Flexible supply structure, positioning module and lithographic apparatus

Abstract

The invention provides a flexible supply structure for connecting a first movable object with a second object, where the flexible supply structure comprises a first permanent magnet having a first magnetic field orientation, where the flexible supply structure is arranged to be at least partially supported by a support comprising a second magnet having a second magnetic field orientation, the first permanent magnet and the second magnet face each other such that when the first permanent magnet and the second magnet face each other, the first permanent magnet and the second magnet repel to apply a force on the flexible supply structure.

Description

[0001] CROSS-REFERENCE TO RELATED APPLICATIONS

[0002] This application claims priority to EP application 22176118.2 filed on May 30, 2022, which is incorporated herein by reference in its entirety. Technical Field

[0003] The invention relates to a flexible supply structure and a positioning module comprising the flexible supply structure. The invention also relates to a lithography device comprising the positioning module. Background Art

[0004] A lithographic apparatus is a machine configured to apply a desired pattern onto a substrate. A lithographic apparatus may be used, for example, in the manufacture of integrated circuits (ICs). A lithographic apparatus may, for example, project a pattern at a patterning device (e.g., a mask) onto a layer of radiation-sensitive material (resist) provided on a substrate.

[0005] To project a pattern onto a substrate, a lithographic apparatus may use electromagnetic radiation. The wavelength of the radiation determines the minimum size of a feature that can be formed on the substrate. Compared to a lithographic apparatus that may use radiation with a wavelength of 193 nm, for example, a lithographic apparatus that uses extreme ultraviolet (EUV) radiation with a wavelength in the range of 4-20 nm (e.g., 6.7 nm or 13.5 nm) may be used to form smaller features on a substrate.

[0006] The lithographic apparatus comprises a movable object requiring supplies. For example, these supplies comprise fluids (e.g., cooling fluids or vacuum), electrical power (e.g., electrical power or control and measurement signals), and / or optical signals. In order to bring these supplies to the movable object, a flexible supply structure comprising a supply hose and / or a supply cable may be provided to allow a flexible connection of the supply hose and / or the supply cable between the movable object and another object.

[0007] In one embodiment, the flexible supply structure can be, for example, a C-shaped cable board including a supply hose and / or a supply cable, which is at least partially supported on a support. The support can be a sliding plate, on which the supply hose and / or the supply cable are mechanically supported. Typically, the C-shaped cable board is oriented in the direction of movement of the movable object, i.e. the supply hose and / or the supply cable extend in a plane extending in the main direction of movement and in the vertical direction of the movable object. When the movable object moves in the main direction of movement, the C-shaped cable board can roll back and forth, with a smaller or larger portion of the cable board being supported by the support.

[0008] In some embodiments, the movable object is arranged to be movable in at least a first horizontal direction, and the movable object is supported on a second movable object that is movable in a second horizontal direction. The acceleration of the second movable object in the second horizontal direction may cause inertial forces of the cable plate in the second horizontal direction. These inertial forces may cause the cable plate to slide on the supporting surface of the support, which may cause wear of the supporting surface, the supply hose and / or the supply cable. This wear may have a serious negative impact on the maximum service life of the supply hose and / or the supply cable. In addition, particles released from the supporting surface, the supply hose and / or the supply cable due to wear may cause substrate defects in the lithography process. Summary of the invention

[0009] The object of the present invention is to provide an improved flexible supply structure. In particular, the object of the present invention is to provide a flexible supply structure which is less susceptible to wear and / or in which the generation of particles due to wear of the flexible supply structure and / or its support is significantly reduced.

[0010] According to one aspect of the present invention, there is provided a flexible supply structure (eg, a cable board) for connecting a first movable object to a second object.

[0011] wherein the flexible supply structure comprises a first permanent magnet having a first magnetic field orientation,

[0012] The flexible supply structure is arranged to be at least partially supported by a support member, which includes a second magnet having a second magnetic field orientation, so that when the first permanent magnet and the second magnet face each other, the first permanent magnet and the second magnet repel to exert a force (e.g., a lifting force) on the flexible supply structure.

