Pure oxygen preparation device and air separation cold box
The pure oxygen production device addresses the issue of excessive cold box height by using a novel configuration with a pump body to pressurize and transport oxygen-rich liquid, reducing the crude argon tower's height and manufacturing costs while maintaining high-purity liquid oxygen production efficiency.
Patent Information
- Application Number
- CN202411542905.1
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2024-10-31
- Publication Date
- 2024-12-31
AI Technical Summary
The traditional high-purity liquid oxygen production process requires the crude argon I tower to be higher than the high-purity oxygen tower to overcome resistance differences, leading to increased manufacturing costs and transportation difficulties due to excessive cold box height.
A pure oxygen production device with a first and second crude argon tower, a high-purity oxygen tower, and a pump body, where the gas and liquid outlets are connected through pipelines and a pump body to facilitate pressurized transport of oxygen-rich liquid, eliminating the need for gravity flow and reducing the height of the crude argon tower.
The solution allows for the production of high-purity liquid oxygen with reduced cold box height and manufacturing costs by utilizing the pump body's pressurization capacity to transport oxygen-rich liquid, ensuring efficient production and component savings.
Smart Images

Figure CN119222944A_ABST
Abstract
Description
Technical Field
[0001] The present application relates to the technical field of air separation, and in particular to a pure oxygen preparation device and an air separation cold box. Background Art
[0002] High-purity liquid oxygen refers to liquid oxygen with a purity of 99.999% or above. In recent years, with the high-quality development of industries such as photovoltaics and electronics, the market demand for it has maintained a steady growth trend. High-purity liquid oxygen is usually produced by cryogenic method. The principle is to use low-temperature distillation to remove impurities (mainly argon, nitrogen, etc.) with a boiling point that is significantly different from that of liquid oxygen, so that its concentration after enrichment is also within the product purity requirements. At present, the most widely used in the industry is the single-tower distillation process for producing high-purity oxygen in combination with the crude argon I tower with argon air separation. This process is to extract a stream of oxygen-rich liquid from the crude argon I tower with argon air separation into the top of the high-purity oxygen tower, and then remove argon and nitrogen impurities therein to obtain high-purity oxygen.
[0003] In the traditional process, the raw liquid for producing high-purity liquid oxygen comes from the middle and lower part of the crude argon I tower. The raw liquid (oxygen-rich liquid) in the middle and lower part of the crude argon I tower enters the top of the high-purity oxygen tower by the pressure difference of the liquid static column. Therefore, when designing, the bottom height of the crude argon I tower needs to be higher than the top height of the high-purity oxygen tower to overcome the resistance difference. However, the superposition of the two heights will cause the total height of the cold box to exceed the standard, which will lead to an increase in manufacturing costs and transportation difficulties. Summary of the invention
[0004] The purpose of the present application is to provide a pure oxygen production device and an air separation cold box, thereby solving the problem that in the traditional high-purity liquid oxygen production process, the oxygen-rich liquid at the bottom of the crude argon I tower enters the top of the high-purity oxygen tower by relying on the liquid static liquid column pressure difference. Therefore, when designing, the bottom height of the crude argon I tower needs to be higher than the top height of the high-purity oxygen tower to overcome the resistance difference. However, the superposition of the heights of the two will cause the total height of the cold box to exceed the standard, which will in turn lead to the problem of increased manufacturing costs and transportation difficulties.
[0005] According to a first aspect of the present application, a pure oxygen production device is provided, which includes a first crude argon tower, a second crude argon tower, a high-purity oxygen tower and a pump body; the gas outlet at the top of the first crude argon tower and the gas outlet at the top of the high-purity oxygen tower are both connected to the gas inlet at the bottom of the second crude argon tower; the liquid outlet at the bottom of the second crude argon tower is connected to the liquid inlet at the top of the first crude argon tower and the liquid inlet at the top of the high-purity oxygen tower through a pump body; the first crude argon tower is used to perform preliminary distillation of the argon fraction from upstream, the second crude argon tower is used to perform deep distillation of the argon fraction from upstream, and the high-purity oxygen tower is used to distill the crude liquid argon from the second crude argon tower.
