Method and system for controlling plasma scalpel by utilizing EMC (Electro Magnetic Compatibility) rectification filtering technology
Through EMC rectifier filtering technology, EMC filter and DC-DC converter are built, which solves the problem of insufficient control accuracy in the electromagnetic environment of plasma knife, realizes stable operation and precise control of the equipment, and improves surgical safety and equipment performance.
Patent Information
- Application Number
- CN202411400067.4
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2024-10-09
- Publication Date
- 2024-12-27
AI Technical Summary
The complex electromagnetic environment generated by plasma knife during work results in insufficient control accuracy, interfering with other electronic equipment in the operating room, and existing control methods cannot effectively manage electromagnetic interference, affecting the stability and safety of the equipment.
Using EMC rectifying and filtering technology, by obtaining the application requirements of plasma knife and the input AC voltage of standard medical electricity in hospitals, building an EMC filter, rectifying and filtering AC voltage, calculating and constructing filter capacitors and inductance values, designing DC-DC converters, and establishing Precise control system to ensure the stable operation of the plasma knife in the electromagnetic environment.
It improves the precise control effect of the plasma knife, reduces electromagnetic interference, ensures the equipment to work stably under a constant voltage, and enhances the safety of the surgical process and the overall performance of the equipment.
Smart Images
Figure CN119210176A_ABST
Abstract
Description
Technical Field
[0001] The invention relates to the field of electromagnetic compatibility, and in particular to a method and a system for controlling a plasma scalpel by utilizing EMC rectification and filtering technology. Background Art
[0002] A plasma knife is a medical device that uses plasma for surgical operations. Plasma is an ionized gas composed of ions, free electrons, and non-ionized neutral particles, and is conductive. A plasma knife creates plasma between the surgical tool and the target tissue to achieve cutting, coagulation, or ablation of tissue.
[0003] At present, the traditional control method of plasma knife mainly relies on simple electronic control. This control method cannot guarantee the control accuracy of plasma knife because the plasma knife will generate a complex electromagnetic environment during operation, which may interfere with other electronic equipment in the operating room. Summary of the invention
[0004] The present invention provides a method and system for controlling a plasma surgical knife by utilizing EMC rectification and filtering technology, the main purpose of which is to improve the precise control effect of the plasma surgical knife.
[0005] To achieve the above object, the present invention provides a method for controlling a plasma surgical knife using EMC rectification and filtering technology, comprising: Obtaining application requirements of the plasma knife, and determining target voltage requirements required by the plasma knife based on the application requirements; Acquire an input AC voltage of hospital standard medical electricity, analyze the electromagnetic interference state of the plasma knife based on the input AC voltage, and construct an EMC filter of the plasma knife based on the input AC voltage and the electromagnetic interference state; Filtering the input AC voltage by using the EMC filter to obtain a filtered AC voltage, constructing a rectifier circuit for the filtered AC voltage based on the target voltage requirement, rectifying the filtered AC voltage into a pulsating DC voltage by using the rectifier circuit, analyzing the pulsating component of the pulsating DC voltage, calculating the filter capacitance value and the filter inductance value required to eliminate the pulsating component, constructing a filter circuit for the rectifier circuit based on the filter capacitance value, and smoothing the pulsating DC voltage by using the filter circuit to obtain a smoothed DC voltage; Based on the smoothed DC voltage and the target voltage requirement, determining a boost coefficient of the converter to be constructed corresponding to the plasma knife, determining a switching frequency and a duty cycle of the converter to be constructed based on the boost coefficient, calculating a conversion inductance value of the converter to be constructed based on the switching frequency and the duty cycle, and constructing a DC-DC converter of the converter to be constructed based on the conversion inductance value; Based on the DC-DC converter, a control system of the plasma knife is constructed, and based on the control system, precise control of the plasma knife is performed.
[0006] Optionally, constructing an EMC filter for the plasma knife based on the input AC voltage and the electromagnetic interference state includes: Based on the electromagnetic interference state, analyzing the electromagnetic interference type and electromagnetic interference frequency of the plasma knife; analyzing an AC voltage parameter of the input AC voltage; Determining a filter topology for constructing the EMC filter according to the electromagnetic interference type, the electromagnetic interference frequency, and the AC voltage parameters; Determine the cutoff frequency of the filter topology by using the electromagnetic interference frequency, wherein the cutoff frequency includes: a common mode cutoff frequency and a differential mode cutoff frequency; Analyzing the common mode capacitance and the differential mode capacitance of the filter topology according to the cut-off frequency; Calculating a common-mode inductance and a differential-mode inductance of the filter topology based on the cut-off frequency, the common-mode capacitance, and the differential-mode capacitance; Determining a common-mode choke and a differential-mode choke of the filter topology based on the common-mode inductance and the differential-mode inductance; Constructing an initial filter of the plasma knife according to the common mode choke, the differential mode choke, the common mode capacitor, the differential mode capacitor and the filter topology; Performing simulation test on the initial filter to obtain filtering test result; Calculating the insertion loss coefficient of the initial filter according to the filtering test result; When the insertion loss coefficient meets a preset loss coefficient threshold, the EMC initial filter is used as an EMC filter.
[0007] Optionally, calculating the insertion loss coefficient of the initial filter according to the filtering test result includes: Extracting the test input voltage, the test output voltage and the filter power from the test result; Calculating the insertion loss of the initial filter according to the test input voltage and the test output voltage; The insertion loss coefficient of the initial filter is determined by the insertion loss and the filter power.