[0013] According to one aspect of the present invention, there is provided a positioning module, comprising:

[0014] a first movable object;

[0015] Second object;

[0016] A flexible supply structure according to any one of claims 1 to 7, wherein a first end of the flexible supply structure is connected to the first object and a second end of the flexible supply structure is connected to the second object; and

[0017] A support, wherein the support includes a second magnet having a second magnetic field orientation such that when the first permanent magnet and the second magnet face each other, the first permanent magnet and the second magnet repel to exert a force (e.g., a lifting force) on the flexible supply structure.

[0018] According to an aspect of the present invention, there is provided a lithography device, comprising a positioning module according to any one of claims 8-17. BRIEF DESCRIPTION OF THE DRAWINGS

[0019] Embodiments of the invention will now be described, by way of example only, with reference to the accompanying schematic drawings, in which:

[0020] Figure 1 A lithography system including a lithography apparatus and a radiation source is depicted;

[0021] Figure 2 depicts a positioning module including a flexible supply structure according to an embodiment of the present invention;

[0022] Figure 3 Depicted Figure 2 A side view of a flexible supply structure;

[0023] Figure 4 Shows Figure 2 a cross-section of a lower portion of the flexible supply structure;

[0024] Figure 5A-5C Shows Figure 2 The different positions of the positioning modules; and

[0025] Figure 6 A cross section of an alternative embodiment of the lower part of a flexible supply structure according to the invention is shown. DETAILED DESCRIPTION

[0026] Figure 1 A lithographic system is shown comprising a radiation source SO and a lithographic apparatus LA. The radiation source SO is configured to generate an EUV radiation beam B and to provide the EUV radiation beam B to the lithographic apparatus LA. The lithographic apparatus LA comprises an illumination system IL, a support structure MT configured to support a patterning device MA (e.g. a mask), a projection system PS, and a substrate table WT configured to support a substrate W.

[0027] The substrate table positioning system WTP is arranged to position the substrate table WT in a desired position. The substrate positioning system WTP comprises a position measurement system for measuring the position of the substrate table WT, and an actuation system for moving the substrate table WT to the desired position. The patterning device support positioning system MTP is arranged to position the support structure MT in a desired position. The patterning device support positioning system MTP also comprises a position measurement system for measuring the position of the support structure MT, and an actuation system for moving the support structure MT to the desired position.

[0028] The illumination system IL is configured to condition the EUV radiation beam B before it is incident on the patterning device MA. Thereby, the illumination system IL may comprise a faceted field mirror arrangement 10 and a faceted pupil mirror arrangement 11. The faceted field mirror arrangement 10 and the faceted pupil mirror arrangement 11 together provide a desired cross-sectional shape and a desired intensity distribution for the EUV radiation beam B. The illumination system IL may comprise other mirrors or arrangements in addition to or instead of the faceted field mirror arrangement 10 and the faceted pupil mirror arrangement 11.

[0029] After this conditioning, the EUV radiation beam B interacts with the pattern forming device MA. As a result of this interaction, a patterned EUV radiation beam B' is generated. The projection system PS is configured to project the patterned EUV radiation beam B' onto the substrate W. To this end, the projection system PS may include a plurality of mirrors 13, 14, which are configured to project the patterned EUV radiation beam B' onto the substrate W held by the substrate table WT. The projection system PS may apply a reduction factor to the patterned EUV radiation beam B', thereby forming an image having features that are smaller than corresponding features on the pattern forming device MA. For example, a reduction factor of 4 or 8 may be applied. Although in Figure 1 The projection system PS is shown in FIG. 2 with only two mirrors 13 , 14 , but the projection system PS may comprise a different number of mirrors (eg six or eight mirrors).

[0030] The substrate W may include a previously formed pattern. In this case, the lithographic apparatus LA aligns an image formed by the patterned EUV radiation beam B′ with a pattern previously formed on the substrate W.

[0031] A relative vacuum, ie a small amount of gas (eg hydrogen) at a pressure well below atmospheric pressure, may be provided in the radiation source SO, illumination system IL and / or projection system PS.

