and a waste liquid treatment device. Among them, the liquid source includes but is not limited to a TCS liquid tank; the carrier gas source includes but is not limited to an H2 tank; the power gas source includes but is not limited to a helium tank; and the waste liquid treatment device includes but is not limited to a water purifier.

[0320] The usage and advantages of this embodiment are the same as those of Embodiment 1 or Embodiment 2, and will not be described in detail here.

[0321] Example 6

[0322] This embodiment relates to a specific implementation of the TCS concentration detection system and method of the present invention.

[0323] like Fig.13 As shown, the first gas delivery unit 110 includes pneumatic diaphragm valves (PV09, PV10), a PC pressure regulator (PC1), a flow controller (MFC1), and a pressure sensor (PT4).

[0324] The concentration detection unit 120 includes a pneumatic diaphragm valve (PV19), a one-way valve (CV10), and a mass spectrometer (MS).

[0325] The verification unit 130 includes a condenser (Cond), a refrigerator (Chiller), a pneumatic diaphragm valve (PV15, PV16), a manual diaphragm valve (MV09, MV10), a one-way valve (CV09), a pressure sensor (PT5), a cylinder (Cylinder), an electronic balance (EB), and a flow meter (MFM).

[0326] The first purge unit 140 includes pneumatic diaphragm valves (PV11, PV12, PV13, PV14, PV17, PV18), one-way valves (CV03, CV04, CV05, CV06, CV07, CV08), and a pressure sensor (PT6).

[0327] The liquid supply unit 210 includes a manual diaphragm valve (MV02) and a pneumatic diaphragm valve (PV02).

[0328] The carrier gas supply unit 220 includes a manual diaphragm valve (MV04), a pneumatic diaphragm valve (PV04), a one-way valve (CV02), a PC pressure regulator (PC2), a flow controller (MFC2), and a pressure sensor (PT3).

[0329] The mixing unit 230 includes a bubbler (TEMPERATURE CONTROLLED VESSEL), manual diaphragm valves (MV05, MV06, MV07, MV08), a liquid level sensor (LEVEL SENSOR), and a temperature sensor (TEMPERATURE SENSOR).

[0330] The second gas delivery unit 240 includes a pneumatic diaphragm valve (PV03), a manual diaphragm valve (MV03), and a pressure sensor (PT0).

[0331] The second purge unit 250 includes a manual diaphragm valve (MV01), pneumatic diaphragm valves (PV01, PV05, PV06, PV07, PV08), and a pressure sensor (PT1).

[0332] The first vacuum unit 260 includes a vacuum pump (VG1), a pressure sensor (PT2), and a safety valve (SV).

[0333] The second vacuum unit 310 includes a vacuum pump ( VG2 ).

[0334] The tail gas treatment unit 320 includes a scrubber.

[0335] Specifically, the TCS concentration detection method of this embodiment is as follows:

[0336] (1) Manually open MV02 and MV05, and open PV02, so that the liquid source is connected to the TEMPERATURE CONTROLLED VESSEL through the liquid supply element 211, and liquid TCS can be delivered to the TEMPERATURE CONTROLLED VESSEL;

[0337] (2) Manually open MV04 and MV07, and open PV04, so that the carrier gas source is connected to the TEMPERATURE CONTROLLED VESSEL through the carrier gas supply element 221, and the carrier gas can be delivered to the TEMPERATURE CONTROLLED VESSEL;

[0338] (3) Turn on PC2 and MFC2 to adjust the pressure and flow rate of the carrier gas delivered in the carrier gas supply element 221;

[0339] (4) manually opening MV06 and MV03, and opening PV03, so that the TEMPERATURE CONTROLLED VESSEL is connected to the first gas delivery element 111 through the fifteenth gas delivery element 241;

[0340] (5) Turn on PC1 and MFC1 to adjust the pressure and flow rate of the mixed gas transported in the first gas transport element 111, so as to ensure the stability of the mixed gas in the first gas transport element 111;

[0341] (6) Open PV09 and PV19 to deliver the mixed gas to the MS through the first gas delivery element 111, the second gas delivery element 112, and the fourth gas delivery element 121;

[0342] (7) The MS can detect the mixed gas, thereby obtaining the concentration of TCS gas in the mixed gas and obtaining the first concentration information;