[0006] In any of the above technical solutions, further, a first separation layer and a first evaporator are arranged inside the high-purity oxygen tower, and pure liquid oxygen is stored at the bottom of the high-purity oxygen tower; the first evaporator is immersed in the pure liquid oxygen, and the first separation layer is arranged in the middle of the high-purity oxygen tower.
[0007] In any of the above technical solutions, further, a second separation layer and a second evaporator are provided inside the second crude argon tower, and crude liquid argon is stored at the bottom of the second crude argon tower; the second evaporator is immersed in the crude liquid argon, and the second separation layer is provided in the middle of the second crude argon tower; the industrial gas after deep distillation of the second crude argon tower is discharged from the gas outlet at the top of the second crude argon tower.
[0008] In any of the above technical solutions, further, a third separation layer and a third evaporator are provided inside the first crude argon tower, and crude liquid oxygen is stored at the bottom of the first crude argon tower; the third evaporator is immersed in the crude liquid oxygen, and the third separation layer is provided in the middle of the first crude argon tower; the argon fraction from the upstream enters through the air inlet at the bottom of the first crude argon tower.
[0009] In any of the above technical solutions, further, the gas outlet at the top of the first crude argon tower and the gas outlet at the top of the high-purity oxygen tower are both connected to the gas inlet at the bottom of the second crude argon tower through a first pipeline.
[0010] In any of the above technical solutions, further, the liquid outlet at the bottom of the second crude argon tower is connected to the liquid inlet at the top of the first crude argon tower and the liquid inlet at the top of the high-purity oxygen tower through a second pipeline; and the pump body is arranged in the second pipeline.
[0011] In any of the above technical solutions, further, in the height direction, the top of the first crude argon tower and the top of the high-purity oxygen tower are aligned.
[0012] In any of the above technical solutions, further, in the height direction, the first crude argon tower and the high-purity oxygen tower are both located in the middle of the second crude argon tower; the pure liquid oxygen stored at the bottom of the high-purity oxygen tower can be delivered to the downstream storage equipment by gravity flow.
[0013] In any of the above technical solutions, further, the number of tower plates in the third separation layer is 5 to 7.
[0014] According to a second aspect of the present application, an air separation cold box is provided, comprising the pure oxygen production device as described above.
[0015] The pure oxygen production device of the present application comprises a first crude argon tower, a second crude argon tower, a high-purity oxygen tower and a pump body. The gas outlet at the top of the first crude argon tower and the gas outlet at the top of the high-purity oxygen tower are both connected to the gas inlet at the bottom of the second crude argon tower; the liquid outlet at the bottom of the second crude argon tower is connected to the liquid inlet at the top of the first crude argon tower and the liquid inlet at the top of the high-purity oxygen tower through the pump body; the first crude argon tower is used to perform preliminary distillation of the argon fraction from the upstream, the second crude argon tower is used to perform deep distillation of the argon fraction from the upstream, and the high-purity oxygen tower is used to distill the crude liquid argon from the second crude argon tower.
[0016] According to the above technical features, the beneficial effects of this application are:
[0017] The production process of the pure oxygen production device of the present application is as follows: the argon fraction I from the upstream enters the first crude argon tower for preliminary distillation, the gas drawn from the top of the first crude argon tower and the gas drawn from the top of the high-purity oxygen tower are combined into argon fraction II and enter the second crude argon tower, and the crude liquid argon at the bottom of the second crude argon tower returns to the first crude argon tower and the high-purity oxygen tower. Argon fraction II is deeply distilled in the second crude argon tower, the process argon gas at the top of the second crude argon tower is extracted and sent to the downstream device, and the crude liquid argon at the bottom of the second crude argon tower is pressurized by the pump body and transported to the top of the first crude argon tower and the top of the high-purity oxygen tower as reflux liquid. After the crude liquid argon is distilled in the high-purity oxygen tower, a high-purity liquid oxygen product is obtained at the bottom.