[0008] Optionally, constructing a rectification circuit for filtering the AC voltage based on the target voltage requirement includes: Analyze target voltage parameters of the target voltage requirement; Determining a rectification circuit type of the filtered AC voltage based on the target voltage parameter; According to the type of the rectifier circuit, determining a circuit topology structure for constructing the rectifier circuit; A diode configured with the circuit topology; Based on the diode and the circuit topology, a rectifier circuit for filtering the AC voltage is constructed.
[0009] Optionally, the calculating of the filter capacitance value and the filter inductance value required to eliminate the pulsation component includes: determining a filter cutoff frequency required to eliminate the pulsation component; Analyzing the rectified output voltage and rectified output current of the rectifier circuit corresponding to the pulsating component; identifying a rectified voltage cycle of the rectified output voltage; extracting the voltage ripple frequency of the pulsating component; determining a peak current of the rectified output current; Based on the rectified output voltage, the rectified voltage period, the voltage ripple frequency and the peak current, a filter capacitance value required to eliminate the pulsating component is calculated.
[0010] The inductance value required to eliminate the pulsation component is calculated according to the filter cut-off frequency and the filter capacitance value.
[0011] Optionally, constructing a filter circuit of the rectifier circuit based on the filter capacitance value and the filter inductance value includes: determining a filter circuit topology for constructing the filter circuit; Based on the filter capacitance value and the filter inductance value, determining a filter capacitance element and a filter inductance element for constructing the filter circuit; Based on the filter capacitor element, the filter inductor element and the filter circuit topology, a filter circuit of the rectifier circuit is constructed.
[0012] Optionally, determining the switching frequency and duty cycle of the converter to be constructed based on the boost coefficient includes: Acquiring the conduction state of the converter to be constructed; analyzing the conduction time of the conduction state; Based on the boost coefficient and the on-time, the switching frequency and the duty cycle of the converter to be constructed are calculated.
[0013] Optionally, the calculating the conversion inductance value of the converter to be constructed based on the switching frequency and the duty cycle includes: Obtaining a smoothed DC voltage corresponding to the converter to be constructed; measuring an input converter current of the converter to be constructed; The conversion inductance value of the converter to be constructed is calculated based on the input converter current, the switching frequency and the duty cycle.
[0014] Optionally, the control system of the plasma knife is constructed based on the DC-DC converter, including: configuring a controller of the DC-DC converter; A sensor for configuring the plasma knife; Based on the sensor and the controller, a feedback mechanism of the plasma knife is constructed; calculating a response coefficient of the feedback mechanism; When the response coefficient meets the preset response coefficient threshold, a control system of the plasma knife is constructed according to the DC-DC converter, the controller, the sensor and the feedback mechanism.
[0015] In order to solve the above problems, the present invention also provides a system for controlling a plasma surgical knife using EMC rectification and filtering technology, the system comprising: A target voltage requirement analysis module is used to obtain application requirements of the plasma knife and determine the target voltage requirements required by the plasma knife based on the application requirements; An EMC filter construction module, used to obtain an input AC voltage of a hospital standard medical electricity, analyze the electromagnetic interference state of the plasma knife based on the input AC voltage, and construct an EMC filter of the plasma knife based on the input AC voltage and the electromagnetic interference state; A rectifier and filter circuit module, used for filtering the input AC voltage by using the EMC filter to obtain a filtered AC voltage, constructing a rectifier circuit for the filtered AC voltage based on the target voltage requirement, rectifying the filtered AC voltage into a pulsating DC voltage by using the rectifier circuit, analyzing the pulsating component of the pulsating DC voltage, calculating the filter capacitance value and filter inductance value required to eliminate the pulsating component, constructing a filter circuit for the rectifier circuit based on the filter capacitance value, and smoothing the pulsating DC voltage by using the filter circuit to obtain a smoothed DC voltage; A DC-DC converter construction module, used to determine a boost coefficient of a converter to be constructed corresponding to the plasma knife based on the smoothed DC voltage and the target voltage requirement, determine a switching frequency and a duty cycle of the converter to be constructed based on the boost coefficient, calculate a conversion inductance value of the converter to be constructed based on the switching frequency and the duty cycle, and construct a DC-DC converter of the converter to be constructed based on the conversion inductance value; The plasma knife control module is used to construct a control system of the plasma knife based on the DC-DC converter, and to perform precise control of the plasma knife based on the control system.
[0016] The embodiment of the present invention can achieve effective tissue cutting and coagulation by determining the target voltage requirement required by the plasma knife based on the application requirements, while avoiding damage to surrounding healthy tissues; optionally, the embodiment of the present invention can ensure that the plasma knife works stably in an electromagnetic environment by constructing the EMC filter of the plasma knife based on the input AC voltage and the electromagnetic interference state, thereby improving the performance and safety of the equipment; the embodiment of the present invention can stably convert the filtered AC voltage into a DC voltage by constructing the rectifier circuit of the filtered AC voltage based on the target voltage requirement; the embodiment of the present invention can reduce the pulsating component by calculating the filter capacitor value and the filter inductance value required to eliminate the pulsating component, thereby improving the stability of the voltage output and reducing fluctuations and noise; the embodiment of the present invention can stabilize the output voltage, reduce voltage fluctuations, and ensure that the plasma knife works at a constant voltage by constructing the DC-DC converter of the converter to be constructed based on the conversion inductance value, finally, the embodiment of the present invention can ensure safety and efficiency during surgery by executing precise control of the plasma knife based on the control system, thereby improving the overall performance and reliability of the plasma knife. Therefore, the present invention can improve the effect of precise control of the plasma knife. BRIEF DESCRIPTION OF THE DRAWINGS
[0017] Figure 1 A schematic flow chart of a method for controlling a plasma surgical knife using EMC rectification and filtering technology provided by an embodiment of the present invention; Figure 2 A functional module diagram of a system for controlling a plasma surgical knife using EMC rectification and filtering technology provided by an embodiment of the present invention; The realization of the purpose, functional features and advantages of the present invention will be further explained in conjunction with embodiments and with reference to the accompanying drawings. DETAILED DESCRIPTION
[0018] It should be understood that the specific embodiments described herein are only used to explain the present invention, and are not used to limit the present invention.