[0343] (8) Open PV10 and PV15, so that the first gas delivery element 111, the sixth gas delivery element 131, and Cond are connected to each other, so that the mixed gas flows into Cond, and Cond condenses the mixed gas to obtain condensed liquid and condensed gas;

[0344] (9) Open MV09 and MV10, so that Cond, liquid delivery element 134, and Cylinder are interconnected, so that the condensed liquid flows into the interior of the Cylinder;

[0345] (10) Open PV16 so that Cond is connected to the seventh gas delivery element 133. MFM can detect the condensed gas flowing through the seventh gas delivery element 133, thereby obtaining the total flow of the condensed gas.

[0346] (11) Open PV17 and PV18, so that the eighth gas delivery element 141, the thirteenth gas delivery element 146, the liquid delivery element 134, the fourteenth gas delivery element 147, and the SCRUBBER are connected, so that the liquid delivery element 134 can be purged;

[0347] (12) The staff separates the cylinder from the liquid delivery element 134 and places the cylinder on the EB to obtain the weight of the condensed liquid inside the cylinder;

[0348] (13) The second concentration information is calculated by the total flow rate of the condensed gas and the weight of the condensed liquid. The second concentration information is compared with the first concentration information to determine whether the result detected by the MS is consistent with the actual result.

[0349] The technical features of the above-described embodiments may be arbitrarily combined. To make the description concise, not all possible combinations of the technical features in the above-described embodiments are described. However, as long as there is no contradiction in the combination of these technical features, they should be considered to be within the scope of this specification.

[0350] The above-mentioned embodiments only express several implementation methods of the present application, and the descriptions thereof are relatively specific and detailed, but they cannot be understood as limiting the scope of the invention patent. It should be pointed out that, for a person of ordinary skill in the art, several variations and improvements can be made without departing from the concept of the present application, and these all belong to the protection scope of the present application. Therefore, the protection scope of the patent of the present application shall be subject to the attached claims.

Claims

1. A TCS concentration detection device, characterized in that: include: a first gas delivery unit, the first gas delivery unit being in communication with the gas mixing device and being used for acquiring and delivering the mixed gas delivered by the gas mixing device; a concentration detection unit, the concentration detection unit being connected to the first gas delivery unit and the tail gas treatment device respectively, and being used for performing mass spectrometry analysis on the mixed gas to obtain first concentration information of the mixed gas; a verification unit, the verification unit being connected to the first gas delivery unit and the tail gas treatment device respectively, and being used for condensing and weighing the mixed gas to obtain second concentration information of the mixed gas to verify the first concentration information; The first purge unit is connected to the verification unit and the exhaust gas treatment device respectively, and is used to purge the verification unit and the exhaust gas treatment device.