[0018] As described above, compared with the prior art, the present application can obtain a high-purity liquid oxygen product with a relatively high purity at the bottom of the high-purity oxygen tower. Moreover, the present application does not need a highly stacked method to overcome the resistance difference as in the prior art. The present application cleverly utilizes the pressurization capacity of the pump body to transport oxygen-rich liquid air, abandoning the traditional gravity flow method, so that the bottom height of the first crude argon tower is not limited by the height of the high-purity oxygen tower, so the height of the first crude argon tower can be reduced, thereby reducing the total height of the cold box.
[0019] In order to make the above-mentioned objects, features and advantages of the present application more obvious and easy to understand, preferred embodiments are specifically cited below and described in detail with reference to the attached drawings. BRIEF DESCRIPTION OF THE DRAWINGS
[0020] In order to more clearly illustrate the technical solutions of the embodiments of the present application, the drawings required for use in the embodiments will be briefly introduced below. It should be understood that the following drawings only show certain embodiments of the present application and therefore should not be regarded as limiting the scope. For ordinary technicians in this field, other related drawings can be obtained based on these drawings without paying creative work.
[0021] Figure 1 A schematic diagram of the process flow of a pure oxygen production device according to an embodiment of the present application is shown.
[0022] Icons: 10-first crude argon tower; 11-third separation layer; 20-second crude argon tower; 21-second separation layer; 30-high purity oxygen tower; 31-first separation layer; 32-first evaporator; 40-pump body; 50-first pipeline; 60-second pipeline. DETAILED DESCRIPTION
[0023] The following specific embodiments are provided to help the reader obtain a comprehensive understanding of the methods, devices and / or systems described herein. However, after understanding the disclosure of the present application, various changes, modifications and equivalents of the methods, devices and / or systems described herein will be apparent. For example, the order of operations described herein is merely an example, and is not limited to the order set forth herein, but in addition to the operations that must occur in a particular order, changes that will be apparent after understanding the disclosure of the present application may be made. In addition, in order to improve clarity and brevity, descriptions of features known in the art may be omitted.
[0024] The features described herein may be implemented in different forms and should not be interpreted as being limited to the examples described herein. Rather, the examples described herein have been provided only to illustrate some of the many possible ways of implementing the methods, devices and / or systems described herein that will be apparent after understanding the disclosure of the present application.
[0025] Throughout the specification, when an element (such as a layer, region, or substrate) is described as being “on”, “connected to”, “bound to”, “over”, or “covering” another element, it may be directly “on”, “connected to”, “bound to”, “over”, or “covering” another element, or one or more other elements may be present between them. In contrast, when an element is described as being “directly on”, “directly connected to”, “directly bound to”, “directly over”, or “directly covering” another element, there may be no other elements present between them.
[0026] As used herein, the term "and / or" includes any one of the associated listed items and any combination of any two or more items.
[0027] Although terms such as "first," "second," and "third" may be used herein to describe various members, components, regions, layers, or portions, these members, components, regions, layers, or portions are not limited by these terms. Rather, these terms are only used to distinguish one member, component, region, layer, or portion from another member, component, region, layer, or portion. Therefore, without departing from the teachings of the examples described herein, the first member, component, region, layer, or portion referred to may also be referred to as the second member, component, region, layer, or portion.
[0028] For ease of description, spatial relational terms such as "above", "upper", "below", and "lower" may be used herein to describe the relationship of one element to another element as shown in the accompanying drawings. Such spatial relational terms are intended to include different orientations of the device in use or operation in addition to the orientation depicted in the accompanying drawings. For example, if the device in the accompanying drawings is turned over, an element described as being "above" or "upper" relative to another element will subsequently be "below" or "lower" relative to the other element. Therefore, the term "above" includes both "above" and "below" orientations depending on the spatial orientation of the device. The device may also be positioned in other ways (e.g., rotated 90 degrees or in other orientations), and the spatial relational terms used herein will be interpreted accordingly.