[0019] The embodiment of the present application provides a method for controlling a plasma scalpel using EMC rectification and filtering technology. The execution subject of the method for controlling a plasma scalpel using EMC rectification and filtering technology includes but is not limited to at least one of the electronic devices such as a server and a terminal that can be configured to execute the method provided by the embodiment of the present application. In other words, the method for controlling a plasma scalpel using EMC rectification and filtering technology can be executed by software or hardware installed on a terminal device or a server device, and the software can be a blockchain platform. The server includes but is not limited to: a single server, a server cluster, a cloud server or a cloud server cluster, etc. The server can be an independent server, or it can be a cloud server that provides basic cloud computing services such as cloud services, cloud databases, cloud computing, cloud functions, cloud storage, network services, cloud communications, middleware services, domain name services, security services, content delivery networks (Content Delivery Network, CDN), and big data and artificial intelligence platforms.
[0020] Reference Figure 1 FIG. 1 is a flow chart of a method for controlling a plasma surgical knife using EMC rectification and filtering technology provided by an embodiment of the present invention. In this embodiment, the method for controlling a plasma surgical knife using EMC rectification and filtering technology includes: S1. Obtain application requirements of a plasma knife, and determine a target voltage requirement required by the plasma knife based on the application requirements.
[0021] The embodiment of the present invention can ensure the efficiency, safety and convenience of the plasma knife in practical application by obtaining the application requirements of the plasma knife, wherein the application requirements refer to the specific use requirements and use environment for the plasma knife as a surgical tool in the field of medical surgery.
[0022] The embodiment of the present invention can achieve effective tissue cutting and coagulation by determining the target voltage requirement required by the plasma knife based on the application requirements, while avoiding damage to surrounding healthy tissues. The target voltage requirement refers to the voltage value and voltage type of the DC power supply that needs to be set and maintained in order to achieve the specific functions and working performance of the plasma knife.
[0023] Optionally, the target voltage requirement for the plasma knife based on the application requirement can be determined by a voltage-tissue response relationship experiment, wherein the voltage-tissue response relationship experiment refers to a series of experiments aimed at studying the effects of the plasma knife on biological tissues under different voltage conditions.
[0024] S2. Obtain an input AC voltage of hospital standard medical electricity, analyze the electromagnetic interference state of the plasma knife based on the input AC voltage, and construct an EMC filter for the plasma knife based on the input AC voltage and the electromagnetic interference state.
[0025] The embodiment of the present invention can determine the voltage range that the filter needs to handle by obtaining the input AC voltage of the hospital standard medical electricity, so as to select the appropriate filter components and circuit design. The input AC voltage refers to the voltage value of the AC power received by the medical device or system from the hospital power grid.
[0026] The embodiment of the present invention can effectively manage and control the electromagnetic interference of the plasma knife by analyzing the electromagnetic interference state of the plasma knife based on the input AC voltage, thereby improving the stability and reliability of the plasma knife. The electromagnetic interference state refers to the characteristics, level, and impact range of the electromagnetic interference generated by the plasma knife during operation, as well as the interference it may cause to surrounding electronic equipment and communication systems.
[0027] Optionally, as an embodiment of the present invention, based on the input AC voltage, the electromagnetic interference state of the plasma knife can be analyzed by the electromagnetic interference test kit, wherein the set of instruments and tools for testing and measuring the electromagnetic interference generated by electronic equipment during operation.
[0028] The embodiment of the present invention can ensure that the plasma knife works stably in an electromagnetic environment and improve the performance and safety of the device by constructing the EMC filter of the plasma knife based on the input AC voltage and the electromagnetic interference state. The EMC filter refers to an electronic component used to suppress or reduce electromagnetic interference.
[0029] As an embodiment of the present invention, the EMC filter of the plasma knife is constructed based on the input AC voltage and the electromagnetic interference state, including: Based on the electromagnetic interference state, analyzing the electromagnetic interference type and electromagnetic interference frequency of the plasma knife; analyzing an AC voltage parameter of the input AC voltage; Determining a filter topology for constructing the EMC filter according to the electromagnetic interference type, the electromagnetic interference frequency, and the AC voltage parameters; Determine the cutoff frequency of the filter topology by using the electromagnetic interference frequency, wherein the cutoff frequency includes: a common mode cutoff frequency and a differential mode cutoff frequency; Analyzing the common mode capacitance and the differential mode capacitance of the filter topology according to the cut-off frequency; Based on the cut-off frequency, common mode capacitance and differential mode capacitance, the common mode inductance and differential mode inductance of the filter topology are calculated using the following formula: in, represents the common mode inductance, represents pi, represents the common mode capacitance, Indicates the common mode cutoff frequency corresponding to the cutoff frequency, represents the differential mode inductance, represents the differential mode capacitance, Indicates the differential mode cutoff frequency corresponding to the cutoff frequency; Determining a common-mode choke and a differential-mode choke of the filter topology based on the common-mode inductance and the differential-mode inductance; Constructing an initial filter of the plasma knife according to the common mode choke, the differential mode choke, the common mode capacitor, the differential mode capacitor and the filter topology; Performing simulation test on the initial filter to obtain filtering test result; Calculating the insertion loss coefficient of the initial filter according to the filtering test result; When the insertion loss coefficient meets a preset loss coefficient threshold, the EMC initial filter is used as an EMC filter.