2. The TCS concentration detection device according to claim 1, characterized in that: The first gas delivery unit comprises: a first gas delivery element, the first gas delivery element being in communication with the gas mixing device and being used for acquiring and delivering the mixed gas delivered by the gas mixing device; a second gas delivery element, the second gas delivery element being connected to the first gas delivery element and the concentration detection unit respectively, and being used for delivering the mixed gas to the concentration detection unit; A third gas delivery element, the third gas delivery element being in communication with the first gas delivery element and the verification unit, respectively, and being used for delivering the mixed gas to the verification unit; and / or The concentration detection unit comprises: a fourth gas delivery element, the fourth gas delivery element being in communication with the first gas delivery unit and being used for acquiring and delivering the mixed gas; a fifth gas delivery element, the fifth gas delivery element being in communication with the fourth gas delivery element and the exhaust gas treatment device, respectively, and being used for delivering the exhaust gas to the exhaust gas treatment device; a mass spectrometer detection element, the mass spectrometer detection element being connected to the fourth gas delivery element and the tail gas treatment device respectively, and being used for performing mass spectrometer analysis on the mixed gas to obtain first concentration information of the mixed gas; and / or The verification unit comprises: a sixth gas delivery element, the sixth gas delivery element being connected to the first gas delivery unit and the first purge unit respectively, and being used for acquiring and delivering the mixed gas; a condensing element, the condensing element being in communication with the sixth gas delivery element and configured to condense the mixed gas and obtain condensed gas and condensed liquid; a seventh gas delivery element, the seventh gas delivery element being respectively connected to the condensing element, the first purge unit, and the tail gas treatment device, and being used for delivering condensed gas to the tail gas treatment device; a liquid delivery element, the liquid delivery element being in communication with the condensation element and being used for acquiring and delivering condensed liquid; a storage element, the storage element being in communication with the liquid delivery element and being used for storing condensed liquid; a flow detection element, the flow detection element being arranged on the seventh gas delivery element and being used for detecting the flow of the condensed gas; a weight detection element, the weight detection element being disposed at the bottom of the storage element and being used to detect the mass of the condensed liquid in the storage element; and / or The first purge unit comprises: an eighth gas delivery element, the eighth gas delivery element being in communication with a purge gas source and configured to obtain and deliver the purge gas; a ninth gas delivery element, the ninth gas delivery element being in communication with the eighth gas delivery element and the gas inlet structure of the verification unit, respectively, and being used for delivering a purge gas to the verification unit; a tenth gas delivery element, the tenth gas delivery element being in communication with the air intake structure and the exhaust gas treatment device of the verification unit respectively, and being used for delivering exhaust gas; an eleventh gas delivery element, the eleventh gas delivery element being in communication with the eighth gas delivery element and the exhaust structure of the verification unit, respectively, and being used for delivering a purge gas; a twelfth gas delivery element, the twelfth gas delivery element being connected to the exhaust structure and the exhaust gas treatment device of the verification unit respectively, and being used for delivering exhaust gas; a thirteenth gas delivery element, the thirteenth gas delivery element being in communication with the eighth gas delivery element and the drainage structure of the verification unit, respectively, and being used for delivering a purge gas; A fourteenth gas delivery element is connected to the drainage structure and the exhaust gas treatment device of the verification unit respectively, and is used for delivering exhaust gas.

3. The TCS concentration detection device according to claim 2, characterized in that: The first gas delivery unit also includes: a first control valve element, the first control valve element being disposed on the second gas delivery element and being used to control the flow of the second gas output element; and / or The first gas delivery unit also includes: a second control valve element, the second control valve element being disposed on the third gas delivery element and being used to control the flow of the third gas delivery element; and / or The first gas delivery unit also includes: a first pressure control element, the first pressure control element being disposed on the first gas delivery element and being used to adjust the gas pressure of the first gas delivery element; and / or The first gas delivery unit also includes: a first flow control element, the first flow control element being disposed on the first gas delivery element and being used to adjust the gas flow of the first gas delivery element; and / or The first gas delivery unit also includes: A first pressure monitoring element, the first pressure monitoring element is connected to the first gas delivery element and is used to monitor the pressure in the first gas delivery element in real time; and / or The concentration detection unit also includes: a third control valve element, the third control valve element being disposed on the fourth gas delivery element and being used to control the flow of the fourth gas delivery element; and / or The concentration detection unit also includes: A first one-way valve element, the first one-way valve element is arranged in the fifth gas delivery element, and is used to prevent the gas in the fifth gas delivery element from flowing back; and / or The verification unit also includes: a fourth control valve element, the fourth control valve element being disposed on the sixth gas delivery element and being used to control the flow between the sixth gas delivery element and the condensation element; and / or The verification unit also includes: a fifth control valve element, the fifth control valve element being arranged to control the flow between the seventh gas delivery element and the condensation element; and / or The verification unit also includes: A second one-way valve element, the second one-way valve element is arranged in the seventh gas delivery element, and is used to prevent the gas in the seventh gas delivery element from flowing back; and / or The verification unit also includes: a sixth control valve element, the sixth control valve element being disposed on the liquid delivery element and being used to control the flow between the condensation element and the liquid delivery element; and / or The verification unit also includes: a seventh control valve element, the seventh control valve element being arranged on the liquid delivery element and being used for controlling the flow of the liquid delivery element; and / or The verification unit also includes: A second pressure monitoring element, which is disposed on the seventh gas delivery element and is used to monitor the pressure of the seventh gas delivery element in real time; and / or The first purge unit further comprises: an eighth control valve element, the eighth control valve element being disposed on the ninth gas delivery element and being used to control the flow of the ninth gas delivery element; and / or The first purge unit further comprises: A third one-way valve element, the third one-way valve element being disposed in the ninth gas delivery element to prevent a backflow of gas in the ninth gas delivery element; and / or The first purge unit further comprises: a fourth one-way valve element, the fourth one-way valve element being disposed in the tenth gas delivery element and being used to prevent a backflow of gas in the tenth gas delivery element; and / or The first purge unit further comprises: a ninth control valve element, the ninth control valve element being disposed on the tenth gas delivery element and being used to control the flow of the tenth gas delivery element; and / or The first purge unit further comprises: a tenth control valve element, the tenth control valve element being disposed on the eleventh gas delivery element and being used to control the flow of the eleventh gas delivery element; and / or The first purge unit further comprises: a fifth one-way valve element, the fifth one-way valve element being disposed in the eleventh gas delivery element and being used to prevent a backflow of gas in the eleventh gas delivery element; and / or The first purge unit further comprises: a sixth one-way valve element, the sixth one-way valve element being disposed on the twelfth gas delivery element to prevent backflow of the twelfth gas delivery element; and / or The first purge unit further comprises: an eleventh control valve element, the eleventh control valve element being disposed on the twelfth gas delivery element and being used to control the flow of the twelfth gas delivery element; and / or The first purge unit further comprises: a twelfth control valve element, the twelfth control valve element being disposed on the thirteenth gas delivery element and being used to control the flow of the thirteenth gas delivery element; and / or The first purge unit further comprises: a seventh one-way valve element, the seventh one-way valve element being disposed in the thirteenth gas delivery element, and being used to prevent a backflow of gas in the thirteenth gas delivery element; and / or The first purge unit further comprises: an eighth one-way valve element, the eighth one-way valve element being disposed in the fourteenth gas delivery element and being used to prevent a backflow of gas in the fourteenth gas delivery element; and / or The first purge unit further comprises: a thirteenth control valve element, the thirteenth control valve element being disposed on the fourteenth gas delivery element and being used to control the flow of the fourteenth gas delivery element; and / or The first purge unit further comprises: A third pressure monitoring element, wherein the third pressure monitoring element is in communication with the eighth gas delivery element and is used for monitoring the pressure of the eighth gas delivery element in real time.