[0032] The radiation source SO may be a laser produced plasma (LPP) source, a discharge produced plasma (DPP) source, a free electron laser (FEL), or any other radiation source capable of producing EUV radiation.

[0033] The lithography process comprises a series of projection phases, in which a patterned EUV radiation beam B' is projected onto a substrate W (exposure phase) and / or the substrate W is aligned with the patterned EUV radiation beam B' (alignment phase), and an idle phase, in which no patterned EUV radiation beam B' is projected onto the substrate W, or is projected onto an irrelevant part of the substrate, and the positioning accuracy of the substrate W relative to the patterned EUV radiation beam B' is less important. During the projection phases, the patterning device and the substrate may be subjected to a scanning movement at a constant scanning speed. The idle phase may be used to decelerate and (re)accelerate the patterning device MT and the substrate W to a desired scanning speed, respectively, and to have a desired alignment relative to the EUV radiation beam B and the patterned EUV radiation beam B'. The constant scanning speed of the patterning device MT is typically different from the constant scanning speed of the substrate W.

[0034] Figure 2 A positioning module is shown, which includes a first movable object 20, a second movable object 21, and a base frame 22. The first movable object 20 is supported on the second movable object 21 and can move relative to the second movable object 21 in a first horizontal direction (e.g., x direction). The second movable object 21 is supported on the base frame 22 and can move relative to the base frame 22 in a second horizontal direction (e.g., y direction). An actuator may be provided to apply an actuation force on the first movable object 20 and the second movable object 21 to move the first movable object 20 and the second movable object 21 toward a desired position.

[0035] For example, the positioning module may be part of a substrate positioning system WTP arranged to position the substrate in a desired position.

[0036] It is desirable to exchange supplies, such as fluids (such as cooling fluids or vacuum), electricity (such as electrical power or electrical measurement or control signals), light (such as optical signals) between the first movable object 20 and the second movable object 21. Therefore, the positioning module includes a flexible supply structure 23 extending between the first movable object 20 and the second movable object 21 to exchange these supplies between the first movable object 20 and the second movable object 21. The flexible supply structure 23 is at least partially supported by a support 24.

[0037] Figure 3A side view of a flexible supply structure 23 and a support 24 is shown. The flexible supply structure 23 includes a plurality of supply hoses and supply cables 25 located between a first movable object 20 and a second movable object 21. The flexible supply structure 23 also includes a first clamping bracket 26, a second clamping bracket 27, and a third clamping bracket 28 for clamping the supply hoses and / or supply cables 25 to form a cable board. One end of the cable board is connected to a first manifold 29 mounted on the first movable object 20, and a second opposite end of the cable board is connected to a second manifold 30 mounted on the second movable object 21. The first manifold 29 and the second manifold 30 can be any structure or device arranged to connect the supply hoses and / or supply cables 25 to the first movable object 20 and the second movable object 21, respectively. The clamping brackets 26, 27, 28 each include a pair of clamping bars, and the plurality of supply hoses and supply cables 25 are clamped adjacent to each other between the clamping bars.

[0038] The cable plate is formed in a C-shape with a lower part, a middle part and an upper part. The C-shaped cable plate is oriented along the moving direction of the first movable object 20, i.e. the supply hose and / or the supply cable 25 all extend in a plane extending along the x-direction and the z-direction. When the first movable object 20 moves in the main moving direction, the C-shaped cable plate can roll back and forth, wherein a smaller or larger part of the cable plate is supported by the support.

[0039] Other flexible supply structures (not shown) similar to the flexible supply structure 23 between the first movable object 20 and the second movable object 21 may be provided between the second movable object 21 and the base frame 22 to exchange supplies between the second movable object 21 and the base frame 22. The other flexible supply structures will typically be oriented in the y-direction, i.e., the supply hoses and / or supply cables will extend in a plane extending in the y-direction and the z-direction.