[0030] Among them, the electromagnetic interference type refers to the type of electromagnetic interference that the plasma knife may generate or be subjected to during operation, wherein the electromagnetic interference type includes common mode interference and differential mode interference. The common mode interference refers to the interference voltage existing simultaneously between a reference point of the device (usually a ground wire or a housing) and the signal line, and the phase is the same, such as noise on the power line, coupling of the external electric field of the device, etc.; the differential mode interference refers to the interference voltage existing between the signal lines, and the voltage phases on the two signal lines are opposite, such as: switching action, current change, etc. The electromagnetic interference frequency refers to the specific frequency or frequency range contained or emitted by the electromagnetic interference signal. The AC voltage parameter refers to the electromagnetic interference emission and anti-interference ability of the plasma knife, such as the amplitude, frequency, waveform, phase, harmonic content, etc. of the AC voltage. The filter topology refers to the design structure of the EMC filter circuit, such as: π-type filter, T-type filter, LC filter, etc. The cutoff frequency refers to the frequency point at which the filter begins to significantly attenuate the signal. The common mode cutoff frequency refers to the frequency point at which the filter begins to significantly attenuate the common mode interference. The differential mode cutoff frequency refers to the frequency point at which the filter begins to significantly attenuate the differential mode interference. The common mode capacitor refers to a capacitor used to suppress common mode interference. The differential mode capacitor refers to a capacitor used to suppress differential mode interference. The common mode choke refers to an electromagnetic component used to suppress common mode interference, which presents high impedance to common mode signals and low impedance to differential mode signals. The common mode choke is usually composed of a double winding coil, and the two windings are wound on the same magnetic core, but the winding directions are opposite. The differential mode choke refers to an electromagnetic component used to suppress differential mode interference, which presents high impedance to differential mode signals and has little effect on common mode signals. The differential mode choke is usually composed of a double winding coil, and the two windings are wound on the same magnetic core and the winding directions are the same. The initial filter refers to a filter preliminarily constructed based on the common mode choke, differential mode choke, common mode capacitor and differential mode capacitor and filter topology. The insertion loss coefficient is a parameter that measures the filter's ability to suppress specific frequency signals. The preset loss coefficient threshold refers to the minimum insertion loss coefficient value set according to the EMC standard and the actual application requirements of the plasma knife.
[0031] Optionally, as another embodiment of the present invention, calculating the insertion loss coefficient of the initial filter according to the filtering test result includes: Extracting the test input voltage, the test output voltage and the filter power from the test result; According to the test input voltage and the test output voltage, the insertion loss of the initial filter is calculated using the following formula: in, represents the insertion loss, represents the logarithmic function with base 10, Indicates the test input voltage, Indicates the test output voltage; The insertion loss coefficient of the initial filter is determined by the insertion loss and the filter power.
[0032] The insertion loss refers to the change in output voltage of the circuit before and after the circuit is connected to the filter.
[0033] S3. Filter the input AC voltage using the EMC filter to obtain a filtered AC voltage. Based on the target voltage requirement, construct a rectifier circuit for the filtered AC voltage. Utilize the rectifier circuit to rectify the filtered AC voltage into a pulsating DC voltage. Analyze the pulsating component of the pulsating DC voltage, calculate the filter capacitor value and the filter inductor value required to eliminate the pulsating component. Based on the filter capacitor value and the filter inductor value, construct a filter circuit for the rectifier circuit. Utilize the filter circuit to smooth the pulsating DC voltage to obtain a smoothed DC voltage.
[0034] In the embodiment of the present invention, the input AC voltage is filtered by the EMC filter to obtain a filtered AC voltage, and the voltage change after passing through the EMC filter can be determined. The filtered AC voltage refers to the AC voltage signal processed by the EMC filter in the circuit.
[0035] The embodiment of the present invention can stably convert the filtered AC voltage into a DC voltage by constructing the rectifier circuit of the filtered AC voltage based on the target voltage requirement. The rectifier circuit refers to a rectifier circuit that can automatically adjust its output voltage to adapt to specific requirements or input changes.
[0036] As an embodiment of the present invention, the rectifier circuit for filtering the AC voltage based on the target voltage requirement includes: Analyze target voltage parameters of the target voltage requirement; Determining a rectification circuit type of the filtered AC voltage based on the target voltage parameter; According to the type of the rectifier circuit, determining a circuit topology structure for constructing the rectifier circuit; A diode configured with the circuit topology; Based on the diode and the circuit topology, a rectifier circuit for filtering the AC voltage is constructed.
[0037] The target voltage parameter refers to the voltage range and voltage type required by the plasma knife under normal working conditions. The types of rectifier circuits include: half-wave rectifier, full-wave rectifier, bridge rectifier, etc. The circuit topology refers to the physical layout and component connection method of the rectifier circuit, such as: half-wave rectifier circuit, full-wave rectifier circuit, bridge rectifier circuit, etc. The diode is a semiconductor device with two electrodes, which allows current to flow in a unidirectional direction, that is, it only allows current to flow from the positive electrode to the negative electrode, and prevents current from flowing from the negative electrode to the positive electrode.
[0038] The embodiment of the present invention can convert AC power into DC power by using the rectifier circuit to rectify the filtered AC voltage into a pulsating DC voltage to meet the DC power supply requirements of the plasma knife. The pulsating DC voltage refers to a waveform that shows continuous fluctuations over a period of time, similar to a pulsating or beating DC voltage. This voltage is usually converted from an AC voltage through a rectifier circuit. Although the rectifier circuit can eliminate the positive and negative polarity changes of the voltage, the voltage fluctuation still exists.