[0029] The terms used herein are only used to describe various examples and are not used to limit the present disclosure. Unless the context clearly indicates otherwise, the singular form is also intended to include the plural form. The terms "include", "comprise" and "have" list the stated features, quantities, operations, components, elements and / or their combinations that exist, but do not exclude the existence or addition of one or more other features, quantities, operations, components, elements and / or their combinations.
[0030] Variations in the shapes shown in the drawings may occur due to manufacturing techniques and / or tolerances. Therefore, the examples described herein are not limited to the specific shapes shown in the drawings but include variations in shapes that occur during manufacturing.
[0031] The features of the examples described herein may be combined in various ways that will be apparent after understanding the disclosure of the present application. In addition, although the examples described herein have various configurations, other configurations are possible as will be apparent after understanding the disclosure of the present application.
[0032] Before the present application was put forward, the most widely used process in the industry was a single-tower distillation process for producing high-purity oxygen in combination with an argon-containing air separation crude argon I tower (the crude argon I tower is similar to the first crude argon tower 10 of the present application). The process is to extract a stream of oxygen-rich liquid from the argon-containing air separation crude argon I tower and enter the top of the high-purity oxygen tower, and then remove argon and nitrogen impurities therein to obtain high-purity oxygen.
[0033] However, in the traditional process, the raw liquid for preparing high-purity liquid oxygen comes from the middle and lower part of the crude argon I tower. The raw liquid (oxygen-rich liquid) in the middle and lower part of the crude argon I tower enters the top of the high-purity oxygen tower by the liquid static liquid column pressure difference. Therefore, when designing, the bottom height of the crude argon I tower needs to be higher than the top height of the high-purity oxygen tower to overcome the resistance difference. However, this height superposition of the two will cause the total height of the cold box to exceed the standard, which will lead to an increase in manufacturing costs and transportation difficulties.
[0034] In view of this, the first aspect of the present application provides a pure oxygen production device to solve the problem in the prior art that the high stacking of the crude argon I tower and the high purity oxygen tower will cause the total height of the cold box to exceed the standard, thereby increasing the manufacturing cost and making transportation difficult. Figure 1 A pure oxygen production device according to some embodiments of the present application is described.
[0035] like Figure 1 As shown, the pure oxygen production device of the present application includes a first crude argon tower 10, a second crude argon tower 20, a high purity oxygen tower 30 and a pump body 40. The gas outlet at the top of the first crude argon tower 10 and the gas outlet at the top of the high purity oxygen tower 30 are both connected to the gas inlet at the bottom of the second crude argon tower 20; the liquid outlet at the bottom of the second crude argon tower 20 is connected to the liquid inlet at the top of the first crude argon tower 10 and the liquid inlet at the top of the high purity oxygen tower 30 through the pump body 40; the first crude argon tower 10 is used to perform preliminary distillation of the argon fraction from the upstream, the second crude argon tower 20 is used to perform deep distillation of the argon fraction from the upstream, and the high purity oxygen tower 30 is used to distill the crude liquid argon from the second crude argon tower 20.
[0036] The production process of the pure oxygen production device of the present application is as follows: the argon fraction I from the upstream enters the first crude argon tower 10 for preliminary distillation, the gas drawn from the top of the first crude argon tower 10 and the gas drawn from the top of the high purity oxygen tower 30 merge into the argon fraction II and enter the second crude argon tower 20, and the crude liquid argon at the bottom of the second crude argon tower 20 returns to the first crude argon tower 10 and the high purity oxygen tower 30. The argon fraction II is deeply distilled in the second crude argon tower 20, the process argon gas at the top of the second crude argon tower 20 is extracted and sent to the downstream device, and the crude liquid argon at the bottom of the second crude argon tower 20 is pressurized by the pump body 40 and transported to the top of the first crude argon tower 10 and the top of the high purity oxygen tower 30 as reflux liquid. After the crude liquid argon is distilled in the high purity oxygen tower 30, a high purity liquid oxygen product is obtained at the bottom.