[0040] In the prior art embodiment of the cable board, the support member can be formed as a sliding plate, and the supply hose and / or supply cable are mechanically supported on the sliding plate. The inertial force on the cable board caused by the acceleration of the second movable object in the y direction may cause the cable board to slide on the supporting surface of the sliding plate. This sliding may cause the wear of the supporting surface, the supply hose and / or the supply cable. This wear may have a serious negative impact on the maximum service life of the supply hose and / or the supply cable. In addition, the particles released due to the wear of the supporting surface, the supply hose and / or the supply cable may cause substrate defects in the photolithography process. In the cable board that does not move in the lateral direction, for example, on the cable board arranged between the fixed support object and the movable object that moves linearly in one direction, wear may also occur. For example, this wear may be caused by the incomplete alignment of the supply hose and / or the supply cable.

[0041] In order to prevent or reduce wear caused by mechanical contact between the support 24 and the flexible supply structure 23, the flexible supply structure 23 includes a plurality of first permanent magnets having a first magnetic field orientation, and the support 24 includes a plurality of second magnets having a second magnetic field orientation. Each first permanent magnet is associated with a second magnet, so that when the first permanent magnet and the associated second magnet face each other, the first permanent magnet and the second magnet repel each other so as to exert a lifting force on the flexible supply structure 23.

[0042] exist Figure 2 In the illustrated embodiment, the first permanent magnet and the second magnet are designed to support the flexible supply structure 23 in a floating state, i.e. there is no direct mechanical contact between the flexible supply structure 23 and the support 24. In an alternative embodiment, there may still be direct mechanical contact between the flexible supply structure 23 and the support 24, but the lifting force exerted on the flexible supply structure 22 by the first permanent magnet and the second magnet may greatly reduce the pressure of the flexible supply structure 23 against the support 24. Due to the reduced pressure, the friction between the flexible supply structure 23 and the support 24 is also reduced, which reduces the wear of the contact surfaces between the flexible supply structure 23 and the support 24 (such as the support surface, the contact surface of the supply hose and / or the supply cable 25).

[0043] Figure 4 A cross section of the lower part of a C-shaped flexible supply structure 23 is shown with a first clamping bracket 26 and a second clamping bracket 27. A first permanent magnet 31 is arranged in each of the first clamping bracket 26 and the second clamping bracket 27. Each first permanent magnet 31 is associated with a second permanent magnet 32 ​​arranged in the support 24.

[0044] Each first permanent magnet 31 has a first magnetic field orientation and each associated second permanent magnet 32 ​​has a second magnetic field orientation such that when the first permanent magnet 31 and the second permanent magnet 32 ​​face each other, the first permanent magnet 31 and the second permanent magnet 32 ​​repel to exert a lifting force on the flexible supply structure.

[0045] exist Figure 4 In the cross section shown, two first permanent magnets 31 in the clamping brackets 26, 27 and two second permanent magnets 32 in the support 24 are shown. A plurality of first permanent magnets 31 and a plurality of second permanent magnets 32 distributed in the length direction (y direction) of the clamping brackets 26, 27 and the support 24 can be arranged to obtain suitable support over the entire width (y direction) of the flexible supply structure 23.

[0046] As discussed, the magnetic fields of the first permanent magnet 31 and the second permanent magnet 32 ​​are selected so that the support 24 will support the flexible supply structure 23 in a floating manner, i.e. there is no direct mechanical contact between the flexible supply structure 23 and the support 24. As a safety measure, a collision element 33 is arranged in the support 24, thereby providing a safety surface in case one or both of the clamping brackets 26, 27 inadvertently engage the support 24. For example, the collision element 33 can be made of an elastic material capable of supporting the flexible support structure 23.

[0047] In the embodiment shown, the main axis of the first magnetic field orientation of the first permanent magnet 31 is arranged perpendicular to a tangent to the flexible supply structure at the location of the first permanent magnet 31, and the main axis of the second magnetic field orientation of the second permanent magnet 32 ​​is arranged vertically. Other suitable magnetic field orientations of the first magnetic field and the second magnetic field may also be used.