[0039] The embodiment of the present invention can improve the stability of the pulsating DC voltage, reduce voltage fluctuations, and improve the performance and reliability of the power supply by analyzing the pulsating component of the pulsating DC voltage through effective circuit design. The pulsating component refers to the unstable and non-uniform voltage fluctuation part existing in the pulsating DC voltage.
[0040] Optionally, as an embodiment of the present invention, the analysis of the pulsating component of the pulsating DC voltage may be performed by a spectrum analysis method, wherein the spectrum analysis refers to analyzing the frequency component and amplitude of the pulsating component using an oscilloscope or a spectrum analyzer.
[0041] The embodiment of the present invention can reduce the pulsation component by calculating the filter capacitance value and filter inductance value required to eliminate the pulsation component, thereby improving the stability of the voltage output and reducing fluctuations and noise. The filter capacitance value and filter inductance value refer to the parameter values of the capacitor and inductance elements used to filter out the pulsation component in the rectifier circuit.
[0042] As an embodiment of the present invention, the calculation of the filter capacitance value and the filter inductance value required to eliminate the pulsation component includes: determining a filter cutoff frequency required to eliminate the pulsation component; Analyzing the rectified output voltage and rectified output current of the rectifier circuit corresponding to the pulsating component; identifying a rectified voltage cycle of the rectified output voltage; extracting the voltage ripple frequency of the pulsating component; determining a peak current of the rectified output current; Based on the rectified output voltage, rectified voltage period, voltage ripple frequency and peak current, the filter capacitor value required to eliminate the pulsation component is calculated using the following formula: in, Indicates the filter capacitor value, represents the peak current, represents the rectified voltage period, represents pi, represents the voltage ripple frequency, Represents the rectified output voltage.
[0043] The inductance value required to eliminate the pulsation component is calculated according to the filter cut-off frequency and the filter capacitance value.
[0044] The rectified voltage cycle refers to the time taken for a complete sinusoidal waveform in the rectified output voltage. The voltage ripple frequency refers to the frequency at which the pulsating component appears in the rectified output voltage. The peak current refers to the maximum value reached in the rectified output current.
[0045] Optionally, the determining of the filter cutoff frequency required for eliminating the pulsation component may be determined by analyzing the requirement for eliminating the pulsation component.
[0046] Optionally, the inductance value required to remove the pulsating component according to the filter cut-off frequency and the filter capacitance value can be calculated by referring to the differential mode inductance calculation formula corresponding to the above-mentioned EMC filter.
[0047] The embodiment of the present invention can provide a more stable output voltage, reduce voltage fluctuations, and improve the stability and reliability of the power supply by constructing the filter circuit of the rectifier circuit based on the filter capacitor value and the filter inductor value. The filter circuit refers to a filter circuit that can automatically adjust its filter parameters to adapt to different working conditions and load changes.
[0048] As an embodiment of the present invention, the filter circuit of the rectifier circuit is constructed based on the filter capacitance value and the filter inductance value, including: determining a filter circuit topology for constructing the filter circuit; Based on the filter capacitance value and the filter inductance value, determining a filter capacitance element and a filter inductance element for constructing the filter circuit; Based on the filter capacitor element, the filter inductor element and the filter circuit topology, a filter circuit of the rectifier circuit is constructed.
[0049] The filter circuit topology refers to the physical layout and connection mode of the components in the filter circuit, such as LC low-pass filter, RC low-pass filter, LC high-pass filter, etc. The filter capacitor component refers to the capacitor used to filter high-frequency noise and interference in the filter circuit. The filter inductor component refers to the inductor used to filter low-frequency noise and interference in the filter circuit.
[0050] The embodiment of the present invention uses the filter circuit to smooth the pulsating DC voltage to obtain a smooth DC voltage, which can ensure that the filter circuit outputs a stable DC voltage to meet the power supply requirements of the plasma knife. The smooth DC voltage refers to a DC voltage whose voltage waveform is continuous and relatively stable in time after being processed by the filter circuit.
[0051] S4. Based on the smoothed DC voltage and the target voltage requirement, determine the boost coefficient of the converter to be constructed corresponding to the plasma knife; based on the boost coefficient, determine the switching frequency and duty cycle of the converter to be constructed; based on the switching frequency and duty cycle, calculate the conversion inductance value of the converter to be constructed; based on the conversion inductance value, construct a DC-DC converter of the converter to be constructed.
[0052] The embodiment of the present invention determines the boost coefficient of the converter to be constructed corresponding to the plasma knife based on the smoothed DC voltage and the target voltage requirement, thereby ensuring that the converter can provide sufficient power output to meet the power requirement of the plasma knife. The boost coefficient refers to the proportional relationship between the output voltage and the input voltage of the converter to be constructed.
[0053] As an embodiment of the present invention, determining the boost coefficient of the converter to be constructed corresponding to the plasma knife based on the smoothed DC voltage and the target voltage requirement includes: Analyze the target voltage of the target voltage requirement; Based on the smoothed DC voltage and the target voltage, the boost coefficient of the converter to be constructed corresponding to the plasma knife is calculated using the following formula: in, represents the boost coefficient, represents the target voltage, Indicates smoothed DC voltage.
[0054] The embodiment of the present invention can optimize the power efficiency of the converter, reduce energy loss, and improve the energy efficiency of the power supply by determining the switching frequency and duty cycle of the converter to be constructed based on the boost coefficient. The switching frequency refers to the number of times a switching device (such as a MOSFET or a transistor) switches per second. The duty cycle refers to the ratio of the time that the switching device remains in the on state in one cycle to the total time of the entire cycle.