4. A TCS concentration detection system, characterized in that: include: The TCS concentration detection device according to any one of claims 1 to 3; A gas mixing device, the gas mixing device is connected to the TCS concentration detection device and the waste liquid treatment device respectively, and is used to deliver a mixed gas to the TCS concentration detection device; An exhaust gas treatment device is connected to the TCS concentration detection device and the gas mixing device respectively, and is used to treat the exhaust gas.

5. The TCS concentration detection system according to claim 4, characterized in that: The gas mixing device comprises: Liquid supply units, each of which is connected to a liquid source and is used to transport liquid TCS; A carrier gas supply unit, each of which is connected to a carrier gas source and is used to deliver the carrier gas; A mixing unit, the mixing unit is connected to the liquid supply unit, the carrier gas supply unit, the TCS concentration detection device, and the waste liquid treatment device, respectively, and is used to store liquid TCS and carrier gas and perform a bubbling reaction on the liquid TCS to generate a mixed gas; a second gas delivery unit, the second gas delivery unit being connected to the mixing unit and the TCS concentration detection device respectively, and being used for acquiring and delivering the mixed gas to the TCS concentration detection device; a second purge unit, the second purge unit being connected to the purge gas source, the liquid supply unit, the carrier gas supply unit, and the second gas delivery unit, respectively, and being used for purging the liquid supply unit, the carrier gas supply unit, and the second gas delivery unit; A first vacuum unit, which is respectively connected to the power gas source, the mixing unit, the second purge unit, and the tail gas treatment device, and is used to perform vacuum treatment on the entire device; and / or The tail gas treatment device comprises: a second vacuum unit, the second vacuum unit being in communication with the TCS concentration detection device and being used for performing a vacuum treatment on the TCS concentration detection device; An exhaust gas treatment unit is connected to the TCS concentration detection device and the gas mixing device, and is used to treat the exhaust gas discharged by the TCS concentration detection device and the gas mixing unit.