[0048] Figure 5A-5C The first movable object 20 is shown in different positions in the x direction. Figure 2 Positioning module.

[0049] Figure 5A Shown with Figure 2 The position in the figure substantially corresponds to the position of the first movable object 20. It can be seen that the support 24 supports the flexible supply structure 23 in a floating manner due to the upward magnetic force between the first permanent magnet 31 and the second permanent magnet 32. In this position of the first movable object 20, the first clamping bracket 26 is closer to the support 24 than the second clamping bracket 27, so that the upward magnetic force applied to the first clamping bracket 26 is greater than the upward magnetic force applied to the second clamping bracket 27. The rigidity of the multiple supply hoses and supply cables 25 maintains the flexible supply structure in a C-shape.

[0050] exist Figure 5B , the first movable object 20 has moved to the left. The C-shape rolls to the left, and the lower part of the C-shape is moved to a position closer to the support 24, so that the first clamping bracket 26 and the second clamping bracket 27 are at substantially the same distance from the support 24. Due to the magnetic force between the first permanent magnet 31 and the second permanent magnet 32, the flexible supply structure 23 is still supported in a floating manner.

[0051] exist Figure 5C In, with Figure 5A , the first movable object 20 moves to the right compared to the position of the first movable object 20. Due to this position of the first movable object 20, the second clamping bracket 27 is moved further away from the support 23, so that a smaller upward magnetic force is applied to the second clamping bracket 27. The first clamping bracket 26 is still spaced apart from the support 24, so the flexible support structure 23 is supported in a floating manner.

[0052] Since the flexible support structure 23 is not in direct mechanical contact with the support 24 in all positions of the first movable object 20 in the x-direction, wear of the flexible support structure 23, such as wear of the supply hose and the supply cable 25, due to friction between the flexible support structure 23 and the support 24 is prevented. This has a beneficial effect on the life of the flexible support structure 23 and reduces the amount of particles released due to wear.

[0053] Figure 6 An alternative embodiment of the lower part of the flexible supply structure 23 is shown. Figure 2 In the embodiment of the present invention, the flexible supply structure 23 comprises a first clamping bracket 26 and a second clamping bracket 27, each of which comprises a pair of clamping bars, between which a plurality of supply hoses and supply cables 25 are clamped in a row. In addition, each clamping bracket 26, 27 comprises at least one permanent magnet 31.

[0054] The support 24 includes second magnets 34, each second magnet 34 being associated with one of the first permanent magnets 31. The second magnets 34 are electromagnets having a second magnetic field that can be controlled by a magnetic field controller 35. The second magnetic field of the second magnets 34 associated with the first permanent magnets 31 in the first clamping bracket 26 can be controlled independently of the second magnetic field of the second magnets 34 associated with the first permanent magnets 31 in the second clamping bracket 27.

[0055] Each first permanent magnet 31 has a first magnetic field orientation, and each associated second magnet 34 has a second magnetic field orientation, so that when the first permanent magnet 31 and the second magnet 34 face each other, the first permanent magnet 31 and the second magnet 34 magnetically activated by the magnetic field controller 35 repel each other so as to exert a lifting force on the flexible supply structure 23.

[0056] The support member 24 is provided with a support element 36 to provide a suitable support surface for receiving the first clamping bracket 26 and the second clamping bracket 27. The support element 36 may be formed by Figure 4 As an alternative, the support element 36 may be made of another material suitable for supporting the first clamping bracket 26 and the second clamping bracket 27, such as polyethylene or another relatively hard plastic material.

[0057] exist Figure 6 In the state shown, there is direct mechanical contact between the first clamping bracket 26 and the associated support element 36 of the support 24. This position may be a rest position, in which the second magnet 34 is not magnetically activated by the magnetic field controller 35. This rest position may be used, for example, when the positioning module is not activated for use.

[0058] The position shown may also be a position during movement of the first movable object 20 of the positioning module. The second magnet 34 may be activated to exert a magnetic force on the first permanent magnet 31 to generate a lifting force on the flexible supply structure 23, thereby reducing the pressure of the first clamping bracket 26 against the support element 36.