[0037] As described above, compared with the prior art, the present application can obtain a high-purity liquid oxygen product at the bottom of the high-purity oxygen tower 30. Moreover, the present application does not need a highly stacked method to overcome the resistance difference as in the prior art. The present application cleverly utilizes the pressurization capacity of the pump body 40 to transport oxygen-rich liquid air, abandoning the traditional gravity flow method, so that the bottom height of the first crude argon tower 10 is not limited by the height of the high-purity oxygen tower 30, so the height of the first crude argon tower 10 can be reduced, thereby reducing the total height of the cold box.
[0038] In the embodiments of the present application, further, Figure 1 As shown, the gas outlet at the top of the first crude argon column 10 and the gas outlet at the top of the high purity oxygen column 30 are connected to the gas inlet at the bottom of the second crude argon column 20 through the first pipeline 50. In this way, while ensuring the good production of high purity liquid oxygen products, the device components can be further saved and the volume of the cold box can be reduced.
[0039] In the embodiments of the present application, further, Figure 1 As shown, the liquid outlet at the bottom of the second crude argon tower 20 is connected to the liquid inlet at the top of the first crude argon tower 10 and the liquid inlet at the top of the high purity oxygen tower 30 through the second pipeline 60; the pump body 40 is arranged on the second pipeline 60 to pressurize and transport the crude liquid argon at the bottom of the second crude argon tower 20 to the top of the first crude argon tower 10 and the top of the high purity oxygen tower 30 as reflux liquid. In this way, the reflux of the top of the first crude argon tower 10 and the top of the high purity oxygen tower 30 can be completed through a second pipeline 60 and a pump body 40, which can further save device components and reduce the volume of the cold box.
[0040] In the embodiment of the present application, preferably, the pump body 40 is a centrifugal pump or a piston pump. Alternatively, the pump body 40 is a variable frequency pump.
[0041] In the examples of this application, see Figure 1 A first separation layer 31 and a first evaporator 32 are arranged inside the high purity oxygen tower 30 , and pure liquid oxygen (high purity oxygen) is stored at the bottom of the high purity oxygen tower 30 ; the first evaporator 32 is immersed in pure liquid oxygen, and the first separation layer 31 is arranged in the middle of the high purity oxygen tower 30 .
[0042] The second crude argon tower 20 is provided with a second separation layer 21 and a second evaporator, and crude liquid argon is stored at the bottom of the second crude argon tower 20; the second evaporator is immersed in the crude liquid argon, and the second separation layer 21 is arranged in the middle of the second crude argon tower 20; the industrial gas after deep distillation of the second crude argon tower 20 is discharged from the gas outlet at the top of the second crude argon tower 20.
[0043] The first crude argon tower 10 is provided with a third separation layer 11 and a third evaporator inside, and crude liquid oxygen is stored at the bottom of the first crude argon tower 10; the third evaporator is immersed in the crude liquid oxygen, and the third separation layer 11 is arranged in the middle of the first crude argon tower 10; the argon fraction from the upstream enters through the air inlet at the bottom of the first crude argon tower 10.