6. The TCS concentration detection system according to claim 5, characterized in that: The liquid supply unit comprises: a liquid supply element, the liquid supply element being connected to a liquid source, the mixing unit, and the second purge unit, respectively, and being used for delivering liquid TCS to the mixing unit; and / or The carrier gas supply unit comprises: a carrier gas supply element, the carrier gas supply element being connected to a carrier gas source, the mixing unit, and the second purge unit, respectively, and being used for delivering the carrier gas to the mixing unit; and / or The mixing unit comprises: A mixing element, which is respectively connected to the liquid supply unit, the carrier gas supply unit, the second gas delivery unit, the first vacuum unit, the TCS concentration detection device, and the waste liquid treatment device, and is used to perform a bubbling reaction on liquid TCS and generate a mixed gas; and / or The second gas delivery unit comprises: a fifteenth gas delivery element, the fifteenth gas delivery element being connected to the mixing unit, the second purge unit, and the TCS concentration detection device, respectively, and being used for acquiring and delivering the mixed gas to the TCS concentration detection device; and / or The second purge unit comprises: a sixteenth gas delivery element, the sixteenth gas delivery element being in communication with a purge gas source and configured to deliver a purge gas; a seventeenth gas delivery element, the seventeenth gas delivery element being in communication with the sixteenth gas delivery element and the liquid supply unit, respectively, and being used for delivering a purge gas to the liquid supply unit; an eighteenth gas delivery element, the eighteenth gas delivery element being in communication with the sixteenth gas delivery element and the carrier gas supply unit, respectively, and being used for delivering a purge gas to the carrier gas supply unit; a nineteenth gas delivery element, the nineteenth gas delivery element being in communication with the sixteenth gas delivery element and the second gas delivery unit, respectively, and being configured to deliver a purge gas to the second gas delivery unit; a twentieth gas delivery element, the twentieth gas delivery element being connected to the sixteenth gas delivery element and the first vacuum unit, respectively, and being used for delivering a purge gas to the first vacuum unit; and / or The first vacuum unit comprises: a first vacuum pump element, the first vacuum pump element being in communication with the second purge unit and being used to form a vacuum negative pressure at an end of the second purge unit; a twenty-first gas delivery element, the twenty-first gas delivery element being connected to a power gas source and the first vacuum pump element, respectively, for delivering power gas; a twenty-second gas delivery element, the twenty-second gas delivery element being connected to the first vacuum pump element and the tail gas treatment device, respectively, and being used for delivering exhaust gas; A twenty-third gas conveying element, the twenty-third gas conveying element is connected to the mixing unit and the exhaust gas treatment device respectively, and is used for conveying exhaust gas; and / or The second vacuum unit comprises: a second vacuum pump element, the second vacuum pump element being in communication with the TCS concentration detection device and being used to form a vacuum negative pressure at an end of the TCS concentration detection device; A twenty-fourth gas delivery element, the twenty-fourth gas delivery element is respectively connected to the concentration detection unit of the TCS concentration detection device and the second vacuum pump element, and is used to transport exhaust gas; A twenty-fifth gas delivery element, the twenty-fifth gas delivery element is respectively connected to the verification unit of the TCS concentration detection device and the second vacuum pump element, and is used to deliver exhaust gas; A twenty-sixth gas delivery element, the twenty-sixth gas delivery element is connected to the second vacuum pump element and the tail gas treatment unit respectively, and is used for delivering exhaust gas; and / or The tail gas treatment unit comprises: An exhaust gas treatment element is connected to the TCS concentration detection device and the gas mixing device respectively, and is used to treat the exhaust gas discharged by the TCS concentration detection device and the gas mixing device.