[0055] As an embodiment of the present invention, determining the switching frequency and duty cycle of the converter to be constructed based on the boost coefficient includes: Acquiring the conduction state of the converter to be constructed; analyzing the conduction time of the conduction state; Based on the boost factor and the on-time, the switching frequency and duty cycle of the converter to be constructed are calculated using the following formula: in, represents the switching frequency, represents the duty cycle, represents the boost coefficient, Indicates the conduction time.
[0056] The on-state refers to a state in which the switch device is in an on-state, allowing current to pass through. The on-time refers to the length of time the switch device is in an on-state.
[0057] The embodiment of the present invention can optimize the circuit design and ensure the performance of the circuit in practical applications by calculating the conversion inductance value of the converter to be constructed based on the switching frequency and the duty cycle. The conversion inductance value refers to the inductance value of the inductor used in the converter.
[0058] As an embodiment of the present invention, the calculating the conversion inductance value of the converter to be constructed based on the switching frequency and the duty cycle includes: Obtaining a smoothed DC voltage corresponding to the converter to be constructed; measuring an input converter current of the converter to be constructed; Based on the input converter current, switching frequency and duty cycle, the conversion inductance value of the converter to be constructed is calculated using the following formula: in, Indicates the conversion inductance value, represents the switching frequency, represents the duty cycle, represents the smoothed DC voltage, is the input converter current.
[0059] The input converter current refers to the total current at the input end of the converter.
[0060] Optionally, the measuring of the input converter current of the converter to be constructed may be performed by using a voltage sensor.
[0061] The embodiment of the present invention can stabilize the output voltage, reduce voltage fluctuations, and ensure that the plasma knife works at a constant voltage by constructing the DC-DC converter of the converter to be constructed based on the conversion inductance value. The DC-DC converter refers to an electronic device that converts a DC voltage into another DC voltage.
[0062] Optionally, as an embodiment of the present invention, the DC-DC converter of the converter to be constructed based on the conversion inductance value may be constructed by determining a suitable conversion inductance based on the conversion inductance value.
[0063] S5. Based on the DC-DC converter, a control system of the plasma knife is constructed, and based on the control system, precise control of the plasma knife is performed.
[0064] The embodiment of the present invention constructs a control system of the plasma knife based on the DC-DC converter, which can automatically adjust the output of the DC-DC converter according to the working state of the plasma knife to adapt to different cutting conditions. The control system refers to a combination of electronic equipment, software and hardware for monitoring and adjusting the working state of the plasma knife.
[0065] As an embodiment of the present invention, the control system of the plasma knife is constructed based on the DC-DC converter, including: configuring a controller of the DC-DC converter; A sensor for configuring the plasma knife; Based on the sensor and the controller, a feedback mechanism of the plasma knife is constructed; calculating a response coefficient of the feedback mechanism; When the response coefficient meets the preset response coefficient threshold, a control system of the plasma knife is constructed according to the DC-DC converter, the controller, the sensor and the feedback mechanism.
[0066] Among them, the sensors include voltage sensors, current sensors and temperature sensors, etc. The controllers include microcontrollers, digital signal processors (DSPs), etc. The feedback mechanism refers to a mechanism used in a plasma knife to monitor the output signal and compare it with a reference signal, and then adjust the input signal according to the comparison result to achieve a control process of stable output. The response coefficient refers to a quantitative indicator of the degree of response to changes in the input signal in the feedback mechanism, and is a parameter used to measure the sensitivity and accuracy of the feedback mechanism to changes in the input signal. The preset hard coefficient threshold refers to a reference value of the response coefficient that is pre-set to ensure that the performance of the feedback mechanism meets specific requirements.
[0067] The embodiment of the present invention can ensure the safety and efficiency of the surgical process and improve the overall performance and reliability of the plasma knife by performing precise control of the plasma knife based on the control system.
[0068] Optionally, based on the control system, precise control of the plasma knife can be performed by adjusting the switching frequency and duty cycle of the DC-DC converter corresponding to the control system.
[0069] The embodiment of the present invention can achieve effective tissue cutting and coagulation by determining the target voltage requirement required by the plasma knife based on the application requirements, while avoiding damage to surrounding healthy tissues; optionally, the embodiment of the present invention can ensure that the plasma knife works stably in an electromagnetic environment by constructing the EMC filter of the plasma knife based on the input AC voltage and the electromagnetic interference state, thereby improving the performance and safety of the equipment; the embodiment of the present invention can stably convert the filtered AC voltage into a DC voltage by constructing the rectifier circuit of the filtered AC voltage based on the target voltage requirement; the embodiment of the present invention can reduce the pulsating component by calculating the filter capacitor value and the filter inductance value required to eliminate the pulsating component, thereby improving the stability of the voltage output and reducing fluctuations and noise; the embodiment of the present invention can stabilize the output voltage, reduce voltage fluctuations, and ensure that the plasma knife works at a constant voltage by constructing the DC-DC converter of the converter to be constructed based on the conversion inductance value, finally, the embodiment of the present invention can ensure safety and efficiency during surgery by executing precise control of the plasma knife based on the control system, thereby improving the overall performance and reliability of the plasma knife. Therefore, the present invention can improve the effect of precise control of the plasma knife.
[0070] like Figure 2 , which is a functional module diagram of a system for controlling a plasma surgical knife using EMC rectification and filtering technology provided by an embodiment of the present invention.