[0044] The preparation process of the pure oxygen preparation device of the present application is as follows: from the upstream argon fraction I (gaseous, containing 90% O 2 , 10% Ar and a small amount of N 2 , 100ppmN2 and ~10ppm hydrocarbons, etc.) enter the first crude argon tower 10 for preliminary distillation, and the lead gas with most of the hydrocarbons removed is obtained at the top of the first crude argon tower 10. The lead gas at the top of the first crude argon tower 10 is combined with the lead gas at the top of the high-purity oxygen tower 30 to form an argon fraction II (gaseous, containing 83.5% O 2 、16.5%Ar、100ppmN 2 and 0.001ppm hydrocarbons, etc.) enter the second crude argon tower 20, and the crude liquid oxygen / crude liquid argon (liquid, containing 93.5% O 2 、6.5%Ar、30ppmN 2 The argon fraction II is subjected to deep distillation in the second crude argon tower 20, and the process argon gas at the top of the second crude argon tower 20 is extracted and sent to the downstream device (the process argon gas at the top of the tower, gaseous, contains 99.7% Ar and 0.3% N 2 ), the crude liquid argon at the bottom of the second crude argon tower 20 is pressurized by the pump body 40 (the crude liquid argon at the bottom of the second crude argon tower 20 is liquid and contains 86% O 2 、14%N 2 and 0.01ppm hydrocarbons) are respectively transported to the top of the first crude argon tower 10 and the high purity oxygen tower 30 as reflux liquid. After the crude liquid argon is rectified in the high purity oxygen tower 30, a high purity liquid oxygen product (liquid, containing 99.999% O 2 、5ppmN 2 and 0.5ppm hydrocarbons) and is delivered to downstream storage equipment by gravity flow.
[0045] In this embodiment, the first evaporator 32 is taken as an example. The first evaporator 32 is a heat exchange device used for re-evaporating the liquid oxygen at the bottom of the high-purity oxygen tower 30 to serve as the rising gas for distillation. In the high-purity oxygen tower 30, the crude liquid oxygen / crude liquid argon exchanges heat and mass with the rising gas from top to bottom on the first filler, and obtains high-purity liquid oxygen at the bottom of the tower.
[0046] A second aspect of the present application provides an air separation cold box, comprising the pure oxygen production device as described above.
[0047] In summary, compared with the prior art, the present application can obtain a high-purity liquid oxygen product with a relatively high purity at the bottom of the high-purity oxygen tower 30. Moreover, the present application does not need a highly stacked method to overcome the resistance difference as in the prior art. The present application cleverly utilizes the pressurization capacity of the pump body 40 to transport oxygen-rich liquid air, abandoning the traditional gravity flow method, so that the bottom height of the first crude argon tower 10 is not limited by the height of the high-purity oxygen tower 30, so the height of the first crude argon tower 10 can be reduced, thereby reducing the total height of the air separation cold box.
[0048] In addition, it is worth mentioning that in the prior art, the first crude argon tower and the high-purity oxygen tower are arranged in a highly stacked manner. The high-purity oxygen tower is located at the bottom of the cold box, and the high-purity liquid oxygen at the bottom needs to be pressurized by a pump body before it can be sent to the downstream storage equipment.
[0049] In this regard, in the height direction, the top of the first crude argon tower 10 and the top of the high-purity oxygen tower 30 are aligned and arranged, and there is no need to arrange them in a highly stacked manner as in the prior art. Figure 1 As shown, in the height direction, the first crude argon tower 10 and the high purity oxygen tower 30 are both located in the middle of the second crude argon tower 20. The pure liquid oxygen stored at the bottom of the high purity oxygen tower 30 can be delivered to the downstream storage equipment by gravity flow, without the need to set up an additional pump body, thereby reducing costs.
[0050] In addition, it is worth mentioning that in the prior art, the oxygen-enriched liquid extracted from the first crude argon column 10 has a low oxygen content and a high hydrocarbon content, which in turn leads to a low oxygen content in the high-purity liquid oxygen finally produced.
[0051] In this regard, the number of plates of the third separation layer of the present application is 5 to 7. In this way, while the oxygen content in the gas drawn out from the top of the first crude argon tower 10 is increased as much as possible (the higher the oxygen content, the more oxygen enters the crude argon II tower, and the more raw liquid for producing high-purity oxygen), the gas is drawn out at a reasonable position of the number of plates and sent to the high-purity oxygen tower 30, and most of the hydrocarbons in the argon fraction I are removed, so that the crude liquid argon at the bottom of the second crude argon tower 20 meets the requirements for producing high-purity oxygen raw liquid (high oxygen content and low hydrocarbons).