7. The TCS concentration detection system according to claim 6, characterized in that: The liquid supply unit further comprises: a fourteenth control valve element, the fourteenth control valve element being disposed on the liquid supply element and being used to control the flow of the liquid supply element; and / or The carrier gas supply unit also includes: a fifteenth control valve element, the fifteenth control valve element being disposed on the carrier gas supply element and being used to control the flow of the carrier gas supply element; and / or The carrier gas supply unit also includes: a ninth one-way valve element, the ninth one-way valve element being disposed on the carrier gas supply element and being used to prevent a backflow of gas from the carrier gas supply element; and / or The carrier gas supply unit also includes: A second pressure control element, the second pressure control element is arranged on the carrier gas supply element, and is used to adjust the pressure of the carrier gas supply element; and / or The carrier gas supply unit also includes: a second flow control element, the second flow control element being disposed on the carrier gas supply element and being used to adjust the flow of the carrier gas supply element; and / or The carrier gas supply unit also includes: a fourth pressure monitoring element, the fourth pressure monitoring element being in communication with the carrier gas supply element and being used for monitoring the pressure of the carrier gas supply element in real time; and / or The mixing unit further comprises: A sixteenth control valve element, the sixteenth control valve element is arranged in the mixing element, and is used to control the flow of the mixing element with the liquid supply unit, the carrier gas supply unit, the second gas delivery unit, and the waste liquid treatment device; and / or The second gas delivery unit also includes: a seventeenth control valve element, the seventeenth control valve element being disposed on the fifteenth gas delivery element and being used to control the flow of the fifteenth gas delivery element; and / or The second gas delivery unit also includes: a fifth pressure monitoring element, the fifth pressure monitoring element being in communication with the fifteenth gas delivery element and configured to monitor the pressure of the fifteenth gas delivery element in real time; and / or The second purge unit further comprises: an eighteenth control valve element, the eighteenth control valve element being disposed on the sixteenth gas delivery element and being used to control the flow of the sixteenth gas delivery element; and / or The second purge unit further comprises: a tenth one-way valve element, the tenth one-way valve element being disposed in the sixteenth gas delivery element and being used to prevent a backflow of gas inside the sixteenth gas delivery element; and / or The second purge unit further comprises: a nineteenth control valve element, the nineteenth control valve element being disposed on the seventeenth gas delivery element and being used to control the flow of the seventeenth gas delivery element; and / or The second purge unit further comprises: a twentieth control valve element, the twentieth control valve element being disposed on the eighteenth gas delivery element and being used for controlling the flow of the eighteenth gas delivery element; and / or The second purge unit further comprises: a twenty-first control valve element, the twenty-first control valve element being disposed on the nineteenth gas delivery element and being used to control the flow of gas through the nineteenth gas delivery element; and / or The second purge unit further comprises: a twenty-second control valve element, the twenty-second control valve element being disposed at the twenty-second gas delivery element and being used to control the flow of the twenty-second gas delivery element; and / or The second purge unit further comprises: a sixth pressure monitoring element, the sixth pressure monitoring element being in communication with the sixteenth gas delivery element and configured to monitor the pressure of the sixteenth gas delivery element in real time; and / or The first vacuum unit also includes: a pressure relief valve element, the pressure relief valve element being arranged on the twenty-third gas delivery element and being used for relieving pressure on the mixing unit; and / or The first vacuum unit also includes: A seventh pressure monitoring element, wherein the seventh pressure monitoring element is in communication with the twentieth gas delivery element and is used for monitoring the pressure of the twentieth gas delivery element in real time.

8. A semiconductor process equipment comprising: The TCS concentration detection device according to any one of claims 1 to 3; or A TCS concentration detection system as claimed in any one of claims 4 to 7.

9. A TCS concentration detection method, applied to the TCS concentration detection device according to any one of claims 1 to 3 or the TCS concentration detection system according to any one of claims 4 to 7, comprising: The first gas delivery unit is used to obtain and deliver the mixed gas delivered by the gas mixing device; The concentration detection unit is used to perform mass spectrometry analysis on the mixed gas to obtain first concentration information of the mixed gas; The verification unit is used to condense and weigh the mixed gas to obtain second concentration information of the mixed gas; By comparing the second concentration information with the first concentration information, it is determined whether the first concentration information obtained by the concentration detection unit is consistent with the actual situation.

10. A TCS concentration detection method, applied to the TCS concentration detection system according to any one of claims 4 to 7, comprising: The gas mixing device is used to obtain liquid TCS and carrier gas and mix them to form a mixed gas and transport the mixed gas to the TCS concentration detection device; The first gas delivery unit is used to obtain and deliver the mixed gas delivered by the gas mixing device; The concentration detection unit is used to perform mass spectrometry analysis on the mixed gas to obtain first concentration information of the mixed gas; The verification unit is used for condensing and weighing the mixed gas to obtain second concentration information of the mixed gas; By comparing the second concentration information with the first concentration information, it is determined whether the first concentration information obtained by the concentration detection unit is consistent with the actual situation.

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