[0059] It should be noted that in this embodiment the flexible supply structure 23 is supported on the first clamping bracket 26 and / or the second clamping bracket 27 rather than on the supply hose and supply cable 25 as in prior art embodiments.

[0060] Since the magnetic fields of the two second magnets 34 can be controlled independently, the magnetic force exerted on the flexible supply structure 23 can depend on the position of the flexible supply structure 23 and / or the first movable object 20 relative to the associated support element 36. For example, when the permanent magnet 31 moves towards the second magnet 34 due to the movement of the first movable object 20 in the left direction, the magnetic field of the second magnet 34 can be temporarily increased to decelerate the movement of the corresponding clamp bracket 26, 27 towards the support 24. For example, such a deceleration can advantageously prevent the corresponding clamp bracket 26, 27 from accidentally hitting the support element 36 when the supply structure 23 is supported in a floating manner, or can advantageously ensure that the corresponding clamp bracket 26, 27 falls smoothly on the support element 36 while allowing mechanical contact between the support element 36 and the corresponding clamp bracket 26, 27.

[0061] In the above, a flexible supply structure 23 having a C-shaped structure is shown and described, wherein the lower portion of the C-shaped structure is supported by a support, and magnetic force is used to exert a lifting force on the flexible supply structure 23 (particularly the lower portion of the flexible supply structure 23). In other embodiments, as an alternative or in addition to the magnetic support at the lower portion of the flexible supply structure 23, magnetic support may also be provided for the middle or upper portion of the C-shaped structure. For example, Figure 2 The third clamping bracket 28 may include one or more other permanent magnets that cooperate with one or more other magnets in the support element (not shown) so that when the one or more other permanent magnets and the one or more other magnets face each other, the one or more other permanent magnets and the one or more other magnets repel each other, thereby exerting a force (e.g., a lifting force) on the flexible supply structure.

[0062] The flexible supply structure 23 may also have other shapes or configurations that use repelling magnetic forces to exert a force on the flexible supply structure. The force exerted on the flexible supply structure 23 may be a lifting force to reduce or eliminate the pressure of the flexible supply structure 23 against the support 24, or may be another beneficial force, such as a force that affects the shape of the flexible supply structure 23. The force may be exerted at any suitable location on the flexible supply structure 23.

[0063] In the above, the flexible supply structure 23 is shown and described with respect to a first movable object 20 (particularly in a positioning module of a lithographic apparatus) movably supported on a second movable object 21. The same flexible supply structure can also be used in conjunction with any other movable object to exchange supply bodies between the movable object and another object, thereby improving the support of the flexible supply structure by applying a force (e.g., a lifting force) on the flexible supply structure using repelling magnets. The other object can be a movable object or a fixed object.

[0064] Although specific reference may be made herein to the use of lithographic apparatus in the manufacture of ICs, it will be appreciated that the lithographic apparatus described herein may have other applications. Other possible applications include the manufacture of integrated optical systems, guidance and detection patterns for magnetic domain memories, flat panel displays, liquid crystal displays (LCDs), thin film magnetic heads, etc.

[0065] Although specific reference may be made herein to embodiments of the invention in the context of lithographic equipment, embodiments of the invention may be used in other equipment. Embodiments of the invention may form part of a mask inspection equipment, a metrology equipment, or any equipment that measures or processes an object such as a wafer (or other substrate) or a mask (or other pattern forming device). These equipment may generally be referred to as lithographic tools. Such lithographic tools may use vacuum conditions or ambient (non-vacuum) conditions.

[0066] Although specific reference may have been made above to the use of embodiments of the invention in the context of optical lithography, it will be appreciated that the invention is not limited to optical lithography and may be used in other applications such as imprint lithography where the context permits.

[0067] Although specific embodiments of the present invention have been described above, it will be appreciated that the present invention may be practiced in a manner other than as described. The above description is intended to be illustrative, not restrictive. Therefore, it will be apparent to those skilled in the art that modifications may be made to the described invention without departing from the scope of the claims set forth below.