[0052] Finally, it should be noted that the above-described embodiments are only specific implementation methods of the present application, which are used to illustrate the technical solutions of the present application rather than to limit them. The protection scope of the present application is not limited thereto. Although the present application has been described in detail with reference to the aforementioned embodiments, ordinary technicians in this field should understand that any technician familiar with this technical field can still modify the technical solutions recorded in the aforementioned embodiments within the technical scope disclosed in the present application, or make equivalent replacements for some of the technical features therein; and these modifications, changes or replacements do not deviate the essence of the corresponding technical solutions from the spirit and scope of the technical solutions of the embodiments of the present application, and should all be covered by the protection scope of the present application.
Claims
1. A pure oxygen production device, characterized in that: The pure oxygen production device comprises a first crude argon tower, a second crude argon tower, a high-purity oxygen tower and a pump body; The gas outlet at the top of the first crude argon tower and the gas outlet at the top of the high-purity oxygen tower are both connected to the gas inlet at the bottom of the second crude argon tower; The liquid outlet at the bottom of the second crude argon tower is connected to the liquid inlet at the top of the first crude argon tower and the liquid inlet at the top of the high-purity oxygen tower through a pump body; The first crude argon tower is used to perform preliminary distillation on the argon fraction from upstream, the second crude argon tower is used to perform deep distillation on the argon fraction from upstream, and the high purity oxygen tower is used to perform distillation on the crude liquid argon from the second crude argon tower.
2. The pure oxygen production device according to claim 1, characterized in that: The high-purity oxygen tower is provided with a first separation layer and a first evaporator, and pure liquid oxygen is stored at the bottom of the high-purity oxygen tower; The first evaporator is immersed in the pure liquid oxygen, and the first separation layer is arranged in the middle of the high-purity oxygen tower.
3. The pure oxygen production device according to claim 1, characterized in that: A second separation layer and a second evaporator are arranged inside the second crude argon column, and crude liquid argon is stored at the bottom of the second crude argon column; The second evaporator is immersed in the crude liquid argon, and the second separation layer is arranged in the middle of the second crude argon column; The industrial gas after deep distillation in the second crude argon tower is discharged from the gas outlet at the top of the second crude argon tower.
4. The pure oxygen production device according to claim 1, characterized in that: A third separation layer and a third evaporator are arranged inside the first crude argon column, and crude liquid oxygen is stored at the bottom of the first crude argon column; The third evaporator is immersed in the crude liquid oxygen, and the third separation layer is arranged on the top of the first crude argon column; The argon fraction from upstream enters from the gas inlet at the bottom of the first crude argon column.
5. The pure oxygen production device according to claim 1, characterized in that: The gas outlet at the top of the first crude argon tower and the gas outlet at the top of the high-purity oxygen tower are both connected to the gas inlet at the bottom of the second crude argon tower through a first pipeline.
6. The pure oxygen production device according to claim 1, characterized in that: The liquid outlet at the bottom of the second crude argon tower is connected to the liquid inlet at the top of the first crude argon tower and the liquid inlet at the top of the high-purity oxygen tower through a second pipeline; The pump body is arranged on the second pipeline.
7. The pure oxygen production device according to claim 1, characterized in that: In the height direction, the top of the first crude argon tower and the top of the high-purity oxygen tower are aligned.
8. The pure oxygen production device according to claim 1, characterized in that: In the height direction, the first crude argon tower and the high-purity oxygen tower are both located in the middle of the second crude argon tower; the pure liquid oxygen stored at the bottom of the high-purity oxygen tower can be delivered to the downstream storage equipment by gravity flow.
9. The pure oxygen production device according to claim 4, characterized in that: The third separation layer has 5 to 7 plates.
10. An air separation cold box, characterized in that: It comprises the pure oxygen production device as described in any one of claims 1 to 9.