[0071] The system 200 for controlling a plasma scalpel using EMC rectification and filtering technology of the present invention can be installed in an electronic device. According to the functions to be implemented, the system 200 for controlling a plasma scalpel using EMC rectification and filtering technology can include a target voltage demand analysis module 201, an EMC filter construction module 202, a rectification and filtering circuit module 203, a DC-DC converter construction module 204 and a plasma scalpel control module 205. The module of the present invention can also be referred to as a unit, which refers to a series of computer program segments that can be executed by a processor of an electronic device and can complete fixed functions, which are stored in the memory of the electronic device.
[0072] In this embodiment, the functions of each module / unit are as follows: The target voltage requirement analysis module 201 is used to obtain the application requirements of the plasma knife, and determine the target voltage requirements required by the plasma knife based on the application requirements; The EMC filter construction module 202 is used to obtain the input AC voltage of the hospital standard medical electricity, analyze the electromagnetic interference state of the plasma knife based on the input AC voltage, and construct the EMC filter of the plasma knife based on the input AC voltage and the electromagnetic interference state; The rectifier filter circuit module 203 is used to filter the input AC voltage using the EMC filter to obtain a filtered AC voltage, construct a rectifier circuit for the filtered AC voltage based on the target voltage requirement, rectify the filtered AC voltage into a pulsating DC voltage using the rectifier circuit, analyze the pulsating component of the pulsating DC voltage, calculate the filter capacitor value and the filter inductor value required to eliminate the pulsating component, construct a filter circuit for the rectifier circuit based on the filter capacitor value, and smooth the pulsating DC voltage using the filter circuit to obtain a smoothed DC voltage; The DC-DC converter construction module 204 is used to determine the boost coefficient of the converter to be constructed corresponding to the plasma knife based on the smoothed DC voltage and the target voltage requirement, determine the switching frequency and duty cycle of the converter to be constructed based on the boost coefficient, calculate the conversion inductance value of the converter to be constructed based on the switching frequency and the duty cycle, and construct the DC-DC converter of the converter to be constructed based on the conversion inductance value; The plasma knife control module 205 is used to construct a control system of the plasma knife based on the DC-DC converter, and to perform precise control of the plasma knife based on the control system.
[0073] In the several embodiments provided by the present invention, it should be understood that the provided system and method can be implemented in other ways. For example, the system embodiment described above is only illustrative, for example, the division of the modules is only a logical function division, and there may be other division methods in actual implementation.
[0074] In addition, each functional module in each embodiment of the present invention may be integrated into one processing unit, each unit may exist physically separately, or two or more units may be integrated into one unit. The above-mentioned integrated unit may be implemented in the form of hardware or in the form of hardware plus software functional modules.
[0075] Finally, it should be noted that the above embodiments are only used to illustrate the technical solution of the present invention rather than to limit it. Although the present invention has been described in detail with reference to the preferred embodiments, those skilled in the art should understand that the technical solution of the present invention can be modified or replaced by equivalents without departing from the spirit and scope of the technical solution of the present invention.
Claims
1. A method for controlling a plasma surgical knife using EMC rectification and filtering technology, characterized in that: The method comprises: Obtaining application requirements of the plasma knife, and determining target voltage requirements required by the plasma knife based on the application requirements; Acquire an input AC voltage of hospital standard medical electricity, analyze the electromagnetic interference state of the plasma knife based on the input AC voltage, and construct an EMC filter of the plasma knife based on the input AC voltage and the electromagnetic interference state; Filtering the input AC voltage by using the EMC filter to obtain a filtered AC voltage, constructing a rectifier circuit for the filtered AC voltage based on the target voltage requirement, rectifying the filtered AC voltage into a pulsating DC voltage by using the rectifier circuit, analyzing the pulsating component of the pulsating DC voltage, calculating the filter capacitance value and the filter inductance value required to eliminate the pulsating component, constructing a filter circuit for the rectifier circuit based on the filter capacitance value, and smoothing the pulsating DC voltage by using the filter circuit to obtain a smoothed DC voltage; Based on the smoothed DC voltage and the target voltage requirement, determining a boost coefficient of the converter to be constructed corresponding to the plasma knife, determining a switching frequency and a duty cycle of the converter to be constructed based on the boost coefficient, calculating a conversion inductance value of the converter to be constructed based on the switching frequency and the duty cycle, and constructing a DC-DC converter of the converter to be constructed based on the conversion inductance value; Based on the DC-DC converter, a control system of the plasma knife is constructed, and based on the control system, precise control of the plasma knife is performed.
2. The method for controlling a plasma surgical knife using EMC rectification and filtering technology as claimed in claim 1, characterized in that: The method of constructing the EMC filter of the plasma knife based on the input AC voltage and the electromagnetic interference state comprises: Based on the electromagnetic interference state, analyzing the electromagnetic interference type and electromagnetic interference frequency of the plasma knife; analyzing an AC voltage parameter of the input AC voltage; Determining a filter topology for constructing the EMC filter according to the electromagnetic interference type, the electromagnetic interference frequency, and the AC voltage parameters; Determining the cutoff frequency of the filter topology by the electromagnetic interference frequency, wherein the cutoff frequency includes: a common mode cutoff frequency and a differential mode cutoff frequency; Analyzing the common mode capacitance and the differential mode capacitance of the filter topology according to the cut-off frequency; Calculating a common-mode inductance and a differential-mode inductance of the filter topology based on the cut-off frequency, the common-mode capacitance, and the differential-mode capacitance; Determining a common-mode choke and a differential-mode choke of the filter topology based on the common-mode inductance and the differential-mode inductance; Constructing an initial filter of the plasma knife according to the common mode choke, the differential mode choke, the common mode capacitor, the differential mode capacitor and the filter topology; Performing simulation test on the initial filter to obtain filtering test result; Calculating the insertion loss coefficient of the initial filter according to the filtering test result; When the insertion loss coefficient meets a preset loss coefficient threshold, the EMC initial filter is used as an EMC filter.