Claims

1. A flexible supply structure for connecting a first movable object to a second object, wherein the flexible supply structure comprises a first permanent magnet having a first magnetic field orientation, Wherein the flexible supply structure is arranged to be at least partially supported by a support member including a second magnet having a second magnetic field orientation, so that when the first permanent magnet and the second magnet face each other, the first permanent magnet and the second magnet repel to exert a force on the flexible supply structure.

2. A flexible supply structure according to claim 1, wherein the force is a lifting force.

3. A flexible supply structure according to claim 1 or 2, wherein the flexible supply structure comprises one or more clamping brackets, each clamping bracket clamping one or more supply hoses and / or supply cables, wherein the first permanent magnet is arranged in one of the one or more clamping brackets or on one of the one or more clamping brackets.

4. The flexible supply structure according to any one of claims 1-3, wherein the flexible supply structure is designed in a C-shaped arrangement having a lower part, a middle part and an upper part, wherein at least the lower part comprises the first permanent magnet.

5. The flexible supply structure according to any one of claims 1 to 4, wherein the first permanent magnet and the second magnet are designed to support the flexible supply structure in a floating state.

6. A flexible supply structure according to any one of claims 1-5, wherein the flexible supply structure includes a plurality of first permanent magnets having a first magnetic field orientation, each first permanent magnet being associated with one of a plurality of second magnets arranged in or on the support member and having a second magnetic field orientation, so that when the corresponding first permanent magnet and the corresponding second magnet face each other, each first permanent magnet and the associated second magnet repel to exert a lifting force on the flexible supply structure.

7. A flexible supply structure according to claim 6, wherein the flexible supply structure comprises a plurality of clamping brackets, each clamping bracket clamping one or more supply hoses and / or supply cables, wherein two or more clamping elements are provided with one or more first permanent magnets.

8. A positioning module, comprising: a first movable object; Second object; A flexible supply structure according to any one of the preceding claims, wherein a first end of the flexible supply structure is connected to the first object and a second end of the flexible supply structure is connected to the second object; and A support, wherein the support includes a second magnet having a second magnetic field orientation such that when the first permanent magnet and the second magnet face each other, the first permanent magnet and the second magnet repel to exert a force on the flexible supply structure.

9. The positioning module of claim 8, wherein the force is a lifting force.

10. A positioning module according to claim 8 or 9, wherein the flexible supply structure comprises one or more supply hoses and / or supply cables, and wherein the support member is arranged to support the flexible supply structure without mechanical contact between the support member and the one or more supply hoses and / or supply cables.

11. The positioning module according to any one of claims 8 to 10, wherein the first permanent magnet and the second magnet are designed to support the flexible supply structure in a floating state.

12. The positioning module according to any one of claims 8 to 11, wherein the second magnet is a permanent magnet.

13. The positioning module according to any one of claims 8 to 12, wherein the second magnet is an electromagnet.

14. The positioning module according to any one of claims 8 to 13, wherein the main axis of the second magnetic field orientation is arranged vertically.

15. The positioning module according to any one of claims 8-14, wherein the flexible supply structure is arranged in a C-shape having a lower part, a middle part and an upper part, wherein at least the lower part is supported by the support.

16. A positioning module according to any one of claims 8-15, wherein the flexible supply structure includes a plurality of first permanent magnets having a first magnetic field orientation, wherein the support member includes a plurality of second magnets having a second magnetic field orientation, wherein each first permanent magnet is associated with one of the second magnets, so that when the corresponding first permanent magnet and the corresponding second magnet face each other, each first permanent magnet and the associated second magnet repel to exert a lifting force on the flexible supply structure.

17. The positioning module according to any one of claims 8 to 16, wherein the first movable object is supported by the second object, wherein the first movable object is movable in a first horizontal direction, and the second object is movable in a second horizontal direction, wherein the first horizontal direction and the second horizontal direction are not parallel.

18. A lithographic device, comprising a positioning module according to any one of claims 8 to 17.

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