3. The method for controlling a plasma surgical knife using EMC rectification and filtering technology as claimed in claim 2, characterized in that: The step of calculating the insertion loss coefficient of the initial filter according to the filtering test result includes: Extracting the test input voltage, the test output voltage and the filter power from the test result; Calculating the insertion loss of the initial filter according to the test input voltage and the test output voltage; The insertion loss coefficient of the initial filter is determined by the insertion loss and the filter power.
4. The method for controlling a plasma surgical knife using EMC rectification and filtering technology as claimed in claim 1, characterized in that: The rectifier circuit for filtering the AC voltage based on the target voltage requirement includes: Analyze target voltage parameters of the target voltage requirement; Determining a rectification circuit type of the filtered AC voltage based on the target voltage parameter; According to the type of the rectifier circuit, determining a circuit topology structure for constructing the rectifier circuit; A diode configured with the circuit topology; Based on the diode and the circuit topology, a rectifier circuit for filtering the AC voltage is constructed.
5. The method for controlling a plasma surgical knife using EMC rectification and filtering technology as claimed in claim 1, characterized in that: The calculation of the filter capacitance value and the filter inductance value required to eliminate the pulsation component includes: determining a filter cutoff frequency required to eliminate the pulsation component; Analyzing the rectified output voltage and rectified output current of the rectifier circuit corresponding to the pulsating component; identifying a rectified voltage cycle of the rectified output voltage; extracting the voltage ripple frequency of the pulsating component; determining a peak current of the rectified output current; Based on the rectified output voltage, the rectified voltage period, the voltage ripple frequency and the peak current, a filter capacitance value required to eliminate the pulsating component is calculated. The inductance value required to eliminate the pulsation component is calculated according to the filter cut-off frequency and the filter capacitance value.
6. The method for controlling a plasma surgical knife using EMC rectification and filtering technology as claimed in claim 1, characterized in that: The filter circuit of the rectifier circuit is constructed based on the filter capacitance value and the filter inductance value, including: determining a filter circuit topology for constructing the filter circuit; Based on the filter capacitance value and the filter inductance value, determining a filter capacitance element and a filter inductance element for constructing the filter circuit; Based on the filter capacitor element, the filter inductor element and the filter circuit topology, a filter circuit of the rectifier circuit is constructed.
7. The method for controlling a plasma surgical knife using EMC rectification and filtering technology as claimed in claim 1, characterized in that: The step of determining the switching frequency and duty cycle of the converter to be constructed based on the boost coefficient includes: Acquiring the conduction state of the converter to be constructed; analyzing the conduction time of the conduction state; Based on the boost coefficient and the on-time, the switching frequency and the duty cycle of the converter to be constructed are calculated.
8. The method for controlling a plasma surgical knife using EMC rectification and filtering technology as claimed in claim 1, characterized in that: The calculating the conversion inductance value of the converter to be constructed based on the switching frequency and the duty cycle includes: Obtaining a smoothed DC voltage corresponding to the converter to be constructed; measuring an input converter current of the converter to be constructed; The conversion inductance value of the converter to be constructed is calculated based on the input converter current, the switching frequency and the duty cycle.
9. The method for controlling a plasma surgical knife using EMC rectification and filtering technology as claimed in claim 1, characterized in that: The control system of the plasma knife is constructed based on the DC-DC converter, including: configuring a controller of the DC-DC converter; A sensor for configuring the plasma knife; Based on the sensor and the controller, a feedback mechanism of the plasma knife is constructed; calculating a response coefficient of the feedback mechanism; When the response coefficient meets the preset response coefficient threshold, a control system of the plasma knife is constructed according to the DC-DC converter, the controller, the sensor and the feedback mechanism.
10. A system for controlling a plasma surgical knife using EMC rectification and filtering technology, characterized in that: A method for controlling a plasma surgical knife using EMC rectification and filtering technology as described in any one of claims 1 to 9, the system comprising: A target voltage requirement analysis module is used to obtain application requirements of the plasma knife and determine the target voltage requirements required by the plasma knife based on the application requirements; An EMC filter construction module, used to obtain an input AC voltage of a hospital standard medical electricity, analyze the electromagnetic interference state of the plasma knife based on the input AC voltage, and construct an EMC filter of the plasma knife based on the input AC voltage and the electromagnetic interference state; A rectifier and filter circuit module, used for filtering the input AC voltage by using the EMC filter to obtain a filtered AC voltage, constructing a rectifier circuit for the filtered AC voltage based on the target voltage requirement, rectifying the filtered AC voltage into a pulsating DC voltage by using the rectifier circuit, analyzing the pulsating component of the pulsating DC voltage, calculating the filter capacitance value and filter inductance value required to eliminate the pulsating component, constructing a filter circuit for the rectifier circuit based on the filter capacitance value, and smoothing the pulsating DC voltage by using the filter circuit to obtain a smoothed DC voltage; A DC-DC converter construction module, used to determine a boost coefficient of a converter to be constructed corresponding to the plasma knife based on the smoothed DC voltage and the target voltage requirement, determine a switching frequency and a duty cycle of the converter to be constructed based on the boost coefficient, calculate a conversion inductance value of the converter to be constructed based on the switching frequency and the duty cycle, and construct a DC-DC converter of the converter to be constructed based on the conversion inductance value; The plasma knife control module is used to construct a control system of the plasma knife based on the DC-DC converter, and to perform precise control of the plasma knife based on the control system.